JP2001107282A - Method for holding suspendability of cathode starting sheet in electrolytic refining and molding device for cathode starting sheet for implementing the method - Google Patents

Method for holding suspendability of cathode starting sheet in electrolytic refining and molding device for cathode starting sheet for implementing the method

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Publication number
JP2001107282A
JP2001107282A JP27929399A JP27929399A JP2001107282A JP 2001107282 A JP2001107282 A JP 2001107282A JP 27929399 A JP27929399 A JP 27929399A JP 27929399 A JP27929399 A JP 27929399A JP 2001107282 A JP2001107282 A JP 2001107282A
Authority
JP
Japan
Prior art keywords
cathode
seed plate
plate
cathode seed
electrolytic refining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27929399A
Other languages
Japanese (ja)
Inventor
Yuji Ando
勇治 安東
Shuichi Kubo
秀一 久保
Akira Ueno
明 上野
Yasukatsu Sasaki
康勝 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Mining Holdings Inc
Eneos Corp
Original Assignee
Nippon Mining and Metals Co Ltd
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining and Metals Co Ltd, Nippon Mining Co Ltd filed Critical Nippon Mining and Metals Co Ltd
Priority to JP27929399A priority Critical patent/JP2001107282A/en
Publication of JP2001107282A publication Critical patent/JP2001107282A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a method for holding the suspendability of cathode starting sheets in electrolytic refining which is capable of assuring always the finest suspendability by taking the differences in the processing adequateness of the cathode starting sheets K for electrolytic refining and is capable of providing the cathode sheets K with ruggedness of a plurality of depths without preparing many metal molds and a molding device for the cathode starting sheets for implementing the method. SOLUTION: The method for holding the suspendability consists in changing the depths of the rugged parts alternately formed on the front and rear surfaces of the cathode starting sheets K according to the characters, such as thicknesses and hardnesses, of the cathode starting sheets K and the molding device for the cathode starting sheets for implementing the method is so constituted that piece members 23a, 23b, 23c, 28a, 28b, 28c, 28d and 28e and liners disposed at the upper mold 20 and lower mold 25 are made respectively exchangeable in order to form the ruggedness on the front and rear surfaces of the cathode starting sheets K to be pressed and that the depths of the rugged parts to be formed on the front and rear surfaces of the cathode starting sheets K may be selected by exchanging the piece members and liners disposed at the upper mold 20 and the lower mold 25 with those of prescribed heights.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電解精錬における
陰極種板の懸垂性保持方法及びその方法を実施するため
の陰極種板の成型装置に関し、さらに詳しくは、電解精
錬に使用される陰極種板を電解槽内で垂直に浸漬するた
めの陰極種板の懸垂性保持方法及びその懸垂性保持方法
を実施するための陰極種板の成型装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for maintaining the suspension of a cathode seed plate in electrolytic refining and a molding apparatus for the cathode seed plate for performing the method, and more particularly, to a cathode seed used for electrolytic refining. The present invention relates to a method for maintaining a suspension of a cathode seed plate for vertically immersing a plate in an electrolytic cell, and a molding apparatus for a cathode seed plate for performing the suspension maintenance method.

【0002】[0002]

【従来の技術】初めに、電解精錬設備の概要について説
明する(図8参照)。電解槽30は、上に向かって解放
した直方体形状の槽で、その長側壁30cの上面に共通
導体32(ブスバー)を設置する。電解槽30は、図7
に最も良く示されているように縦方向及び横方向に複数
隣接して設置されており、その総数は数百槽にも及ぶ。
各電解槽30の電解液には、複数(Cuの場合、通常、
20枚から50枚程度)の陰極種板(カソード板)K及
び陽極耳付き型(アノード板)Aが交互に平行になるよ
うにして浸漬される。各カソード板Kは、陰極支持用竿
(クロスバー)34に吊り下げられている。陰極支持用
竿34の両端及びアノード板Aの耳部は、左右いずれか
一方の電解槽側壁30cの上面及び他方の電解槽側壁3
0cに設けられた共通導体32にそれぞれ支持されてい
る。
2. Description of the Related Art First, an outline of an electrolytic refining facility will be described (see FIG. 8). The electrolytic cell 30 is a rectangular parallelepiped tank opened upward, and a common conductor 32 (bus bar) is provided on the upper surface of the long side wall 30c. The electrolytic cell 30 is shown in FIG.
As best shown in FIG. 2, a plurality of tanks are installed adjacently in the vertical and horizontal directions, the total number of which is several hundred tanks.
The electrolytic solution in each electrolytic cell 30 includes a plurality (usually, in the case of Cu,
The cathode seed plate (cathode plate) K and the anode eared type (anode plate) A (about 20 to 50 sheets) are immersed alternately in parallel. Each cathode plate K is suspended from a cathode support rod (crossbar) 34. Both ends of the cathode support rod 34 and ears of the anode plate A are connected to the upper surface of one of the left and right electrolytic cell side walls 30c and the other electrolytic cell side wall 3c.
0c are supported by the common conductors 32 provided for the respective conductors.

【0003】図7に示されたウオルカ式電流供給方式で
は、縦横2つずつ合計4つの電解槽30を一組として各
電解槽30の全アノード板Aから全カソード板Kにそれ
ぞれ電流が流れるように配線されている。電解精錬用電
源としては、低電圧、大電流を必要とし、大容量であり
ながら電解操業の条件に応じて広い範囲の電圧調節が可
能であるため、サイリスタ方式又はダイオード方式の半
導体整流器が用いられる。
In the Walker-type current supply system shown in FIG. 7, a total of four electrolytic cells 30 each having two rows and columns are formed as a set so that current flows from all anode plates A to all cathode plates K of each electrolytic cell 30. It is wired to. As a power source for electrolytic refining, a thyristor-type or diode-type semiconductor rectifier is used because it requires a low voltage and a large current, and has a large capacity and can adjust a wide range of voltage according to the conditions of the electrolytic operation. .

【0004】このような電解精錬における正常操業を妨
げる要因として、陰極面での樹脂状晶やコブの発生、陰
極の湾曲、大きな陽極破片による橋渡し等がある。カソ
ード板Kは、概略として、縦横約1m×1mで幅が約
0.6〜0.8mmと非常に薄いため平面性を保持する
ことが難しく湾曲し易い。また、アノード板Aは電解槽
30内に約100mm間隔で整列されており、アノード
AとアノードAの間の間隙にカソード板Kが非常に接近
した状態で浸漬されるのでカソード板Kが電解槽30内
で垂直に吊り下げられないとカソード板Kがアノード板
Aに接触して短絡(ショート)を起こしてしまうことが
ある。短絡が起きると電解電流が短絡部分に集中するた
め、正常な電解精錬が妨げられることとなる。従って、
カソード板Kとアノード板Aは互いに接触することがな
いよう電解槽30内に垂直に吊下げられる懸垂性が要求
される。そこで、従来は、図6に示すように、カソード
板Kをプレス機によりプレスしてカソード板Kの表裏面
に凹凸を設け、電解槽30内へ浸漬したときにカソード
板Kが真っ直ぐ垂直に吊下げられる懸垂性を確保するこ
とが行われていた。
Factors hindering the normal operation in such electrolytic refining include generation of resinous crystals and bumps on the cathode surface, curvature of the cathode, bridging by large anode fragments, and the like. The cathode plate K is approximately 1 m × 1 m in length and width and approximately 0.6 to 0.8 mm in width, which makes it very difficult to maintain flatness and easily curve. The anode plates A are arranged in the electrolytic cell 30 at intervals of about 100 mm, and the cathode plate K is immersed in a state in which the cathode plate K is very close to the gap between the anodes A. If the cathode plate K is not suspended vertically in the inside 30, the cathode plate K may come into contact with the anode plate A to cause a short circuit. When a short circuit occurs, the electrolytic current concentrates on the short-circuit portion, so that normal electrolytic refining is hindered. Therefore,
The cathode plate K and the anode plate A are required to be suspended vertically in the electrolytic cell 30 so as not to contact each other. Therefore, conventionally, as shown in FIG. 6, the cathode plate K is pressed by a pressing machine to form irregularities on the front and back surfaces of the cathode plate K, and when the cathode plate K is immersed in the electrolytic cell 30, the cathode plate K is suspended vertically. Ensuring that the suspension could be lowered was performed.

【0005】[0005]

【発明が解決しようとする課題】しかし、従来は、カソ
ード板Kの表裏面に凹凸を設ければその懸垂性が改善さ
れると考えられていたため、カソード板Kの厚さや硬度
等の特性に関係なく常に同一の金型により同一の凹凸を
設けて電解精錬に供していた。しかし、実際には、カソ
ード板Kの製造ロットごとに懸垂性に差異が見られ、常
に最良の懸垂性が確保出来るものではないことがわかっ
た。その理由としては、製造ロットによるカソード板K
の厚みの違いや含まれる不純物の含量及びその含有割合
等によりカソード板Kの加工適性が異なるものと考えら
れる。そのため、カソード板Kの特性に応じて異なるサ
イズの凹凸を設けることが考えられるが、必要なサイズ
の数だけの金型を用意するのはコスト的に問題があっ
た。
However, conventionally, it has been thought that if the surface of the cathode plate K is provided with irregularities on the front and back surfaces, the suspension property is improved. Irrespective of this, the same concavities and convexities were always provided by the same mold and used for electrolytic refining. However, in practice, there was a difference in the suspension from one production lot of the cathode plate K to the other, and it was found that the best suspension could not always be ensured. The reason is that the cathode plate K
It is considered that the processing suitability of the cathode plate K is different depending on the difference in the thickness, the content of the contained impurities and the content ratio thereof. For this reason, it is conceivable to provide irregularities of different sizes according to the characteristics of the cathode plate K, but there is a problem in terms of cost in preparing dies of the required size.

【0006】そこで、本発明は、このようなカソード板
Kの加工適正の違いを考慮しつつ、常に最良の懸垂性を
確保することが可能な電解精錬における陰極種板の懸垂
性保持方法及びその方法を実施するための陰極種板の成
型装置を提供することを目的とする。
Accordingly, the present invention provides a method of maintaining the suspension of a cathode seed plate in electrolytic refining, which can always ensure the best suspension while taking into account such differences in the processing suitability of the cathode plate K, and its method. It is an object of the present invention to provide an apparatus for molding a cathode seed plate for performing the method.

【0007】本発明は、また、多数の金型を用意するこ
となく複数の深さの凹凸を設けることが可能な電解精錬
における陰極種板の懸垂性保持方法を実施するための陰
極種板の成型装置を提供することを目的とする。
Another object of the present invention is to provide a cathode seed plate for carrying out a method for maintaining the suspension of a cathode seed plate in electrolytic refining, in which irregularities having a plurality of depths can be provided without preparing a large number of molds. An object is to provide a molding device.

【0008】[0008]

【課題を解決するための手段】上記課題を解決するため
に、請求項1に記載の本発明は、電解精錬に使用される
陰極種板を電解槽内で垂直に浸漬するための陰極種板の
懸垂性保持方法において、陰極種板の表裏面に形成され
る凹凸部の深さを該陰極種板の厚さや硬度等の特性に応
じて変更することを特徴とする電解精錬における陰極種
板の懸垂性保持方法を提供する。
In order to solve the above-mentioned problems, the present invention according to claim 1 provides a cathode seed plate for vertically immersing a cathode seed plate used for electrolytic refining in an electrolytic cell. Wherein the depth of the concave and convex portions formed on the front and back surfaces of the cathode seed plate is changed according to characteristics such as the thickness and hardness of the cathode seed plate. To provide a suspension method.

【0009】上記課題を解決するために、請求項2に記
載の本発明は、請求項1に記載の電解精錬における陰極
種板の懸垂性保持方法において、陰極種板の表裏面に形
成される凹凸の深さは2mm〜4mmであり、該陰極種
板の厚さや硬度等の特性に応じてそのいずれかが選択さ
れることを特徴とする。
According to a second aspect of the present invention, there is provided a method for maintaining the suspension of a cathode seed plate in electrolytic refining according to the first aspect of the present invention. The depth of the unevenness is 2 mm to 4 mm, and one of them is selected depending on characteristics such as the thickness and hardness of the cathode seed plate.

【0010】上記課題を解決するために、請求項3に記
載の本発明は、請求項1又は2に記載の電解精錬におけ
る陰極種板の懸垂性保持方法において、陰極種板の表裏
面に形成される凹凸部は、陰極種板の中心部に形成され
た逆U字状の逆U字状部と、U字状部を囲むように外側
方向に連続して形成された略「コ」の字状のコの字状部
とにより形成されていることを特徴とする。
According to a third aspect of the present invention, there is provided a method for maintaining the suspension of a cathode seed plate in electrolytic refining according to the first or second aspect. The concavo-convex portion is formed of an inverted U-shaped portion formed in the center of the cathode seed plate, and an approximately U-shaped portion formed continuously in the outward direction so as to surround the U-shaped portion. And a U-shaped portion having a U-shape.

【0011】上記課題を解決するために、請求項4に記
載の本発明は、請求項1から3のいずれか1項に記載の
電解精錬における陰極種板の懸垂性保持方法を実施する
ための陰極種板の成型装置において、陰極種板はプレス
加工により成型されると共に、該陰極種板の表裏面に凹
凸を形成するために上金型及び下金型に配設されるピー
ス部材がそれぞれ交換可能とされ、上金型及び下金型に
配設されるピース部材を所定の厚さのものに交換するこ
とにより陰極種板の表裏面に形成される凹凸部の深さを
選択できるように構成されていることを特徴とする。
According to a fourth aspect of the present invention, there is provided a method for maintaining the suspension of a cathode seed plate in electrolytic refining according to any one of the first to third aspects. In the apparatus for molding a cathode seed plate, the cathode seed plate is formed by press working, and piece members provided on an upper mold and a lower mold to form irregularities on the front and back surfaces of the cathode seed plate, respectively. The depth of the concave and convex portions formed on the front and back surfaces of the cathode seed plate can be selected by replacing the piece members provided in the upper mold and the lower mold with those having a predetermined thickness. It is characterized by comprising.

【0012】上記課題を解決するために、請求項5に記
載の本発明は、請求項4に記載の陰極種板の成型装置に
おいて、上金型とピース部材との間及び下金型とピース
部材との間に、ピース部材と同一形状を有し、0.1〜
0.4mmの厚さに形成されたライナを挟むことにより
陰極種板の表裏面に形成される凹凸部の深さを調整でき
るように構成されていることを特徴とする。
According to a fifth aspect of the present invention, there is provided an apparatus for molding a cathode seed plate according to the fourth aspect of the present invention, wherein the lower die and the piece are disposed between the upper die and the piece member. Between the member, has the same shape as the piece member, 0.1 ~
It is characterized in that the depth of the concave and convex portions formed on the front and back surfaces of the cathode seed plate can be adjusted by sandwiching a liner formed to a thickness of 0.4 mm.

【0013】[0013]

【発明の実施の形態】以下、本発明に係る電解精錬にお
ける陰極種板の懸垂性保持方法及びその方法を実施する
ための陰極種板の成型装置について図示された好ましい
実施形態に基づいて詳細に説明する。図1は、本発明に
係る電解精錬における陰極種板の懸垂性保持方法のフロ
ーチャートである。本発明に係る電解精錬における陰極
種板の懸垂性保持方法は、初めに、製板されたカソード
板Kについて製造ロットごとにその厚さや含まれる不純
物の含量及びその含有割合等を検査し、各カソード板K
が有する加工適性を確認する(S1)。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, a method for maintaining the suspension of a cathode seed plate in electrolytic refining according to the present invention and a molding apparatus for a cathode seed plate for performing the method will be described in detail based on the illustrated preferred embodiments. explain. FIG. 1 is a flowchart of a method for maintaining the suspension of a cathode seed plate in electrolytic refining according to the present invention. The method for maintaining the suspension of the cathode seed plate in the electrolytic refining according to the present invention, first, for the manufactured cathode plate K, by inspecting the thickness and the content of the contained impurities and the content ratio thereof for each production lot, Cathode plate K
Confirm the processing suitability (S1).

【0014】ここで、カソード板Kの表裏面に形成され
る凹凸部は、図6に示すように、カソード板Kの中心部
に位置する逆U字状をした逆U字状部41と、逆U字状
部41を囲むようにして外側方向に連続して形成された
「コ」の字状をしたコの字状部41、42によりなり、
この凸部と凹部は交互に連続して設けられている。本実
施形態では、カソード板Kの表裏面に形成する逆U字状
部41及びコの字状部42、43の深さはそれぞれ2m
m〜4mmの間、0.1mm間隔で選択される。
Here, the concave and convex portions formed on the front and back surfaces of the cathode plate K are, as shown in FIG. 6, an inverted U-shaped inverted portion 41 located at the center of the cathode plate K, It consists of U-shaped portions 41 and 42 which are continuously formed in the outward direction so as to surround the inverted U-shaped portion 41, and have a U-shape.
The convex portions and concave portions are provided alternately and continuously. In the present embodiment, the depth of the inverted U-shaped portion 41 and the U-shaped portions 42 and 43 formed on the front and back surfaces of the cathode plate K is 2 m, respectively.
It is selected at intervals of 0.1 mm between m and 4 mm.

【0015】カソード板Kの加工適性検査の結果、一般
的には、例えば、カソード板Kの厚みが厚い場合(約
0.8mm)又は硬度が高い場合にはカソード板Kの表
裏面に形成される凹凸の深さは3mm以上が選択され、
逆にカソード板Kの厚みが薄い場合(約0.6mm)又
は硬度が低い場合には凹凸の深さは3mm以下が選択さ
れる。そして、厚み又は硬度が平均的な場合であれば凹
凸の深さは3mmが選択される(S2)。ただし、カソ
ード板Kの加工適性は厚みや硬度等の各種の条件が組み
合わさって発現されるものでありカソード板Kのロット
毎に異なるものであるからその適性にあった凹凸の深さ
を確認しておく必要がある。
As a result of the workability inspection of the cathode plate K, generally, for example, when the thickness of the cathode plate K is large (about 0.8 mm) or when the hardness is high, the cathode plate K is formed on the front and back surfaces of the cathode plate K. 3mm or more is selected as the depth of
Conversely, when the thickness of the cathode plate K is small (about 0.6 mm) or when the hardness is low, the depth of the unevenness is selected to be 3 mm or less. If the thickness or hardness is average, 3 mm is selected as the depth of the unevenness (S2). However, the processing suitability of the cathode plate K is expressed by a combination of various conditions such as thickness and hardness, and differs for each lot of the cathode plate K. It is necessary to keep.

【0016】そして、凹凸の深さが選択されたら、選択
された凹凸の深さに基づいてカソード板Kの表裏面に凹
凸部を形成し(S3)、電解精錬に供する(S4)。
Then, when the depth of the unevenness is selected, an uneven portion is formed on the front and back surfaces of the cathode plate K based on the selected depth of the unevenness (S3), and is subjected to electrolytic refining (S4).

【0017】次に、本発明に係る電解精錬における陰極
種板の懸垂性保持方法を実施するための陰極種板の成型
装置について説明する。図2は本発明に係る陰極種板の
成型装置の一実施形態における正面図である。成型装置
10は、概略として、台座19上に立設された左右の円
柱状の支柱13、13と、左右の支柱13、13の上端
部に架け渡され、それらを連結する梁11により外形が
構成されている。そして、支柱13、13には左右の両
端が円筒状に形成され、該円筒の内側に支柱13、13
が挿入されるようにして配設された移動フレーム17が
梁11の下部側中央に配置された油圧シリンダ15によ
り上昇下降可能に取り付けられている。移動フレーム1
7の下部側にはカソード板Kに凹凸を形成するための上
金型20が着脱可能に取着されている。
Next, an apparatus for forming a cathode seed plate for performing the method for maintaining the suspension of the cathode seed plate in electrolytic refining according to the present invention will be described. FIG. 2 is a front view of an embodiment of the apparatus for molding a cathode seed plate according to the present invention. The molding device 10 has a left and right cylindrical columns 13, 13 erected on a pedestal 19, and bridges the upper ends of the left and right columns 13, 13. It is configured. The right and left ends of the columns 13 are formed in a cylindrical shape, and the columns 13, 13 are provided inside the cylinder.
Is mounted so as to be able to ascend and descend by a hydraulic cylinder 15 arranged at the center of the lower side of the beam 11. Moving frame 1
An upper mold 20 for forming irregularities on the cathode plate K is detachably attached to the lower side of the base 7.

【0018】一方、上金型20の下部側に配置された下
金型台19aには下金型25が着脱可能に戴置され、上
金型20に対向する位置に配置されている。油圧シリン
ダ15により移動フレーム17が下降すると上金型20
と下金型25の間に配置されたカソード板Kがプレスさ
れ、その表裏面に凹凸が形成されるようになっている。
On the other hand, a lower mold 25 is removably mounted on a lower mold stand 19a disposed below the upper mold 20, and is arranged at a position facing the upper mold 20. When the moving frame 17 is lowered by the hydraulic cylinder 15, the upper mold 20
The cathode plate K arranged between the lower die 25 and the lower die 25 is pressed to form irregularities on the front and back surfaces.

【0019】上金型20は、図3(a)に示すように、
縦横のサイズがカソード板Kとほぼ同じ大きさとされた
鋼製の座板21上に、カソード板Kの表面に凹凸を形成
させるためのピース部材23a、23b、23cがビス
24により螺着されている(図5参照)。そして、この
ピース部材23a、23b、23cはそれぞれ交換可能
とされている。本実施形態におけるピース部材23aは
その幅が約70mmのU字形状を有し、ピース部材23
b及びピース部材23cはその幅が約50mmでコの字
形状を有している。なお、図が煩雑となるため図3に
は、ビス24のすべてについては符号を付していない
が、ピース部材23a、23b、23cが脱落しない適
宜の部所にビス24が配置されている。また座板21に
はビス穴24aが穿設されている。
The upper mold 20 is, as shown in FIG.
Piece members 23a, 23b and 23c for forming irregularities on the surface of the cathode plate K are screwed on screws 24 on a steel seat plate 21 having a length and width substantially equal to the size of the cathode plate K. (See FIG. 5). The piece members 23a, 23b, and 23c are replaceable. The piece member 23a in the present embodiment has a U-shape having a width of about 70 mm,
The b and the piece member 23c have a U-shape with a width of about 50 mm. Note that in FIG. 3, all the screws 24 are not denoted by reference numerals for the sake of simplicity, but the screws 24 are arranged at appropriate places where the piece members 23a, 23b, and 23c do not fall off. A screw hole 24a is formed in the seat plate 21.

【0020】ピース部材23a、23b、23cは座板
21に取着されたときに座板21からの高さhがそれぞ
れ2mm、3mm、4mmとなるような3種類が用意さ
れている。カソード板Kの厚みの違いや含まれる不純物
の含量及びその含有割合等によりカソード板Kの加工適
性が異なるため、その特性に最も適合する凹凸を形成さ
せるためである。
Three kinds of piece members 23a, 23b and 23c are prepared such that the heights h from the seat plate 21 when attached to the seat plate 21 are 2 mm, 3 mm and 4 mm, respectively. The processing suitability of the cathode plate K varies depending on the difference in the thickness of the cathode plate K, the content of the contained impurities, the content ratio thereof, and the like, so that unevenness most suitable for the characteristics is formed.

【0021】上金型20とピース部材23a、23b、
23cの間にはピース部材23a、23b、23cと同
一の形状を有し、その厚さが、それぞれ、0.1mm、
0.2mm、0.3mm、0.4mmである図示しない
ライナを挟むことによりカソード板Kの表裏面に形成さ
れる凹凸部の深さを0.1mmの単位で調整できるよう
にされている。また、ライナを組み合わせて使用すれば
0.5mm〜1.0mmの凹凸を0.1mm間隔で形成
することができる。ライナの材質としてはSS、好まし
くはSUSが用いられる。
The upper mold 20 and the piece members 23a, 23b,
Between 23c, it has the same shape as the piece members 23a, 23b, 23c, and the thickness thereof is 0.1 mm,
By sandwiching liners (not shown) of 0.2 mm, 0.3 mm, and 0.4 mm, the depth of the uneven portions formed on the front and back surfaces of the cathode plate K can be adjusted in units of 0.1 mm. If a liner is used in combination, irregularities of 0.5 mm to 1.0 mm can be formed at 0.1 mm intervals. SS, preferably SUS, is used as the material of the liner.

【0022】一般的には、例えば、カソード板Kの厚み
が厚い場合(約0.8mm)又は硬度が高い場合には3
mm以上のピース部材23a、23b、23c又はライ
ナとの併用が行われ、逆にカソード板Kの厚みが薄い場
合(約0.6mm)又は硬度が低い場合には3mm未満
のピース部材23a、23b、23c又はライナとの併
用が行われる。そして、厚み又は硬度が平均的な場合に
は3mmのピース部材23a、23b、23cが用いら
れる。ただし、カソード板Kの厚みや硬度等の加工適性
はカソード板Kの製造ロットごとに異なるものであるか
らその適性にあったピース部材23a、23b、23c
及びライナが選択される。
Generally, for example, when the thickness of the cathode plate K is large (about 0.8 mm) or when the hardness is high, 3
When the thickness of the cathode plate K is small (about 0.6 mm) or when the hardness is low, the piece members 23a, 23b of less than 3 mm , 23c or a liner. When the thickness or hardness is average, 3 mm piece members 23a, 23b and 23c are used. However, since the processing suitability such as the thickness and hardness of the cathode plate K is different for each production lot of the cathode plate K, the piece members 23a, 23b, 23c suitable for the suitability are different.
And a liner are selected.

【0023】下金型25は、上金型20と同様の構成を
有しており、縦横のサイズがカソード板Kとほぼ同じ大
きさとされた鋼製の座板26上に、カソード板Kの表裏
面に凹凸を形成させるためのピース部材28a、28
b、28c、28d、28eがビス24により螺着され
ている(図4(a)参照)。そして、各ピース部材28
a、28b、28c、28d、28eもそれぞれ交換可
能とされている。ピース部材28a、28b、28c、
28d、28eは上金型20に取着されるピース部材2
3a、23b、23cにより形成される凹部に嵌合され
る形状とされている。そして、ピース部材28eの両側
には陰極支持用竿34とカソード板Kを連結するための
リボン40、40が位置するリボン取付部35が形成さ
れている。なお、図が煩雑となるため図4には、ビス2
4のすべてについては符号を付していないが、ピース部
材28a、28b、28c、28d、28eが脱落しな
い適宜の部所にビス24が配置されている。また座板2
6には図示しないビス穴が穿設されている。
The lower mold 25 has the same structure as the upper mold 20. The lower mold 25 is provided with a cathode plate K on a steel seat plate 26 having the same length and width as the cathode plate K. Piece members 28a, 28 for forming irregularities on the front and back surfaces
b, 28c, 28d, and 28e are screwed with screws 24 (see FIG. 4A). And each piece member 28
a, 28b, 28c, 28d, and 28e are also replaceable. Piece members 28a, 28b, 28c,
28d and 28e are the piece members 2 attached to the upper mold 20.
It is shaped to fit into the recess formed by 3a, 23b, 23c. On both sides of the piece member 28e, a ribbon mounting portion 35 in which ribbons 40, 40 for connecting the cathode support rod 34 and the cathode plate K are located is formed. Note that the screw 2 is shown in FIG.
Although reference numerals are not given to all of the four, screws 24 are arranged at appropriate places where the piece members 28a, 28b, 28c, 28d, 28e do not fall off. Seat plate 2
6 is provided with a screw hole (not shown).

【0024】ピース部材28a、28b、28c、28
d、28eはピース部材23a、23b、23cと同様
に、座板26に取着されたときに座板26からの高さh
がそれぞれ2mm、3mm、4mmとなるような3種類
が用意されている。そして、上金型20に取着されるピ
ース部材23a、23b、23cと共に適宜高さhのも
のが選択される。
Piece members 28a, 28b, 28c, 28
Similarly to the piece members 23a, 23b, and 23c, d and 28e have a height h from the seat plate 26 when attached to the seat plate 26.
Are 2 mm, 3 mm, and 4 mm, respectively. Then, together with the piece members 23a, 23b, and 23c attached to the upper mold 20, a member having a height h is selected as appropriate.

【0025】下金型25とピース部材28a、28b、
28c、28d、28eの間には、上金型20と同様
に、ピース部材28a、28b、28c、28d、28
eと同一の形状を有し、その厚さが、それぞれ、0.1
mm、0.2mm、0.3mm、0.4mmである図示
しないライナを挟むことによりカソード板Kの表裏面に
形成される凹凸部の深さを0.1mmの単位で調整でき
るようにされている。
The lower mold 25 and the piece members 28a, 28b,
Piece members 28a, 28b, 28c, 28d, 28, 28c, 28d, 28e
e, and has a thickness of 0.1
mm, 0.2 mm, 0.3 mm, 0.4 mm, by sandwiching a liner (not shown), the depth of the concave and convex portions formed on the front and back surfaces of the cathode plate K can be adjusted in units of 0.1 mm. I have.

【0026】次に、本発明にかかる成型装置10の動作
について説明する。まず、各カソード板Kが有する加工
適性を確認した後、所定の逆U字状部41及びコの字状
部42、43の深さを決定する。そして、座板21から
の高さhが2mm、3mm、4mmである3種類のピー
ス部材23a、23b、23cとその高さを0.1mm
間隔で調整するためのライナを決定された深さとなるよ
うに選択して上金型20にビス24に螺着する。同様
に、選択されたピース部材23a、23b、23cに対
応するピース部材28a、28b、28c、28d、2
8e及びライナを下金型25に取着する。
Next, the operation of the molding apparatus 10 according to the present invention will be described. First, after confirming the processing suitability of each cathode plate K, the depth of the predetermined inverted U-shaped portion 41 and the U-shaped portions 42 and 43 is determined. The three kinds of piece members 23a, 23b, and 23c whose height h from the seat plate 21 is 2 mm, 3 mm, and 4 mm and the height is 0.1 mm
A liner for adjusting at intervals is selected so as to have a determined depth, and screwed to the screw 24 on the upper mold 20. Similarly, the piece members 28a, 28b, 28c, 28d, 2d corresponding to the selected piece members 23a, 23b, 23c
8e and the liner are attached to the lower mold 25.

【0027】そして、上金型20を移動フレーム17の
下部側に取着し、一方、下金型台19aに下金型25を
戴置する。上金型20と下金型25の間にカソード板K
を挿入した後、油圧シリンダ15により移動フレーム1
7を降下させ、カソード板Kをプレスする。これによ
り、所望のサイズの凹凸を有するカソード板Kを製板す
ることができる。
Then, the upper mold 20 is attached to the lower side of the moving frame 17, while the lower mold 25 is placed on the lower mold stand 19a. A cathode plate K between the upper mold 20 and the lower mold 25;
Is inserted into the moving frame 1 by the hydraulic cylinder 15.
7 is lowered, and the cathode plate K is pressed. Thereby, a cathode plate K having irregularities of a desired size can be manufactured.

【0028】[0028]

【発明の効果】本発明に係る電解精錬における陰極種板
の懸垂性保持方法によれば、陰極種板の表裏面に交互に
形成される凹凸部の深さを該陰極種板の厚さや硬度等の
特性に応じて変更することとしたため、電解精錬におけ
る陰極種板の懸垂性が常に最良の状態で保持することが
可能となるという効果を有する。
According to the method for maintaining the suspension of the cathode seed plate in the electrolytic refining according to the present invention, the depth of the concave and convex portions alternately formed on the front and back surfaces of the cathode seed plate is determined by the thickness and hardness of the cathode seed plate. Therefore, there is an effect that the suspension of the cathode seed plate in the electrolytic refining can always be kept in the best condition.

【0029】本発明に係る電解精錬における陰極種板の
懸垂性保持方法を実施するための陰極種板の成型装置に
よれば、陰極種板の表裏面に凹凸を形成するために上金
型及び下金型に配設されるピース部材及びライナがそれ
ぞれ交換可能とされ、上金型及び下金型に配設されるピ
ース部材及びライナを所定の高さのものに交換すること
により陰極種板の表裏面に形成される凹凸部の深さを選
択できるように構成されているため、多数の金型を用意
することなく複数の深さの凹凸を設けることが可能とな
ると共に、金型に係るコストも抑えることができるとい
う効果がある。
According to the apparatus for forming a cathode seed plate for carrying out the method for maintaining the suspension of the cathode seed plate in the electrolytic refining according to the present invention, the upper die and the upper mold are used to form irregularities on the front and back surfaces of the cathode seed plate. The piece member and the liner arranged on the lower mold are exchangeable, and the piece and the liner arranged on the upper mold and the lower mold are exchanged for those having a predetermined height. Since it is configured so that the depth of the uneven portion formed on the front and back surfaces can be selected, it is possible to provide unevenness of a plurality of depths without preparing many molds, There is an effect that such cost can be suppressed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る電解精錬における陰極種板の懸垂
性保持方法のフローチャートである。
FIG. 1 is a flowchart of a method for maintaining the suspension of a cathode seed plate in electrolytic refining according to the present invention.

【図2】本発明に係る電解精錬における陰極種板の懸垂
性保持方法を実施するための陰極種板の成型装置の一実
施形態を示す正面図である。
FIG. 2 is a front view showing an embodiment of an apparatus for forming a cathode seed plate for carrying out a method for maintaining the suspension of a cathode seed plate in electrolytic refining according to the present invention.

【図3】(a)は上金型及びピース部材を示す平面図、
(b)は(a)のA―A線断面図である。
FIG. 3A is a plan view showing an upper mold and a piece member;
(B) is a sectional view taken along line AA of (a).

【図4】(a)は下金型及びピース部材を示す平面図、
(b)は(a)のB―B線断面図である。
FIG. 4A is a plan view showing a lower mold and a piece member,
(B) is a sectional view taken along line BB of (a).

【図5】上金型とピース部材との関係を示す分解斜視図
である。
FIG. 5 is an exploded perspective view showing a relationship between an upper mold and a piece member.

【図6】カソード板に形成された凹凸を示す正面図であ
る。
FIG. 6 is a front view showing irregularities formed on the cathode plate.

【図7】電解槽への給電方法を説明するための概略図で
ある
FIG. 7 is a schematic diagram for explaining a method of supplying power to an electrolytic cell.

【図8】電解精錬におけるアノード板及びカソード板へ
の給電部の斜視図である。
FIG. 8 is a perspective view of a power supply unit for an anode plate and a cathode plate in electrolytic refining.

【符号の説明】[Explanation of symbols]

A アノード板 K カソード板 10 成型装置 11 梁 13 支柱 15 油圧シリンダ 17 移動フレーム 19 台座 19a 下金型台 20 上金型 21 座板 23a ピース部材 23b ピース部材 23c ピース部材 24 ビス 24a ビス穴 25 下金型 26 座板 28a ピース部材 28b ピース部材 28c ピース部材 28d ピース部材 28e ピース部材 34 陰極支持用竿 35 リボン取付部 40 リボン 41 逆U字状部 42 ピース部材 43 ピース部材 Reference Signs List A Anode plate K Cathode plate 10 Molding device 11 Beam 13 Support 15 Hydraulic cylinder 17 Moving frame 19 Pedestal 19a Lower mold base 20 Upper mold 21 Seat plate 23a Piece member 23b Piece member 23c Piece member 24 Screw 24a Screw hole 25 Lower metal Mold 26 Seat plate 28a Piece member 28b Piece member 28c Piece member 28d Piece member 28e Piece member 34 Cathode support rod 35 Ribbon attachment part 40 Ribbon 41 Inverted U-shaped part 42 Piece member 43 Piece member

───────────────────────────────────────────────────── フロントページの続き (72)発明者 上野 明 大分県北海部郡佐賀関町大字関3の3382番 地 日鉱金属株式会社佐賀関製錬所内 (72)発明者 佐々木 康勝 大分県北海部郡佐賀関町大字関3の3382番 地 日鉱金属株式会社佐賀関製錬所内 Fターム(参考) 4K058 BA21 BB03 EB01 EB13 FA08 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Akira Ueno 3382-3 Seki, Saganoseki-machi, Sakaseki-cho, Oita Pref. Nippon Mining & Metals Co., Ltd. Saganoseki Smelter & Refinery (72) Inventor Yasukatsu Sasaki Sagaseki, Oita Pref. No. 3382, Seki 3 of the town, Nippon Mining & Metals Co., Ltd. F-term in the Saganoseki Smelter & Refinery (reference) 4K058 BA21 BB03 EB01 EB13 FA08

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 電解精錬に使用される陰極種板を電解槽
内で垂直に浸漬するための陰極種板の懸垂性保持方法に
おいて、 前記陰極種板の表裏面に形成される凹凸部の深さを該陰
極種板の厚さや硬度等の特性に応じて変更することを特
徴とする電解精錬における陰極種板の懸垂性保持方法。
1. A method for maintaining the suspension of a cathode seed plate for vertically immersing a cathode seed plate used for electrolytic refining in an electrolytic cell, comprising the steps of: A method for maintaining the suspension of a cathode seed plate in electrolytic refining, wherein the thickness of the cathode seed plate is changed according to characteristics such as the thickness and hardness of the cathode seed plate.
【請求項2】 請求項1に記載の電解精錬における陰極
種板の懸垂性保持方法において、 前記陰極種板の表裏面に形成される凹凸の深さは2mm
〜4mmであり、該陰極種板の厚さや硬度等の特性に応
じてそのいずれかが選択されることを特徴とする電解精
錬における陰極種板の懸垂性保持方法。
2. The method for maintaining the suspension of a cathode seed plate in electrolytic refining according to claim 1, wherein the depth of the unevenness formed on the front and back surfaces of the cathode seed plate is 2 mm.
A method for maintaining the suspension of a cathode seed plate in electrolytic refining, wherein any one of them is selected according to characteristics such as thickness and hardness of the cathode seed plate.
【請求項3】 請求項1又は2に記載の電解精錬におけ
る陰極種板の懸垂性保持方法において、 前記陰極種板の表裏面に形成される凹凸部は、前記陰極
種板の中心部に形成された逆U字状の逆U字状部と、 前記U字状部を囲むように外側方向に連続して形成され
た略「コ」の字状のコの字状部とにより形成されている
ことを特徴とする電解精錬における陰極種板の懸垂性保
持方法。
3. The method for maintaining the suspension of a cathode seed plate in electrolytic refining according to claim 1 or 2, wherein the concave and convex portions formed on the front and back surfaces of the cathode seed plate are formed at the center of the cathode seed plate. And a substantially U-shaped U-shaped portion continuously formed in an outward direction so as to surround the U-shaped portion. A method for maintaining the suspension of a cathode seed plate in electrolytic refining.
【請求項4】 請求項1から3のいずれか1項に記載の
電解精錬における陰極種板の懸垂性保持方法を実施する
ための陰極種板の成型装置において、 前記陰極種板はプレス加工により成型されると共に、該
陰極種板の表裏面に凹凸を形成するために上金型及び下
金型に配設されるピース部材がそれぞれ交換可能とさ
れ、前記上金型及び下金型に配設される前記ピース部材
を所定の厚さのものに交換することにより前記陰極種板
の表裏面に形成される凹凸部の深さを選択できるように
構成されていることを特徴とする陰極種板の成型装置。
4. A cathode seed plate forming apparatus for performing the method for maintaining the suspension of a cathode seed plate in electrolytic refining according to any one of claims 1 to 3, wherein the cathode seed plate is formed by press working. In addition to being molded, the piece members provided on the upper mold and the lower mold to form irregularities on the front and back surfaces of the cathode seed plate are respectively replaceable, and are arranged on the upper mold and the lower mold. The cathode seed is characterized in that it is configured such that the depth of the concave and convex portions formed on the front and back surfaces of the cathode seed plate can be selected by replacing the provided piece member with one having a predetermined thickness. Plate molding equipment.
【請求項5】 請求項4に記載の陰極種板の成型装置に
おいて、 前記上金型と前記ピース部材との間及び前記下金型と前
記ピース部材との間に、前記ピース部材と同一形状を有
し、0.1〜0.4mmの厚さに形成されたライナを挟
むことにより前記陰極種板の表裏面に形成される凹凸部
の深さを調整できるように構成されていることを特徴と
する陰極種板の成型装置。
5. The apparatus for molding a cathode seed plate according to claim 4, wherein the same shape as the piece member is provided between the upper mold and the piece member and between the lower mold and the piece member. Having a thickness of 0.1 to 0.4 mm sandwiched between the liner is configured to be able to adjust the depth of the uneven portion formed on the front and back of the cathode seed plate Characteristic cathode seed plate molding equipment.
JP27929399A 1999-09-30 1999-09-30 Method for holding suspendability of cathode starting sheet in electrolytic refining and molding device for cathode starting sheet for implementing the method Pending JP2001107282A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27929399A JP2001107282A (en) 1999-09-30 1999-09-30 Method for holding suspendability of cathode starting sheet in electrolytic refining and molding device for cathode starting sheet for implementing the method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27929399A JP2001107282A (en) 1999-09-30 1999-09-30 Method for holding suspendability of cathode starting sheet in electrolytic refining and molding device for cathode starting sheet for implementing the method

Publications (1)

Publication Number Publication Date
JP2001107282A true JP2001107282A (en) 2001-04-17

Family

ID=17609160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27929399A Pending JP2001107282A (en) 1999-09-30 1999-09-30 Method for holding suspendability of cathode starting sheet in electrolytic refining and molding device for cathode starting sheet for implementing the method

Country Status (1)

Country Link
JP (1) JP2001107282A (en)

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