JP2001064028A - Tempered glass base plate for flat panel display - Google Patents
Tempered glass base plate for flat panel displayInfo
- Publication number
- JP2001064028A JP2001064028A JP17865699A JP17865699A JP2001064028A JP 2001064028 A JP2001064028 A JP 2001064028A JP 17865699 A JP17865699 A JP 17865699A JP 17865699 A JP17865699 A JP 17865699A JP 2001064028 A JP2001064028 A JP 2001064028A
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- compressive stress
- tempered glass
- cao
- mgo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B27/00—Tempering or quenching glass products
- C03B27/04—Tempering or quenching glass products using gas
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B27/00—Tempering or quenching glass products
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B27/00—Tempering or quenching glass products
- C03B27/04—Tempering or quenching glass products using gas
- C03B27/0413—Stresses, e.g. patterns, values or formulae for flat or bent glass sheets
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、フラットパネルデ
ィスプレイ、特にプラズマディスプレイパネル（ＰＤ
Ｐ）に好適なガラス基板に関する。The present invention relates to a flat panel display, and more particularly to a plasma display panel (PD).
The present invention relates to a glass substrate suitable for P).
【０００２】[0002]
【従来の技術】ＰＤＰのガラス基板には、従来より、Ｐ
ＤＰの構成部材として使用される様々なガラスフリット
材料等の無機シール材料との膨張係数の整合が容易なソ
ーダライムシリカガラスが用いられてきた。前記無機シ
ール材料はガラス基板に塗布され、通常は５５０〜６０
０℃で焼成される。しかし、ソーダライムシリカガラス
の歪点は５１０℃程度であるため、前記温度での焼成に
際してガラス基板が変形または収縮して寸法が著しく変
化し、所定の寸法精度が得られない問題があった。2. Description of the Related Art Conventionally, PDP glass substrates have
Soda lime silica glass, which can easily match expansion coefficients with various inorganic sealing materials such as glass frit materials used as components of DP, has been used. The inorganic sealing material is applied to a glass substrate, usually 550-60.
Fired at 0 ° C. However, since the soda lime silica glass has a strain point of about 510 ° C., the glass substrate is deformed or shrunk during firing at the above-mentioned temperature, so that the dimensions are significantly changed, and there has been a problem that predetermined dimensional accuracy cannot be obtained.
【０００３】この問題を解決するガラス基板として、膨
張係数がソーダライムシリカガラス程度であり、歪点が
ソーダライムシリカガラスよりも高いガラス基板が知ら
れている（たとえば、特開平３−４０９３３）。As a glass substrate that solves this problem, a glass substrate having a coefficient of expansion on the order of soda lime silica glass and a strain point higher than that of soda lime silica glass is known (for example, JP-A-3-40933).
【０００４】[0004]
【発明が解決しようとする課題】しかし、これらの高歪
点ガラスはソーダライムシリカガラスに比べて脆く、製
造工程中に割れやすい問題があった。本発明は、以上の
課題を解決し、膨張係数がソーダライムシリカガラス程
度であり、歪点がソーダライムシリカガラスよりも高
く、かつ割れにくいガラス基板の提供を目的とする。However, these high strain point glasses have a problem that they are brittle compared to soda lime silica glass and are easily broken during the manufacturing process. An object of the present invention is to solve the above-mentioned problems, and to provide a glass substrate having an expansion coefficient on the order of soda-lime silica glass, a strain point higher than that of soda-lime silica glass, and being hard to break.
【０００５】[0005]
【課題を解決するための手段】本発明は、５０〜３５０
℃における平均線膨張係数が７０×１０-7〜１００×１
０-7／℃、歪点が５５０℃以上であり、かつ表面に圧縮
応力層が形成されている強化ガラス基板であって、表面
から５０μｍ以上の深さまで該圧縮応力層が形成されて
おり、かつ該圧縮応力層の圧縮応力最大値が２００ｋｇ
ｆ／ｃｍ2以上であるフラットパネルディスプレイ用強
化ガラス基板を提供する。SUMMARY OF THE INVENTION According to the present invention, there is provided a method comprising
Average linear expansion coefficient at 70 ° C. is 70 × 10 −7 to 100 × 1
0-7 / ° C., a strain point of 550 ° C. or higher, and a tempered glass substrate having a compressive stress layer formed on the surface, wherein the compressive stress layer is formed to a depth of 50 μm or more from the surface; And the maximum value of the compressive stress of the compressive stress layer is 200 kg.
Provided is a tempered glass substrate for a flat panel display having an f / cm 2 or more.
【０００６】[0006]
【発明の実施の形態】本発明のフラットパネルディスプ
レイ用強化ガラス基板（以下単に本発明の強化ガラス基
板という。）は、５０〜３５０℃における平均線膨張係
数が７０×１０-7〜１００×１０-7／℃の範囲にあり、
かつ歪点が５５０℃以上であるガラス基板を強化して得
られる。以下、５０〜３５０℃における平均線膨張係数
を単に膨張係数という。また、前記ガラス基板の膨張係
数、歪点をそれぞれ本発明の強化ガラス基板の膨張係
数、歪点という。前記強化は、風冷強化（物理強化）、
化学強化、等周知の強化方法を用いて行われる。BEST MODE FOR CARRYING OUT THE INVENTION The tempered glass substrate for a flat panel display of the present invention (hereinafter simply referred to as the tempered glass substrate of the present invention) has an average linear expansion coefficient at 50 to 350 ° C. of 70 × 10 -7 to 100 × 10. In the range of -7 / ° C,
It is obtained by strengthening a glass substrate having a strain point of 550 ° C. or higher. Hereinafter, the average linear expansion coefficient at 50 to 350 ° C. is simply referred to as an expansion coefficient. The expansion coefficient and strain point of the glass substrate are referred to as the expansion coefficient and strain point of the tempered glass substrate of the present invention, respectively. The reinforcement is air cooling reinforcement (physical reinforcement),
This is performed using a well-known strengthening method such as chemical strengthening.
【０００７】本発明の強化ガラス基板の膨張係数が７０
×１０-7／℃未満または１００×１０-7／℃超では、ソ
ーダライムシリカガラス基板（膨張係数は８０×１０-7
〜９０×１０-7／℃）に対して従来使用されている無機
シール材料との膨張係数の整合が困難になる。好ましく
は８０×１０-7〜９０×１０-7／℃である。The tempered glass substrate of the present invention has an expansion coefficient of 70.
If the temperature is less than × 10 −7 / ° C. or more than 100 × 10 −7 / ° C., the soda lime silica glass substrate (expansion coefficient is 80 × 10 −7)
(90.times.10.sup.- 7 / .degree. C.), it becomes difficult to match the expansion coefficient with the inorganic sealing material conventionally used. Preferably 80 × 10 -7 ~90 × 10 -7 / ℃.
【０００８】本発明の強化ガラス基板の歪点が５５０℃
未満では、無機シール材料を塗布して５５０〜６００℃
で焼成する際の強化ガラス基板の変形または収縮が大き
くなりすぎ、所定の寸法精度が得られない。The strain point of the tempered glass substrate of the present invention is 550 ° C.
If it is less than 550 to 600 ° C. by applying an inorganic sealing material
The deformation or shrinkage of the tempered glass substrate during firing in the step becomes too large, and a predetermined dimensional accuracy cannot be obtained.
【０００９】本発明の強化ガラス基板はその表面に圧縮
応力層が形成されている。前記圧縮応力層がその表面か
ら５０μｍ未満の深さまでの領域にしか形成されていな
いと、強化ガラス基板表面に発生したキズは容易に圧縮
応力層を突き抜け強化ガラス基板が割れる。好ましくは
１００μｍ以上である。また、前記圧縮応力層の圧縮応
力最大値が２００ｋｇｆ／ｃｍ2未満では、強化効果が
小さすぎる。[0009] The tempered glass substrate of the present invention has a compressive stress layer formed on its surface. If the compressive stress layer is formed only in a region from the surface to a depth of less than 50 μm, the scratches generated on the surface of the tempered glass substrate easily penetrate through the compressive stress layer to crack the tempered glass substrate. Preferably it is 100 μm or more. If the maximum value of the compressive stress of the compressive stress layer is less than 200 kgf / cm 2 , the strengthening effect is too small.
【００１０】本発明の強化ガラス基板は、実質的に重量
％表示で、 ＳｉＯ2 ４５〜７０、 Ａｌ2Ｏ3 ２〜２０、 Ｂ2Ｏ3 ０〜６、 ＭｇＯ １〜１０、 ＣａＯ １〜１０、 ＳｒＯ ０〜９、 ＢａＯ ０〜９、 ＭｇＯ＋ＣａＯ＋ＳｒＯ＋ＢａＯ １０〜２５、 ＺｒＯ2 ０〜１０、 Ｎａ2Ｏ＋Ｋ2Ｏ ７〜１５、 からなることが好ましい。重量％を単に％と表記して以
下に理由を述べる。The tempered glass substrate of the present invention is substantially expressed in terms of% by weight: SiO 2 45-70, Al 2 O 3 2-20, B 2 O 3 0-6, MgO 1-10, CaO 1-10 , SrO 0-9, BaO 0-9, MgO + CaO + SrO + BaO 10-25, ZrO 2 0-10, and Na 2 O + K 2 O 7-15. Weight% is simply expressed as% and the reason is described below.
【００１１】ＳｉＯ2はネットワークフォーマーであり
必須である。７０％超では膨張係数が小さくなりすぎる
おそれがある。好ましくは６５％以下である。４５％未
満では歪点が低くなりすぎ、また化学的耐久性が低下す
るおそれがある。好ましくは５１％以上である。[0011] SiO 2 is a network former and is essential. If it exceeds 70%, the expansion coefficient may be too small. Preferably it is 65% or less. If it is less than 45%, the strain point may be too low, and the chemical durability may decrease. Preferably, it is at least 51%.
【００１２】Ａｌ2Ｏ3は歪点を高くする成分であり必須
である。２０％超では溶融ガラスの粘度が大きくなりす
ぎ、板ガラス成形、特にフロート成形が困難になるおそ
れがある。好ましくは１６％以下である。２％未満では
歪点が低くなりすぎるおそれがある。Al 2 O 3 is a component that increases the strain point and is essential. If it exceeds 20%, the viscosity of the molten glass becomes too large, and it may be difficult to form a sheet glass, particularly a float. Preferably it is 16% or less. If it is less than 2%, the strain point may be too low.
【００１３】Ｂ2Ｏ3は必須ではないが、破壊靭性を大き
くし、また溶融ガラスの粘度を下げてガラス溶解を促進
するために６％まで含有してもよい。６％超では膨張係
数が小さくなりすぎるおそれがある。好ましくは５％以
下である。また、Ｂ2Ｏ3を含有する場合は２％以上とす
ることが好ましい。B 2 O 3 is not essential, but may be contained up to 6% in order to increase the fracture toughness and to lower the viscosity of the molten glass to promote glass melting. If it exceeds 6%, the expansion coefficient may be too small. Preferably it is 5% or less. When B 2 O 3 is contained, the content is preferably 2% or more.
【００１４】ＭｇＯは破壊靭性を大きくし、また溶融ガ
ラスの粘度を下げてガラス溶解を促進する成分であり必
須である。１０％超では失透温度が高くなりすぎるおそ
れがある。好ましくは５％以下、より好ましくは４％以
下である。１％未満では効果が小さすぎるおそれがあ
る。好ましくは２％以上、より好ましくは３％以上であ
る。なお、膨張係数を８０×１０-7／℃としたい場合、
ＭｇＯは１〜３％とすることが好ましい。MgO is a component which increases the fracture toughness and lowers the viscosity of the molten glass to promote glass melting, and is essential. If it exceeds 10%, the devitrification temperature may be too high. It is preferably at most 5%, more preferably at most 4%. If it is less than 1%, the effect may be too small. It is preferably at least 2%, more preferably at least 3%. When the expansion coefficient is to be set to 80 × 10 −7 / ° C.,
MgO is preferably set to 1 to 3%.
【００１５】ＣａＯは膨張係数を大きくし、また溶融ガ
ラスの粘度を下げてガラス溶解を促進する成分であり必
須である。１０％超では失透温度が高くなりすぎるおそ
れがある。好ましくは９％以下である。１％未満では膨
張係数が小さくなりすぎるおそれがある。好ましくは５
％以上、より好ましくは６％以上である。なお、失透温
度を下げたい場合、ＣａＯは１〜６％とすることが好ま
しい。CaO is a component that increases the expansion coefficient and lowers the viscosity of the molten glass to promote glass melting, and is essential. If it exceeds 10%, the devitrification temperature may be too high. Preferably it is 9% or less. If it is less than 1%, the expansion coefficient may be too small. Preferably 5
% Or more, more preferably 6% or more. In order to reduce the devitrification temperature, CaO is preferably set to 1 to 6%.
【００１６】ＳｒＯは必須ではないが、膨張係数を大き
くし、また溶融ガラスの粘度を下げてガラス溶解を促進
するために９％まで含有してもよい。９％超では失透温
度が高くなりすぎるおそれがある。好ましくは６％以下
である。SrO is not essential, but may be contained up to 9% in order to increase the expansion coefficient and lower the viscosity of the molten glass to promote glass melting. If it exceeds 9%, the devitrification temperature may be too high. It is preferably at most 6%.
【００１７】ＢａＯは必須ではないが、膨張係数を大き
くし、また溶融ガラスの粘度を下げてガラス溶解を促進
するために９％まで含有してもよい。９％超では失透温
度が高くなりすぎるおそれがある。好ましくは２％以下
である。なお、比重を下げるためにはＢａＯを含有しな
いことが好ましい。BaO is not essential, but may be contained up to 9% in order to increase the expansion coefficient and to lower the viscosity of the molten glass to promote glass melting. If it exceeds 9%, the devitrification temperature may be too high. Preferably it is 2% or less. In order to lower the specific gravity, it is preferable not to contain BaO.
【００１８】ＭｇＯ、ＣａＯ、ＳｒＯおよびＢａＯの合
量が２５％超では失透温度が高くなりすぎるおそれがあ
る。好ましくは２０％以下である。１０％未満では溶融
ガラスの粘度が大きくなりすぎガラス溶解が困難になる
おそれがある。好ましくは１２％以上である。If the total amount of MgO, CaO, SrO and BaO exceeds 25%, the devitrification temperature may be too high. Preferably it is 20% or less. If it is less than 10%, the viscosity of the molten glass becomes too large, and it may be difficult to melt the glass. It is preferably at least 12%.
【００１９】ＺｒＯ2は必須ではないが、歪点を高くす
るために１０％まで含有してもよい。１０％超では失透
温度が高くなりすぎるおそれがある。好ましくは５％以
下、より好ましくは４％以下である。また、ＺｒＯ2を
含有する場合は２％以上とすることが好ましい。なお、
失透温度が高くても成形できる板ガラス成形法を採る場
合は、ＺｒＯ2を５〜１０％とすることが好ましい。ZrO 2 is not essential, but may be contained up to 10% in order to increase the strain point. If it exceeds 10%, the devitrification temperature may be too high. It is preferably at most 5%, more preferably at most 4%. When ZrO 2 is contained, the content is preferably 2% or more. In addition,
If even high devitrification temperature takes a sheet glass forming method can be molded, it is preferable that the ZrO 2 5-10%.
【００２０】Ｎａ2ＯおよびＫ2Ｏは膨張係数を大きく
し、また溶融ガラスの粘度を下げてガラス溶解を促進す
る成分であり、少なくとも一方を含有しなければならな
い。それらの合量が１５％超では化学的耐久性が低下
し、また電気抵抗が小さくなりすぎるおそれがある。好
ましくは１３％以下である。７％未満では効果が小さす
ぎるおそれがある。好ましくは９％以上である。Na 2 O and K 2 O are components which increase the expansion coefficient and lower the viscosity of the molten glass to promote the melting of the glass, and must contain at least one of them. If their combined amount exceeds 15%, the chemical durability may be reduced and the electric resistance may be too small. Preferably it is 13% or less. If it is less than 7%, the effect may be too small. It is preferably at least 9%.
【００２１】本発明の強化ガラス基板は実質的に上記成
分からなるが、本発明の目的を損なわない範囲で他の成
分を合量で５重量％まで含有してもよい。他の成分とし
ては、ＳＯ3、Ａｓ2Ｏ3、Ｓｂ2Ｏ3、等の清澄剤、Ｆｅ2
Ｏ3、ＮｉＯ、ＣｏＯ、等の着色剤、ＺｎＯ等の溶解促
進剤、などが例示される。The tempered glass substrate of the present invention consists essentially of the above components, but may contain other components up to 5% by weight as long as the object of the present invention is not impaired. Other components include fining agents such as SO 3 , As 2 O 3 , Sb 2 O 3 , Fe 2
Examples include coloring agents such as O 3 , NiO, and CoO, and dissolution promoters such as ZnO.
【００２２】本発明の強化ガラス基板を製造する方法は
特に限定されず、各種製造方法を採用できる。たとえ
ば、目標組成となるように通常使用される原料を調合
し、これを溶解炉中で１５００〜１６００℃に加熱して
溶融する。バブリングや清澄剤添加や撹拌などによって
ガラスの均質化を行い、周知のフロート法、ダウンドロ
ー法などの方法により所定の板厚に成形し、徐冷後、研
削、研磨などの加工を行い、所定のサイズ、形状のガラ
ス基板とする。このガラス基板を、徐冷点より１００℃
以上高い温度に一旦加熱後常温の空気をガラス基板表面
にあてて急冷（風冷強化）し、表面に圧縮応力層が形成
された強化ガラス基板を得る。本発明の強化ガラス基板
はＰＤＰ、ＦＥＤ（フィールドエミッションディスプレ
イ）、等に好適である。The method for producing the tempered glass substrate of the present invention is not particularly limited, and various production methods can be adopted. For example, a commonly used raw material is prepared so as to have a target composition, and this is heated to 1500 to 1600 ° C. in a melting furnace to be melted. The glass is homogenized by bubbling, fining agent addition, stirring, etc., formed into a predetermined thickness by a well-known float method, down-draw method, etc., cooled slowly, and then ground, polished, and processed. A glass substrate of the size and shape of This glass substrate is kept at 100 ° C. from the annealing point.
After heating once to a high temperature, air at room temperature is applied to the surface of the glass substrate and rapidly cooled (strengthened by air cooling) to obtain a reinforced glass substrate having a compression stress layer formed on the surface. The tempered glass substrate of the present invention is suitable for PDP, FED (field emission display), and the like.
【００２３】[0023]
【実施例】重量％表示の組成が、ＳｉＯ2：５８、Ａｌ2
Ｏ3：７、ＭｇＯ：２、ＣａＯ：５、ＳｒＯ：７、Ｂａ
Ｏ：８、ＺｒＯ2：３、Ｎａ2Ｏ：４、Ｋ2Ｏ：６、であ
るガラスを溶融し、フロート法により厚さが２．８ｍｍ
の板ガラスに成形した。この板ガラスを所定の寸法（９
５０ｍｍ×１０５０ｍｍ）に切断後面取りしてガラス基
板を得た。このガラス基板の膨張係数は８３×１０-7／
℃、歪点は５７０℃であった。EXAMPLE The composition expressed as% by weight is SiO 2 : 58, Al 2
O 3 : 7, MgO: 2, CaO: 5, SrO: 7, Ba
The glass of O: 8, ZrO 2 : 3, Na 2 O: 4, K 2 O: 6 is melted, and the thickness is 2.8 mm by the float method.
Into a sheet glass. This sheet glass is set to a predetermined size (9
After cutting to 50 mm × 1050 mm), the glass substrate was obtained by chamfering. The expansion coefficient of this glass substrate is 83 × 10 −7 /
° C and the strain point were 570 ° C.
【００２４】前記ガラス基板を７５０℃まで加熱後常温
の空気をガラス基板表面にあてて急冷して強化し、強化
ガラス基板を得た。この強化ガラス基板の圧縮応力層は
表面から６００μｍの深さまで形成されており、該圧縮
応力層の圧縮応力最大値は８００ｋｇｆ／ｃｍ2であっ
た。After the glass substrate was heated to 750 ° C., the room temperature air was applied to the surface of the glass substrate to rapidly cool the glass substrate to strengthen it, thereby obtaining a reinforced glass substrate. The compression stress layer of this tempered glass substrate was formed to a depth of 600 μm from the surface, and the maximum value of the compression stress of the compression stress layer was 800 kgf / cm 2 .
【００２５】前記強化ガラス基板、強化されていない前
記ガラス基板、それぞれ１００枚をＩＴＯ（インジウム
がドープされたスズ酸化物）成膜工程に投入した。該成
膜工程における強化ガラス基板または強化されていない
ガラス基板の最高温度は約３００℃であった。その結
果、強化ガラス基板は該成膜工程において１枚も割れな
かったが、強化されていないガラス基板については１０
枚が割れた。この割れたガラスはＩＴＯ成膜チャンバか
ら除去しなければならず、そのために多大の時間を要し
生産効率を著しく低下させた。なお、このガラス基板が
割れた原因は、ガラス基板内に生じた温度分布によるも
のと考えられる。One hundred substrates each of the tempered glass substrate and the non-reinforced glass substrate were put into an ITO (indium-doped tin oxide) film forming step. The maximum temperature of the tempered glass substrate or the non-tempered glass substrate in the film forming step was about 300 ° C. As a result, no tempered glass substrate was broken in the film forming process, but 10
The piece broke. This broken glass had to be removed from the ITO deposition chamber, which required a great deal of time and significantly reduced production efficiency. It is considered that the cause of the breakage of the glass substrate is a temperature distribution generated in the glass substrate.
【００２６】[0026]
【発明の効果】本発明の強化ガラス基板を用いることに
より、次のような効果が得られる。 （１）ソーダライムシリカガラス基板に対して従来用い
られていた無機シール材料を本発明の強化ガラス基板に
対しても使用できる。 （２）前記無機シール材料の焼成に際し、基板の寸法精
度の問題が起るおそれがない。 （３）フラットディスプレイパネル製造工程における高
温工程、たとえばＩＴＯ成膜工程等、における基板割れ
の問題が減少する。The following effects can be obtained by using the tempered glass substrate of the present invention. (1) The inorganic sealing material conventionally used for the soda lime silica glass substrate can be used for the tempered glass substrate of the present invention. (2) When firing the inorganic seal material, there is no possibility that a problem of dimensional accuracy of the substrate occurs. (3) The problem of substrate cracking in a high-temperature process in a flat display panel manufacturing process, such as an ITO film forming process, is reduced.
───────────────────────────────────────────────────── フロントページの続き Ｆターム(参考） 4G015 CA04 CB02 4G059 AA08 AC20 4G062 AA04 BB01 DA05 DA06 DB03 DB04 DC01 DC02 DC03 DD01 DE01 DF01 EA01 EB01 EB02 EB03 EB04 EC01 EC02 EC03 EC04 ED03 EE03 EF01 EF02 EF03 EG01 EG02 EG03 FA10 GA10 HH20 JJ10 KK10 MM27 NN01 5C040 GA01 GA09 JA21 JA40 KA07 KB03 KB11 KB19 KB28 MA09 MA10 MA23 ──────────────────────────────────────────────────続 き Continued on the front page F-term (reference) 4G015 CA04 CB02 4G059 AA08 AC20 4G062 AA04 BB01 DA05 DA06 DB03 DB04 DC01 DC02 DC03 DD01 DE01 DF01 EA01 EB01 EB02 EB03 EB04 EC01 EC02 EC03 EC04 ED03 EE03 EF01 EF01 EF01 EF02 HH20 JJ10 KK10 MM27 NN01 5C040 GA01 GA09 JA21 JA40 KA07 KB03 KB11 KB19 KB28 MA09 MA10 MA23
Claims (2)
７０×１０-7〜１００×１０-7／℃、歪点が５５０℃以
上であり、かつ表面に圧縮応力層が形成されている強化
ガラス基板であって、表面から５０μｍ以上の深さまで
該圧縮応力層が形成されており、かつ該圧縮応力層の圧
縮応力最大値が２００ｋｇｆ／ｃｍ2以上であるフラッ
トパネルディスプレイ用強化ガラス基板。1. A reinforcement having an average coefficient of linear expansion at 50 to 350 ° C. of 70 × 10 -7 to 100 × 10 -7 / ° C., a strain point of 550 ° C. or more, and a compressive stress layer formed on the surface. A tempered glass substrate for a flat panel display, wherein the glass substrate has the compressive stress layer formed to a depth of 50 μm or more from the surface, and the maximum value of the compressive stress of the compressive stress layer is 200 kgf / cm 2 or more.
用強化ガラス基板。In 2. A substantially wt% display, SiO 2 45~70, Al 2 O 3 2~20, B 2 O 3 0~6, MgO 1~10, CaO 1~10, SrO 0~9, The tempered glass substrate for a flat panel display according to claim 1, comprising BaO 0-9, MgO + CaO + SrO + BaO 10-25, ZrO 2 0-10, and Na 2 O + K 2 O 7-15.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17865699A JP2001064028A (en) | 1999-06-22 | 1999-06-24 | Tempered glass base plate for flat panel display |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17554399 | 1999-06-22 | ||
| JP11-175543 | 1999-06-22 | ||
| JP17865699A JP2001064028A (en) | 1999-06-22 | 1999-06-24 | Tempered glass base plate for flat panel display |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2001064028A true JP2001064028A (en) | 2001-03-13 |
Family
ID=26496794
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17865699A Pending JP2001064028A (en) | 1999-06-22 | 1999-06-24 | Tempered glass base plate for flat panel display |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001064028A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1321443A1 (en) * | 2001-10-30 | 2003-06-25 | Corning Incorporated | Glass composition for display panels |
| JP2008077102A (en) * | 2007-11-02 | 2008-04-03 | Asahi Glass Co Ltd | Method for manufacturing filter with antireflection function for display device |
| KR100846283B1 (en) | 2007-03-07 | 2008-07-16 | 샌트랄 글래스 컴퍼니 리미티드 | A substrate glass for a flat panel display device |
| JP2008218417A (en) * | 2008-03-24 | 2008-09-18 | Nippon Electric Glass Co Ltd | Sheet glass for plane surface display device and its evaluation method |
| TWI380967B (en) * | 2007-08-31 | 2013-01-01 | Asahi Glass Co Ltd | Glass plate and manufacturing method thereof, and manufacturing method of TFT panel |
| CN103459337A (en) * | 2011-03-31 | 2013-12-18 | 日本板硝子株式会社 | Glass composition suitable for chemical strengthening and chemically strengthened glass article |
| CN104302590A (en) * | 2012-05-16 | 2015-01-21 | 旭硝子株式会社 | Method for producing plate glass |
| CN110709361A (en) * | 2017-06-05 | 2020-01-17 | Ａｇｃ株式会社 | Tempered glass |
-
1999
- 1999-06-24 JP JP17865699A patent/JP2001064028A/en active Pending
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1321443A1 (en) * | 2001-10-30 | 2003-06-25 | Corning Incorporated | Glass composition for display panels |
| US6753279B2 (en) | 2001-10-30 | 2004-06-22 | Corning Incorporated | Glass composition for display panels |
| SG116464A1 (en) * | 2001-10-30 | 2005-11-28 | Corning Inc | Glass composition for display panels. |
| US7087541B2 (en) | 2001-10-30 | 2006-08-08 | Corning Incorporated | Glass composition for display panels |
| KR100846283B1 (en) | 2007-03-07 | 2008-07-16 | 샌트랄 글래스 컴퍼니 리미티드 | A substrate glass for a flat panel display device |
| TWI380967B (en) * | 2007-08-31 | 2013-01-01 | Asahi Glass Co Ltd | Glass plate and manufacturing method thereof, and manufacturing method of TFT panel |
| JP2008077102A (en) * | 2007-11-02 | 2008-04-03 | Asahi Glass Co Ltd | Method for manufacturing filter with antireflection function for display device |
| JP2008218417A (en) * | 2008-03-24 | 2008-09-18 | Nippon Electric Glass Co Ltd | Sheet glass for plane surface display device and its evaluation method |
| CN103459337A (en) * | 2011-03-31 | 2013-12-18 | 日本板硝子株式会社 | Glass composition suitable for chemical strengthening and chemically strengthened glass article |
| CN103459337B (en) * | 2011-03-31 | 2015-11-25 | 日本板硝子株式会社 | Be suitable for glass composition and the chemically toughened glass article of chemical tempering |
| CN104302590A (en) * | 2012-05-16 | 2015-01-21 | 旭硝子株式会社 | Method for producing plate glass |
| CN110709361A (en) * | 2017-06-05 | 2020-01-17 | Ａｇｃ株式会社 | Tempered glass |
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