JP2001158986A - Apparatus and method for treating belt-like metal sheet - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an apparatus and a method for treating a belt-like metal sheet by which the belt-like metal sheet for color CRT such as a shadow mask and an aperture grille and the belt-like metal sheet for semi-conductor device such as a lead frame are uniformly treated while reducing the occupied space of the apparatus. SOLUTION: The cleaning solution L is fed from a nozzle part 130 to a treatment surface S of the shadow mask W to be guided and carried by rollers 121, 122 and 123, and a pair of solution guide plates 141 and 142 having a guide surface and solution guide plate 143 and 144 are provided at the position across the treatment surface S. The guide surfaces 141a, 142a, 143a and 144a of the solution guide plates 141, 142, 143 and 144 are provided facing and close to the treatment surface S to guide the cleaning solution L from the nozzle part 130 in the direction along the treatment surface S.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a processing apparatus and a processing method for a band-shaped metal sheet such as a band-shaped metal sheet for a color cathode ray tube such as a shadow mask and an aperture grille, or a band-shaped metal sheet for a semiconductor element such as a lead frame.

[0002]

2. Description of the Related Art For example, in general, a color cathode ray tube is
An electron gun that emits three electron beams, a phosphor that receives the electron beam emitted from the electron gun and emits light in three primary colors, and is disposed between the phosphor and the electron gun. A plurality of round or long through holes (hereinafter referred to as "holes") for selectively passing only the electron beam in the required direction to guide the phosphors of the three primary colors and blocking the electron beam in unnecessary directions. , Referred to as through-holes)
Alternatively, it is configured to include an aperture grill in which a plurality of elongated holes are formed. The shadow mask and the aperture grill, which have a role of selectively guiding the electron beam to the phosphor, are generally called a color selection mechanism, and are made of a thin metal plate having the plurality of through holes.

Here, for example, taking the shadow mask of these color selection mechanisms as an example, in the process of manufacturing this shadow mask, for example, an Invar type alloy containing 36% of nickel, a low carbon aluminum killed steel, or the like. Various processing described below are sequentially performed on a band-shaped thin metal plate (hereinafter, referred to as a shadow mask material) made of to form a shadow mask that can be incorporated into a color CRT.

That is, first, a band-shaped shadow mask material manufactured by using a predetermined metal material is wound around a shaft to form a coil, and then, the coil-shaped shadow mask material is sequentially unwound and longitudinally wound. By carrying out a predetermined manufacturing process using the photolithographic etching method described below while conveying along the inside, an inner region (hereinafter, referred to as a product portion) of a substantially rectangular range (hereinafter, referred to as a product portion) required as a product of the shadow mask material is provided. The plurality of through holes are formed in the through hole formation region).

Here, in the manufacturing process of the shadow mask by the photolithographic etching method, first, in order to adjust the surface condition of the shadow mask material, the shadow mask material is subjected to a degreasing treatment and a smoothing process (a smoothing process). Next, a resist solution is applied to each surface (both surfaces) of the shadow mask material to form a resist film having a thickness of about several μm (coating process). A predetermined through-hole pattern is baked on the film (baking step). Subsequently, the resist film on the surface (both surfaces) of the shadow mask material is subjected to a development process, and a portion corresponding to the hole pattern of the resist film is removed (development step), and the resist film remains on the surface (both surfaces) of the shadow mask material. The resist film is hardened (hardening step). Next, an unnecessary resist film remaining on the surface (both surfaces) of the shadow mask material where the resist film is to be removed is removed and exposed (surface exposure step). An etching solution composed of, for example, an aqueous solution of ferric chloride is sprayed on the surface (both surfaces) of the shadow mask material to etch both surfaces of the shadow mask material to form a plurality of through holes in the shadow mask material (etching step). Thereafter, the resist film and the like remaining on the shadow mask material surface (both surfaces) are subjected to a peeling treatment (a film removing step). After that, the surface (both surfaces) of the shadow mask material is subjected to rust prevention treatment (rust prevention process), and a range including the above product portion is cut from the band-shaped shadow mask material to form a plurality of single plate-shaped shadow masks. Finally, the product portion of the single-plate-shaped shadow mask material is peeled off (stripping step) to complete the shadow mask as a product. Further, in necessary portions of the above steps, a cleaning process is appropriately performed on the shadow mask material.

The above-mentioned etching step includes a one-step etching step in which an etching solution is sprayed on both sides of the shadow mask material to form a plurality of through holes in the shadow mask material at once, and first, etching is performed on both sides of the shadow mask material. The liquid is sprayed to finish the processing before the through-hole is formed, to form a dent of a predetermined depth on both surfaces thereof, and then to form a resin (backing resin) on one surface of the shadow mask material. Is applied to close the recess (backing treatment), and then an etching solution is sprayed from a surface opposite to one surface of the shadow mask material,
There is a two-step etching step of forming a plurality of through holes in the shadow mask material.

Here, in some of the above-mentioned steps, further using the processing liquid, each processing is performed by immersing the shadow mask material in the processing liquid stored in the tank. ing. For example, in the surface conditioning step, a degreasing process and a surface conditioning process are performed by immersing a shadow mask material in the degreasing solution and the surface conditioning solution in the tank, and the developing solution in the tank is shadowed in the developing step. The mask material is immersed for development, and in the hardening step, the shadow mask material is immersed in a hardening solution in a tank to perform hardening processing. The surface treatment is performed by immersing the shadow mask material in a surface liquid such as oxalic acid, aqueous hydrogen peroxide, or sulfuric acid in the tank, and in the film removing step, The shadow mask material is immersed to perform the film removal treatment, and in the rust prevention step, the shadow mask material is immersed in a rust prevention liquid in a tank to perform the rust prevention treatment. Further, in each of the above steps, in order to wash away dust and treatment liquid remaining on the surface of the shadow mask material, the shadow mask material is appropriately immersed in a cleaning solution in a tank to perform a cleaning process. .

Here, in each of these steps, the immersion processing in which the shadow mask material is immersed in a predetermined processing solution to perform the predetermined processing will be described in more detail with reference to FIG. Degreasing treatment, surface conditioning treatment, development treatment as described above,
In a hardening treatment, a surface treatment, a peeling treatment, a rust prevention treatment, a cleaning treatment, or the like, a treatment liquid tank 11 as shown in FIG.
Each immersion process is performed by the processing unit 10 provided with. The processing liquid L is stored in the processing liquid tank 11, and the liquid level La of the processing liquid L is lower than the upper end 11 b of the side wall 11 a of the processing liquid tank 11.
Then, the band-shaped shadow mask material W is wound up by a winding device (not shown) from left to right in FIG. 7 and is driven by three substantially cylindrical rollers 12 (each conveyed). (Referred to as 12a, 12b, and 12c from the upstream side in the direction), and is transported while being guided in the longitudinal direction F (transport direction) of the shadow mask material W. Roller 1
2a and 12c are upper end portions 11 of the side wall 11a, respectively.
b, the roller 12b is disposed above the processing liquid tank 1
1, it is disposed below the liquid level La in a state of being immersed in the processing liquid L.

With these configurations, the processing unit 10 conveys the shadow mask material W carried in from another processing unit or the like (not shown) on the upstream side from the left to the right in FIG. The shadow mask material W is immersed in the processing liquid L in the processing liquid tank 11 to perform a predetermined processing on the processing surface S (both sides), and further carried out to another processing unit or the like (not shown) downstream thereof. You can do it.

[0010]

However, in the above-described conventional shadow mask material processing section 10, the portions A1 and A2 of the shadow mask material W from the liquid surface La to the roller 12c above the liquid surface La. Hereinafter, the part A above the liquid surface
1 and A2), the substantial processing with the processing liquid L is not performed. Therefore, in order to secure the processing time for the shadow mask material W, the portions B1 and B1 of the shadow mask material W immersed in the processing liquid L below the liquid level La.
B2 (hereinafter, referred to as liquid lower portions B1 and B2) had to be long. That is, it is necessary to make the processing liquid tank 11 larger (deeper) by that amount, and there is a problem that the space occupied by the apparatus becomes larger.

Further, of the above-mentioned liquid surface portions A1 and A2,
In particular, in the portion A2 on the side pulled up from the processing liquid L, the processing surface S (both surfaces) pulled up from the processing liquid L and exposed to the air is in a state where the droplets of the processing liquid L are partially adhered. Become. Therefore, there is a problem that the processing surface S is partially processed by the droplets of the processing liquid L, and the processing becomes uneven. For example, in a case where the shadow mask material W has been processed with another processing liquid in another processing section on the upstream side of the processing section 10, especially the processing liquid among the above-mentioned liquid surface portions A1 and A2. Also in the part A1 drawn into L, since the droplets of the another processing liquid partially adhere to the processing surface S, the processing becomes uneven due to the droplets of the another processing liquid. There were also problems.

Here, if the above-mentioned liquid surface portions A1 and A2 are completely eliminated, the above-mentioned problem can be solved. However, the above-liquid surface portions A1 and A2 cannot be eliminated for the following reasons. . First, another processing liquid is brought into the processing liquid tank 11 from the processing section using another processing liquid on the upstream side, or the processing liquid L is transferred from the processing liquid tank 11a to another processing section on the downstream side.
Rollers 12a and 12c are connected to the upper end 11b in order to prevent the upper end 11b from being brought in or to prevent physical interference between the shadow mask material W and the upper end 11b.
Must be placed above the height of the Also,
When the processing liquid L is fully stored in the processing liquid tank 11, the processing liquid L overflows from the processing liquid tank 11, and in order to prevent this, the height of the liquid surface La is set to the above-mentioned value. It must be lower than the height of the upper end 11c with a margin. Therefore, the rollers 12a, 1
2c and the liquid level La are separated from each other, and as a result, the above-mentioned liquid surface portions A1 and A2 are generated.

Accordingly, an object of the present invention is to solve the above-mentioned technical problems and to reduce the space occupied by the device and to reduce the occupied space of the device, such as a band-shaped thin metal plate for a color cathode-ray tube such as a shadow mask or an aperture grille, or a semiconductor element such as a lead frame. It is an object of the present invention to provide a processing apparatus and a processing method for a strip-shaped metal sheet that can uniformly perform processing on a strip-shaped metal sheet for use.

[0014]

According to the first aspect of the present invention, there is provided a liquid storage tank for storing a processing liquid for processing a strip-shaped metal sheet, and a liquid storage tank for storing the processing liquid. As the band-shaped metal sheet passes through the liquid surface of the processing liquid stored in, the conveying means capable of conveying the band-shaped metal sheet along its longitudinal direction, and of the band-shaped metal sheet conveyed by the conveying means And a liquid supply nozzle for supplying a processing liquid equivalent to the processing liquid stored in the liquid storage tank with respect to the processing surface of the strip-shaped metal sheet located above the liquid level of the processing liquid. A strip-shaped metal sheet processing apparatus characterized by the above-mentioned.

According to the present invention, the strip-shaped metal sheet is transported by the transport means so as to pass through the liquid surface (substantially horizontal surface) of the processing liquid. That is, the strip-shaped metal sheet is transported in a direction in which the strip-shaped metal sheet is pulled up from or pulled into the processing liquid. , A vertical plane) or a plane inclined with respect to a horizontal plane (hereinafter, referred to as an inclined plane). Then, a processing liquid equivalent to the processing liquid in the liquid storage tank is supplied from the liquid supply nozzle to the processing surface of the strip-shaped metal sheet located above the liquid level.

According to this configuration, in addition to the immersion processing of the strip-shaped metal sheet in the processing liquid, the processing liquid from the liquid supply nozzle is also applied to the processing surface of the strip-shaped metal sheet located above the liquid level. Is performed. Therefore, the processing time for the processing surface can be secured, and the length of the strip-shaped metal sheet immersed in the processing liquid can be shortened. Strictly speaking, at a certain moment, the length of the portion of the strip-shaped metal sheet immersed in the processing liquid is at least half the length of the processing surface of the strip-shaped metal sheet to which the processing liquid is supplied above the liquid level. Can be shortened. Therefore, the liquid storage tank can be made smaller (shallower) by that amount, and the space occupied by the apparatus can be reduced.

According to this configuration, the processing surface of the strip-shaped metal sheet immediately after being pulled up from the liquid surface of the processing liquid is
If the processing liquid is supplied from the liquid supply nozzle, the liquid drops of the processing liquid taken out of the liquid storage tank do not partially adhere to the processing surface of the strip-shaped metal sheet. Therefore, the processing surface of the strip-shaped metal sheet is uniformly processed by the processing liquid.
Further, in another processing section on the upstream side of the liquid storage tank,
Even when the strip-shaped metal sheet is being treated with another treatment liquid, the treatment liquid is supplied from the liquid supply nozzle to the treatment surface of the strip-shaped metal sheet immediately before being drawn into the treatment liquid level. In this case, droplets of another processing liquid adhering to the processing surface of the strip-shaped metal sheet can be washed away. Therefore, it is possible to prevent the processing surface of the strip-shaped metal sheet from being unevenly processed by another processing liquid. Therefore, in any case, the treatment of the strip-shaped metal sheet can be performed uniformly.

Further, since the processing surface of the strip-shaped metal sheet is not a horizontal plane but a vertical surface or an inclined surface, most of the processing liquid supplied from the liquid supply nozzle is along the processing surface of the strip-shaped metal sheet. Flow down toward the liquid surface of the processing liquid in the liquid storage tank. For this reason, as compared with the case of the immersion processing, the relative speed of the processing liquid to the processing surface is increased by the amount of the processing liquid flowing down, so that the processing progress speed on the processing surface is increased. Furthermore, since the liquid storage tank can be made smaller by that amount, the space occupied by the apparatus can be further reduced. Note that it is more preferable to increase the flow rate and flow rate of the processing liquid supplied from the liquid supply nozzle, because the processing speed on the processing surface increases accordingly.

Further, the processing surface of the strip-shaped metal sheet is positioned above the liquid surface of the processing liquid in the liquid storage tank in a state of being vertical or inclined. Therefore, most of the processing liquid supplied to the processing surface flows down to the liquid surface in the liquid storage tank along the processing surface of the strip-shaped metal sheet, and is also supplied to the processing surface and spilled from the processing surface. A part of the processing liquid also flows down (drops) on the liquid surface in the liquid storage tank. Therefore, there is no possibility that the processing liquid supplied to the processing surface leaks out of the liquid storage tank. Further, since a processing liquid equivalent to the processing liquid stored in the liquid storage tank is supplied to the processing surface, even if the processing liquid flows down into the liquid storage tank, the processing liquid in the liquid storage tank is There is no significant change in properties.

Here, "equivalent processing liquid" refers to a processing liquid having, for example, substantially the same components, concentrations, specific gravities, or temperatures, and even if mixed with the processing liquid in the liquid storage tank. Any liquid that does not cause a problem in the processing of the strip-shaped metal sheet may be used. That is, even if at least one of the components, the concentration, the specific gravity, the temperature, and the like is significantly different, it is sufficient that the difference does not affect the treatment of the strip-shaped metal sheet. Then, the processing liquid supplied from the liquid supply nozzle may flow down to and be stored in the liquid storage tank, be collected, sent out to the liquid supply nozzle again, and reused. Also, after flowing down and stored in the liquid storage tank, it is discarded and newly
A processing liquid equivalent to this processing liquid may be sent to the liquid supply nozzle and supplied to the processing surface of the strip-shaped metal sheet.

In the present invention including the first and fifth aspects, the "liquid supply nozzle" is provided inside the liquid guide member and directly discharges the processing liquid toward the processing surface of the strip-shaped metal sheet. Thing, or one that discharges the processing liquid toward the liquid guiding surface disposed at a position away from the liquid guiding member, or one that directly discharges the processing liquid toward the processing surface of the strip-shaped metal sheet, Any of these may be used.

According to a second aspect of the present invention, in the apparatus for processing a strip-shaped metal sheet according to the first aspect, a liquid guide for guiding the processing liquid supplied from the liquid supply nozzle in a direction along the processing surface of the strip-shaped metal sheet. An apparatus for treating a strip-shaped metal sheet, the surface further comprising a liquid guide member formed at a position close to a treatment surface of the strip-shaped metal sheet.

According to the present invention, there is further provided a liquid guide member having a liquid guide surface, and the liquid guide surface is provided close to the processing surface of the strip-shaped metal sheet, and receives the processing liquid from the liquid supply nozzle. The guide is adapted to be guided in a direction along the processing surface of the strip-shaped metal sheet. For this reason, the processing liquid supplied in a direction different from the processing surface of the strip-shaped sheet metal is guided in a direction along the processing surface, or the processing liquid supplied to the processing surface of the strip-shaped metal sheet is again transferred to the processing surface. It can be guided along the direction. Therefore, it is possible to efficiently supply the processing liquid from the liquid supply nozzle to the processing surface of the strip-shaped thin metal plate without waste, and thus it is possible to reduce the consumption of the processing liquid from the liquid supply nozzle.

The processing liquid supplied from the liquid supply nozzle spreads in the liquid guide surface in the direction along the processing surface of the strip-shaped metal sheet, and the contact area (contact time) between the processing liquid and the processing surface.
Therefore, the processing of the processing surface with the processing liquid can be made uniform over a wide range.

Here, in the present invention including the second and fifth aspects, the "liquid guide surface" is a substantially parallel plane close to the processing surface of the strip-shaped metal sheet as described in the eighth aspect. That is, a plane facing the processing surface with a predetermined gap (hereinafter, referred to as an opposing plane) may be used, or a plane provided so as to gradually approach the processing surface of the strip-shaped metal sheet (hereinafter, asymptotically). A flat surface) or a curved surface (hereinafter, referred to as an asymptotic curved surface). Further, the “liquid guide member” may be a member having a shape having the opposed plane as the liquid guide surface, a member having a shape having the asymptotic plane as the liquid guide surface, or the asymptotic curved surface as the liquid guide surface. May be a member having a shape. in short,
The liquid guide surface guides the processing liquid supplied from the liquid supply nozzle in a direction along the processing surface regardless of before or after the processing liquid is supplied to the processing surface of the band-shaped metal sheet. What is necessary is just to ensure that the processing surface is processed.

The invention according to claim 3 is the invention according to claim 1 or 2
Wherein the liquid guide surface of the liquid guide member is provided so that its lower end is immersed in the processing liquid in the liquid storage tank. This is a thin metal plate processing device.

According to the present invention, the lower end of the liquid guide surface of the liquid guide member is in the processing liquid below the liquid level of the processing liquid.
For this reason, the processing liquid guided and flowing down on the liquid guide surface and the processing liquid in the liquid storage tank are continuous (the liquids are connected to each other). Therefore, between the portion of the strip-shaped metal sheet immersed in the processing liquid and the portion of the strip-shaped metal sheet to which the processing liquid is supplied from the liquid supply nozzle, the processing surface of the strip-shaped metal sheet comes into contact with air. And will be processed continuously. Therefore, since the strip-shaped metal sheet is processed with the processing liquid without being exposed to the air, the droplets do not partially adhere to the processing surface of the strip-shaped metal sheet, and the processing on the processing surface of the strip-shaped metal sheet can be performed. Further uniform.

The invention according to claim 4 is the invention according to claims 1 to 3
In the apparatus for processing a strip-shaped metal sheet according to any one of
The liquid storage tank and the liquid supply nozzle are connected to each other, and a liquid pipe through which the processing liquid can flow, and a processing liquid interposed at an intermediate portion of the liquid pipe and collected in the liquid storage tank are collected. And a liquid circulating pump for sending the liquid to the liquid supply nozzle.

According to the present invention, the processing liquid from the liquid supply nozzle is supplied to the processing surface of the strip-shaped metal sheet, flows down into the liquid storage tank, is recovered by the liquid circulation pump, and flows through the liquid pipe. At the same time, the liquid is sent out to the liquid supply nozzle and is used again as a processing liquid from the liquid supply nozzle. For this reason, the processing liquid is not discarded unnecessarily, and the consumption of the processing liquid can be suppressed. Further, it becomes easy to supply a processing liquid equivalent to the processing liquid in the liquid storage tank from the liquid supply nozzle, and it is possible to suppress a change in the property of the processing liquid in the liquid storage tank.

According to a fifth aspect of the present invention, a conveying means capable of conveying a strip-shaped metal sheet along its longitudinal direction, and a processing liquid is supplied to a processing surface of the strip-shaped metal sheet conveyed by the conveying means. And a liquid guide surface for guiding the processing liquid supplied from the liquid supply nozzle in a direction along the processing surface of the strip-shaped metal sheet, the liquid being formed at a position close to the processing surface of the strip-shaped metal sheet. And a guide member.

According to the present invention, the processing liquid is supplied from the liquid supply nozzle to the processing surface of the strip-shaped metal sheet conveyed by the conveying means, and the processing liquid is supplied near the processing surface of the strip-shaped metal sheet. A liquid guide member having a guide surface is provided. The liquid guide surface of the liquid guide member is provided near the processing surface of the strip-shaped metal sheet, and guides the processing liquid from the liquid supply nozzle in a direction along the processing surface of the strip-shaped metal sheet. I have.

Therefore, similarly to the second aspect of the present invention, the processing liquid supplied in a direction different from the processing surface of the strip-shaped metal sheet is guided in a direction along the processing surface, or the processing surface of the strip-shaped metal sheet is processed. The processing liquid supplied to the processing surface can be guided again in the direction along the processing surface. Therefore, it is possible to efficiently supply the processing liquid from the liquid supply nozzle to the processing surface of the strip-shaped metal sheet without waste, and
The consumption of the processing liquid from the liquid supply nozzle can be suppressed low. Also, the processing liquid supplied from the liquid supply nozzle is
The liquid guide surface spreads in the direction along the processing surface of the strip-shaped metal sheet, and the contact area (contact time) between the processing liquid and the processing surface increases, so that the processing of the processing surface by the processing liquid is made uniform over a wide range. Can be.

When the liquid guide surface is a vertical surface or an inclined surface, the treatment liquid flows down on the liquid guide surface. The processing speed of the processing surface with the processing liquid can be improved as compared with a case where the processing surface is horizontal.

On the other hand, when the liquid guide surface is a horizontal surface, the processing liquid temporarily stays on the liquid guide surface to form a liquid film of the processing liquid on the liquid guide surface. Then, the liquid film of the processing liquid moves only at such a speed as to be continuously pushed out by the processing liquid supplied from the liquid supply nozzle. For this reason, while it is possible to perform almost the same treatment as the immersion treatment, a large treatment liquid tank is not required as compared with the treatment such as the conventional immersion treatment, and a constant property that is always fresh to the treatment surface is provided. (If the processing liquid is stored for a long period of time, the processing liquid will age and its properties will change). Therefore, the processing stability of the processing surface of the strip-shaped metal sheet can be improved while keeping the space occupied by the apparatus small.

According to a sixth aspect of the present invention, in the apparatus for processing a strip-shaped metal sheet according to the fifth aspect, the processing surface of the strip-shaped metal sheet crosses a horizontal plane. Processing device.

According to the present invention, the processing surface of the strip-shaped metal sheet is a surface intersecting the horizontal plane, that is, a vertical plane or an inclined plane. Therefore, most of the processing liquid supplied to the processing surface of the strip-shaped metal sheet flows down on the processing surface. For this reason, the processing liquid guided by the liquid guide surface has a relative speed to the processing surface. The processing speed on the processing side can be improved.

The invention according to claim 7 is the invention according to claim 5 or 6.
In the apparatus for processing a strip-shaped metal sheet according to the above, a liquid recovery tank that recovers the processing liquid supplied from the liquid supply nozzle and guided by the liquid guide member to flow down, and the liquid recovery tank and the liquid supply nozzle A liquid pipe through which the processing liquid can flow, and a liquid circulation pump interposed at an intermediate portion of the liquid pipe and for sending the processing liquid recovered in the liquid recovery tank to the liquid supply nozzle. It is a processing apparatus for a strip-shaped metal sheet, further provided.

According to the present invention, the processing liquid from the liquid supply nozzle is supplied to the processing surface of the strip-shaped metal sheet, flows down into the liquid storage and recovery tank, is recovered by the liquid circulation pump, and flows through the liquid pipe. It circulates and is sent out to the liquid supply nozzle, and is used again as a processing liquid from the liquid supply nozzle. For this reason, the processing liquid is not discarded unnecessarily, and the consumption of the processing liquid can be suppressed.

The invention according to claim 8 is the invention according to claims 2 to 7
In the apparatus for processing a strip-shaped metal sheet according to any one of
The liquid guide surface of the liquid guide member is a substantially parallel plane close to the processing surface of the strip-shaped metal sheet, and is a processing apparatus for a strip-shaped metal sheet.

According to the present invention, the liquid guide surface of the liquid guide member is a plane (opposing plane) opposed to the processing surface of the strip-shaped sheet metal with a predetermined gap. For this reason, a portion having a predetermined gap (hereinafter referred to as a gap portion) is formed between the processing surface of the strip-shaped sheet metal and the opposing plane (liquid guide surface), and is supplied from the liquid supply nozzle to the opposing plane. The guided processing liquid fills the gap. As a result, the processing liquid comes into uniform contact over a wide range along the processing surface of the strip-shaped metal sheet facing the opposing plane, and therefore, the contact area (contact time) between the processing liquid and the processing surface increases. Therefore, the processing of the processing surface with the processing liquid can be made uniform.

Strictly speaking, the predetermined gap is such a gap that the gap can be filled with the processing liquid, and the liquid guide surface and the processing surface of the strip-shaped metal sheet have a liquid film of the processing liquid. Any gap may be used as long as the gap is continuous through the gap. Further, even when the liquid guide surface and the processing surface of the strip-shaped metal sheet are in contact with each other when the processing liquid is not supplied, if the processing liquid is supplied, the liquid guide surface and the processing surface of the strip-shaped metal sheet may be in contact with each other. A liquid film of the processing liquid is formed therebetween, and a gap is formed, and a predetermined gap is formed between them. That is, when the liquid film of the processing liquid exists at least in the gap, the processing surface of the strip-shaped metal sheet does not come into contact with the liquid guide surface, and the processing surface is not damaged.

According to a ninth aspect of the present invention, in the apparatus for processing a strip-shaped metal sheet according to the eighth aspect, both the processing surface of the strip-shaped metal sheet and the liquid guide surface of the liquid guide member intersect with a vertical plane. And a liquid guiding member provided at least one below the processing surface of the strip-shaped metal sheet.

According to the present invention, the processing surface and the substantially flat liquid guide surface of the strip-shaped sheet metal are substantially parallel to each other and both intersect with the vertical plane, ie, the processing surface and the liquid guide surface are inclined surfaces. Or it is a horizontal plane. And at least one liquid guide member is provided below the processing surface. For this reason, the liquid guide surface near the processing surface is directed upward, so that the processing liquid is guided on the upper surface (upper side) of the liquid guide surface and the strip-shaped metal sheet above the liquid guide surface. Is processed (the lower surface). Therefore, the processing liquid spreads over a wide area on the upper surface of the liquid guide surface, and the processing surface can be uniformly processed over a wide area.

According to a tenth aspect of the present invention, in the apparatus for processing a strip-shaped metal sheet according to the eighth aspect, both the processing surface of the strip-shaped metal sheet and the liquid guide surface of the liquid guide member intersect with a horizontal plane. A liquid guide surface of the liquid guide member, wherein a groove is formed in a direction intersecting a direction in which the liquid guide surface is inclined.

According to the present invention, the processing surface and the substantially flat liquid guide surface of the strip-shaped metal sheet are substantially parallel to each other and both intersect with the horizontal plane, that is, the processing surface and the liquid guide surface are inclined surfaces or It is vertical and inclined in the direction of inclination or in the vertical direction. A groove is formed in the liquid guide surface in a direction intersecting the direction in which the liquid guide surface is inclined, that is, in a direction oblique to or perpendicular to the direction in which the liquid guide surface is inclined. For this reason,
When the processing liquid flows down on the liquid guide surface, the processing liquid flows in a direction different from the direction in which the liquid guide surface is inclined by being guided by this groove. Can be. Therefore, even if the processing liquid supplied from the liquid supply nozzle is non-uniform, the flow-down range of the processing liquid is expanded and uniformized by the grooves, so that the processing of the processing surface with the processing liquid is uniform. Can be

According to an eleventh aspect of the present invention, in the strip metal sheet processing apparatus according to the eighth aspect, the processing surface of the strip metal sheet and the liquid guide surface of the liquid guide member both intersect with a horizontal plane. A liquid guide surface of the liquid guide member, wherein a groove is formed in a direction in which the liquid guide surface is inclined.

According to the present invention, the processing surface and the substantially flat liquid guide surface of the strip-shaped sheet metal are substantially parallel to each other and both intersect with the horizontal plane, ie, the processing surface and the liquid guide surface are inclined or inclined. It is vertical and inclined in the direction of inclination or in the vertical direction. A groove is formed in the liquid guide surface in a direction in which the liquid guide surface is inclined. For this reason, when the processing liquid flows down on the liquid guide surface, the processing liquid flows along the direction in which the liquid guide surface is inclined by being guided by the groove, so that the flow direction of the processing liquid on the liquid guide surface is unified. can do. Therefore, since the amount of the processing liquid spilling from the liquid guiding surface in a direction different from the direction in which the liquid guiding surface is inclined is reduced, the processing liquid supply efficiency can be improved, and the consumption of the processing liquid can be reduced. .

According to a twelfth aspect of the present invention, in the strip metal sheet processing apparatus according to any one of the second to eleventh aspects, the liquid guide member is provided in a pair at a position sandwiching the strip metal sheet. The liquid guide surfaces of the pair of liquid guide members are provided so as to face each other with the band-shaped metal sheet interposed therebetween.

According to the present invention, a pair (two) of liquid guide members are provided at positions sandwiching the band-shaped metal sheet, and these liquid guide surfaces are provided so as to face each other with the band-shaped metal sheet interposed therebetween. I have. That is, the liquid guide surfaces of each of the pair of liquid guide members are provided so as to face the processing surfaces of both surfaces of the strip-shaped metal sheet. For this reason, the processing surfaces on both surfaces of the strip-shaped metal sheet can be reliably processed.

According to a thirteenth aspect of the present invention, in the apparatus for treating a strip-shaped metal sheet according to any one of the second to twelfth aspects, the liquid guide surface of the liquid guide member is located within a range covering the width of the strip-shaped metal sheet. An apparatus for processing a strip-shaped metal sheet, wherein the apparatus is provided.

According to the present invention, the liquid guide surface is provided in a range covering the width of the band-shaped metal sheet. In other words,
The width of the liquid guide surface in a direction perpendicular to the longitudinal direction (transport direction) of the band-shaped metal sheet has a length equal to or greater than the width of the band-shaped metal sheet. For this reason, the processing liquid guided to the liquid guide surface is spread over a range that covers the width of the strip-shaped metal sheet, so that the processing liquid can be brought into contact with the entire processing surface of the strip-shaped metal sheet, and the strip-shaped metal sheet can be contacted. The entire area of the processing surface can be reliably processed.

According to a fourteenth aspect of the present invention, in the apparatus for processing a strip-shaped metal sheet according to any one of the first to thirteenth aspects, the strip-shaped metal sheet has a plurality of through holes penetrating the strip-shaped metal sheet. This is a processing apparatus for a strip-shaped metal sheet.

According to the present invention, a plurality of through holes, that is, through holes for passing an electron beam, are formed in the strip-shaped thin metal plate. In other words, for example, the processing apparatus of the present invention is used in a step after an etching step of etching both sides of a strip-shaped metal sheet to form a plurality of through holes in the strip-shaped metal sheet, as described in the section of the related art. Is something that can be done. For example, the present invention is applied to a processing unit including a cleaning processing unit used for a cleaning process after an etching process, a film removing unit used for a film removing process, or a rust preventing unit used for a rust preventing process. . In a processing apparatus including these processing units, since a plurality of through holes are formed in the band-shaped metal sheet, the processing liquid can freely pass between both surfaces of the band-shaped metal sheet.

For this reason, even if the liquid supply nozzle is disposed only on one side of the strip-shaped metal sheet, and supplies the processing liquid directly to only one side of the strip-shaped metal sheet, the liquid supply nozzle may not be provided. In addition to the processing surface on one side, the processing liquid can be supplied to the processing surface on the other side. Further, when the liquid guide surface of the liquid guide member is provided on the other surface side of the strip-shaped thin metal plate,
The processing liquid can be supplied to the processing surface on the other side. Therefore, in this case, if at least one liquid supply nozzle is provided on one surface side of the strip-shaped metal sheet, both processing surfaces of the strip-shaped metal sheet can be processed.

When the above-described two-step etching process is employed as the etching process, the above-mentioned backing process is performed. For this reason, immediately after the etching step, a plurality of through-holes has not yet been formed on the processing surface of the strip-shaped metal sheet, and a plurality of through-holes will be formed for the first time in the subsequent stripping process. Therefore, in such a case, the present invention is a cleaning processing unit used for cleaning processing after the film removal processing, a film removal processing unit used for the film removal processing,
Alternatively, the present invention is applied to a processing apparatus including a rust prevention processing unit used for rust prevention processing.

According to a fifteenth aspect of the present invention, there is provided an immersion treatment step in which a strip-shaped metal sheet is immersed in a treatment liquid for treatment, and before and after the immersion treatment step, the band-shaped metal sheet passes through the liquid surface of the treatment liquid. A transporting step of transporting the strip-shaped metal sheet along its longitudinal direction, and of the strip-shaped metal sheet transported in the transporting step, the strip-shaped metal sheet located above the liquid level of the processing liquid. A liquid supply step of supplying a treatment liquid equivalent to the treatment liquid in which the strip-shaped metal sheet is immersed in the immersion step with respect to the treated surface of the sheet, and a method of treating the strip-shaped metal sheet. .

According to the present invention, in the immersion treatment step, the strip-shaped metal sheet is immersed in the treatment liquid, while in the transport step, the strip-shaped metal sheet is pulled up from the treatment liquid or drawn into the treatment liquid. The processing surface of the strip-shaped metal sheet is a vertical surface or an inclined surface. And in the liquid supply step,
A treatment liquid equivalent to the treatment liquid used in the immersion treatment step is supplied to the treatment surface of the strip-shaped metal sheet located above the liquid surface.

According to this method, in addition to immersing the strip-shaped metal sheet in the processing liquid, the processing surface of the strip-shaped metal sheet located above the liquid level is also treated with the processing liquid. . Therefore, the processing time of the processing surface of the strip-shaped metal sheet can be ensured in the liquid supply step, and the immersion time in the immersion processing can be shortened accordingly. Further, since the processing surface of the strip-shaped metal sheet is a vertical surface or an inclined surface, the processing liquid supplied in the liquid supply step flows down the processing surface at a predetermined speed. The processing speed of the processing surface by the supplied processing liquid can be improved. Therefore, from the above, it is possible to shorten the overall processing time of the processing surface of the strip-shaped metal sheet and improve the processing efficiency.

According to this method, if the processing liquid is supplied to the processing surface of the strip-shaped metal sheet immediately after being pulled up from the liquid level of the processing liquid, the processing surface of the strip-shaped metal sheet is immersed in the immersion process. The liquid droplets of the processing liquid used do not partially adhere. Therefore, the processing surface of the strip-shaped metal sheet is uniformly processed by the processing liquid. Further, in another processing step immediately before the immersion processing step, even when the strip-shaped metal sheet is treated with another processing liquid, the strip-shaped metal sheet immediately before being drawn into the liquid level of the processing liquid is processed. If the processing liquid is supplied to the processing surface, droplets of another processing liquid adhered to the processing surface of the strip-shaped metal sheet can be washed away. Therefore, it is possible to prevent the processing surface of the strip-shaped metal sheet from being unevenly processed by another processing liquid. Therefore, in any case, the processing on the processing surface of the strip-shaped metal sheet can be performed uniformly.

Further, in the liquid treatment step, a treatment liquid equivalent to the treatment liquid for immersing the band-shaped metal sheet is supplied to the treatment surface of the band-shaped metal sheet. Therefore, even if the processing liquid supplied in the liquid processing step flows down into the processing liquid for immersing the strip-shaped metal sheet, the properties of the processing liquid do not significantly change. Here, the “equivalent treatment liquid” refers to a treatment liquid having, for example, substantially the same components, concentrations, specific gravities, or temperatures as described above, and is mixed with the treatment liquid used in the immersion treatment step. Even if it is a liquid which does not cause a problem in the processing of the strip-shaped metal sheet, any liquid may be used.

According to a sixteenth aspect of the present invention, a transporting step of transporting the strip-shaped metal sheet along its longitudinal direction, and a processing liquid is supplied to the processing surface of the strip-shaped metal sheet transported in the transporting step. The processing liquid supplied in the liquid supply step is guided in a direction along the processing surface of the strip-shaped metal sheet by a liquid supply step and a liquid guide surface formed at a position close to the processing surface of the strip-shaped metal sheet. And a liquid guiding step.

According to the present invention, the processing liquid is supplied to the processing surface of the strip-shaped metal sheet conveyed in the conveying step in the liquid supply step, and the processing liquid supplied in the liquid supply step is further supplied in the liquid guiding step. Liquid is guided by the liquid guide surface. The liquid guiding surface in the liquid guiding step is provided near the processing surface of the strip-shaped metal sheet, and guides the processing liquid supplied in the liquid supply step in a direction along the processing surface of the strip-shaped metal sheet. Has become.

According to this method, the processing liquid supplied in a direction different from the processing surface of the strip-shaped metal sheet in the liquid supply step is guided in a direction along the processing surface in the liquid guiding step.
Alternatively, the processing liquid supplied to the processing surface of the strip-shaped metal sheet in the liquid supply step can be guided again in a direction along the processing surface in the liquid guiding step. Therefore, in the liquid supply step, the processing liquid can be efficiently and efficiently supplied to the processing surface of the strip-shaped metal sheet, and therefore, the consumption of the processing liquid in the liquid supply step can be reduced.

Further, the processing liquid supplied in the liquid supply step spreads in the liquid guide surface in the direction along the processing surface of the strip-shaped metal sheet, and the contact area (contact time) between the processing liquid and the processing surface increases. In addition, the processing of the processing surface with the processing liquid can be made uniform over a wide range.

When the liquid guide surface is a vertical surface or an inclined surface, the processing liquid flows down on the liquid guide surface, so that the processing liquid has a relative speed to the processing surface. Therefore, the processing speed of the processing surface with the processing liquid can be improved as compared with the case where the immersion processing is performed.
On the other hand, when the liquid guide surface is a horizontal surface, the processing liquid temporarily stays on the liquid guide surface to form a liquid film of the processing liquid on the liquid guide surface. The liquid film of the processing liquid moves only at such a speed that the liquid film is continuously pushed out by the processing liquid supplied in the liquid supply step. For this reason, while it is possible to perform substantially the same treatment as the immersion treatment, it is possible to always supply a treatment liquid having a constant property to the treated surface as compared with a treatment such as a conventional immersion treatment. Therefore, the processing stability of the processing surface of the strip-shaped metal sheet can be improved.

Here, the liquid guide surface may be any as long as it guides in the direction along the processing surface of the strip-shaped metal sheet to ensure that the processing surface of the strip-shaped metal sheet is processed. Further, the liquid guide member may have such a liquid guide surface at a position close to the processing surface of the strip-shaped metal sheet.

[0067]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Several embodiments of the present invention for solving the above-mentioned technical problems will be described below in detail with reference to the accompanying drawings.

First, a processing device according to the first embodiment of the present invention will be described. FIG. 1 is a schematic diagram showing a configuration of a processing apparatus for a shadow mask material according to a first embodiment of the present invention, particularly, a cleaning processing unit. The processing device PU of the shadow mask material W performs a series of predetermined processes on the shadow mask material W, for example, degreasing, leveling, coating, developing,
This is an apparatus for performing treatments such as hardening, surfacing, etching, and peeling. Further, a cleaning processing unit 100 as shown in FIG. 1 is incorporated in a part of the processing device PU, and in addition, another processing unit (not shown) used for the series of predetermined processes described above. Are provided on the upstream and downstream sides. It should be noted that a plurality of through holes may or may not be formed in the shadow mask material W to be cleaned by the cleaning processing unit 100.

The cleaning processing section 100 shown in FIG. 1 is for cleaning the shadow mask material W by immersing the shadow mask material in a liquid containing a surfactant or a cleaning liquid L such as industrial water or pure water. . Then, the cleaning processing unit 10
0 is a liquid storage unit 110 that stores the cleaning liquid L.
And a roller unit 1 for guiding the shadow mask material W in a predetermined direction.
20, a nozzle unit 130 for supplying the cleaning liquid L to the processing surface S of the shadow mask material W, a liquid guide unit 140 for guiding the cleaning liquid L supplied from the nozzle unit 130 in a direction along the shadow mask material W, and a liquid A liquid circulation unit 15 that circulates the cleaning liquid L stored in the storage unit 110 to the nozzle unit 130
0.

Further, the cleaning unit 1 is provided in the processing unit PU.
An unwinding device TR1 that sequentially unwinds the coil-shaped shadow mask material W upstream of the cleaning process unit 100 and a winding device TR2 that sequentially winds the shadow mask material W in a coil shape downstream of the cleaning unit 100 are provided. , Shadow mask material W
Is transported along its longitudinal direction (transport direction) F in cooperation with the unwinding device TR1 and the winding device TR2 and the roller unit 120.

Here, the respective components of the cleaning processing section 100 will be described in more detail. First, the liquid storage unit 110
Includes a cleaning liquid tank 111 for storing the cleaning liquid L, and a drain port 112 provided at the bottom of the cleaning liquid tank 111 and capable of discharging the cleaning liquid L in the cleaning liquid tank 111. The liquid surface La of the cleaning liquid L stored in the cleaning liquid tank 111 is located below the upper end 111b of the side wall 111a, and the liquid surface La is prevented from overflowing from the upper end 111b. The height of La is controlled.

Next, the roller unit 120 is driven by three parallel rollers 121, 122 and 12
Contains three. In addition, these three rollers 121, 1
Among the rollers 22 and 123, the rollers 121 and 123 are provided above the upper end portion 111b of the side wall 111a of the cleaning liquid tank 111, and the remaining roller 122 is a liquid surface of the cleaning liquid L stored in the cleaning liquid tank 111. Below La
It is provided at a position immersed in the cleaning liquid L. In addition,
The shadow mask material W is guided between the rollers 121 and 122 in a direction inclined with respect to a horizontal plane, and is guided between the rollers 122 and 123 in a vertical direction. That is, the shadow mask material W
The two processing surfaces S are inclined surfaces between the rollers 121 and 122 and are vertical surfaces between the rollers 122 and 123.

Next, the nozzle unit 130 is used to supply the cleaning liquid L to the processing surface S (both surfaces) of the shadow mask material W.
A pair (four) of nozzle blocks 131, 132, 133,
And 134. Further, each of these nozzle blocks 131, 132, 133, and 134 is provided with a plurality (for example, seven) of nozzles 131a, 132a, 133a, and 134a that discharge the cleaning liquid L. Then, the pair of nozzle blocks 131 and 13
2 is a cleaning liquid L directed to each of the processing surfaces S (both surfaces) of the shadow mask material W between the rollers 121 and 122.
Is provided at a position sandwiching the shadow mask material W. Further, a pair of nozzle blocks 133,
Similarly, 134 is provided at a position sandwiching the shadow mask material W so as to supply the cleaning liquid L to each of the processing surfaces S (both surfaces) of the shadow mask material W between the rollers 122 and 123. ing.

Next, the liquid guide section 140 guides the cleaning liquid L in a direction along the surface of the shadow mask material W.
It includes two pairs (four) of liquid guide plates 141, 142, 143, and 144 having 41a, 142a, 143a, and 144a. Also, a pair of liquid guide plates 141,
142 is provided at a position sandwiching the shadow mask material W between the roller 121 and the roller 122, and their guide surfaces 141a and 142a are provided to face each other with the shadow mask material W interposed therebetween. . In addition, 1
Similarly, the pair of liquid guide plates 143 and 144 are also provided at positions sandwiching the shadow mask material W between the rollers 121 and 122, and their guide surfaces 143a and 144a.
Are provided so as to face each other with the shadow mask material W interposed therebetween. These liquid guide plates 141, 14
2, 143, 144 guide surfaces 141a, 142a, 1
43a and 144a are processing surfaces S of the shadow mask material W
(Both sides) are substantially parallel with a predetermined gap.

Here, the perspective view of FIG. 2 shows the shadow mask material W between the rollers 121 and 122 as a representative.
The configuration of the liquid guide plate 141 and the nozzle 131 close to (shown by a two-dot chain line) is shown. As shown in FIG. 2, the guide surface 141a has a tilt direction D1 (corresponding to the longitudinal direction F of the shadow mask material W) on the guide surface 141a.
Guide grooves 1 in a direction D2 (horizontal direction) orthogonal to
41b are formed. For example, the guide grooves 141b are linear grooves having a rectangular cross section.

When the cleaning liquid L is discharged from the nozzle 131a of the nozzle block 131 located above the liquid guide plate 141, the portion K between the processing surface S of the shadow mask material W and the guide surface 141a (hereinafter, referred to as a portion K). Gap))
Alternatively, the cleaning liquid L is applied to the processing surface S (in this case, the lower surface).
Is supplied. Then, the cleaning liquid L flows down on the guide surface 141a mainly in the above-described inclination direction D1, and
Due to the plurality of guide grooves 141b on “a”, the guide grooves 141b are also expanded in a direction D2 perpendicular to the tilt direction D1.

The other guide surfaces 142a, 143
Guide grooves 142b, 143b, and 144b similar to the guide grooves 141b are also formed on the guide surfaces 142a, 143a, and 144a in the directions perpendicular to the inclination directions of the liquid guide plates 142, 143, and 144, respectively. The cleaning liquid L flowing down the guide grooves 142b, 143b, 144b
Is spread horizontally.

The lower end portion 141c of the liquid guide plate 141
Is provided below the liquid level La so as to be immersed in the cleaning liquid L. Further, other liquid guide plates 142,
143 and 144 have the same configuration as the liquid guide plate 141 shown in FIG.
3 and 134 have the same configuration as the nozzle block 131 shown in FIG. However, the guide surfaces 141a, 142a of the liquid guide plates 141, 142 are substantially inclined surfaces, while the guide surfaces 143a, 143,
144a is vertical.

Further, the guide surface 141 of the liquid guide plate 141
The width WA of “a” is longer than the width WB of the shadow mask material W, and covers the width WB of the shadow mask material W. The other guide surfaces 142a, 143
The widths WA of the a and 144a are longer than the width WB of the shadow mask material W, similarly to the width WA of the guide surface 141a shown in FIG.

Next, the liquid circulating unit 150 includes the cleaning liquid tank 111.
Drain port 112 and nozzle blocks 131, 132, 13
And a circulation pipe 151 through which the cleaning liquid L flows.
The cleaning liquid L in the nozzle block 131, 132, 13
3, 134, and a temperature controller 153 for adjusting the temperature of the cleaning liquid L in the circulation pipe 151.
And a filter 154 for removing impurities in the cleaning liquid L in the circulation pipe 151.

With this configuration, the cleaning liquid L stored in the cleaning liquid tank 111 is collected and the nozzle blocks 131, 1
32, 133, and 134, and the nozzle block 13
The cleaning liquid L supplied from 1, 132, 133, and 134 can be reused. Further, the temperature controller 1
The temperature of the cleaning liquid L circulated and used can be kept at a constant optimum temperature by the filter 53, and the cleaning liquid L can be kept clean by the filter 154.

Here, the cleaning unit 1 of the processing unit PU
The actual cleaning operation of the cleaning process 00 will be described. First, the shadow mask material W is always conveyed along its longitudinal direction F by the unwinding device TR1 and the winding device TR2.
0, the cleaning liquid L stored in the cleaning liquid tank 111 is conveyed so as to pass through the liquid surface La (conveying step). The cleaning liquid L is supplied from the nozzle unit 130 to the processing surface S located above the liquid level La while the shadow mask material W is being transported in this transport step (liquid supply step). The cleaning liquid L supplied in this liquid supply step is supplied to the guide surfaces 141a, 142a, 143a,
The processing surface S is guided in a direction along the processing surface S so as to be processed by the 144a (liquid guiding step).

In the first embodiment described above,
Unwinding device TR1, winding device TR2, and roller unit 12
By 0 or the like, the shadow mask material W is conveyed so as to pass through the liquid level La of the cleaning liquid L. And the liquid level L
a cleaning liquid tank 1 on the processing surface S (both surfaces) located above
The cleaning liquid L in the nozzle 11 is circulated and supplied from the nozzle unit 130.

According to such a configuration, the shadow mask material W is immersed in the cleaning liquid L and the liquid level La
The cleaning process using the cleaning liquid L is also performed on the processing surface S located above the surface. Therefore, the cleaning liquid tank 111 can be made small (shallow), and the space occupied by the apparatus can be reduced. Further, since the cleaning liquid L is supplied from the nozzle unit 130 to the processing surface S immediately after being pulled up from the liquid level La, the liquid droplets of the cleaning liquid L do not partially adhere. Therefore, the processing surface S is uniformly cleaned by the cleaning liquid L. Further, even in a case where the shadow mask material W has been processed with another processing liquid in another processing section on the upstream side (left side in FIG. 1) of the cleaning liquid tank 111, another processing unit that has adhered to the processing surface S Of the processing liquid can be washed away. Therefore, it is possible to prevent the processing surface S from being unevenly cleaned by another processing liquid.

Further, since the processing surface S is not a horizontal surface but a vertical surface or an inclined surface, the processing speed of the processing surface S increases.
Can be reduced, and the space occupied by the device can be reduced. Note that it is more preferable to increase the flow rate and the flow rate of the cleaning liquid L supplied from the nozzle unit 130 because the processing progress speed of the processing surface S increases. Further, the processing surface S is located above the liquid surface of the cleaning liquid L in the cleaning liquid tank 111 in a state of being a vertical surface or an inclined surface. Therefore, the cleaning liquid L supplied to the processing surface S does not leak out of the cleaning liquid tank 111. Further, by reusing the cleaning liquid L by the liquid circulation unit 150,
The cleaning liquid L stored in the cleaning liquid tank 111 is provided on the processing surface S.
Since the cleaning liquid L equivalent to the cleaning liquid L is supplied from the nozzle unit 130, the property of the cleaning liquid L in the cleaning liquid tank 111 does not significantly change.

In the first embodiment, the guide surfaces 141a, 142a, 143a,
144a is provided close to the processing surface S of the shadow mask material W, and guides the cleaning liquid L from the nozzle unit 130 in a direction along the processing surface S. For this reason, the cleaning liquid L can be efficiently supplied to the processing surface S without waste, and therefore, the consumption amount of the cleaning liquid L can be suppressed low. The cleaning liquid L supplied from the nozzle unit 130 is supplied to the guide surfaces 141a, 142a, 143a, 1
Since the contact area (contact time) with the processing surface S is increased by 44a, the cleaning processing of the processing surface S with the cleaning liquid L can be uniformed over a wide range.

The guide surfaces 141a, 142a, 14
Since 3a and 144a are vertical surfaces or inclined surfaces, the processing speed of the processing surface S with the cleaning liquid L can be improved, and therefore, the length of the portion of the shadow mask material W immersed in the cleaning liquid tank 111 can be improved. Or liquid guide plate 14
It is not necessary to increase the length of 1,142,143,144. Therefore, the space occupied by the processing device PU can be further reduced.

In the first embodiment, the lower end 141 of the liquid guide plates 141, 142, 143, 144
c, 142c, 143c, and 144c are in the cleaning liquid L below the liquid level La of the cleaning liquid L. For this reason, the cleaning liquid L guided and flowing down by the guide surfaces 141a, 142a, 143a, 144a and the cleaning liquid L in the cleaning liquid tank 111 are continuous, and the shadow mask material W is exposed to the air. Since the cleaning process is performed without any treatment, the droplets do not partially adhere to the processing surface S.

Further, in the first embodiment, the cleaning liquid L is supplied to the processing surface S, flows down into the cleaning liquid tank 111, is recovered by the pump 152, flows through the circulation pipe 151, and It is sent out to the section 130 and is used again as the cleaning liquid L from the nozzle section 130. Therefore, the consumption of the cleaning liquid L can be suppressed without wasting the cleaning liquid L unnecessarily. Further, the cleaning liquid L equivalent to the cleaning liquid L in the cleaning tank 111 can be easily supplied from the nozzle unit 130, and the property of the cleaning liquid L in the cleaning tank 111 can be prevented from changing.

Further, in the first embodiment, the guide surfaces 141a, 142a, 143a, 144a are flat surfaces facing the processing surface S with a predetermined gap. Therefore, the processing surface S and the guide surfaces 141a,
A gap K having a predetermined gap is formed between the cleaning liquid L and the cleaning liquid L supplied and guided from the nozzle unit 130, and the gap K is filled with the cleaning liquid L. Thereby, in a wide range along the processing surface S,
The cleaning liquid L comes into uniform contact, and the cleaning of the processing surface S can be made uniform.

Further, in the first embodiment, the processing surface S and the substantially planar guide surfaces 141a, 142a
Are almost parallel to each other and both are inclined surfaces. The liquid guide plates 141 and 142 are provided below the processing surface S. For this reason, since the guide surfaces 141a and 142a near the processing surface S face upward, the cleaning liquid L is located above the guide surfaces 141a and 142a while being guided on the upper surfaces of the guide surfaces 141a and 142a. The processing surface S (lower surface) will be processed. Therefore,
The cleaning liquid L spreads over a wide area on the upper surfaces of the guide surfaces 141a and 142a, and the processing surface S can be uniformly cleaned over a wide area.

In the first embodiment, the processing surface S and the substantially planar guide surfaces 141a, 142a,
143a and 144a are substantially parallel to each other, are both inclined surfaces or vertical surfaces, and are inclined in the inclination direction or the vertical direction. Then, the guide surfaces 141a,
142a, 143a, and 144a have guide grooves 141b, 142b, and 14 that extend in a direction perpendicular to the tilt direction.
3b and 144b are formed. Therefore, the cleaning liquid L is applied on the guide surfaces 141a, 142a, 143a, and 144a.
When the cleaning liquid L flows down, the guide grooves 141b,
The guide surface 14 is guided by 142b, 143b, 144b.
Since 1a, 142a, 143a, and 144a flow in a direction different from the direction in which they incline (a direction perpendicular to the direction), the flow-down range of the cleaning liquid L can be expanded. Therefore, the nozzle portion 1
Even if the cleaning liquid L supplied from the cleaning liquid 20 is not uniform, the cleaning processing of the processing surface S can be made uniform.

Further, in the first embodiment, a pair of liquid guide plates 141 and 142 or 143 and 144 are provided at positions sandwiching the shadow mask material W, respectively, and these guide surfaces 141a and 142a or 143a are provided. And 144a are provided to face each other with the shadow mask material W interposed therebetween.
Therefore, the processing surfaces S on both surfaces of the shadow mask material W can be reliably cleaned.

In the first embodiment, the guide surfaces 141a, 142a, 143a, 144a are provided in a range that covers the width WB of the shadow mask material W.
In other words, the guide surfaces 141a, 142a, 143
a, 144a is the width WB of the shadow mask material W.
It has the above length. Therefore, the cleaning liquid L can be brought into contact with the entire surface of the processing surface S, and the entire surface of the processing surface S can be reliably cleaned.

Next, a processing apparatus according to a second embodiment, which is a modification of the first embodiment of the present invention, will be described. FIG.
It is the schematic which shows the structure of the processing apparatus of the shadow mask material which concerns on 2nd Embodiment of this invention especially the cleaning process part. The shadow mask material processing apparatus PU is an apparatus for performing a series of predetermined processes, for example, processes such as etching, peeling, and rust prevention, on the shadow mask material W in which a plurality of through holes are already formed. Further, a cleaning processing unit 200 as shown in FIG. 3 is incorporated in a part of the processing device PU, and in addition, another processing unit (not shown) used for the above series of predetermined processes. Are provided on the upstream and downstream sides.

In the first embodiment shown in FIG. 1 described above, the liquid guide plates 141, 142, 143, 144 of the liquid guide section 140 in the cleaning section 100 face each other with the shadow mask material W interposed therebetween. Each pair is provided as described above, but in the second embodiment shown in FIG.
Liquid guide plate 2 of liquid guide unit 240 in cleaning processing unit 200
41 is different in that only one is provided so as to face the one surface side of the shadow mask material W. Further, in the second embodiment, the cleaning processing unit 200
Is a shadow mask material W in which a plurality of through holes are already formed.
Is to be washed. Therefore, a detailed description other than these different points will substitute the description of the above-described first embodiment, and a description thereof will be omitted. In FIG. 3, the same parts as those shown in FIG. 1 are denoted by the same reference numerals.

The cleaning processing unit 200 shown in FIG. 3 is similar to the first embodiment, except that the shadow mask material is immersed in a cleaning agent L such as a liquid containing a surfactant or industrial water or pure water. The cleaning unit W is a cleaning unit that stores the cleaning liquid L, a roller unit 120 that guides the shadow mask material W in a predetermined direction, and a nozzle unit that supplies the cleaning liquid L to the processing surface S. 230, a liquid guide 240 for guiding the cleaning liquid L supplied from the nozzle 230 in a direction along the shadow mask material W, and a liquid circulation unit for circulating the cleaning liquid L stored in the liquid storage 110 to the nozzle 130 150. Further, similarly to the first embodiment, the sheet is conveyed along its longitudinal direction (conveying direction) F by the unwinding device TR1 and the winding device TR2.

Here, among the above-described components of the cleaning processing section 200, the components different from the first embodiment will be described in more detail. First, the nozzle section 230 includes two nozzle blocks 231 and 232 for supplying the cleaning liquid L to the shadow mask material W. Further, each of these nozzle blocks 231 and 232 has a plurality of (for example, seven) nozzles 23 for discharging the cleaning liquid L.
1a and 232a are provided. The nozzle block 231 is located between the roller 121 and the roller 122, and the nozzle block 232 is located between the roller 122 and the roller 1.
The cleaning liquid L is supplied to one side of the shadow mask material W between the cleaning liquid L and the cleaning liquid L.

Next, the liquid guiding section 240 guides the cleaning liquid L in a direction along the surface of the shadow mask material W.
It includes two liquid guide plates 241 and 242 having 41a and 242a. The liquid guide plate 241 is provided on one side of the shadow mask material W conveyed in an inclined direction between the roller 121 and the roller 122, and the guide surface 241a is close to the processing surface S. Is provided. Further, the liquid guide plate 242 is provided on one side of the shadow mask material W which is conveyed in the vertical direction between the rollers 122 and 123, and the guide surface 242 is provided.
a is provided near the processing surface S. Note that these guide surfaces 242a, 242a are substantially parallel to one surface of the shadow mask material W with a predetermined gap.

Here, the guide surfaces 241a, 242a are formed with guide grooves 241b, 241b having the same shape as in the first embodiment in a direction perpendicular to the direction in which the liquid guide plates 241 and 242 are inclined (in this case, the horizontal direction). 242b is formed.

The nozzles 231 of the nozzle blocks 231 and 232 located above the liquid guide plates 241 and 242
When the cleaning liquid L is discharged from the first and second surfaces a and 232a, first, one surface of the shadow mask material W (the guide surfaces 241a and 242a).
The cleaning liquid L is supplied to the processing surface S) not facing
One side is cleaned. Then, a part of the cleaning liquid L passes through a plurality of through-holes formed in the shadow mask material W, and the other surface of the shadow mask material W (the guide surface 241).
a, 242a.
A part of the cleaning liquid L that has reached the other surface of the shadow mask material W flows down on the guide surfaces 241a and 242a, and the surface of the shadow mask material W and the guide surface 24a.
The gap K between the first and second masks 1a and 242a is filled with the cleaning liquid L, and the cleaning liquid L comes into contact with the other surface of the shadow mask material W. Therefore, the nozzle blocks 231, 232
Is located only on one side of the shadow mask material W, the plurality of through holes of the shadow mask material W and the liquid guide plate 24
In cooperation with 1, 242, the processing surfaces S on both surfaces (one surface and the other surface) of the shadow mask material W can be cleaned.

Note that, similarly to the first embodiment, the guide surface 2
The cleaning liquid L flowing down on the guide grooves 41a and 242a
It is expanded in the horizontal direction by 41b and 242b.
Also, lower end portions 241c, 24 of the liquid guide plates 241, 242
2c is also provided below the liquid level La so as to be immersed in the cleaning liquid L. Further, the guide surfaces 241a,
The width WA of 242 is longer than the width WB of the shadow mask material W and covers the width WB of the shadow mask material W. In addition, the liquid storage unit 110, the roller unit 1
20 and the liquid circulation unit 150 have the same configuration as in the first embodiment. Note that the actual cleaning operation performed by the cleaning processing unit 200 of the processing apparatus PU is also the first operation.
The description is omitted because it is similar to the embodiment.

Here, a plurality of through-holes formed in the shadow mask material W which has been cleaned by the cleaning section 200 will be described. As the plurality of through holes of the shadow mask material W, there are generally round holes (dot type) and long holes (slot type). Further, instead of the shadow mask material W, a band-shaped thin metal plate for an aperture grill (hereinafter, referred to as an aperture grill material) may be processed. Is a long and narrow hole-shaped through hole (slit type), and the through hole forming region of the aperture grille has a sloping shape as a whole.

In the second embodiment described above,
Since a plurality of through holes, that is, through holes for passing an electron beam, are formed in the shadow mask material W,
The cleaning liquid L can pass freely between both surfaces of the shadow mask material W. For this reason, even if the nozzle portion 230 is arranged only on one surface side of the shadow mask material W and supplies the cleaning liquid L from one surface side of the shadow mask material W,
In addition to the processing surface S on one side of the shadow mask material W, the cleaning liquid L can be supplied to the processing surface S on the other side. Further, since the guide surfaces 241a and 242a are provided on the other surface side of the shadow mask material W, the cleaning liquid L can be supplied to the processing surface S on the other surface more reliably. The processing surfaces S on both surfaces of the mask material W can be cleaned.

Next, a processing apparatus according to a third embodiment, which is a modification of the first embodiment of the present invention, will be described. FIG.
It is the schematic which shows the structure of the processing apparatus of the shadow mask material which concerns on 3rd Embodiment of this invention especially the structure of a cleaning process part. The shadow mask material processing apparatus PU performs a series of predetermined processes on the shadow mask material W in which a plurality of through-holes are already formed, for example, degreasing, leveling, coating, development, hardening, surface exposure, etching, It is a device for performing processing such as peeling or rust prevention. Further, a cleaning processing unit 300 as shown in FIG. 4 is incorporated in a part of the processing device PU, and in addition, another processing unit (not shown) used for the series of predetermined processes described above. Are provided on the upstream and downstream sides.

In the first embodiment described above,
Although the shadow mask W is immersed in the liquid storage unit 110, the shadow mask W is not immersed in the third embodiment. That is, in the first embodiment shown in FIG. 1 described above, the cleaning liquid tank 111 in the cleaning processing unit 100 stores the cleaning liquid L such that the liquid surface La of the cleaning liquid L is located above the roller 122. However, in the third embodiment shown in FIG. 4, the liquid receiving tank 311 in the cleaning processing unit 300 is
The difference is that the cleaning liquid L is received so that the liquid level La of the cleaning liquid L is located below the roller 122. Therefore, a detailed description other than the difference will be made by replacing the description of the above-described first embodiment, and the description thereof will be omitted here. Also, in FIG.
The same parts as those shown in FIG. 1 are denoted by the same reference numerals.

The cleaning unit 300 shown in FIG.
The cleaning processing is performed on the shadow mask material W by supplying the cleaning liquid L from the nozzle unit 130 to the processing surface S without immersing the shadow mask material W therein. Section 310, a roller section 120 for guiding the shadow mask material W in a predetermined direction, a nozzle section 130 for supplying the cleaning liquid L to the processing surface S, and a cleaning liquid L supplied from the nozzle section 130 for the shadow mask material W
Guide 140 for guiding in a direction along the line, and liquid receiver 3
And a liquid circulating unit 150 for circulating the cleaning liquid L received at 10 to the nozzle unit 130. Furthermore, the first
As in the embodiment, the unwinding device TR1 and the winding device TR
2, the paper is conveyed along its longitudinal direction (conveying direction) F.

Here, of the above-described components of the cleaning processing unit 300, those components that are different from the above-described first embodiment will be described in further detail. First, the liquid receiving part 310 includes a liquid receiving tank 311 for receiving the cleaning liquid L and a drain port 312 provided at the bottom of the liquid receiving tank 311 and capable of discharging the cleaning liquid L received in the liquid receiving tank 311. Contains. In addition, the liquid receiving tank 3
The liquid level La of the cleaning liquid L received at 11 is the side wall 311a.
The height of the liquid surface La is controlled so that the cleaning liquid L does not overflow from the upper end 111b. Further, since the liquid surface La of the cleaning liquid L is located at a position lower than the roller 122 of the roller section 120, the shadow mask material W guided and transported by the roller section 120 is transferred to the liquid receiving tank 311. Is not immersed after passing through the cleaning liquid L received in the step (1).

Further, the liquid guide plates 141, 141 of the liquid guide portion 140
142, 143, and 144 have slightly longer lengths in the direction along the shadow mask material W than those of the first embodiment. For this reason, a sufficient cleaning process can be performed on the shadow mask material W without the immersion bath (the cleaning liquid bath 111 in FIG. 1) as in the first embodiment. In the third embodiment, a liquid receiving tank 311 is provided instead of the cleaning liquid tank 111 as in the first embodiment. However, the liquid receiving tank 311 may be sufficiently smaller than the cleaning liquid tank 111. Therefore, the cleaning processing unit 300
Is smaller than the cleaning processing unit 100 of the first embodiment, so that the space occupied by the entire processing apparatus PU can be reduced.

Here, the cleaning unit 3 of the processing unit PU
The actual cleaning operation of the cleaning process 00 will be described. First, the shadow mask material W is always conveyed along its longitudinal direction F by the unwinding device TR1, the winding device TR2, the roller unit 120, and the like (conveying step). The cleaning liquid L is supplied to the processing surface S from the nozzle unit 130 while the shadow mask material W is being transported in the transporting step (liquid supplying step). The cleaning liquid L supplied in this liquid supply step is supplied to the guide surfaces 141a, 141 of the liquid guide section 140 formed at a position close to the processing surface S.
The processing surface S is guided in a direction along the processing surface S so as to be processed by the 42a, 143a, and 144a (liquid guiding process).

In the third embodiment described above, the cleaning liquid L is supplied from the nozzle unit 130 to the processing surface S transported by the unwinding device TR1, the winding device TR2, the roller unit 120, and the like. Further, liquid guide plates 141, 142, 143, 144 having guide surfaces 141a, 142a, 143a, 144a are provided. The guide surfaces 141a, 142a, 143
a, 144a are provided near the processing surface S,
The cleaning liquid L from the nozzle portion is guided in a direction along the processing surface S. For this reason, similarly to the first and second embodiments, the consumption of the processing liquid from the liquid supply nozzle can be suppressed low, and the processing surface S by the cleaning liquid L can be reduced.
It is also possible to improve the processing speed while making the cleaning process uniform.

Further, the guide surfaces 141a, 142a, 14
Since 3a and 144a are vertical surfaces or inclined surfaces, the case where the shadow mask material W is immersed,
Compared to the case where the processing surface S is horizontal, the processing surface S
Can be improved.

Further, the cleaning liquid L from the nozzle 130 is
After being supplied to the processing surface S and flowing down into the liquid receiving tank 311,
By the 152 pump, it is collected, circulates through the circulation pipe 151, and is sent out to the nozzle unit 130,
Again, it is used as the cleaning liquid L from the nozzle unit 130. Therefore, the consumption of the cleaning liquid L can be suppressed without wasting the cleaning liquid L unnecessarily.

Next, a processing apparatus according to a fourth embodiment which is a further modification of the third embodiment of the present invention will be described. FIG. 5 is a schematic diagram showing a configuration of a processing apparatus for a shadow mask material according to a fourth embodiment of the present invention, particularly, a cleaning processing unit. The processing apparatus PU for the shadow mask material performs a series of predetermined processes on the shadow mask material W, for example, degreasing, leveling, coating, developing, hardening, surfacing, etching,
This is an apparatus for performing processing such as peeling or rust prevention.
Further, a cleaning processing unit 400 as shown in FIG. 5 is incorporated in a part of the processing apparatus PU, and other processing units (not shown) used for the above-described series of predetermined processes are also provided.
Are provided on the upstream and downstream sides.

In the third embodiment described above,
Processing surface S and liquid guide plates 141, 142, 143, 14
4 guide surfaces 141a, 142a, 143a, 144a
Is a vertical surface or an inclined surface, but in the fourth embodiment, the processing surface S and the liquid guide plates 441, 44
The two guide surfaces 441a and 442a are different in that they are horizontal. Further, in the above-described third embodiment, the nozzle unit 130 includes the liquid guide plates 141, 142,
Apart from the nozzles 431a, 143, 144, the nozzles 431a,
432a is a liquid guide plate 441, 442, 443, 444
And that it is provided inside. Therefore, for the detailed description other than the difference, the description of the above-described first and third embodiments is substituted, and the description is omitted here. In FIG. 5, the same parts as those shown in FIG. 4 are denoted by the same reference numerals.

The cleaning section 400 shown in FIG. 5 includes nozzles 431a, 431 provided inside the liquid guide plates 441, 442.
The cleaning process is performed on the shadow mask material W by supplying the cleaning liquid L from the processing surface 32a to the processing surface S. The liquid receiving unit 310 that receives the cleaning liquid L and the shadow mask material W are guided in a predetermined direction. Roller 420 and cleaning liquid L
430 that supplies the cleaning liquid L supplied from the nozzle 430 to the processing surface S, a liquid guide 440 that guides the cleaning liquid L supplied in the direction along the shadow mask material W, and the liquid receiver 31.
And a liquid circulating unit 150 that circulates the cleaning liquid L received at 0 through the nozzle unit 430. Further, as in the first embodiment, the unwinding device TR1 and the winding device TR2
Is transported along its longitudinal direction (transport direction) F.

Here, among the above-described components of the cleaning processing section 400, those components that are different from the above-described third embodiment will be described in further detail. First, the roller section 420
Four parallel rollers 421 and 42 that can be driven and rotated
2,423, and 424. Further, among these four rollers 421, 422, 423, and 424,
The rollers 422 and 423 are provided at the same height as each other, and the remaining rollers 421 and 424
At positions higher than 2,423, they are provided at the same height. Therefore, the processing surface S is
A horizontal plane is formed between the roller 2 and the roller 423.

Next, the nozzle portion 430 is provided inside each of the pair of liquid guide plates 431a and 432a, and a plurality of nozzles 431a and 431 for flowing and discharging the cleaning liquid L.
2a. And these nozzles 431a,
432a is provided at a position sandwiching the shadow mask material W so as to supply the cleaning liquid L to each of the processing surfaces S (both surfaces) of the shadow mask material W between the rollers 422 and 423.

Next, the liquid guide section 440 guides the cleaning liquid L in a direction along the surface of the shadow mask material W.
A pair (two) of liquid guide plates 44 having 41a and 442a
1,442. Also, a pair of liquid guide plates 44
1, 442 are provided at positions sandwiching the shadow mask material W between the rollers 422 and 423, and the guide surfaces 441a, 442a are provided to face each other with the shadow mask material W interposed therebetween. . The guide surfaces 441a and 442a are substantially parallel to the processing surface S (both surfaces) of the shadow mask material W with a predetermined gap. The tip surfaces of the plurality of nozzles 431a and 432a are open on the guide surfaces 441a and 442a.
2a are arranged at uniform intervals over substantially the entire area of the guide surfaces 441a and 442a. As a result, the cleaning liquid L can be supplied substantially uniformly to the processing surface S (both surfaces) of the shadow mask material W, so that the guide grooves as in the first to third embodiments are provided on the guide surfaces 441a and 442a. Not.

The width WA of the guide surfaces 441a and 442a of the liquid guide plates 441 and 442 in the depth direction in FIG.
Is a shadow mask material W, as in the first to third embodiments.
5 is longer than the width WB in the depth direction of FIG. 5, and covers the width WB of the shadow mask material W. Further, the cleaning liquid L from the nozzle unit 430 is supplied to the gap K
, And flows down from the periphery of the guide surfaces 441a and 442a to be received by the liquid receiving tank 311.

Here, the cleaning unit 4 of the processing unit PU
The actual cleaning operation of the cleaning process 00 will be described. First, the shadow mask material W is always conveyed along its longitudinal direction F by the unwinding device TR1, the winding device TR2, the roller unit 120, and the like (conveying step). The cleaning liquid L is supplied from the nozzle unit 430 in the liquid guide unit 440 to the substantially horizontal processing surface S (both surfaces) while the shadow mask material W is being transported in this transport process (liquid supply process). The cleaning liquid L supplied in the liquid supply step is directed along the processing surface S so that the processing surface S is processed by the substantially horizontal guide surfaces 441a and 442a formed at positions close to the processing surface S. (Liquid guiding step).

In the fourth embodiment described above, the processing surface S and the guide surfaces 441a and 442a are horizontal surfaces. The liquid guide plate 441 is provided close to the lower side of the processing surface S. For this reason, the cleaning liquid L
While being guided along the guide surface 441a, the guide surface 4
The processing surface S on the lower surface side of the shadow mask material W above the surface 41a is processed. Therefore, the processing surface S on the lower surface side of the shadow mask material W can be uniformly processed over a wide range. On the other hand, the liquid guide plate 442 is provided close to the upper side of the processing surface S. In this case, the cleaning liquid L is guided mainly to the processing surface S on the upper surface side of the shadow mask material W, and is additionally guided to the guide surface 442a. Therefore, even in this case, the processing surface S on the upper surface side of the shadow mask material W can be uniformly processed over a wide range. From the above, the processing surfaces S on both surfaces of the shadow mask material W can be uniformly processed over a wide range.

Although the first to fourth embodiments of the present invention have been described above, the present invention can be embodied in other forms. For example, the above-mentioned first to fourth
The processing apparatus PU according to the embodiment processes the shadow mask material W. Instead of the shadow mask material W, the processing device PU processes a band-shaped thin metal plate for an aperture grill (hereinafter, referred to as an aperture grill material). There may be.
In this case, the plurality of through-holes formed in the aperture grill material are slit-shaped through-holes (hereinafter, referred to as slits) in the shape of an elongated hole, and a tape-like plate portion (hereinafter, referred to as a slit) is provided between adjacent slits. , Tape).
In other words, the aperture forming region of the aperture grill material has a slender shape in which slits and tapes are alternately arranged. Here, when the aperture grill material is conveyed, the longitudinal direction of the tape of the aperture grill material (hereinafter, referred to as the tape direction) may coincide with the longitudinal direction F of the aperture grill material. It is not necessary.

Here, in the case where the cleaning liquid L as the processing liquid flows down along the longitudinal direction F of the aperture grill material as in the first to third embodiments, the tape direction is the length of the aperture grill material. When the cleaning liquid L flows perpendicularly to the direction F, the tape of the aperture grill material may be disturbed by the flowing down of the cleaning liquid L. For this reason, it is conceivable that the tapes are overlapped with each other, and sufficient processing is not performed on the overlapped portions, or the root of the tape is twisted, resulting in a product defect. In such a case, the supply of the cleaning liquid L is not performed from above the processing surface S as in the first to third embodiments, but, for example, from the side in the width direction of the processing surface S of the aperture grill material. What is necessary is just to supply. For example, a nozzle for discharging the cleaning liquid L may be arranged laterally with respect to the width direction of the processing surface S of the aperture grill material.

On the other hand, in the case where the cleaning liquid L flows down in the longitudinal direction F of the aperture grill material, when the tape direction substantially coincides with the longitudinal direction F of the aperture grill material, the flowing direction of the cleaning liquid L Since the cleaning liquid L flows down in a direction along the tape substantially in accordance with the direction, the tape of the aperture grill material is aligned in substantially the same direction by the flow of the cleaning liquid L. With this configuration, the tapes do not overlap with each other and the root of the tape is not twisted, so that the aperture grill material can be satisfactorily processed, and the occurrence of product defects can be further suppressed. be able to.

In the first to third embodiments, the guide surfaces 141a, 142a, 143a, 144
a, 241a, 242a in the guide grooves 141b, 142b, 143 in a direction orthogonal to the direction in which the guide surface is inclined.
Although b, 144b, 241b, and 242b are formed, a guide groove may be formed in such a guide surface in a direction in which the guide surface is inclined (equal to the longitudinal direction F of the shadow mask material W). With this configuration, when the cleaning liquid L as the processing liquid flows down on the guide surface, the cleaning liquid L is guided by the guide grooves and flows in the direction in which the guide surface is inclined. Flow direction can be unified. Therefore, since the amount of the cleaning liquid L spilling from the guide surface in a direction different from the direction in which the guide surface is inclined is reduced, the supply efficiency of the cleaning liquid L can be improved, and the consumption of the cleaning liquid L can be reduced. Alternatively, the liquid guide plates 141, 142, 143, 14
If convex portions are formed on both sides in the direction of the width WA of 4,241 and 242, that is, if a concave portion is formed in the central portion in the direction of the width WA of the liquid guide plate, the downward direction of the cleaning liquid L is unified by the concave portions. Therefore, the consumption amount of the cleaning liquid L can be similarly reduced.

Further, the guide surfaces 141a, 142a,
The direction in which the guide grooves extend in 143a, 144a, 241a, and 242a is not limited to the direction in which the guide surface is inclined (D1 in FIG. 2) or the direction perpendicular to the direction (D2 in FIG. 2). The directions may cross obliquely. Further, the guide groove is not limited to the one extending linearly, and may be a polygonal line or a curved line. Also, the cross-sectional shape of the guide groove on the guide surface may be any shape such as a wedge shape and a semicircle shape, in addition to the rectangular shape as in the first to third embodiments,
The guide surface may have a corrugated cross section. In short, it is only necessary that the grooves are formed on the guide surface so that the concave portions and the convex portions are alternately continuous.

Further, in the above-described first to fourth embodiments, the liquid guide plates 141, 14 as liquid guide members are provided.
2,143,144,241,242,441,442
Is a plate-shaped member, but is not limited to this, and may have any shape as long as it has a guide surface. Further, the guide surface is not limited to a plane parallel to the processing surface S. For example, as shown in a schematic diagram of FIG. 6, a planar surface provided so as to gradually approach the processing surface S of the shadow mask material W. May be a guide surface P (asymptotic plane: FIG. 6A) or a curved guide surface R (asymptotic curved surface: FIG. 6B). In such a case, the processing liquid from the nozzle N is guided by the guide surface P or R of the liquid guide plate G in a direction along the processing surface S, and flows down on the guide surface P or R or the processing surface S, and A gap K between the surface S and the guide surface P or R (near the lower end of the guide surface P or R) is filled with the processing liquid. Therefore, even in such a case, the processing liquid can be uniformly supplied to the processing surface S, and the processing of the processing surface S can be made uniform.

In the first to third embodiments described above, the nozzle for supplying the cleaning liquid L as the processing liquid is composed of a plurality of nozzles, but may be a single nozzle. Alternatively, a so-called slit nozzle whose tip extends in the width direction of the shadow mask material W and opens in a slit shape may be used. In the case of a single slit nozzle, the cleaning liquid L can be uniformly supplied in the longitudinal direction of the slit even if there is one slit nozzle. Further, in the above-described first to third embodiments, the nozzle may be provided inside the liquid guide plate as in the above-described fourth embodiment, or the shadow mask material W as a band-shaped thin metal plate may be provided. May be provided laterally with respect to the width direction. In the case of a slit nozzle, the longitudinal direction of the slit-shaped opening is preferably parallel to the processing surface S of the strip-shaped metal sheet. Further, the above-mentioned first to third
In the embodiment, the liquid guides 140 and 240 are not essential if the cleaning liquid L is uniformly supplied from a plurality of nozzles or slit nozzles as described above. In this case, it is particularly preferable to apply this slit nozzle because the uniformity of the supply of the cleaning liquid L to the slit nozzle is high.

Further, in the first to fourth embodiments described above, the liquid circulating unit 150 is provided to collect and reuse the cleaning liquid L as the processing liquid. Need not always be provided, and the processing liquid may be discarded and a new cleaning liquid L may be supplied from the nozzle. In this case, since the fresh cleaning liquid L is always supplied, stable processing can be performed without the property of the cleaning liquid L changing over time.

In the first to fourth embodiments described above, the cleaning units 100, 200, 300, and 400 for cleaning the shadow mask material W as a strip-shaped metal sheet.
The present invention is applied to a degreasing treatment section for supplying a degreasing liquid to a strip-shaped metal sheet to perform a degreasing treatment, a surface-regulating section for supplying a conditioning liquid to the strip-shaped metal sheet to perform a surface-regulating treatment, and a strip-shaped metal sheet. A developing section that supplies a developing solution to the developing section, a hardening section that supplies a hardening liquid to the strip-shaped metal sheet and performs a hardening process, and a chamfering section that supplies a surface to the strip-shaped metal sheet and performs a chamfering process. Processing unit,
One of the processing units such as a stripping unit that supplies a stripping solution to the strip-shaped metal sheet and performs a stripping process, and a rust-proofing unit that supplies a rust-preventing solution to the strip-shaped metal sheet and performs a rust-proofing process. The present invention may be applied. In these cases, similar to the various cleaning effects (the uniformity of the cleaning process, the improvement in the speed of the cleaning process, etc.) in the first to fourth embodiments as described above, the degreasing effect and the cleaning effect are respectively adjusted. A surface treatment effect, a development treatment effect, a hardening treatment effect, a surface treatment treatment effect, a film removal treatment effect, or a rust prevention treatment effect can be obtained.

In the above-described first to fourth embodiments, a shadow mask material used for manufacturing a shadow mask for a color cathode-ray tube has been described as an example of the band-shaped thin metal plate. The present invention can also be applied to a strip-shaped thin metal plate used for manufacturing an aperture grill for a pipe, a lead frame for a semiconductor element, or the like.

In addition, various design changes can be made within the scope of the matters described in the claims.

[0134]

As described above in detail, according to the apparatus for processing a strip-shaped thin metal sheet according to the first aspect of the present invention, the space occupied by the apparatus can be reduced. Further, there is an effect that the processing surface of the band-shaped metal sheet can be uniformly processed while the processing speed of the processing surface of the band-shaped metal sheet is improved. Further, there is an effect that the leakage of the processing liquid to the outside of the liquid storage tank is prevented, and a change in the property of the processing liquid in the liquid storage tank is suppressed.

Further, according to the apparatus for processing a strip-shaped metal sheet according to the second aspect of the present invention, the consumption of the processing liquid from the liquid supply nozzle can be suppressed low, and the processing of the processing surface of the strip-shaped metal sheet can be broadened. This has the effect of being uniform over the range.

Further, according to the apparatus for processing a strip-shaped metal sheet according to the third aspect of the invention, there is an effect that the processing of the processing surface of the strip-shaped metal sheet is further uniformed.

Further, according to the strip metal sheet processing apparatus of the present invention, it is possible to further suppress the consumption of the processing liquid and to further suppress the change in the property of the processing liquid in the liquid storage tank. .

Further, according to the strip metal sheet processing apparatus of the present invention, the consumption of the processing liquid from the liquid supply nozzle can be suppressed low, and the processing of the processing surface can be made uniform over a wide range. In addition, there is an effect that the processing speed is improved.

Further, according to the apparatus for treating a strip-shaped metal sheet according to the sixth aspect of the invention, there is an effect that the processing speed of the processing surface can be further improved.

Further, according to the strip metal sheet processing apparatus of the present invention, there is an effect that the consumption of the processing liquid can be suppressed.

Further, according to the strip-shaped metal sheet processing apparatus of the present invention, there is an effect that the processing of the processing surface with the processing liquid can be made more uniform.

Further, according to the strip metal sheet processing apparatus of the ninth aspect, there is an effect that the processing surface can be processed more uniformly over a wide range.

According to the apparatus for treating a strip-shaped metal sheet according to the tenth aspect of the present invention, there is an effect that the treatment of the treated surface with the treatment liquid can be further uniformized.

Further, according to the apparatus for processing a strip-shaped metal sheet according to the eleventh aspect of the invention, there is an effect that the consumption of the processing liquid can be reduced.

Further, according to the strip metal sheet processing apparatus of the twelfth aspect, there is an effect that the processing surfaces on both sides of the strip metal sheet can be surely processed.

Further, according to the strip metal sheet processing apparatus of the thirteenth aspect, there is an effect that the entire processing surface of the strip metal sheet can be surely processed.

According to the strip metal sheet processing apparatus of the present invention, if at least one liquid supply nozzle is provided on one side of the strip metal sheet, the processing surfaces on both sides of the strip metal sheet are processed. It has the effect of being able to do so.

According to the method for treating a strip-shaped metal sheet according to the fifteenth aspect of the invention, there is an effect that the overall treatment time of the treated surface of the strip-shaped metal sheet can be shortened and the treatment efficiency can be improved. In addition, there is an effect that the processing of the processing surface of the strip-shaped metal sheet can be performed uniformly, and a change in the properties of the processing liquid can be suppressed.

According to the method for treating a strip-shaped metal sheet according to the sixteenth aspect of the present invention, the consumption of the treatment liquid in the liquid supply step can be reduced, and the treatment of the treatment surface with the treatment liquid can be performed over a wide range. This has the effect of being able to be uniform.

[Brief description of the drawings]

FIG. 1 is a schematic diagram showing a configuration of a shadow mask material processing apparatus according to a first embodiment of the present invention, particularly, a cleaning processing unit.

FIG. 2 is a perspective view showing a configuration of a part of a liquid guide plate and a nozzle close to a shadow mask material according to a second embodiment of the present invention.

FIG. 3 is a schematic diagram showing a configuration of a processing apparatus for a shadow mask material according to a second embodiment of the present invention, particularly, a cleaning processing unit.

FIG. 4 is a schematic diagram showing a configuration of a processing apparatus for a shadow mask material according to a third embodiment of the present invention, particularly, a cleaning processing unit.

FIG. 5 is a schematic view showing a configuration of a processing apparatus for a shadow mask material according to a fourth embodiment of the present invention, in particular, a cleaning processing unit.

FIG. 6 is a schematic view mainly showing a modified form of the liquid guide plate according to the present invention.

FIG. 7 is a schematic diagram showing a configuration of a cleaning processing unit of a conventional shadow mask material processing apparatus.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 10 Processing part 11 Processing liquid tank 11a Side wall 11b Upper end part 12 Roller 100, 200, 300, 400 Cleaning processing part 110 Liquid storage part 111 Cleaning liquid tank (liquid storage tank) 111a Side wall 111b Upper end part 112 Drainage port 120 Roller part 121, 122, 123 Roller (conveying means) 130 Nozzle section 131, 132, 133, 134 Nozzle block 131a, 132a, 133a, 134a Nozzle (liquid supply nozzle) 140 Liquid guide section 141, 142, 143, 144 Liquid guide plate (liquid guide) 141a, 142a, 143a, 144a Guide surface (liquid guide surface) 141b, 142b, 143b, 144b Guide groove (groove) 141c, 142c, 143c, 144c Lower end of guide surface (lower end of liquid guide surface) 150 Liquid Circulation unit 151 Circulation pipe (liquid pipe) 15 2 Pump (liquid circulation pump) 153 Temperature controller 154 Filter 230 Nozzle part 231,232 Nozzle block 231a, 232a Nozzle (liquid supply nozzle) 240 Liquid guide part 241,242 Liquid guide plate (liquid guide member) 241a, 242a Guide surface (Liquid guide surface) 241b, 242b Guide groove (groove) 241c, 242c Lower end of guide surface (lower end of liquid guide surface) 310 Liquid receiving part 311 Liquid receiving tank (liquid recovery tank) 311a Side wall 311b Upper end 312 Drainage Mouth 420 Roller 421, 422, 423, 424 Roller (conveying means) 430 Nozzle 431a, 432a Nozzle (liquid supply nozzle) 440 Liquid guide 441, 442 Liquid guide plate (liquid guide member) 441a, 442a Guide surface (liquid) Guide surface) A Upper part of liquid surface B Lower part of liquid surface D1 How to incline guide surface (Direction in which the liquid guide surface is inclined) D2 Direction perpendicular to the inclination direction of the guide surface F Longitudinal direction of the shadow mask material W, transport direction (longitudinal direction of the strip-shaped metal sheet) K Gap L Cleaning liquid (treatment liquid) La Liquid level N Nozzle (liquid supply nozzle) PU processing device P Flat guide surface (liquid guide surface) R Curved guide surface (liquid guide surface) S Processing surface of shadow mask material W (processing surface of strip-shaped metal sheet) TR1 unwinding Apparatus (transporting means) TR2 Winding device (transporting means) W Shadow mask material (band-shaped metal sheet) WA Width of guide surface WB Width of shadow mask material (width of band-shaped metal sheet)

 ────────────────────────────────────────────────── ─── Continued on the front page F term (reference) 4K044 AA01 AB02 BC02 CA04 CA16 CA64 CA71 4K053 PA02 PA06 PA12 QA06 SA04 SA06 TA11 XA01 XA22 XA26 YA17

Claims (16)

[Claims] 1. A liquid storage tank for storing a processing liquid for processing a strip-shaped metal sheet, and a strip-shaped metal sheet so that the strip-shaped metal sheet passes through the liquid surface of the processing liquid stored in the liquid storage tank. Conveying means capable of being conveyed along the longitudinal direction thereof, of the band-shaped sheet metal being conveyed by the conveying means, with respect to the processing surface of the band-shaped metal sheet located above the liquid level of the processing liquid A liquid supply nozzle for supplying a processing liquid equivalent to the processing liquid stored in the liquid storage tank. 2. A liquid guide formed at a position close to the processing surface of the strip-shaped metal sheet, the liquid guide surface guiding the processing liquid supplied from the liquid supply nozzle in a direction along the processing surface of the strip-shaped metal sheet. The apparatus according to claim 1, further comprising a member. 3. The liquid guide surface of the liquid guide member is provided such that a lower end portion thereof is immersed in the processing liquid in the liquid storage tank. For processing strip-shaped sheet metal. 4. The liquid storage tank and the liquid supply nozzle are connected to each other, and a liquid pipe through which a processing liquid can flow is interposed at an intermediate portion of the liquid pipe and stored in the liquid storage tank. 4. The apparatus according to claim 1, further comprising a liquid circulation pump for collecting the processing liquid and sending the processing liquid to the liquid supply nozzle. 5. A transport means capable of transporting a strip-shaped metal sheet along its longitudinal direction; a liquid supply nozzle for supplying a processing liquid to a processing surface of the strip-shaped metal sheet being transported by the transport means; A liquid guide member that guides the processing liquid supplied from the liquid supply nozzle in a direction along the processing surface of the strip-shaped metal sheet, the liquid guide member being formed at a position close to the processing surface of the strip-shaped metal sheet. An apparatus for treating a strip-shaped metal sheet. 6. The apparatus for processing a strip-shaped metal sheet according to claim 5, wherein a processing surface of the strip-shaped metal sheet crosses a horizontal plane. 7. A liquid recovery tank for recovering a processing liquid supplied from the liquid supply nozzle and guided by the liquid guide member and flowing down, connecting the liquid recovery tank to the liquid supply nozzle and processing the inside. A liquid pipe through which the liquid can flow, and a liquid circulation pump interposed at an intermediate portion of the liquid pipe and for sending the processing liquid collected in the liquid recovery tank to the liquid supply nozzle. The apparatus for processing a strip-shaped metal sheet according to claim 5. 8. The belt-like shape according to claim 2, wherein the liquid guide surface of the liquid guide member is a substantially parallel plane close to the processing surface of the strip-shaped metal sheet. Metal sheet processing equipment. 9. The processing surface of the strip-shaped metal sheet and the liquid guiding surface of the liquid guiding member both intersect with a vertical plane, and the liquid guiding member is below the processing surface of the strip-shaped metal sheet. The apparatus for processing a strip-shaped metal sheet according to claim 8, wherein at least one is provided in the apparatus. 10. The processing surface of the strip-shaped metal sheet and the liquid guide surface of the liquid guide member both intersect with a horizontal plane, and the liquid guide surface of the liquid guide member is inclined. 9. The apparatus according to claim 8, wherein a groove is formed in a direction intersecting the direction. 11. The processing surface of the strip-shaped metal sheet and the liquid guide surface of the liquid guide member both intersect with a horizontal plane, and the liquid guide surface of the liquid guide member is inclined. 9. The strip-shaped sheet metal processing apparatus according to claim 8, wherein a groove is formed in the direction. 12. A pair of said liquid guide members are provided at positions sandwiching said band-shaped metal sheet, and liquid guide surfaces of said pair of liquid guide members are provided so as to face each other with said band-shaped metal sheet interposed therebetween. The apparatus for treating a strip-shaped metal sheet according to any one of claims 2 to 11, characterized in that: 13. The processing of a strip-shaped metal sheet according to claim 2, wherein the liquid guide surface of the liquid guide member is provided in a range covering the width of the strip-shaped metal sheet. apparatus. 14. An apparatus for processing a strip-shaped metal sheet according to claim 1, wherein the strip-shaped metal sheet has a plurality of through-holes penetrating the strip-shaped metal sheet. . 15. An immersion treatment step in which a strip-shaped metal sheet is immersed in a treatment liquid for treatment; A transporting step of transporting the thin plate along its longitudinal direction, of the strip-shaped metal sheet transported in the transporting step,
A liquid supply step of supplying a processing liquid equivalent to the processing liquid in which the band-shaped metal sheet is immersed in the immersion processing step, for the processing surface of the band-shaped metal sheet located above the liquid level of the processing liquid, A method for treating a strip-shaped metal sheet, comprising: 16. A transporting step of transporting the strip-shaped metal sheet along its longitudinal direction; a liquid supply step of supplying a processing liquid to a processing surface of the strip-shaped metal sheet transported in the transporting step; A liquid guiding surface formed at a position close to the processing surface of the band-shaped metal sheet, a liquid guiding step of guiding the processing liquid supplied in the liquid supply step in a direction along the processing surface of the band-shaped metal sheet. A method for treating a strip-shaped metal sheet, comprising: