JP2001203073A - High frequency heating device - Google Patents

High frequency heating device

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Publication number
JP2001203073A
JP2001203073A JP2000012551A JP2000012551A JP2001203073A JP 2001203073 A JP2001203073 A JP 2001203073A JP 2000012551 A JP2000012551 A JP 2000012551A JP 2000012551 A JP2000012551 A JP 2000012551A JP 2001203073 A JP2001203073 A JP 2001203073A
Authority
JP
Japan
Prior art keywords
frequency
frequency output
heating chamber
temperature
output value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000012551A
Other languages
Japanese (ja)
Inventor
Seiji Nakamura
政治 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2000012551A priority Critical patent/JP2001203073A/en
Publication of JP2001203073A publication Critical patent/JP2001203073A/en
Pending legal-status Critical Current

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  • Control Of High-Frequency Heating Circuits (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a high frequency heating device in which the changes of high frequency output due to initial temperature in the heating chamber and the temperature characteristics of the high frequency generating means can be corrected, and uniform cooking performance is obtained. SOLUTION: In this device, the amount of heat applied naturally to an object 3 by the temperature of a heating chamber 4 which is calculated by the use time and stop time of the magnetron (high frequency generating means) 2 and the amount of changes in the high frequency output due to correlation characteristics of the use time of the magnetron (high frequency generating means) 2 and the change of the high frequency output, are obtained and the correction of the high frequency output and the change of cooking time are made, and the magnetron (high frequency generating means) 2 is controlled. Accordingly uniform cooking is obtained.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は高周波加熱装置に関
し、特に高周波発生手段から供給される高周波出力値の
補正方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-frequency heating device, and more particularly to a method for correcting a high-frequency output value supplied from a high-frequency generator.

【0002】[0002]

【従来の技術】従来の高周波加熱装置1は、図6に示す
ように、マイクロ波を発生する高周波発生手段であるマ
グネトロン2と、前記マグネトロン2に電源を供給する
交流制御装置、食品等の被加熱物3を収容する加熱室4
と、本体前面に調理時間等の選択を行う操作手段5と、
調理時間等の設定内容の表示を行う表示手段6のように
構成されている。
2. Description of the Related Art As shown in FIG. 6, a conventional high-frequency heating apparatus 1 includes a magnetron 2 serving as a high-frequency generating means for generating microwaves, an AC control device for supplying power to the magnetron 2, and a food or the like. Heating chamber 4 containing heated object 3
Operating means 5 for selecting a cooking time or the like on the front of the main body;
The display unit 6 is configured to display setting contents such as cooking time.

【0003】そして上記高周波加熱装置1は、調理設定
時に高周波発生装置や発熱装置等の加熱室4の被加熱物
3を実際に加熱・保温を行う加熱装置の調理方法を選択
することにより、高周波発生装置・発熱装置等の制御を
行い、加熱室4内の被加熱物3を加熱・保温することが
可能となる。
The high-frequency heating apparatus 1 selects a cooking method of a heating apparatus for actually heating and keeping the object 3 to be heated in a heating chamber 4 such as a high-frequency generator or a heating apparatus at the time of cooking setting. By controlling a generator, a heat generator, and the like, it becomes possible to heat and keep the object 3 to be heated in the heating chamber 4.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、従来の
高周波加熱装置1において、マグネトロン2を構成する
部品の温度特性によるばらつきがあり、また発熱と共に
熱効率が低下することもあり、照射する高周波出力が多
少なりとも異なることがあるため出来映えに影響する。
また同様の調理方法の設定を行い、マグネトロン2より
同様の熱量を与えても季節や高周波加熱装置1を使用す
る場所の気温および加熱室4の温度等により加熱室4内
の被加熱物3が受ける熱量が異なってくるため、調理の
出来映えが異なることがあるという課題を有していた。
However, in the conventional high-frequency heating apparatus 1, there are variations due to the temperature characteristics of the components constituting the magnetron 2, and the heat efficiency may decrease with heat generation. Because it can be quite different, it affects the workmanship.
Even if the same cooking method is set and the same amount of heat is applied from the magnetron 2, the heating target 3 in the heating chamber 4 may be changed depending on the season, the temperature of the place where the high-frequency heating device 1 is used, the temperature of the heating chamber 4, and the like. Since the amount of heat received is different, there is a problem that the quality of cooking may be different.

【0005】[0005]

【課題を解決するための手段】本発明の高周波加熱装置
は、食品等の被加熱物を収納する加熱室と、前記加熱室
に高周波出力を供給する高周波発生手段とを有し、前記
高周波発生手段の高周波出力毎の使用時間と高周波出力
値の変化の相関特性と、高周波発生手段の使用時間によ
り算出した加熱室の温度とから、高周波出力値を補正
し、高周波発生手段を制御するものである。
A high-frequency heating apparatus according to the present invention includes a heating chamber for storing an object to be heated such as food, and high-frequency generating means for supplying a high-frequency output to the heating chamber. The high-frequency output value is corrected based on the correlation between the use time of each high-frequency output of the means and the change in the high-frequency output value and the temperature of the heating chamber calculated based on the use time of the high-frequency generation means, and the high-frequency generation means is controlled. is there.

【0006】これによって、高周波発生手段の高周波出
力毎の使用時間に伴う高周波出力値の変化がわかり、高
周波出力値を補正でき、一定の調理性能を提供すること
ができる。また高周波発生手段の各高周波出力における
使用時間と休止時間とにより現在の加熱室の温度状況を
算出でき、算出した結果を踏まえて、被加熱物を加熱す
るのに必要な熱量から、加熱室内の温度により自然に被
加熱物に加わる熱量を除いた適正熱量を、高周波発生手
段から供給するように高周波発生手段を制御するため、
一定の調理性能を提供することができる。
Thus, the change of the high-frequency output value with the use time of each high-frequency output of the high-frequency generation means can be recognized, the high-frequency output value can be corrected, and a constant cooking performance can be provided. Further, the current temperature state of the heating chamber can be calculated from the use time and the pause time at each high-frequency output of the high-frequency generation means. In order to control the high-frequency generator so that the appropriate amount of heat excluding the amount of heat naturally applied to the object to be heated due to the temperature is supplied from the high-frequency generator,
Constant cooking performance can be provided.

【0007】[0007]

【発明の実施の形態】請求項1の発明は、食品等の被加
熱物を収納する加熱室と、前記加熱室に高周波出力を供
給する高周波発生手段とを有し、前記高周波発生手段の
高周波出力毎の使用時間と高周波出力値の変化の相関特
性と、高周波発生手段の使用時間により算出した加熱室
の温度とから、高周波出力値を補正し、高周波発生手段
を制御するものである。
DETAILED DESCRIPTION OF THE INVENTION The invention according to claim 1 has a heating chamber for storing an object to be heated such as food, and high frequency generating means for supplying a high frequency output to the heating chamber. The high-frequency output value is corrected based on the correlation between the use time of each output and the change of the high-frequency output value and the temperature of the heating chamber calculated based on the use time of the high-frequency generation means, and the high-frequency generation means is controlled.

【0008】これにより、高周波発生手段の高周波出力
毎の使用時間に伴う高周波出力値の変化がわかり、高周
波出力値を補正でき、均一の調理性能を提供することが
できる。また、高周波発生手段の各高周波出力における
使用時間と休止時間とにより現在の加熱室の温度状況を
算出でき、算出した結果を踏まえて、被加熱物を加熱す
るのに必要な熱量から、加熱室内の温度により自然に被
加熱物に加わる熱量を除いた適正熱量を、高周波発生手
段から供給するように高周波発生手段を制御するため、
さらに均一の調理性能を提供することができる。
Thus, the change of the high-frequency output value with the use time of each high-frequency output of the high-frequency generation means can be recognized, the high-frequency output value can be corrected, and uniform cooking performance can be provided. In addition, the current temperature state of the heating chamber can be calculated based on the usage time and the idle time at each high-frequency output of the high-frequency generation means. In order to control the high frequency generating means to supply the appropriate amount of heat excluding the amount of heat naturally applied to the object to be heated by the temperature of the high frequency generating means,
Further, uniform cooking performance can be provided.

【0009】また請求項2の発明は、食品等の被加熱物
を収納する加熱室と、前記加熱室に高周波出力を供給す
る高周波発生手段と、前記高周波発生手段の温度を監視
する第1の監視手段とを有し、前記高周波発生手段の第
1の監視手段に基づく温度と高周波出力値の変化の相関
特性と、高周波発生手段の使用時間により算出した加熱
室の温度とから、高周波出力値を補正し、高周波発生手
段を制御するものである。
According to a second aspect of the present invention, there is provided a heating chamber for storing an object to be heated such as food, a high frequency generating means for supplying a high frequency output to the heating chamber, and a first temperature monitoring means for monitoring the temperature of the high frequency generating means. A high-frequency output value based on a correlation characteristic between a change in the high-frequency output value and a temperature based on the first monitoring means of the high-frequency generation means, and a temperature of the heating chamber calculated based on a use time of the high-frequency generation means. And controls the high frequency generation means.

【0010】そして、上記第1の監視手段を設けること
により、正確に高周波発生手段の温度を知ることが出
来、この温度と高周波出力値の変化の相関特性から高周
波出力値の変化がわかり、高周波出力値を補正でき、一
定の調理性能を提供することができる。また、温度特性
によるばらつきを押さえることが可能となり、一層の安
定した調理性能を提供することが出来る。また、高周波
発生手段の各高周波出力における使用時間と休止時間と
により現在の加熱室の温度状況を算出でき、算出した結
果を踏まえて、被加熱物を加熱するのに必要な熱量か
ら、加熱室内の温度により自然に被加熱物に加わる熱量
を除いた適正熱量を、高周波発生手段から供給するよう
に高周波発生手段を制御するため、さらに均一の調理性
能を提供することができる。
By providing the first monitoring means, the temperature of the high-frequency generating means can be accurately known, and the change in the high-frequency output value can be determined from the correlation characteristic between the temperature and the change in the high-frequency output value. The output value can be corrected, and constant cooking performance can be provided. In addition, it is possible to suppress variations due to temperature characteristics, and it is possible to provide more stable cooking performance. In addition, the current temperature state of the heating chamber can be calculated based on the usage time and the idle time at each high-frequency output of the high-frequency generation means. Since the high-frequency generator is controlled to supply an appropriate amount of heat excluding the amount of heat naturally applied to the object to be heated according to the temperature of the high-frequency generator, more uniform cooking performance can be provided.

【0011】また請求項3の発明は、食品等の被加熱物
を収納する加熱室と、前記加熱室に高周波出力を供給す
る高周波発生手段と、加熱室の温度を監視する第2の監
視手段とを有し、前記高周波発生手段の高周波出力毎の
使用時間と高周波出力値の変化の相関特性と、第2の監
視手段により測定した加熱室の温度とから、高周波出力
値を補正し、高周波発生手段を制御するものである。
According to a third aspect of the present invention, there is provided a heating chamber for storing an object to be heated such as food, a high-frequency generating means for supplying a high-frequency output to the heating chamber, and a second monitoring means for monitoring the temperature of the heating chamber. And correcting the high-frequency output value from the correlation between the use time of each high-frequency output of the high-frequency generation means and the change in the high-frequency output value and the temperature of the heating chamber measured by the second monitoring means. It controls the generating means.

【0012】そして、高周波発生手段の高周波出力毎の
使用時間に伴う高周波出力値の変化がわかり、高周波出
力値を補正でき、均一の調理性能を提供することができ
る。また、上記第2の監視手段を設けることにより、加
熱室の温度を知ることが出来るので、自然放置で被加熱
物が加熱室から吸収する熱量を正確に読み取ることが可
能となり、加熱開始時での高周波出力値を補正出来るば
かりでなく、加熱中においても常に最適な高周波出力値
を供給するように高周波発生手段を制御することが可能
となり、均一な調理性能の確保および調理性能の向上を
図ることが出来る。
The change in the high-frequency output value with the use time of each high-frequency output of the high-frequency generation means can be understood, and the high-frequency output value can be corrected, and uniform cooking performance can be provided. In addition, by providing the second monitoring means, the temperature of the heating chamber can be known, so that the amount of heat absorbed by the object to be heated from the heating chamber during natural standing can be accurately read. Not only can correct the high-frequency output value, but also can control the high-frequency generation means so as to always supply the optimum high-frequency output value even during heating, thereby ensuring uniform cooking performance and improving cooking performance. I can do it.

【0013】[0013]

【実施例】以下、本発明の実施例について、図面を用い
て説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0014】(実施例1)図1は、本発明の第1の実施
例の高周波加熱装置の構成を表すブロック図である。
尚、従来例と同一符号のものは同一構造を有し、詳細な
説明を省略する。
(Embodiment 1) FIG. 1 is a block diagram showing a configuration of a high-frequency heating apparatus according to a first embodiment of the present invention.
The components having the same reference numerals as those of the conventional example have the same structure, and the detailed description is omitted.

【0015】図1において高周波出力を加熱室4に供給
するマグネトロン(高周波発生手段)2と、制御手段7
を接続し、マイクロコンピュータ8により、制御手段7
を制御し、高周波出力を可変にしている。
In FIG. 1, a magnetron (high-frequency generating means) 2 for supplying a high-frequency output to a heating chamber 4 and a control means 7
And the microcomputer 8 controls the control means 7
To make the high frequency output variable.

【0016】次に動作、作用について説明すると、マグ
ネトロン2から加熱室4に供給される高周波出力毎の使
用時間およびマグネトロン2の休止時間をマイクロコン
ピュータ8またはその他の記憶手段9により記憶する。
その記憶された時間の情報とマグネトロン2の高周波出
力値の変化との相関特性およびマグネトロン2の使用時
間から推測される加熱室4内の温度を基にマイクロコン
ピュータ8にて計算を行い、基本の高周波出力値に対し
て補正を行い、制御手段7に補正した高周波出力値の情
報を与え、マグネトロン2の制御を行う。このことによ
り、一定(均一)の調理性能を提供することが出来る。
Next, the operation and operation will be described. The operating time of each high-frequency output supplied from the magnetron 2 to the heating chamber 4 and the idle time of the magnetron 2 are stored by the microcomputer 8 or other storage means 9.
The microcomputer 8 performs calculations based on the correlation characteristics between the stored time information and the change in the high-frequency output value of the magnetron 2 and the temperature in the heating chamber 4 estimated from the use time of the magnetron 2. The high-frequency output value is corrected, the information of the corrected high-frequency output value is given to the control means 7, and the magnetron 2 is controlled. Thereby, a constant (uniform) cooking performance can be provided.

【0017】また、図2はマグネトロン2を構成する部
品の温度を監視する感受素子等で構成される第1の監視
手段10を設けた高周波加熱装置の構成を表すブロック
図である。
FIG. 2 is a block diagram showing the configuration of a high-frequency heating apparatus provided with first monitoring means 10 including a sensing element for monitoring the temperature of the components constituting the magnetron 2.

【0018】次に動作、作用について説明すると、上記
の相関特性の変わりにマグネトロン2の温度を監視する
感受素子等で構成される第1の監視手段10により得ら
れた温度情報とマグネトロン2の高周波出力値の変化と
の相関特性およびマグネトロン2の使用時間から推測さ
れる加熱室4内の温度を基にマイクロコンピュータ8に
て計算を行い、基本の高周波出力値に対して補正を行
い、制御手段7に補正した高周波出力値の情報を与え、
マグネトロン2の制御を行う。この監視手段10を設け
ることにより、常にマグネトロン2の温度を知ることが
出来る為、温度特性によるばらつきを考慮し高周波出力
の制御が可能となることにより、さらなる安定した調理
性能を確保出来、提供することが可能となる。
Next, the operation and the operation will be described. Instead of the above-mentioned correlation characteristics, the temperature information obtained by the first monitoring means 10 comprising a sensing element for monitoring the temperature of the magnetron 2 and the high frequency of the magnetron 2 are obtained. The microcomputer 8 performs calculations on the basis of the correlation characteristics with the change of the output value and the temperature in the heating chamber 4 estimated from the use time of the magnetron 2 to correct the basic high-frequency output value. 7 to give corrected high frequency output value information,
The magnetron 2 is controlled. By providing the monitoring means 10, the temperature of the magnetron 2 can always be known, and the high-frequency output can be controlled in consideration of the variation due to the temperature characteristics, so that more stable cooking performance can be secured and provided. It becomes possible.

【0019】また、図3は、加熱室4の温度や被加熱物
3の温度を監視する感受素子等で構成される第2の監視
手段11を設けた高周波加熱装置の構成を表すブロック
図である。
FIG. 3 is a block diagram showing the configuration of a high-frequency heating apparatus provided with a second monitoring means 11 comprising a sensing element for monitoring the temperature of the heating chamber 4 and the temperature of the object 3 to be heated. is there.

【0020】次に動作、作用について説明すると、マグ
ネトロン2から加熱室4に供給される高周波出力毎の使
用時間およびマグネトロン2の休止時間をマイクロコン
ピュータ8またはその他の記憶手段9により記憶する。
その記憶された時間情報とマグネトロン2の高周波出力
値の変化との相関特性および加熱室4の温度や被加熱物
3の温度を監視する感受素子等で構成される第2の監視
手段11より得られた温度情報とを基にマイクロコンピ
ュータ8にて計算を行い、基本の高周波出力値に対して
補正を行い、制御手段7に補正した高周波出力値の情報
を与え、マグネトロン2の制御を行う。
Next, the operation and operation will be described. The operating time of each high-frequency output supplied from the magnetron 2 to the heating chamber 4 and the idle time of the magnetron 2 are stored by the microcomputer 8 or other storage means 9.
The correlation characteristic between the stored time information and the change in the high-frequency output value of the magnetron 2 and the temperature of the heating chamber 4 and the temperature of the object to be heated 3 are obtained from the second monitoring means 11 composed of a sensing element or the like. The microcomputer 8 performs calculation based on the obtained temperature information, corrects the basic high-frequency output value, gives the corrected high-frequency output value information to the control means 7, and controls the magnetron 2.

【0021】この第2の監視手段11を設けることによ
り加熱室4の温度や被加熱物3の温度等を基に現時点で
の熱量を知ることが出来、さらには、次に加熱室4内に
供給するべき熱量をマイクロコンピュータ8にて算出す
る事が可能となり、制御手段7を介し、マグネトロン2
より供給する高周波出力を可変にすることが出来る。
The provision of the second monitoring means 11 makes it possible to know the amount of heat at the present time based on the temperature of the heating chamber 4 and the temperature of the object 3 to be heated. The amount of heat to be supplied can be calculated by the microcomputer 8.
The supplied high frequency output can be made variable.

【0022】つまり、加熱開始時での高周波出力の補正
が可能であるばかりでなく、加熱中においても常に最適
な高周波出力が可能であり、均一な調理性能および調理
性能の大幅な向上を図ることが出来る。
That is, not only can the high-frequency output be corrected at the start of heating, but also the optimum high-frequency output can always be obtained even during heating, and uniform cooking performance and significant improvement in cooking performance can be achieved. Can be done.

【0023】上記3つの手段を用いることにより、個々
部品の温度特性や加熱室4の温度のばらつきなどの外的
要因に影響を受けることなく、どんな状況に置いても、
常に一定の調理性能の確保が容易に可能となる。
By using the above three means, regardless of the external characteristics such as the temperature characteristics of the individual parts and the temperature variation of the heating chamber 4, the apparatus can be used in any situation.
It is easy to always ensure a constant cooking performance.

【0024】(実施例2)図4および図5は、本発明の
第2の実施例のフローチャートである。
(Embodiment 2) FIGS. 4 and 5 are flow charts of a second embodiment of the present invention.

【0025】図4においてマイクロコンピュータ8は、
ステップS1にて、マグネトロン2から高周波出力を加
熱室4内に供給しているか否か判断する。高周波出力を
供給していると判断した場合は、ステップS2に移行
し、ステップS2で現在加熱室4内に供給している高周
波出力値と単位時間毎に設定されている重み付けを使用
経過時間として加味していく。ステップS1にて、高周
波出力を加熱室4内に供給していないと判断した場合
は、ステップS3に移行しステップS2の場合と同様に
単位時間毎に設定されている重み付けを休止経過時間と
して加味していく。
In FIG. 4, the microcomputer 8 comprises:
In step S1, it is determined whether or not a high-frequency output is being supplied from the magnetron 2 into the heating chamber 4. If it is determined that the high-frequency output is being supplied, the process proceeds to step S2, and the high-frequency output value currently being supplied into the heating chamber 4 and the weighting set for each unit time are used as the elapsed use time in step S2. I will add it. If it is determined in step S1 that the high-frequency output is not supplied to the inside of the heating chamber 4, the process proceeds to step S3, and the weight set for each unit time is taken into consideration as the pause elapsed time as in step S2. I will do it.

【0026】そして、ステップS2で算出された使用経
過時間とステップS3で算出された休止経過時間とから
現時点の総合的経過時間が算出され、その経過時間より
加熱室内の温度が算出されるのがステップS4である。
The current total elapsed time is calculated from the use elapsed time calculated in step S2 and the pause elapsed time calculated in step S3, and the temperature in the heating chamber is calculated from the elapsed time. This is step S4.

【0027】算出された加熱室4内の温度を基に、図5
においてマイクロコンピュータ8は、ステップS1Aに
て、操作手段5より調理加熱開始の入力信号を待ち、調
理加熱が開始されたと判断すると、ステップS2Aで、
算出された加熱室4内の温度により被加熱物3に供給さ
れる熱量の算出を行う。ステップS3Aでは、使用休止
両方を加味した経過時間におけるマグネトロン2の温度
特性情報を読み出す。そして調理加熱方法設定時に設定
された高周波出力値に対しての、高周波出力毎の使用時
間に伴う高周波出力値の変化の補正計算を行い、マグネ
トロン2によって加えられる熱量を算出し、ステップS
4Aで、ステップS3Aで算出された熱量からステップ
S2Aで算出された熱量を差分し、熱量の差分分だけ調
理時間を短くする。
Based on the calculated temperature inside the heating chamber 4, FIG.
In step S1A, the microcomputer 8 waits for an input signal for starting cooking and heating from the operating means 5 and determines that cooking and heating have been started. In step S2A,
Based on the calculated temperature in the heating chamber 4, the amount of heat supplied to the object to be heated 3 is calculated. In step S3A, the temperature characteristic information of the magnetron 2 at the elapsed time in consideration of both the suspension of use is read. Then, a correction calculation of a change in the high-frequency output value with the use time for each high-frequency output with respect to the high-frequency output value set at the time of setting the cooking heating method is performed, and the amount of heat added by the magnetron 2 is calculated, and step S
In 4A, the calorie calculated in step S2A is subtracted from the calorie calculated in step S3A, and the cooking time is shortened by the calorific value difference.

【0028】補正された高周波出力値および加熱時間を
制御手段7へ伝達し、マグネトロン2の制御を行う。
The corrected high-frequency output value and the heating time are transmitted to the control means 7 to control the magnetron 2.

【0029】また、図2におけるマグネトロン2の温度
を監視する感受素子等で構成される第1の監視手段10
を設けた高周波加熱装置の場合、ステップS3Aの使用
休止両方を加味した経過時間から温度特性による差異を
導く箇所を直接マグネトロン2の温度から導くことが出
来、正確さを増す事が可能となる。
A first monitoring means 10 comprising a sensing element for monitoring the temperature of the magnetron 2 in FIG.
In the case of the high-frequency heating device provided with the above, the location where the difference due to the temperature characteristic is derived from the elapsed time in consideration of both the suspension of use in step S3A can be directly derived from the temperature of the magnetron 2, and the accuracy can be increased.

【0030】また、図3における加熱室4の温度や被加
熱物3の温度を監視する感受素子等で構成される第2の
監視手段11を設けた高周波加熱装置の場合は、ステッ
プS2Aの使用未使用両方を加味した経過時間から得ら
れていた加熱室4の温度や被加熱物3の温度を直接知る
ことが可能となり調理性能の向上となる。
In the case of the high-frequency heating apparatus provided with the second monitoring means 11 composed of a sensing element for monitoring the temperature of the heating chamber 4 and the temperature of the article 3 to be heated in FIG. 3, the step S2A is used. It is possible to directly know the temperature of the heating chamber 4 and the temperature of the object 3 to be heated, which are obtained from the elapsed time in consideration of both the unused state, and the cooking performance is improved.

【0031】また、図2における上記部品温度を監視す
る感受素子等で構成される第1の監視手段10と図3に
おける加熱室4の温度や被加熱物3の温度を監視する感
受素子等で構成される第2の監視手段11とを設けるこ
とにより経過時間を算出せずとも、良好な調理性能を得
ることが可能となり、図4のフローチャート図で説明し
た処理が不要となる。
A first monitoring means 10 comprising a sensing element for monitoring the temperature of the above-mentioned parts in FIG. 2 and a sensing element for monitoring the temperature of the heating chamber 4 and the temperature of the object 3 in FIG. By providing the second monitoring means 11 configured, good cooking performance can be obtained without calculating the elapsed time, and the processing described in the flowchart of FIG. 4 becomes unnecessary.

【0032】なお、このステップは一つの例であり、実
際にはプログラムを簡略化する事も可能で、場合によっ
ては、不要となる箇所も発生する。
Note that this step is just an example, and the program can be simplified in actuality. In some cases, unnecessary portions may occur.

【0033】[0033]

【発明の効果】以上のように、本発明によれば次のよう
な効果が得られる。
As described above, according to the present invention, the following effects can be obtained.

【0034】各高周波出力値における使用時間と高周波
発生手段の休止時間を記録しておき、各時間を用いて現
在の高周波発生手段の温度状況を算出し、算出した結果
を踏まえて、加熱室内の被加熱物に加える熱量から加熱
室内の温度により自然に加わる熱量を除いた熱量を高周
波発生手段から高周波出力にて供給することが出来、一
定の調理性能を提供することが出来るという有利な効果
を有する。
The use time and the pause time of the high-frequency generating means at each high-frequency output value are recorded, and the current temperature condition of the high-frequency generating means is calculated using each time. The amount of heat applied to the object to be heated, excluding the amount of heat naturally applied by the temperature in the heating chamber, can be supplied from the high-frequency generating means with high-frequency output, and the advantageous effect that a constant cooking performance can be provided. Have.

【0035】また、高周波発生手段の高周波出力毎の使
用時間に伴う高周波出力値の変化がわかり、高周波出力
値を補正でき、さらに均一の調理性能を提供することが
できる。
Further, the change of the high-frequency output value with the use time of each high-frequency output of the high-frequency generation means can be understood, the high-frequency output value can be corrected, and more uniform cooking performance can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1の実施例である高周波加熱装置の
構成を表すブロック図
FIG. 1 is a block diagram illustrating a configuration of a high-frequency heating device according to a first embodiment of the present invention.

【図2】同高周波加熱装置に第1の監視手段を設けた構
成を表すブロック図
FIG. 2 is a block diagram illustrating a configuration in which a first monitoring unit is provided in the high-frequency heating device.

【図3】同高周波加熱装置に第2の監視手段を設けた構
成を表すブロック図
FIG. 3 is a block diagram illustrating a configuration in which a second monitoring unit is provided in the high-frequency heating device.

【図4】本発明の第2の実施例における高周波加熱装置
のフローチャート
FIG. 4 is a flowchart of a high-frequency heating device according to a second embodiment of the present invention.

【図5】同高周波加熱装置の他のフローチャートFIG. 5 is another flowchart of the high-frequency heating device.

【図6】従来の高周波加熱装置の外観図FIG. 6 is an external view of a conventional high-frequency heating device.

【符号の説明】[Explanation of symbols]

2 マグネトロン(高周波発生手段) 3 被加熱物 4 加熱室 10 第1の監視手段 11 第2の監視手段 2 magnetron (high frequency generating means) 3 object to be heated 4 heating chamber 10 first monitoring means 11 second monitoring means

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】食品等の被加熱物を収納する加熱室と、前
記加熱室に高周波出力を供給する高周波発生手段とを有
し、前記高周波発生手段の高周波出力毎の使用時間と高
周波出力値の変化の相関特性と、高周波発生手段の使用
時間により算出した加熱室の温度とから、高周波出力値
を補正し、高周波発生手段を制御する高周波加熱装置。
1. A heating chamber for storing an object to be heated such as food, and high-frequency generating means for supplying a high-frequency output to the heating chamber, wherein a usage time and a high-frequency output value of each high-frequency output of the high-frequency generating means are provided. A high-frequency heating device that corrects a high-frequency output value and controls the high-frequency generation means based on the correlation characteristic of the change in the high-frequency generation means and the temperature of the heating chamber calculated by the use time of the high-frequency generation means.
【請求項2】食品等の被加熱物を収納する加熱室と、前
記加熱室に高周波出力を供給する高周波発生手段と、前
記高周波発生手段の温度を監視する第1の監視手段とを
有し、前記高周波発生手段の第1の監視手段に基づく温
度と高周波出力値の変化の相関特性と、高周波発生手段
の使用時間により算出した加熱室の温度とから、高周波
出力値を補正し、高周波発生手段を制御する高周波加熱
装置。
2. A heating chamber for storing an object to be heated such as food, a high-frequency generator for supplying a high-frequency output to the heating chamber, and a first monitor for monitoring the temperature of the high-frequency generator. Correcting the high-frequency output value from the correlation characteristic of the change in the high-frequency output value with the temperature based on the first monitoring means of the high-frequency generation means and the temperature of the heating chamber calculated based on the usage time of the high-frequency generation means; High frequency heating device that controls the means.
【請求項3】食品等の被加熱物を収納する加熱室と、前
記加熱室に高周波出力を供給する高周波発生手段と、加
熱室の温度を監視する第2の監視手段とを有し、前記高
周波発生手段の高周波出力毎の使用時間と高周波出力値
の変化の相関特性と、第2の監視手段により測定した加
熱室の温度とから、高周波出力値を補正し、高周波発生
手段を制御する高周波加熱装置。
3. A heating chamber for storing an object to be heated such as food, a high-frequency generating means for supplying a high-frequency output to the heating chamber, and a second monitoring means for monitoring a temperature of the heating chamber. A high-frequency wave for correcting the high-frequency output value and controlling the high-frequency generation means from the correlation characteristic between the use time of each high-frequency output means and the change in the high-frequency output value and the temperature of the heating chamber measured by the second monitoring means. Heating equipment.
JP2000012551A 2000-01-21 2000-01-21 High frequency heating device Pending JP2001203073A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000012551A JP2001203073A (en) 2000-01-21 2000-01-21 High frequency heating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000012551A JP2001203073A (en) 2000-01-21 2000-01-21 High frequency heating device

Publications (1)

Publication Number Publication Date
JP2001203073A true JP2001203073A (en) 2001-07-27

Family

ID=18540256

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000012551A Pending JP2001203073A (en) 2000-01-21 2000-01-21 High frequency heating device

Country Status (1)

Country Link
JP (1) JP2001203073A (en)

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