JP2001207254A - Vapor deposition chamber - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a vapor deposition chamber which is an apparatus for heating and evaporating a source material in vacuum, vapor depositing the resultant evaporated matter on an object to be coated held in the chamber, and carrying out polymerization to form an organic film and in which the removal of the organic film deposited on the inside of the chamber by this vacuum evaporation is facilitated. SOLUTION: The inside of a vapor deposition chamber 3 is constituted of a material harder than aluminum, or the inside of the chamber is provided with a freely detachable chamber-deposition shield composed of a material harder than aluminum.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vapor deposition tank for an apparatus for forming an organic film by heating and evaporating a raw material on a coating object such as an electronic component housed in a tank by evaporating the material in a vacuum and polymerizing the material. It is about.

[0002]

2. Description of the Related Art In order to improve insulation and heat resistance, an electronic component such as a semiconductor device is provided with an organic coating such as a polyimide coating (see, for example, Japanese Patent Application Laid-Open No. H08-08258). No. 13136). In the method of forming the polyimide film, an apparatus as shown in FIG. 4 is used to heat and evaporate tetracarboxylic dianhydride and diamine as two kinds of raw materials 11 and 12, respectively, to thereby form a coating material 1 such as an electronic component. And polymerized in vacuum. In the above-described apparatus, the mesh-shaped rotary barrel 2 containing the object to be coated 1 is housed in an evaporation tank 20 which is a cylindrical tank, and a vacuum pump 15 is operated in the evaporation tank 20 so as to have a predetermined vacuum degree. After that, the raw materials 11, 12 charged into the evaporating tube 4
Is heated by a heater, and the raw materials 11, 1 are introduced through the introduction pipe 5.
The second raw material vapor can be introduced into the vapor deposition tank 20. The above-mentioned apparatus forms the polyamic acid film by vapor-depositing and polymerizing the above-mentioned raw material vapor on the surface of the object to be coated 1 in the rotary barrel 2 which is rotated by the motor 16. Thereafter, the coated object 1 on which the polyamic acid film is formed is taken out of the apparatus, and further, the polyamic acid film is subjected to a heat treatment to form an organic film of polyimide on the surface of the coated object.

[0003]

The above-mentioned vapor deposition tank is formed of a material having good thermal conductivity such as aluminum in order to ensure uniform temperature. The vacuum deposition for forming a polyamic acid film on the object to be coated is performed in a state of being heated to about 200 ° C. In the above-mentioned vapor deposition tank, when this vacuum deposition is repeatedly performed, the organic film deposited in the tank adheres to the inner wall of the tank. For this reason, in the above-mentioned vapor deposition tank, the temperature distribution in the tank may be non-uniform, and therefore, it is necessary to remove the attached organic film. However, since the adhered organic film is polymerized together with the vapor deposition and adheres firmly, the organic film has to be scraped off with a blade or the like to peel off the organic film. The peeling method of shaving with a blade or the like may damage the vapor deposition tank, and the operation of removing the organic film while paying attention to this method requires a lot of time.

The present invention has been made in view of the above circumstances, and an object of the present invention is to heat and evaporate a raw material on a coating object stored in a tank in a vacuum to vapor-deposit and polymerize the raw material. It is an object of the present invention to provide an apparatus for forming an organic film, which is capable of easily removing an organic film deposited in the tank by the vacuum evaporation.

[0005]

According to the first aspect of the present invention, there is provided an apparatus for forming an organic film by vaporizing and evaporating a raw material in a vacuum on a material to be coated contained in the tank. Is characterized in that the inside of this tank is formed of a material harder than aluminum. By the above, since the inner wall surface to which the organic film deposited in the tank adheres is formed of a hard material such as stainless steel, the adhered organic film is hardly damaged when scraped with a blade or the like, and adheres. The organic film can be easily removed.

According to a second aspect of the present invention, there is provided the vapor deposition tank according to the first aspect, wherein the wall of the tank has a hard layer made of a material harder than aluminum inside and a uniform layer made of aluminum outside the hard layer. It is characterized by having a thermal layer. Due to the above, aluminum is a material having good thermal conductivity, so if the soaking layer is provided, heat transmitted from the heating layer can be uniformly transmitted to the hard layer throughout the tank, so that the adhered organic layer This facilitates the work of removing the coating film and can further improve the uniformity of the temperature in the bath.

A vapor deposition tank according to a third aspect of the present invention is a vapor deposition tank of an apparatus for forming an organic film by heating and evaporating a raw material in a vacuum on a material to be coated housed in the tank and polymerizing the material. Is provided with an attachment / detachment-preventing plate made of a material harder than aluminum.
As described above, the inner wall surface is covered with the anti-adhesion plate formed of a hard material such as stainless steel, so that the organic coating deposited in the tank can be adhered to this anti-adhesion plate. Therefore, when the organic coating adheres to the deposition-preventing plate, the organic deposition deposited in the vessel can be removed by replacing the deposition-preventing plate.

According to a fourth aspect of the present invention, in the vapor deposition tank according to any one of the first to third aspects, the material harder than the aluminum is stainless steel.

According to a fifth aspect of the present invention, there is provided the vapor deposition tank according to any one of the first to fourth aspects, wherein the tank is provided with a heater for heating the side surface or the entire front and rear surface of the tank. Features. As described above, the uniformity of the temperature of the vapor deposition tank can be ensured.

[0010]

DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is an explanatory view showing an example of an apparatus provided with a vapor deposition tank to which the present invention is applied. The vapor deposition tank 3 has a cylindrical shape.
Vacuum deposition is performed to form an organic film on the surface of the stored object 1 to be coated. The above device
Powdered pyromellitic anhydride, which is a tetracarboxylic dianhydride, and powdered diaminodiphenyl ether, which is a diamine, are heated and evaporated as the raw materials 11 and 12, respectively, and are vapor-deposited on the object to be coated 1 in a vacuum and polymerized. A polyimide film as an organic film. The above-mentioned apparatus is used for the raw material 1 charged in the evaporating tube 4.
Heaters 1 and 12 are heated by a heater 6, and raw material vapors of the raw materials 11 and 12 are introduced into the vapor deposition tank 3 through an introduction pipe 5.
The introduction pipe 5 is provided in the vapor deposition tank 3 with a plurality of introduction ports 5.
a are arranged in the longitudinal direction of the pipe, and the inlet 5a
The raw material vapor is introduced into the vapor deposition tank 3. The above device comprises a mesh-shaped rotary barrel 2 containing a coating object 1.
Is stored in the vapor deposition tank 3, and the rotary barrel 2 is rotated by a motor 16. The above-mentioned apparatus operates the vacuum pump 15 inside the vapor deposition tank 3 to set a predetermined degree of vacuum.
The raw materials 11 and 12 charged into the evaporating pipe 4 are heated by a heater, and the raw material vapors of the raw materials 11 and 12 are introduced into the vapor deposition tank 3 through the introducing pipe 5, and the coating material 1 in the rotary barrel 2 is formed. Is to form a polyamic acid film on the surface of. The coated object 1 on which the polyamic acid film is formed is obtained by taking out the polyamic acid film from the apparatus and further subjecting the polyamic acid film to a heat treatment to form an organic film of polyimide.

The organic film formed using the vapor deposition tank of the present invention may be, for example, other than the above-mentioned polyimide film.
Examples of the coating include polyparaxylene and polyurea.

Next, the vapor deposition tank according to claim 1 of the present invention will be described. The inside of the vapor deposition tank 3 is formed of a material harder than aluminum. Examples of the material harder than aluminum include stainless steel. Since the inner wall surface 9 to which the organic film deposited in the vapor deposition tank 3 adheres is formed of a hard material such as stainless steel, the adhered organic film is hardly damaged even when it is scraped with a blade or the like. The operation of removing the adhered organic film can be easily performed. By the way, the work of removing the adhered organic film can be greatly reduced to 4 hours / person for a conventional tank made of aluminum and 1 hour / person for a tank made of stainless steel.
In addition, since the vapor deposition tank is damaged, repairs and the like that are required every year can be eliminated.

Further, since the material such as stainless steel has a lower thermal conductivity than aluminum which has been widely used in the past, in order to ensure the temperature uniformity of the vapor deposition tank 3, the vapor deposition tank 3 is It is preferable to provide a heater for heating the side surface 7 or the entire front and rear surface 8 of the tank. A mantle heater may be used to heat the entire side surface 7 of the tank.
A heater for heating the entire front and rear surfaces 8 of the tank includes a surface heater.

As long as the inside of the vapor deposition tank 3 is a tank made of a material harder than aluminum, even if the vapor deposition tank is made only of a hard material such as stainless steel, the outside is made of another material. It may have a formed layer. When the vapor deposition tank 3 is formed only of a hard material such as stainless steel, when the introduction pipe 5 attached to the vapor deposition tank 3 is attached with screws, the problem that the thread is broken and the introduction pipe 5 becomes loose is solved. There are advantages that can be done. As the vapor deposition tank, for example, as shown in FIG. 2 (b), the wall of the tank has a hard layer 9 made of a hard material such as stainless steel.
a and a heating layer 14 such as a heater for heating the tank by circumscribing the hard layer 9a.

As another wall configuration of the tank, for example,
As shown in FIG. 2A, the wall configuration of the vapor deposition tank 3 includes a hard layer 9a whose inside is made of a hard material such as stainless steel,
A layer having a heat equalizing layer 10 outside the hard layer 9a for uniformizing the temperature of a tank made of aluminum and a heating layer 14 such as a heater for heating the tank outside the heat equalizing layer 10 can be given. Since aluminum is a material having good thermal conductivity, if the heat equalizing layer 10 is provided, heat transmitted from the heating layer 14 can be uniformly transmitted to the hard layer 9a throughout the tank. Therefore, the vapor deposition tank 3 can facilitate the work of removing the attached organic film and can further improve the uniformity of the temperature in the tank.

Next, the vapor deposition tank according to claim 3 of the present invention will be described. FIG. 3 is an explanatory diagram schematically showing a vapor deposition tank. The vapor deposition tank 3 is provided with detachable protection plates 16a and 16b made of a material harder than aluminum and detachable inside a tank body 3a formed of aluminum or the like. Examples of the material harder than aluminum include stainless steel. The vapor deposition tank 3 has an inner wall surface formed of a hard material such as stainless steel or the like.
Since it is covered with 16b, the organic film deposited in the tank can adhere to the adhesion preventing plates 16a and 16b. Therefore, the removal of the organic film deposited in the tank is performed when the organic film deposited in the tank adheres to the deposition-preventing plates 16a and 16b.
The deposition plates 3a and 16b may be replaced, and the vapor deposition tank 3 can be easily removed. Also, the attachment-preventing plates 16a,
The removal of the organic film adhered to 16b may be performed outside the apparatus. Since the deposition-preventing plates 16a and 16b are made of a hard material such as stainless steel, the deposition-preventing plates 16a and 16b may be formed by cutting off the deposits with a blade or the like. It is hard to be damaged and can easily remove the organic film.

[0017]

According to the first aspect of the present invention, the inner wall surface on which the organic film deposited in the tank adheres is formed of a hard material such as stainless steel. It is hard to be damaged when scraping, and the work of removing the attached organic film can be easily performed.

Furthermore, the vapor deposition tank according to claim 2 is preferably
Since aluminum is a material with good thermal conductivity, the heat transmitted from the heating layer can be uniformly transmitted to the hard layer throughout the tank, so that the work of removing the attached organic film is facilitated and the aluminum inside the tank is removed. Temperature uniformity can be improved.

According to a third aspect of the present invention, in the vapor deposition tank,
Since it is covered with a protection plate made of hard material such as stainless steel,
Since the organic coating deposited in the tank can be attached to this anti-adhesion plate, where the organic coating adheres to the anti-adhesion plate,
The organic coating deposited in the tank can be removed by replacing the anti-adhesion plate.

Further, the vapor deposition tank according to claim 4 is preferably
Since stainless steel is suitable as a material harder than aluminum, it is easy to remove the organic film deposited in the tank by vacuum evaporation.

Furthermore, the vapor deposition tank according to claim 5 is preferably
The uniformity of the temperature of the vapor deposition tank can be ensured.

[Brief description of the drawings]

FIG. 1 is an explanatory view showing an example of an apparatus provided with a vapor deposition tank to which the present invention is applied.

FIGS. 2A and 2B are cross-sectional views showing a wall surface of a vapor deposition tank.

FIG. 3 is an explanatory view schematically showing the invention according to claim 3;

FIG. 4 is an explanatory view showing an example of an apparatus provided with a conventional vapor deposition tank.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Coated object 2 Rotation barrel 3 Evaporation tank 4 Evaporation tube 5 Introducing tube 9a Hard layer 10 Heat equalizing layer 11,12 Raw material 16a, 16b Deposition plate

Claims (5)

[Claims] 1. A vapor deposition tank of an apparatus for forming an organic film by heating and evaporating a raw material on a material to be coated housed in a tank in a vacuum and polymerizing the raw material, wherein the inside of the tank is harder than aluminum. A vapor deposition tank characterized by being a tank formed of the above material. 2. The tank according to claim 1, wherein the wall of the tank has a hard layer made of a material harder than aluminum on the inside, and a soaking layer made of aluminum on the outside of the hard layer. Evaporation tank. 3. A vapor deposition tank of an apparatus for forming an organic film by heating and evaporating a raw material in a vacuum on an object to be coated housed in a tank, and polymerizing the material to form an organic film.
An evaporation tank characterized by comprising a removable attachment plate made of a material harder than aluminum. 4. The vapor deposition tank according to claim 1, wherein the material harder than aluminum is stainless steel. 5. The vapor deposition tank according to claim 1, wherein the tank is provided with a heater for heating the side surface or the entire front and rear surface of the tank.