JP2001084524A - Magnetic head and magnetic head device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a magnetic head and a magnetic head device capable of more accurately retrieving the track position of the magnetic head provided with a magnetoresistance effect element by an optical measurement device. SOLUTION: This magnetic head is provided with a sliding surface where a recording medium TP is slid, the magnetoresistance effect element provided on the sliding surface and a track TW formed of the magnetic resistance effect element. In this case, the magnetic head 20 is provided with the track position retrieval marker 29 of the magnetoresistance effect element arranged adjacently to the magnetic resistance effect element 26, offset for an azimuth portion and arranged on the sliding surface 24.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic head and a magnetic head device for recording and reproducing information on a recording medium such as a magnetic tape by helical scanning.

[0002]

2. Description of the Related Art In general, a thin film magnetic head, which is a magnetic head, is formed by laminating thin films such as a magnetic film and an insulating film in multiple layers.
Further, it is constituted by forming a conductor coil, a lead wire and a terminal. Such a thin film magnetic head is
Since it is formed by the vacuum thin film formation technology, it has the advantages that it is easy to make fine dimensions such as narrow tracks and narrow gaps, and that high-resolution recording is possible. Attention has been paid to thin film magnetic heads. As such a thin film magnetic head, for example, FIG.
As shown in FIG. 1, a magneto-resistance effect type head using a magneto-resistance effect element (hereinafter, referred to as an MR element) is known.

In FIG. 21, a magnetoresistive head 1
Is constituted by joining two soft magnetic substrates 2a and 2b with an adhesive or the like at a joint surface.
A sliding surface 2c is formed on the upper surface of each of a and 2b so as to have a predetermined track width. The sliding surface 2c is subjected to a curved surface processing in order to improve sliding with a magnetic tape as a recording medium. This magnetoresistive head (MR
The head 1 includes, for example, a non-magnetic non-conductive insulating film 3 as a lower layer gap, a magnetoresistive element (MR element) 4 and a non-magnetic non-conductive layer as an upper layer gap, which are sequentially formed on a substrate 2a. And an insulating film 5.
The MR element 4 has a predetermined track width Tw, and an electrode (described later) for applying a sense current I is connected to the MR element 4.

Here, the MR head 1 is described in detail in FIG.
As shown in FIG. 5, an MR element 4 is formed on a substrate 2a via an insulating film 3, electrodes 6 are formed on both sides thereof, an insulating film 5 is further formed thereon, and finally, 2b is placed.

According to the MR head 1 having such a configuration,
By using it as a reproducing head, the reproduced output does not depend on the speed of the magnetic recording medium, and even if the recording medium is scanned at a relatively low speed, a higher output can be obtained as compared with the inductive reproducing head. Has become.

[0006]

Incidentally, with respect to such an MR head 1, there are various operations for performing positioning control with reference to a track position at the time of incorporation or adjustment in a magnetic head recording / reproducing apparatus or the like. In these operations, the search for the track position of the MR head 1 is important. Here, the so-called track position, which is a physical range for reproducing the magnetic information of the inductive magnetic head, is determined by observing the sliding surface of the magnetic head that is in contact with and contacts the magnetic recording medium with an optical measurement device. It was clearly identifiable from its structure. For this reason, the machining accuracy in manufacturing the magnetic head can be easily assured, and the track width end of the inductive magnetic head with respect to the rotating drum of the helical scan system can be easily positioned at a predetermined position.

On the other hand, in the MR head, the search for the track position on the sliding surface is performed by the shield substrates 2a and 2
b (or a shield film made of a soft magnetic film) and an MR element 4 at the center of the lower shield and the upper shield.
Is performed on the premise that the central portion of the MR element 4 is located at the distance between the electrodes 6 at both ends of the MR element 4. However, such a search for the track position is performed by the MR element 4
Since both the electrode 6 and the electrode 6 have a film thickness of 0.1 μm or less, a high-performance microscope with a high magnification of 1000 times or more is required, and image processing is required. Was difficult. Further, as the prerequisite, the center of the MR element 3a is located at the center of the lower shield and the upper shield, the positional accuracy thereof is relatively low, and therefore, the speed, accuracy and reliability of the track position search are increased. There was a problem in the point.

SUMMARY OF THE INVENTION In view of the above, it is an object of the present invention to provide a magnetic head and a magnetic head device capable of accurately searching for a track position of a magnetic head having a magnetoresistive element by an optical measuring device. And

[0009]

According to the first aspect of the present invention, a sliding surface on which a recording medium slides, a magnetoresistive element provided on the sliding surface, And a track formed by the resistance effect element, wherein the track of the magnetoresistance effect element is arranged adjacent to the magnetoresistance effect element and is offset by azimuth on the sliding surface. This is achieved by a magnetic head characterized in that a position search marker is provided.

Preferably, in the configuration of claim 1, an imaginary line connecting an end of the magnetoresistive element and an end of the track position search marker is a side surface in a longitudinal direction of the sliding surface. The magnetic head is provided with the track position search marker so as to be disposed substantially in parallel with the magnetic head.

According to the above arrangement, the magnetic head is provided with the track position search marker of the magnetoresistive element, which is adjacent to the magnetoresistive element and offset by the azimuth on the sliding surface. ing.
Also, preferably, a virtual line connecting the end of the magnetoresistive element and the end of the track position search marker,
Since the track position search marker is provided so as to be arranged substantially in parallel with the side surface portion in the longitudinal direction of the sliding surface, the track position search marker and the track position of the magnetoresistive effect element are set as described above. Since the track position search marker is not optically measured on the sliding surface, it is easy to search for the track position of the magnetoresistive element on the sliding surface.

[0012] According to a ninth aspect of the present invention, a sliding surface on which a recording medium slides, a magnetoresistive element provided on the sliding surface, and the magnetoresistive element are formed. A magnetic head device having a magnetic head having a magnetic head having: a magnetic head disposed adjacent to the magnetoresistive element of the magnetic head and offset by azimuth on the sliding surface. This is achieved by a magnetic head device including a magnetic head, wherein a track position search marker for an effect element is provided.

According to the above construction, the magnetic head device is provided with a magnetoresistive element arranged adjacent to the magnetoresistive element of the magnetic head and offset by azimuth on the sliding surface. Since the track position search marker of the effect element is provided, the track position search marker and the track position of the magnetoresistive element are not disposed obliquely on the sliding surface. When optically measuring the search marker, the track position of the magnetoresistive element on the sliding surface can be easily searched. Therefore, the work of mounting the magnetic head on the head drum with reference to the track position of the magnetoresistive element can be performed easily and at high speed, and the accuracy and reliability of the magnetic head device can be further improved.

[0014]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a preferred embodiment of the present invention will be described in detail with reference to FIGS.
The embodiment described below is a preferred specific example of the present invention, and thus various technically preferable limitations are added. However, the scope of the present invention particularly limits the present invention in the following description. The embodiment is not limited to these embodiments unless otherwise stated.

FIG. 1 shows the configuration of a rotary magnetic head device provided with a magnetoresistive head (MR head) which is a magnetic head according to an embodiment of the present invention. In FIG. 1, a rotating magnetic head device 10 includes a fixed drum 11,
A rotating drum 12, a motor M and the like are provided. A motor M is provided below the fixed drum 11, and a rotary drum 12 is provided above the fixed drum 11.
The rotating drum 12 and the motor M are connected via a shaft 14, and the fixed drum 11 supports the shaft 14 by a bearing (not shown). A lead guide portion 13 is formed on the outer peripheral surface of the fixed drum 11, and a magnetic tape TP, which is a tape-shaped magnetic information recording medium, is moved along the lead guide portion 13 along the entrance side as shown by an arrow E. The paper is sent obliquely from IN to the outlet side OUT.

A notch is formed in the outer peripheral surface of the rotary drum 12, and the thin-film magnetic head 20 is disposed in the notch so as to protrude from the outer peripheral surface of the rotary drum 12. The rotating drum 12 rotates in the direction of the arrow R1 with respect to the fixed drum 11 by the operation of the motor M. Along with this, the MR head 20 also rotates, and performs recording or reproduction while sliding on the magnetic tape TP as the recording medium. At this time, since the magnetic tape TP is traveling obliquely in the direction of arrow E along the lead guide portion 13, the MR head 20
Is a so-called helical scan system that records or reproduces information on a magnetic tape TP.

FIGS. 2 and 3 show an MR head 20 according to a first embodiment of the present invention. In FIG.
The MR head 20 is configured as a so-called substrate shield type magnetoresistive head, and includes a substrate 21 and a magnetoresistive element (MR element) 26 and a substrate 23. The substrates 21 and 23 are formed in a thin plate shape having a substantially rectangular planar shape, and the upper surface thereof is a tape sliding surface 24.
It is formed as. The tape sliding surface 24 is formed as an arcuate curved surface along the tape running direction A.

As shown in FIG. 3, the MR head 20 has an insulating layer as a lower gap which is sequentially laminated on a soft magnetic substrate 21 made of a soft magnetic material, for example, polycrystalline ferrite such as Ni--Fe. The substrate 25 is composed of a film 25, an MR element 26, and an insulating film 27 as an upper layer gap. Finally, a soft magnetic substrate 23 similar to the substrate 21 is mounted thereon. The MR element 26 has a predetermined track width Tw, and electrodes 28 for applying a sense current I are connected to both sides of the MR element 26. Here, in the MR head 20, the substrates 21 and 23 form magnetic poles as shield cores. By reading a change in magnetic flux generated from the magnetic tape TP to the magnetic pole as a change in resistance of the MR element 26, an information signal is reproduced. Can be performed.

The above configuration is similar to the configuration of the MR head 1 shown in FIGS. 21 and 22, but in the MR head 20 according to the present embodiment, as shown in FIG. A track position search marker 29 for searching the track position of the MR element 26 is formed.
The track position search marker (hereinafter, referred to as a marker) 29 produces a distinct brightness difference from a metal material having excellent wear resistance, such as Ti, Ta, or the like, preferably a material forming the insulating films 25, 27. It is made of a metal material and has the same length as the MR element 26. In the case shown, the marker 29 corresponds to the MR element 26.
It has the same length as the element 26, and is disposed offset by azimuth as described later.

The MR head 20 having such a configuration is manufactured as described below. That is, the MR head 20 incorporates the marker 29 described above,
It is manufactured as shown in FIGS. First, a metal film 31 made of a metal material having excellent wear resistance to form a marker is sputtered on a substrate 30 (21) made of a soft magnetic material shown in FIG. 4, for example, polycrystalline ferrite such as Ni-Fe. The film is formed by a method or the like. The thickness of the metal film 31 is selected to be smaller than the thickness of the non-magnetic and non-conductive insulating film 25 serving as a lower gap.

Next, as shown in FIG. 5, a marker 29 having the same length as the MR element 26 is formed on the film 31 by photolithography. That is, first, FIG.
As shown in (1), a photoresist 32 is applied to the entire upper surface of the metal film 31, and exposure is performed using a mask 33 having a pattern 33a for the marker 29. afterwards,
By developing, as shown in FIG. 5B, the unexposed portions of the photoresist 32 are removed, and the pattern 33a is removed.
Is formed.

Subsequently, as shown in FIG. 5C, the exposed portion of the metal film 31 is removed by etching. In this case, the etching may be performed by a dry method or a wet method, but ion etching is preferable in consideration of easiness of processing and the like. FIG. 5C shows ion etching using argon ions. After the etching, the photoresist 32 is removed with a solvent such as acetone, so that the remaining portion 31a of the metal film 31 allows the marker 2 to be removed.
9 will be formed. In the following description,
The photolithography method is based on the same photoresist coating, exposure with a mask, development and etching as in FIG.

Next, as shown in FIG. 6, a non-magnetic, non-conductive insulating film 34 serving as a lower gap is formed on the entire surface of the substrate 30 from above the marker 29 by a sputtering method or the like. The insulating film 34 is preferably made of alumina (Al ₂ O ₃ ) from the viewpoint of insulating properties and abrasion resistance. Further, the thickness of the insulating film 34 is appropriately set according to a predetermined lower gap length (frequency of a recording signal or the like,
Specifically, the size is selected by adding about 20 nm to (for example, 85 nm). Then, the surface of the insulating film 34 is polished and mirror-finished, and has a predetermined thickness (flattened).
This is because alumina has a large surface roughness when formed by a sputtering method or the like, and thus, when an MR element is formed as it is, the characteristics of the MR element deteriorate. In this case, the polishing amount is about 20
Since it is on the order of nm, even if the substrate has a diameter of 3 inches or more, there is almost no polishing distribution error and uniform polishing is performed, so that it is possible to increase the diameter of the substrate. After polishing, washing with running water is performed before the polishing liquid is dried. If the cleaning is not performed, particles of the polishing liquid are fixed on the substrate surface, and the surface roughness may be deteriorated.

Thereafter, as shown in FIG. 7, an MR film 35 is formed on the insulating film 34. Here, the MR film 35
It has a known configuration, and is called a so-called SAL (Soft Adju).
(St Layer) bias structure. For example, Ta (5 nm), Ni
FeNb (25 nm), Ta (5 nm), NiFe (2
2 nm) and Ta (1 nm). Here, when the NiFe film is a soft magnetic film having a magnetoresistive effect, and the coercive force Hc is extremely small, the characteristics as an MR element become better. Also, N
The iFeNb film becomes a soft magnetic film (a so-called SAL film) for applying the next bias to the NiFe film. In addition, Ta
Acts as a magnetic separation layer. The configuration, material, and thickness of each thin film of the MR film 35 are not limited to the above examples, and appropriate values are selected according to the specifications. Here, the circle indicated by a chain line in FIG. 7A indicates a circular portion indicated by reference numeral B in FIG. 6, and the same applies to the drawings in FIGS. 8 to 12A. Further, in FIG. 7A, the length t1 of the marker 29 in the major axis direction is selected to be the same as the length of the MR element 26, and the length t2 in the minor axis direction perpendicular to this is appropriately set. Is selected. The thickness of the marker 29 is selected to be smaller than the thickness of the insulating film 34 as shown in FIG. Specifically, the thickness of the polished insulating film 34 is 65 nm.
On the other hand, the thickness of the marker 29 is, for example, 45
nm.

Next, as shown in FIG. 8, permanent magnet films 36a and 36b for stably operating the MR element 26 are embedded in the MR film 35 by photolithography. The permanent magnet films 36a and 36b have, for example, a length t3 in the major axis direction.
Is about 50 μm, the length t4 in the minor axis direction is about 10 μm, the interval between the two permanent magnet films 36a and 36b (the length t1 in the major axis direction of the marker 29) is about 7 μm, and the permanent magnet film 36a , 36b are offset rightward by a distance t5 with respect to the marker 29 as shown in the figure so as to be offset by the azimuth of the MR head 20. The interval between the permanent magnet films 36a and 36b finally becomes the track width of the magnetic head element 22. That is, in this case, the track width of the MR head 20 is about 7 μm.
The material of the permanent magnet films 36a and 36b has a holding force Hc of 10
A film having a thickness of 00 Oe or more is preferable, and for example, a CoNiPt film or a CoCrPt film is suitable. Here, the permanent magnet film 3
The embedding of the MR films 35 into the MR films 35 is performed, for example, by first forming a mask having two rectangular openings for each magnetic head element by using a photoresist film and etching the masks. Is removed. in this case,
The etching may be a dry method or a wet method, but preferably, ion etching is employed. Subsequently, after a permanent magnet film is formed by a sputtering method or the like, the photoresist film is removed together with the permanent magnet film formed thereon using a solvent such as acetone. This allows
As shown in FIG. 8, a predetermined pattern of the permanent magnet film 36a,
36b is embedded in the MR film 35.

Here, the offset amount t for the azimuth is
5 is obtained as follows with reference to FIG.
That is, in the case of the marker 29a facing the MR element 26 and having an offset amount of zero (see FIG. 9B), the marker 29a is positioned diagonally to the upper right of the MR element 26. Therefore, in the track position search of the MR element 26 in the direction parallel to the tape sliding direction, it is difficult to accurately search the track position based on the marker 29a. Therefore, it is preferable to offset the marker 29 in a direction parallel to the tape sliding direction in consideration of the azimuth angle θ of the MR head 20.

Here, when the offset amount t5 in FIG. 8 is the movement amount in the X direction in FIG.
Where Y is the displacement in the thickness direction of the MR head and Z is the displacement in the track width direction of the MR head 20, sin θ = Y / Z (1) cos θ = X / Z (2) Eliminating Z from Equations 1 and 2 and solving for X gives: t5 = X = (cos θ / sin θ9) · Y Equation 3 According to Equation 3, the moving length X, ie, the offset amount t
5 is required.

Thereafter, as shown in FIG. 10, the MR film 35 is etched by a photolithography method to leave the MR element 35a (26). At this time, portions 35b and 35c serving as electrodes for supplying a sense current are also left on both sides of the MR element 35a. Specifically, for example, a mask having an opening in the MR element 35a and the electrode portions 35b and 35c is formed for each magnetic head element using a photoresist film, and the MR film 35 exposed to the opening by etching is formed. Remove. Also in this case, the etching may be a dry method or a wet method, but preferably, ion etching is employed. Subsequently, the photoresist film is removed with a solvent such as acetone to obtain a photoresist film shown in FIG.
As shown in the figure, an MR element 35a and this MR element 35a
35a, which serve as electrodes for supplying a sense current to
35b will remain. Here, the length t6 of the MR element 35a in the long axis direction is, for example, 7 μm, and the marker 2
9 corresponds to the length t1 in the major axis direction. The length t7 of the MR element 35a in the minor axis direction is, for example, 4 μm.
The length t7 in the short-axis direction finally becomes the MR element 35a.
This corresponds to the length from the end to the other end on the tape sliding surface side of (29), that is, the depth length. Also, the electrode portions 35b, 35c
Has a length t8 of about 2 mm, a width t9 of about 80 μm, and an interval t10 of about 40 μm.

Next, as shown in FIG. 11, the electrodes 37a and 37b are formed by photolithography by replacing the electrode portions 35b and 35c with conductive films. More specifically, as shown in FIG. 12, a mask having openings in the electrode portions 35b and 35c is formed for each magnetic head element by a photoresist film, and the MR film 35 exposed to the openings by etching is formed. The electrode portions 35b and 35c are removed. Then, the conductive film 37 is formed thereon while leaving the mask of the photoresist film as it is. Here, the conductive film 37 is made of, for example, Ti (10 nm), Cu (50 n
m) and Ti (10 nm) are sequentially formed,
Although formed, a conductive film having an arbitrary configuration is not limited thereto, and may be used. Thereafter, by removing the photoresist film together with the conductive film 37 formed thereon, the electrodes 37a and 37b made of the conductive film are formed.

Subsequently, as shown in FIG. 12, a non-magnetic and non-conductive insulating film 38 serving as an upper layer gap of the magnetic head element is formed.
(27) is formed by a sputtering method or the like. In this case, too, alumina (Al ₂ O ₃ ) is preferably used as the material of the insulating film 38 from the viewpoint of insulating properties and abrasion resistance. The thickness of the insulating film 38 is set to an appropriate thickness according to the frequency of a recording signal and the like, and is, for example, about 100 nm.

Thereafter, as shown in FIG.
External terminals 39a, 37b for making an electrical connection with the outside are connected to one ends of the electrodes 37a, 37b for supplying a sense current to 5a.
39b is formed. Specifically, first, a mask having an opening in a portion corresponding to the external terminals 39a and 39b is formed by a photoresist film for each magnetic head element, and the insulating film 38 exposed in the opening is removed by etching. I do.
Also in this case, the etching may be a dry method or a wet method, but preferably, ion etching is employed. Then, a conductive film for external terminals is formed thereon while leaving the mask of the photoresist film as it is. Here, the conductive film is formed, for example, by forming a Cu film having a thickness of about 100 μm by a sputtering method or the like. Thereafter, by removing the photoresist film together with the conductive film formed thereon, the external terminals 39a and 39b made of the conductive film are formed. The external terminals 39a and 39b are formed on the electrodes 37a and 37b on the side opposite to the permanent magnet films 36a and 36b, and have a length t.
11 is, for example, about 50 μm from the ends of the electrodes 37a and 37b.
m.

As described above, the thin film process for forming the MR element 26 on the substrate 21 is completed by the above steps, and a number of magnetic head elements 22 are formed on the substrate 21 as shown in FIG. State and proceed to the next processing step. In the processing step, first, as shown in FIG.
1 is cut into a so-called strip shape so that the magnetic head elements 22 are arranged in the horizontal direction. Here, in FIG. 15, five magnetic head elements 22 are arranged, but it is desirable that the number of magnetic head elements 22 arranged in the horizontal direction is actually as large as possible from the viewpoint of productivity.

Next, as shown in FIG. 16, a thickness t12 of about 0.7 mm
Is bonded. Here, the length t13 of the substrate 23 in the vertical direction is set to about 1.5 mm in order for the magnetic head element 22 to be electrically connected to the outside by an external terminal. The length t14 of the substrate 21 in the vertical direction is specifically set to, for example, about 3 mm in consideration of the entire length of the magnetic head element 22. The substrate 23 also functions as a guard material on the rear end side in the sliding direction and as an upper layer shield (substrate shield) of the MR head.

Subsequently, as shown in FIG.
Is processed into an arc shape. Thereby, the magnetic head element 22
When the magnetic tape as the medium slides, the track portion of the magnetic head element 22 has the least spacing with the tape. Thereafter, as shown in FIG. 18, the block composed of the substrate 21 and the substrate 23 is cut into individual heads.
At this time, cutting is performed by inclining by an azimuth angle θ (specifically, for example, 20 degrees), so that M shown in FIGS.
The R head 20 is completed. The MR head 20 is the same as that shown in FIG.
As shown in FIG. 9, each MR head 20 has a head base 4
The external terminals 39a and 39b are connected to the current supply terminals 41a and 41b, respectively.

The MR head 20 according to the embodiment of the present invention
Is configured as described above. At the time of reproduction, based on the magnetic signal recorded on the sliding magnetic tape TP, the magnetic field circulating from the gap g through the substrate 21 as the lower shield and the substrate 23 as the upper shield Is generated, the resistance value of the MR element 26 fluctuates based on the magnetic field, and the change in the resistance value is detected and appropriately processed.
The information recorded on the magnetic tape TP is reproduced.

Here, in the MR head 20 according to the embodiment of the present invention, the track position of the MR element 26 is
Track position search marker 29 provided on insulating film 25
Optically recognizes that the marker 29 is disposed offset by the azimuth with respect to the MR element 26. For example, the center of the lower end of the MR element 26 is connected to the center of the lower end of the marker 29. The virtual line C is
The sliding surface 24 is arranged substantially in parallel with D, which is a side surface portion in the longitudinal direction. Since this is substantially parallel to the sliding direction of the magnetic tape TP, the track position of the MR element 26 in the direction parallel to the sliding direction of the magnetic tape TP can be optically accurately determined on the sliding surface 24. Can be searched. It should be noted that the reference for the track position search is not limited to the lower end of the central portion, and a point where the track position search can be easily performed can be appropriately selected.

Accordingly, since the marker 29 is formed so that it can be easily searched optically, it is possible to use a high-power microscope as in the prior art, and to eliminate the need for advanced image recognition technology. The track position is recognized by the marker 29. Therefore, a vacuum device is not required, and the track position of the MR element 26 can be easily and accurately recognized at low cost. This makes it possible to increase the speed, accuracy, and reliability of the drum mounting operation of the MR head 20.

The marker 29 is made of a metal film material such as Ti, Ta, etc., but is not limited to this, and may be made of another material as long as it can be easily recognized optically. It may be made of a film transparent to visible light such as SiO ₂ or Al ₂ O ₃ .

FIG. 20A shows an MR head according to a second embodiment of the present invention. 20A, the MR head 50 is different from the MR head 20 shown in FIGS.
7, a track position search marker 51 for searching for the track position of the MR element 26 is different only in that it is formed offset by azimuth. The track position search marker 51 is formed on the insulating film 27 by using the photolithography method similarly to the marker 29.
It is formed therein and has the same length as the MR element 26.

According to such a configuration, the track position of the MR element 26 is optically recognized by the track position search marker 51 provided on the insulating film 27, so that this marker 51 Since they are arranged offset by azimuth, the track position of the MR element 26 is set on the sliding surface 24 in a direction substantially parallel to the sliding direction of the magnetic tape TP, as in the first embodiment. Can be recognized. Therefore, the marker 51
Is formed so that it can be easily measured optically, and therefore, as in the first embodiment, it is possible to use a conventional high-power microscope and to eliminate the need for advanced image recognition technology. In addition, the track position is easily recognized by the marker 51.

FIG. 20B shows an MR head according to a third embodiment of the present invention. In FIG. 20B, the MR head 60 is the M head shown in FIG. 2 and FIG.
Compared with the R head 20, only the point that the track position search marker 61 for searching the track position of the MR element 26 is formed offset in the insulating film 25 by azimuth instead of the marker 29 is provided. It has a different configuration. Here, the track position search marker 61 is
It is composed of a pair of markers 61, 61 arranged at an interval equal to the length of the MR element 26, and using a photolithography method like the marker 29,
It is formed in the insulating film 25.

According to such a configuration, the track position of the MR element 26 is determined by optically recognizing the pair of track position search markers 61 provided on the insulating film 25, so that this marker 51 Since it is arranged offset by azimuth from both ends, the track position of the MR element 26 is optically recognized from the sliding surface 24 as in the above-described embodiments. Therefore, since the markers 61 and 61 are formed so as to be easily measured optically, a high-power microscope as in the related art can be used or an advanced microscope can be used similarly to the first embodiment. The track position can be easily recognized by the marker 61 without requiring image recognition technology.

FIG. 20C shows an MR head according to a fourth embodiment of the present invention. 20C, the MR head 70 is different from the MR head 60 shown in FIG.
7, a track position search marker 71 for searching for a track position of the MR element 26 is different only in that it is formed offset by azimuth. Here, the track position search marker 71 is composed of a pair of markers 71, 71 arranged at an interval equal to the length of the MR element 26, and
In the same manner as described above, the insulating film 27
Formed inside.

According to such a configuration, the track position of the MR element 26 is optically recognized by the pair of track position search markers 71 provided on the insulating film 27, so that the marker 71 Since it is arranged offset by azimuth with respect to both ends of 26,
As in the above-described embodiments, the track position of the MR element 26 can be easily and optically recognized from the sliding surface 24.

FIG. 20D shows an MR head according to a fifth embodiment of the present invention. 20D, the MR head 80 is different from the MR head 60 shown in FIG. 20B in that, instead of the pair of markers 61 formed in the insulating film 25, one of the MR heads 60 is in the insulating film 25. And a track position search marker 81 for searching the track position of a pair of MR elements 26 formed in the insulating film 27 is offset by azimuth. I have. Here, the track position search markers 81 are disposed with an interval equal to the length of the MR element 26, and are formed in the insulating films 25 and 27 using the photolithography method similarly to the marker 29. Is done.

According to such a configuration, the track position of the MR element 26 is optically recognized by the pair of track position search markers 81 provided on the insulating films 25 and 27. Since they are formed and disposed offset by azimuth from both ends of the MR element 26, the MR element 26
Is easily optically recognized from the sliding surface 24.

In each of the above-described embodiments, the magnetic head element and the track position search marker 29 and the like are shown in an enlarged manner in each of the drawings in order to make them easy to see. The element and track position search marker 29 and the like are finer than the substrate 21.

Thus, according to each of the embodiments of the present invention described above, the MR heads 20, 50, 60, 70, 8
0, the track position of the MR element 26 is determined by the markers 29,
By optically recognizing 1, 61, 71 and 81, it is possible to indirectly and accurately grasp them. That is,
Since the markers 29, 51, 61, 71 and 81 are arranged offset by the azimuth, the markers 29 and the like and the ends of the MR element 26 are imaginary lines parallel to the sliding direction of the magnetic tape TP. By connecting with C, this magnetic tape T
The track position of the MR element 26 in the direction parallel to the sliding direction of P can be optically and accurately searched on the sliding surface 24. Therefore, as described above, the MR is directly applied using a conventional high-power microscope.
Compared with the case where the element 26 is measured, no vacuum device or advanced image recognition technology is required, so that the track position of the MR element 26 can be optically measured easily and in a short time. This also allows the MR element 26
Track position can be accurately determined using an optical measuring device conventionally used in the manufacturing process, so that the machining accuracy in the manufacture of the MR head including the MR element 26 is improved, and the The cost can be reduced, and when the MR head is mounted at a predetermined position on the rotating drum of the helical scan system, it is possible to position the MR head with high accuracy, and the assembling accuracy of the magnetic head device is improved.

In the above embodiment, the MR element 2
6 has a so-called SAL bias structure, but is not limited to this, and it is clear that another structure, for example, an MR element utilizing a giant magnetoresistance effect or a tunneling magnetoresistance effect may be used. Further, in the above-described embodiment, the MR head 20 is configured to include only the MR head as a reproducing head, but is not limited thereto.
A recording head comprising a reproducing head and a recording head, wherein a magnetic shield as an intermediate core is formed on an upper layer gap formed on the MR element of the reproducing head, and a recording head is formed thereon. It is obvious that the present invention can be applied to a reproducing magnetic head.

[0050]

As described above, according to the present invention, there is provided a magnetic head and a magnetic head device capable of accurately searching for a track position of a magnetic head having a magnetoresistive element by an optical measuring device. can do.

[Brief description of the drawings]

FIG. 1 is a schematic perspective view showing an overall configuration of a magnetic head device including an MR head according to an embodiment of the present invention.

FIG. 2 is a schematic perspective view showing a configuration of a first embodiment of an MR head in the magnetic head device of FIG. 1;

FIG. 3 is a view as seen from a sliding surface of the MR head of FIG. 2;

4A is a plan view of a substrate and FIG. 4B is a cross-sectional view taken along the line X1-X1, showing a manufacturing process of the MR head of FIG. 2;

5 is a process chart sequentially showing a marker forming step for the substrate of FIG. 4 by a photolithography method.

FIG. 6 is a plan view of a substrate showing a manufacturing process of the MR head of FIG. 2;

7A and 7B show a manufacturing process of the MR head of FIG. 2;
FIG. 2 is an enlarged plan view of a portion B in FIG.

8A is an enlarged plan view, FIG. 8B is a cross-sectional view taken along line X3-X3, and FIG.
It is a 1-line sectional view.

9A is a schematic view showing a sliding surface of the MR head of FIG. 2, and FIG. 9B is a partially enlarged view thereof.

10A is an enlarged plan view showing a manufacturing process of the MR head shown in FIG. 2, and FIG. 10B is a sectional view taken along line Y2-Y2.

11A is an enlarged plan view and FIG. 11B is a cross-sectional view taken along the line Y3-Y3, illustrating a process of manufacturing the MR head in FIG. 2;

12A is an enlarged plan view and FIG. 12B is a cross-sectional view taken along the line Y4-Y4, illustrating a manufacturing process of the MR head in FIG. 2;

13A is an enlarged plan view and FIG. 13B is a cross-sectional view taken along the line Y5-Y5, illustrating a process of manufacturing the MR head in FIG. 2;

FIG. 14 is a plan view of the substrate, illustrating a process of manufacturing the MR head of FIG. 2;

FIG. 15 is an enlarged plan view showing a substrate cut in a strip shape.

FIG. 16 is an enlarged perspective view illustrating a manufacturing process of the MR head of FIG. 2;

FIG. 17 is an enlarged perspective view illustrating a manufacturing process of the MR head of FIG. 2;

FIG. 18 is an enlarged plan view showing chip cutting in a manufacturing process of the MR head of FIG. 2;

FIG. 19 is a schematic diagram showing the MR head in a state of being bonded to a head base.

FIG. 20 shows M according to the second to fifth embodiments of the present invention.
It is the figure which looked at the R head from the sliding surface, respectively.

FIG. 21 is a schematic perspective view showing a configuration of an example of a conventional MR head.

FIG. 22 is a view of the MR head of FIG. 21 as viewed from a sliding surface.

[Explanation of symbols]

10. Rotating magnetic head device, 20, 50, 60, 7
0, 80: MR head, 21, 23: Soft magnetic substrate, 22: Magnetic head element, 24: Tape sliding surface, 25, 27: Insulating film, 26: MR Element, 2
8 ... electrode, 29, 51, 61, 71, 81 ... track position search marker, 30 ... substrate, 31 ...
Metal film, 31a marker, 32 photoresist, 33 mask, 34 insulating film, 35
.MR film, 35a ... MR element, 36a, 36b
・ Permanent magnet film, 37a, 37b ... electrode, 38 ...
Insulating film, 39a, 39b ... external terminals.

Claims (9)

[Claims] A sliding surface on which a recording medium slides; a magnetoresistive element provided on the sliding surface; a track formed by the magnetoresistive element;
A magnetic head having a track position search marker for the magnetoresistive element disposed adjacent to the magnetoresistive element and offset by azimuth on the sliding surface. Characteristic magnetic head. 2. An imaginary line connecting an end of the magnetoresistive effect element and an end of the track position search marker is arranged substantially parallel to a longitudinal side surface of the sliding surface. 2. The magnetic head according to claim 1, wherein the track position search marker is provided. 3. The apparatus according to claim 2, wherein the track position search marker is a single marker disposed opposite to the magnetoresistive element and having a length substantially equal to that of the magnetoresistive element. The magnetic head according to claim 1. 4. The marker according to claim 1, wherein the track position search markers are two markers arranged at the same interval as the length of the magnetoresistive element corresponding to both ends of the magnetoresistive element. Thin film magnetic head. 5. The thin-film magnetic head according to claim 1, wherein the track position search marker is provided on an insulating film formed adjacent to the magnetoresistive element. 6. The track position search marker,
One track position search marker is formed on one of the insulating films formed adjacent to both sides of the magnetoresistive element, and the other track position search marker is adjacent on both sides of the magnetoresistive element. 5. The magnetic head according to claim 4, wherein the magnetic head is formed on the other of the insulating film formed as described above. 7. The magnetic head according to claim 1, wherein the track position search markers are two pairs of markers provided corresponding to both ends of the magnetoresistive element. 8. A pair of track position search markers of the two pairs of track position search markers is formed on one of insulating films formed adjacent to both sides of the magnetoresistive element and the other is formed. 8. The magnetic head according to claim 7, wherein the pair of track position search markers are formed on the other of the insulating films formed adjacent to both sides of the magnetoresistive element. 9. A sliding surface on which a recording medium slides, a magnetoresistive element provided on the sliding surface, a track formed by the magnetoresistive element,
A magnetic head device having a magnetic head having: a track position search marker of a magnetoresistive element adjacent to the magnetoresistive element of the magnetic head and offset by azimuth on the sliding surface. A magnetic head device comprising a magnetic head provided.