JP2001150327A - Polishing method using fluid abrasive mixed with subliminate material - Google Patents

Polishing method using fluid abrasive mixed with subliminate material

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Publication number
JP2001150327A
JP2001150327A JP33241299A JP33241299A JP2001150327A JP 2001150327 A JP2001150327 A JP 2001150327A JP 33241299 A JP33241299 A JP 33241299A JP 33241299 A JP33241299 A JP 33241299A JP 2001150327 A JP2001150327 A JP 2001150327A
Authority
JP
Japan
Prior art keywords
polishing
abrasive
abrasives
temperature
fluid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33241299A
Other languages
Japanese (ja)
Inventor
Motoyuki Suzuki
基之 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Motor Corp
Original Assignee
Toyota Motor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyota Motor Corp filed Critical Toyota Motor Corp
Priority to JP33241299A priority Critical patent/JP2001150327A/en
Publication of JP2001150327A publication Critical patent/JP2001150327A/en
Pending legal-status Critical Current

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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To realize abrasives for preventing overheat of the abrasives. SOLUTION: Granular materials 26 to be subliminated at the temperature of abrasives during polishing are mixed in fluid abrasives besides abrasive grains 22. By using the abrasives, when the temperature of the abrasive grain rises to some extent during polishing, subliminate materials 26 contained in the abrasives are subliminated. In sublimination, since heat is absorbed from the abrasives, the abrasives are effectively cooled, and a base material can be prevented from being softened.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、流動性母剤に多数
の砥粒が分散した流動性研磨剤を用いて研磨する方法に
関する。特にその流動性研磨剤を加圧した状態で被研磨
面に沿って流動させることでその被研磨面を研磨する技
術に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for polishing using a fluid abrasive in which a large number of abrasive grains are dispersed in a fluid matrix. In particular, the present invention relates to a technique for polishing the surface to be polished by flowing the fluid abrasive along the surface to be polished in a pressurized state.

【0002】[0002]

【従来の技術】特開平6−179234号公報に上記研
磨技術が記載されている。この技術を図1を用いて説明
する。図1は略筒状のワーク10の内面10aを研磨す
る場合を例示しており、研磨装置とワークの一部を破断
して内部を図示している。この研磨装置では上側シリン
ダ18と下側シリンダ20の間に筒状のワーク10を挟
み込む。上側シリンダ18の下端には上側のワーク取り
付け台8が固定され、下側シリンダ20の上端には下側
のワーク取り付け台12が固定されており、各ワーク取
り付け台8、12に開口が設けられているために、各ワ
ーク取り付け台8、12を介して上側シリンダ18と下
側シリンダ20の間に筒状のワーク10が挟み込まれる
と、上側チャンバ4と下側チャンバ14とワーク10の
内側空間が相互に連通して大気からは遮断された密閉空
間21を作り出す。この密封空間21に流動性研磨剤6
が充填されている。この流動性研磨剤6が充填された密
閉空間21の上側には上側ピストン2が位置しており、
下側には下側ピストン16が位置しており、上側ピスト
ン2には図示されない上側の油圧シリンダが連結され、
下側ピストン16には図示されない下側の油圧シリンダ
が連結されている。この技術で用いられる流動性研磨剤
6は図3に模式的に示すように、例えば粘弾性樹脂や有
機媒体や液などの流動性母剤24のなかに、多数の砥粒
22を混在させたものである。
2. Description of the Related Art The above polishing technique is described in Japanese Patent Application Laid-Open No. Hei 6-179234. This technique will be described with reference to FIG. FIG. 1 illustrates a case in which the inner surface 10a of a substantially cylindrical workpiece 10 is polished, in which a polishing apparatus and a part of the workpiece are cut away to show the inside. In this polishing apparatus, a cylindrical work 10 is sandwiched between an upper cylinder 18 and a lower cylinder 20. An upper work mount 8 is fixed to a lower end of the upper cylinder 18, and a lower work mount 12 is fixed to an upper end of the lower cylinder 20. Openings are provided in the respective work mounts 8 and 12. Therefore, when the cylindrical work 10 is sandwiched between the upper cylinder 18 and the lower cylinder 20 via the work mounts 8 and 12, the upper chamber 4, the lower chamber 14, and the inner space of the work 10 Communicate with each other to create a closed space 21 which is isolated from the atmosphere. In this sealed space 21, fluid abrasive 6
Is filled. The upper piston 2 is located above the closed space 21 filled with the fluid abrasive 6,
A lower piston 16 is located on the lower side, and an upper hydraulic cylinder (not shown) is connected to the upper piston 2,
A lower hydraulic cylinder (not shown) is connected to the lower piston 16. As shown schematically in FIG. 3, the fluid abrasive 6 used in this technique has a large number of abrasive grains 22 mixed in a fluid matrix 24 such as a viscoelastic resin, an organic medium, or a liquid. Things.

【0003】研磨方法の実行時には、例えば下側ピスト
ン16を100kgの力で上側に付勢した状態で上側ピ
ストン2に120kgの力を下向きに加える。この結
果、流動性研磨剤6が充填されている密閉空間21は1
00kgの力で加圧され、加圧状態で上下のピストン
2,16が同じ速度で下降する。この下降に伴って加圧
された流動性研磨剤6がワーク10内側の被研磨面10
aに沿って上から下に流動し、ワーク10内側の被研磨
面10aが研磨される。上側ピストン2が下死点に達し
たら、今度は、上側ピストン2を100kgの力で下側
に付勢した状態で下側ピストン16に120kgの力を
上向きに加える。これによって、今度は、加圧された流
動性研磨剤6がワーク10内側の被研磨面10aに沿っ
て下から上に流動し、ワーク10内側の被研磨面10a
が研磨される。ピストン2と16の上下動を繰返し反転
することで、研磨作業を長時間に亘って継続する事がで
きる。
When the polishing method is executed, a force of 120 kg is applied to the upper piston 2 downward while the lower piston 16 is urged upward with a force of 100 kg. As a result, the closed space 21 filled with the fluid abrasive 6 is 1
It is pressurized by a force of 00 kg, and the upper and lower pistons 2 and 16 descend at the same speed in the pressurized state. The fluid abrasive 6 pressurized along with the downward movement causes the polished surface 10 inside the work 10 to be polished.
Flowing from top to bottom along a, the polished surface 10a inside the work 10 is polished. When the upper piston 2 reaches the bottom dead center, a force of 120 kg is applied upward to the lower piston 16 with the upper piston 2 urged downward with a force of 100 kg. Thereby, the pressurized fluid abrasive 6 flows upward from below along the polished surface 10a inside the work 10, and the polished surface 10a inside the work 10 is turned on.
Is polished. By repeatedly reversing the vertical movement of the pistons 2 and 16, the polishing operation can be continued for a long time.

【0004】上記装置によって研磨作業を長時間に亘っ
て継続させても、意外なことに、研磨の進行程度は期待
したほどには進行しない。その原因を鋭意研究した結
果、流動性研磨剤6の温度が上昇するために、研磨が進
行しないことを確認した。即ち、上下のピストン2,1
6を繰返し上下動させると、流動性研磨剤6の温度が上
昇する。流動性母材24の温度が上昇すると、流動性母
材24が軟化して流動しやすくなる。研磨中、ワーク1
0と接する部分の流動性母材24はワーク10によって
冷却されるために、流動性母材24は中心部において高
温となりワーク10に接する研磨部において低温とな
る。即ち、研磨中、流動性母材24は中心部で流動しや
すく、研磨に寄与するワーク10に接する部位で流動し
にくい状態となってしまう。この状態で研磨作業を長時
間に亘って継続させても、期待したほどには研磨が進行
しない。さらに研磨剤の温度が上昇すると流動性母材2
4が劣化し、研磨作用が得られなくなってしまう。
[0004] Surprisingly, even if the polishing operation is continued for a long time by the above-mentioned apparatus, the progress of polishing does not proceed as expected. As a result of earnestly studying the cause, it was confirmed that the polishing did not proceed because the temperature of the fluid abrasive 6 increased. That is, the upper and lower pistons 2, 1
6 is repeatedly moved up and down, the temperature of the fluid abrasive 6 rises. When the temperature of the flowable base material 24 rises, the flowable base material 24 is softened and easily flows. During polishing, work 1
Since the fluid base material 24 at the portion in contact with 0 is cooled by the work 10, the flow base material 24 has a high temperature in the central portion and has a low temperature in the polishing section in contact with the work 10. That is, during polishing, the fluid base material 24 tends to flow at the central portion, and hardly flows at a portion in contact with the workpiece 10 that contributes to polishing. Even if the polishing operation is continued for a long time in this state, the polishing does not proceed as expected. When the temperature of the abrasive further increases, the flowable base material 2
4 deteriorates and the polishing action cannot be obtained.

【0005】研磨中に研磨剤6の温度が上昇しないよう
にする技術が開発されており、典型的には上シリンダ1
8と下シリンダ20の周囲に冷却水通路を設けることに
よって流動性研磨剤6を外から冷やす方法が知られてい
る。この種の技術、即ち流動性研磨剤6を冷却装置で冷
却する技術が特開平8-243902号公報や特開平1
0-180621号公報に記載されている。
A technique for preventing the temperature of the abrasive 6 from increasing during polishing has been developed.
A method of cooling the fluid abrasive 6 from the outside by providing a cooling water passage around the periphery of the lower cylinder 8 and the lower cylinder 20 is known. This type of technology, that is, a technology of cooling the fluid abrasive 6 with a cooling device, is disclosed in Japanese Patent Application Laid-Open Nos. 8-243902 and
No. 0-180621.

【0006】[0006]

【発明が解決しようとする課題】研磨装置に冷却装置を
付加する技術では、流動性研磨剤の中心部を効果的に冷
却する事が難しく、前記した研磨効率が低下する現象を
効果的に抑制する事が難しい。この他、装置自体を改良
する必要があってコストアップとなること、冷却装置が
作業スペースに張出して作業性を損ねるといった問題を
もたらす。本発明は、特別な冷却装置を用いないでも研
磨剤の温度上昇を防止できる技術を実現する試みの中で
創作されたものである。
In the technology in which a cooling device is added to the polishing apparatus, it is difficult to effectively cool the central portion of the fluid abrasive, and the above-mentioned phenomenon in which the polishing efficiency is reduced is effectively suppressed. Difficult to do. In addition, there is a need to improve the apparatus itself, which leads to an increase in cost, and a problem that the cooling apparatus extends to the work space and impairs the workability. The present invention was created in an attempt to realize a technique capable of preventing a rise in the temperature of an abrasive without using a special cooling device.

【0007】[0007]

【課題を解決するための手段と作用】この発明の研磨方
法は、被研磨面に沿って加圧された流動性研磨剤を流動
させることで被研磨面を研磨する方法を改良した方法で
あって、砥粒の他に、研磨中の研磨剤の温度で昇華する
粒状物質を混在した流動性研磨剤を用いることを特徴と
する。この方法によると、研磨中に研磨剤の温度がある
程度上昇すると、研磨剤に含まれている昇華性物質が昇
華し、その昇華に際して研磨剤から吸熱することから研
磨剤は効果的に冷却され、流動性母材の軟化を防止で
き、長時間の研磨作業中に研磨剤の研磨能力を高い状態
に維持できる。このようにして、効率的な研磨作業を長
時間に亘って継続する事が可能となる。
The polishing method of the present invention is an improved method of polishing a surface to be polished by flowing a flowable abrasive which is pressurized along the surface to be polished. Further, in addition to the abrasive grains, a fluid abrasive in which a particulate substance that sublimes at the temperature of the abrasive being polished is mixed is used. According to this method, when the temperature of the abrasive rises to some extent during polishing, the sublimable substance contained in the abrasive sublimes, and the abrasive is effectively cooled because heat is absorbed from the abrasive during the sublimation, The softening of the fluid base material can be prevented, and the polishing ability of the abrasive can be maintained at a high level during a long polishing operation. In this way, efficient polishing can be continued for a long time.

【0008】この発明で用いる昇華性物質とは、研磨中
の研磨剤の温度(混在している昇華性物質の昇華に伴う
冷却によって温度上昇が抑制されるとはいえ、研磨剤の
温度は研磨作業中にある程度は上昇する)以下で昇華す
る物質をいい、典型的にはドライアイスや樟脳が例示さ
れる。固相から気相に直接変化する物理的に厳密な昇華
ではないものの、液相の状態が短くて一時的に液相に変
化する事が研磨能力や研磨剤の変質に事実上の影響を及
ぼさないものも、ここでいう昇華性物質に含まれる。
The sublimable substance used in the present invention is defined as the temperature of the polishing agent during polishing (although the temperature rise is suppressed by cooling due to the sublimation of the sublimable material mixed in, the temperature of the polishing agent is reduced by polishing. (Substance that rises to some extent during work)), and refers to a substance that sublimates below, typically exemplified by dry ice and camphor. Although it is not physically strict sublimation that changes directly from the solid phase to the gas phase, the temporary change of the liquid phase to a temporary liquid phase has a substantial effect on the polishing ability and the deterioration of the abrasive. Those that do not exist are also included in the sublimable substance here.

【0009】[0009]

【発明の実施の形態】この発明は研磨方法ないしは研磨
剤の発明であり、研磨装置自体は従来のものをそのまま
使用できる。例えば図1に例示した従来の研磨装置がそ
のまま使用できる。その研磨装置の説明は先にしたので
ここでは繰返さない。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention relates to a polishing method or an abrasive, and a conventional polishing apparatus can be used as it is. For example, the conventional polishing apparatus illustrated in FIG. 1 can be used as it is. Since the description of the polishing apparatus has been given earlier, it will not be repeated here.

【0010】この実施の形態では、研磨剤6として図2
に模式的に示したものを用いる。この研磨剤6は、加圧
されると流動する粘弾性樹脂24を母剤とし、そこに多
数の砥粒22とドライアイス粒26が分散したものであ
る。
In this embodiment, an abrasive 6 is used as shown in FIG.
Is used. The abrasive 6 has a base material of a viscoelastic resin 24 which flows when pressurized, and a number of abrasive grains 22 and dry ice grains 26 are dispersed therein.

【0011】この研磨剤6を用いて図1の研磨装置で研
磨すると、研磨剤6が温度上昇するのに対応してドライ
アイス粒26が昇華し、研磨剤6を冷却する。この結
果、研磨中の研磨剤6の温度を、仮にドライアイス粒2
6が分散されていなければ上昇してしまう温度よりも低
温度に保つ。従って研磨方法の実行中に、研磨剤6に含
まれている流動性母材24が熱によって軟化しない状態
を長時間に亘って維持する事ができ、研磨効率が高い状
態を保ちながら研磨作業を持続できる。
When this polishing agent 6 is polished by the polishing apparatus shown in FIG. 1, the dry ice grains 26 sublime in response to the temperature rise of the polishing agent 6, thereby cooling the polishing agent 6. As a result, the temperature of the abrasive 6 during polishing is temporarily reduced to the dry ice particles 2.
If the temperature is not dispersed, the temperature is kept lower than the temperature at which the temperature rises. Therefore, during the execution of the polishing method, the state in which the fluid base material 24 contained in the abrasive 6 is not softened by heat can be maintained for a long time, and the polishing operation can be performed while maintaining the state of high polishing efficiency. Can last.

【0012】研磨方法の実行中に研磨剤6を比較的低温
に保つために、ドライアイス粒26が徐々に昇華し、研
磨剤6の中に炭酸ガスの気泡が生じる。この気泡は、研
磨剤6が全体として流動するために、速やかに、ワーク
10とワーク取付け台8の間の微小なクリアランスとワ
ーク10とワーク取付け台12の間の微小なクリアラン
スから大気に放出される。
In order to keep the polishing agent 6 at a relatively low temperature during the execution of the polishing method, the dry ice particles 26 gradually sublime, and carbon dioxide gas bubbles are generated in the polishing agent 6. Since the abrasive 6 flows as a whole, the air bubbles are quickly released to the atmosphere from the minute clearance between the work 10 and the work mount 8 and from the minute clearance between the work 10 and the work mount 12. You.

【0013】この研磨剤6は固相から液相を経ることな
く直接に気相に変化するドライアイスを使用するため
に、研磨剤6、特にその母剤(粘弾性樹脂)24の粘性
を変化させたり品質を劣化させたりする事が無く、研磨
剤6の使用寿命を低下させることが無い。
Since the abrasive 6 uses dry ice which directly changes from a solid phase to a gas phase without passing through a liquid phase, it changes the viscosity of the abrasive 6, especially its base material (viscoelastic resin) 24. It does not cause deterioration or quality deterioration, and does not reduce the service life of the abrasive 6.

【0014】[0014]

【発明の効果】この発明の流動性研磨剤は従来からの研
磨装置で使用できるために適用範囲が広い。さらに、研
磨効率を長時間に亘って維持するために装置を改良する
必要が無く、低コストで導入する事ができる。また、研
磨中に流動性研磨剤が過熱されることを防止することか
らワークが過熱されることも防止でき、ワークが熱膨張
した状態で研磨されて結果として所望の寸法精度が得ら
れないとか、ワークが意図せずに熱処理されてしまうと
いったことを防止することができる。
The fluid abrasive of the present invention has a wide range of application because it can be used in a conventional polishing apparatus. Further, there is no need to improve the apparatus for maintaining the polishing efficiency over a long period of time, and the apparatus can be introduced at low cost. Further, since the fluid abrasive is prevented from being overheated during polishing, the work can be prevented from being overheated, and the desired dimensional accuracy cannot be obtained as a result of the work being polished in a thermally expanded state. In addition, it is possible to prevent the workpiece from being unintentionally heat-treated.

【図面の簡単な説明】[Brief description of the drawings]

【図1】研磨方法を実施する研磨装置の一部破断斜視
図。
FIG. 1 is a partially cutaway perspective view of a polishing apparatus that performs a polishing method.

【図2】実施の形態に係わる研磨剤を模式的に示す図。FIG. 2 is a diagram schematically showing an abrasive according to the embodiment.

【図3】従来の研磨剤を模式的に示す図。FIG. 3 is a diagram schematically showing a conventional abrasive.

【符号の説明】[Explanation of symbols]

2 :上側ピストン 4 :
上側チャンバ 6 :研磨剤 8 :
上側のワーク取り付け台 10 :ワーク 10a:
被研磨面 12 :下側のワーク取り付け台 14 :
下側チャンバ 16 :下側ピストン 18 :
上側シリンダ 20 :下側シリンダ
2: Upper piston 4:
Upper chamber 6: Abrasive 8:
Upper work mount 10: Work 10a:
Surface to be polished 12: Lower work mounting base 14:
Lower chamber 16: Lower piston 18:
Upper cylinder 20: Lower cylinder

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 被研磨面に沿って加圧された流動性研磨
剤を流動させることで被研磨面を研磨する方法におい
て、砥粒の他に、研磨中の研磨剤の温度で昇華する粒状
物質を流動性母材に混在した流動性研磨剤を用いること
を特徴とする研磨方法。
1. A method of polishing a surface to be polished by flowing a flowable abrasive pressurized along the surface to be polished, wherein the granular material sublimates at the temperature of the polishing agent being polished in addition to the abrasive grains. A polishing method comprising using a flowable abrasive in which a substance is mixed in a flowable base material.
JP33241299A 1999-11-24 1999-11-24 Polishing method using fluid abrasive mixed with subliminate material Pending JP2001150327A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33241299A JP2001150327A (en) 1999-11-24 1999-11-24 Polishing method using fluid abrasive mixed with subliminate material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33241299A JP2001150327A (en) 1999-11-24 1999-11-24 Polishing method using fluid abrasive mixed with subliminate material

Publications (1)

Publication Number Publication Date
JP2001150327A true JP2001150327A (en) 2001-06-05

Family

ID=18254690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33241299A Pending JP2001150327A (en) 1999-11-24 1999-11-24 Polishing method using fluid abrasive mixed with subliminate material

Country Status (1)

Country Link
JP (1) JP2001150327A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006026475A (en) * 2004-07-13 2006-02-02 Nissan Motor Co Ltd Retouching method of coating film
CN106584259A (en) * 2016-11-24 2017-04-26 京磁材料科技股份有限公司 Die maintaining equipment and method
JP2019014001A (en) * 2017-07-05 2019-01-31 新日鐵住金株式会社 Method for polishing surface of rod-like test piece
CN115673998A (en) * 2022-12-30 2023-02-03 钜亚汽车零部件科技(太仓)有限公司 Polishing device and polishing method for special-shaped porous part

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006026475A (en) * 2004-07-13 2006-02-02 Nissan Motor Co Ltd Retouching method of coating film
JP4701647B2 (en) * 2004-07-13 2011-06-15 日産自動車株式会社 How to repair the coating
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