JP2001033557A - Ionization box with tension structure - Google Patents

Ionization box with tension structure

Info

Publication number
JP2001033557A
JP2001033557A JP23446399A JP23446399A JP2001033557A JP 2001033557 A JP2001033557 A JP 2001033557A JP 23446399 A JP23446399 A JP 23446399A JP 23446399 A JP23446399 A JP 23446399A JP 2001033557 A JP2001033557 A JP 2001033557A
Authority
JP
Japan
Prior art keywords
electrode
electrode film
tension
ring
mounting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23446399A
Other languages
Japanese (ja)
Inventor
Nobumasa Fujikawa
信正 藤川
Yoshitaka Yamazaki
義孝 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitec Co Ltd
Original Assignee
Fujitec Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitec Co Ltd filed Critical Fujitec Co Ltd
Priority to JP23446399A priority Critical patent/JP2001033557A/en
Publication of JP2001033557A publication Critical patent/JP2001033557A/en
Pending legal-status Critical Current

Links

Landscapes

  • Measurement Of Radiation (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

PROBLEM TO BE SOLVED: To miniaturize and stabilize an ionization space capacity, improve the position measurement of radiation beams, and perform accurate measurement by providing a step or a groove on a mounting surface for mounting an electrode film. SOLUTION: A step for applying tension to an electrode film 1 is provided between an electrode latch surface 6 and a mounting surface for mounting the electrode film 1, and the electrode film 1 is pinched and fixed by a space ring 3 by a mounting ring 2. A tension ring 4 that presses the electrode film 1 from the above to the electrode latch surface 6 and has a push-out projection for applying tension to the electrode film 1 is fixed to the recessed part of the space ring 3, or a groove may be provided instead of the step. With the configuration, specific, designed tension can be applied to the electrode film 1 and an ionization layer space that is stable for a long time can be maintained. Further, by providing the step within a range for preventing the ionization film 1 from causing permanent distortion, the same tension can be applied to the ionization film 1 even in the case of repeated reassembly.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【産業上の利用分野】 本発明は、放射線計測におけ
る、電離箱の構造に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure of an ionization chamber in radiation measurement.

【従来の技術】 電離箱に電極膜を張る際には、
電極膜として使用される範囲より大きめの電極膜を作
り、電極膜の外周に、均等に張力を掛けて、その状態で
電離箱に張り付ける。張り付ける方法は電離箱と取り付
リングで挟み込み、固定する方法である。
2. Description of the Related Art When an electrode film is put on an ionization chamber,
An electrode film that is larger than the range used as the electrode film is made, and tension is evenly applied to the outer periphery of the electrode film, and then attached to the ionization chamber in that state. The sticking method is a method of sandwiching and fixing between an ionization chamber and a mounting ring.

【発明が解決しようとする課題】 電離箱による放射
線ビーム位置、線量の測定は接続する回路系の改良によ
り、電離空間の微少化、電離空間容量の変動の最小化が
必要であり、この点、従来の構造であると、電極膜の張
力の設定が難しく、長期にわたる使用中には電極膜が弛
んだり、電極間隔が変化したり電離空間容量の変化が起
こった。 また電極膜を外した後での、再組立では、再
び外部からの張力を掛けて組み立てる必要があった。
Problems to be Solved by the Invention The measurement of the radiation beam position and the dose by the ionization chamber requires miniaturization of the ionization space and minimization of the fluctuation of the ionization space capacity by improving the connected circuit system. In the case of the conventional structure, it is difficult to set the tension of the electrode film, and during long-term use, the electrode film is loosened, the distance between the electrodes is changed, and the ionization space capacity is changed. In reassembly after removing the electrode film, it was necessary to assemble again by applying an external tension.

【課題を解決する為の手段】 電離空間を構成する電
極膜面を正確に設定するための電極止め面と電極膜
を取り付ける取付面と間に、電極膜に対し張力を掛
けさせる段差を設けるべく作られたスペースリングに
平面状の電極膜を取り付リングで挟み固定する、そ
の上から電極膜を電極止め面に押し当てて電極膜
に張力を与える押し出し突起を持ったテンションリング
を、スペースリングの凹状に合わせて固定する構造、
あるいは、段差の代わりに溝を、テンションリングの代
わりにオーリングで構成することもできる。電離膜に
ついては取り付リングを基盤とし、一体化構造とす
ることにより極力薄くすることができる。これらの特徴
を合わせもたせることにより課題を解決する。
Means for Solving the Problems In order to provide a step for applying tension to the electrode film, between an electrode stopping surface for accurately setting an electrode film surface constituting an ionization space and a mounting surface for mounting the electrode film. Place the flat electrode film on the created space ring with the mounting ring and fix it in place.From above, press the electrode film against the electrode stop surface and apply a tension ring with an extrusion protrusion that gives tension to the electrode film, the space ring Structure to be fixed according to the concave shape of
Alternatively, the groove may be formed by the O-ring instead of the step ring, instead of the step. The ionization film can be made as thin as possible by using an attachment ring as a base and forming an integrated structure. The problem is solved by combining these features.

【作用】 電極止め面を持った電極膜支持体に張ら
れ固定された電極膜に円筒状の押し出し突起を持ったテ
ンションリングまたはスペーイスリングを電極止め面ま
で差込ことで、設計された所定の張力を電極膜に与える
ことができ、長期に安定な電離層空間を維持することが
できる。更に電離膜が永久歪みを起こさない範囲に段差
を設けておけば、何回かの組立直し時でも、同じ張力を
電離膜に掛けることができる。一体構造電極は張力を掛
けながら電極間隔を非常に狭くでき、更に電極膜方向の
組立位置精度も上げることができ、放射線ビームの位置
分解度を向上させることができる。
[Action] A predetermined ring designed by inserting a tension ring or a space ring having a cylindrical extrusion protrusion into an electrode membrane fixed to an electrode membrane support having an electrode stop surface up to the electrode stop surface. Can be applied to the electrode film, and a stable ionospheric space can be maintained for a long period of time. Further, if a step is provided in a range where the ionized film does not cause permanent distortion, the same tension can be applied to the ionized film even during several reassembly. The electrode having a monolithic structure can make the interval between the electrodes extremely small while applying tension, can also increase the assembly position accuracy in the direction of the electrode film, and can improve the position resolution of the radiation beam.

【実施例】 実施例について、図面を参照して説明す
る。第1図は実施例を示し電極膜、取り付リング、
スペースリング、テンションリング、電極止め面
、と取付面、その他内部シールド、カバー、取り付
ベースで構成する。スペースリングに電極膜を中心
を合わせておき、取り付リングで固定する。固定され
た電極膜の上からテンションリングを電極止め面
まで押し込み、電極膜を所定の張力で張るようにす
る。第2図は電極膜と基盤とを一体化させた一体構
造電極の実施例を示し、電極膜と基盤で構成する。
電極膜の外周に基盤を張り付け一体化し一体構造電極と
する。一体構造電極は取り付リングと電極膜に代わ
りに使用する。
Embodiment An embodiment will be described with reference to the drawings. FIG. 1 shows an embodiment, in which an electrode film, a mounting ring,
Consists of a space ring, tension ring, electrode stop surface, mounting surface, other internal shield, cover, and mounting base. The electrode film is centered on the space ring and fixed with the mounting ring. The tension ring is pushed from above the fixed electrode film to the electrode stop surface, and the electrode film is stretched with a predetermined tension. FIG. 2 shows an embodiment of an electrode having an integral structure in which the electrode film and the substrate are integrated, and is composed of the electrode film and the substrate.
A base is attached to the outer periphery of the electrode film to form an integrated electrode. The monolithic electrode is used instead of the mounting ring and the electrode membrane.

【発明の効果】 本発明は、上述のとおり構成さ
れているので、電離空間容量の微細化と安定化に効果が
あり、放射線ビームの位置測定の分解能を上げ、線量測
定の変動を微少にし、正確な測定が期待できる。
Since the present invention is configured as described above, it is effective in miniaturizing and stabilizing the ionization space capacity, increasing the resolution of the position measurement of the radiation beam, minimizing the fluctuation of the dose measurement, Exact measurement can be expected.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 請求項1、を実現するための、断面図であ
る。
FIG. 1 is a cross-sectional view for realizing claim 1;

【図2】 請求項2、を実現するための、展開図と断面
図である。
FIG. 2 is a development view and a cross-sectional view for realizing claim 2;

【符号の説明】[Explanation of symbols]

】 電極膜 取り付リング スペースリング テンションリング 基盤 電極止め面 取付面 ] Electrode membrane Mounting ring Space ring Tension ring Base Electrode retaining surface Mounting surface

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 放射線計測用電離箱において、内外部の
気圧差による力や電極相互の引力、反力に抗し電極を平
行に保つ方法として、電極膜を取り付ける取付面と
取付面に対し段差のある電極止め面を持った電極膜支
持体に張られ固定された電極膜に対し、段差にそって円
筒状の押し出し突起を持ったテンションリングまたは
スペーイスリングを電極止め面まで差込で固定し、所
定の張力を電極膜に与える構造あるいは、段差の代わり
に溝に差込む構造を持った、張り構造付き電離箱
In an ionization chamber for radiation measurement, as a method for keeping electrodes parallel to each other against a force due to a pressure difference between the inside and the outside, an attractive force between electrodes, and a reaction force, a step for mounting an electrode film and a step relative to the mounting surface are provided. For an electrode membrane stretched and fixed on an electrode membrane support with an electrode stop surface with a hole, a tension ring or space ring with a cylindrical extrusion protrusion is inserted along the step and fixed to the electrode stop surface An ionization chamber with a tension structure that has a structure that applies a predetermined tension to the electrode membrane or a structure that inserts into the groove instead of a step
【請求項2】 放射線計測用電離箱のおいて、電極膜
の取り付けにあたり、電極膜の外周に堅い基盤を設
け、電極膜と一体構造とした一体構造電極と、スペーイ
スリングとテンションリング等により構成された、
張り構造付き電離箱
2. In the ionization chamber for radiation measurement, when mounting the electrode film, a rigid base is provided on the outer periphery of the electrode film, and an integrated electrode integrally formed with the electrode film, a space ring and a tension ring, etc. Composed,
Ionization chamber with tension structure
JP23446399A 1999-07-19 1999-07-19 Ionization box with tension structure Pending JP2001033557A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23446399A JP2001033557A (en) 1999-07-19 1999-07-19 Ionization box with tension structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23446399A JP2001033557A (en) 1999-07-19 1999-07-19 Ionization box with tension structure

Publications (1)

Publication Number Publication Date
JP2001033557A true JP2001033557A (en) 2001-02-09

Family

ID=16971408

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23446399A Pending JP2001033557A (en) 1999-07-19 1999-07-19 Ionization box with tension structure

Country Status (1)

Country Link
JP (1) JP2001033557A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007033290A (en) * 2005-07-28 2007-02-08 Kyocera Corp Ceramic frame for fixing metal wire rod

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007033290A (en) * 2005-07-28 2007-02-08 Kyocera Corp Ceramic frame for fixing metal wire rod
JP4638294B2 (en) * 2005-07-28 2011-02-23 京セラ株式会社 Ceramic frame for fixing metal wires

Similar Documents

Publication Publication Date Title
US5490220A (en) Solid state condenser and microphone devices
US6738484B2 (en) Pressure responsive device and method of manufacturing semiconductor substrate for use in pressure responsive device
FR2375665A1 (en) ELECTRONIC BEAM LITHOGRAPHY PROCESS
GB2112605A (en) A capacitive transducer
JP2001033557A (en) Ionization box with tension structure
JP2005027182A (en) Electret condenser microphone
EP3594675B1 (en) Mass spectrometry device and mass spectrometry method
JP2900235B2 (en) Capacitive pressure sensor
JPH10162688A (en) Depressing operation device
JPH10170381A (en) Pressure detector
KR930017078A (en) Mechanically Stable Radiant Gun Assembly
JPH07174654A (en) Pressure sensor
JP2952617B2 (en) Condenser microphone and method of manufacturing the same
US4215249A (en) Method and device for controlling wrinkles in a vibratile diaphragm
JP2593571Y2 (en) Liquid-filled magnetic compass
KR100235304B1 (en) Manufacturing method of spacer for fed
JPS6239447Y2 (en)
JP2008131160A (en) Electret condenser microphone unit and electret condenser microphone
US4401858A (en) Method for controlling wrinkles in a vibratile diaphragm
JP2001292497A (en) Microphone
JP2004320108A (en) Capacitor microphone
JPH0219812A (en) Optical element holder
JP2001050843A (en) Capacitance-type pressure sensor
KR0125418Y1 (en) An apparatus for coupling dust cap of speaker
JP2003035614A (en) Pressure-sensitive sensor and method for manufacturing the same