JP2001048841A - Hydronaphthalene derivative and its amide compound - Google Patents

Hydronaphthalene derivative and its amide compound

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Publication number
JP2001048841A
JP2001048841A JP11218926A JP21892699A JP2001048841A JP 2001048841 A JP2001048841 A JP 2001048841A JP 11218926 A JP11218926 A JP 11218926A JP 21892699 A JP21892699 A JP 21892699A JP 2001048841 A JP2001048841 A JP 2001048841A
Authority
JP
Japan
Prior art keywords
group
compound
added
hydronaphthalene
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11218926A
Other languages
Japanese (ja)
Inventor
Akira Takahashi
昭 高橋
Junichi Masuda
順一 増田
Toshiyuki Wakayama
敏之 若山
Nobuaki Koike
信明 小池
Toshiaki Segawa
俊章 瀬川
Shigeo Nozoe
重男 野副
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toagosei Co Ltd
Original Assignee
Toagosei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toagosei Co Ltd filed Critical Toagosei Co Ltd
Priority to JP11218926A priority Critical patent/JP2001048841A/en
Publication of JP2001048841A publication Critical patent/JP2001048841A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To obtain the subject new compound having a hydronaphthalene structure and useful as a fungicide or a raw material of various fungicidal agents. SOLUTION: This hydronaphthalene derivative is a compound of formula I [X, Y are each a lower alkyl or a (substituted) hydroxyl group; R1 is an (unsaturated bond-containing) lower alkylene; R2 is H, a lower alkyl or a blocking group, and a bond between 8th and 9th positions may be double bond, and in the case of the double bond, the substituting group at the 8th position is one of X, Y] or its amide compound (e.g.; a reaction product with a lower alkylamine such as propylamine and a hydroxy lower alkylamine such as ethanolamine). For example, a compound of formula II. The compound of formula I is obtained e.g. by a publicly known method by using sclareolide, gelanyl, linalool, etc., and ethyl acetate as starting materials.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ヒドロナフタレン
環構造を有する新規な化合物に関するものであり、本発
明の化合物は抗真菌剤として、あるいは各種抗真菌剤製
造の原料として、さらにはその他の医薬品またはその原
料として、例えば、抗癌剤として、あるいは各種抗癌剤
の原料としても有効であり、本発明は医薬製造技術に属
するものである。
TECHNICAL FIELD The present invention relates to a novel compound having a hydronaphthalene ring structure, and the compound of the present invention is used as an antifungal agent, as a raw material for producing various antifungal agents, and as another pharmaceutical agent. Alternatively, it is also effective as a raw material thereof, for example, as an anticancer agent or as a raw material of various anticancer agents, and the present invention belongs to the pharmaceutical manufacturing technology.

【0002】[0002]

【従来の技術】抗生物質を中心に抗微生物薬の開発が目
ざましい発展を遂げるなかで、抗真菌剤に関してはその
種類、有効性や毒性の点から判断して、必ずしも満足で
きる状態にはない。抗真菌剤の治療対象となる真菌症に
は深在性真菌感染症と表在性真菌感染症とがあり、深在
性真菌感染症は、カンジダ症、アスペルギルス症、クリ
プトコッカス症、ムコール症が多く、その他輸入真菌症
を含めて、アクチノミセス症、ノカルジア症、クロモブ
ラストミコーシス、ヒストプラスマ症、コクシジオイデ
ス症、ゲオトリクム症、ペニシリウム症などが知られて
いる。また、表在性真菌症には水虫や爪真菌症、タムシ
などがある。特に、近年、老齢化、手術後、抗癌剤や免
疫抑制剤、ステロイドホルモン等の汎用やエイズ感染等
による生体防御能の低下からカンジダ(Candida)、アス
ペルギルス(Aspergillus)、クリプトコッカス(Cryptoco
ccus)等の真菌感染による日和見感染症が一つの医療問
題になっており、その治療薬の開発が望まれている。こ
れらの真菌感染症の治療薬としては、現在のところ、ア
ンホテリンシB、フルコナゾール、イトラコナゾール、
ミコナゾール、5-フロロシトシンなどの化学療法剤が使
用されている。しかし、これらの化学療法剤は毒性や治
療効果の面で必ずしも満足できるものでなく、また、耐
性菌の出現も問題となっている。この問題を解決するた
めに、選択性に優れた臨床上有用な抗真菌薬が望まれて
いる。
2. Description of the Related Art With the remarkable development of antimicrobial drugs, mainly antibiotics, antifungal agents are not always in a satisfactory state, judging from the point of kind, effectiveness and toxicity. Mycosis to be treated with antifungal agents includes deep fungal infections and superficial fungal infections, and deep fungal infections include candidiasis, aspergillosis, cryptococcosis, and mucormycosis. Actinomycosis, Nocardiosis, Chromoblast Mycosis, Histoplasmosis, Coccidioidomycosis, Geotrichum disease, Penicillium disease, etc., including other imported mycosis. In addition, superficial mycosis includes athlete's foot, onychomycosis, and bugs. In particular, in recent years, aging, after surgery, Candida (Candida), Aspergillus (Aspergillus), Cryptococcus (Cryptoco
Opportunistic infections caused by fungal infections such as ccus) have become a medical problem, and the development of therapeutic agents has been desired. Therapeutic agents for these fungal infections currently include amphotericin B, fluconazole, itraconazole,
Chemotherapeutic agents such as miconazole, 5-fluorocytosine have been used. However, these chemotherapeutic agents are not always satisfactory in terms of toxicity and therapeutic effect, and the emergence of resistant bacteria is also a problem. In order to solve this problem, a clinically useful antifungal drug excellent in selectivity is desired.

【0003】[0003]

【発明が解決しようとする課題】本発明者等は、日和見
感染症を惹起する上述の真菌類に対して強い抗菌力を有
する、すなわち抗真菌剤として、あるいは抗真菌剤製造
のための原料として有効な新規な化合物を見出すべく鋭
意検討を続けたのである。すなわち、本発明は抗真菌剤
や抗癌剤等として、あるいはその原料として有効な新規
な化合物を提供しようとするものである。
SUMMARY OF THE INVENTION The present inventors have a strong antibacterial activity against the above-mentioned fungi which cause opportunistic infections, that is, as an antifungal agent or as a raw material for producing an antifungal agent. They continued their intensive studies to find effective new compounds. That is, an object of the present invention is to provide a novel compound effective as an antifungal agent, an anticancer agent or the like, or as a raw material thereof.

【0004】[0004]

【課題を解決するための手段】本発明者等は上記目的を
達成すべく鋭意研究を行ない、ヒドロナフタレン環構造
が抗真菌作用に大きな影響を及ぼしていること、すなわ
ち、そのヒドロナフタレン環構造を有するアルビカノー
ルおよびそれと類似の構造を有するスクラレオライドお
よびゲラニイルやリナロール等から合成したヒドロナフ
タレン環構造を有する化合物等に各種の置換基を付加し
た新規な化合物が抗真菌剤として、あるいは抗真菌剤製
造のための原料として有効であることを見出して本発明
を完成したのである。
Means for Solving the Problems The present inventors have made intensive studies to achieve the above-mentioned object, and have found that the hydronaphthalene ring structure has a great influence on the antifungal action, that is, the hydronaphthalene ring structure has New compounds in which various substituents are added to arbicanol and sclareolide having a structure similar thereto and compounds having a hydronaphthalene ring structure synthesized from geraniyl, linalool, etc. as antifungal agents or production of antifungal agents The present inventors have found that the present invention is effective as a raw material for the present invention, and have completed the present invention.

【0005】すなわち、本発明は下記構造式で示される
ヒドロナフタレン誘導体およびそのアミド化合物に関す
るものである。
That is, the present invention relates to a hydronaphthalene derivative represented by the following structural formula and an amide compound thereof.

【0006】[0006]

【化2】 Embedded image

【0007】ただし、式中XとYは低級アルキル基と置
換基または保護基を有していてもよい水酸基であり、R
1は不飽和結合を有していても良い、低級アルキレン
基、R2は水素原子、低級アルキル基または保護基であ
り、8位と9位の間は2重結合でも良く、2重結合の場
合は8位の置換基はXまたはYの1個のみである。
Wherein X and Y are a lower alkyl group and a hydroxyl group which may have a substituent or a protecting group;
1 is a lower alkylene group which may have an unsaturated bond, R 2 is a hydrogen atom, a lower alkyl group or a protecting group, and a double bond may be formed between the 8-position and the 9-position; In such a case, the substituent at the 8-position is only one of X or Y.

【0008】[0008]

【発明の実施の形態】以下、本発明について詳説する。
本発明における化合物は、その構造の中心がヒドロナフ
タレン環であり、より詳細には前記構造式で示される様
に、その8位に低級アルキル基と置換基または保護基を
有していてもよい水酸基があり、置換基としては、エー
テル又はエステル構造としての低級アルキル基、低級ア
ルキロイル基が、保護基としては、水酸基ではメトキシ
メチル基(MOM)、メチルチオメチル(MTM)、テトラヒドロ
ピラニル(THP)、t-ブチル(t-Bu)、トリチル(Trt)、ベン
ジル(BzlまたはBn)、p-メトキシベンジル(MP)などの
エーテル型保護基、アセチル基などのアシル型保護基、
トリメチルシリル(TMS)、t-ブチルジメチルシリル(TBDM
S)等のシリル型保護基等であり、この保護基は環状構造
を有していても良く、9位には不飽和結合を有していて
も良い低級アルキレン基を介してカルボキシル基を有す
るものであり、カルボキシル基の末端は水素原子、低級
アルキル基または保護基であり、保護基としては、ベン
ジル基等のエステル型保護基やトリメチルシリル基等の
シリルエステル型保護基等を挙げることができる。ま
た、上記誘導体のアミド化合物としては、プロピルアミ
ンやジエチルアミンの様な低級アルキルアミン、エタノ
ールアミンの様なヒドロキシ低級アルキルアミン、4-(3
-アミノプロピル)モルホリンや1-(3-アミノプロピル)イ
ミダゾールの様なヘテロ環を有するアミン等との反応物
が挙げられる。本発明の化合物は既知の化合物であるス
クラレオライド、ゲラニイル、リナロール等から公知の
手段により誘導されるものである。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail.
The compound in the present invention has a hydronaphthalene ring at the center of its structure, and more specifically, may have a lower alkyl group and a substituent or a protecting group at the 8-position, as shown in the structural formula. There is a hydroxyl group, as a substituent, a lower alkyl group as an ether or ester structure, a lower alkyloyl group, and as a protecting group, a hydroxyl group is methoxymethyl group (MOM), methylthiomethyl (MTM), tetrahydropyranyl (THP). , T-butyl (t-Bu), trityl (Trt), benzyl (Bzl or Bn), ether-type protecting group such as p-methoxybenzyl (MP), acyl-type protecting group such as acetyl group,
Trimethylsilyl (TMS), t-butyldimethylsilyl (TBDM
S) and the like, which may have a cyclic structure and may have a carboxyl group at the 9-position via a lower alkylene group which may have an unsaturated bond. The terminal of the carboxyl group is a hydrogen atom, a lower alkyl group or a protecting group, and examples of the protecting group include ester-type protecting groups such as benzyl group and silyl ester-type protecting groups such as trimethylsilyl group. . Examples of the amide compounds of the above derivatives include lower alkylamines such as propylamine and diethylamine, hydroxy lower alkylamines such as ethanolamine, and 4- (3
A reaction product with an amine having a hetero ring such as -aminopropyl) morpholine or 1- (3-aminopropyl) imidazole is exemplified. The compound of the present invention is derived from known compounds such as sclareolide, geraniyl, linalool and the like by known means.

【0009】[0009]

【実施例】以下に本発明ついての実施例を示すが,この
実施例は何ら本発明を制限するものではない。また、各
実施例における抗真菌活性測定法及び感染治療試験方法
は以下のとおりである。 ○ 抗カンジダアルビカンス(Candida albicans)活性測
定法 各種の化合物について、カンジダアルビカンス(Candida
albicans)を被験菌として、該真菌に対する感受性をin
vitroで試験してその活性を確認した。抗真菌剤感受性
試験は、日本医真菌学会誌 Vol.36(1), 62-64(1995) で
提案されている方法に準じて行った。実験に使用した菌
株は、帝京大学医真菌研究センターから分譲された株T
IMM1768とTIMM3318を用いた。このう
ち、TIMM3318株はアゾール系抗真菌剤に対し耐
性を有しているものである。感受性測定用培地は、RP
MI1640(Irvine Scientific Cat. #9512)を10.
4gと炭酸水素ナトリウムを2.0gを滅菌蒸留水900m
lに溶解後、緩衝液としてMOPS34.53gを加え、
溶解するまでよく撹拌し、次に、水酸化ナトリウムでp
H7.0に修正した後、滅菌蒸留水を加えて1リットル
に容量調整し、濾過滅菌後4℃に保存した。試験菌はYM
agar培地(Difco)を用い、35℃,24〜48時間の培
養を2回以上行って継代した後、5mlの滅菌生理食塩水
に懸濁して得た。この懸濁液の吸光度を600nmで測定
し、あらかじめ作成した検量線から菌量を求め、2×1
3cells/mlの菌数になるように感受性測定用培地で希
釈し、試験菌液とした。試験検体は20%DMSO添加
メタノール溶液を用いて検体を溶かし、2倍段階希釈に
て試験検定溶液を作製した。抗真菌感受性の試験は、9
6ウェルの平底マイクロプレートに90μlの感受性測
定用培地を分注し、10μlの試験検定溶液と100μl
の試験菌液を各ウェルに加え、所定の濃度を作製した。
湿度を保った容器にマイクロプレートを入れ、72時間
を限度として35℃にて培養し、24時間毎に観察して
発育コントロールの濁度が0.2に達した時点で各ウェ
ルの濁度を測定した。80%発育阻止濃度(IC80)の判
定は、マイクロプレートをミキサーで撹拌後、発育コン
トロールの培養液を40μl取り、これに感受性測定用
培地160μlを加え、IC80相当のウェルを作製し
た。このウェルの濁度に比べて同等またはそれ以下の濁
度を示すウェルを終末点とした。
EXAMPLES Examples of the present invention will be described below, but these examples do not limit the present invention in any way. In addition, the antifungal activity measurement method and the infection treatment test method in each Example are as follows. ○ Assay for anti-Candida albicans activity Candida albicans (Candida albicans)
albicans) as a test bacterium, and
Tested in vitro to confirm its activity. The antifungal susceptibility test was performed according to the method proposed in the Journal of the Japanese Society for Medical Mycology, Vol. 36 (1), 62-64 (1995). The strain used for the experiment was strain T, which was distributed by Teikyo University Medical Mycology Research Center.
IMM1768 and TIMM3318 were used. Among them, the TIMM3318 strain has resistance to an azole antifungal agent. The culture medium for sensitivity measurement is RP
MI1640 (Irvine Scientific Cat. # 9512) for 10.
4 g and 2.0 g of sodium bicarbonate in 900 m of sterile distilled water
After dissolving in l, 34.53 g of MOPS was added as a buffer,
Stir well until dissolved, then p with sodium hydroxide
After adjusting to H7.0, the volume was adjusted to 1 liter by adding sterile distilled water, and the solution was sterilized by filtration and stored at 4 ° C. Test bacteria are YM
Using an agar medium (Difco), the cells were subcultured by culturing at 35 ° C. for 24 to 48 hours twice or more, and then suspended in 5 ml of sterile physiological saline. The absorbance of this suspension was measured at 600 nm, the amount of bacteria was determined from a calibration curve created in advance, and 2 × 1
It was diluted with a culture medium for sensitivity measurement so as to have a cell count of 0 3 cells / ml to prepare a test bacterial solution. The test sample was dissolved using a methanol solution containing 20% DMSO, and a test assay solution was prepared by 2-fold serial dilution. The test for antifungal susceptibility was 9
Dispense 90 μl of sensitivity measurement medium into a 6-well flat bottom microplate, add 10 μl of test assay solution and 100 μl
Was added to each well to prepare a predetermined concentration.
The microplate was placed in a container keeping humidity and cultured at 35 ° C. for a maximum of 72 hours. Observation was made every 24 hours, and when the turbidity of the growth control reached 0.2, the turbidity of each well was determined. It was measured. To determine the 80% growth inhibitory concentration (IC 80 ), a microplate was stirred with a mixer, 40 μl of a growth control culture was taken, and 160 μl of a culture medium for sensitivity measurement was added thereto to prepare a well equivalent to IC 80 . The wells exhibiting a turbidity equal to or less than the turbidity of this well were defined as the end points.

【0010】○ 抗アスペルギルスフミガータス(Asper
gillus fumigatus)活性測定法 1.薬液調製法 試験薬剤を秤量し、20%DMSO添加メタノールで薬
剤希釈段階を作製した。 2.感受性測定培地と調製法 RPM11640(Irvine Scientific Cat.#9512)10.4
g、NaHCO3 2.0gを滅菌蒸留水900m1に溶解後、
緩衝液としてMOPS34.53gを加え撹拌し、NaO
HでpH7.0に修正した後1リットルに容量調整し、濾
過滅菌後使用した。 3.接種菌液の調製 試験菌はポテトデキストロース寒天培地(Difco)を用
い、30℃で1週間培養した後、0.05%Tween80
含有滅菌生理食塩水を加え、分生子浮遊液を得た。血球
計算盤を用いて顕微鏡下で分生子数を計測し、測定用培
地で2.5×105cell/mlの菌数に調整した。 4.培養 96穴平底マイクロプレートに90μlの培地を分注
し、1で調製した薬液を10μl、接種菌液を80μl、
alamar blue液20μlを各ウエルに加えた(培地に対し最
終でDMSOが1%、メタノールが4%、alamar blue
が10%、発育コントロールは薬剤不含の同培地とす
る)。乾燥を防ぐため湿潤容器中で30℃にて培養、2
4時間毎に観察し、発育コントロールのOD570が0.6
に達した時点で終末点を判定した。 5.結果の判定 発育コントロールに対する80%発育阻止濃度(IC80)
を終末点としてこれを最小発育阻止濃度とした。具体的
には発育コントロールの測定値の20%値を基準にして
相当するかそれ以下の測定値を示すものの薬剤濃度をI
80(MIC)とした。
○ Anti-Aspergillus fumigatus (Asper
gillus fumigatus) activity measurement method Drug solution preparation method The test drug was weighed, and a drug dilution step was prepared with methanol containing 20% DMSO. 2. Sensitivity measurement medium and preparation method RPM11640 (Irvine Scientific Cat. # 9512) 10.4
g, 2.0 g of NaHCO 3 in 900 ml of sterile distilled water
34.53 g of MOPS was added as a buffer solution, and the mixture was stirred.
After adjusting the pH to 7.0 with H, the volume was adjusted to 1 liter and sterilized by filtration before use. 3. Preparation of Inoculated Bacterial Solution Test bacteria were cultured on a potato dextrose agar medium (Difco) at 30 ° C. for 1 week, and then 0.05% Tween80 was added.
A sterile physiological saline solution was added to obtain a conidia suspension. The number of conidia was counted under a microscope using a hemocytometer and adjusted to 2.5 × 10 5 cells / ml in a measurement medium. 4. Culture 90 μl of medium was dispensed into a 96-well flat bottom microplate, 10 μl of the drug solution prepared in 1 and 80 μl of the inoculum were added.
20 μl of alamar blue solution was added to each well (final 1% DMSO, 4% methanol, alamar blue
Is 10%, and the growth control is the same medium without drug). Incubate at 30 ° C in a wet container to prevent drying, 2
Observed every 4 hours, OD 570 of the growth control was 0.6.
The end point was judged when reaching. 5. Judgment of results 80% growth inhibitory concentration (IC 80 ) relative to growth control
This was defined as the minimum inhibitory concentration with the endpoint as the endpoint. More specifically, the drug concentration was determined to be equal to or less than 20% of the measured value of the growth control, but the drug concentration was calculated as I
C 80 (MIC).

【0011】〇 感染治療試験 健康に生育したマウス(ICR,4週齢,雌,19〜2
2g,日本チャールスリバー)に対し、0.1%Tween8
0添加した生理食塩水に懸濁したアスペルギルスフミガ
ータス(1.0×106CFU/マウス)の菌液を0.2ml
尾静脈より接種し、感染を成立させた。治療は、5%ア
ラビアゴム水溶液に検体を溶解又は懸濁し、各回0.2m
l量を胃ゾンデを用いて経口投与した(50mg/kgと10m
g/kg又は10mg/kgと2mg/kg)。1回目は菌接種1時間
後に、その後は1日1回24時間おきに6回の投与を行
なった(1回/日,計7日間投与)。対照群は基剤だけを
0.2ml量投与した。薬効は対照動物群が全て死亡した
時点の検体投与群のマウス生存匹数から下記の様に判定
した。 有効 60%以上の生存率 やや有効 40%の生存率 無効 20%以下の生存率
[0011] Infection treatment test Healthy growing mouse (ICR, 4 weeks old, female, 19-2)
2g, Charles River Japan) 0.1% Tween8
0.2 ml of a bacterial solution of Aspergillus fumigatus (1.0 × 10 6 CFU / mouse) suspended in physiological saline to which 0 was added.
Inoculation was performed through the tail vein to establish infection. Treatment is performed by dissolving or suspending the specimen in a 5% gum arabic aqueous solution, 0.2 m each time.
l was orally administered using a gastric probe (50 mg / kg and 10 m
g / kg or 10 mg / kg and 2 mg / kg). The first administration was performed 1 hour after inoculation of the bacteria, and thereafter, 6 administrations were performed once a day every 24 hours (administered once a day for a total of 7 days). The control group received 0.2 ml of the vehicle alone. The efficacy was determined as follows from the number of surviving mice in the sample administration group at the time when all the control animal groups died. Effective 60% or more survival rate Slightly effective 40% survival rate Ineffective 20% or less survival rate

【0012】実施例1 ALB−204の合成 市販のスクラレオライド(1.25g:5.00mmol、アル
ドリッチ試薬)をテトラヒドロフラン(以下THFとい
う)(10ml)-エーテル(10ml)の混液に溶解し、氷冷下
撹拌しながら水素化リチウムアルミニウム(190mg:
5.00mmol)を少量ずつ加えた。同温下1時間撹拌した
後、酢酸エチルを少量ずつ加え過剰の試薬を分解した。
1N塩酸(40ml)を加えた後酢酸エチル(40ml)で2回
抽出し、抽出液は飽和炭酸水素ナトリウム水溶液及び飽
和食塩水で順次洗浄した。抽出液を無水硫酸マグネシウ
ムで乾燥後溶媒を留去し、析出する結晶を濾取して、4
位に2個のメチル基、8位にメチル基とヒドロキシ基、
9位に2-ヒドロキシエチル基、10位にメチル基を有す
るヒドロナフタレン(以下AT-1という)1.20gを無色
針状晶として得た(以下構造式の説明において、格別の
注釈がなければ4位と10位のメチル基については説明
を省略する)。その1H-NMRスペクトル(400MHz)は以下の
とおりであった。 (CDCl3,ppm): 0.79(3H,s,Me-C10), 0.79(3H,s,Meβ-C
4), 0.88(3H,s,Meα-C4),1.20(3H,s,Me-C8), 1.90(1H,
ddd,J=12.2,3.4,2.9,H7), 3.46(1H,ddd,J=10.3,8.3,5.
9,H12), 3.75(1H,ddd,J=10.3,4.4,4.4,H12')
Example 1 Synthesis of ALB-204 Commercially available sclareolide (1.25 g: 5.00 mmol, Aldrich reagent) was dissolved in a mixture of tetrahydrofuran (hereinafter referred to as THF) (10 ml) -ether (10 ml), and ice was added. Lithium aluminum hydride (190 mg:
5.00 mmol) was added in small portions. After stirring at the same temperature for 1 hour, ethyl acetate was added little by little to decompose excess reagent.
After adding 1N hydrochloric acid (40 ml), the mixture was extracted twice with ethyl acetate (40 ml), and the extract was washed successively with a saturated aqueous solution of sodium hydrogen carbonate and a saturated saline solution. After the extract was dried over anhydrous magnesium sulfate, the solvent was distilled off, and the precipitated crystals were collected by filtration.
Two methyl groups at the 8 position, a methyl group and a hydroxy group at the 8 position,
1.20 g of hydronaphthalene having a 2-hydroxyethyl group at the 9-position and a methyl group at the 10-position (hereinafter referred to as AT-1) was obtained as colorless needles (unless otherwise noted in the description of the structural formula, The description of the methyl groups at the 4- and 10-positions is omitted. Its 1 H-NMR spectrum (400 MHz) was as follows. (CDCl 3 , ppm): 0.79 (3H, s, Me-C10), 0.79 (3H, s, Meβ-C
4), 0.88 (3H, s, Meα-C4), 1.20 (3H, s, Me-C8), 1.90 (1H,
ddd, J = 12.2,3.4,2.9, H7), 3.46 (1H, ddd, J = 10.3,8.3,5.
9, H12), 3.75 (1H, ddd, J = 10.3,4.4,4.4, H12 ')

【0013】上記AT-1(1.20g:4.72mmol)のピ
リジン(1.5ml)溶液に氷冷下無水酢酸(1ml)を加えた
後、室温下一晩放置した。反応液に氷水(40ml)を加え
酢酸エチル(30ml)で2回抽出した後、抽出液を1N塩
酸、飽和炭酸水素ナトリウム水溶液及び飽和食塩水で順
次洗浄した。抽出液を無水硫酸マグネシウムで乾燥後、
溶媒を留去して得られる残渣をシリカゲルカラムクロマ
トグラフィー[13g:1.5cmIDx16.5、溶出溶媒:
クロロホルムー酢酸エチル=100/0→70/30]に
より精製して、8位にメチル基とヒドロキシ基、9位に
2-アセトキシエチル基を有するヒドロナフタレン(以下
AT-2という)1.35gを無色飴状物質として得た。そ
1H-NMRスペクトル(400MHz)は以下のとおりであった。 (CDCl3,ppm): 0.79(3H,s,Me-C10), 0.79(3H,s,Meβ-C
4), 0.87(3H,s,Meα-C4),1.16(3H,s,Me-C8), 1.89(1H,d
dd,J=12.2,2.9,2.9,H7), 4.12 (2H,m,H12 and H12')
Acetic anhydride (1 ml) was added to a solution of the above AT-1 (1.20 g: 4.72 mmol) in pyridine (1.5 ml) under ice-cooling, and the mixture was allowed to stand at room temperature overnight. Ice water (40 ml) was added to the reaction solution, and the mixture was extracted twice with ethyl acetate (30 ml). The extract was washed successively with 1N hydrochloric acid, a saturated aqueous solution of sodium hydrogencarbonate and saturated saline. After drying the extract over anhydrous magnesium sulfate,
The residue obtained by evaporating the solvent was subjected to silica gel column chromatography [13 g: 1.5 cm ID × 16.5, elution solvent:
Chloroform-ethyl acetate = 100/0 → 70/30], and methyl and hydroxy groups at the 8th position and 9th position
1.35 g of hydronaphthalene having a 2-acetoxyethyl group (hereinafter referred to as AT-2) was obtained as a colorless candy substance. Its 1 H-NMR spectrum (400 MHz) was as follows. (CDCl 3 , ppm): 0.79 (3H, s, Me-C10), 0.79 (3H, s, Meβ-C
4), 0.87 (3H, s, Meα-C4), 1.16 (3H, s, Me-C8), 1.89 (1H, d
dd, J = 12.2,2.9,2.9, H7), 4.12 (2H, m, H12 and H12 ')

【0014】上記AT-2(1.85g:6.25mmol)のジ
クロロメタン(20ml)溶液に、氷冷下撹拌しながらクロ
ロメチルメチルエーテル(715μl:9.38mmol)及び
ジイソプロピルエチルアミン(1.74ml:9.99mmol)
を順次加えた。反応液を室温下8時間撹拌後、クロロホ
ルム(30ml)及び水(30ml)を加え生成物を抽出し、抽
出液は1N塩酸、飽和炭酸水素ナトリウム水溶液及び飽
和食塩水で順次洗浄した。無水硫酸マグネシウムで乾燥
後溶媒を留去し、残渣をシリカゲルカラムクロマトグラ
フィー[30g:2.0cmIDx20.5、溶出溶媒:n-ヘキ
サンー酢酸エチル=100/0→60/40]により精製
して下記構造式で示される化合物(以下AT-6という)6
21mgを無色飴状物質として得た。その1H-NMRスペクト
ル(400MHz)は以下のとおりであった。 (CDCl3,ppm): 0.79(3H,s,Me-C10), 0.83(3H,s,Meβ-C
4), 0.87(3H,s,Meα-C4),1.23(3H,s,Me-C8), 2.06(1H,d
dd,J=12.2,3.4,2.9,H7), 3.37(3H,s,OCH2OCH3),3.45(1
H,ddd,J=9.8,9.8,4.4,H12), 3.72(1H,ddd,J=9.8,5.4,4.
4,H12'), 4.75(2H,s, OCH2OCH3)
In a dichloromethane (20 ml) solution of the above AT-2 (1.85 g: 6.25 mmol), chloromethyl methyl ether (715 μl: 9.38 mmol) and diisopropylethylamine (1.74 ml: 9) were stirred with ice cooling. .99 mmol)
Were sequentially added. After stirring the reaction solution at room temperature for 8 hours, chloroform (30 ml) and water (30 ml) were added to extract the product, and the extract was washed successively with 1N hydrochloric acid, a saturated aqueous solution of sodium hydrogen carbonate and a saturated saline solution. After drying over anhydrous magnesium sulfate, the solvent was distilled off, and the residue was purified by silica gel column chromatography [30 g: 2.0 cm ID × 20.5, elution solvent: n-hexane-ethyl acetate = 100/0 → 60/40] to give the following structure: Compound represented by the formula (hereinafter referred to as AT-6) 6
21 mg were obtained as a colorless candy. Its 1 H-NMR spectrum (400 MHz) was as follows. (CDCl 3 , ppm): 0.79 (3H, s, Me-C10), 0.83 (3H, s, Meβ-C
4), 0.87 (3H, s, Meα-C4), 1.23 (3H, s, Me-C8), 2.06 (1H, d
dd, J = 12.2,3.4,2.9, H7), 3.37 (3H, s, OCH 2 OCH 3 ), 3.45 (1
H, ddd, J = 9.8,9.8,4.4, H12), 3.72 (1H, ddd, J = 9.8,5.4,4.
4, H12 '), 4.75 (2H, s, OCH 2 OCH 3 )

【0015】[0015]

【化3】 Embedded image

【0016】窒素気流下、−70℃に冷却した7.71m
lのDMSOの塩化メチレン40ml溶液に、8.52mlの
無水トリフルオロ酢酸の塩化メチレン40ml溶液を30
分かけてゆっくり滴下した。さらに30分攪拌した後、
AT-6の12gの塩化メチレン40ml溶液を30分かけ
てゆっくり滴下し、さらに30分攪拌した。トリエチル
アミン16.8mlを30分かけてゆっくり滴下した後、
ドライアイスバスを除いて、さらに2時間攪拌した。反
応溶液にクロロホルムを加えて希釈し、この有機層を飽
和食塩水で2回洗浄し、無水硫酸ナトリウムを加えて乾
燥し濾過した。ろ液を濃縮し、残査をシリカゲルカラム
クロマトグラフィ(n-ヘキサン:酢酸エチル=95:5
〜9:1)にかけ、8位にメチル基、メトキシメチルオ
キシ基、9位にホルミルメチル基を有するヒドロナフタ
レン(以下ALB203という)7.06g(59%)を得た。
その1H-NMR(400MHz)スペクトルデータは以下のとおりで
あり、Rfは0.50(シリカゲル薄層カラムクロマトグ
ラフィ、n-ヘキサン:酢酸エチル=8:2)である。 (CDCl3,ppm): 9.61(1H,br dd,J=1.0,1.5Hz,CHO), 4.63
(2H,s,O-CH2-O-), 3.30(3H,s,O-Me), 2.45(1H,m,CH-CH
O), 2.29(1H,m,CH-CHO), 2.02(2H,m,cyclic CH),1.75-
1.1(7H,m,cyclic CH), 1.21(3H,s,Me), 1.0-0.8(2H,m,c
yclic CH), 0.89(3H,s,Me), 0.84(3H,s,Me), 0.80(3H,
s,Me)
7.71 m cooled to -70 ° C. under a stream of nitrogen
To a solution of 1 ml of DMSO in 40 ml of methylene chloride was added 30 ml of a solution of 8.52 ml of trifluoroacetic anhydride in 40 ml of methylene chloride.
It was dripped slowly over a minute. After stirring for another 30 minutes,
A solution of 12 g of AT-6 in 40 ml of methylene chloride was slowly added dropwise over 30 minutes, and the mixture was further stirred for 30 minutes. After slowly adding 16.8 ml of triethylamine dropwise over 30 minutes,
Except for the dry ice bath, the mixture was further stirred for 2 hours. Chloroform was added to the reaction solution to dilute it, and the organic layer was washed twice with saturated saline, dried over anhydrous sodium sulfate, and filtered. The filtrate is concentrated, and the residue is subjected to silica gel column chromatography (n-hexane: ethyl acetate = 95: 5).
To 9: 1) to give 7.06 g (59%) of a hydronaphthalene having a methyl group, a methoxymethyloxy group at the 8-position and a formylmethyl group at the 9-position (hereinafter referred to as ALB203).
Its 1 H-NMR (400 MHz) spectrum data is as follows, and Rf is 0.50 (silica gel thin layer column chromatography, n-hexane: ethyl acetate = 8: 2). (CDCl 3 , ppm): 9.61 (1H, br dd, J = 1.0,1.5Hz, CHO), 4.63
(2H, s, O-CH 2 -O-), 3.30 (3H, s, O-Me), 2.45 (1H, m, CH-CH
O), 2.29 (1H, m, CH-CHO), 2.02 (2H, m, cyclic CH), 1.75-
1.1 (7H, m, cyclic CH), 1.21 (3H, s, Me), 1.0-0.8 (2H, m, c
yclic CH), 0.89 (3H, s, Me), 0.84 (3H, s, Me), 0.80 (3H,
s, Me)

【0017】20gの(エトキシカルボニルメチル)トリ
フェニルホスホニウムブロミドのDMSO100ml溶液
に水素化ナトリウム1.68g(60wt% in oil)を加え、
80℃に加熱し1時間攪拌した。6.9gのALB203を
DMSO30mlに溶解し、反応溶液に加え、80℃に加
熱しながら15時間攪拌した。反応溶液に酢酸エチルと
水を加えて分液した。有機層を、水、飽和食塩水で順次
洗浄し、無水硫酸ナトリウムを加えて乾燥した。水層は
酢酸エチルで再抽出し、有機層を飽和食塩水で洗浄した
後、無水硫酸ナトリウムで乾燥した。乾燥後濾過し、ろ
液を合わせ、溶媒を減圧下留去し、残査をシリカゲルカ
ラムクロマトグラフィー(n-ヘキサン:酢酸エチル=
9:1)にかけ下記構造式で示される化合物(以下ALB
204という)7.22g(85%)を得た。その1H-NMR(400MH
z)スペクトルデータは以下のとおりである。 (CDCl3, ppm): 7.06(1H,m,vinyl), 5.74(1H,m,vinyl),
4.71(1H,d,J=7.3Hz,O-CH-O), 4.63(1H,d,J=7.3Hz,O-CH-
O), 4.15(2H,m,CH2), 3.33(3H,s,O-Me), 2.41(1H,m,all
ylic CH), 2.18(1H,m,allylic CH), 1.94(1H,m,cyclic
CH), 1.69-1.10(15H,m,Me*2 and cyclicCH), 0.92(2H,
m,cyclic CH), 0.86(6H,s,Me*2), 0.79(3H,s,Me)
To a solution of 20 g of (ethoxycarbonylmethyl) triphenylphosphonium bromide in 100 ml of DMSO was added 1.68 g (60 wt% in oil) of sodium hydride.
The mixture was heated to 80 ° C. and stirred for 1 hour. 6.9 g of ALB203 was dissolved in 30 ml of DMSO, added to the reaction solution, and stirred for 15 hours while heating to 80 ° C. Ethyl acetate and water were added to the reaction solution to carry out liquid separation. The organic layer was sequentially washed with water and saturated saline, and dried by adding anhydrous sodium sulfate. The aqueous layer was re-extracted with ethyl acetate, and the organic layer was washed with saturated saline and dried over anhydrous sodium sulfate. After drying, filtration, the filtrates were combined, the solvent was distilled off under reduced pressure, and the residue was subjected to silica gel column chromatography (n-hexane: ethyl acetate =
9: 1) (hereinafter referred to as ALB)
7.22 g (85%) were obtained. Part 1 H-NMR (400MH
z) The spectrum data is as follows. (CDCl 3 , ppm): 7.06 (1H, m, vinyl), 5.74 (1H, m, vinyl),
4.71 (1H, d, J = 7.3Hz, O-CH-O), 4.63 (1H, d, J = 7.3Hz, O-CH-
O), 4.15 (2H, m, CH 2 ), 3.33 (3H, s, O-Me), 2.41 (1H, m, all
ylic CH), 2.18 (1H, m, allylic CH), 1.94 (1H, m, cyclic
CH), 1.69-1.10 (15H, m, Me * 2 and cyclicCH), 0.92 (2H,
m, cyclic CH), 0.86 (6H, s, Me * 2), 0.79 (3H, s, Me)

【0018】[0018]

【化4】 Embedded image

【0019】実施例2 ALB−205の合成 6.5gのALB204を酢酸エチル100mlに溶解し、5
%Pd/C約200mgを加えた。反応容器を水素ガス雰囲
気下にし、室温で5日間激しく攪拌した。溶媒を減圧下
留去し、残査をシリカゲルカラムクロマトグラフィ(n-
ヘキサン:酢酸エチル=9:1)にかけ下記構造式で示
される化合物(以下ALB205という)6.11g(94%)
を得た。その1H-NMR(400MHz)スペクトルデータは以下の
とおりである。 (CDCl3,ppm): 4.75(1H,d,J=7.3Hz,O-CH-O), 4.63(1H,d,
J=7.3Hz,O-CH-O), 4.11(2H,m,COOCH2), 3.34(3H,s,O-M
e), 2.29(2H,m,CH2-COO), 1.92(1H,m,cyclic CH), 1.72
-1.09(16H,m,cyclic CH,CH2 chain and COOCH2-CH3),
0.95(2H,m,cyclicCH), 0.86(3H,s,Me), 0.80(3H,s,Me),
0.78(3H,s,Me)
Example 2 Synthesis of ALB-205 6.5 g of ALB204 was dissolved in 100 ml of ethyl acetate, and
About 200 mg of% Pd / C was added. The reaction vessel was placed under a hydrogen gas atmosphere and stirred vigorously at room temperature for 5 days. The solvent was distilled off under reduced pressure, and the residue was subjected to silica gel column chromatography (n-
6.11 g (94%) of a compound represented by the following structural formula (hereinafter referred to as ALB205) by applying hexane: ethyl acetate = 9: 1).
I got The 1 H-NMR (400 MHz) spectrum data is as follows. (CDCl 3 , ppm): 4.75 (1H, d, J = 7.3Hz, O-CH-O), 4.63 (1H, d,
J = 7.3Hz, O-CH-O), 4.11 (2H, m, COOCH 2 ), 3.34 (3H, s, OM
e), 2.29 (2H, m, CH 2 -COO), 1.92 (1H, m, cyclic CH), 1.72
-1.09 (16H, m, cyclic CH, CH 2 chain and COOCH 2 -CH 3 ),
0.95 (2H, m, cyclicCH), 0.86 (3H, s, Me), 0.80 (3H, s, Me),
0.78 (3H, s, Me)

【0020】[0020]

【化5】 Embedded image

【0021】実施例3 ALB−211の合成 ALB204の0.6gを2N水酸化ナトリウム水溶液/エタ
ノール=1/2の混合液30mlに溶解し、室温で15時
間攪拌した。反応溶液にクロロホルムを加えて希釈し、
2N-塩酸水溶液を加えて酸性とした後、分液し、有機層
を無水硫酸ナトリウムで乾燥した。乾燥後濾過しろ液を
濃縮し、シリカゲルカラムクロマトグラフィー(n-ヘキ
サン:酢酸エチル=7:3)にかけ、8位にメチル基、
メトキシメチルオキシ基、9位に3-カルボキシ-2-プロ
ペニル基を有し下記構造式で示されるヒドロナフタレン
Fr. A(化56、以下ALB211-Aという)とFr. B(化5
7、以下ALB211-Bという)を得た。その1H-NMR(400MH
z)スペクトルデータは以下のとおりであり、RfはAL
B211-Aが0.20(シリカゲル薄層クロマトグラフィ
ー、n-ヘキサン:酢酸エチル=8:2)、ALB211-Bが
0.19(同上)である。 ALB211-A (DMSO-d6,ppm): 6.25(1H,m,vinyl), 5.55(1H,d,J=11.7H
z,vinyl), 4.63(1H,d,J=7.3Hz,O-CH-O), 4.58(1H,d,J=
7.3Hz,O-CH-O), 3.20(3H,s,O-Me), 2.97(1H,m,allylic
CH), 2.50(1H,m,allylic CH), 1.88(1H,m,cyclic CH),
1.57-1.13(9H,m,cyclic CH), 1.13(3H,s,Me), 0.94(2H,
m,cyclic CH), 0.85(3H,s,Me), 0.83(3H,s,Me), 0.77(3
H,s,Me) ALB211-B (DMSO-d6,ppm): 6.85(1H,m,vinyl), 5.68(1H,d,J=15.6H
z,vinyl), 4.65(1H,d,J=7.3Hz,O-CH-O), 4.57(1H,d,J=
7.3Hz,O-CH-O), 3.22(3H,s,O-Me), 2.32(1H,m,allylic
CH), 2.16(1H,m,allylic CH), 1.88(1H,m,cyclic CH),
1.57-1.13(9H,m,cyclic CH), 1.13(3H,s,Me), 0.94(2H,
m,cyclic CH), 0.85(3H,s,Me), 0.82(3H,s,Me), 0.77(3
H,s,Me)
Example 3 Synthesis of ALB-211 0.6 g of ALB204 was dissolved in 30 ml of a mixture of 2N aqueous sodium hydroxide / ethanol = 1/2 and stirred at room temperature for 15 hours. Dilute the reaction solution by adding chloroform.
After adding 2N-hydrochloric acid aqueous solution to make it acidic, the layers were separated, and the organic layer was dried over anhydrous sodium sulfate. After drying, filtration and concentration of the filtrate, the residue was subjected to silica gel column chromatography (n-hexane: ethyl acetate = 7: 3) to give a methyl group at the 8-position.
A hydronaphthalene Fr. A (Chem. 56, hereinafter referred to as ALB211-A) having a methoxymethyloxy group and a 3-carboxy-2-propenyl group at the 9-position and represented by the following structural formula:
7, ALB211-B). Part 1 H-NMR (400MH
z) The spectrum data is as follows, and Rf is AL
B211-A is 0.20 (silica gel thin layer chromatography, n-hexane: ethyl acetate = 8: 2), and ALB211-B is 0.19 (same as above). ALB211-A (DMSO-d6, ppm): 6.25 (1H, m, vinyl), 5.55 (1H, d, J = 11.7H
z, vinyl), 4.63 (1H, d, J = 7.3Hz, O-CH-O), 4.58 (1H, d, J =
7.3Hz, O-CH-O), 3.20 (3H, s, O-Me), 2.97 (1H, m, allylic
CH), 2.50 (1H, m, allylic CH), 1.88 (1H, m, cyclic CH),
1.57-1.13 (9H, m, cyclic CH), 1.13 (3H, s, Me), 0.94 (2H,
m, cyclic CH), 0.85 (3H, s, Me), 0.83 (3H, s, Me), 0.77 (3
(H, s, Me) ALB211-B (DMSO-d6, ppm): 6.85 (1H, m, vinyl), 5.68 (1H, d, J = 15.6H
z, vinyl), 4.65 (1H, d, J = 7.3Hz, O-CH-O), 4.57 (1H, d, J =
7.3Hz, O-CH-O), 3.22 (3H, s, O-Me), 2.32 (1H, m, allylic
CH), 2.16 (1H, m, allylic CH), 1.88 (1H, m, cyclic CH),
1.57-1.13 (9H, m, cyclic CH), 1.13 (3H, s, Me), 0.94 (2H,
m, cyclic CH), 0.85 (3H, s, Me), 0.82 (3H, s, Me), 0.77 (3
(H, s, Me)

【0022】[0022]

【化6】 Embedded image

【0023】[0023]

【化7】 Embedded image

【0024】実施例4 ALB−212の合成 ALB204を加水分解して得たALB211(A,B混合物)
をTHF5mlに溶解し、80%酢酸水溶液20mlと2N
塩酸400μlを加え、室温で5日間攪拌した。減圧
下、溶媒を留去した後、シリカゲルカラムクロマトグラ
フィ(n-ヘキサン:酢酸エチル=8:2〜6:4)にか
け、8位にメチル基、ヒドロキシ基、9位に3-カルボキ
シ-2-プロペニル基を有するヒドロナフタレン(以下AL
B212という)192mgを白色結晶で得た。その1H-NMR(4
00MHz)スペクトルデータは以下のとおりであり、Rfは
0.50(シリカゲル薄層クロマトグラフィー、n-ヘキサ
ン:酢酸エチル=6:4)である。 (DMSO-d6): 6.91(1H,m,vinyl), 5.68(1H,d,J=15.1Hz,vi
nyl), 4.08(1H,br,OH),2.38(1H,m,allylic CH), 2.11(1
H,m,allylic CH), 1.72(1H,m,cyclic CH), 1.6-1.05(9
H,m,cyclic CH), 1.0(3H,s,Me), 0.85(2H,m,cyclic C
H), 0.84(3H,s,Me), 0.78(3H,s,Me), 0.76(3H,s,Me)
Example 4 Synthesis of ALB-212 ALB211 obtained by hydrolyzing ALB204 (mixture of A and B)
Was dissolved in 5 ml of THF, 20 ml of an 80% aqueous acetic acid solution and 2N
400 μl of hydrochloric acid was added, and the mixture was stirred at room temperature for 5 days. After evaporating the solvent under reduced pressure, the residue was subjected to silica gel column chromatography (n-hexane: ethyl acetate = 8: 2 to 6: 4) to give a methyl group and a hydroxy group at the 8-position and 3-carboxy-2-propenyl at the 9-position. Hydronaphthalene having a group (hereinafter referred to as AL
192 mg were obtained as white crystals. Its 1 H-NMR (4
(00 MHz) The spectral data are as follows, and Rf is 0.50 (silica gel thin layer chromatography, n-hexane: ethyl acetate = 6: 4). (DMSO-d6): 6.91 (1H, m, vinyl), 5.68 (1H, d, J = 15.1Hz, vi
nyl), 4.08 (1H, br, OH), 2.38 (1H, m, allylic CH), 2.11 (1
H, m, allylic CH), 1.72 (1H, m, cyclic CH), 1.6-1.05 (9
H, m, cyclic CH), 1.0 (3H, s, Me), 0.85 (2H, m, cyclic C
H), 0.84 (3H, s, Me), 0.78 (3H, s, Me), 0.76 (3H, s, Me)

【0025】実施例5 ALB−213の合成 ALB205の1.2gを2N水酸化ナトリウム水溶液/エタ
ノール=1/2の混合液30mlに溶解し、室温で15時
間攪拌した。反応溶液にクロロホルムを加えて希釈し、
2N塩酸を加えて酸性とした後、分液し、有機層を無水
硫酸ナトリウムで乾燥した。乾燥後濾過しろ液を濃縮
し、シリカゲルカラムクロマトグラフィ(n-ヘキサン:
酢酸エチル=7:3)にかけ、8位にメチル基、メトキ
シメチルオキシ基、9位に3-カルボキシプロピル基を有
するヒドロナフタレン(以下ALB213という)970mg
(88%)を得た。その1H-NMR(400MHz)スペクトルデータ
は以下のとおりであり、Rfは0.21(シリカゲル薄層
クロマトグラフィー、n-ヘキサン:酢酸エチル=8:
2)である。 (DMSO-d6): 4.68(1H,d,J=7.3Hz,O-CH-O), 4.54(1H,d,J=
7.3Hz,O-CH-O), 3.22(3H,s,O-Me), 2.15(2H,m,CH2COO),
1.88(1H,m,cyclic CH), 1.65-1.1(13H,m,cyclic CH),
1.10(3H,s,Me), 0.9(2H,m,cyclic CH), 0.84(3H,s,Me),
0.77(3H,s,Me),0.76(3H,s,Me)
Example 5 Synthesis of ALB-213 1.2 g of ALB205 was dissolved in 30 ml of a mixture of 2N aqueous sodium hydroxide / ethanol = 1/2 and stirred at room temperature for 15 hours. Dilute the reaction solution by adding chloroform.
After acidification with 2N hydrochloric acid, the layers were separated, and the organic layer was dried over anhydrous sodium sulfate. After drying, filtration and concentration of the filtrate were performed, and silica gel column chromatography (n-hexane:
Ethyl acetate = 7: 3), 970 mg of hydronaphthalene (hereinafter ALB213) having a methyl group, a methoxymethyloxy group at the 8-position and a 3-carboxypropyl group at the 9-position
(88%). Its 1 H-NMR (400 MHz) spectrum data is as follows, and Rf was 0.21 (silica gel thin layer chromatography, n-hexane: ethyl acetate = 8:
2). (DMSO-d6): 4.68 (1H, d, J = 7.3Hz, O-CH-O), 4.54 (1H, d, J =
7.3Hz, O-CH-O) , 3.22 (3H, s, O-Me), 2.15 (2H, m, CH 2 COO),
1.88 (1H, m, cyclic CH), 1.65-1.1 (13H, m, cyclic CH),
1.10 (3H, s, Me), 0.9 (2H, m, cyclic CH), 0.84 (3H, s, Me),
0.77 (3H, s, Me), 0.76 (3H, s, Me)

【0026】実施例6 ALB−214の合成 ALB213の779mgをTHF5mlに溶解し、80%酢
酸水溶液20mlと2N塩酸400μlを加え、室温で5日
間攪拌した。減圧下、溶媒を留去した後、シリカゲルカ
ラムクロマトグラフィー(n-ヘキサン:酢酸エチル=
8:2〜6:4)にかけ、8位にメチル基、ヒドロキシ
基、9位に3-カルボキシプロピル基を有するヒドロナフ
タレン(以下ALB214という)を白色結晶で得た。その1
H-NMR(400MHz)スペクトルデータは以下のとおりであ
り、Rfは0.50(シリカゲル薄層クロマトグラフィ、n
-ヘキサン:酢酸エチル=6:4)である。 (DMSO, ppm): 2.24-2.06(2H,m,CH2-COO), 1.74-1.52(6
H,m,CH), 1.39-1.07(7H,m,CH), 0.97(3H,s,Me), 0.95-
0.7(3H,m,cyclic CH), 0.84(3H,s,Me), 0.75(3H,s,Me)
0.72(3H,s,Me)
Example 6 Synthesis of ALB-214 779 mg of ALB213 was dissolved in 5 ml of THF, 20 ml of an 80% acetic acid aqueous solution and 400 μl of 2N hydrochloric acid were added, and the mixture was stirred at room temperature for 5 days. After evaporating the solvent under reduced pressure, silica gel column chromatography (n-hexane: ethyl acetate =
8: 2 to 6: 4) to give hydronaphthalene (hereinafter ALB214) having a methyl group, a hydroxy group at the 8-position and a 3-carboxypropyl group at the 9-position as white crystals. Part 1
H-NMR (400 MHz) spectrum data is as follows, and Rf was 0.50 (silica gel thin layer chromatography, n
-Hexane: ethyl acetate = 6: 4). (DMSO, ppm): 2.24-2.06 ( 2H, m, CH 2 -COO), 1.74-1.52 (6
H, m, CH), 1.39-1.07 (7H, m, CH), 0.97 (3H, s, Me), 0.95-
0.7 (3H, m, cyclic CH), 0.84 (3H, s, Me), 0.75 (3H, s, Me)
0.72 (3H, s, Me)

【0027】実施例7 ALB−344、345の合成 ALB344 250mg(0.739mmol)のALB211を窒素雰囲気下で5ml
のテトラヒドロフランに溶解し、−20℃まで冷却し
た。これにトリエチルアミン0.11ml(0.789mmol)およ
び塩化ピバロイル0.1ml(0.812mmol)を加え、−20℃
で1時間攪拌した。その後1-(3-アミノプロピル)イミ
ダゾール0.1ml(0.838mmol)を加え、室温まで昇温しな
がら一晩攪拌した。この反応液にクロロホルムを加え、
飽和炭酸水素ナトリウム水溶液で3回、飽和食塩水で1
回洗浄した後、クロロホルム層を無水硫酸ナトリウムで
乾燥させ、減圧下溶媒を留去した。得られた残渣174
mgを5mlのメタノールに溶解し、5%パラジウム/活性
炭を触媒量加え、水素雰囲気下室温で一晩攪拌した。こ
の反応液をセライトを用いてろ過し、ろ液を減圧下溶媒
を留去した。得られた残渣をシリカゲルカラムクロマト
グラフィー(50ml,2%〜4%メタノール/クロロホ
ルムで溶出)で精製し、下記構造式で示される化合物
(以下ALB344という)を油状物質として得た(14
9mg,収率52%)。1 H−NMR(400MHz,CDCl3) δppm:7.49(1H,s), 7.06(1H,s), 6.94(1H,s), 5.60(1
H,brs), 4.00(2H,t,J=6.8Hz), 3.28(2H,q,J=6.8Hz), 2.
18-0.73(19H,m), 1.56(3H,s), 0.92(3H,s), 0.88(3H,
s), 0.82(3H,s).
Example 7 Synthesis of ALB-344, 345 ALB344 250 mg (0.739 mmol) of ALB211 was added under nitrogen atmosphere in 5 ml.
Was dissolved in tetrahydrofuran and cooled to -20 ° C. To this were added 0.11 ml (0.789 mmol) of triethylamine and 0.1 ml (0.812 mmol) of pivaloyl chloride, and the mixture was added at -20 ° C.
For 1 hour. Thereafter, 0.1 ml (0.838 mmol) of 1- (3-aminopropyl) imidazole was added, and the mixture was stirred overnight while warming to room temperature. Chloroform was added to the reaction solution,
3 times with a saturated aqueous solution of sodium bicarbonate and 1 with a saturated saline solution
After washing twice, the chloroform layer was dried over anhydrous sodium sulfate, and the solvent was distilled off under reduced pressure. The obtained residue 174
mg was dissolved in 5 ml of methanol, a catalytic amount of 5% palladium / activated carbon was added, and the mixture was stirred overnight at room temperature under a hydrogen atmosphere. The reaction solution was filtered using celite, and the filtrate was evaporated under reduced pressure to remove the solvent. The obtained residue was purified by silica gel column chromatography (50 ml, eluted with 2% to 4% methanol / chloroform) to obtain a compound represented by the following structural formula (hereinafter referred to as ALB344) as an oil (14).
9 mg, yield 52%). 1 H-NMR (400 MHz, CDCl 3 ) δ ppm: 7.49 (1 H, s), 7.06 (1 H, s), 6.94 (1 H, s), 5.60 (1
H, brs), 4.00 (2H, t, J = 6.8Hz), 3.28 (2H, q, J = 6.8Hz), 2.
18-0.73 (19H, m), 1.56 (3H, s), 0.92 (3H, s), 0.88 (3H,
s), 0.82 (3H, s).

【0028】[0028]

【化8】 Embedded image

【0029】ALB345 250mg(0.739mmol)のALB211および0.12ml
(0.821mmol)の4-(3-アミノプロピル)モルホリンを用い
てALB344と同様の操作を行い、得られた残渣をシリ
カゲルカラムクロマトグラフィー(50ml,2%〜4%
メタノール/クロロホルムで溶出)で精製し、下記構造
式で示される化合物(以下ALB345という)を油状物
質として得た(164mg,収率55%)。1 H−NMR(400MHz,CDCl3) δppm:6.77(1H,brs), 3.72(4H,t,J=4.4Hz), 3.35(2H,
q,J=6.4Hz), 2.47-2.44(6H,m), 2.18-0.73(19H,m),1.56
(3H,s), 0.93(3H,s), 0.88(3H,s), 0.82(3H,s).
ALB 345 250 mg (0.739 mmol) of ALB 211 and 0.12 ml
(0.821 mmol) of 4- (3-aminopropyl) morpholine was used to carry out the same operation as ALB344, and the obtained residue was subjected to silica gel column chromatography (50 ml, 2% to 4%).
Purification by elution with methanol / chloroform) gave a compound represented by the following structural formula (hereinafter referred to as ALB345) as an oil (164 mg, 55% yield). 1 H-NMR (400 MHz, CDCl 3 ) δ ppm: 6.77 (1H, brs), 3.72 (4H, t, J = 4.4 Hz), 3.35 (2H,
q, J = 6.4Hz), 2.47-2.44 (6H, m), 2.18-0.73 (19H, m), 1.56
(3H, s), 0.93 (3H, s), 0.88 (3H, s), 0.82 (3H, s).

【0030】[0030]

【化9】 Embedded image

【0031】○ 化合物の特性測定 各実施例で調製された各化合物の抗真菌活性及び感染治
療試験の結果を表1、表2に示す。
測定 Measurement of compound properties Tables 1 and 2 show the results of the antifungal activity and the infection treatment test of each compound prepared in each Example.

【0032】[0032]

【表1】 [Table 1]

【0033】[0033]

【表2】 [Table 2]

【0034】[0034]

【発明の効果】以上の結果から、本発明の化合物は抗真
菌剤として、あるいは抗真菌剤製造のための原料として
有効な新規な化合物であることが示される。
The above results show that the compound of the present invention is a novel compound effective as an antifungal agent or as a raw material for producing an antifungal agent.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 小池 信明 茨城県つくば市大久保2番 東亞合成株式 会社つくば研究所内 (72)発明者 瀬川 俊章 茨城県つくば市大久保2番 東亞合成株式 会社つくば研究所内 (72)発明者 野副 重男 宮城県仙台市太白区八木山本町一丁目10番 4号 Fターム(参考) 4H006 AA01 AB03 AB84 BJ30 BV42 FC32 FC74  ──────────────────────────────────────────────────の Continuing on the front page (72) Nobuaki Koike, No. 2 Okubo, Tsukuba, Ibaraki Prefecture, Toagosei Co., Ltd. (72) Inventor Toshiaki Segawa No. 2, Okubo, Tsukuba, Ibaraki Prefecture, Tokusei Co., Ltd. 72) Inventor Shigeo Nozoe 1-10-4 Yagiyama Honcho, Taihaku-ku, Sendai City, Miyagi Prefecture F-term (reference) 4H006 AA01 AB03 AB84 BJ30 BV42 FC32 FC74

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 下記構造式で示されるヒドロナフタレン
誘導体およびそのアミド化合物。 【化1】 ただし、式中XとYは低級アルキル基と置換基または保
護基を有していてもよい水酸基であり、R1は不飽和結
合を有していても良い低級アルキレン基、R2は水素原
子、低級アルキル基または保護基であり、8位と9位の
間は2重結合でも良く、2重結合の場合は8位の置換基
はXまたはYの1個のみである。
1. A hydronaphthalene derivative represented by the following structural formula and an amide compound thereof. Embedded image Wherein X and Y are a lower alkyl group and a hydroxyl group which may have a substituent or a protecting group, R 1 is a lower alkylene group which may have an unsaturated bond, and R 2 is a hydrogen atom , A lower alkyl group or a protecting group, and a double bond may be provided between the 8-position and the 9-position. In the case of a double bond, the substituent at the 8-position is only one X or Y.
JP11218926A 1999-08-02 1999-08-02 Hydronaphthalene derivative and its amide compound Pending JP2001048841A (en)

Priority Applications (1)

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Country Status (1)

Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109810017A (en) * 2019-02-28 2019-05-28 上海师范大学 Alepterolic acid derivative and its preparation method and application

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109810017A (en) * 2019-02-28 2019-05-28 上海师范大学 Alepterolic acid derivative and its preparation method and application
CN109810017B (en) * 2019-02-28 2021-10-22 上海师范大学 Amazonia sparsa acid derivative and preparation method and application thereof

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