JP2001026429A - System for supplying feedstock gas for quartz glass - Google Patents
System for supplying feedstock gas for quartz glassInfo
- Publication number
- JP2001026429A JP2001026429A JP19911099A JP19911099A JP2001026429A JP 2001026429 A JP2001026429 A JP 2001026429A JP 19911099 A JP19911099 A JP 19911099A JP 19911099 A JP19911099 A JP 19911099A JP 2001026429 A JP2001026429 A JP 2001026429A
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- raw material
- material gas
- gas
- filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/81—Constructional details of the feed line, e.g. heating, insulation, material, manifolds, filters
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Melting And Manufacturing (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、石英ガラスを気相
合成する際に用いられ、石英ガラスの原料ガスを石英ガ
ラス合成装置へ供給する系に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a system for supplying a raw material gas for quartz glass to a quartz glass synthesizing apparatus, which is used in the vapor phase synthesis of quartz glass.
【０００２】[0002]
【従来の技術】テトラクロロシランやテトラクロロゲル
マニウムを酸水素火炎中に供給して加水分解させ、生成
したガラス微粒子を出発部材上に堆積させたり種結晶に
成長させることによって、光ファイバの原材である石英
多孔質ガラス母材や、半導体フォトマスクの原材である
合成石英が製造されている。2. Description of the Related Art Tetrachlorosilane and tetrachlorogermanium are supplied to an oxyhydrogen flame to be hydrolyzed, and the resulting glass fine particles are deposited on a starting member or grown into a seed crystal to produce a raw material for an optical fiber. Some quartz porous glass preforms and synthetic quartz as a raw material for semiconductor photomasks are manufactured.
【０００３】テトラクロロシラン等の石英ガラス原料液
は気化装置でガス化される。この原料ガスは、マスフロ
ーコントローラー（流量制御装置）により流量が制御さ
れつつ、石英ガラス合成装置である酸水素火炎バーナへ
供給されている。流量制御装置内のガス流路途中に有す
る細管や流量制御弁の原料ガス通過部位は細く狭いた
め、原料ガスと水分との反応で生じたゲル状物質や原料
ガスに混在している不純微粒子の不純異物による目詰ま
りを起しやすい。目詰まりを起すと、原料ガスの適切な
流量制御ができなくなり、原料ガスの流量変動を起して
しまう。その結果、酸水素火炎中でガラス微粒子が均質
に生成されず、ガラス微粒子の堆積密度が不均一とな
る。さらに不純異物が石英ガラス合成装置へ達すると、
ガラス微粒子の純度が低下したり、得られた多孔質ガラ
ス母剤を焼結して透明ガラス化させたときにガラス中に
気泡が発生してしまう。[0003] A quartz glass raw material liquid such as tetrachlorosilane is gasified by a vaporizer. This raw material gas is supplied to an oxyhydrogen flame burner, which is a quartz glass synthesizer, while controlling the flow rate by a mass flow controller (flow rate control device). Since the raw gas passage of the thin tube and flow control valve in the gas flow path in the flow control device is narrow and narrow, the gel-like substance generated by the reaction between the raw material gas and moisture and the impurity fine particles mixed in the raw material gas are removed. It is easy to cause clogging due to impurities. If the clogging occurs, it becomes impossible to appropriately control the flow rate of the source gas, and the flow rate of the source gas fluctuates. As a result, the glass particles are not uniformly generated in the oxyhydrogen flame, and the deposition density of the glass particles becomes non-uniform. When further impurities reach the quartz glass synthesis device,
The purity of the glass fine particles is reduced, or bubbles are generated in the glass when the obtained porous glass base material is sintered to be transparent vitrified.
【０００４】目詰まりを起した構成部品は度々交換しな
ければならない。交換の際に原料ガスが外気の水分と接
触するとゲル状物質や腐食性ガスを生成し新たな目詰ま
りの原因となるので、ガス流路を原料ガスに完全に置換
する必要があり、操作が煩雑で、生産性が低かった。[0004] Clogged components must be replaced frequently. If the source gas comes into contact with the moisture of the outside air at the time of replacement, a gel-like substance or corrosive gas is generated, causing new clogging.Therefore, it is necessary to completely replace the gas flow path with the source gas. It was complicated and the productivity was low.
【０００５】[0005]
【発明が解決しようとする課題】本発明は前記の課題を
解決するためなされたもので、目詰まりを起すことな
く、高純度な石英ガラスの原料ガスを、長期間安定して
石英ガラス合成装置へ供給するための系を提供すること
を目的とする。DISCLOSURE OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and a quartz glass synthesizing apparatus capable of stably supplying a high-purity quartz glass raw material gas for a long period of time without causing clogging. The purpose is to provide a system for supplying to the
【０００６】[0006]
【課題を解決するための手段】前記の目的を達成するた
めになされた本発明の石英ガラスの原料ガス供給系は、
実施例に対応する図面を参照して説明すると以下のとお
りである。Means for Solving the Problems The raw material gas supply system for quartz glass of the present invention, which has been made to achieve the above object, comprises:
The following is a description with reference to the drawings corresponding to the embodiments.
【０００７】石英ガラスの原料ガス供給系は、図１に示
すとおり、気相合成される石英ガラスの原料ガスの供給
源から石英ガラス合成装置４への原料ガスの供給経路１
途中に、供給経路１の原料ガス通過断面積より小さな透
過孔を有する不純異物除去フィルタ２と、原料ガス流量
制御装置３とが配置されている。As shown in FIG. 1, the raw material gas supply system for the raw material gas for quartz glass is supplied from a raw material gas supply source for the raw material gas to be synthesized into a quartz glass synthesizing apparatus 4.
On the way, an impurity filter 2 having a permeation hole smaller than the source gas passage cross-sectional area of the supply path 1 and a source gas flow control device 3 are arranged.
【０００８】この不純異物除去フィルタ２は、原料ガス
供給源と、原料ガス流量制御装置３との間に配置されて
いることが好ましい。この不純異物除去フィルタ２の有
する孔は、径がゲル状物質や不純微粒子の不純異物より
小さいため、原料ガス中の不純異物を濾過により除去す
ることができる。そのため、原料ガス流量制御装置は、
不純異物による目詰まりを起さず、一定流量の原料ガス
を長期間安定して石英ガラス合成装置へ供給することが
できる。したがって、石英ガラス合成装置により均質な
ガラス微粒子が生成され、高品質な石英ガラスが得られ
る。The impurity filter 2 is preferably disposed between a source gas supply source and a source gas flow control device 3. Since the pores of the impurity filter 2 have a smaller diameter than that of the gel-like substance or the impurity particles of the impurity fine particles, the impurity substances in the raw material gas can be removed by filtration. Therefore, the source gas flow control device is
The raw material gas at a constant flow rate can be stably supplied to the quartz glass synthesizing apparatus for a long period of time without causing clogging due to impurity foreign matter. Therefore, homogeneous glass fine particles are generated by the quartz glass synthesizing apparatus, and high quality quartz glass is obtained.
【０００９】不純異物除去フィルタ２が、ポリテトラフ
ルオロエチレン製メンブレンフィルタ、ステンレス焼結
体、またはセラミックフィルタからなることで好適に実
施できる。ポリテトラフルオロエチレン製メンブレンフ
ィルタは、透過孔の孔径が０．１〜１０μｍの膜状フィ
ルタである。ステンレス焼結体は、ステンレス製の繊
維、またはステンレス粉の焼結体であって、透過孔の孔
径が０．１〜１００μｍである。セラミックフィルタ
は、透過孔の孔径が０．１〜１００μｍのセラミック焼
結体である。The filter 2 can be suitably implemented when the filter 2 for removing impurities is made of a polytetrafluoroethylene membrane filter, a stainless sintered body, or a ceramic filter. The polytetrafluoroethylene membrane filter is a membrane filter having a permeation hole diameter of 0.1 to 10 μm. The stainless sintered body is a sintered body of stainless steel fiber or stainless steel powder, and the diameter of the transmission hole is 0.1 to 100 μm. The ceramic filter is a ceramic sintered body having a transmission hole having a diameter of 0.1 to 100 μm.
【００１０】この原料ガスの供給系がステンレス製であ
ると、機械的強度および化学的安定性に優れている。[0010] When the supply system of the raw material gas is made of stainless steel, it has excellent mechanical strength and chemical stability.
【００１１】石英ガラス合成装置４が、多孔質ガラス母
材形成用火炎バーナであると、均質で不純異物を含まな
い多孔質ガラス母材等の石英ガラスを形成することがで
きるため、好ましい。It is preferable that the quartz glass synthesizing apparatus 4 is a flame burner for forming a porous glass base material because a quartz glass such as a porous glass base material which is homogeneous and does not contain any impurity can be formed.
【００１２】[0012]
【発明の実施の形態】以下、本発明の実施例を詳細に説
明する。図１は、本発明を適用する石英ガラスの原料ガ
ス供給系の実施例を示すブロック図である。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described in detail. FIG. 1 is a block diagram showing an embodiment of a raw material gas supply system for quartz glass to which the present invention is applied.
【００１３】石英ガラスの原料ガス供給系は、石英ガラ
ス原料液の気化装置（不図示）から、石英ガラス合成装
置である酸水素火炎バーナ４に至る原料ガスの供給経路
１の途中に、不純異物除去フィルタ２、ガス流量制御装
置３がこの順で配置されている。The raw material gas supply system for the quartz glass includes an impure foreign substance in the raw material gas supply path 1 from a quartz glass raw material vaporizer (not shown) to an oxyhydrogen flame burner 4 which is a quartz glass synthesizing apparatus. The removal filter 2 and the gas flow control device 3 are arranged in this order.
【００１４】図２は不純異物除去フィルタ２の構成ユニ
ットを示す図である。不純異物除去フィルタ２内に配置
されたポリテトラフルオロエチレン製メンブレンフィル
タ１４ａ・１４ｂは、供給経路の原料ガス通過断面積よ
り小さな孔を有している。FIG. 2 is a diagram showing the constituent units of the filter 2 for removing foreign matter. The polytetrafluoroethylene membrane filters 14a and 14b disposed in the impurity filter 2 have holes smaller than the cross-sectional area of the supply path of the source gas.
【００１５】メンブレンフィルタ１４ａは、通気孔１６
ａを有するフッ素樹脂製の膜支持体１５ａに取り付けら
れている。メンブレンフィルタ１４ａの中央部にフッ素
樹脂製の分流体１２が取り付けられている。膜支持体１
５ａの通気孔１６ａの外周の挿入された別なメンブレン
フィルタ１４ｂが、通気孔１６ｂを有するフッ素樹脂製
の別な膜支持体１５ｂに取り付けられている。メンブレ
ンフィルタ１４ａ・１４ｂと、分流体１２や膜支持体１
５ａ・１５ｂとは、隙間を生じないように接着剤または
挟込みにより、固定されている。膜支持体１５ａ・１５
ｂは、ステンレス製のハウジング１１および１７内に収
められている。膜支持体１５ａは通気小孔の開いた突起
１８により、また膜支持体１５ｂは突起２３により、ハ
ウジング１１・１７に固定されている。膜支持体１５ｂ
の通気孔１６ｂの外周はハウジング１７と密着してい
る。ハウジング１１・１７は、各々が有しているフラン
ジ２０・２１をボルト１９およびナット２２で締めつけ
ることにより固定され、内部が外界と遮断されている。The membrane filter 14a has a ventilation hole 16
It is attached to a fluororesin membrane support 15a having a. The fluid separation 12 made of fluororesin is attached to the center of the membrane filter 14a. Membrane support 1
Another membrane filter 14b inserted around the outer periphery of the ventilation hole 16a of 5a is mounted on another fluororesin membrane support 15b having the ventilation hole 16b. Membrane filters 14a and 14b, fluid separation 12 and membrane support 1
5a and 15b are fixed by an adhesive or sandwiching so as not to form a gap. Membrane supports 15a and 15
b is housed in stainless steel housings 11 and 17. The membrane support 15a is fixed to the housings 11 and 17 by the projections 18 having small ventilation holes, and the membrane support 15b is fixed to the housings 11 and 17 by the projections 23. Membrane support 15b
The outer periphery of the ventilation hole 16b is in close contact with the housing 17. The housings 11 and 17 are fixed by tightening flanges 20 and 21 of the housings with bolts 19 and nuts 22, respectively, and the interior is isolated from the outside.
【００１６】原料ガス供給経路１のガス供給先の酸水素
火炎バーナ４は、水素ガスと酸素ガス供給に繋がってい
る。The oxyhydrogen flame burner 4 to which the gas is supplied in the raw material gas supply path 1 is connected to the supply of hydrogen gas and oxygen gas.
【００１７】石英ガラスの原料ガス供給系は、以下のよ
うに使用する。図１に示すように原料液であるテトラク
ロロシランおよびテトラクロロゲルマニウムの気化装置
から発生した原料ガスが、ガス供給経路１を経て、不純
異物除去フィルタ２内を流れる。図２に示すように原料
ガスは、不純異物除去フィルタ２内で、分流体１２によ
り分流される。一部の原料ガスは膜支持体１５ａのメン
ブレンフィルタ１４ａを通過し膜支持体１５ａの通気孔
１６ａへ流れる。一部の原料ガスは膜支持体１５ａの突
起１８の通気小孔を経て、膜支持体１５ｂのメンブレン
フィルタ１４ｂを通過し膜支持体１５ｂの通気孔１６ｂ
へ流れる。メンブレンフィルタ１４ａ・１４ｂを通過す
るとき、原料ガスに含まれるゲル状物質や不純微粒子の
不純異物１３は濾過により除去される。不純異物の除去
された原料ガスは、ガス流量制御装置３で流量を制御さ
れ、所定のガス流量が酸水素火炎バーナ４へ流れる。バ
ーナ４の火炎５によりガラス微粒子が形成され、堆積す
ると光ファイバの原材となる多孔質ガラス母材６が得ら
れる。The raw material gas supply system for quartz glass is used as follows. As shown in FIG. 1, a raw material gas generated from a vaporizer of tetrachlorosilane and tetrachlorogermanium, which is a raw material liquid, flows through an impurity foreign matter removing filter 2 via a gas supply path 1. As shown in FIG. 2, the raw material gas is separated by the separation fluid 12 in the impurity filter 2. Part of the raw material gas passes through the membrane filter 14a of the membrane support 15a and flows to the ventilation holes 16a of the membrane support 15a. Part of the raw material gas passes through the small holes of the projections 18 of the membrane support 15a, passes through the membrane filter 14b of the membrane support 15b, and passes through the ventilation holes 16b of the membrane support 15b.
Flows to When passing through the membrane filters 14a and 14b, the impurities such as gel-like substances and impurity particles 13 contained in the raw material gas are removed by filtration. The flow rate of the raw material gas from which the impurities are removed is controlled by the gas flow rate control device 3, and a predetermined gas flow rate flows to the oxyhydrogen flame burner 4. Glass particles are formed by the flame 5 of the burner 4, and when deposited, a porous glass preform 6 as a raw material of an optical fiber is obtained.
【００１８】上記の実施例にしたがって、多孔質ガラス
母材を試作した。フィルタとして、孔径が０．５μｍの
ポリテトラフルオロエチレン製メンブレンフィルタを用
いた。ガス流量制御装置内のガス流量測定部は、ガス経
路の細管および流量センサが内径２００μｍのステンレ
ス管、最大開口孔径１０００μｍの電磁弁を有するもの
を用いた。テトラクロロシランとテトラクロロゲルマニ
ウムとの混合ガスの圧力を０．１ＭＰａとし流量を調整
しながら、連続して８０００時間稼動させて多孔質ガラ
ス母材を試作したが、目詰まりの発生はなく、安定して
バーナへガスを供給することができた。According to the above-described embodiment, a porous glass base material was experimentally manufactured. As the filter, a polytetrafluoroethylene membrane filter having a pore diameter of 0.5 μm was used. As the gas flow rate measuring unit in the gas flow rate control device, a gas flow rate narrow tube and a flow rate sensor having a stainless steel pipe having an inner diameter of 200 μm and a solenoid valve having a maximum opening hole diameter of 1000 μm were used. While the pressure of the mixed gas of tetrachlorosilane and tetrachlorogermanium was adjusted to 0.1 MPa and the flow rate was adjusted, the porous glass base material was operated continuously for 8000 hours to produce a prototype, but no clogging occurred and the porous glass base material was stable. Gas could be supplied to the burner.
【００１９】なお、この供給系は石英ガラスの原料ガス
の供給に用いる例について示したが、石英ガラス合成装
置へ、可燃性ガス例えば水素、支燃性ガス例えば酸素、
不活性ガス例えば窒素やアルゴンを供給する配管に用い
てもよい。Although this supply system is used for supplying a raw material gas for quartz glass, a flammable gas such as hydrogen, a flammable gas such as oxygen,
It may be used for a pipe for supplying an inert gas such as nitrogen or argon.
【００２０】[0020]
【発明の効果】以上、詳細に説明したように本発明の石
英ガラスの原料ガス供給系を用いると、原料ガス中の不
純異物が除去できるので、ガス流量制御装置内の細管や
弁が詰まらず、安定して所定流量の原料ガスを石英ガラ
ス合成装置へ供給することができる。さらに不純異物が
石英ガラス合成装置へ流入しない。そのため、均質で不
純異物を含まない多孔質ガラス母材や石英が得られ、高
品質な光ファイバや半導体フォトマスクを製造すること
ができる。As described in detail above, when the raw material gas supply system for quartz glass according to the present invention is used, impurity foreign substances in the raw material gas can be removed, so that the thin tubes and valves in the gas flow control device are not clogged. It is possible to stably supply the raw material gas at a predetermined flow rate to the quartz glass synthesizing apparatus. Further, no impurity particles flow into the quartz glass synthesizing apparatus. Therefore, a porous glass base material and quartz that are homogeneous and do not contain impurity particles can be obtained, and high-quality optical fibers and semiconductor photomasks can be manufactured.
【図１】本発明を適用する石英ガラスの原料ガス供給系
の実施例を示すブロック図である。FIG. 1 is a block diagram showing an embodiment of a raw material gas supply system for quartz glass to which the present invention is applied.
【図２】本発明を適用する石英ガラスの原料ガス供給系
の実施例の要部を示す図である。FIG. 2 is a diagram showing a main part of an embodiment of a raw material gas supply system for quartz glass to which the present invention is applied.
１はガス供給経路、２は不純異物除去フィルタ、３はガ
ス流量制御装置、４は酸水素バーナ、５は火炎、６は多
孔質ガラス母材、１１はハウジング、１２は分流体、１
３は不純異物、１４ａ・１４ｂはメンブレンフィルタ、
１５ａ・１５ｂは膜支持体、１６ａ・１６ｂは通気孔、
１７はハウジング、１８は突起、１９はボルト、２０・
２１はフランジ、２２はナット、２３は突起である。1 is a gas supply path, 2 is an impurity removal filter, 3 is a gas flow control device, 4 is an oxyhydrogen burner, 5 is a flame, 6 is a porous glass base material, 11 is a housing, 12 is a fluid separator, 1
3 is an impurity, 14a and 14b are membrane filters,
15a and 15b are membrane supports, 16a and 16b are ventilation holes,
17 is a housing, 18 is a projection, 19 is a bolt, 20
21 is a flange, 22 is a nut, and 23 is a projection.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 飛坂 優二 群馬県安中市磯部２丁目13番１号 信越化 学工業株式会社精密機能材料研究所内 (72)発明者 荻野 剛 群馬県安中市磯部２丁目13番１号 信越化 学工業株式会社精密機能材料研究所内 (72)発明者 島田 忠克 群馬県安中市磯部２丁目13番１号 信越化 学工業株式会社精密機能材料研究所内 (72)発明者 平沢 秀夫 群馬県安中市磯部２丁目13番１号 信越化 学工業株式会社精密機能材料研究所内 Ｆターム(参考） 4G014 AH12 4G068 AA02 AB03 AC01 AD17 AD50 AE01 AE10 AF12 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Yuji Tobisaka 2- 13-1, Isobe, Annaka-shi, Gunma Shin-Etsu Kagaku Kogyo Co., Ltd.Precision Functional Materials Laboratory (72) Inventor Tsuyoshi Ogino Annaka-shi, Gunma 2-3-1 Isobe, Shin-Etsu Chemical Industry Co., Ltd.Precision Functional Materials Research Laboratory (72) Inventor Tadakatsu Shimada 2-1-1, Isobe, Annaka-shi, Gunma Prefecture Shin-Etsu Chemical Co., Ltd.Precision Functional Materials Research Laboratory (72 ) Inventor Hideo Hirasawa 2-13-1, Isobe, Annaka-shi, Gunma F-term in Shin-Etsu Kagaku Kogyo Co., Ltd. Precision Functional Materials Laboratory 4G014 AH12 4G068 AA02 AB03 AC01 AD17 AD50 AE01 AE10 AF12
Claims (2)
の供給源から石英ガラス合成装置への該原料ガスの供給
経路途中に、該供給経路の原料ガス通過断面積より小さ
な透過孔を有する不純異物除去フィルタと、原料ガス流
量制御装置とが配置されている石英ガラスの原料ガス供
給系。1. An impurity having a transmission hole, which is smaller than a cross-sectional area of a raw material gas passing through the supply path, in a supply path of the raw material gas from a supply source of the raw material gas of the silica glass to be synthesized in a vapor phase to a quartz glass synthesizer. A raw material gas supply system for quartz glass in which a foreign matter removing filter and a raw material gas flow control device are arranged.
料ガス供給源と前記原料ガス流量制御装置との間に配置
されていることを特徴とする請求項１に記載の石英ガラ
スの原料ガス供給系。2. The raw material gas supply system for quartz glass according to claim 1, wherein the impurity foreign matter removing filter is disposed between the raw material gas supply source and the raw material gas flow control device. .
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19911099A JP2001026429A (en) | 1999-07-13 | 1999-07-13 | System for supplying feedstock gas for quartz glass |
| EP00250172A EP1057792B1 (en) | 1999-06-03 | 2000-06-02 | A process and apparatus for vaporizing a liquid glass precursor for the manufacture of optical fibre preforms |
| KR1020000030281A KR100632879B1 (en) | 1999-06-03 | 2000-06-02 | An apparatus for manufacturing glass base material and a method for manufacturing glass base material |
| US09/585,573 US6698240B1 (en) | 1999-06-03 | 2000-06-02 | Apparatus for manufacturing glass base material and a method for manufacturing glass base material |
| TW089110793A TW584611B (en) | 1999-06-03 | 2000-06-02 | Apparatus for manufacturing glass base material and a method for manufacturing glass base material |
| DE60021955T DE60021955T2 (en) | 1999-06-03 | 2000-06-02 | Method and apparatus for vaporizing a liquid glass precursor for the production of optical fiber preforms |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19911099A JP2001026429A (en) | 1999-07-13 | 1999-07-13 | System for supplying feedstock gas for quartz glass |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2001026429A true JP2001026429A (en) | 2001-01-30 |
Family
ID=16402301
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19911099A Pending JP2001026429A (en) | 1999-06-03 | 1999-07-13 | System for supplying feedstock gas for quartz glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001026429A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018507160A (en) * | 2015-02-18 | 2018-03-15 | ヘレウス・クアルツグラース・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング・ウント・コンパニー・コマンディット・ゲゼルシャフトＨｅｒａｅｕｓ Ｑｕａｒｚｇｌａｓ ＧｍｂＨ ＆ Ｃｏ． ＫＧ | Method and apparatus for producing fused quartz from a polymerizable polyalkylsiloxane compound using a membrane filter as a purification apparatus |
| CN112174496A (en) * | 2019-07-03 | 2021-01-05 | 住友电气工业株式会社 | Glass raw material supply device and filter replacement method for glass raw material supply device |
-
1999
- 1999-07-13 JP JP19911099A patent/JP2001026429A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018507160A (en) * | 2015-02-18 | 2018-03-15 | ヘレウス・クアルツグラース・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング・ウント・コンパニー・コマンディット・ゲゼルシャフトＨｅｒａｅｕｓ Ｑｕａｒｚｇｌａｓ ＧｍｂＨ ＆ Ｃｏ． ＫＧ | Method and apparatus for producing fused quartz from a polymerizable polyalkylsiloxane compound using a membrane filter as a purification apparatus |
| CN112174496A (en) * | 2019-07-03 | 2021-01-05 | 住友电气工业株式会社 | Glass raw material supply device and filter replacement method for glass raw material supply device |
| JP2021008391A (en) * | 2019-07-03 | 2021-01-28 | 住友電気工業株式会社 | Glass raw material feeding device and filter replacement method for glass raw material feeding device |
| JP7310373B2 (en) | 2019-07-03 | 2023-07-19 | 住友電気工業株式会社 | Frit feeder and filter replacement method for frit feeder |
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