JP2000329952A - Method and apparatus for manufacturing optical waveguide component - Google Patents
Method and apparatus for manufacturing optical waveguide componentInfo
- Publication number
- JP2000329952A JP2000329952A JP11136836A JP13683699A JP2000329952A JP 2000329952 A JP2000329952 A JP 2000329952A JP 11136836 A JP11136836 A JP 11136836A JP 13683699 A JP13683699 A JP 13683699A JP 2000329952 A JP2000329952 A JP 2000329952A
- Authority
- JP
- Japan
- Prior art keywords
- ultraviolet
- optical waveguide
- ultraviolet light
- light
- container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 62
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 34
- 238000000034 method Methods 0.000 title claims description 9
- 230000000737 periodic effect Effects 0.000 claims abstract description 35
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 22
- 239000007789 gas Substances 0.000 claims description 56
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 19
- 239000000835 fiber Substances 0.000 claims description 18
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 14
- 229910052731 fluorine Inorganic materials 0.000 claims description 11
- 239000011737 fluorine Substances 0.000 claims description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 10
- 239000001301 oxygen Substances 0.000 claims description 10
- 229910052760 oxygen Inorganic materials 0.000 claims description 10
- 229910052786 argon Inorganic materials 0.000 claims description 7
- 239000010409 thin film Substances 0.000 claims description 7
- 239000002019 doping agent Substances 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 239000001307 helium Substances 0.000 claims description 5
- 229910052734 helium Inorganic materials 0.000 claims description 5
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 5
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 2
- 239000013307 optical fiber Substances 0.000 abstract description 32
- 238000006552 photochemical reaction Methods 0.000 abstract description 10
- 229910052756 noble gas Inorganic materials 0.000 abstract description 2
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 12
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 239000010453 quartz Substances 0.000 description 7
- 229910052804 chromium Inorganic materials 0.000 description 6
- 239000011651 chromium Substances 0.000 description 6
- 229940119177 germanium dioxide Drugs 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 5
- 230000008878 coupling Effects 0.000 description 5
- 238000010168 coupling process Methods 0.000 description 5
- 238000005859 coupling reaction Methods 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 5
- ISQINHMJILFLAQ-UHFFFAOYSA-N argon hydrofluoride Chemical compound F.[Ar] ISQINHMJILFLAQ-UHFFFAOYSA-N 0.000 description 4
- 238000005253 cladding Methods 0.000 description 4
- 238000011049 filling Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- VZPPHXVFMVZRTE-UHFFFAOYSA-N [Kr]F Chemical compound [Kr]F VZPPHXVFMVZRTE-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 230000009102 absorption Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/02171—Refractive index modulation gratings, e.g. Bragg gratings characterised by means for compensating environmentally induced changes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
- G02B6/02133—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference
- G02B6/02138—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference based on illuminating a phase mask
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/02171—Refractive index modulation gratings, e.g. Bragg gratings characterised by means for compensating environmentally induced changes
- G02B6/02176—Refractive index modulation gratings, e.g. Bragg gratings characterised by means for compensating environmentally induced changes due to temperature fluctuations
- G02B6/02185—Refractive index modulation gratings, e.g. Bragg gratings characterised by means for compensating environmentally induced changes due to temperature fluctuations based on treating the fibre, e.g. post-manufacture treatment, thermal aging, annealing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Light Guides In General And Applications Therefor (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
Abstract
(57)【要約】
【課題】 光導波路の一部に回折格子等を形成するため
に出射される周期縞光が形成された紫外線と大気による
光化学反応を起こり難くして、製造条件の経時的変化を
少なくし、周期縞光を形成する位相格子等の寿命を延ば
す。
【解決手段】 エキシマレーザ4等の紫外線光源と位相
格子3等の紫外線周期縞形成手段とを備えた光導波路部
品の製造装置において、少なくとも、位相格子3等の紫
外線周期縞形成手段から、回折格子を形成する光ファイ
バ1等の光導波路部分を配置する光導波路配置箇所まで
の紫外線の通路領域を容器7に収容して、その容器7の
内部7aを希ガスと水蒸気の相対湿度30〜80%の混
合ガス雰囲気とする。
(57) [Problem] To prevent photochemical reaction between ultraviolet rays and periodic atmosphere formed with periodic fringe light emitted to form a diffraction grating or the like in a part of an optical waveguide, and to reduce the manufacturing conditions over time. The change is reduced, and the life of the phase grating or the like that forms the periodic stripe light is extended. In an apparatus for manufacturing an optical waveguide component having an ultraviolet light source such as an excimer laser 4 and an ultraviolet periodic fringe forming means such as a phase grating 3, at least a diffraction grating is formed from an ultraviolet periodic fringe forming means such as a phase grating 3. The ultraviolet ray passage region up to the optical waveguide disposing portion where the optical waveguide portion such as the optical fiber 1 forming the optical fiber 1 is arranged is accommodated in the container 7, and the inside 7a of the container 7 is made to have a relative humidity of noble gas and water vapor of 30 to 80%. Mixed gas atmosphere.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、光導波路の長手方
向の一部に回折格子を形成した光導波路部品の製造方法
及び製造装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for manufacturing an optical waveguide component having a diffraction grating formed in a part of the optical waveguide in a longitudinal direction.
【0002】[0002]
【従来の技術】二酸化ゲルマニウム等の感光性ドーパン
トをコア又はクラッドに含有する光ファイバの側面から
位相格子等の紫外線周期縞形成手段を通して紫外線の周
期縞光を照射することによって、コアの屈折率を変化さ
せて屈折率の周期的変調部分を作り、光ファイバの長手
方向の一部に回折格子を形成し光導波路部品とすること
が知られている。図7はその方法を説明する図であっ
て、図7(A)は装置の主要部を示す斜視図、図7
(B)はX方向の断面図である。図7において、31は
光ファイバ、31aはコア、32は位相格子、32aは
格子面、33は紫外線光源、33aは紫外線、33bは
紫外線の干渉光、34は回折格子である。2. Description of the Related Art A core or a clad containing a photosensitive dopant such as germanium dioxide is irradiated with ultraviolet periodic stripe light from a side surface of an optical fiber through an ultraviolet periodic stripe forming means such as a phase grating to reduce the refractive index of the core. It is known that an optical waveguide component is formed by changing the refractive index to form a periodically modulated portion of the refractive index and forming a diffraction grating in a part of the optical fiber in the longitudinal direction. FIG. 7 is a view for explaining the method. FIG. 7A is a perspective view showing a main part of the apparatus.
(B) is a sectional view in the X direction. In FIG. 7, 31 is an optical fiber, 31a is a core, 32 is a phase grating, 32a is a grating surface, 33 is an ultraviolet light source, 33a is ultraviolet light, 33b is interference light of ultraviolet light, and 34 is a diffraction grating.
【0003】位相格子32は、紫外線周期縞形成手段の
一例であって、石英板の表面に数千本から数万本の平行
した溝を刻んだ格子面32aを設けた板状物体である。
そして、その一方の面側に配置した紫外線光源33から
紫外線33aを照射し、位相格子32の格子面32aを
通過させることによって紫外線の周期縞光の一例である
紫外線の干渉光33bを得る。[0003] The phase grating 32 is an example of an ultraviolet periodic stripe forming means, and is a plate-like object provided with a grating surface 32a in which thousands to tens of thousands of parallel grooves are formed on the surface of a quartz plate.
Then, ultraviolet rays 33a are irradiated from an ultraviolet light source 33 disposed on one surface side of the light, and the ultraviolet rays 33a are passed through the grating surface 32a of the phase grating 32, thereby obtaining ultraviolet interference light 33b, which is an example of ultraviolet periodic stripe light.
【0004】位相格子32の他方の面側には格子面32
aの溝方向と垂直で格子面32aと平行になるように二
酸化ゲルマニウム等の感光性ドーパントをコア31aに
含有する光ファイバ31を配置して、光ファイバ31の
側面から紫外線の干渉光33bを照射する。また、光フ
ァイバの長手方向に形成される回折格子の部分が長い場
合は、紫外線光源33を光ファイバ31と平行に移動さ
せることがある。On the other surface of the phase grating 32, a grating surface 32
The optical fiber 31 containing a photosensitive dopant such as germanium dioxide in the core 31a is arranged so as to be perpendicular to the groove direction of a and parallel to the lattice plane 32a, and irradiate the interference light 33b of ultraviolet light from the side surface of the optical fiber 31. I do. When a portion of the diffraction grating formed in the longitudinal direction of the optical fiber is long, the ultraviolet light source 33 may be moved in parallel with the optical fiber 31.
【0005】光ファイバ31への干渉光33bの照射に
よって、コア31aの屈折率は干渉光33bの強度に応
じて変化するので、コアの長手方向の一部に屈折率が周
期的に変化した部分が形成される。なお、その部分は回
折格子34として機能を果たし、その光ファイバ31に
光を伝送すると、コアの屈折率の周期的変化に応じて特
定の波長の光が反射される。When the optical fiber 31 is irradiated with the interference light 33b, the refractive index of the core 31a changes in accordance with the intensity of the interference light 33b. Is formed. This portion functions as a diffraction grating 34, and when light is transmitted to the optical fiber 31, light of a specific wavelength is reflected according to a periodic change in the refractive index of the core.
【0006】[0006]
【発明が解決しようとする課題】紫外線光源としては、
クリプトンフロライド(KrF)エキシマレーザ(波長
247nm)、アルゴン2倍波レーザ(波長244n
m)、アルゴンフロライド(ArF)エキシマレーザ
(波長193nm)等が使用される。クリプトンフロラ
イド(KrF)エキシマレーザ(波長247nm)、ア
ルゴン2倍波レーザ(波長244nm)の場合、光ファ
イバ中のコアの二酸化ゲルマニウム添加だけでは紫外線
による屈折率変化の反応性が小さいため、光ファイバ中
に水素分子を高濃度で含浸させる必要がある。ところが
この場合、水素分子の浸透、拡散離脱の進行によって、
反応性が変わり回折格子としての反射波長のずれを生じ
る等の不具合を発生し易く、所望の反射波長を有する製
品としての生産性を向上させることが難しい。SUMMARY OF THE INVENTION As an ultraviolet light source,
Krypton fluoride (KrF) excimer laser (wavelength 247 nm), argon double wave laser (wavelength 244 n)
m), an argon fluoride (ArF) excimer laser (wavelength 193 nm) or the like is used. In the case of krypton fluoride (KrF) excimer laser (wavelength 247 nm) and argon second-harmonic laser (wavelength 244 nm), the reactivity of the refractive index change due to ultraviolet rays is small only by adding germanium dioxide to the core in the optical fiber. It is necessary to impregnate the inside with a high concentration of hydrogen molecules. However, in this case, the penetration of hydrogen molecules, the progress of diffusion and desorption,
The reactivity changes and a problem such as a shift in the reflection wavelength as a diffraction grating easily occurs, and it is difficult to improve the productivity as a product having a desired reflection wavelength.
【0007】一方、アルゴンフロライド(ArF)エキ
シマレーザ(波長193nm)の場合は、光ファイバの
コアに二酸化ゲルマニウムと共にP2O5を添加すること
によって、反応性を高めることが出来るが、このような
短い波長域では紫外線のパワーを数10mJ/cm2 程
度にまで上昇させると、紫外線と大気の光化学反応(O
2 の光分解・再結合によるオゾンの発生と、そのオゾン
による紫外線吸収)によって、製造条件が経時的に変化
するという問題がある。On the other hand, in the case of an argon fluoride (ArF) excimer laser (wavelength 193 nm), the reactivity can be increased by adding P 2 O 5 together with germanium dioxide to the core of the optical fiber. In a very short wavelength range, when the power of the ultraviolet light is increased to about several tens mJ / cm 2 , the photochemical reaction between the ultraviolet light and the atmosphere (O
(2 ) Generation of ozone due to photolysis and recombination and absorption of ultraviolet light by the ozone) causes a problem that manufacturing conditions change over time.
【0008】本発明は、紫外線と大気による光化学反応
を起こり難くし、アルゴンフロライド(ArF)エキシ
マレーザ等を用いた波長200nm以下の比較的波長の
短い波長域においても製造条件の経時的変化を少なくし
た光導波路部品の製造方法及び製造装置を提供するもの
である。The present invention makes it difficult for a photochemical reaction caused by ultraviolet light and the atmosphere to occur, and makes it possible to prevent a change in manufacturing conditions over time even in a relatively short wavelength range of 200 nm or less using an argon fluoride (ArF) excimer laser or the like. An object of the present invention is to provide a method and an apparatus for manufacturing an optical waveguide component with reduced number.
【0009】[0009]
【課題を解決するための手段】本発明の光導波路部品の
製造方法は、少なくとも感光性ドーパントを含有するコ
ア又はクラッドを備えた光導波路の該コアの長手方向の
一部に紫外線を照射して、該光導波路の屈折率を変化さ
せて光導波路部品を製造する方法において、前記紫外線
の通路領域の紫外線の周期縞光を形成する箇所から光導
波路に至るまでの領域を希ガスと水蒸気の相対湿度30
〜80%の混合ガス雰囲気とするものである。これによ
って、経時的な製造条件の変化を少なくすると共に紫外
線と大気との光化学反応を抑制し、光導波路に対する回
折格子形成の生産性を向上させる。According to the present invention, there is provided a method of manufacturing an optical waveguide component, comprising: irradiating at least a part of an optical waveguide having a core or a clad containing a photosensitive dopant in a longitudinal direction of the core with ultraviolet rays. In the method of manufacturing an optical waveguide component by changing the refractive index of the optical waveguide, the region from the portion where the ultraviolet periodic stripe light is formed in the ultraviolet passage region to the optical waveguide is formed by a relative gas and water vapor relative to each other. Humidity 30
A mixed gas atmosphere of about 80% is used. As a result, changes in manufacturing conditions over time are reduced, and a photochemical reaction between ultraviolet light and the atmosphere is suppressed, thereby improving the productivity of forming a diffraction grating on an optical waveguide.
【0010】この製造方法は、紫外線の通路領域の内少
なくとも該紫外線光源から出射した紫外線を周期縞光と
なす紫外線周期縞形成手段から該紫外線の周期縞光を照
射する対象物である光導波路を配置するための光導波路
配置箇所までを容器に収容して、該容器内を希ガスと水
蒸気の相対湿度30〜80%の混合ガス雰囲気とするこ
とによって実現出来る。In this manufacturing method, an optical waveguide which is an object to be irradiated with the periodic fringe light of the ultraviolet light from the ultraviolet periodic fringe forming means for converting the ultraviolet light emitted from the ultraviolet light source into the periodic fringe light out of at least the ultraviolet light passage region. This can be realized by housing a container up to the position where the optical waveguide is to be disposed, and setting the inside of the container to a mixed gas atmosphere of a relative humidity of a rare gas and water vapor of 30 to 80%.
【0011】また、紫外線光源から出射した紫外線を案
内し該紫外線を紫外線周期縞形成手段に照射する紫外線
出射端末部を有するライトガイドを設け、該紫外線出射
端末部から光導波路配置箇所に至る紫外線の通路領域を
容器に収容して、該容器内を希ガスと水蒸気の相対湿度
30〜80%の混合ガス雰囲気とすることによって、混
合ガスを満たす容器の大きさを小さくして、混合ガスの
充填量を減少させ、かつ紫外線光源を紫外線周期縞形成
手段を収容した容器から分離して紫外線光源の設備保守
を容易にすることが出来る。A light guide having an ultraviolet light emitting terminal for guiding ultraviolet light emitted from an ultraviolet light source and irradiating the ultraviolet light to the ultraviolet periodic stripe forming means is provided, and the ultraviolet light from the ultraviolet light emitting terminal to the optical waveguide arrangement location is provided. The passage area is accommodated in a container, and the inside of the container is made to be a mixed gas atmosphere of a relative humidity of 30 to 80% of a rare gas and water vapor, so that the size of the container that fills the mixed gas is reduced and the mixed gas is filled. The amount can be reduced and the ultraviolet light source can be separated from the container accommodating the ultraviolet periodic stripe forming means, so that maintenance of the equipment of the ultraviolet light source can be facilitated.
【0012】また、ライトガイドを、フッ素が添加され
た石英ガラスからなるコアとそれを覆うフッ素が添加さ
れた石英ガラスからなるクラッドを有し、クラッドのフ
ッ素添加量はコアのフッ素添加量よりも多い紫外線導波
ファイバでとするか、石英ガラスからなるパイプの内壁
面にアルミニウムの薄膜層を設けた中空導波路とするこ
とによって、ライトガイドの劣化を少なくし、大きなパ
ワーの紫外線を効率良く、紫外線光源から紫外線周期縞
形成手段に導くことが出来る。Further, the light guide has a core made of quartz glass to which fluorine is added and a clad made of quartz glass to which fluorine is added so as to cover the core. The amount of fluorine added to the clad is larger than the amount of fluorine added to the core. By using a large number of ultraviolet waveguide fibers or a hollow waveguide in which a thin film layer of aluminum is provided on the inner wall surface of a pipe made of quartz glass, deterioration of the light guide is reduced, and ultraviolet light of large power is efficiently used. The light can be guided from the ultraviolet light source to the ultraviolet periodic stripe forming means.
【0013】紫外線の波長帯域が140〜200nmの
場合、紫外線のパワーを大きくすると紫外線と大気との
光化学反応の発生が起きやすいが、紫外線の通過領域を
希ガスと水蒸気の混合ガスで満たすことによって、光化
学反応の発生を少なくすることが出来る。また、混合ガ
ス雰囲気中の酸素濃度を、1000体積ppm未満とす
ることによって、更に光化学反応の発生を抑えることが
可能になる。When the wavelength range of the ultraviolet light is 140 to 200 nm, a photochemical reaction between the ultraviolet light and the atmosphere tends to occur when the power of the ultraviolet light is increased. However, by filling the ultraviolet light passage region with a mixed gas of a rare gas and water vapor. And the occurrence of photochemical reactions can be reduced. Further, by setting the oxygen concentration in the mixed gas atmosphere to less than 1000 ppm by volume, it is possible to further suppress the occurrence of a photochemical reaction.
【0014】[0014]
【発明の実施の形態】図1は、本発明の光導波路部品の
製造装置の実施形態の主要部を示す断面図であって、1
は光ファイバ、2はクランプ、3は位相格子、4はエキ
シマレーザ、5は紫外線、6a、6b、6cはミラー、
7は容器、7aは容器の内部、7bは雰囲気ガス導入
口、7cは排気口、8はバブラー、9は希ガス供給装
置、10は水、11は酸素濃度・湿度測定装置、12は
測定光源、13はスペクトルアナライザである。FIG. 1 is a sectional view showing a main part of an embodiment of an optical waveguide component manufacturing apparatus according to the present invention.
Is an optical fiber, 2 is a clamp, 3 is a phase grating, 4 is an excimer laser, 5 is ultraviolet light, 6a, 6b and 6c are mirrors,
7 is a container, 7a is the inside of the container, 7b is an atmosphere gas inlet, 7c is an exhaust port, 8 is a bubbler, 9 is a rare gas supply device, 10 is water, 11 is an oxygen concentration / humidity measurement device, and 12 is a measurement light source. , 13 are spectrum analyzers.
【0015】光ファイバ1は光導波路の一例であって、
コアに少なくとも二酸化ゲルマニウム等の感光性ドーパ
ントを含有するものである。なお、光導波路の回折格子
を形成する部分は紫外線の周期縞光を照射するために光
導波路配置箇所に配置される。図1の場合は、2つのク
ランプ2が光導波路配置箇所を示す部材であって、クラ
ンプ2は光ファイバ1の長手方向の一部を直線状に保持
する。なお、光導波路配置箇所であるクランプ2は容器
7の内部7aに配置する。位相格子3は紫外線周期縞形
成手段の一例であって、石英板の表面に0.5μm程度
の幅の溝を溝幅とほぼ同じ間隔で平行に数千本乃至数万
本刻んだもので、位相格子3を通過する紫外線を回折さ
せて干渉光を作るものであって、容器7の内部7aに光
ファイバ1の直線状部分と平行に配置する。なお、位相
格子3の格子面の溝方向は光ファイバの方向と直角か又
は直角から所定角度傾けて配置する。The optical fiber 1 is an example of an optical waveguide,
The core contains at least a photosensitive dopant such as germanium dioxide. The portion of the optical waveguide where the diffraction grating is formed is arranged at the location where the optical waveguide is arranged in order to irradiate ultraviolet periodic stripe light. In the case of FIG. 1, the two clamps 2 are members indicating an optical waveguide disposition location, and the clamp 2 holds a part of the optical fiber 1 in the longitudinal direction in a straight line. In addition, the clamp 2 which is an optical waveguide arrangement location is disposed inside 7 a of the container 7. The phase grating 3 is an example of an ultraviolet periodic fringe forming means, and is formed by cutting thousands to tens of thousands of grooves having a width of about 0.5 μm on the surface of a quartz plate in parallel at substantially the same interval as the groove width. The interference light is generated by diffracting the ultraviolet light passing through the phase grating 3 and is arranged inside the container 7 in parallel with the linear portion of the optical fiber 1. The groove direction of the grating surface of the phase grating 3 is arranged at a right angle to the direction of the optical fiber or at a predetermined angle from the right angle.
【0016】エキシマレーザ3は紫外線光源の一例であ
って、例えば波長193nmの紫外線5を出射するアル
ゴンフロライド(ArF)エキシマレーザを使う。そし
て、エキシマレーザ3から出射した紫外線5を、ミラー
6a、6b、6cで位相格子3に照射するように導く。
また、光ファイバ1の長手方向に回折格子の形成箇所が
長い場合は、ミラー6cを光ファイバ1の長手方向に移
動可能とすることによって、紫外線の光ファイバ1への
照射範囲を広げることが出来る。なお、エキシマレーザ
4から光ファイバ1に至る紫外線5の通過領域は、容器
7の内部7aに収容する。The excimer laser 3 is an example of an ultraviolet light source, and uses, for example, an argon fluoride (ArF) excimer laser that emits ultraviolet light 5 having a wavelength of 193 nm. Then, the ultraviolet rays 5 emitted from the excimer laser 3 are guided so as to irradiate the phase grating 3 with mirrors 6a, 6b and 6c.
When the diffraction grating is formed in the longitudinal direction of the optical fiber 1 in a long position, the irradiation range of the ultraviolet light to the optical fiber 1 can be expanded by moving the mirror 6c in the longitudinal direction of the optical fiber 1. . The region through which the ultraviolet light 5 passes from the excimer laser 4 to the optical fiber 1 is accommodated in the inside 7 a of the container 7.
【0017】また、容器7の内部7aには、希ガスと水
蒸気との混合ガスを満たす。希ガスとしては、アルゴン
又はヘリウムが好ましい。空気中の窒素ガスは金属と反
応して窒化物を生成するので好ましくない。また、酸素
は分解・再結合によってオゾンとなり経時的に製造条件
の変化をもたらすので、出来るだけ少なくすることが望
ましい。容器の内部7aを空気から希ガスと水蒸気との
混合ガス雰囲気に完全に置換することは困難であるが、
容器の内部7aの酸素濃度を酸素濃度・湿度測定装置1
1にて測定し、1000体積ppm未満になるように制
御することが好ましい。酸素濃度が1000体積ppm
未満なら、製造条件の経時変化は実用的に問題のない範
囲に抑えることが出来る。The interior 7a of the container 7 is filled with a mixed gas of a rare gas and water vapor. As the rare gas, argon or helium is preferable. Nitrogen gas in air is not preferable because it reacts with metal to form nitride. Further, oxygen is converted into ozone by decomposition and recombination, and changes in production conditions with the passage of time. Therefore, it is desirable to reduce oxygen as much as possible. Although it is difficult to completely replace the interior 7a of the container from air with a mixed gas atmosphere of a rare gas and water vapor,
Oxygen concentration / humidity measuring device 1
It is preferable to measure at 1 and control to be less than 1000 ppm by volume. Oxygen concentration is 1000 volume ppm
If it is less than the above range, the change with time in the manufacturing conditions can be suppressed to a practically acceptable range.
【0018】また、希ガスと水蒸気の混合ガスの相対湿
度は30〜80%に範囲になるように、酸素濃度・湿度
測定装置11にて監視する。容器の内部7aを希ガスの
みで満たすと、湿度が低くなりすぎて、内部の部品類が
帯電し易くなり、浮遊塵埃が光導波路あるいは位相格子
等の光学部品に付着してそれが紫外線の吸収を起こし、
製品不良につながることがある。混合ガスの相対湿度を
30%以上とすると、このような帯電現象を抑えること
が出来る。The oxygen concentration / humidity measuring device 11 monitors the relative humidity of the mixed gas of the rare gas and the water vapor so as to be in the range of 30 to 80%. If the inside 7a of the container is filled only with a rare gas, the humidity becomes too low, and the components inside the container are easily charged, and floating dust adheres to optical components such as an optical waveguide or a phase grating, which absorbs ultraviolet rays. Cause
May lead to product failure. If the relative humidity of the mixed gas is 30% or more, such a charging phenomenon can be suppressed.
【0019】また、相対湿度が80%を超えると、結露
が起こり易くなり、装置劣化の原因になり易い。これら
から、容器の内部7aの雰囲気は希ガスと水蒸気の相対
湿度30〜80%の混合ガスで満たすことにする。な
お、容器の内部7aを混合ガス雰囲気とすることによっ
て、オゾン発生が抑制されるので、経時的にも製造条件
が安定する。また、位相格子の寿命も長くなり、大気中
での使用時に比較して位相格子の寿命は約5倍になる。On the other hand, when the relative humidity exceeds 80%, dew condensation tends to occur, which tends to cause deterioration of the apparatus. From these, the atmosphere inside the container 7a is filled with a mixed gas of a rare gas and water vapor having a relative humidity of 30 to 80%. Since the ozone generation is suppressed by setting the inside 7a of the container to a mixed gas atmosphere, the manufacturing conditions are stabilized over time. In addition, the life of the phase grating becomes longer, and the life of the phase grating becomes about five times as long as that when used in the atmosphere.
【0020】なお、希ガス供給装置9から希ガスを水1
0を入れたバブラー8を通して容器7の内部7aに雰囲
気ガス導入口7bを通して導くことによって、容器の内
部7aを希ガスと水蒸気との混合ガス雰囲気とすること
が出来る。なお、排気口7cには図示しない排気装置を
設置することも出来る。また、光ファイバ1の端末に
は、必要に応じて測定用光源12とスペクトルアナライ
ザ13を結合して、光ファイバ1を通る光の反射波長が
設計通りであるかを製造中においても監視することが出
来る。The rare gas is supplied from the rare gas supply device 9 to water 1
By introducing the atmosphere gas inlet 7b into the inside 7a of the container 7 through the bubbler 8 filled with 0, the inside 7a of the container can be made a mixed gas atmosphere of a rare gas and water vapor. Note that an exhaust device (not shown) can be provided in the exhaust port 7c. The terminal of the optical fiber 1 may be connected to the measuring light source 12 and the spectrum analyzer 13 as necessary to monitor whether the reflection wavelength of the light passing through the optical fiber 1 is as designed during the manufacturing. Can be done.
【0021】図1の光導波路部品の製造装置では、光導
波路として光ファイバ2を用いる例を示したが、光導波
路としては平面導波路を適用することも可能である。平
面導波路の場合も、コアに二酸化ゲルマニウム等の感光
性ドーパントを含有するものを用いて、平面導波路のコ
アが直線状になっている箇所を図1の光ファイバの位置
即ち光導波路配置箇所において、位相格子3等の紫外線
周期縞形成手段を通して周期縞光を平面導波路に照射す
ることによって、平面導波路のコアの一部に回折格子を
形成することが出来る。In the apparatus for manufacturing an optical waveguide component shown in FIG. 1, an example is shown in which the optical fiber 2 is used as the optical waveguide, but a planar waveguide can be applied as the optical waveguide. Also in the case of a planar waveguide, a core containing a photosensitive dopant such as germanium dioxide is used for the core, and the location where the core of the planar waveguide is linear is defined as the position of the optical fiber in FIG. In this case, the diffraction grating can be formed on a part of the core of the planar waveguide by irradiating the planar waveguide with periodic fringe light through the ultraviolet periodic fringe forming means such as the phase grating 3.
【0022】また図1では、紫外線周期縞形成手段とし
て位相格子3を用いる例を示したが、比較的粗い周期の
回折格子を光導波路に形成する長周期型回折格子の場合
は、位相格子の代わりに、強度変調マスクを紫外線周期
縞形成手段として使うことが出来る。図2(A)は位相
格子の横断面図、図2(B)は強度変調マスクの横断面
図であって、3は位相格子、3aは格子面、14は石英
基板、15は金属クロム膜、16は強度変調マスクであ
る。FIG. 1 shows an example in which the phase grating 3 is used as the ultraviolet periodic fringe forming means. However, in the case of a long-period type diffraction grating in which a diffraction grating having a relatively coarse period is formed in the optical waveguide, the phase grating is not used. Alternatively, an intensity modulation mask can be used as the ultraviolet periodic stripe forming means. 2A is a cross-sectional view of a phase grating, FIG. 2B is a cross-sectional view of an intensity modulation mask, 3 is a phase grating, 3a is a grating surface, 14 is a quartz substrate, and 15 is a chromium metal film. , 16 are intensity modulation masks.
【0023】位相格子3は石英板の表面に紙面に対して
垂直方向の溝が多数刻まれた格子面3aを設けたもので
あって、位相格子3を通過した紫外線を干渉させて干渉
光を得ることが出来る。溝の幅は約0.5μm程度、間
隔は約0.5μm程度で、数千本から数万本の溝が刻ま
れている。強度変調マスク16は、石英基板14の表面
に一定間隔で紙面に対して垂直方向に延びる金属クロム
膜15の複数本のストライプを配置したものであって、
強度変調マスク16を通過した紫外線は、金属クロム膜
15が形成された部分は遮蔽され、それ以外の部分を紫
外線は透過するので、紫外線の周期縞光が形成される。The phase grating 3 is provided with a grating surface 3a in which a number of grooves perpendicular to the plane of the drawing are formed on the surface of a quartz plate, and makes the ultraviolet light passing through the phase grating 3 interfere with the interference light. Can be obtained. The width of the groove is about 0.5 μm, the interval is about 0.5 μm, and thousands to tens of thousands of grooves are carved. The intensity modulation mask 16 has a plurality of stripes of a metal chromium film 15 arranged at regular intervals on the surface of a quartz substrate 14 and extending in a direction perpendicular to the plane of the drawing.
Ultraviolet rays that have passed through the intensity modulation mask 16 are blocked at the portion where the metal chromium film 15 is formed, and are transmitted through the other portions, so that periodic stripes of the ultraviolet light are formed.
【0024】なお、金属クロム膜15のストライプの幅
及び間隔は約200μm程度で、ストライプの本数は数
百本程度である。このような強度変調マスクも、大気中
で使用した場合、金属クロム膜が10分程度で消滅する
こともあるが、容器中の雰囲気を希ガスと水蒸気との混
合ガス雰囲気とすることによって、金属クロム膜の寿命
を100分以上に延ばすことが出来る。The width and interval of the stripes of the metal chromium film 15 are about 200 μm, and the number of stripes is about several hundreds. When such an intensity modulation mask is also used in the air, the metal chromium film may disappear in about 10 minutes. However, by setting the atmosphere in the container to a mixed gas atmosphere of a rare gas and water vapor, The life of the chromium film can be extended to 100 minutes or more.
【0025】また、位相格子を使わずに、ミラーを組み
合わせて、紫外線光源から出射された紫外線を分光しそ
れぞれの光路長を変えて集光することによっても干渉光
を形成することも可能である。このような場合は、その
干渉光を形成する一群のミラーが紫外線周期縞形成手段
となる。It is also possible to form interference light by combining mirrors without using a phase grating, dispersing ultraviolet rays emitted from an ultraviolet light source, and condensing the ultraviolet rays with different optical path lengths. . In such a case, a group of mirrors forming the interference light serves as ultraviolet periodic fringe forming means.
【0026】図3は、本発明の光導波路部品の製造装置
の他の実施形態の主要部を示す断面図であって、図1と
同じ符号は同じものを示す。17はライトガイド、18
は紫外線出射端末部、19は結合部、20は結合部収容
容器、20aは排気口である。図3の装置が図1の装置
と異なる点は、紫外線光源であるエキシマレーザ4から
出た紫外線5をライトガイド17を使って紫外線周期縞
形成手段である位相格子3に導く点で、エキシマレーザ
4及びライトガイド17の大部分を容器7の外部に配置
することによって、容器7の大きさを小さくして容器7
の内部7aに満たす混合ガスの量を少なくする。また、
エキシマレーザ4を容器7の外部に離して設置すること
が出来るので、エキシマレーザ4の設備保守が容易にな
る。FIG. 3 is a sectional view showing a main part of another embodiment of the optical waveguide component manufacturing apparatus according to the present invention, and the same reference numerals as those in FIG. 1 denote the same parts. 17 is a light guide, 18
Denotes an ultraviolet light emitting terminal, 19 denotes a coupling portion, 20 denotes a coupling container, and 20a denotes an exhaust port. The device of FIG. 3 differs from the device of FIG. 1 in that ultraviolet light 5 emitted from an excimer laser 4 as an ultraviolet light source is guided to a phase grating 3 as ultraviolet periodic fringe forming means using a light guide 17. By arranging most of the light guide 4 and the light guide 17 outside the container 7, the size of the container 7 is reduced, and
The amount of the mixed gas filled in the inside 7a is reduced. Also,
Since the excimer laser 4 can be installed separately from the outside of the container 7, facility maintenance of the excimer laser 4 is facilitated.
【0027】また、ライトガイド17の位相格子3側の
端末は、ライトガイド17を伝わってきた紫外線を平行
光とするためのレンズを備えた紫外線出射端末部18と
し、該紫外線出射端末部18は、光ファイバ1の長手方
向に移動出来るように図示しない移動ステージ等に取付
け、容器の内部7aに配置する。The terminal on the phase grating 3 side of the light guide 17 is an ultraviolet light emitting terminal 18 having a lens for converting the ultraviolet light transmitted through the light guide 17 into parallel light. The optical fiber 1 is attached to a moving stage or the like (not shown) so as to be movable in the longitudinal direction of the optical fiber 1, and is disposed inside the container 7a.
【0028】また、ライトガイド17のエキシマレーザ
4側の端末はエキシマレーザ4との結合部19を設けて
エキシマレーザ4から出た紫外線5をライトガイド17
に導く。なお、この結合部19も結合部収容容器20に
入れてその内部を希ガスと水蒸気との混合ガス雰囲気と
する。なお、必要に応じて排気口20aから排気する。
また、ライトガイド17は、容器7の壁面を貫通するよ
うに配置し、貫通部は気密を保持し得るように適宜シー
ルを行なう。The end of the light guide 17 on the side of the excimer laser 4 is provided with a coupling portion 19 with the excimer laser 4 so that the ultraviolet light 5 emitted from the excimer laser 4 is transmitted to the light guide 17.
Lead to. The connecting portion 19 is also placed in the connecting portion housing container 20 and the inside thereof is made a mixed gas atmosphere of a rare gas and water vapor. In addition, it exhausts from the exhaust port 20a as needed.
Further, the light guide 17 is disposed so as to penetrate the wall surface of the container 7, and the penetrating portion is appropriately sealed so as to maintain airtightness.
【0029】図4、図5は、それぞれライトガイドの事
例を示す横断面図であって、21は紫外線導波ファイ
バ、22はコア、23はクラッド、24は被覆、25は
中空導波路、26は薄膜層、27はパイプ、28は被
覆、29は中空部である。図4に示す紫外線導波ファイ
バ21は、フッ素が添加された石英ガラスからなるコア
22の周囲にフッ素を添加した石英からなるクラッド2
3の層を設け、クラッドのフッ素添加量はコアのフッ素
添加量よりも多くして、クラッド23の周囲に樹脂等か
らなる被覆24を施したものである。FIGS. 4 and 5 are cross-sectional views showing examples of light guides, respectively, 21 is an ultraviolet waveguide fiber, 22 is a core, 23 is a clad, 24 is a coating, 25 is a hollow waveguide, and 26 is a hollow waveguide. Is a thin film layer, 27 is a pipe, 28 is a coating, and 29 is a hollow portion. The ultraviolet waveguide fiber 21 shown in FIG. 4 has a cladding 2 made of quartz doped with fluorine around a core 22 made of quartz glass doped with fluorine.
In this example, the cladding 23 is provided with a coating 24 made of a resin or the like, in which three layers are provided, the amount of fluorine added to the cladding is larger than the amount of fluorine added to the core.
【0030】コアの外径は約180μm、クラッドの外
径は約200μm、被覆の外径は約300μmの紫外線
導波ファイバを使用することが出来る。なお、この紫外
線導波ファイバは、コア22及びクラッド23共にフッ
素が添加されているので、波長200nm以下の紫外線
を通しても、劣化が少なく設備としての寿命を長くする
ことが出来る。An ultraviolet waveguide fiber having an outer diameter of a core of about 180 μm, an outer diameter of a clad of about 200 μm, and an outer diameter of a coating of about 300 μm can be used. In addition, since both the core 22 and the clad 23 are doped with fluorine, the ultraviolet waveguide fiber is hardly deteriorated even when ultraviolet rays having a wavelength of 200 nm or less are passed, and the life of the equipment can be extended.
【0031】図5に示す中空導波路25は石英ガラスか
らなるパイプ27の内壁面にアルミニウムの薄膜層26
を設け、パイプ27の外側に樹脂等からなる被覆28を
設けたものであって、中心には中空部29が形成されて
いる。パイプ17の内径は約500μm、外径は約70
0μm、被覆28の外径は約800μmで、パイプ17
の内壁面に数nm程度の厚さのアルミニウムの薄膜層2
6を蒸着にて設けた中空導波路25を使用することが出
来る。The hollow waveguide 25 shown in FIG. 5 has an aluminum thin film layer 26 on the inner wall surface of a pipe 27 made of quartz glass.
And a coating 28 made of resin or the like is provided outside the pipe 27, and a hollow portion 29 is formed at the center. The inner diameter of the pipe 17 is about 500 μm and the outer diameter is about 70
0 μm, the outer diameter of the coating 28 is about 800 μm,
A thin film layer 2 of aluminum having a thickness of about several nm
A hollow waveguide 25 provided with 6 by vapor deposition can be used.
【0032】なお、中空導波路25は、外径1mm以下
の細いものであるので、相当の可撓性を有しており、容
易に曲げることが出来る。また、中空導波路25は、紫
外線のエネルギーが中空部29を反射しながら伝達され
るので、コアに石英ガラス等を使った紫外線導波ファイ
バに比べて劣化が少ない。中空導波路25の場合、中空
部29をアルゴン、ヘリウム等の希ガスで満たすことに
よって、更に中空導波路の劣化を抑えることが出来る。Since the hollow waveguide 25 is thin with an outer diameter of 1 mm or less, it has considerable flexibility and can be easily bent. In addition, since the energy of the ultraviolet light is transmitted while reflecting the hollow part 29, the hollow waveguide 25 is less deteriorated than an ultraviolet waveguide fiber using a quartz glass or the like for the core. In the case of the hollow waveguide 25, deterioration of the hollow waveguide can be further suppressed by filling the hollow portion 29 with a rare gas such as argon or helium.
【0033】また図6は、複数本の紫外線導波ファイバ
を使ってバンドル形状としたライトガイドの例を示す斜
視図であって、30は端末成形部である。図6の例は、
数百本の紫外線導波ファイバ21を束にして、その両端
では、紫外線導波ファイバ21を平行にしてまとめ、エ
ポキシ樹脂等で固めて端末成形部30を作る。端末成形
部30以外の部分では紫外線導波ファイバ21は互いに
固着されていないので、個別の紫外線導波ファイバと同
様に自由に曲げることが出来る。FIG. 6 is a perspective view showing an example of a light guide in a bundle shape using a plurality of ultraviolet waveguide fibers. Reference numeral 30 denotes a terminal forming portion. The example in FIG.
Hundreds of ultraviolet waveguide fibers 21 are bundled, and at both ends, the ultraviolet waveguide fibers 21 are gathered in parallel and solidified with an epoxy resin or the like to form a terminal molding 30. Since the ultraviolet waveguide fibers 21 are not fixed to each other in portions other than the terminal forming section 30, they can be bent freely like individual ultraviolet waveguide fibers.
【0034】また、図6では紫外線導波ファイバをバン
ドル形状とした例を示したが、中空導波路の場合も同様
にして複数本束にし、両端末に端末成形部を設けること
が出来る。なお、中空導波路の場合は、数十本を束にす
るもので十分である。また、バンドル形状にしたライト
ガイドは、それぞれの紫外線導波ファイバ又は中空導波
路に均一な紫外線の導光を行なわしめることが出来るの
で、紫外線照射端末部での紫外線の強度分布を均一化す
ることが出来る。FIG. 6 shows an example in which the ultraviolet waveguide fiber is formed into a bundle shape, but a hollow waveguide may be formed into a plurality of bundles in the same manner, and terminal molded portions may be provided at both ends. In the case of a hollow waveguide, it is sufficient to bundle several tens of them. In addition, since the light guide having a bundle shape can uniformly guide ultraviolet rays to each ultraviolet waveguide fiber or hollow waveguide, the intensity distribution of ultraviolet rays at the ultraviolet irradiation terminal portion can be made uniform. Can be done.
【0035】またバンドル形状のライトガイドの場合、
端末成形部の形状は、多数の紫外線導波ファイバ又は中
空導波路を配列して固めるので、断面の配列の仕方によ
って種々の形にすることが可能であり、断面を円形とし
たり、矩形としたり、長矩形としたりすることが出来
る。従って、照射対象となる光導波路部分の形状に応じ
て、その配列形状を決めることが可能で、例えば紫外線
出射端末部の側を長矩形断面形状としてその長手方向を
光ファイバの長手方向と合わせることによって、紫外線
出射端末部を光ファイバの長手方向に移動しなくても、
光ファイバの長手方向に長い回折格子の部分を形成する
ことも可能である。In the case of a bundle-shaped light guide,
Since the shape of the terminal forming portion is such that a number of ultraviolet waveguide fibers or hollow waveguides are arranged and solidified, it is possible to take various shapes depending on the arrangement of the cross section, and the cross section can be circular or rectangular. , Or a long rectangle. Therefore, it is possible to determine the arrangement shape according to the shape of the optical waveguide portion to be irradiated.For example, the side of the ultraviolet light emitting terminal portion has a long rectangular cross-sectional shape, and its longitudinal direction is aligned with the longitudinal direction of the optical fiber. Thereby, even if the ultraviolet light emitting terminal does not move in the longitudinal direction of the optical fiber,
It is also possible to form a portion of the diffraction grating that is long in the longitudinal direction of the optical fiber.
【0036】[0036]
【発明の効果】本発明の光導波路部品の製造方法は、光
導波路の長手方向の一部に紫外線の周期縞光を照射し
て、光導波路の屈折率を変化させて光導波路部品を製造
する方法であって、紫外線の通路領域の少なくとも一部
を希ガスと水蒸気の相対湿度30〜80%との混合ガス
雰囲気とするものである。これによって、紫外線と大気
との光化学反応を抑制し、オゾンによる製造条件の経時
的変化を少なくし、光導波路に対する回折格子形成の生
産性を向上させることが出来る。According to the method of manufacturing an optical waveguide component of the present invention, an optical waveguide component is manufactured by irradiating a part of the optical waveguide in the longitudinal direction with ultraviolet periodic stripe light to change the refractive index of the optical waveguide. In this method, at least a part of the ultraviolet ray passage area is a mixed gas atmosphere of a rare gas and a relative humidity of water vapor of 30 to 80%. As a result, it is possible to suppress the photochemical reaction between the ultraviolet light and the atmosphere, reduce the change over time of the manufacturing conditions due to ozone, and improve the productivity of forming a diffraction grating on the optical waveguide.
【0037】紫外線光源から光導波路に至る紫外線の通
路領域及びその間の装置部分の全体を容器内に収容し
て、該容器内を希ガスと水蒸気の相対湿度30〜80%
の混合ガス雰囲気とすることによって上記の製造方法を
達成することが出来るが、紫外線光源と紫外線出射端末
部をライトガイドで連結し、紫外線出射端末部から光導
波路配置箇所に至る紫外線の通路領域のみを容器内に収
容して、該容器内を希ガスと水蒸気の相対湿度30〜8
0%の混合ガス雰囲気とすることによって、混合ガスを
満たす容器の大きさを小さくして、混合ガスの充填量を
減少させ、かつエキシマレーザを分離してエキシマレー
ザの設備保守を容易にすることが出来る。The entire region of the ultraviolet light passage from the ultraviolet light source to the optical waveguide and the device between them are accommodated in a container, and the container is filled with a relative humidity of noble gas and water vapor of 30 to 80%.
The above manufacturing method can be achieved by using a mixed gas atmosphere of the above, but the ultraviolet light source and the ultraviolet light emitting terminal are connected by a light guide, and only the ultraviolet light passage region from the ultraviolet light emitting terminal to the optical waveguide arrangement location is provided. Is stored in a container, and the relative humidity of the rare gas and water vapor is 30 to 8 in the container.
By making the mixed gas atmosphere of 0%, the size of the container filled with the mixed gas is reduced, the filling amount of the mixed gas is reduced, and the excimer laser is separated to facilitate the maintenance of the excimer laser equipment. Can be done.
【0038】また、ライトガイドを、フッ素添加石英ガ
ラスからなるコアとフッ素添加石英ガラスからなるクラ
ッドとで形成した紫外線導波ファイバでとするか、石英
ガラスからなるパイプの内壁面にアルミニウムの薄膜層
を設けた中空導波路とすることによって、ライトガイド
の劣化を少なくし、大きなパワーの紫外線を効率良く導
くことが出来るようにすることが出来る。また、中空導
波路の場合、中空部にアルゴン又はヘリウムを満たすこ
とによって、更に中空導波路の劣化を抑えることが出来
る。The light guide may be an ultraviolet waveguide fiber formed of a core made of fluorine-doped quartz glass and a clad made of fluorine-doped quartz glass, or a thin film of aluminum may be formed on the inner wall surface of a pipe made of quartz glass. By using a hollow waveguide provided with a light guide, it is possible to reduce deterioration of the light guide and efficiently guide ultraviolet light having a large power. In the case of a hollow waveguide, the deterioration of the hollow waveguide can be further suppressed by filling the hollow portion with argon or helium.
【0039】紫外線の波長帯域が140〜200nmの
場合、紫外線のパワーを大きくすると光化学反応発生を
起こし易いが、紫外線の通過領域を希ガスと水蒸気との
混合ガス雰囲気とすることによって、それを防止するこ
とが出来る。また、混合ガス雰囲気中の酸素濃度を、1
000体積ppm未満とすることによって、更に光化学
反応の発生を抑えることが可能になる。In the case where the wavelength band of the ultraviolet light is 140 to 200 nm, a photochemical reaction is likely to occur when the power of the ultraviolet light is increased. However, this is prevented by setting the passage area of the ultraviolet light to a mixed gas atmosphere of a rare gas and water vapor. You can do it. Further, the oxygen concentration in the mixed gas atmosphere is set to 1
When the content is less than 000 ppm by volume, the occurrence of a photochemical reaction can be further suppressed.
【図1】本発明の光導波路部品の製造装置の実施形態の
主要部を示す断面図である。FIG. 1 is a cross-sectional view showing a main part of an embodiment of an optical waveguide component manufacturing apparatus according to the present invention.
【図2】(A)は位相格子の横断面図、(B)は強度変
調マスクの横断面図である。2A is a cross-sectional view of a phase grating, and FIG. 2B is a cross-sectional view of an intensity modulation mask.
【図3】本発明の光導波路部品の製造装置の他の実施形
態の主要部を示す断面図である。FIG. 3 is a sectional view showing a main part of another embodiment of the optical waveguide component manufacturing apparatus of the present invention.
【図4】本発明の光導波路部品の製造装置において使用
するライトガイドの例を示す横断面図である。FIG. 4 is a cross-sectional view showing an example of a light guide used in the optical waveguide component manufacturing apparatus of the present invention.
【図5】本発明の光導波路部品の製造装置において使用
するライトガイドの他の例を示す横断面図である。FIG. 5 is a cross-sectional view showing another example of the light guide used in the optical waveguide component manufacturing apparatus of the present invention.
【図6】ライトガイドをバンドル形状とした例を示す斜
視図である。FIG. 6 is a perspective view showing an example in which the light guide is formed in a bundle shape.
【図7】従来技術による光導波路部品の製造方法を説明
する図であって、(A)は装置の主要部の斜視図、
(B)はX方向の断面図である。7A and 7B are diagrams illustrating a method for manufacturing an optical waveguide component according to a conventional technique, wherein FIG. 7A is a perspective view of a main part of the device,
(B) is a sectional view in the X direction.
1:光ファイバ(光導波路の一例) 2:クランプ(光導波路配置箇所の一例) 3:位相格子(紫外線周期縞形成手段の一例) 3a:格子面 4:エキシマレーザ(紫外線光源の一例) 5:紫外線 6a、6b、6c:ミラー 7:容器 7a:容器の内部 7b:雰囲気ガス導入口 7c:排気口 8:バブラー 9:希ガス供給装置 10:水 11:酸素濃度・湿度測定装置 12:測定光源 13:スペクトルアナライザ 14:石英基板 15:金属クロム膜 16:強度変調マスク 17:ライトガイド 18:紫外線出射端末部 19:結合部 20:結合部収容容器 20a:排気口 21:紫外線導波ファイバ 22:コア 23:クラッド 24:被覆 25:中空導波路 26:薄膜層 27:パイプ 28:被覆 29:中空部 30:端末成形部 1: an optical fiber (an example of an optical waveguide) 2: a clamp (an example of an optical waveguide disposition location) 3: a phase grating (an example of an ultraviolet periodic stripe forming means) 3a: a grating surface 4: an excimer laser (an example of an ultraviolet light source) 5: Ultraviolet rays 6a, 6b, 6c: mirror 7: container 7a: inside of container 7b: atmosphere gas inlet 7c: exhaust port 8: bubbler 9: rare gas supply device 10: water 11: oxygen concentration / humidity measurement device 12: measurement light source 13: Spectrum analyzer 14: Quartz substrate 15: Metal chromium film 16: Intensity modulation mask 17: Light guide 18: Ultraviolet emission terminal 19: Coupling 20: Coupling container 20a: Exhaust port 21: Ultraviolet waveguide fiber 22: Core 23: Cladding 24: Coating 25: Hollow waveguide 26: Thin film layer 27: Pipe 28: Coating 29: Hollow part 30: Terminal forming part
フロントページの続き (72)発明者 茂原 政一 神奈川県横浜市栄区田谷町1番地 住友電 気工業株式会社横浜製作所内 (72)発明者 春本 道子 神奈川県横浜市栄区田谷町1番地 住友電 気工業株式会社横浜製作所内 Fターム(参考) 2H038 BA25 2H050 AB10Z AB67Y AC64 AC82 AC84 AD00 Continued on the front page (72) Inventor Seiichi Mohara 1st Tayacho, Sakae-ku, Yokohama-shi, Kanagawa Prefecture Sumitomo Electric Industries Co., Ltd. F-term (reference) in Yokohama, Ltd. 2H038 BA25 2H050 AB10Z AB67Y AC64 AC82 AC84 AD00
Claims (11)
コア又はクラッドを備えた光導波路の長手方向の一部に
紫外線を照射して、該光導波路の屈折率を変化させて光
導波路部品を製造する方法において、前記紫外線の通路
領域の紫外線の周期縞光を形成する箇所から光導波路に
至るまでの領域を希ガスと水蒸気の相対湿度30〜80
%の混合ガス雰囲気とすることを特徴とする光導波路部
品の製造方法。1. A method for manufacturing an optical waveguide component by irradiating at least a part of the optical waveguide provided with a core or clad containing a photosensitive dopant in the longitudinal direction with ultraviolet rays to change the refractive index of the optical waveguide. In the above, the region from the location where the ultraviolet periodic stripe light is formed in the ultraviolet ray passage area to the optical waveguide is formed, and the relative humidity of the rare gas and water vapor is 30 to 80.
% In a mixed gas atmosphere.
mの範囲にあることを特徴とする請求項1に記載の光導
波路部品の製造方法。2. The wavelength of the ultraviolet light is 140 to 200 n.
2. The method for manufacturing an optical waveguide component according to claim 1, wherein the value is in the range of m.
あることを特徴とする請求項1又は請求項2に記載の光
導波路部品の製造方法。3. The method for manufacturing an optical waveguide component according to claim 1, wherein the rare gas is argon or helium.
00体積ppm未満であることを特徴とする請求項1又
は請求項2に記載の光導波路部品の製造方法。4. An oxygen concentration of the mixed gas atmosphere is 10
The method for producing an optical waveguide component according to claim 1, wherein the amount is less than 00 ppm by volume.
た紫外線を周期縞光となす紫外線周期縞形成手段と、該
紫外線の周期縞光を照射する対象物である光導波路を配
置するための光導波路配置箇所と、前記紫外線光源から
前記光導波路配置箇所に至る紫外線の通路領域を収容す
る容器とを備え、該容器内を希ガスと水蒸気の相対湿度
30〜80%の混合ガス雰囲気とすることを特徴とする
光導波路部品の製造装置。5. An ultraviolet light source, an ultraviolet periodic stripe forming means for converting the ultraviolet light emitted from the ultraviolet light source into periodic stripe light, and an optical waveguide for arranging an optical waveguide to be irradiated with the ultraviolet periodic stripe light. A wave path arrangement portion, and a container for accommodating an ultraviolet passage region from the ultraviolet light source to the optical waveguide arrangement portion, wherein the inside of the container is a mixed gas atmosphere of a rare gas and water vapor having a relative humidity of 30 to 80%. An optical waveguide component manufacturing apparatus, comprising:
た紫外線を案内し該紫外線を紫外線周期縞形成手段に照
射する紫外線出射端末部を有するライトガイドと、該紫
外線出射端末部から出射された紫外線を周期縞光となす
紫外線周期縞形成手段と、該紫外線の周期縞光を照射す
る対象物である光導波路を配置するための光導波路配置
箇所と、前記ライトガイドの紫外線出射端末部から前記
光導波路配置箇所に至る紫外線の通路領域を収容する容
器とを備え、該容器内を希ガスと水蒸気の相対湿度30
〜80%の混合ガス雰囲気とすることを特徴とする光導
波路部品の製造装置。6. A light guide having an ultraviolet light source, an ultraviolet light emitting terminal for guiding ultraviolet light emitted from the ultraviolet light source and irradiating the ultraviolet light to the ultraviolet periodic stripe forming means, and an ultraviolet light emitted from the ultraviolet light emitting terminal. Means for forming a periodic fringe light, an optical waveguide arranging portion for arranging an optical waveguide which is an object to be irradiated with the ultraviolet periodic fringe light, and the light guide from an ultraviolet emitting end portion of the light guide. A container for accommodating an ultraviolet ray passage area reaching the wave path arrangement location, wherein the container is provided with a relative humidity of 30 for a rare gas and water vapor.
An apparatus for manufacturing an optical waveguide component, wherein a mixed gas atmosphere of about 80% is used.
波長は、140〜200nmの範囲にあることを特徴と
する請求項5又は請求項6に記載の光導波路部品の製造
装置。7. The apparatus according to claim 5, wherein a wavelength of the ultraviolet light emitted from the ultraviolet light source is in a range of 140 to 200 nm.
た石英ガラスからなるコアとそれを覆うフッ素が添加さ
れた石英ガラスからなるクラッドとを有し、該クラッド
のフッ素添加量は該コアのフッ素添加量よりも多い紫外
線導波ファイバであることを特徴とする請求項6に記載
の光導波路部品の製造装置。8. The light guide has a core made of quartz glass to which fluorine is added, and a clad made of quartz glass to which fluorine is added so as to cover the core. 7. The apparatus for manufacturing an optical waveguide component according to claim 6, wherein the amount of the ultraviolet waveguide fiber is larger than the addition amount.
るパイプの内壁面にアルミニウムの薄膜層を設けた中空
導波路であることを特徴とする請求項6に記載の光導波
路部品の製造装置。9. The apparatus according to claim 6, wherein the light guide is a hollow waveguide in which an aluminum thin film layer is provided on an inner wall surface of a pipe made of quartz glass.
又はヘリウムを満たしたものであることを特徴とする請
求項9に記載の光導波路部品の製造装置。10. The apparatus of claim 9, wherein the hollow portion of the hollow waveguide is filled with argon or helium.
外線導波ファイバ又は複数本の前記中空導波路が束ねら
れたバンドル形状であることを特徴とする請求項8又は
請求項9に記載の光導波路部品の製造装置。11. The light guide according to claim 8, wherein the light guide has a bundle shape in which a plurality of the ultraviolet waveguide fibers or a plurality of the hollow waveguides are bundled. Wave component manufacturing equipment.
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|---|---|---|---|
| JP11136836A JP3067768B1 (en) | 1999-05-18 | 1999-05-18 | Method and apparatus for manufacturing optical waveguide component |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11136836A JP3067768B1 (en) | 1999-05-18 | 1999-05-18 | Method and apparatus for manufacturing optical waveguide component |
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| Publication Number | Publication Date |
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| JP2000329952A true JP2000329952A (en) | 2000-11-30 |
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|---|---|---|---|---|
| CN117826314A (en) * | 2023-11-17 | 2024-04-05 | 中国核动力研究设计院 | A high temperature resistant and radiation resistant fiber Bragg grating preparation system and method |
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| JP2023533186A (en) * | 2020-07-08 | 2023-08-02 | エーエスエムエル ネザーランズ ビー.ブイ. | Hollow-core fiber-based broadband radiation generator with long fiber lifetime |
| JP7493063B2 (en) | 2020-07-08 | 2024-05-30 | エーエスエムエル ネザーランズ ビー.ブイ. | Hollow-core fiber-based broadband radiation generator with long fiber lifetime |
| US12399313B2 (en) | 2020-07-08 | 2025-08-26 | Asml Netherlands | Hollow-core fiber based broadband radiation generator with extended fiber lifetime |
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| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |