JP2001075113A - Liquid crystal device, its manufacture and electronic equipment using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a high picture quality and to improve the manufacturing yield by providing thick parts extending from straight liner wiring parts between respective pixel electrodes so as to prevent the switching elements from being broken in a rubbing treatment process and so as to eliminate the generation of defective pixels. SOLUTION: Many pixel electrodes 6, which are connected to straight linear wiring parts 7 of data lines via thin film diode(TFD) driving elements 10, are arranged in a matrix within a liquid crystal panel region. Besides a thick part 8 protruding in the same direction as the TFD driving element 10 (namely, in the direction of connection to the pixel electrode 6) is provided between the linear wiring part 7 and each of the pixel electrode 6. Thereby, in the case where rubbing treatment is carried out from the upper right to the lower left, depicted in the figure, to 45 deg. arrow L direction, a foreign matter, rolled in the rubbing brush for example at the pixel electrode a-1, is caught by the corner part 8a at the lower side of the pixel electrode a-1. The thick part 8 is provided with a function of a protecting wall for the TFD driving element 10.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement in a liquid crystal device, and more particularly to a liquid crystal device in which a switching element is destroyed in a rubbing step of aligning liquid crystal molecules, thereby preventing a defect in the liquid crystal device. .

[0002]

2. Description of the Related Art In recent years, large-capacity matrix liquid crystal devices have been used for personal computer displays and the like. Among them, an active matrix type liquid crystal display device in which a thin film element having a switching function is introduced between a pixel electrode and a signal wiring is mainly used as a high quality and large capacity liquid crystal display device. A typical example of a switching element of an active matrix type liquid crystal display device is a thin film diode (hereinafter, referred to as T).
FD), thin film transistor (Thin Film)
Transistor: hereinafter, abbreviated as TFT), and it is possible to display an arbitrary character or figure by driving a large number of pixels arranged in a matrix using the functions of these switching elements. .

On the other hand, a twisted nematic (TN) liquid crystal display, which is currently widely used, has a large viewing angle dependency, and it is necessary to balance the viewing angle in the vertical and horizontal directions in the display characteristics. It is necessary to orient in the direction.

The arrangement direction of the liquid crystal molecules is easily regulated by the surface condition of the substrate. However, simply arranging the liquid crystal molecules in a parallel direction has a degree of freedom in the arrangement direction of the liquid crystal molecules. It is not possible. In order to orient the liquid crystal molecules in a specific direction, a means for physically regulating the major axis direction of the liquid crystal molecules by providing an adherend or a groove having alignment in a specific direction on the substrate surface is employed. The main means of this means is to apply an oriented film such as a polyimide resin or to apply a scratch in a specific direction to the surface of the oriented film so as to have an oriented property. Means for imparting directionality by scratching the alignment film include an oblique deposition method and a rubbing method. Since the oblique deposition method has disadvantages such as low production efficiency and insufficient image contrast, the rubbing method is widely used. Usually, a rubbing method is a rubbing method in which a cloth is rubbed on an alignment film such as a polyimide resin with a cloth, or a diameter of 10 to 20 μm.
A rotary rubbing method of rubbing with a rotating brush with a brush has been put to practical use.

Usually, in a TN liquid crystal display device, as shown in FIG. 1A, the alignment film on the element substrate 1 side is rubbed in a direction of 45 degrees with respect to each square pixel, while rubbing is performed on the other side. The orientation film on the substrate 2 side was further twisted by 90 degrees.
Rubbing in the direction of 35 degrees. As described above, a liquid crystal material is sealed between the alignment films of the two substrates in a state where the rubbing direction of the alignment film is twisted by 90 degrees, and the liquid crystal material is kept in a twisted state.

The rubbing direction is not limited to the direction shown in FIG. 1A, but may be the direction shown in FIG. Also in this case, the rubbing directions of the alignment film on the element substrate side and the alignment film on the counter substrate side are twisted by 90 degrees.

However, in the switching element structure composed of a thin film laminate, foreign matter such as dust and glass powder brought into the rubbing step during the rubbing treatment destroys the thin film of the switching element portion, resulting in defective elements and dot-like pixels. There is a drawback that a defect is generated and display becomes impossible, and the production yield of a product as a liquid crystal device is reduced.
Once a point-like pixel defect occurs, there is a tendency for point defects to occur continuously.

When the vicinity of the switching element portion of the pixel electrode exhibiting such a point defect is observed by SEM, an oblique scratch is found in the switching element part, and the thin film laminated structure of the switching element is destroyed, resulting in insulation failure. Was recognized. This scratch was inclined at 45 degrees with respect to the square pixel electrode, and it was found that the scratch coincided with the rubbing direction. In addition, it was found that it occurred continuously for several pixels. When observing the rubbing brush when a scratch occurs, the diameter is 10 to 20.
It was observed that foreign matter was attached to the tip of the brush of about μm. As a result, when foreign matter adheres to the brush tip, it is presumed that foreign matter is dragged on many element electrodes.

In order to prevent the scratches generated during the rubbing process, the applicant of the present invention inclined the electrodes constituting the switching element by 45 degrees in the rubbing direction when forming the switching element first. A method of forming an isolated pattern for a breakwater in the vicinity of a switching element by arranging the breakwater in a direction (see Japanese Patent Application Laid-Open No. Hei 6-35005) was proposed.
However, even with this method, no means for exhibiting an effective effect of preventing scratches has been obtained. The present invention is a further improvement of these methods.

[0010]

That is, the present invention provides a means for preventing scratches due to foreign substances such as dust and glass powder, which are generated when a liquid crystal device having a switching element is subjected to an alignment treatment by a rubbing step. It is an object of the present invention to provide a method which is effective for protecting a switching element in an orientation direction and does not impose a burden on a manufacturing process.

[0011]

SUMMARY OF THE INVENTION The present invention has been made in order to solve the above-mentioned drawbacks, and has been made in view of the above circumstances. In a liquid crystal device having a substrate and a counter substrate which is arranged to face the element substrate and has a counter electrode or an alignment film formed on the substrate, and a liquid crystal material between the two substrates, Means for providing a thick portion extending from the linear wiring portion between the pixel electrodes is employed. The thickness of the thick portion has a thickness equal to or greater than the thickness of the device electrode.

As described above, a thick portion having a thickness equal to or greater than the thickness of the device electrode is provided between each pixel electrode, and a corner portion formed by this thick portion and a linear wiring portion is provided. At the corners to prevent foreign matter such as dust from entering the switching element during the rubbing process, and to prevent dragging over many pixel electrodes even if foreign matter adheres to the brush, and at the same time rubbing The impact of the tip of the brush is reduced, thereby preventing scratches.

Further, in the present invention, the structure of the thick portion having the same thickness as the element electrode is formed as a thin film laminated structure having the same structure as the switching element, so that it is formed simultaneously with the formation of the switching element. High productivity can be maintained without increasing the number of steps.

First, the structure of a liquid crystal display panel of a liquid crystal device according to the present invention will be described.

FIG. 2 is a partial plan view showing one embodiment of the outline of an active matrix liquid crystal display panel using a TFD element as a switching element according to the present invention. In the figure, an element substrate 1 and a counter substrate 2 are arranged to face each other, and are adhered to each other by a seal portion 4. The distance between these substrates is defined by bead-shaped spacers having a small diameter and distributed between the substrates, and is maintained at, for example, about 5 μm. A liquid crystal injection port 3 exposed to the outside of the panel is provided in a part of the seal portion 4, and liquid crystal is injected from the liquid crystal injection port 3 into a portion surrounded by the seal portion 4, and sealed in the sealing portion 5. I have.

In a region (right side in the figure) of the opposing substrate 2 which protrudes from the element substrate 1, for example, when the opposing electrode on the opposing substrate is used as a scanning line, an operation side driving IC 50a for supplying a scanning signal is provided. Be placed. Similarly, a data side driving IC 50b is arranged on the element substrate side (substrate back side in the figure). Reference numeral 51 denotes an input terminal for externally supplying a signal to the driving IC.

A large number of rectangular pixel electrodes 6 are arranged in a matrix on the element substrate 1 and are connected to a linear wiring portion 7 of a data line via a switching element described later in detail. In addition, a transparent electrode made of indium tin oxide (hereinafter, abbreviated as ITO) is formed on an opposing substrate 2 opposing the element substrate 1 in a stripe shape in the horizontal direction of the paper. A controlled signal is sent to each pixel electrode, and a predetermined pixel is displayed as a dot, thereby allowing the display device as a whole to recognize characters and figures. An alignment film made of polyimide or the like is applied to the surfaces of the element substrate 1 and the opposing substrate 2 facing each other, and the alignment films are rubbed so as to have directionality, and then both substrates are bonded. When the arrangement as shown in FIG. 2 is employed, the rubbing direction of the alignment film on the element substrate side is, for example, a direction of 45 degrees from the upper right to the lower left side of the paper, and the rubbing direction of the alignment film on the counter substrate side is the upper left of the paper. They are perpendicular to each other at a 45-degree direction from the right to the lower right (see FIG. 1A).

In addition, although not shown, a polarizing plate is attached to each of the surfaces of the element substrate 1 and the counter substrate 2 opposite to the surfaces facing each other. Further, a flexible substrate connected to the input terminal 51 and a light source disposed on the back of the panel in the case of a transmissive panel are mounted, and a driving IC is provided.
A liquid crystal device is configured by housing these components including a control board called a control box on which a circuit for generating a signal to be supplied to the power supply 50 and a power supply circuit are mounted, and a panel, in a case.

Next, switching elements used in the liquid crystal display panel will be described.

FIGS. 3 and 4 are enlarged views of the vicinity of one pixel electrode of the liquid crystal display panel. FIG. 4 is a sectional view taken along the line AA ′ of FIG. In this example, the pixel electrode 6 is connected to a linear wiring portion 7 via a TFD drive element 10 which is a two-terminal nonlinear element as a switching element.
It is connected to the. The TFD drive element 10 in the case of FIG. 3 has a back-to-back structure. That is, the first TFD drive element 10a and the second
Is connected in series with the TFD drive element 10b of the same polarity with the opposite polarity. 3 and 4, the TFD drive element 10 is composed of two elements 10a.
And 10b, the first TFD driving element 10
a denotes a first metal film 12 made of tantalum or the like, an insulating film 14 made of an anodic oxide film or the like, and a first metal film 12 made of chromium or the like formed on the insulating film 31 formed on the element substrate 1 as a base layer. It is composed of a two-metal film 16a. On the other hand, the second TFD drive element 10b includes an insulating film 31 formed on the element substrate 1 as a base layer, a first metal film 12 made of tantalum or the like formed sequentially thereon, an anodic oxide film or the like. The second metal film 16b made of chromium or the like is isolated from the insulating film 14 and the second metal film 16a. The thickness of the first metal film 12 is about 150 nm, the thickness of the insulating film 14 is about 20 to 30 nm, and the thickness of the second metal film 16 is about 80 to 100 nm.

Here, the second metal film 16a of the first TFD drive element 10a is connected to the second metal film forming the linear wiring portion 7 formed on the element substrate 1. Further, the second metal film 16b has a complicated shape as shown in FIG. 3 in order to secure a contact area with the pixel electrode 15 and to prevent corrosion and cutting due to sneak of an etchant when formed by etching. It is arranged so that a part thereof overlaps the corner.

Now, for example, when the alignment film surface of the element substrate coated with the alignment film is rubbed in the direction of arrow L from the upper right to the lower left in FIG. 3, the tip of the rubbing brush directly rubs the TFD drive element 10. If the brush has foreign matter caught in the tip, the TFD drive element 10 composed of a thin film is easily scratched, the thin film is broken, insulation failure occurs, and the function as an element is lost. Become. Moreover, when foreign matter is wrapped around the tip of the brush,
This results in the continuous destruction of some TFD driving elements in the rubbing direction.

FIGS. 5 and 6 show another example of a TFD drive element as a switching element, which is a so-called cross structure. 5 and 6, the TFD drive element 20 includes a first metal film 22 made of tantalum or the like, an anodic oxide film, and the like sequentially formed thereon with an insulating film 31 formed on the element substrate 1 as a base. A TFD structure composed of an insulating film 24 and a second metal film 26 made of chromium or the like is formed. The first metal film 22 is connected to the first metal film of the linear wiring portion 7 formed on the element substrate 1, and the second metal film 26 partially overlaps the corner of the pixel electrode 6. It is connected. Each film thickness is the same as that of the back-to-back structure described above.
Is about 150 nm, and the thickness of the insulating film 24 is about 50 nm.
nm, and the thickness of the second metal film 26 is about 80 to 100 nm.
It is about. Even in the case of such a structure, since the device is constituted by a thin film laminated structure, the state of damage to the device during the rubbing treatment is the same as in the case of the above-described back-to-back device structure.

In the present invention, in order to prevent scratches on the TFD drive element during the rubbing process as described above,
A thick portion having the same thickness as the device electrode extending from the linear wiring portion is provided between each pixel electrode to form a corner portion, and the foreign matter which the brush gets in is supplemented by the corner portion, and the foreign material is TFD.
In addition to preventing the TFD drive element from being dragged over a large number of TFD drive elements even when foreign matter is brought in, the impact on the TFD drive element is reduced. Things.

The thick portion must be provided between the pixel electrodes in consideration of the rubbing direction. When the alignment film surface is rubbed in a direction of 45 degrees with respect to each pixel electrode, it is sufficient that there is a thick portion in front of each TFD drive element portion that serves as a protective wall of the TFD drive element portion. In other words, the thick part is TFD
It suffices if it is on an extension of the rubbing direction passing through the driving element.

It is sufficient that the width of the thick portion is about 2 to 3 μm. Further, the length may be the entire area of one side of the pixel electrode,
Considering the size of the TFD drive element and the rubbing direction, a length of about one third to one sixth of one side of the pixel electrode is sufficient.

Further, if the thickness of the thick portion is equal to or greater than the thickness of the device electrode, the effect of preventing scratches can be exerted. In consideration of the manufacturing process, when forming the TFD drive element and simultaneously forming the thick portion with the same structure as the TFD drive element, it is efficient without increasing the number of steps. Further, if the number of steps is allowed to increase, it is possible to form the thick portion with an insulating resin or the like other than the material forming the TFD drive element.

[0028]

Embodiments of the present invention will be described below in detail with reference to the drawings. FIG. 7 is a plan view showing an embodiment of an element substrate of a liquid crystal panel used in the liquid crystal device according to the present invention, and shows a part of the element substrate 1 of one liquid crystal display panel shown in FIG. It is shown enlarged.
This embodiment shows an example in which a TFD drive element having a back-to-back structure is used as a switching element. In FIG. 7, a large number of pixel electrodes 6 connected to the linear wiring portion 7 of the data line via the TFD driving element 10
It is arranged in a matrix in each liquid crystal panel area. Now, suppose that the pixel electrode 6 is a-1, a-2, a-3,..., B-1, b as shown in FIG.
-2, b-3, ..... In FIG. 7, a linear wiring portion 7a is arranged on the left side of the pixel electrodes a-1, b-1, c-1, d-1,. Similarly, the pixel electrode a-
A linear wiring portion 7b is arranged on the left side of 2, b-2, c-2, d-2,.... That is, when viewed from the pixel electrode 6, the wiring section 7 is connected to the pixel electrode 6 from the same direction via the TFD element 10.

A panel having an alignment film coated on a pixel electrode is
When rubbing is performed in the direction of arrow L at 45 degrees from the upper right to the lower left in the drawing in the rubbing process, the linear wiring portion 7 is used.
If a thick portion 8 is provided between the pixel electrodes 6 so as to protrude in the same direction as the TFD drive element 10 (that is, the direction of connection to the pixel electrode), for example, the pixel electrode a-1 may be caught in a rubbing brush. The foreign matter trapped in the corner 8a below the pixel electrode a-1 has a function as a protective wall for the TFD drive element 10. The thick portion 8 provided between the pixel electrodes a-2 and b-2, for example,
It is possible to protect the TFD drive element 10 located directly below b-2 and the TFD drive element 10 located further below the lower left row c-1. Similarly, the thick portion 8 provided between the pixel electrodes a-3 and b-3 includes a TFD drive element 10 located immediately below b-3 and a TFD drive element c-2 located at the lower left of another row.
The drive element 10 can be protected. As described above, the thick portion 8 may be disposed on an extension of the rubbing direction L passing through the TFD drive element 10.

The width of the thick portion 8 may be about 2 to 3 μm. The length of the thick portion 8 is not particularly limited, and it is sufficient that the TFD drive element 10 is hidden by the thick portion 8 with respect to the rubbing brush when rubbing is performed in a 45-degree direction. . Therefore, the length of one side of one pixel electrode may be determined as appropriate based on 1/3 to 1/6.

Next, a manufacturing method for manufacturing the element substrate of this embodiment will be described.

A light-transmitting and large-area element substrate base material such as glass is prepared as a material, and a plurality of liquid crystal panel regions are formed on the element substrate base material.

First, a tantalum film is formed to a thickness of about 1000 angstroms on the element substrate base material by sputtering as a thin film forming means, and then thermally oxidized to form a tantalum oxide insulating film 31 serving as a base layer. Form. The underlayer has a function of improving the adhesion between the element substrate 1 and a tantalum film which is a component of a TFD driving element described later. In the case where impurity diffusion into the tantalum film does not pose a problem, the formation of this insulating film can be omitted.

On the insulating film 31, a linear wiring portion 7 is formed.
And a tantalum alloy film containing 0.1 to 6 atomic% of tungsten, which is to be the first metal film 12 of the TFD drive element 10,
It is formed by sputtering to a thickness of about 500 angstroms. Next, patterning is performed by photoetching as shown in an enlarged manner in FIG. 3 to form a pattern to be the linear wiring portion 7 and the first metal film 12 of the TFD drive element 10 into a predetermined shape. During this patterning,
Since the wiring portion 7 and the first metal film 12 of the device electrode portion 10 are simultaneously anodized in an anodic oxidation step described later, a pattern connecting the wiring portion 7 (not shown) and the first metal film 12 of the device electrode 10 is left. Form. The width of the linear wiring portion 7 is generally about 6 to 10 μm, and the width of the first
The width of the metal film 12 is approximately 2 to 3 μm.

At this time, as shown in FIG. 7, the tantalum also extends from the linear wiring portion 7 between the pixel electrodes 6 to a position extending in the same direction as the switching element connected from the linear wiring portion 7. A film pattern is formed. The width of the tantalum pattern is approximately 2-3 μm, and the length is, for example, 1 μm.
2 if the length of one side of one pixel electrode is one-fourth
It is about 5 μm. This pattern is TF
The thick portion 8 protects the D drive element. This tantalum pattern is formed separately from the pixel electrode 6.

Then, each tantalum pattern is subjected to anodic oxidation, and a tantalum oxide film serving as the insulating film 14 is formed on the surface of each tantalum pattern to a thickness of about 20 to 30 nm.

Thereafter, the second metal films 16, 16a, 16
A chromium film to be b is formed on the substrate by sputtering to a thickness of 80 to 100 nm, and is patterned so as to have a predetermined pattern. As a result, as shown in FIGS. 3 and 4, the second metal film 16 a continuous from the linear wiring portion 7 so as to partially overlap the insulating film 14 formed on the first TFD drive element 10 a. And a second TF
A part of the insulating film 14 formed on the D drive element 10b is overlapped with the insulating film 14 so that the ITO
A chromium film serving as a second metal film 16b extending to a corner of the film 15 and an insulating film 14 on the surface of a tantalum pattern extending from the linear wiring portion 7 between the pixel electrodes 6 shown in FIG. Is formed.

After the patterning of the chromium, the tantalum alloy film, which is the first metal film connecting the wiring portion 7 and the device portion 10 which has been left for anodizing the first metal film of the device portion, is etched. And remove.

Finally, the pixel electrode 6 is formed so as to partially overlap the second metal film 16b of the second TFD drive element 10b. As the pixel electrode 6, an ITO film or the like is formed to a thickness of about 50 nm. At this time, an ITO film 15 is also formed on the insulating film 14 on the surface of the tantalum pattern extending from the linear wiring portion 7 between the pixel electrodes 6 shown in FIG.

As described above, the thick portion 8 having the same thickness as the TFD drive element electrode 10 as shown in the cross section in FIG. 8 adds a special process between the pixel electrodes 6 shown in FIG. It is formed by the same process as the TFD element forming step and the pixel electrode forming step without performing. As a result, the linear wiring portion 7
The thick portion 8 forms a corner portion 8a, so that foreign matter attached to the brush during rubbing can be captured and captured in the corner portion, and can be prevented from being dragged to the TFD drive element portion.

As described above, the linear wiring portion 7, the thick portion 8, the TFD drive element 10, the pixel electrode 15 are formed on the element substrate.
Is formed, a polyimide resin is applied on the element substrate, and rubbing is performed on the square pixel electrodes in a direction of 45 degrees to obtain an element substrate 1 of a liquid crystal display panel used in the present invention.

On the other hand, after forming a transparent counter electrode corresponding to each pixel electrode on the counter substrate 2, a polyimide resin is applied, and a rubbing process is performed in a direction twisted by 90 degrees with respect to the rubbing direction of the element substrate. The counter substrate 2 of the liquid crystal display panel used in the present invention. FIG. 9 is a cross-sectional view showing a state in which the element substrate 1 and the counter substrate 2 thus obtained are bonded. The alignment film 9 is located on the inner surface of each substrate in contact with the pixel electrode 6.

FIG. 10 shows another embodiment of the present invention. In the pattern shown in FIG. 10, the thick portion 8 extends from the linear wiring portion 7 in the direction opposite to the switching element 10 connected to the wiring portion. In this embodiment, the effect is obtained when the rubbing is performed diagonally from the TFD driving element portion in the diagonal direction, that is, from the upper left to the lower right in FIG. 10 along the arrow direction M (see FIG. 1B). Demonstrate.
In addition, the effect of removing foreign matter is also effective for rubbing in the direction of arrow L 'from the lower left to the upper right in FIG.

FIG. 11 shows another embodiment of the present invention. In the pattern of this embodiment, the thick portions 8 project on both sides of the linear wiring portion 7. This embodiment has the advantage of being able to cope with rubbing in any of the arrow directions L, L 'and M.

In the above embodiment, the TFD element, which is a two-terminal nonlinear element, has been described as the switching element. However, a TFT element, which is a three-terminal nonlinear element, may be used. In the case of a TFT element, for example, a gate electrode metal film, a gate insulating oxide film, a semiconductor film, and ITO
The thick portion 8 can be formed using a thin film laminated structure made of a film.

In the description of the above embodiment, TFD
Although the structure of the element has been described with reference to the back-to-back structure, it is needless to say that the element may have a cross structure.

Further, TFD is used as a two-terminal nonlinear element.
Although an example of the driving element has been described, the present invention relates to a zinc oxide (Zn0) varistor, a MIS (metal semi-insurator).
The present invention can also be applied to an active matrix drive type liquid crystal display panel having a two-terminal type nonlinear element having a bidirectional diode characteristic such as a drive element or RD (Ring Diode).

Next, electronic equipment using the liquid crystal device of the present invention will be described.

FIG. 12 shows an example of an electronic apparatus using the liquid crystal device of the present invention.

FIG. 12A is a perspective view showing an example of a portable telephone. 1000 indicates a mobile phone body, of which 10
01 is a liquid crystal device of the present invention.

FIG. 12B is a perspective view showing an example of a wristwatch-type electronic device. Reference numeral 1100 denotes a watch main body 1101
Is the liquid crystal device of the present invention.

FIG. 12C is a perspective view showing an example of a portable information processing device such as a word processor or a personal computer. 120 in the figure
0 denotes an information processing apparatus, 12002 denotes an input unit such as a keyboard, 1204 denotes an information processing apparatus main body, and 1206 denotes a liquid crystal device of the present invention. When the liquid crystal device of the present invention is used in these electronic devices, not only the display device is free from point defects on the display surface and the display device is easy to see, but also the production yield is remarkably improved, and the effect of contributing to cost reduction is great.

FIG. 13 shows an example of a projector (projection display device) using the liquid crystal device of the present invention as a light modulation device as another example of electronic equipment.

The projector of this embodiment has a light source section 110 and an integrator lens 1 arranged along the system optical axis L.
20, a polarization illuminating device 100 schematically constituted by a conversion conversion element 130, a polarizing beam splitter 200 for reflecting an S-polarized light beam emitted from the polarized light illuminating device 100 by an S-polarized light beam reflecting surface 201, and a polarizing beam splitter 200
A dichroic mirror 412 that separates a blue light (B) component of the light reflected from the S-polarized light reflecting surface 201
A reflection type liquid crystal light modulator 300B that modulates the separated blue light (B) into blue light, and a dichroic mirror 413 that reflects and separates the red light (R) component of the light flux after the blue light is separated. , A reflective liquid crystal light modulator 300R for modulating the separated red light (R), a reflective liquid crystal light modulator 300G for modulating the remaining green light (G) passing through the dichroic mirror 413, and three reflective liquid crystal lights. The light modulated by the modulation devices 300B, 300R, and 300G is combined by the dichroic mirrors 412 and 413 and the polarization beam splitter 200, and the combined light is screen 600
The projection optical system 500 includes a projection lens that projects light to The above three reflective liquid crystal light modulators 300
The liquid crystal device of the present invention is used for each of R, 300G, and 300B. By using the liquid crystal device of the present invention, occurrence of product defects can be suppressed.

[0055]

According to the present invention, in the rubbing process, there is a thick portion in front of the switching element in the rubbing direction, and a corner portion is formed between the thick portion and the linear wiring portion. Therefore, there is an effect that foreign matter adhering to the brush tip is captured at the corner portion. As a result, it is possible to prevent intrusion of foreign matter and to prevent the foreign matter from dragging on the pixel electrode and hitting the driving element. At the same time, it has the effect of reducing the impact of the rubbing brush tip, so that the switching element will not be scratched, there will be no point defects due to element failure, a high quality screen can be obtained, and the production yield as a liquid crystal panel will be reduced. It has the effect of improving.

In addition, since the possibility of scratching is reduced, the pressing pressure of the brush during the rubbing process can be increased, so that the rubbing effect is enhanced and a high-quality screen with stronger contrast can be obtained. Has an effect.

[Brief description of the drawings]

FIG. 1 is a diagram illustrating a rubbing direction.

FIG. 2 is a partial plan view showing one embodiment of the liquid crystal device according to the present invention.

FIG. 3 is a plan view showing one embodiment of a TFD drive element used in the liquid crystal device according to the present invention.

FIG. 4 is a diagram showing a cross-sectional structure along the line AA ′ in FIG. 3;

FIG. 5 is a plan view showing another embodiment of the TFD drive element used in the liquid crystal device according to the present invention.

FIG. 6 is a diagram showing a cross-sectional structure along the line BB ′ of FIG. 5;

FIG. 7 is a plan view showing one mode of an element substrate of a liquid crystal panel used in the liquid crystal device according to the present invention.

8 is a diagram showing a cross-sectional structure along the line XX ′ of FIG. 7;

FIG. 9 is a diagram showing a state where an element substrate and a counter substrate are bonded.

FIG. 10 is a diagram showing another embodiment of the present invention.

FIG. 11 is a view showing still another embodiment of the present invention.

FIG. 12 is a diagram illustrating an example of an electronic apparatus using the liquid crystal device of the present invention.

FIG. 13 is a diagram illustrating another example of an electronic apparatus using the liquid crystal device of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Element substrate, 2 ... Counter substrate, 3 ... Liquid crystal injection port, 4 ... Seal part, 5 ... Sealing part, 6 ... Pixel electrode, 7 ... Wiring part , 8: thick portion, 9: alignment film, 10: TFD drive element, 12: first metal film, 14: insulating film, 15: ITO film, 16 ... -2nd metal film, 20 ... TFD drive element, 22 ... 1st metal film, 24 ... insulating film, 26 ... 2nd metal film, 30 ... liquid crystal material, 31 ... Insulating film, 50: driving IC, 51: input terminal, L, M: rubbing direction, 1000: mobile phone, 1100: wristwatch, 1200: notebook computer, 100 ...・ Polarization illumination device, 200 ・ ・ ・ Polarization beam splitter, 300 ・ ・ ・ Liquid crystal light modulation device, 412 ・ ・ ・ Dichroic Mirror, 500 ... condenser lens, 600 ... screen

Claims (11)

[Claims] 1. An element substrate having a linear wiring portion, a switching element, and a pixel electrode formed on a substrate, and an opposing electrode formed on a substrate disposed opposite to the element substrate. A liquid crystal device comprising: a substrate; and a liquid crystal material having a liquid crystal material between the two substrates, comprising a thick portion extending from the linear wiring portion between each pixel electrode. 2. An element substrate having a linear wiring portion, a switching element, a pixel electrode, and an alignment film formed on the substrate.
A liquid crystal device having a counter electrode formed by forming a counter electrode and an alignment film on a substrate disposed opposite to the element substrate, and having a liquid crystal material between the two substrates; A liquid crystal device comprising a thick portion extending from the linear wiring portion. 3. The liquid crystal device according to claim 1, wherein the thick portion is on an extension of a rubbing direction passing through the switching element. 4. The liquid crystal device according to claim 1, wherein the thick portion extends from the linear wiring portion in the same direction as a switching element connected to the wiring portion. Characteristic liquid crystal device. 5. The liquid crystal device according to claim 1, wherein the thick portion extends from the linear wiring portion in a direction opposite to a switching element connected to the wiring portion. Characteristic liquid crystal device. 6. The liquid crystal device according to claim 1, wherein the thick portion extends from the linear wiring portion in both the same direction as the switching element connected to the wiring portion and the opposite direction. A liquid crystal device characterized by being elongated. 7. The liquid crystal device according to claim 1, wherein the thick portion has the same thin film laminated structure as a switching element. 8. The liquid crystal device according to claim 1, wherein the thick portion has a thin film laminated structure of metal tantalum, tantalum oxide, metal chromium, and indium tin oxide. Liquid crystal device. 9. An element substrate on which a linear wiring portion, a switching element, and a pixel electrode are formed on a substrate, and an opposing element which is disposed opposite to the element substrate and has an opposing electrode formed on the substrate. A liquid crystal device including a substrate and a liquid crystal material sealed between the two substrates, wherein when the switching element is formed on the substrate, the same as the thin film laminated structure of the switching element between each pixel electrode. A method for manufacturing a liquid crystal device, comprising: forming a thick portion extending from a linear wiring portion, comprising a thin film laminated structure of (1). 10. An element substrate on which a linear wiring portion, a switching element, and a pixel electrode are formed on a substrate, and an opposing element which is disposed opposite to the element substrate and has an opposing electrode formed on the substrate. A liquid crystal device including a substrate and a liquid crystal material sealed between the two substrates, wherein when the switching element is formed on the substrate, the same as the thin film laminated structure of the switching element between each pixel electrode. A liquid crystal device comprising a thin film laminated structure, a thick portion extending from a linear wiring portion, a rubbing process after applying an alignment film on a pixel electrode, and an element substrate. Production method. 11. An electronic apparatus comprising the liquid crystal device according to any one of claims 1 to 8 as a display device.