JP2001023885A - Aligner system - Google Patents

Abstract

PROBLEM TO BE SOLVED: To stably control an aligner system for vibration proofing by controlling an attitude adjusting device by means of a controller based on the detected result of an inclination detecting device. SOLUTION: A control circuit (controller) 120 for controlling vibration proofing is connected to an exposure control circuit 110. In order to make vibration proofing control stable, particularly, the combination of an inclination detecting device 130 and an attitude adjusting device 140 is adopted. The detecting device 130 detects the inclination of the main body section 160 of an aligner from a prescribed basis and the adjusting device 140 adjusts the attitude of the main body section 6. Therefore, the control circuit 120 controls the adjusting device 140 based on the detected result of the detecting device 130. The inclination detecting device 130 has a level or gyroscope. In addition, the attitude adjusting device 140 is composed of an electromagnetic actuator, electro-hydraulically controlled actuator, electrically controlled fluid cylinder, or piezoelectric element or the combination of some of them.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus having an exposure main body for forming a pattern such as a reticle pattern on a substrate such as a wafer, and more particularly, to an exposure apparatus provided with a measure against vibration caused by an earthquake or the like. About.

[0002]

2. Description of the Related Art Conventionally, in a lithography process for manufacturing a semiconductor device, a liquid crystal display device, etc., a reticle pattern as a mask is exposed to each shot area of a substrate such as a wafer or a glass plate coated with a photoresist. An exposure device (stepper or the like) for transferring is used. For example, in a batch exposure type exposure apparatus such as a stepper, when transferring a reticle pattern to each shot area of a wafer, it is necessary to keep the reticle and the wafer almost completely stationary. Therefore, the base may be installed on the floor via a vibration isolator so that the vibration from the floor is not transmitted to the exposure main body supported by the base of the exposure apparatus.

Further, recently, in order to transfer a wider reticle pattern onto a wafer without increasing the size of the projection optical system, the reticle is scanned in a direction perpendicular to the optical axis of the projection optical system. Scanning exposure such as a step-and-scan method for sequentially transferring a reticle pattern onto a wafer by synchronously scanning the wafer in a corresponding direction at a speed ratio determined according to the magnification of the projection optical system. A type of exposure apparatus is also used. In a scanning exposure type exposure apparatus, since it is necessary to stably scan the reticle and the wafer at a constant speed during exposure, it is also necessary to eliminate vibrations from the floor using a vibration isolator or the like.

[0004] As a vibration isolator for an exposure apparatus, a passive type vibration isolator configured to support a base of the exposure apparatus by a spring element such as an air spring or a spring element and a damper element is known. However, a passive type vibration isolator may not exhibit an anti-vibration effect with respect to vibration having a frequency component of about 30 Hz or less. In order to improve this, the vibration of the floor on which the exposure apparatus is installed is accelerated. There has been proposed an active-type image stabilizing apparatus that detects a sensor or the like and actively applies a force to a base of the exposure apparatus by feedforward control or feedback control based on the detected value.

[0005]

In an active vibration damping device, a controlled force is applied to an exposure main body or a base of an exposure device by, for example, an electrically controllable electromagnetic actuator. Acting on the floor, the criterion for control may be uncertain.

In order to enable high-speed processing in a scanning exposure type exposure apparatus, the scanning reaction force of a stage (reticle stage, wafer stage, etc.) acting on the base or floor of the exposure apparatus becomes considerably large. In such a case, the reference for control may be uncertain.

As described above, in the exposure apparatus to which the conventional active type anti-vibration apparatus is applied, stable control for anti-vibration can be performed because the reference for control becomes indefinite. However, there is a problem that an allowable range for vibration such as an earthquake is narrow.

Accordingly, an object of the present invention is to provide an exposure apparatus which can stably perform control for image stabilization and has a wide allowable range for vibration such as an earthquake. Other objects of the present invention will become clear from the following description.

[0009]

Hereinafter, in the examples shown in this section, for ease of understanding, each constituent element of the present invention will be described with typical reference numerals shown in the drawings of the embodiments. The configuration of the present invention or each component requirement is not limited to those restricted by these reference numerals.

According to the present invention, there is provided an exposure apparatus having an exposure main body (6) for forming a pattern on a substrate (wafer 9). The exposure apparatus includes a tilt detector (130) that detects a tilt of the exposure main body (6) with respect to a predetermined reference (for example, a vertical direction (gravity direction) provided by a level gauge or a gyroscope), and an exposure main body ( 6) A posture adjusting device (140) for adjusting the posture, and a control device (control circuit 120) for controlling the posture adjusting device (140) based on the detection result of the inclination detecting device (130).

According to this configuration, it is possible to easily set the above-mentioned predetermined reference which is less susceptible to disturbances related to the inclination detecting device, so that the control for image stabilization can be stably performed. As a result, it becomes possible to provide an exposure apparatus having a wide tolerance for vibration such as an earthquake.

[0012]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below in detail with reference to the drawings. Throughout the drawings, substantially the same parts have the same reference characters allotted.

FIG. 1 is a front view showing an embodiment of an exposure apparatus according to the present invention, and FIG. 2 is a block diagram showing a control system of the exposure apparatus according to the present invention. Here, a step-and-scan type reduction projection type exposure apparatus is shown.

Referring to FIG. 1, a floor (installation surface or ground)
On the base 1, there is provided a seismic isolation base 2 made of a highly rigid member such as ceramics or iron via a base attitude adjusting device 200 (see also FIG. 2, the detailed configuration will be described later). The seismic isolation base 2 is provided with an exposure main body 6 of the exposure apparatus via an attitude adjustment device 140 (see also FIG. 2 and a detailed configuration will be described later).

A wafer stage 8 is provided below the first structure 7 of the exposure main body 6, and a wafer 9 as a photosensitive substrate is mounted on the wafer stage 8. First
A projection optical system 10 and a second structure 11 are provided above the structure 7.
Is provided. A reticle stage 12 is provided on the second structure 11, and a reticle 13 on which a circuit pattern is formed is mounted on the reticle stage 12. As a result, the reticle 13 and the wafer 9 are two-dimensionally movable within a plane different from each other in the direction along the optical axis OA of the projection optical system 10 and orthogonal to the optical axis OA. I have. Also, reticle stage 12
Above the reticle 13 mounted thereon, an illumination optical system 14 for converting light emitted from a light source such as an excimer laser (not shown) into predetermined illumination light and guiding the same to the reticle 13 is provided. .

The illumination optical system 14 illuminates the rectangular pattern area of the reticle 13 from above with illumination light extending in a slit shape (rectangular shape) in a direction perpendicular to the scanning direction during scanning exposure. The illumination area on the reticle 13 is the projection optical system 1
The position of the pattern of the reticle 13 in the illumination area is located at the center of the circular visual field on the object plane side perpendicular to the optical axis OA of 0 and through a projection optical system 10 having a predetermined reduction magnification β (for example, β = 1/4). Part of the image is projected on the wafer 9 at a predetermined resolution. As the projection optical system 10, for example, a reticle 13
The one that projects a reduced inverted image of the pattern formed on the pattern surface on the wafer 9 is used.

At the time of scanning exposure, the exposure control circuit 11
0 (see FIG. 2), an exposure start command is sent to the wafer stage 8 and the reticle stage 12, and in response, the reticle 13 is scanned and moved at a speed Vm in a predetermined direction, and in synchronization with this. , The wafer 9 moves at a speed Vw (= β ·
Vm).

Referring to FIG. 2, the exposure control circuit 110 is connected to a control circuit (or control device) 120 for anti-vibration control characteristic of the present embodiment. In particular, in this embodiment, an effective combination of the tilt detection device 130 and the attitude adjustment device 140 is employed in order to stably perform control for image stabilization. The inclination detecting device 130 detects the inclination of the exposure main body 6 with respect to a predetermined reference, and the posture adjusting device 140 adjusts the posture of the exposure main body 6. Therefore, the control circuit 120 can control the posture adjustment device 140 based on the detection result of the inclination detection device 130.

As the above-mentioned predetermined reference relating to the inclination detecting device 130, for example, a vertical direction (gravity direction) provided by a level gauge or a gyroscope can be used. In this case, the tilt detection device 130
A predetermined reference plane (reference plane 18 set on the second structure 11 in the embodiment shown in FIG. 1)
a, 18b) and an angle sensor 17 (17a, 17b) for detecting an angle between the vertical direction and an inclination detecting circuit 1 for detecting an inclination of the exposure main body 6 based on an output of the angle sensor 17.
31.

In this embodiment, in order to increase the detection accuracy, the inclination detecting device 130 further includes a distortion sensor 17 '(17'a, 17'b) for detecting a distortion of the reference plane.
The output of the strain sensor 17 'is supplied to the tilt detection circuit 131, and the angle sensor 17' is output based on the output of the strain sensor 17 '.
Is corrected.

The output signal of the inclination detection circuit 131 is input to the control circuit 120 via the determination circuit 132. The determination circuit 132 determines whether or not the output level of the tilt detection circuit 131 is higher than a predetermined threshold level, that is, the detection value of the tilt detection device 130 deviates from the range of the predetermined threshold. Is determined. Accordingly, by supplying the output of the determination circuit 132 to the exposure control circuit 110, when the inclination of the exposure main body 6 detected by the inclination detection device 130 becomes larger than a predetermined range, the exposure main body 6 Can easily be stopped.

The reference plane related to the angle sensor 17 and the strain sensor 17 'is located at a place where the deformation of the exposure main body 6 is small (a place having high rigidity such as a column of the first structure 7 or the second structure 11). In addition, it is desirable that the setting be made such that the inclination of the exposure main body 6 (the surface inclination of the support of the wafer stage 8 or the support of the projection optical system 10) is easily reflected.
In this embodiment, as shown in FIG. 1, two reticle stages 12 are formed on the upper surface of the second structure 11 adjacent to the reticle stage 12.
The two reference surfaces 18a and 18b are set substantially perpendicularly to the vertical direction, that is, substantially horizontally. Therefore, the angle sensor 17 (see FIG. 2)
, And the strain sensors 17 'are respectively provided with reference surfaces 18a, 18b.
And strain sensors 17'a and 17'b provided correspondingly to. Two or more reference planes may be set in relation to the exposure main body 6. In this case, the plurality of reference planes may not be on the same plane, or may each be at a certain angle with respect to the horizontal direction.

The attitude adjusting device 140 includes a horizontal actuator 16 (16) for displacing the exposure main body 6 in the horizontal direction.
a, 16b) and a vertical actuator 15 (15a, 15b) for displacing the exposure main body 6 in the vertical direction. Each of the actuators 15, 16 may be provided by one or some combination selected from an electromagnetic actuator, an electro-hydraulic controlled actuator, an electrically controlled fluid cylinder and a piezoelectric element. In this embodiment, as shown in FIG. 1, the vertical actuator 15 includes vertical anti-vibration sets 15 a and 15 b interposed between the horizontal surface of the base 2 and the first structure 7 of the exposure main body 6.
The horizontal actuator 16 includes horizontal anti-vibration sets 16 a and 16 b interposed between the vertical surface of the base 2 and the first structure 7. Although FIG. 1 shows two anti-vibration sets as each of the actuators 15 and 16, in order to correspond to various forms of the seismic isolation base 2 and the exposure main body 6, Preferably, each includes at least three anti-vibration sets.

As described above, in this embodiment, the vertical actuator 15 of the attitude adjusting device 140 is a plurality of vibration isolating sets 15a and 15b (or a plurality of actuators).
The control circuit 120 includes the tilt detection device 1
Based on the value detected by 30, the vertical actuator 15 can be feedback-controlled so that the tilt of the exposure main body 6 is eliminated. In this control, the reference of the detection in the tilt detection device 130 is the vertical direction which can be provided by the level gauge or the gyro meter as described above. The control for the vibration can be stably performed, and the allowable range for the vibration such as an earthquake is widened. Therefore, the threshold value in the determination circuit 132 can be set to a high level, and abnormal stop of the exposure apparatus due to an earthquake or the like can be reduced.

As shown in FIG. 2, the inclination detecting device 13
In order to provide a more effective combination of the zero and the posture adjustment device 140, the installation surface vibration detection device 150, the base inclination detection device 160, the base acceleration detection device 170, the main body acceleration detection device 180, the relative distance detection device 190, and the base A posture adjusting device 200 is additionally provided.

In the embodiment shown in FIG. 1, the base attitude adjusting device 200 includes vibration isolation devices 3a and 3b that support the base 2 in the horizontal direction with respect to the installation surface 1. Specifically, the vibration isolators 3a and 3b are interposed between the wall surface of the depression of the installation surface 1 and the side surface of the base 2 to adjust the posture of the base 2. Although only two anti-vibration devices 3a and 3b are shown in the figure, it is desirable to use three or more anti-vibration devices according to the form of the seismic isolation base 2. In addition, seismic isolation base 2
Are seismic isolation devices 4a, 4 perpendicular to the installation surface 1.
b, 4c. Seismic isolation device 4a, 4
b and 4c are provided, for example, to suppress the transmission of the vibration to the exposure main body 6 when the installation surface 1 vibrates. Specifically, the bottom surface b and 4c are provided with the bottom surface of the base-isolated base 2 and the installation surface. 1
And the bottom of the depression. Seismic isolation device 4a,
Each of the exposure main units 4b and 4c is flexible (movable horizontally) in the horizontal direction and is largely deformed.
A mechanism capable of basically insulating a ground vibration in which a single cycle is dominant by extending the vibration cycle of the exposure main body 6 in the horizontal direction, for example, by laminating, A device having at least one of rubber, a sliding bearing, and a magnetic levitation device. A damper 4 is provided between the base 2 and the installation surface 1 in order to absorb the vibration energy of the base 2 particularly in the horizontal direction.
d is provided.

As shown in FIG. 2, an installation surface vibration detecting device 150 for detecting the vibration of the installation surface 1 is provided.
Acceleration sensor 5 (5a,
5b) and an installation surface vibration detection circuit 151 that detects vibration of the installation surface 1 based on the output of the acceleration sensor 5. An output signal of the installation surface vibration detection circuit 151 is a determination circuit 152 for performing a determination for stopping the operation of the exposure main unit 6 when a detection value of the installation surface vibration detection device 150 deviates from a predetermined threshold value. Is supplied to the control circuit 120 via the. The output signal of the determination circuit 152 is supplied to the exposure control circuit 110. The acceleration sensor 5 specifically includes acceleration sensors 5a and 5b (see FIG. 1) provided on the installation surface 1.

As described above, in this embodiment, since the installation surface vibration detecting device 150 is provided, the control circuit 120 controls the vibration transmitted to the seismic isolation base 2 based on the value detected by the installation surface vibration detecting device 150. , The base attitude adjusting device 200 can be feedforward controlled.

The base tilt detector 160 detects a tilt of the base 2 with respect to a predetermined reference. As the reference here, similarly to the reference in the inclination detection device 130,
A vertical direction (gravity direction) provided by a level gauge or a gyrometer can be employed. Therefore, the base tilt detecting device 160 includes the angle sensor 21, the distortion sensor 21 ', and the base tilt detecting circuit 161 according to the same principle as the tilt detecting device 130. The output signal of the base tilt detection circuit 161 is used when the value detected by the base tilt detection device 160 deviates from a predetermined threshold value.
Is supplied to the control circuit 120 via a determination circuit 162 which makes a determination for stopping the operation of the control circuit 120. The output signal of the determination circuit 162 is supplied to the exposure control circuit 110.

As described above, in the present embodiment, the base tilt detecting device 160 is provided, so that the control circuit 120 controls the base posture based on the detection value of the base tilt detecting device 160 so that the base isolation base 2 is no longer tilted. Adjustment device 20
0 can be feedback controlled. A specific example of the base posture adjustment device 200 suitable for this control will be described later.

The reference plane associated with the angle sensor 21 and the strain sensor 21 'is specifically, as shown in FIG.
Reference surfaces 24a and 24b are provided on the upper surface of the column portion of the base isolation base 2.
Is given as The angle sensor 21 includes angle sensors 21a, 21b provided on reference surfaces 24a, 24b, respectively.
21b. Also, the strain sensor 21 ′ is
Strain sensor 2 for indirectly detecting strains 4a and 24b
1'a and 21'b. Here, the strain sensor 2
1′a and 21′b are provided at the base of the column portion of the base isolation base 2. The reference surfaces 24a and 24b are provided on the base 2 at a place where the distortion and deformation are relatively small.
It is desirable to be installed in a place that easily reflects the inclination.

The base acceleration detection device 170 includes an acceleration sensor 20 attached to the base isolation base 2 and a base acceleration detection circuit 171 for detecting the acceleration of the base isolation base 2 based on the output of the acceleration sensor 20. The output signal of the base acceleration detection circuit 171 is
When the detected value of 0 deviates from a predetermined threshold value, it is supplied to the control circuit 170 via a determination circuit 172 for determining that the operation of the exposure main body 6 is stopped. The output signal of the determination circuit 172 is supplied to the exposure control circuit 110.

The acceleration sensor 20 comprises the acceleration sensors 20a, 20b and 20c shown in FIG. The acceleration sensor 20c is provided substantially at the center of the horizontal portion of the base 2, and the acceleration sensors 20a and 20b are provided near the root of a pair of columns that stand vertically from the horizontal portion of the base 2. Have been.

As described above, in this embodiment, since the base acceleration detecting device 170 is provided, the control circuit 120
Can feedback control the base attitude adjusting device 200 based on the value detected by the base acceleration detecting device 170 so that the vibration of the base-isolated base 2 is attenuated.

The main body acceleration detecting device 180 includes an acceleration sensor 19 attached to the exposure main body 6, and a main body acceleration detection circuit 181 for detecting the acceleration of the exposure main body 6 based on the output of the acceleration sensor 19. The output signal of the main body acceleration detection circuit 181 is supplied to the control circuit 120. As shown in FIG. 1, the acceleration sensors 19 are acceleration sensors 19a and 19b mounted on the upper part of the first structure 7.
including. Although not shown, the acceleration sensor 19 may further include an acceleration sensor provided on the wafer stage 8 or on a column of the first structure 7. The acceleration sensor 19 detects, for example, the horizontal acceleration of the exposure main body 6.

As described above, in this embodiment, since the main body acceleration detecting device 180 is provided, the control circuit 120
Based on the value detected by the main body acceleration detector 180, the horizontal actuator 16 is feedback-controlled so that the horizontal movement of the exposure main body 6 is eliminated, and based on the value detected by the tilt detector 130, the exposure main body is controlled. The vertical actuator 15 can be feedback-controlled so that the inclination of the vertical actuator 6 is eliminated.

The relative distance detecting device 190 includes the exposure main unit 6
And a position sensor 22 for measuring the relative distance between a part of the base and a corresponding part of the base isolation base 2.
And a relative distance detecting circuit 191 for detecting the relative distance based on the output of the control unit 191. The position sensor 22 is, specifically,
As shown in FIG. 1, it comprises position sensors 22 a and 22 b interposed between the column portion of the seismic isolation base 2 and the first structure 7. The output signal of the relative distance detection circuit 191 is transmitted through a determination circuit 192 that determines to stop the operation of the exposure main unit 6 when the value detected by the relative distance detection device 190 deviates from a predetermined threshold value. It is supplied to the control circuit 120. The output signal of the decision circuit 192 is
0 is supplied.

As described above, since the relative distance detecting device 190 is provided in the present embodiment, the control device 120 controls the horizontal distance based on the value detected by the relative distance detecting device 190 so that the relative distance becomes constant. Direction actuator 1
6 and the inclination detecting device 13
Based on the detection value of 0, the vertical actuator 15 can be feedback-controlled so that the tilt of the exposure main body 6 is eliminated.

The exposure main body 6 is held by a base isolation base 2 installed on the installation surface 1 via a main body vibration isolator including an attitude adjusting device 140. The main body vibration isolator may include a spring or a damper. For example, base-isolated base 2
In order to absorb the vibration energy and rapidly reduce the vibration of the base isolation base 2, the base isolation base 2 is provided with dynamic vibration absorbers (dampers) 23a and 23b as shown in FIG.

The base attitude adjusting device 200 (for example, the vibration isolating devices 3a and 3b shown in FIG. 1) can include any of an electromagnetic actuator, an electro-hydraulic control actuator, an electric control fluid cylinder, and a piezoelectric element. .

In this embodiment, the gain (or response) of the feedback control of the attitude adjusting device 140 for the exposure main unit 6 using the tilt detecting device 130 is made larger than the gain (or response) of the other feedback control. (Faster). Thereby, the inclination posture control of the exposure main body 6 is performed with the highest priority. as a result,
According to the principle of the present invention, it is possible to stably control the attitude adjustment device 140 using the tilt detection device 130, and then to use the other detection devices (150, 160, 170, 18).
(0, 190) can be extremely stably performed. Therefore, the judgment circuits 132, 152, 162, 172, 19
2 can be set to a higher value, and it becomes possible to provide an exposure apparatus having a wide allowable range for vibration such as an earthquake.

In the embodiment shown in FIG. 1, as the active actuator of the base posture adjusting device 200, the vibration isolator 3a, 3b associated with the horizontal movement of the base isolation base 2 is used.
Is used alone, it is difficult to perform feedback control to eliminate the inclination of the seismic isolation base 2 based on the value detected by the base inclination detection device 160 alone. Therefore, an embodiment for coping with this will be described with reference to FIGS.

FIG. 3 is a front view showing another embodiment of the base posture adjusting device. Here, only the horizontal portion 2a is shown as the seismic isolation base 2, and the exposure main body 6 is provided on the seismic isolation base 2 in the same manner as shown in FIG. Bases 31a, 31b, 31c are used to achieve both attitude (tilt) control and vibration suppression control of seismic isolation base 2.
, Seismic isolation devices 32a and 32b, and vibration isolation devices 33a and 33
b is used. The base 31c is a seismic isolation device 32
The anti-vibration devices 3a and 3b for the horizontal direction are interposed between the wall surface of the dent of the installation surface 1 and the base 31c via the a and 32b on the bottom surface of the dent of the installation surface 1. .
The bases 31a and 31b are erected on both ends of the base 31c. The horizontal portion 2a of the base isolation base 2 is
It is provided on the base 31c via a and 33b.

Reference numerals 30a and 30b denote a mechanism constituted by using a spring element and a damper element (for example, a laminated rubber, a leaf spring, a static pressure bearing, etc.). By adopting the vibration isolator 33a, a small relative displacement is generated between the base isolation base 2 and the bases 31a, 31b, 31c.
The inclination posture of the base isolation base 2 can be controlled to some extent by 33b.

As described above, in the embodiment shown in FIG. 3, the base posture adjusting device 200 (see FIG. 2) includes not only the anti-vibration devices 3a and 3b in the horizontal direction but also the anti-vibration devices in the vertical direction. Since the control device 120 includes the vibration devices 33a and 33b, the control circuit 120 can perform feedback control of the base attitude adjustment device 200 based on the value detected by the base tilt detection device 160 so that the base isolation base 2 is no longer tilted. .

The acceleration sensor 5 for detecting the vibration of the installation surface 1 includes an acceleration sensor 5c provided on the bottom surface of the recess of the installation surface 1 in addition to the acceleration sensors 5a and 5b. For example, acceleration due to ground vibration of the installation surface 1 is measured by the acceleration sensors 5a, 5b, 5c, and the signal can be used as a feed-forward signal in the first period for the vibration isolation control of the base-isolated base 2.

In this embodiment, the reference planes 24a and 24b for the base tilt detecting device 160 are the base-isolated base 2
Are set on the upper surface of the horizontal portion 2a, and the angle sensors 21a and 21b and the strain sensor 2
1′a and 21′b are provided. Further, the acceleration sensors 20a, 20a in the base acceleration detection device 170
b is provided on the upper surface of the base 31c.

FIG. 4 is a front view showing still another embodiment of the base posture adjusting device. Here, the bases 31a and 31b and the mechanisms 30a and 30b shown in FIG. 3 are omitted, and the anti-vibration devices 3a and 3b are used for the horizontal portion 2a of the base isolation base 2.
And the wall surface of the recess of the installation surface 1. Also,
Acceleration sensor 20 in base acceleration detection device 170
a and 20b are provided near the reference surfaces 24a and 24b, respectively.

According to this embodiment, a plurality of vibration isolators 33a and 33 acting in a direction perpendicular to the seismic isolation base 2 are also provided.
b, the control circuit 120 controls the base attitude adjusting device 200 based on the value detected by the base tilt detecting device 170 so that the base isolation base 2 is no longer tilted.
Can be feedback controlled.

FIG. 5 is a front view showing another embodiment of the exposure apparatus according to the present invention. Here, an acceleration sensor 5c is additionally provided as shown in FIGS. Also, in the embodiment shown in FIG.
In this embodiment, in contrast to the case where is provided by an integral structure, the base isolation base 2 is provided upright on the horizontal portion 2 a located in the recess of the installation surface 1 and on the edge of the horizontal portion 2. And the supporting columns 2b and 2c. In order to prevent the detection accuracy of the base tilt detection device 160 that operates on the base isolation base 2 provided by such an assembly from deteriorating, the base isolation base 2 is connected to the detection device 160. A reference plane 24c is set on the horizontal portion 2a of the angle sensor 21 corresponding to the reference plane 24c.
c and a strain sensor 21′c are additionally provided.
Furthermore, acceleration sensors 20a, 2 for the base isolation base 2
0b is changed to the vicinity of the angle sensors 21a and 21b, respectively.

The embodiment shown in FIG. 5 is particularly different from the embodiment shown in FIG. 1 in that vibration isolators 4'a and 4'b are additionally provided adjacent to the seismic isolation devices 4a and 4b, respectively. Is characterized by the fact that As described above, the base posture adjusting device 200 is provided with the vibration isolator 3a,
3b plus vibration isolator 4'a, 4'b for vertical direction
The control circuit 120 can perform feedback control of the base attitude adjustment device 200 based on the value detected by the base tilt detection device 170 so that the base isolation base 2 is no longer tilted.

In the embodiment described with reference to FIG. 2, the control of the attitude adjusting device 140 using the inclination detecting device 130 and other plural controls are combined, but the other plural controls are simultaneously performed. The present invention is not limited by implementation, and only a part thereof may be implemented.

For example, in still another embodiment of the exposure apparatus according to the present invention shown in FIG. 6, a base 2 'directly fixed to the installation surface 1 is used in place of the base isolation base 2, and accordingly, The anti-vibration and seismic isolation devices for the base 2 'and the associated detection devices have been omitted. According to this embodiment as well, the inclination of the exposure main body 6 with respect to a predetermined reference (for example, a vertical direction) can be detected, and the attitude adjustment device 140 can be controlled based on the detection result. An exposure apparatus which can be performed stably and has a wide allowable range against vibration such as an earthquake can be provided.

In the embodiment shown in FIG. 2, the judgment circuits 132, 152, 162, 17 for which the respective threshold values are set are set.
2, 192, the threshold value can be easily set for the servo signal of the feedback control. The servo signals for the feedback control include, for example, an acceleration signal related to the base acceleration detecting device 170, a relative position signal related to the relative distance detecting device 190, and a tilt posture signal related to the tilt detecting device 130. For example, since the stiffness of the exposure apparatus is weaker in the horizontal direction than in the vertical direction, the threshold value of the acceleration signal will be described in connection therewith. The maximum vibration damping force of the vibration isolator including the horizontal actuator 16 (the horizontal vibration of the exposure main body 6 is suppressed within the device specifications by this force) is F1, and the representative acceleration and the representative mass of the exposure main body 6 are respectively a1, m1, the representative acceleration and the representative mass of the base-isolated base 2 are respectively a2, m2
Then, the threshold value a0 of the acceleration can be calculated according to the following equation.

A0 = b · (F1− (m1 + m2) a2) / m1 where b is a safety constant, for example, its value is 0.8.

As shown in FIG. 7, in the horizontal direction, the arithmetic average value a1 of the outputs of the acceleration sensors 20a, 20b, 20c is compared with the acceleration threshold value a0 as a feedback signal. Is large, a signal for stopping the exposure main body 6 is generated.

The threshold values of the relative position signal and the tilt attitude signal are set in the same manner as in the case of the acceleration signal, depending on the accuracy required for the exposure apparatus and the possibility of hardware failure. For example, it can be set in advance by an experiment.

In the embodiment shown in FIG.
32, 152, 162, 172, 192 are the control circuit 12
0, the control circuit 1
When the exposure control circuit 20 and the exposure control circuit 110 are configured using a programmable computer, the function of each determination circuit may be obtained by the software.

The embodiments described above are described to facilitate understanding of the present invention, but are not described to limit the present invention. Therefore,
Each element disclosed in the above embodiment is intended to include all design changes and equivalents belonging to the technical scope of the present invention.

For example, in the above embodiment, the steps
Although the description has been given of the reduction projection type exposure apparatus of the AND scan method, the entire surface of the reticle pattern is irradiated with exposure illumination light while the reticle and the wafer are stationary, and the wafer on which the reticle pattern is to be transferred. Similarly, a step-up-repeat type reduction projection exposure apparatus (stepper) for batch exposure of the above one partitioned area (shot area), and an exposure apparatus of a mirror projection type, proximity type, contact type, etc. The present invention can be applied.

The present invention can also be applied to a step-and-stitch reduction projection type exposure apparatus using far ultraviolet light or vacuum ultraviolet light as exposure light. In this exposure apparatus, a circuit pattern to be formed on a substrate (for example, a reticle substrate) is enlarged by a reciprocal multiple of the reduction ratio, the enlarged pattern is divided into a plurality of parts, each of which is formed on a plurality of reticles. Each pattern of the reticle is projected in a reduced size, and is connected and transferred on a substrate. When transferring the pattern of each reticle onto the substrate, either a scanning exposure method or a static exposure method may be adopted. Further, the connecting portion may not be provided between a plurality of patterns transferred adjacently on the substrate. That is, the step-and-stitch method is to transfer a reticle pattern to a plurality of exposure areas that partially overlap on a substrate, regardless of the presence or absence of a pattern connection.

Further, a semiconductor device, a liquid crystal display,
An exposure apparatus for transferring a circuit pattern to a glass substrate or a silicon wafer for manufacturing a reticle or a mask, as well as an exposure apparatus used for manufacturing a plasma display, a thin-film magnetic head, and an imaging device (such as a CCD). The present invention can also be applied to That is, the present invention is applicable irrespective of the exposure method and application of the exposure apparatus.

As a light source of an exposure apparatus to which the present invention is applied
Is not particularly limited, and a KrF excimer laser (wavelength 24
8 nm), ArF excimer laser (wavelength 193 nm),
F₂ Laser (wavelength 157nm), Kr₂Laser (wavelength
146 nm), KrAr laser (wavelength 134 nm), A
r₂Laser (wavelength 126nm) can be used.
You.

Further, for example, a single-wavelength laser in the infrared or visible range oscillated from a DFB semiconductor laser or a fiber laser is amplified by a fiber amplifier doped with erbium (or both erbium and ytterbium). It is also possible to use a harmonic whose wavelength has been converted to ultraviolet light using a nonlinear optical crystal. Note that an ytterbium-doped fiber laser is used as the single-wavelength oscillation laser.

A reduction projection exposure apparatus using a soft X-ray having a wavelength of about 10 nm as a light source, and an X-ray projection apparatus using a light having a wavelength of about 1 nm as a light source.
Line exposure apparatus, electron beam (E
The present invention can also be applied to an exposure apparatus that performs exposure and drawing on a photosensitive substrate using B) or an ion beam.

In the meantime, the steps of designing the function and performance of the circuit of the semiconductor element, the steps of manufacturing a reticle and the step of manufacturing a silicon wafer based on the design step are performed by using the exposure apparatus described in the above embodiment. The reticle is manufactured through a step of transferring a reticle pattern onto a wafer, an assembling step (including a dicing step, a package step, and the like), an inspection step, and the like.

[0067]

As described above, according to the present invention,
The effect of stably performing control for image stabilization and providing an exposure apparatus having a wide allowable range for vibration such as an earthquake is produced. The effects obtained by the specific embodiment of the present invention are as described above, and the description thereof will be omitted.

[Brief description of the drawings]

FIG. 1 is a front view showing an embodiment of an exposure apparatus according to the present invention.

FIG. 2 is a block diagram showing an embodiment of a control system of the exposure apparatus according to the present invention.

FIG. 3 is a front view showing another embodiment of the base posture adjusting device.

FIG. 4 is a front view showing still another embodiment of the base posture adjusting device.

FIG. 5 is a front view showing another embodiment of the exposure apparatus according to the present invention.

FIG. 6 is a front view showing still another embodiment of the exposure apparatus according to the present invention.

FIG. 7 is a diagram for explaining an outline of threshold control in the embodiment of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Installation surface 2 ... Seismic isolation base 5, 20 ... Acceleration sensor 6 ... Exposure main body 7 ... 1st structure 8 ... Wafer stage 9 ... Wafer 10 ... Projection optical system 11 ... 2nd structure 12 ... Reticle stage 13 ... Reticle 14 Illumination optical system 15 Vertical actuator 16 Horizontal actuator 17, 21 Angle sensor 17 ', 21' Strain sensor 110 Exposure control circuit 120 Control circuit 130 Inclination detection device 140 Attitude adjustment device 150 ... installation surface vibration detection device 160 ... base inclination detection device 170 ... base acceleration detection device 180 ... main body acceleration detection device 190 ... relative distance detection device

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) H01L 21/30 516Z

Claims (21)

[Claims] 1. An exposure apparatus comprising an exposure main body for forming a pattern on a substrate, an inclination detection device for detecting an inclination of the exposure main body with respect to a predetermined reference, and an attitude adjustment for adjusting an attitude of the exposure main body. An exposure apparatus, comprising: an apparatus; and a control device that controls the attitude adjustment device based on a detection result of the tilt detection device. 2. The exposure apparatus according to claim 1, wherein the inclination detecting device includes a level gauge or a gyrometer. 3. The exposure apparatus according to claim 1, wherein the attitude adjusting device includes one of an electromagnetic actuator, an electro-hydraulic control actuator, an electric control fluid cylinder, and a piezoelectric element. 4. The apparatus according to claim 1, wherein the exposure main body is held on a base isolation base installed on an installation surface via a main body vibration isolator including the attitude adjusting device. The exposure apparatus according to claim 1. 5. The exposure apparatus according to claim 4, wherein the main body vibration isolator includes a spring or a damper. 6. The seismic isolation base is installed on the installation surface via a seismic isolation device that suppresses transmission of the vibration to the exposure main body when the installation surface vibrates. The exposure apparatus according to claim 4, wherein 7. The exposure apparatus according to claim 6, wherein the seismic isolation device includes at least one of a laminated rubber, a slide bearing, and a magnetic levitation device. 8. A base attitude adjusting device that adjusts the attitude of the seismic isolation base interposed between the seismic isolation base and the installation surface, and an installation surface vibration detection device that detects vibration of the installation surface. The control device is further configured to perform feedforward control of the base attitude adjustment device based on a value detected by the installation surface vibration detection device so as to suppress vibration transmitted to the seismic isolation base. An exposure apparatus according to claim 4. 9. A base attitude adjusting device interposed between the seismic isolation base and the installation surface for adjusting the attitude of the seismic isolation base, and a base for detecting an inclination of the seismic isolation base with respect to a predetermined reference. The apparatus according to claim 1, further comprising an inclination detection device, wherein the control device performs feedback control of the base attitude adjustment device based on a value detected by the base inclination detection device so as to eliminate the inclination of the base isolation base. 5. The exposure apparatus according to 4. 10. The exposure apparatus according to claim 9, wherein the base tilt detection device includes a level gauge or a gyrometer. 11. A base attitude adjusting device that adjusts the attitude of the seismic isolation base interposed between the seismic isolation base and the installation surface, and a base acceleration detection device that detects acceleration of the seismic isolation base. 5. The control device according to claim 4, wherein the control device performs feedback control of the base attitude adjustment device based on a value detected by the base acceleration detection device so as to attenuate the vibration of the base isolation base. 6. Exposure equipment. 12. The device according to claim 8, wherein the base posture adjusting device includes any one of an electromagnetic actuator, an electro-hydraulic control actuator, an electric control fluid cylinder, and a piezoelectric element. Exposure equipment. 13. An inclination sensor for detecting an angle between a predetermined reference plane and a vertical direction, and a distortion sensor for detecting a distortion of the reference plane. The exposure apparatus according to claim 1, wherein a detection result of the angle sensor is corrected based on an output of the distortion sensor. 14. The attitude adjusting device according to claim 1, further comprising a plurality of horizontal actuators for displacing the exposure main body in the horizontal direction, and a plurality of vertical actuators for displacing the exposure main body in the vertical direction. Claim 4
3. The exposure apparatus according to claim 1. 15. The apparatus according to claim 15, further comprising a main body acceleration detecting device for detecting a horizontal acceleration of the exposure main body portion, wherein the control device is configured to detect a horizontal acceleration of the exposure main body portion based on a value detected by the main body acceleration detecting device. The horizontal actuator is feedback-controlled so as to eliminate shaking, and the vertical actuator is feedback-controlled so as to eliminate the inclination of the exposure main body based on a value detected by the inclination detecting device. Claim 14
3. The exposure apparatus according to claim 1. 16. A relative distance detecting device for measuring a relative distance between a part of the exposure main body and a corresponding part of the seismic isolation base, wherein the control device is configured to control the relative distance by the relative distance detecting device. Based on the detected value, the horizontal actuator is feedback-controlled so that the relative distance is constant, and based on the detected value of the tilt detection device, the vertical actuator is configured to eliminate the tilt of the exposure main body. 15. The feedback control of
3. The exposure apparatus according to claim 1. 17. The exposure apparatus according to claim 1, wherein the operation is stopped when a value detected by the tilt detection device deviates from a predetermined threshold value. 18. The exposure apparatus according to claim 8, wherein the operation is stopped when a value detected by the installation surface vibration detection device deviates from a predetermined threshold value. 19. The exposure apparatus according to claim 9, wherein the operation is stopped when a value detected by the base tilt detection device deviates from a predetermined threshold value. 20. The exposure apparatus according to claim 11, wherein the operation is stopped when a value detected by the base acceleration detection device deviates from a predetermined threshold value. 21. The exposure apparatus according to claim 16, wherein the operation is stopped when a value detected by the relative distance detection device deviates from a predetermined threshold value.