JP2001214258A - Film deposition apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a film deposition apparatus having the improved deposition speed of a thin deposited film by improving charged particle transport efficiency of a magnetic field generating means. SOLUTION: In the film deposition apparatus 1 having a housing 2 maintaining high vacuum, when the charged particle discharged from a plasma source 3 with using a troidal coil 8 only is transported along a magnetic axis 7 to a film deposited face 4a of a material to be film supported by a material holding means 5, the charged particle is run away from a magnetic flux by a vector product E×B drift resulting from a magnetic flux gradient, the charged particle transport efficiency is lowered accordingly. By additionally arranging a poloidal coil 9, a helical magnetic field is generated, the vector product E×B drift is prevented.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a film forming apparatus that guides charged particles to a material to be formed by using a magnetic field, and deposits charged particles (ions) on the material to form a film.

[0002]

2. Description of the Related Art In the production of functional materials including semiconductors and fine ceramics, it is necessary to deposit a thin film having characteristics such as corrosion resistance, high strength and low friction on the surface as a surface treatment. Further, submicron wiring in an integrated circuit requires metal embedding in a narrow groove (0.1 μm width). In order to carry out these, there is a technique of generating charged particles and depositing them on a material to be film-formed.Among these techniques, a technique of leading charged particles by a magnetic field when transporting the charged particles has attracted attention. ing.

As an example of an apparatus in which means for generating such a magnetic field is an important component, there is, for example, a film forming apparatus having means for emitting charged particles having a cathodic arc for generating arc discharge plasma. . The cathodic arc is known as a means for depositing a dense thin film at a high speed. In such a film forming apparatus, a desired material such as a metal and graphite is used for a cathode, a high-current arc discharge is performed under a high vacuum, a plasma almost close to complete ionization is obtained, and a necessary strong ion current is extracted. I have. However, since the evaporation rate of the cathode material is very high, a part of the cathode material sometimes erupts to disperse large electrically neutral particles having a size on the order of μm. Therefore, when a material to be film-formed can be expected from the cathode, an extremely large amount of neutral large particles accumulate on the material to be film-formed, thereby deteriorating the film quality. In order to prevent the film quality from deteriorating, bending the vacuum wall and making it more complicated,
Despite the devising of placing the film-forming material outside the viewing angle from the cathode, the probability that large neutral particles are reflected on the vacuum vessel wall and accumulate on the film-forming material cannot be ignored, and the simple wall bending However, it was not possible to prevent the deterioration of the film quality. Therefore, in order to prevent this deterioration in film quality, utilizing the property that charged particles are guided along the lines of magnetic force while large neutral particles travel straight irrespective of the lines of magnetic force, a curved line of magnetic force is used along this line. In addition, a method of deriving charged particles and separating charged particles from large neutral particles was used. As means for separating charged particles and large neutral particles, a magnetic field generating means was introduced into the film forming apparatus.

[0004] Marcela MM Bileka
nd Andre Anders “Designing
advanced filters for mac
ROPARTICLE REMOVAL FROM C
athletic arcplasmas "Plasma
Sources Sci. Technol. 8 4
88-493 (1999) describes a typical magnetic field generating means used in a film forming apparatus for guiding charged particles by a magnetic field. FIG. 5 is a schematic diagram of an experimental apparatus having this typical magnetic field generating means. In this apparatus, a plasma source 20 for generating arc discharge plasma by using a cathodic arc and emitting charged particles, and an ion collector 21 installed in place of a film-forming material and evaluating the number of incident ions are provided. Are spaced apart in the housing. This plasma source 20 emits neutral large particles together with charged particles in the same direction. Between the plasma source 20 and the ion collector 21, charged particles emitted from the plasma source 20 are guided along a curved magnetic field, and charged particles emitted from the plasma source 20 in the same direction as neutral ions. A magnetic filter 22 for extracting only charged particles from the particles is provided. The magnetic filter 22 is an air-core coil whose main axis is bent 90 ° in a plane. One opening 22a of the magnetic filter 22 faces the direction in which the plasma source 20 emits particles, and the other opening 22b of the magnetic filter 22 corresponds to the ion collector 21.
Face the surface on which the ions are incident. With this device,
The ions emitted from the plasma source 20 pass through the opening 22a.
Then, the light enters the magnetic filter 22, is separated from the neutral large particles, exits from the opening 22 b, and is guided to the ion collector 21.

[0005] Furthermore, this document describes another device having two types of conductors additionally provided to the device shown in FIG. One type of conductor is four sidelines that extend along the curvature of the main axis of the magnetic filter 22 and these four lines are
A pair of side lines (up and down lines), which are symmetrically arranged vertically above and below the main axis and through which currents flow in opposite directions, and a magnetic filter 2
And two sets of side lines (left and right lines) in which currents flow in opposite directions to each other symmetrically with respect to the two main axes. The upper and lower lines have the effect of shifting the position where the charged particles collide with the ion collector 21 in the left-right direction, and the left and right lines have the effect of shifting this position in the vertical direction. The other type of conductor is two injection coils located at the two openings 22a and 22b of the magnetic filter 22, respectively, and has an effect of eliminating the divergence of the lines of magnetic force near these two openings. is there. By these actions, more charged particles can be guided along the curvature of the magnetic filter 22 than when only the magnetic filter 22 is used.

Although the apparatus shown in FIG. 5 describes a magnetic field generating means having an air-core coil whose main axis is curved by 90 ° in a plane, MMM Bilek, ORM.
onteiro and IG Brown “Opt
immigration of film sticks
s profiles using a magnet
ic cusp homogenizer "Plasm
a SourcesSci. Technol. 8 8
8-93 (1999) describes a magnetic field generating means having an air-core coil (S-shaped coil 30) whose main axis is curved in an S-shape. FIG. 6 shows a plan view of the S-shaped coil 30. Similar to the air-core coil whose main axis is curved by 90 ° as shown in FIG. 5, the S-shaped coil 30 allows the neutral large particles to go straight and the charged particles to be curved by the S-shaped coil 30. To separate neutral large particles and charged particles.

[0007]

The film forming apparatus using a magnetic field generating means having a coil, described in the above-mentioned documents and the like, has greatly improved the efficiency of separating large neutral particles. However, further improvement is required in terms of the charged particle transport efficiency (the ratio of the amount of charged particles reaching the material to be deposited to the amount of charged particles emitted from the charged particle emission means). In such a film forming apparatus, about 10% of the normal arc current is evaluated as an ion current contributing to film formation. Generally, it is 1% or less.

The poor transport efficiency is one of the major factors due to the vector product E × B drift caused by the existence of the gradient of the magnetic flux density of the magnetic field that guides the charged particles. FIG.
It is a conceptual diagram which shows the vector product E * B drift which starts the existence of the gradient of magnetic flux density. Francis F. Ch
en “Introduction to Plasma”
Physics and Controlled F
usion "Second ed. vol.1 pp
26-28, Plenum Press (New Yo
As described in rk & London, 1984), when ions and electrons, which are charged particles, are guided by a magnetic field, the gradient of the magnetic flux density in a direction orthogonal to the direction of the magnetic flux density vector B formed by the magnetic field. Vector ▽ B
Is present, the ions and electrons are separated by the direction of the magnetic flux density vector B and the gradient vector ▽ B of the magnetic flux density.
Move in directions opposite to each other in a direction perpendicular to the direction of.
Thereby, charge separation P occurs. This charge separation P is
An electric field vector E having a component perpendicular to the magnetic flux density vector B is generated. The electric field vector E and the magnetic flux density vector B cause a so-called vector product E × B drift D. Thus, the ions and the electrons have velocity components in a common direction perpendicular to the electric field vector E and the magnetic flux density vector B. That is, when ions and electrons, which are charged particles, are guided by a magnetic field, if there is a directional component of the gradient of the magnetic flux density in a direction orthogonal to the direction of the magnetic flux density formed by this magnetic field, most of the charged particles are Escapes from the magnetic lines of force formed by the magnetic field guiding the charged particles.

SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a film forming apparatus that improves the charged particle transport efficiency of a magnetic field generating means and increases the deposition rate of a thin film.

[0010]

In order to achieve the above object, in a film forming apparatus according to a first aspect of the present invention, a housing and a material for supporting a material to be formed so as to be positioned in the housing. A supporting means, a charged particle emitting means that is arranged in the housing away from the film-forming material and emits charged particles, and a magnetic field line that extends curvedly between the material supporting means and the charged particle emitting means. Forming a toroidal magnetic field for guiding charged particles from the charged particle emission means to the film-forming material along the lines of magnetic force.
A magnetic field generating means and a magnetic field line perpendicular to the magnetic field line formed by the toroidal magnetic field, and forming a magnetic field line surrounding the magnetic field line, wherein the charged particles have a velocity component perpendicular to the magnetic field line formed by the toroidal magnetic field; And a second magnetic field generating means for generating a poloidal magnetic field for preventing escape from lines of magnetic force formed by the magnetic field.

As a result, since a twisted magnetic field can be formed, the vector product E × B drift caused by the plasma internal electric field vector E and the magnetic flux density vector B caused by charge separation caused by the gradient of the magnetic flux density is reduced. Therefore, the efficiency of charged particle transport of the magnetic field generating means can be improved, and the deposition rate of the thin film can be improved.

In the film forming apparatus according to a second aspect of the present invention, the first magnetic field generating means has a conductor surrounding a magnetic field line formed by the toroidal magnetic field, and the second magnetic field generating means The means each extend along the direction of the magnetic field lines formed by the toroidal magnetic field, are disposed at predetermined intervals so as to surround the magnetic field lines formed by the toroidal magnetic field, and the current flows in the same direction. Characterized by having a plurality of conducting wires.

[0013] In the film forming apparatus according to claim 3 of the present invention, the first magnetic field generating means has a conductor surrounding a magnetic field line formed by the toroidal magnetic field, and the second magnetic field generating means has a second magnetic field generating means. The means has a conductor spirally extending around a magnetic field line formed by the toroidal magnetic field, and a tangential direction of the conductor at an intersection between the conductor and an arbitrary plane perpendicular to the magnetic field line formed by the toroidal magnetic field. Is characterized by having both a component parallel to this plane and a component perpendicular to this plane.

[0014]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a film forming apparatus according to two embodiments of the present invention will be described with reference to FIGS. FIG. 2A is a top view illustrating the configuration of the film forming apparatus 1 according to the first embodiment. In addition, FIG.
2 is a cross-sectional view taken along a line 1b-1b in FIG. 2A and viewed from a cross section perpendicular to the paper surface. A plasma source 3 used as charged particle emission means for generating a plasma using a cathodic arc and emitting charged particles in one direction is provided in a housing 2 capable of maintaining a high vacuum inside thereof. The material holding means 5 for holding the film forming material 4 is located apart from the material holding means 5. In addition, these
Charged particle discharge hole 3a for discharging charged particles of plasma source 3
A half line extending in the direction in which the charged particles are emitted starting from the first line, and a half line extending in a direction perpendicular to the film forming surface 4a where the film of the material to be formed is generated are shown in FIG. )
Are arranged so as to intersect approximately vertically on the paper surface of FIG. A plane that includes these two half lines and is parallel to the plane of FIG. 2A is defined as a reference plane 6 (indicated by a dotted line in FIG. 2B). Within this reference plane 6, the plasma source 3
A toroidal coil comprising a conductive wire spirally wound around a curved toroidal coil axis (hereinafter referred to as a magnetic axis 7) with the film-forming material 4 at both ends and constituting the first magnetic field generating means. A coil 8 is provided. One opening 8a of the toroidal coil 8 faces the charged particle emission hole 3a of the plasma source 3, and the other opening 8b
The film-forming material 4 faces the film-forming surface 4a. A plane perpendicular to the reference plane 6, that is, a plane perpendicular to the plane of FIG. 2A and perpendicular to the magnetic axis 7 is hereinafter referred to as a horizontal plane, and each turn of the toroidal coil 8 (which is a part of a conductor). Thus, the ring-shaped portion that makes one rotation of the magnetic shaft 7) exists substantially in a horizontal plane. That is, a current substantially perpendicular to the magnetic axis 7 flows through the toroidal coil 8. Due to this current, inside the toroidal coil 8, it extends along the magnetic axis 7, that is,
Magnetic lines of force extending in a curved manner are formed between the plasma source 3 and the film-forming material 4. The magnetic field that forms the lines of magnetic force is called a toroidal magnetic field.

As shown in FIG. 2B, eight conductors are provided outside the toroidal coil 8 so as to surround the magnetic axis 7 along the magnetic axis 7, and a second magnetic field is provided. A poloidal coil 9 constituting the generating means is provided.
A current flows through each conductor in the same direction. Each conductor is symmetrically located with respect to the magnetic axis 7. That is, in any horizontal plane, all the conductors are arranged at a certain distance from the magnetic axis 7 and any two adjacent conductors are arranged at a certain distance. Have been. That is, all the conductors are present on a circumference centered on the magnetic axis 7 on an arbitrary horizontal plane, and on this horizontal plane, on the reference plane 6, on a straight line forming + 45 ° with the reference plane 6, The poloidal coil 9 is arranged such that two conductors are respectively provided on a straight line that forms an angle of −45 ° with the reference plane 6 and a straight line that forms an angle of 90 ° with the reference plane 6 so as to face each other with the magnetic axis 7 interposed therebetween. , Are arranged.

FIG. 3A shows lines of magnetic force formed by a poloidal magnetic field generated by using the poloidal coil 9 in an arbitrary horizontal plane. When a current is applied to each conductor of the poloidal coil 9 in the same direction, the poloidal coil 9 faces in opposite directions on the inside and outside of a boundary line called a separatrix 10 that is present around the poloidal coil 9 and surrounds the magnetic axis 7. Closed
A poloidal magnetic field that forms a group of magnetic force lines surrounding the magnetic axis 7 is generated.

First, with reference to FIG. 2A, the motion of charged particles when only a toroidal magnetic field is generated will be described. The charged particles emitted from the charged particle emission hole 3a of the plasma source 3 enter inside from the opening 8a of the toroidal coil 8. The incident charged particles move around the magnetic field formed by the toroidal magnetic field. Since the toroidal magnetic field has a gradient of the magnetic flux density, most of the incident charged particles escape from the toroidal magnetic field due to the vector product E × B drift triggered by the gradient of the magnetic flux density as described above. Charged particles guided along the toroidal magnetic field without escaping from the toroidal magnetic field exit from the opening 8b and accumulate on the deposition surface 4a of the deposition target material 4.

Next, the motion of charged particles when a toroidal magnetic field and a poloidal magnetic field are generated will be described.
FIG. 3 (b) shows the inside of the toroidal coil 8.
The figure shows the lines of magnetic force formed by the helical magnetic field in which the toroidal magnetic field and the poloidal magnetic field overlap. The magnetic field lines spirally extend around the magnetic axis 7, and the tangential direction 12 of the magnetic field lines on an arbitrary horizontal plane 11 has a vertical component 12 a and a parallel component 12 b of the horizontal plane 11. A continuous curved surface including the magnetic axis 7, wherein a line of intersection between the curved surface and an arbitrary horizontal plane 11 is a straight line and the angle between the straight line and the reference plane 6 is constant, is defined as a vertical curved surface 13. And The lines of magnetic force formed by the toroidal magnetic field are
The configuration is such that all exist in the vertical curved surface 13,
In other words, although a two-dimensional configuration is used, a vertical curved surface shared by two different points on an arbitrary line of magnetic force formed by a helical magnetic field does not always exist. In other words, the magnetic lines of force formed by the helical magnetic field are three-dimensional, so to speak, in a twisting configuration.

The toroidal coil 8 of the first magnetic field generating means and the poloidal coil 9 of the second magnetic field generating means cooperate to generate a helical magnetic field. It is in a configuration that gives a twist. This can prevent the charge separation caused by the gradient of the magnetic flux density as described above. Therefore, it is possible to prevent the vector product E × B drift due to the plasma internal electric field vector E and the magnetic flux density vector B due to the charge separation, and thus to improve the charged particle transport efficiency of the magnetic field generating means, and to reduce The deposition rate can be improved. By preventing the vector product E × B drift, it is estimated that most of the charged particles do not escape from the lines of magnetic force when the charged particles pass through the toroidal coil 8. The transport loss is expressed as transport loss (%) = ((amount of charged particles emitted from the plasma source−amount of charged particles deposited on the deposition surface of the material to be deposited))
/ Amount of charged particles released from the plasma source) × 100, the transport loss of the film forming apparatus 1 of the present embodiment is estimated to be about 10%. The transport loss of a conventional film forming apparatus having a magnetic field generating means that does not generate a helical magnetic field is about 90%.

The transport loss of the film forming apparatus 1 of this embodiment is 1
Assuming that the transport loss of the conventional film forming apparatus is 90%
Differences in transport losses cause differences in deposition rates
Explain the rubbing. With reference to FIG.
Pressure 1 × 10^-4Keep high vacuum below Torr
That is, an arc discharge is generated between the anode and the cathode of the plasma source 3.
Rub Since ionization of residual gas molecules is negligible,
The atoms that make up the cathode are sputtered by the
It is ionized in the column and maintains an arc discharge. Cathode material
For example, graphite or a high melting point metal is used.
The arc discharge plasma density is 10¹³-10^Fifteencm
^-3Very high, temperature is 1-10 eV, void
It is suitable for high-speed deposition of dense thin films without any problems. here
Considers carbon as the cathode material. Ion density n_iTo
Having a magnetic field generating means that does not generate a helical magnetic field
Deposition rate of 90% loss of carbon film for conventional film deposition equipment
R_{0. 9}And charcoal related to the film forming apparatus 1 of the first embodiment.
Deposition rate R for 10% loss of elementary film _0.1If you indicate
become that way. However, the atomic surface density of the monoatomic layer is 2 × 10
^Fifteencm^-2, The distance between atomic layers is 4Å, and the magnetic
The velocity in the direction of the air axis 7, that is, the ion velocity is represented by v_i= 4 × 10
⁵cms^-1It is assumed that

N_icm^-3 n_iv_icm^-2s^-1 R_0.9nms^-1 R_0.1nms ^-1 1 × 10¹² 4 × 10¹⁷ 4 × 10^-2 3.6 × 10^-1 1 × 10¹³ 4 × 10¹⁸ 4 × 10^-1 3.6 × 10⁰ 1 × 10¹⁴ 4 × 10¹⁹ 4 × 10⁰ 3.6 × 10¹ The arc discharge is pulsed and used for operation.
The pulse width of the pulse current is 5 ms and the repetition is 1 H
z. To omit cooling, the pulse
It is desirable that the ratio be about 5/1000. This
Not surprisingly, the deposition rate of the carbon film was
Particle flux density n that has passed through the toroidal coil 8_iv
_iIs proportional to Naturally, n_iGrows larger
And R_0.9And R_0.1Means that they tend to be large
I understand. In addition, the transport of the film forming apparatus 1 according to the first embodiment is performed.
10% transmission loss and no helical magnetic field
The transport loss of the conventional film forming apparatus having a magnetic field generating means is reduced by 90%.
%, Each n_iFor R_0.1Is
R_0.9It can be seen that the value is increased by one digit. That is, the first
Does not generate a helical magnetic field
Larger than conventional film forming equipment with magnetic field generating means
High charged particle transport efficiency can be achieved.
As a result, the deposition rate of the thin film can be improved.

In the first embodiment, the poloidal coil 9 is composed of eight conductors.
What is necessary is just to be comprised by more than this conductor. FIG.
As shown in (b) of FIG.
Although, as described above, the poloidal coil 9 is composed of eight or more conductors symmetrically positioned on any horizontal plane, and the The poloidal coil 9 may be configured such that the figure formed by the line segment connecting the two conducting wires includes the magnetic axis 7 and all the internal angles of the figure are smaller than 180 °. Preferably, 4
A figure formed by a line segment connecting two adjacent conductors on an arbitrary horizontal plane is a regular polygon, and the center of gravity of this figure and the magnetic axis 7 are
The poloidal coil 9 is configured to match.

Next, a second embodiment will be described with reference to FIG. Note that in this embodiment, components that are substantially the same as those in the first embodiment are denoted by the same reference numerals, and description thereof is omitted. In FIG. 4, the housing 2, the plasma source 3, the film-forming material 4, the material supporting means 5, and the poloidal coil 8 are omitted. In the first embodiment (see FIG. 2A), the second magnetic field generating means has the poloidal coil 9, but in the second embodiment, the second magnetic field generating means Has, instead of this, a poloidal coil 14 with six conductors extending helically around the magnetic axis 7 outside the toroidal coil 8. FIG. 4 shows this poloidal coil 1.
4 shows a plan view of FIG. Current flows through the six conductors of the poloidal coil 14 in the same direction. The number of intersections between the conductor of the toroidal coil 8 and the reference plane 6 is different from the number of intersections between the conductor of the poloidal coil 14 and the reference plane 6.
That is, the pitch of the toroidal coil 8 and the pitch of the poloidal coil 14 are different.

Tangential direction 1 of conductor of poloidal coil 14
5 at the intersection of any transverse plane 16 and this conductor
It has a component 15 a in a direction parallel to the horizontal plane 16. That is, the direction of the current flowing through the conductor of the poloidal coil 14 has the same component as the direction of the current flowing through the toroidal coil 8. The tangential direction 15 of the conductor of the poloidal coil 14 has a component 15b in a direction perpendicular to the horizontal plane 16 at an intersection of the arbitrary horizontal plane 16 and the conductor.
That is, the direction of the current flowing through the conductor of the poloidal coil 14 has the same component as the direction of the current flowing through the poloidal coil 9 of the first embodiment. From this, it is presumed that the magnetic field generating means of the second embodiment can generate a magnetic field similar to the helical magnetic field generated by the magnetic field generating means of the first embodiment.

Therefore, the film forming apparatus according to the second embodiment
Functions and effects similar to those of the film forming apparatus of the first embodiment are obtained. That is, it is possible to prevent a vector product E × B drift due to the plasma internal electric field vector E and the magnetic flux density vector B caused by the charge separation caused by the gradient of the magnetic flux density as described above. The charged particle transport efficiency can be improved, and the deposition rate of the thin film can be increased.

In the second embodiment, the poloidal coil 14 is composed of six conductors,
It may be constituted by one or more conducting wires. Preferably, it is composed of six or more. Further, although the poloidal coil 14 is located outside the toroidal coil 8, it may be located inside.

It should be noted that the present invention is not limited to the above-described embodiment, and it is needless to say that various modifications and applications are possible without departing from the spirit of the invention.

[Brief description of the drawings]

FIG. 1 is a conceptual diagram showing a vector product E × B drift triggered by the existence of a gradient of a magnetic flux density.

FIG. 2A is a top view illustrating a configuration of a film forming apparatus according to the first embodiment. FIG. 2B is a cross-sectional view taken along line 1b-1b of FIG. 2A.

FIG. 3A is a diagram showing lines of magnetic force formed by a poloidal magnetic field. FIG. 3B is a conceptual diagram showing magnetic lines of force formed by a helical magnetic field in which a toroidal magnetic field and a poloidal magnetic field overlap.

FIG. 4 is a plan view of a poloidal coil according to a second embodiment.

FIG. 5 is a schematic diagram of an experimental apparatus having a typical magnetic field generating means.

FIG. 6 is a plan view of an air-core coil whose main axis is curved in an S-shape.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Film-forming apparatus 2 Housing 3 Plasma source 5 Material holding means 8 Toroidal coil 9 Poloidal coil

Claims (3)

[Claims] 1. A housing, material support means for supporting a film-forming material so as to be positioned in the housing, and charged particle emission that is arranged in the housing at a distance from the film-forming material and emits charged particles. Means for forming a magnetic line of force extending in a curved manner between the material supporting means and the charged particle emitting means, and for guiding charged particles from the charged particle emitting means to the film-forming material along the magnetic line of force. First magnetic field generating means for generating a toroidal magnetic field, perpendicular to the lines of magnetic force formed by the toroidal magnetic field,
A magnetic field line surrounding this magnetic field line is formed, and a charged particle has a velocity component perpendicular to the magnetic field line formed by the toroidal magnetic field, and generates a poloidal magnetic field for preventing the charged particle from escaping from the magnetic field line formed by the toroidal magnetic field. And a second magnetic field generating means. 2. The method according to claim 1, wherein the first magnetic field generating means has a conductor surrounding a magnetic field line formed by the toroidal magnetic field,
Each of the second magnetic field generating means extends in a direction of a magnetic field line formed by the toroidal magnetic field, and is disposed at a predetermined interval so as to surround the magnetic field line formed by the toroidal magnetic field. And a plurality of conducting wires through which current flows in the same direction.
3. The film forming apparatus according to item 1. 3. The first magnetic field generating means has a conductor surrounding a magnetic field line formed by the toroidal magnetic field,
Further, the second magnetic field generating means has a conductor spirally extending around a magnetic field line formed by the toroidal magnetic field, and an arbitrary plane perpendicular to the magnetic field line formed by the toroidal magnetic field and this conductor. 2. The film forming apparatus according to claim 1, wherein the tangential direction of the conductive wire at the intersection of the component has both a component parallel to the plane and a component perpendicular to the plane.