JP2001093402A - Structural body for side heated immersed cathode and cathode-ray tube using the same - Google Patents

Structural body for side heated immersed cathode and cathode-ray tube using the same

Info

Publication number
JP2001093402A
JP2001093402A JP27175999A JP27175999A JP2001093402A JP 2001093402 A JP2001093402 A JP 2001093402A JP 27175999 A JP27175999 A JP 27175999A JP 27175999 A JP27175999 A JP 27175999A JP 2001093402 A JP2001093402 A JP 2001093402A
Authority
JP
Japan
Prior art keywords
cup
shaped holder
porous substrate
metal porous
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27175999A
Other languages
Japanese (ja)
Inventor
Tadanori Taguchi
貞憲 田口
Hiroshi Takakura
博 高倉
Yukio Suzuki
行男 鈴木
Michihide Shibata
倫秀 柴田
Shunji Saito
駿次 齋藤
Ikumitsu Nonaka
育光 野中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Hitachi Electronic Devices Co Ltd
Original Assignee
Hitachi Ltd
Hitachi Electronic Devices Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Electronic Devices Co Ltd filed Critical Hitachi Ltd
Priority to JP27175999A priority Critical patent/JP2001093402A/en
Publication of JP2001093402A publication Critical patent/JP2001093402A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To improve boding strength of a high melting point metallic porous base body which constituted a structural body for a side heated immersed cathode with a cup-shaped holder, and to secure reliability of the bonding, and to greatly improve efficiency in a bonding work, and to provide a cathode-ray tube of high brightness, high resolution, and a long life. SOLUTION: A structural body for a cathode comprises a cathode pellet 4 wherein a thermoelectron emitting substance 3 is immersed in a high melting point metallic porous base body 1, a cup-shaped holder 2 which is bonded with planes other than an electron emission plane 1c of the high melting point metallic porous base body 1, a heater 6 whose head portion faces the cup-shaped holder 2, and a sleeve 5 which is bonded with a sidewall of the cup-shaped holder 2, wherein the cup-shaped holder 2 has an inner base 2a that is bonded with a base 1b opposite to the electron emission plane 1c of the high melting point metallic porous base body 1 and has a concave area 1c for forming a fine clearance between the bonded two bases.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、OA機器端末用モ
ニタ管、投射形を含めたTVセット用等のブラウン管
や、放送用の撮像管等の陰極線管に係り、特に、高電流
密度特性を長時間持続出来、かつ長寿命の傍熱形含浸陰
極構造体と、この傍熱形含浸陰極構体を備えた陰極線管
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a monitor tube for an OA equipment terminal, a cathode ray tube such as a cathode ray tube for a TV set including a projection type, and an image pickup tube for broadcasting. The present invention relates to an indirectly heated impregnated cathode structure that can be maintained for a long time and has a long service life, and a cathode ray tube having the indirectly heated impregnated cathode structure.

【0002】[0002]

【従来の技術】この種の陰極線管、例えばOA機器端末
用モニタに用いられるカラー陰極線管は一般に蛍光体を
塗布したパネルと、電子銃を収容するネック、および上
記パネルとネックを連接するファンネルとからなる真空
外囲器を有する。
2. Description of the Related Art A cathode ray tube of this type, for example, a color cathode ray tube used for a monitor of an OA equipment terminal, generally has a panel coated with a phosphor, a neck for accommodating an electron gun, and a funnel for connecting the panel to the neck. Having a vacuum envelope consisting of

【0003】上記した陰極線管に用いられる電子銃で
は、その構成部品で有る陰極構造体として、傍熱形含浸
陰極構造体が知られている。この傍熱形含浸陰極構造体
は高い電流密度の陰極に適しており、高融点金属の1つ
であるタングステンの多孔質基体に、バリウム(B
a),カルシウム(Ca),アルミニウム(Al)の3
元酸化物で構成される熱電子放出物質を含浸させた陰極
ペレットを用いるものや、さらに電子放出特性を向上さ
せるために、陰極ペレットの電子放出面上にオスミウム
(Os),ルテニウム(Ru)の一種、あるいはこれら
の合金薄膜を被覆させたものがある。
In the electron gun used in the above-mentioned cathode ray tube, an indirectly heated impregnated cathode structure is known as a cathode structure as a component thereof. This indirectly heated impregnated cathode structure is suitable for a cathode having a high current density, and a barium (B) is formed on a porous substrate of tungsten, which is one of the refractory metals.
a), calcium (Ca), aluminum (Al)
In the case of using a cathode pellet impregnated with a thermionic emission material composed of a source oxide, and in order to further improve the electron emission characteristics, osmium (Os) and ruthenium (Ru) are deposited on the electron emission surface of the cathode pellet. One type or those coated with a thin film of these alloys are available.

【0004】このような傍熱形含浸陰極構造体は、高輝
度で、且つ高解像度特性を必要とする前記OA機器端末
用モニタをはじめ大型TVに使用するブラウン管や、撮
像管等の陰極線管に使用されて、これらの陰極線管の必
要特性に応えられる高い熱電子放出電流密度を有し、し
かも、その高電流密度特性が数万時間と言った長時間に
わたって持続できる特性を有している。
[0004] Such an indirectly heated impregnated cathode structure is used in cathode ray tubes such as cathode ray tubes used in large-screen TVs, such as monitors for OA equipment terminals, which require high brightness and high resolution characteristics, and image pickup tubes. It has a high thermionic emission current density that can be used to meet the required properties of these cathode ray tubes, and has a property that the high current density property can be maintained for a long time such as tens of thousands of hours.

【0005】しかしながら、この傍熱形含浸陰極構造体
は,常用動作温度が1000〜1100°Cと云う高温
下で使用されることから、その構造体としては、信頼性
を考えて、各構成部材を互いに溶着固定する構成が知ら
れている(例えば特許第2735955号公報)。
However, since the indirectly heated impregnated cathode structure is used at a high operating temperature of 1000 to 1100 ° C., the structure of the structure is considered to be highly reliable. Are known (for example, Japanese Patent No. 2735955).

【0006】図8は、前記した特許第2735955号
公報に開示された従来の傍熱形含浸陰極構造体の一例を
示す概略的断面図で、このような傍熱形含浸陰極構造体
は、一般には次のような方法で製造される。まず、タン
グステン、モリブデンなどの高融点金属粉末から成る所
定形状の成形体を圧縮成型した後、これを焼結処理して
高融点金属多孔質基体81を得る。併せて、それぞれ公
知の工程を通じて、カップ状ホルダー82、スリーブ8
3、ヒータ84を製造する。
FIG. 8 is a schematic sectional view showing an example of a conventional indirectly heated impregnated cathode structure disclosed in the above-mentioned Japanese Patent No. 2,735,955. Is manufactured by the following method. First, after a compact having a predetermined shape made of a high melting point metal powder such as tungsten or molybdenum is compression-molded, this is sintered to obtain a high melting point metal porous substrate 81. At the same time, the cup-shaped holder 82, the sleeve 8
3. The heater 84 is manufactured.

【0007】その後、このカップ状ホルダー82に、高
融点金属多孔質基体81をその電子放出面81aの反対
側の底面81bが前記カップ状ホルダー82の内側底面
82aに対面するように挿入し、この高融点金属多孔質
基体81をカップ状ホルダー82の内側底面82aに強
く圧着した状態において、レーザ溶接の手段でカップ状
ホルダー82の外側底面82bにレーザビームを当て、
両者をスポット溶接により溶着する。この時、数点、例
えば4〜6個程度の溶接部位SW1を形成するのが望ま
しい。この結果、前記高融点金属多孔質基体81は、電
子放出面81aとなる面を除くほぼ全表面を前記カップ
状ホルダー82で覆われれた構造となる。
[0007] Thereafter, the high melting point metal porous substrate 81 is inserted into the cup-shaped holder 82 such that the bottom surface 81b opposite to the electron emission surface 81a faces the inner bottom surface 82a of the cup-shaped holder 82. In a state where the refractory metal porous substrate 81 is strongly pressed against the inner bottom surface 82a of the cup-shaped holder 82, a laser beam is applied to the outer bottom surface 82b of the cup-shaped holder 82 by means of laser welding.
Both are welded by spot welding. At this time, it is desirable to form several points, for example, about 4 to 6 welding portions SW1. As a result, the refractory metal porous substrate 81 has a structure in which substantially the entire surface except the surface serving as the electron emission surface 81a is covered by the cup-shaped holder 82.

【0008】ついで、通常の方法で高融点金属多孔質基
体81にバリウム、カルシウム、アルミネート等の熱電
子放出物質を含浸し、含浸が完了した後にショットピー
ニング(shot peening)法で高融点金属多孔質基体81
の表面に付着した余剰の含浸残留物を除去し、陰極ペレ
ット85を形成する。次にこのカップ状ホルダー82と
陰極ペレット85の結合体を、スリーブ83の一端側8
3aに挿入した後、レーザビーム溶接または抵抗溶接に
よりスリーブ83の側面を介して溶接固定する。図8中
のSW2はその際の溶接部位を示す。
Next, the high-melting metal porous substrate 81 is impregnated with a thermionic emission material such as barium, calcium, aluminate or the like by a usual method, and after the impregnation is completed, the high-melting metal porous material is formed by a shot peening method. Substrate 81
The excess impregnated residue adhering to the surface of the substrate is removed to form a cathode pellet 85. Next, the combined body of the cup-shaped holder 82 and the cathode pellet 85 is connected to one end 8 of the sleeve 83.
After insertion into 3a, it is welded and fixed via the side surface of the sleeve 83 by laser beam welding or resistance welding. SW2 in FIG. 8 indicates the welding site at that time.

【0009】又、従来の傍熱形含浸陰極構造体の他の製
造方法としては、高融点金属多孔質基体とカップ状ホル
ダーとの溶接固着前に予め電子放出物質を高融点金属多
孔質基体に含浸しておく方法も提案されている。
Another conventional method for producing an indirectly heated infiltrated cathode structure is as follows: before the high-melting-point metal porous substrate and the cup-shaped holder are fixed to each other by welding, an electron-emitting material is previously applied to the high-melting-point metal porous substrate. A method of impregnation has also been proposed.

【0010】さらに、カップ状ホルダーと高融点金属多
孔質基体との固定方法としては、前記カップ状ホルダー
の側面にテ−パをもたせ、かしめて前記高融点金属多孔
質基体を固定する方法が特開平1−225033号公報
に開示されている。
Further, as a method of fixing the cup-shaped holder and the high-melting-point metal porous substrate, there is a method in which a tape is provided on a side surface of the cup-shaped holder, and the high-melting-point metal porous substrate is fixed by caulking. It is disclosed in Japanese Unexamined Patent Publication No. 1-225033.

【0011】[0011]

【発明が解決しようとする課題】この様な傍熱形含浸陰
極構造体は、安定した高電流密度特性が得られ、更に長
時間の安定動作を得る事ができるが、従来の構造では、
先ず、陰極ペレット85を持ったカップ状ホルダー82
をスリーブ83とレーザビーム溶接により溶接固定する
ものでは、いずれの部品もみな高融点金属材料を使用し
ている為、一寸とした溶融熱でも2000°C近い高温
となり、前記含浸されている熱電子放出物質が激しく噴
きだし、結果的にSW2の溶接跡は穴明き状態となって
溶着固定の信頼性確保に問題が有るのみならず、前記穴
明き状態は、傍熱形含浸陰極構造体使用中に熱電子放出
物質が前記穴から吹き出し陰極構体周りを汚染する致命
的欠陥となり、傍熱形含浸陰極構造体だけでなく陰極線
管自体の長寿命化が確保出来ないという問題が有った。
Although such an indirectly heated impregnated cathode structure can provide stable high current density characteristics and stable operation for a long period of time, the conventional structure has the following disadvantages.
First, a cup-shaped holder 82 having a cathode pellet 85
Is fixed by welding with the sleeve 83 by laser beam welding, since all parts are made of a high melting point metal material, even a one-dimensional melting heat becomes a high temperature of about 2000 ° C., and the impregnated thermoelectrons The release material is violently blown out, and as a result, the welding trace of SW2 becomes a perforated state, so that there is a problem in securing the reliability of welding and fixing, and the perforated state is caused by the indirectly impregnated cathode structure. During use, thermionic emission material blows out from the hole and becomes a fatal defect that contaminates the surroundings of the cathode structure, and there is a problem that the life of the cathode ray tube itself as well as the indirectly heated impregnated cathode structure cannot be extended. .

【0012】このことは、前述した高融点金属多孔質基
体とカップ状ホルダーとのレーザビーム溶接による溶接
固定に於いても全く同様であり、傍熱形含浸陰極構造体
使用中に熱電子放出物質が前記穴から吹き出し陰極構体
周りを汚染する致命的欠陥となり、傍熱形含浸陰極構造
体のみならず、陰極線管自体の長寿命化が確保出来ない
という問題が有った。
This is exactly the same in the above-mentioned welding and fixing of the high-melting-point metal porous substrate and the cup-shaped holder by laser beam welding. However, there is a fatal defect that blows out from the hole and contaminates the periphery of the cathode structure, and there is a problem that not only the indirectly heated impregnated cathode structure but also a long life of the cathode ray tube itself cannot be secured.

【0013】又、抵抗溶接によるものでは、被溶接部品
相互間の抵抗を利用して部品の表面の浅い部分で100
0分の数秒間と云う非常に短時間で部品相互間を溶着さ
せる方法で、この方法では部品全体が高温度に加熱され
ないので熱電子放出物質が激しく噴き出すことは避けら
れるが、上述の様な傍熱形含浸陰極構造体は比較的微小
な部品を組み合わせて構成するため、抵抗溶接時には高
融点金属多孔質基体及びカップ状ホルダーの対向面は共
に平面、更に溶接電極先端形状も共に平面であって、被
溶接部品相互間の平行度を寸分の狂いなく調整しなけれ
ば溶接電極と溶接部品間に不均一な加圧力が作用し、溶
接の均一性に欠ける。又、溶接毎に平行度の調整が必要
であり、作業効率が非常に低いと云う問題があった。
In the case of the resistance welding, the resistance between the parts to be welded is utilized at a shallow part of the surface of the part by utilizing the resistance between the parts.
In this method, the parts are welded to each other in a very short time of several minutes, and the whole part is not heated to a high temperature. Therefore, it is possible to avoid the violent ejection of thermionic emission material. Since the indirectly heated impregnated cathode structure is composed of a combination of relatively small components, the opposing surfaces of the high-melting-point metal porous substrate and the cup-shaped holder are both flat during resistance welding, and the tips of the welding electrodes are also flat. If the parallelism between the parts to be welded is not adjusted without deviation, uneven pressing force acts between the welding electrode and the welded parts, resulting in lack of uniformity of welding. Further, there is a problem that the parallelism needs to be adjusted for each welding, and the working efficiency is extremely low.

【0014】さらに、前述したかしめによるものでは、
対象となる傍熱形含浸陰極構造体自体が約1mm程度の
微小部品であるため、最適な手段とはなりえず、信頼性
にも問題があった。
Further, according to the caulking described above,
Since the target indirectly heated impregnated cathode structure itself is a small part of about 1 mm, it cannot be an optimal means and has a problem in reliability.

【0015】本発明の目的は、前述した従来技術の諸問
題を解決した優れた傍熱形含浸陰極構造体と、この傍熱
形含浸陰極構造体を用いた陰極線管を提供する事にあ
る。
An object of the present invention is to provide an excellent indirectly heated impregnated cathode structure which solves the above-mentioned problems of the prior art, and a cathode ray tube using the indirectly heated impregnated cathode structure.

【0016】[0016]

【課題を解決するための手段】上記目的を達成するため
に、本発明は、高融点金属多孔質基体とキャップ状ホル
ダーの固着面に微小間隙を有する構成として、穴明きに
伴う熱電子放出物質による陰極構体周りの汚染の防止
と、両者の固着強度の向上および固着の信頼性を確保
し、長寿命の傍熱形含浸陰極構造体及び陰極線管を提供
できるようにしたものである。
In order to achieve the above object, the present invention provides a structure having a minute gap in a fixing surface between a refractory metal porous substrate and a cap-shaped holder, the thermoelectron emission associated with perforation. An object of the present invention is to prevent contamination around the cathode structure by a substance, to improve the fixing strength of both, and to ensure the reliability of the fixing, and to provide a long-life indirectly heated impregnated cathode structure and a cathode ray tube.

【0017】本発明の典型的な構成を列挙すれば下記の
通りである。すなわち、 (1) 高融点金属多孔質基体に熱電子放出物質を含浸
した陰極ペレットと、前記高融点金属多孔質基体の電子
放出面を除く他の面と固着したカップ状ホルダーと、こ
のカップ状ホルダーとその頭部を対向して配置したヒー
タと、前記カップ状ホルダーの側壁と固着したスリーブ
とを有する傍熱形含浸陰極構造体であって、前記カップ
状ホルダーの内側底面を前記高融点金属多孔質基体の前
記電子放出面の反対側の底面に固着し、かつその固着面
に微小間隙を有せしめた。
Typical configurations of the present invention are as follows. (1) A cathode pellet in which a high-melting-point metal porous substrate is impregnated with a thermionic emission material; a cup-shaped holder fixed to the other surface of the high-melting-point metal porous substrate except for the electron emission surface; An indirectly heated impregnated cathode structure having a holder and a heater having its head opposed to each other, and a sleeve fixed to a side wall of the cup-shaped holder, wherein an inner bottom surface of the cup-shaped holder is formed of the refractory metal. The porous substrate was fixed to the bottom surface opposite to the electron emission surface, and a small gap was formed in the fixed surface.

【0018】(2)(1)における前記微小間隙を、前
記高融点金属多孔質基体の底面及び前記カップ状ホルダ
ーの内側底面の何れか一方又は両方の凹部によって構成
した。
(2) The minute gap in (1) is formed by one or both concave portions of the bottom surface of the refractory metal porous base and the inner bottom surface of the cup-shaped holder.

【0019】(3)(1)における前記カップ状ホルダ
ーの底面の略中央部を前記高融点金属多孔質基体側へ突
出させた。
(3) A substantially central portion of the bottom surface of the cup-shaped holder in (1) is projected toward the refractory metal porous substrate.

【0020】上記(1)乃至(3)の構成に依れば、高
融点金属多孔質基体とカップ状ホルダーとの固着面に微
小間隙が存在することで両者の固着強度の向上と固着の
信頼性の確保が可能となり、長寿命の傍熱形含浸陰極構
造体が得られる。
According to the above-mentioned constitutions (1) to (3), the presence of a minute gap in the fixing surface between the high-melting-point metal porous substrate and the cup-shaped holder improves the fixing strength of both and improves the reliability of the fixing. The insulated property can be ensured, and a long-life indirectly heated impregnated cathode structure can be obtained.

【0021】(4)(1)において前記カップ状ホルダ
ーの前記高融点金属多孔質基体を取り囲む開口端側の先
端を、前記高融点金属多孔質基体の前記電子放出面より
後退させた。
(4) In (1), the tip of the cup-shaped holder on the opening end side surrounding the high-melting-point metal porous substrate is receded from the electron emission surface of the high-melting-point metal porous substrate.

【0022】この構成に依れば、高融点金属多孔質基体
とカップ状ホルダーとの固着時に両者の接触が良好とな
り、固着強度の向上と固着の信頼性の確保が可能となる
と共に、電子銃の陰極構体と第一電極との間隔が、陰極
構体の上端の出っ張りで寸法的制限を受ける事無く、設
計の自由度が大きくなる。
According to this structure, when the porous metal substrate having a high melting point and the cup-shaped holder are fixed to each other, the contact therebetween is good, so that the fixing strength can be improved and the fixing reliability can be ensured. The space between the cathode structure and the first electrode is not dimensionally limited by the protrusion of the upper end of the cathode structure, and the degree of freedom in design is increased.

【0023】(5)高融点金属粉末集積体を圧縮整形し
焼結して得られた高融点金属多孔質基体に、電子放出物
質を含浸してなる傍熱形含浸陰極構造体の製造方法であ
って、前記高融点金属多孔質基体の底面に凹部を設ける
工程と、この高融点金属多孔質基体にバリウムを含むア
ルカリ土類金属酸化物とアルミナとの化合物を主成分と
する電子放出物質を含浸する工程と、前記電子放出物質
を含浸した前記高融点金属多孔質基体を前記底面を前記
カップ状ホルダーの内側底面と対面させて前記カップ状
ホルダーの内側に挿入した後、前記高融点金属多孔質基
体と前記カップ状ホルダーとを一対の溶接電極で溶接固
定する工程とを有し、前記一対の溶接電極のうち前記電
子放出面側の第1の溶接電極として平面溶接電極を、又
前記カップ状ホルダーの外側底面側には第2の溶接電極
として非平面溶接電極をそれぞれ用いる。
(5) A method of manufacturing an indirectly impregnated cathode structure in which an electron emitting material is impregnated into a refractory metal porous substrate obtained by compressing, shaping and sintering a refractory metal powder assembly. A step of providing a concave portion on the bottom surface of the high-melting-point metal porous substrate; and forming an electron-emitting substance mainly containing a compound of an alkaline earth metal oxide containing barium and alumina on the high-melting-point metal porous substrate. Impregnating and inserting the refractory metal porous substrate impregnated with the electron-emitting substance into the cup-shaped holder with the bottom face facing the inner bottom face of the cup-shaped holder; Fixing the porous substrate and the cup-shaped holder with a pair of welding electrodes, wherein a flat welding electrode is used as a first welding electrode on the electron emission surface side of the pair of welding electrodes; Shape hol The outer bottom surface side of the chromatography using non-planar welding electrodes respectively as a second welding electrode.

【0024】この構成に依れば、溶接時の加圧の均一性
が高くなり、通電電流と電圧を一定にすることが出来、
均一で安定した溶接が可能となると共に、溶接電極相互
の平行度裕度が緩和出来、固着作業効率を大幅に向上で
きる。
According to this configuration, the uniformity of the pressurization during welding is increased, and the current and voltage can be made constant.
Uniform and stable welding can be achieved, and the parallelism allowance between the welding electrodes can be reduced, so that the fixing work efficiency can be greatly improved.

【0025】(6)高融点金属多孔質基体に熱電子放出
物質を含浸した陰極ペレットと、前記高融点金属多孔質
基体の電子放出面を除く他の面と固着したカップ状ホル
ダーと、このカップ状ホルダーとその頭部を対向して配
置したヒータと、前記カップ状ホルダーの側壁と固着し
たスリーブとを有し、前記カップ状ホルダーは、その内
側底面が前記高融点金属多孔質基体の前記電子放出面の
反対側の底面と固着され、かつその固着面に微小間隙を
有する傍熱形含浸陰極構造体を備えた陰極線管とした。
(6) A cathode pellet in which a high-melting-point metal porous substrate is impregnated with a thermionic emission material, a cup-shaped holder fixed to the other surface of the high-melting-point metal porous substrate except for the electron emission surface, A holder having a cup-shaped holder and a head opposed to each other, and a sleeve fixed to a side wall of the cup-shaped holder. The cathode ray tube provided with the indirectly heated impregnated cathode structure fixed to the bottom surface opposite to the emission surface and having a minute gap in the fixed surface.

【0026】この構成によれば、高電流密度特性が数万
時間と言った長時間に渡って持続できる特性を有し、か
つ長寿命の傍熱形含浸陰極構体を備えたことから、高輝
度及び高解像度で、かつ長寿命の陰極線管を可能にし
た。
According to this configuration, since the high current density characteristic has a characteristic that can be maintained for a long time, such as tens of thousands of hours, and has a long-life indirectly heated impregnated cathode structure, a high luminance can be obtained. And a high-resolution and long-life cathode ray tube has been made possible.

【0027】なお、本発明は上記構成に限るものではな
く、本発明の技術思想を逸脱することなく、種々の変更
が可能である。
It should be noted that the present invention is not limited to the above configuration, and various changes can be made without departing from the technical idea of the present invention.

【0028】[0028]

【発明の実施の形態】以下、本発明の実施の形態につ
き、実施例を参照して詳細に説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below in detail with reference to examples.

【0029】図1は本発明による傍熱形含浸陰極構造体
の一実施例を説明するための概略断面図である。同図に
おいて、1は高融点金属多孔質基体である。この高融点
金属多孔質基体1はタングステン(W)金属粉末にバイ
ンダー等を加えて顆粒化し、所定形状に成形した後、1
900°C程度の還元雰囲気中で焼結して、直径1.0
0mm、高さ0.55mmに形成した。
FIG. 1 is a schematic sectional view for explaining one embodiment of an indirectly heated impregnated cathode structure according to the present invention. In FIG. 1, reference numeral 1 denotes a porous metal substrate having a high melting point. The high melting point metal porous substrate 1 is granulated by adding a binder or the like to tungsten (W) metal powder, and is formed into a predetermined shape.
Sintered in a reducing atmosphere of about 900 ° C to a diameter of 1.0
It was formed to have a height of 0 mm and a height of 0.55 mm.

【0030】この高融点金属多孔質基体1は、その熱電
子放出面1aとは反対側の底面1bの略中央に微小間隙
を形成する凹部1cを有している。この凹部1cは高さ
0.05mm、開口端直径0.4mm、底部直径0.3
mmの円錐台形状を呈している。この高融点金属多孔質
基体1を、板厚0.05mm、内径1.03mm、外径
1.13mm,高さ0.55mmのタンタル(Ta)製
のカップ状ホルダー2の内側底面2aに前記底面1bを
対面させて突き合わせて溶接により固着している。固着
は抵抗溶接が用いられて両者が溶着固定されている。
The high-melting-point metal porous substrate 1 has a concave portion 1c which forms a minute gap substantially at the center of the bottom surface 1b opposite to the thermionic emission surface 1a. The concave portion 1c has a height of 0.05 mm, an opening end diameter of 0.4 mm, and a bottom diameter of 0.3 mm.
It has a truncated cone shape of mm. The refractory metal porous substrate 1 is placed on the inner bottom surface 2a of a tantalum (Ta) cup-shaped holder 2 having a thickness of 0.05 mm, an inner diameter of 1.03 mm, an outer diameter of 1.13 mm and a height of 0.55 mm. 1b are faced to each other and fixed by welding. The two are fixed by welding using resistance welding.

【0031】この溶着固定で前記熱電子放出面1aは前
記カップ状ホルダー2の開口端側の先端2cより突出し
ている。3は熱電子放出物質で、この熱電子放出物質3
は前記カップ状ホルダー2に固定する以前に高融点金属
多孔質基体1にそのほぼ全面から、還元雰囲気中、公知
の方法でバリウム(Ba),カルシウム(Ca),アル
ミニウム(Al)の3元酸化化合物(バリウム・カルシ
ウム・アルミネート)を溶融し、溶融液を含浸させたも
ので、含浸完了後に温水撹拌にて余剰の熱電子放出物質
3を除去している。
The thermoelectron emission surface 1a protrudes from the tip 2c on the opening end side of the cup-shaped holder 2 by the welding and fixing. Reference numeral 3 denotes a thermionic emission material.
The ternary oxidation of barium (Ba), calcium (Ca), and aluminum (Al) is carried out by a known method in a reducing atmosphere from almost the entire surface of the refractory metal porous substrate 1 before being fixed to the cup-shaped holder 2. A compound (barium, calcium, aluminate) is melted and impregnated with a molten liquid. After completion of the impregnation, excess thermoelectron emitting material 3 is removed by stirring with hot water.

【0032】この熱電子放出物質3を含む高融点金属多
孔質基体1をカップ状ホルダー2と固定して陰極ペレッ
ト4を形成している。5はスリーブで、このスリーブ5
はタンタル(Ta)製で、その一端部5aに前記陰極ペ
レット4をその熱電子放出面1aが外側となるように前
記カップ状ホルダー2の外側底面2b側から挿入し、そ
の側壁2dとスリーブ5の側壁5bとをレーザ溶接又は
抵抗溶接で溶着固定している。SW3はそのときの溶接
部位をしめす。6はヒータで、前記スリーブ5の他の一
端部5c側から挿入され、そのほぼ全長がスリーブ5で
取り囲まれており、かつその頭部6aが前記カップ状ホ
ルダー2の外側底面2bと所定の間隔を保って配置され
て傍熱形を構成している。このヒータ6とスリーブ5及
び陰極ペレット4とで傍熱形含浸陰極構造体7を構成し
ている。
The high melting point metal porous substrate 1 containing the thermoelectron emitting material 3 is fixed to a cup-shaped holder 2 to form a cathode pellet 4. Reference numeral 5 denotes a sleeve.
Is made of tantalum (Ta), and the cathode pellet 4 is inserted into one end 5a of the cup-shaped holder 2 from the outer bottom surface 2b side so that the thermoelectron emission surface 1a is on the outside. Is welded and fixed to the side wall 5b by laser welding or resistance welding. SW3 indicates the welding site at that time. Reference numeral 6 denotes a heater which is inserted from the other end 5c side of the sleeve 5 and whose entire length is surrounded by the sleeve 5, and whose head 6a has a predetermined distance from the outer bottom surface 2b of the cup-shaped holder 2. It is arranged keeping the shape of the indirect heat. The heater 6, the sleeve 5 and the cathode pellet 4 constitute an indirectly heated impregnated cathode structure 7.

【0033】この例では、高融点金属多孔質基体1の直
径と、カップ状ホルダー2の内径とをほぼ同径とした
が、高融点金属多孔質基体1の直径をカップ状ホルダー
2の内径より0.2mm程度まで小さくしても良い。
In this example, the diameter of the high-melting-point porous metal substrate 1 and the inner diameter of the cup-shaped holder 2 are substantially the same, but the diameter of the high-melting-point porous metal substrate 1 is made larger than the inner diameter of the cup-shaped holder 2. It may be reduced to about 0.2 mm.

【0034】図2は図1に示す本発明による傍熱形含浸
陰極構造体の一実施例の製造方法を説明するために一対
の溶接電極間に被溶接物を配置した状態の断面図で、図
1と同じ部分には同一記号を付してある。
FIG. 2 is a sectional view showing a state in which an object to be welded is arranged between a pair of welding electrodes in order to explain a manufacturing method of one embodiment of the indirectly heated impregnated cathode structure according to the present invention shown in FIG. 1 are given the same reference numerals.

【0035】図2において、前記一対の第1及び第2の
溶接電極21、22はその対向面21a、22aが平坦
と凸形状の組合わせと成っており、第1の溶接電極であ
る平坦な対向面21aを有する平面溶接電極21上に、
熱電子放出物質3を含む高融点金属多孔質基体1と組み
合わせた状態のカップ状ホルダー2をその熱電子放出面
1aが前記平坦な対向面21aに対面するように載置す
る。
In FIG. 2, the pair of first and second welding electrodes 21 and 22 have a combination of flat and convex surfaces 21a and 22a, respectively. On the flat welding electrode 21 having the facing surface 21a,
The cup-shaped holder 2 combined with the refractory metal porous substrate 1 containing the thermionic emission material 3 is placed so that the thermionic emission surface 1a faces the flat opposing surface 21a.

【0036】次に、この状態で前記平面溶接電極21上
に対向配置された第2の溶接電極である凸形状の対向面
22aを有する非平面溶接電極22を矢印23で示すよ
うに下降させ、加圧、通電して熱電子放出物質3を含む
高融点金属多孔質基体1とカップ状ホルダー2とを溶接
固定して陰極ペレット4を形成する。
Next, in this state, the non-planar welding electrode 22 having the convex facing surface 22a, which is the second welding electrode disposed opposite to the planar welding electrode 21, is lowered as shown by an arrow 23. The cathode pellet 4 is formed by pressurizing and energizing to weld and fix the refractory metal porous substrate 1 containing thermionic emission material 3 and the cup-shaped holder 2 by welding.

【0037】ここで、この例では前記第1の溶接電極で
ある平面溶接電極21は直径12mmのタングステン丸
棒の一部を平面に加工して用いた。この電極材料は銅、
モリブデン等でもよい。又前記第2の溶接電極である非
平面溶接電極22は直径6mmの銅棒を用い対向面22
aは曲率半径5mmの球面とした。この曲率半径はこの
例では4mm以上有れば目的が達せられることが確認で
きた。又、電極材料としては、前記銅に限定されず、例
えばタングステン、モリブデン等でもよい。
Here, in this example, the flat welding electrode 21 as the first welding electrode was formed by processing a part of a tungsten round bar having a diameter of 12 mm into a flat surface. This electrode material is copper,
Molybdenum or the like may be used. The non-planar welding electrode 22, which is the second welding electrode, is made of a copper rod having a diameter of 6 mm using a facing surface 22.
a is a spherical surface having a radius of curvature of 5 mm. In this example, it was confirmed that the object could be achieved if the radius of curvature was 4 mm or more in this example. Further, the electrode material is not limited to copper, and may be, for example, tungsten, molybdenum, or the like.

【0038】この様にして形成された陰極ペレット4
を、スリ−ブ5と固着し、更にヒ−タ6を挿入して傍熱
形含浸陰極構造体7を製造している。
The cathode pellet 4 thus formed
Is fixed to a sleeve 5 and a heater 6 is inserted to produce an indirectly heated impregnated cathode structure 7.

【0039】図2に示した例では、対向面が球面を呈す
る非平面溶接電極22を用いることにより、高融点金属
多孔質基体1とカップ状ホルダー2との間に存在する微
小間隙の凹部1cの開口端側周縁部を均一に加圧するこ
とができ、これにより両者の底面1b、2aの接触を一
層良好に維持した状態で溶接が行なわれるため、溶接時
の通電電流と電圧を一定にすることができ、均一で強固
な、かつ安定した溶接を可能にした。
In the example shown in FIG. 2, the non-planar welding electrode 22 having a spherical opposing surface is used, so that the concave portion 1c of the minute gap existing between the refractory metal porous substrate 1 and the cup-shaped holder 2 is formed. Can be uniformly pressed at the opening end side, thereby performing welding while maintaining the contact between the bottom surfaces 1b and 2a better, so that the current and voltage during welding are constant. It enabled uniform, strong and stable welding.

【0040】更に、溶接電極を平面と非平面との組合わ
せとすることにより、溶接時に要求される両電極の平行
度裕度が緩和でき、作業効率を大幅に向上することがで
きる。
Further, by using a combination of flat and non-planar welding electrodes, the degree of parallelism between the two electrodes required at the time of welding can be reduced, and the working efficiency can be greatly improved.

【0041】図3は高融点金属多孔質基体とカップ状ホ
ルダ−との溶接強度とその変動を、本発明と従来技術と
を比較して示すもので、溶接条件は、加圧力:3kg
f、投入電力(電圧V×電流A):300W、溶接時
間:3msとした。
FIG. 3 shows the welding strength of the high melting point metal porous substrate and the cup-shaped holder and its fluctuation in comparison with the present invention and the prior art.
f, input power (voltage V × current A): 300 W, welding time: 3 ms.

【0042】この条件の下、本発明の方法は前述した図
2のものを、また従来の方法は、高融点金属多孔質基体
1とカップ状ホルダー2との間に凹部1cが存在しない
こと及び一対の溶接電極は何れも平面電極を用いたこと
を除いて材料、寸法は図2に合わせた。
Under this condition, the method of the present invention is the same as that of FIG. 2 described above, and the conventional method is that there is no concave portion 1c between the high melting point metal porous substrate 1 and the cup-shaped holder 2. The materials and dimensions were the same as in FIG. 2 except that a flat electrode was used for each of the pair of welding electrodes.

【0043】図3から明らかなように、丸印で示す本発
明の方法に依るもでは溶接強度が600〜700gf
で、かつ変動も少ない。この溶接強度は製品寿命からみ
て400gf以上有れば実用上問題の無いことが本発明
者らの実験の結果から明らかとなっている。
As is apparent from FIG. 3, the welding strength of 600 to 700 gf is obtained by the method of the present invention shown by a circle.
And little fluctuation. It is clear from the results of experiments by the present inventors that there is no practical problem if the welding strength is 400 gf or more in view of the product life.

【0044】一方、角印で示す従来の方法によるもの
は、溶接強度は最低200gfから最高750gf迄と
大きく変動し、更に実用に耐えない強度のものが多数存
在して、固着の信頼性が確保出来ないことを明らかにし
ている。
On the other hand, in the case of the conventional method indicated by square marks, the welding strength fluctuates greatly from a minimum of 200 gf to a maximum of 750 gf. It clarifies what cannot be done.

【0045】図4(a)〜(c)は、本発明による傍熱
形含浸陰極構造体の他の実施例を説明するための概略断
面図で、図1及び図2と同じ部分には同一記号を付して
ある。
FIGS. 4A to 4C are schematic cross-sectional views for explaining another embodiment of the indirectly heated impregnated cathode structure according to the present invention, and the same parts as those in FIGS. 1 and 2 are the same. The symbol is attached.

【0046】先ず、図4(a)に示す実施例では、高融
点金属多孔質基体31のその熱電子放出面31aとは反
対側の底面31bは平坦であり、一方カップ状ホルダー
32の内側底面32aの略中央に微小間隙を形成する凹
部32bを有している。この凹部32bの寸法形状は図
1の凹部1cと略同一で有る。。又、符号32cはカッ
プ状ホルダー32の開口端側の先端、34は陰極ペレッ
ト、37は傍熱形含浸陰極構造体を示す。
First, in the embodiment shown in FIG. 4A, the bottom surface 31b of the refractory metal porous substrate 31 opposite to the thermionic emission surface 31a is flat, while the inner bottom surface of the cup-shaped holder 32 is flat. A recess 32b forming a minute gap is provided substantially at the center of 32a. The dimensional shape of the concave portion 32b is substantially the same as the concave portion 1c of FIG. . Reference numeral 32c denotes a tip on the opening end side of the cup-shaped holder 32, 34 denotes a cathode pellet, and 37 denotes an indirectly heated impregnated cathode structure.

【0047】次に、図4(b)に示す実施例では、高融
点金属多孔質基体41のその熱電子放出面41aとは反
対側の底面41bの略中央に環状の凹部41cを有する
と共に、カップ状ホルダー42の内側底面42aにも前
記凹部41cに対向する位置に凹部42bを有してい
る。この例でも前記熱電子放出面41aは前記カップ状
ホルダー42の開口端側の先端42cより突出してい
る。又、符号44は陰極ペレット、47は傍熱形含浸陰
極構造体を示す。
Next, in the embodiment shown in FIG. 4 (b), the refractory metal porous substrate 41 has an annular concave portion 41c substantially at the center of the bottom surface 41b opposite to the thermionic emission surface 41a. The inner bottom surface 42a of the cup-shaped holder 42 also has a concave portion 42b at a position facing the concave portion 41c. Also in this example, the thermoelectron emission surface 41a protrudes from the tip 42c on the opening end side of the cup-shaped holder 42. Reference numeral 44 denotes a cathode pellet, and reference numeral 47 denotes an indirectly heated impregnated cathode structure.

【0048】更に、図4(c)に示す実施例では、図1
に示す実施例でカップ状ホルダー2の内側底面2aを凹
部1cに沿うように加圧変形させて固着している。この
構成は、例えば図2に示す非平面電極の球面の形状を選
ぶことでも達成でき、又この構造では図示しないがヒ−
タを高融点金属多孔質基体1側に一層接近させることが
出来る。
Further, in the embodiment shown in FIG.
In the embodiment shown in (1), the inner bottom surface 2a of the cup-shaped holder 2 is fixed by pressing and deforming along the concave portion 1c. This configuration can also be achieved by selecting the shape of the spherical surface of the non-planar electrode shown in FIG. 2, for example.
Can be brought closer to the refractory metal porous substrate 1 side.

【0049】ここで、上述では高融点金属多孔質基体と
カップ状ホルダーの一方または両方に1個の凹部を備え
たが、複数個でも良いことは勿論である。
In the above description, one or both of the high-melting-point metal porous substrate and the cup-shaped holder are provided with one concave portion, but it is needless to say that a plurality of concave portions may be provided.

【0050】図5は本発明による傍熱形含浸陰極構造体
を、カラ−陰極線管に実装する際の陰極組立体の具体的
な全体構成例を説明するインライン方向断面図である。
傍熱形含浸陰極構造体はヒ−タの図示を省略してある
が、前述した図1の実施例の構成を有する。
FIG. 5 is a sectional view in the in-line direction illustrating a specific example of the entire structure of the cathode assembly when the indirectly heated impregnated cathode structure according to the present invention is mounted on a color cathode ray tube.
Although the illustration of the heater is omitted in the indirectly heated impregnated cathode structure, it has the configuration of the embodiment of FIG. 1 described above.

【0051】図5において、51は3個の筒状の陰極支
持体、52は1枚の絶縁基板で、この絶縁基板52は前
記各陰極支持体51を所定の間隔で貫通させてその一端
部51aで封着固定している。この陰極支持体51と同
軸に配置された傍熱形含浸陰極構造体7は、陰極ペレッ
ト4と反対側のスリ−ブ5の開口端側でデイスク53の
一端53aと固定しており、このデイスク53の他端5
3bは前記陰極支持体51の前記絶縁基板52との封着
固定端側とは反対側の端部で固定している。符号54は
3個の傍熱形含浸陰極構造体7を含む全体の陰極組立体
で、この陰極組立体54を電子銃を構成する他の電極と
共に絶縁支持杆に所定の相互関係で固定してインライン
型の電子銃を構成している。図中×印は固定点を示す。
In FIG. 5, reference numeral 51 denotes three cylindrical cathode supports, 52 denotes one insulating substrate, and the insulating substrate 52 is formed by penetrating each of the cathode supports 51 at a predetermined interval and having one end thereof. The seal is fixed at 51a. The indirectly heated impregnated cathode structure 7, which is arranged coaxially with the cathode support 51, is fixed to one end 53a of a disk 53 at the opening end of the sleeve 5 opposite to the cathode pellet 4. The other end 5 of 53
3b is fixed at the end of the cathode support 51 opposite to the fixed end of the cathode support 51 with the insulating substrate 52. Reference numeral 54 denotes an entire cathode assembly including three indirectly heated impregnated cathode structures 7. This cathode assembly 54 is fixed together with other electrodes constituting the electron gun to an insulating support rod in a predetermined relationship. It constitutes an in-line type electron gun. The crosses in the figure indicate fixed points.

【0052】図6は図5に示す陰極組立体を実装したカ
ラ−陰極線管に用いる電子銃構体の一例を示す側面図で
ある。図6において60は陰極組立体、61は第1電
極、62は第2電極、63は第3電極、64は第4電
極、65は第5電極、66は第6電極、67は第7電
極、68はビーディングガラス(絶縁支持杆)、69は
ステム、69aはステムピンである。
FIG. 6 is a side view showing an example of an electron gun assembly used for a color cathode ray tube on which the cathode assembly shown in FIG. 5 is mounted. 6, reference numeral 60 denotes a cathode assembly, 61 denotes a first electrode, 62 denotes a second electrode, 63 denotes a third electrode, 64 denotes a fourth electrode, 65 denotes a fifth electrode, 66 denotes a sixth electrode, and 67 denotes a seventh electrode. 68, a beading glass (insulating support rod); 69, a stem; 69a, a stem pin.

【0053】同図において、陰極組立体60、第1電極
61、第2電極62、第3電極63、第4電極64、第
5電極65、第6電極66及び第7電極67は一対のビ
ーディングガラス68で同軸に固定される。
In the figure, the cathode assembly 60, the first electrode 61, the second electrode 62, the third electrode 63, the fourth electrode 64, the fifth electrode 65, the sixth electrode 66 and the seventh electrode 67 are a pair of beads. It is coaxially fixed with a loading glass 68.

【0054】陰極組立体60から発射された電子ビーム
は第1電極61、第2電極62、第3電極63、第4電
極64、第5電極65、第6電極66及び第7電極67
で所要の加速、集束を受け、第7電極67から蛍光面方
向に出射する。なお、ステムピン69aは、電子銃を構
成する所定の電極に必要とする電圧および画像信号を印
加する端子である。
The electron beam emitted from the cathode assembly 60 is applied to the first electrode 61, the second electrode 62, the third electrode 63, the fourth electrode 64, the fifth electrode 65, the sixth electrode 66, and the seventh electrode 67.
Then, the light is subjected to required acceleration and focusing, and is emitted from the seventh electrode 67 in the direction of the fluorescent screen. The stem pin 69a is a terminal for applying a voltage and an image signal required for predetermined electrodes constituting the electron gun.

【0055】図7は本発明による傍熱形含浸陰極構造体
を具備した陰極線管の一実施例を説明するシャドウマス
ク型カラー陰極線管の部分断面図で、同図において71
はパネル、72はネック、73はファンネル、74は蛍
光面、75は多数の電子ビーム通過孔を有するシャドウ
マスク、76はマスクフレーム、77は磁気シールド、
78はシャドウマスク懸架機構、79は3本の電子ビー
ムBc(センター電子ビーム)、Bs(2本のサイド電
子ビーム)を発射する電子銃、DYは電子ビームを水平
と垂直に偏向する偏向ヨーク、MAはピュリティ補正等
の外部磁気装置である。
FIG. 7 is a partial cross-sectional view of a shadow mask type color cathode ray tube for explaining one embodiment of a cathode ray tube having the indirectly heated impregnated cathode structure according to the present invention.
Is a panel, 72 is a neck, 73 is a funnel, 74 is a phosphor screen, 75 is a shadow mask having many electron beam passage holes, 76 is a mask frame, 77 is a magnetic shield,
78 is a shadow mask suspension mechanism, 79 is an electron gun that emits three electron beams Bc (center electron beam) and Bs (two side electron beams), DY is a deflection yoke that deflects the electron beam horizontally and vertically, MA is an external magnetic device such as a purity correction.

【0056】同図において、蛍光面74を内面に有する
パネル71と,ファンネル73とは、パネル71とファ
ンネル73で形成されるバルブ内部にシャドウマスク7
5および磁気シールド77等を固定したマスクフレーム
76をシャドウマスク懸架機構78で装架し、フリット
ガラスでパネル71とファンネル73を溶着固定した
後、ネック72に電子銃79を封入して、ネック72に
おいて真空封止される。
In the figure, a panel 71 having a fluorescent screen 74 on the inner surface and a funnel 73 are provided inside a bulb formed by the panel 71 and the funnel 73.
5 and a mask frame 76 to which the magnetic shield 77 and the like are fixed are mounted by a shadow mask suspension mechanism 78, and the panel 71 and the funnel 73 are welded and fixed with frit glass. Is vacuum sealed.

【0057】電子銃79から発射された電子ビームB
c、Bsはネック72とファンネル73の遷移部分に装
着された偏向ヨークDYで水平と垂直の2方向に偏向を
受け、色選択電極であるシャドウマスク75の電子ビー
ム通過孔を通して蛍光面を構成する所定色の蛍光面74
に射突することにより画像を形成する。
Electron beam B emitted from electron gun 79
c and Bs are deflected in two directions, horizontal and vertical, by a deflection yoke DY attached to a transition portion between the neck 72 and the funnel 73, and form a phosphor screen through an electron beam passage hole of a shadow mask 75 which is a color selection electrode. Phosphor screen 74 of predetermined color
To form an image.

【0058】本発明は上記の実施例に限定されるもので
はなく、特許請求の範囲に記載した本発明の思想を逸脱
しない範囲で種々の変更が可能である。
The present invention is not limited to the embodiments described above, and various modifications can be made without departing from the spirit of the present invention described in the appended claims.

【0059】[0059]

【発明の効果】以上説明したように、本発明によれば、
高融点金属多孔質基体とカップ状ホルダーとの固着面に
微小間隙が存在することで両者の固着強度の向上と固着
の信頼性の確保が可能となる。
As described above, according to the present invention,
The presence of the minute gap in the fixing surface between the high melting point metal porous substrate and the cup-shaped holder makes it possible to improve the fixing strength of both and secure the reliability of the fixing.

【0060】又、溶接時の加圧の均一性が高くなり、通
電電流と電圧を一定にすることが出来、均一で安定した
溶接が可能となると共に、溶接電極相互の平行度裕度が
緩和出来、固着作業効率を大幅に向上できる。
In addition, the uniformity of pressurization during welding is increased, the current and voltage can be made constant, uniform and stable welding can be performed, and the parallelism tolerance between welding electrodes is reduced. The fixing work efficiency can be greatly improved.

【0061】更に、溶接固定する際、熱電子放出物質が
激しく噴き出すこともなく、結果的には溶接跡が穴明き
状態と成る事も無く、良好な溶接固着状態となり、溶着
固定の信頼性確保が可能になると共に熱電子放出物質の
溶接穴からの吹き出しによる陰極構体周りの汚染もなく
なり、長寿命の傍熱形含浸陰極構体及び高輝度、高解像
度で長寿命の陰極線管を提供することが出来る。
Furthermore, when welding and fixing, thermionic emission material does not erupt violently, and as a result, the welding trace does not become a hole, and a good welding and fixing state is obtained. To provide a long-life indirectly heat impregnated cathode structure and a high-brightness, high-resolution, long-life cathode ray tube that can secure the structure and eliminate contamination around the cathode structure due to blowing of thermionic emission material from the welding hole. Can be done.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の傍熱形含浸陰極構造体の一実施例を説
明するための概略的断面図である。
FIG. 1 is a schematic cross-sectional view for explaining one embodiment of an indirectly heated impregnated cathode structure of the present invention.

【図2】本発明の傍熱形含浸陰極構造体の製造方法を説
明するための概略的断面図である。
FIG. 2 is a schematic cross-sectional view for explaining a method of manufacturing the indirectly heated impregnated cathode structure of the present invention.

【図3】本発明の傍熱形含浸陰極構造体の溶接強度を説
明するための図である。
FIG. 3 is a diagram for explaining the welding strength of the indirectly heated impregnated cathode structure of the present invention.

【図4】本発明の傍熱形含浸陰極構造体の他の実施例を
説明するための概略的断面図である。
FIG. 4 is a schematic cross-sectional view for explaining another embodiment of the indirectly heated impregnated cathode structure of the present invention.

【図5】本発明の傍熱形含浸陰極構造体を具備する陰極
組立体の具体的な全体構成例を説明するインライン方向
断面図である。
FIG. 5 is an in-line direction cross-sectional view illustrating a specific overall configuration example of a cathode assembly including the indirectly heated impregnated cathode structure of the present invention.

【図6】図5に示す陰極組立体を実装したカラ−陰極線
管に用いる電子銃構体の一例を示す側面図である。
6 is a side view showing an example of an electron gun assembly used for a color cathode ray tube on which the cathode assembly shown in FIG. 5 is mounted.

【図7】本発明の傍熱形含浸陰極構造体を具備する陰極
線管の一実施例を示すシャドウマスク形カラー陰極線管
の部分断面図である。
FIG. 7 is a partial cross-sectional view of a shadow mask type color cathode ray tube showing one embodiment of a cathode ray tube having the indirectly heated impregnated cathode structure of the present invention.

【図8】従来の傍熱形含浸陰極構造体を示す概略的断面
図である。
FIG. 8 is a schematic sectional view showing a conventional indirectly heated impregnated cathode structure.

【符号の説明】[Explanation of symbols]

1 高融点金属多孔質基体 1c 凹部 2 カップ状ホルダ− 3 電子放出物質 4 陰極ペレット 5 スリ−ブ 6 ヒ−タ 7 傍熱形含浸陰極構造体。 REFERENCE SIGNS LIST 1 High-melting-point metal porous substrate 1c recess 2 cup-shaped holder 3 electron-emitting substance 4 cathode pellet 5 sleeve 6 heater 7 indirectly heated impregnated cathode structure

フロントページの続き (72)発明者 高倉 博 千葉県茂原市早野3350番地 日立エレクト ロニックデバイシズ株式会社内 (72)発明者 鈴木 行男 千葉県茂原市早野3300番地 株式会社日立 製作所ディスプレイグループ内 (72)発明者 柴田 倫秀 千葉県茂原市早野3300番地 株式会社日立 製作所ディスプレイグループ内 (72)発明者 齋藤 駿次 千葉県茂原市早野3300番地 株式会社日立 製作所ディスプレイグループ内 (72)発明者 野中 育光 千葉県茂原市早野3300番地 株式会社日立 製作所ディスプレイグループ内 Fターム(参考) 5C027 CC10 5C031 DD10 DD15 DD19 Continuing from the front page (72) Inventor Hiroshi Takakura 3350 Hayano Mobara-shi, Chiba Prefecture Hitachi Electronics Devices, Ltd. (72) Inventor Yukio Suzuki 3300 Hayano Mobara-shi, Chiba Display Group of Hitachi, Ltd. 72) Inventor Norihide Shibata 3300 Hayano, Mobara-shi, Chiba Prefecture, Hitachi, Ltd.Display Group (72) Inventor Shunji Saito 3300, Hayano, Mobara-shi, Chiba Prefecture, Hitachi, Ltd.Display Group, Hitachi, Ltd. Hikari 3300 Hayano, Mobara-shi, Chiba F-term (reference) 5C027 CC10 5C031 DD10 DD15 DD19 in Display Group, Hitachi, Ltd.

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】高融点金属多孔質基体に熱電子放出物質を
含浸した陰極ペレットと、前記高融点金属多孔質基体の
電子放出面を除く他の面と固着したカップ状ホルダー
と、このカップ状ホルダーとその頭部を対向して配置し
たヒータと、前記カップ状ホルダーの側壁と固着したス
リーブとを有する傍熱形含浸陰極構造体であって、 前記カップ状ホルダーは、その内側底面が前記高融点金
属多孔質基体の前記電子放出面の反対側の底面と固着さ
れ、かつその固着面に微小間隙を有することを特徴とす
る傍熱形含浸陰極構造体。
A cathode pellet comprising a refractory metal porous substrate impregnated with a thermionic emission material; a cup-shaped holder fixed to the other surface of the refractory metal porous substrate except for an electron emission surface; An indirectly heated impregnated cathode structure having a holder and a heater having its head opposed to each other, and a sleeve fixed to a side wall of the cup-shaped holder, wherein the cup-shaped holder has an inner bottom surface having the height. An indirectly-heated impregnated cathode structure fixed to a bottom surface of the porous metal base member opposite to the electron emission surface and having a minute gap in the fixed surface.
【請求項2】前記微小間隙は、前記高融点金属多孔質基
体の底面及び前記カップ状ホルダーの内側底面の何れか
一方又は両方の凹部によって構成されていることを特徴
とする請求項1の傍熱形含浸陰極構造体。
2. The apparatus according to claim 1, wherein the minute gap is formed by a concave portion of one or both of a bottom surface of the refractory metal porous substrate and an inner bottom surface of the cup-shaped holder. Hot impregnated cathode structure.
【請求項3】前記カップ状ホルダーの底面はその略中央
部が前記高融点金属多孔質基体側へ突出していることを
特徴とする請求項1の傍熱形含浸陰極構造体。
3. The indirectly-heated impregnated cathode structure according to claim 1, wherein the bottom surface of said cup-shaped holder has a substantially central portion protruding toward said refractory metal porous substrate.
【請求項4】前記カップ状ホルダーの前記高融点金属多
孔質基体を取り囲む開口端側の先端は、前記高融点金属
多孔質基体の前記電子放出面より後退していることを特
徴とする請求項1の傍熱形含浸陰極構造体。
4. An end of the cup-shaped holder on the opening end side surrounding the refractory metal porous substrate is receded from the electron emission surface of the refractory metal porous substrate. 1. An indirectly heated impregnated cathode structure.
【請求項5】高融点金属粉末集積体を圧縮整形し焼結し
て得られた高融点金属多孔質基体に、電子放出物質を含
浸してなる傍熱形含浸陰極構造体の製造方法であって、 前記高融点金属多孔質基体の底面に凹部を設ける工程
と、この高融点金属多孔質基体にバリウムを含むアルカ
リ土類金属酸化物とアルミナとの化合物を主成分とする
電子放出物質を含浸する工程と、前記電子放出物質を含
浸した前記高融点金属多孔質基体の前記底面を前記カッ
プ状ホルダーの内側底面と対面させて前記カップ状ホル
ダーの内側に挿入した後、前記高融点金属多孔質基体と
前記カップ状ホルダーとを一対の溶接電極で溶接固定す
る工程とを有し、前記一対の溶接電極のうち前記電子放
出面側に第1の溶接電極として平面溶接電極を、又前記
カップ状ホルダーの外側底面側の第2の溶接電極として
非平面溶接電極をそれぞれ用いる事を特徴とする傍熱形
含浸陰極構造体の製造方法。
5. A method for producing an indirectly heat impregnated cathode structure comprising impregnating an electron emitting material into a high melting point metal porous substrate obtained by compressing, shaping and sintering a high melting point metal powder assembly. Forming a concave portion on the bottom surface of the high-melting-point metal porous substrate, and impregnating the high-melting-point metal porous substrate with an electron-emitting substance mainly composed of a compound of an alkaline earth metal oxide containing barium and alumina. And inserting the inside of the cup-shaped holder with the bottom surface of the refractory metal porous substrate impregnated with the electron-emitting substance facing the inner bottom surface of the cup-shaped holder. Welding the base and the cup-shaped holder with a pair of welding electrodes, wherein a flat welding electrode is provided as a first welding electrode on the electron emission surface side of the pair of welding electrodes, and the cup-shaped Holder A method for producing an indirectly heated impregnated cathode structure, wherein a non-planar welding electrode is used as the second welding electrode on the outer bottom surface side.
【請求項6】高融点金属多孔質基体に熱電子放出物質を
含浸した構成の傍熱形含浸陰極構造体を具備する陰極線
管であって、 前記高融点金属多孔質基体に熱電子放出物質を含浸した
陰極ペレットと、前記高融点金属多孔質基体の電子放出
面を除く他の面と固着したカップ状ホルダーと、このカ
ップ状ホルダーとその頭部を対向して配置したヒータ
と、前記カップ状ホルダーの側壁と固着したスリーブと
を有し、前記カップ状ホルダーは、その内側底面が前記
高融点金属多孔質基体の前記電子放出面の反対側の底面
と固着され、かつその固着面に微小間隙を有する傍熱形
含浸陰極構造体を備えたことを特徴とする陰極線管。
6. A cathode ray tube comprising an indirectly heated impregnated cathode structure having a structure in which a refractory metal porous substrate is impregnated with a thermionic emission material, wherein the refractory metal porous substrate is provided with a thermionic emission material. An impregnated cathode pellet, a cup-shaped holder fixed to the other surface of the refractory metal porous substrate except for the electron emission surface, a heater in which the cup-shaped holder and its head are arranged to face each other, The cup-shaped holder has a side wall fixed to a side wall of the refractory metal porous substrate opposite to the electron emission surface, and a small gap is formed in the fixed surface. A cathode ray tube comprising an indirectly heated impregnated cathode structure having:
JP27175999A 1999-09-27 1999-09-27 Structural body for side heated immersed cathode and cathode-ray tube using the same Pending JP2001093402A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27175999A JP2001093402A (en) 1999-09-27 1999-09-27 Structural body for side heated immersed cathode and cathode-ray tube using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27175999A JP2001093402A (en) 1999-09-27 1999-09-27 Structural body for side heated immersed cathode and cathode-ray tube using the same

Publications (1)

Publication Number Publication Date
JP2001093402A true JP2001093402A (en) 2001-04-06

Family

ID=17504453

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27175999A Pending JP2001093402A (en) 1999-09-27 1999-09-27 Structural body for side heated immersed cathode and cathode-ray tube using the same

Country Status (1)

Country Link
JP (1) JP2001093402A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020085096A (en) * 2001-05-04 2002-11-16 삼성에스디아이 주식회사 Cathode assembly for cathode ray tube

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020085096A (en) * 2001-05-04 2002-11-16 삼성에스디아이 주식회사 Cathode assembly for cathode ray tube

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