JP2000323485A - Heating device - Google Patents
Heating deviceInfo
- Publication number
- JP2000323485A JP2000323485A JP11132353A JP13235399A JP2000323485A JP 2000323485 A JP2000323485 A JP 2000323485A JP 11132353 A JP11132353 A JP 11132353A JP 13235399 A JP13235399 A JP 13235399A JP 2000323485 A JP2000323485 A JP 2000323485A
- Authority
- JP
- Japan
- Prior art keywords
- container
- heater
- closed
- lid
- heated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はガラス基板などの半
導体材料、加工素材などの熱処理に使用する加熱装置に
係り、特に加圧状態で加熱する加熱装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a heating apparatus used for heat treatment of a semiconductor material such as a glass substrate, a processing material, and the like, and more particularly to a heating apparatus for heating under pressure.
【0002】[0002]
【従来の技術】シリコンウエハや基板上に形成された半
導体膜を処理するためのアニール炉、拡散炉、酸化炉や
膜を形成するための減圧CVD(Chemical Vapor Depos
ition)等の加熱炉が従来から多く用いられている。近
年、これらの加熱炉は、装置の省スペース化を図るため
反応管を横置きするタイプに代わり縦置きするタイプ
(例えば、特開平8−8194の図3に開示されてい
る。)が主流となっている。また、酸化炉においては反
応容器内ガス雰囲気を高圧することによって、圧力に依
存した高い反応レートを得ることができる(例えば、特
開昭53−112064、特開昭56−24938に開
示されている。)ことも知られている。また、近年、液
晶ディスプレイ等に大面積角型ガラス基板が用いられる
ため、従来の丸型シリコンウエハに代わって大面積角型
ガラス基板を処理する装置が求められている。2. Description of the Related Art Annealing furnaces, diffusion furnaces, and oxidizing furnaces for processing semiconductor films formed on silicon wafers and substrates, and low-pressure CVD (chemical vapor deposition) for forming films.
)) has been widely used in the past. In recent years, the mainstream of these heating furnaces is a type in which a reaction tube is placed vertically instead of a type in which a reaction tube is placed horizontally (for example, disclosed in FIG. 3 of JP-A-8-8194) in order to save space in the apparatus. Has become. In the oxidation furnace, a high reaction rate depending on the pressure can be obtained by increasing the pressure of the gas atmosphere in the reaction vessel (for example, disclosed in JP-A-53-112064 and JP-A-56-24938). .) Is also known. In recent years, since a large-area square glass substrate is used for a liquid crystal display or the like, an apparatus for processing a large-area square glass substrate instead of a conventional round silicon wafer is required.
【0003】図4は従来の加熱装置の断面図である。図
において1は、加工素材などの被加熱物である。なお、
酸化炉など加熱中に反応ガスを導入する場合は、被加熱
物は内部の汚染防止のため石英などで製作される密閉さ
れた反応容器内に収容し、反応容器内に反応ガスを導入
する。反応ガスを高圧にする場合には、反応容器内外の
圧力を等しくするため反応容器外にも高圧空気を導入す
る。FIG. 4 is a sectional view of a conventional heating device. In the figure, reference numeral 1 denotes an object to be heated such as a processing material. In addition,
When introducing a reaction gas during heating in an oxidation furnace or the like, the object to be heated is housed in a sealed reaction vessel made of quartz or the like to prevent internal contamination, and the reaction gas is introduced into the reaction vessel. When the pressure of the reaction gas is increased, high-pressure air is introduced outside the reaction vessel to equalize the pressure inside and outside the reaction vessel.
【0004】2はヒータ容器で被加熱物1に上から被せ
るように囲繞し、下部が解放され、上部が密閉された竪
型円筒状で、内面にヒータ2aが貼付してある。2bは
下部ヒータで、上記ヒータ容器2の下端からわずかに離
れて下方に設けられ、被加熱物1を下から加熱するよう
になっており、上面にヒータ2aが埋め込まれている。
3は密閉容器で、竪型円筒状で上部容器3aと下部容器
3bとからなり、これらがフランジ3cにより連結され
ており、被加熱物1の出し入れのため開放可能になって
いる。なお、3dはOリングなどのシールである。4は
密閉容器3の外面に取付けられた冷却ジャケットであ
る。密閉容器内には1〜50気圧の気体を封入すること
ができる。[0004] Reference numeral 2 denotes a heater container which surrounds the object 1 so as to cover the object to be heated 1 from above, has a lower part opened, and a closed upper part, and has a heater 2a adhered to the inner surface thereof. Reference numeral 2b denotes a lower heater, which is provided slightly below and below the lower end of the heater container 2 so as to heat the object 1 to be heated from below, and has a heater 2a embedded in the upper surface.
Numeral 3 denotes a closed container, which is a vertical cylinder and comprises an upper container 3a and a lower container 3b, which are connected by a flange 3c, and which can be opened for taking in and out the object 1 to be heated. 3d is a seal such as an O-ring. Reference numeral 4 denotes a cooling jacket attached to the outer surface of the closed container 3. A gas at 1 to 50 atm can be sealed in the closed container.
【0005】この加熱装置で被加熱物を加熱して熱処理
するやり方を説明する。密閉容器3を開放して被加熱物
1を挿入し、再び密閉し、ヒータ2aにより加熱を開始
する。加熱装置内は昇温し、所定の熱処理温度、例えば
600℃まで昇温したら、その温度を所定時間保持して
熱処理を行う。熱処理が完了したら冷却ジャケット4に
通水して自然冷却し、例えば内部が200℃程度まで冷
却したら、通水を止め、密閉容器3を開放し、被加熱物
1を装置内から取り出す。[0005] A method of heating an object to be heated by this heating apparatus and performing heat treatment will be described. The sealed container 3 is opened, the object 1 to be heated is inserted, the container is closed again, and heating is started by the heater 2a. After the temperature inside the heating device is increased to a predetermined heat treatment temperature, for example, 600 ° C., the heat treatment is performed while maintaining the temperature for a predetermined time. When the heat treatment is completed, water is passed through the cooling jacket 4 to cool it naturally. For example, when the inside is cooled to about 200 ° C., the water flow is stopped, the closed vessel 3 is opened, and the object to be heated 1 is taken out of the apparatus.
【0006】[0006]
【発明が解決しようとする課題】このように被加熱物1
の熱処理をするのに、所定時間一定温度に保つ必要があ
る。しかし、ヒータ容器2内部では高温の気体は軽く、
ヒータ容器1の上部に集り、低温の気体は重くヒータ容
器下部に集るので、被加熱物の均熱化が図れない。ま
た、熱処理温度から被加熱物1を取り出す温度まで冷却
するのに対流が起りにくく伝熱による熱の放出にたよっ
ているため長時間かかり、熱処理のサイクルが長くなっ
て生産性が低下してしまう。The object to be heated 1
It is necessary to maintain a constant temperature for a predetermined time in order to perform the heat treatment. However, the high-temperature gas is light inside the heater container 2,
Since the low-temperature gas is collected at the upper portion of the heater container 1 and the low-temperature gas is heavily collected at the lower portion of the heater container, the object to be heated cannot be equalized in temperature. Further, it takes a long time to cool from the heat treatment temperature to the temperature at which the article 1 to be heated is taken out because heat is hardly generated due to convection and heat is released due to heat transfer, and the heat treatment cycle becomes longer and productivity is reduced. .
【0007】本発明は従来の加熱装置のかかる問題点に
鑑み案出されたもので、被加熱物の均熱性を高めて品質
向上を図るとともに、冷却時間を短縮して生産性の向上
を図ることができる熱処理装置を提供することを目的と
する。The present invention has been devised in view of the above-mentioned problems of the conventional heating apparatus, and aims to improve the quality by improving the uniformity of the object to be heated, and to improve the productivity by shortening the cooling time. It is an object of the present invention to provide a heat treatment apparatus that can perform the heat treatment.
【0008】[0008]
【課題を解決するための手段】上記目的を達成するた
め、本発明の加熱装置は被加熱物に上から被せるように
囲繞し、下部が開放され上部が密閉された竪型円筒状で
内面にヒータが貼付してあるヒータ容器と、上記ヒータ
容器の下端からわずかに離れて下方に設けられ、被加熱
物を下から加熱する下部ヒータと、ヒータ容器に上から
被せるように囲繞し、下部が開放され上部が密閉された
竪型円筒状のシールド容器と、これらを収容する竪型円
筒状で底部が開放可能な密閉容器とを有してなる加熱装
置であって、上記ヒータ容器と上記シールド容器の天井
中心には、同心状に孔があけられているとともに、それ
らの孔を塞ぐ昇降可能な蓋が設けられていて、蓋が最下
位置にあるときには、ヒータ容器の孔が塞がれており、
蓋が中間位置にあるときにはヒータ容器の孔は開き、シ
ールド容器の孔が塞がれており、蓋が最上位置にあると
きには、ヒータ容器の孔とシールド容器の孔は共に開い
ているようになっている。Means for Solving the Problems To achieve the above object, a heating apparatus according to the present invention surrounds an object to be heated so as to cover the object to be heated from above, and has a vertical cylindrical shape in which a lower part is opened and an upper part is closed. A heater container to which a heater is attached, a lower heater provided slightly below the lower end of the heater container to heat the object to be heated from below, and a lower portion surrounding the heater container so as to cover the heater container from above; A heating device comprising: a vertical cylindrical shielded container which is open and the top is closed; and a vertical cylindrical closed container capable of opening the bottom and housing the heater container and the shield. Holes are formed concentrically at the center of the ceiling of the container, and a lid that can be moved up and down to close those holes is provided.When the lid is at the lowest position, the holes in the heater container are closed. And
When the lid is in the middle position, the hole in the heater container is open and the hole in the shield container is closed, and when the lid is at the uppermost position, both the hole in the heater container and the hole in the shield container are open. ing.
【0009】密閉容器内には、1〜50気圧の気体が封
入されていると熱処理時間の短縮が図れるので好まし
い。It is preferable that a gas at 1 to 50 atm is sealed in the closed container, because the heat treatment time can be shortened.
【0010】密閉容器の外面には、冷却ジャッケトが取
り付けられているのが好ましい。[0010] A cooling jacket is preferably attached to the outer surface of the closed vessel.
【0011】以下、本発明の作用を説明する。密閉容器
を開放して被加熱物を挿入し、再び密閉し、ヒータによ
り加熱を開始する。加熱装置内は所定の熱処理温度まで
昇温する。この間蓋は最下位置にあってヒータ容器の孔
が塞がれている。したがって、加熱装置内での対流はほ
とんど起らず、放熱量が少いので速やかに昇温する。Hereinafter, the operation of the present invention will be described. The sealed container is opened, an object to be heated is inserted, the container is closed again, and heating is started by the heater. The temperature inside the heating device is raised to a predetermined heat treatment temperature. During this time, the lid is at the lowermost position and the hole of the heater container is closed. Therefore, convection hardly occurs in the heating device, and the amount of heat radiation is small, so that the temperature rises quickly.
【0012】所定の熱処理温度に到達したらその温度を
所定時間保持した熱処理を行う。この間蓋は中間位置に
あって、ヒータ容器の孔は開き、シールド容器の孔が塞
がれている。ヒータ容器内では加熱された高温の気体は
ヒータ容器内を上昇し、ヒータ容器の孔を通って外部に
流出する。シールド容器の外側の密閉容器は低温なの
で、シールド容器の温度もヒータ容器内部よりも低温に
なっており、ヒータ容器から流出した高温の気体は冷さ
れて、ヒータ容器外側とシールド容器内側の隙間を下降
し、ヒータ容器下端から再びヒータ容器内に流入し、ヒ
ータ容器内で加熱されて上昇する。このように対流が行
われるため、ヒータ容器内の温度は、従来の加熱装置の
ように上方が高温で下方が低温になるようなことがな
く、均熱化が図れる。When a predetermined heat treatment temperature is reached, heat treatment is performed while maintaining the temperature for a predetermined time. The lid is in the middle position, the hole in the heater container is open, and the hole in the shield container is closed. In the heater container, the heated high-temperature gas rises in the heater container and flows out through the hole of the heater container. Since the temperature of the sealed container outside the shield container is low, the temperature of the shield container is also lower than the inside of the heater container, and the high-temperature gas flowing out of the heater container is cooled, and the gap between the heater container outside and the shield container inside is reduced. It descends, flows into the heater container again from the lower end of the heater container, is heated in the heater container, and rises. Since the convection is performed in this manner, the temperature inside the heater container can be equalized without having a high temperature in the upper portion and a low temperature in the lower portion as in the conventional heating device.
【0013】熱処理が完了したらヒータを切り、密閉容
器外面に取付けられた冷却ジャケットに通水する。この
間蓋は最上位置にあり、ヒータ容器の孔とシールド容器
の孔は共に開いている。ヒータ容器内で被加熱物により
昇温した気体はヒータ容器内を上昇し、ヒータ容器の孔
から外部に流出する。ヒータ容器から流出した気体の一
部はヒータ容器外側とシールド容器内側の隙間を下降
し、残部はシールド容器の孔から外部に流出する。シー
ルド容器から流出した気体は密閉容器内面が冷却ジャケ
ットにより低温になっているのでそこで冷され、シール
ド容器外面と密閉容器内面の隙間を下降する。シールド
容器の内面および外面の隙間を下降した低温の気体はヒ
ータ容器下端からヒータ容器内に流入し、被加熱物を冷
却しつつ昇温し、ヒータ容器内を上昇する。このように
対流が行われるため、被加熱物は急速に冷却される。When the heat treatment is completed, the heater is turned off, and water is passed through a cooling jacket attached to the outer surface of the closed vessel. The lid is at the uppermost position, and the hole in the heater container and the hole in the shield container are both open. The gas heated by the object to be heated in the heater container rises in the heater container and flows out of the heater container through the hole. Part of the gas flowing out of the heater container descends through the gap between the outside of the heater container and the inside of the shield container, and the remainder flows out of the hole of the shield container to the outside. The gas that has flowed out of the shield container is cooled there because the inner surface of the closed container is cooled by the cooling jacket, and descends through the gap between the outer surface of the shield container and the inner surface of the closed container. The low-temperature gas that has flowed down the gap between the inner surface and the outer surface of the shield container flows into the heater container from the lower end of the heater container, raises the temperature while cooling the object to be heated, and rises in the heater container. Since the convection is performed as described above, the object to be heated is rapidly cooled.
【0014】このように蓋の位置が最下位置、中間位
置、最上位置の3段階に変化するのに対応して、被加熱
物の昇温、均熱、冷却が行われるので、均熱化による品
質の向上と、昇温および冷却時間の短縮による生産性の
向上が図れる。In accordance with the change of the position of the lid in the three stages of the lowermost position, the intermediate position, and the uppermost position, the object to be heated is heated, soaked, and cooled. And the productivity can be improved by shortening the heating and cooling times.
【0015】[0015]
【発明の実施の形態】以下本発明の1実施形態につい
て、図面を参照しつつ説明する。図1は本発明の加熱装
置の断面図であり、蓋が最下位置にある状態を示してい
る。図2は同様の断面図で、蓋が中間位置にある状態を
示している。図3は同様の断面図で蓋が最上位置にある
状態を示している。なお、これらの図において、図4に
示した従来の加熱装置と共通の部分については、同一の
符号を付しており、重複した説明を省略する。これらの
図において、1は被加熱物である。2はヒータ容器であ
り、被加熱物1に上から被せるように囲繞し、下部が開
放され上部が密閉された竪型円筒状であり、内面にヒー
タ2aが貼付してある。2bは下部ヒータであり、ヒー
タ容器2の下端からわずかに離れて下方に設けられ、上
面にヒータ2aを有して被加熱物1を加熱する。5はシ
ールド容器であり、ヒータ容器2に上から被せるように
囲繞し、下部が開放され上部が密閉された竪型円筒状の
形状をしている。3は密閉容器であり、ヒータ容器2、
下部ヒータ2b、シールド容器5などを収容しており、
竪型円筒状の形状をしている。密閉容器3は、上部容器
3aと、下部容器3bとからなり、これらがフランジ3
cにより連結されていて、被加熱物1の出し入れのため
開放可能になっている。密閉容器3の外面には冷却ジャ
ケット4が取付けられている。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a cross-sectional view of the heating device of the present invention, showing a state where a lid is at a lowermost position. FIG. 2 is a similar cross-sectional view showing the state where the lid is at an intermediate position. FIG. 3 is a similar sectional view showing a state where the lid is at the uppermost position. In these figures, the same reference numerals are given to the same parts as those of the conventional heating device shown in FIG. 4, and duplicate description will be omitted. In these figures, reference numeral 1 denotes an object to be heated. Reference numeral 2 denotes a heater container, which is a vertical cylindrical shape which surrounds the object to be heated 1 so as to cover it from above, has a lower portion opened and an upper portion sealed, and has a heater 2a attached to an inner surface thereof. Reference numeral 2b denotes a lower heater, which is provided slightly below the lower end of the heater container 2 and has a heater 2a on the upper surface to heat the object 1 to be heated. Reference numeral 5 denotes a shield container, which has a vertical cylindrical shape that surrounds the heater container 2 so as to cover the heater container 2 from above, and has an open lower portion and a closed upper portion. Reference numeral 3 denotes a closed container, and the heater container 2,
It houses the lower heater 2b, the shield container 5, and the like,
It has a vertical cylindrical shape. The closed container 3 includes an upper container 3a and a lower container 3b.
c, and can be opened for taking in and out of the object 1 to be heated. A cooling jacket 4 is attached to the outer surface of the closed container 3.
【0016】2cはヒータ容器2の天井中心にあけられ
た孔であり、5aはシールド容器5の天井中心にあけら
れた孔であり、上下に同心状にあけられている。5bは
ヒータ容器2とシールド容器5とを連結するサポートで
ある。6は蓋であり、エアシリンダ6aのピストンロッ
ドに連結されたロッド6bの下端に固着されている。ロ
ッド6bは密閉容器3の上部容器3aの天井中心にあけ
られた孔3eを上下に摺動可能に貫通している。3fは
シールである。蓋6はエアシリンダ6aにより昇降す
る。蓋6が最下位置にあるときにはヒータ容器2の孔2
cが塞がれており、蓋6が中間位置にあるときにはヒー
タ容器2の孔2cに開き、シールド容器5の孔5aが塞
がれており、蓋6が最上位置にあるときにはヒータ容器
2の孔2cとシールド容器5の孔5aは共に開いている
ようになっている。Reference numeral 2c denotes a hole formed in the center of the ceiling of the heater container 2, and reference numeral 5a denotes a hole formed in the center of the ceiling of the shield container 5, which is vertically and concentrically formed. 5b is a support connecting the heater container 2 and the shield container 5. Reference numeral 6 denotes a lid, which is fixed to a lower end of a rod 6b connected to a piston rod of an air cylinder 6a. The rod 6b penetrates a hole 3e formed in the center of the ceiling of the upper container 3a of the closed container 3 so as to be slidable up and down. 3f is a seal. The lid 6 is moved up and down by an air cylinder 6a. When the lid 6 is at the lowermost position, the hole 2 of the heater container 2
c is closed, and when the lid 6 is at the intermediate position, it opens to the hole 2c of the heater container 2, and when the lid 6 is at the uppermost position, the hole 5a of the shield container 5 is closed. The hole 2c and the hole 5a of the shield container 5 are both open.
【0017】以下、本実施形態の作用を説明する。密閉
容器3を開放して被加熱物を挿入し、再び密閉し、ヒー
タ2aにより加熱を開始する。加熱装置内は所定の熱処
理温度まで昇温する。この間蓋6は図1に示すように最
下位置にあってヒータ容器2の孔2cが塞がれている。
したがって、加熱装置内での対流はほとんど起らず、放
熱量が少いので速やかに昇温する。The operation of this embodiment will be described below. The sealed container 3 is opened, the object to be heated is inserted, the container is closed again, and heating is started by the heater 2a. The temperature inside the heating device is raised to a predetermined heat treatment temperature. The lid 6 is located at the lowermost position as shown in FIG. 1, and the hole 2c of the heater container 2 is closed.
Therefore, convection hardly occurs in the heating device, and the amount of heat radiation is small, so that the temperature rises quickly.
【0018】所定の熱処理温度に到達したら、その温度
を所定時間保持して熱処理を行う。この間蓋6は図2に
示すように中間位置にあってヒータ容器2の孔2cは開
き、シールド容器5の孔5aが塞がれている。ヒータ容
器2内では、加熱された高温の気体は矢印で示すように
ヒータ容器2内を上昇し、ヒータ容器2の孔2cを通っ
て外部に流出する。シールド容器5の外側の密閉容器3
は低温なので、シールド容器5の温度もヒータ容器2内
部よりも低温になっており、ヒータ容器2から流出した
高温の気体は冷されて、ヒータ容器2外側とシールド容
器5内側の隙間7を下降し、ヒータ容器2下端から再び
ヒータ容器2内に流入し、ヒータ容器2内で加熱されて
上昇する。このように、対流が行われるためヒータ容器
2内の温度は、従来の加熱装置のように上方が高温で下
方が低温になるようなことがなく、均熱化が図れる。When a predetermined heat treatment temperature is reached, the heat treatment is performed while maintaining the temperature for a predetermined time. As shown in FIG. 2, the lid 6 is located at an intermediate position, the hole 2c of the heater container 2 is opened, and the hole 5a of the shield container 5 is closed. In the heater container 2, the heated high-temperature gas rises in the heater container 2 as indicated by an arrow, and flows out through the hole 2 c of the heater container 2. Closed container 3 outside shield container 5
Is low, the temperature of the shield container 5 is also lower than that of the inside of the heater container 2, and the high-temperature gas flowing out of the heater container 2 is cooled and descends through the gap 7 between the outside of the heater container 2 and the inside of the shield container 5. Then, it flows into the heater container 2 again from the lower end of the heater container 2 and is heated in the heater container 2 and rises. As described above, since the convection is performed, the temperature in the heater container 2 does not become high in the upper part and low in the lower part as in the conventional heating device, and the uniform temperature can be achieved.
【0019】熱処理が完了したらヒータ2aを切り、密
閉容器3外面に取付けられた冷却ジャケット4に通水す
る。この間蓋6は図3に示すように最上位置にあり、ヒ
ータ容器2の孔2cとシールド容器5の孔5aは共に開
いている。ヒータ容器2内で被加熱物により昇温した気
体はヒータ容器2内を上昇し、ヒータ容器2の孔2cか
ら外部に流出する。ヒータ容器2から流出した気体の一
部は、ヒータ容器2外側とシールド容器5内側の隙間7
を下降し、残部はシールド容器5の孔5cから外部に流
出する。シールド容器5から流出した気体は密閉容器3
内面が冷却ジャケット4により低温になっているのでそ
こで冷され、シールド容器5外面と密閉容器3内面の隙
間8を下降する。シールド容器5の内面および外面の隙
間7、8を下降した低温の気体はヒータ容器2下端から
ヒータ容器2内に流入し、被加熱物を冷却しつつ昇温
し、ヒータ容器2内を上昇する。このように対流が行わ
れるため、被加熱物1は急速に冷却される。When the heat treatment is completed, the heater 2a is turned off, and water is passed through the cooling jacket 4 attached to the outer surface of the closed vessel 3. The lid 6 is at the uppermost position as shown in FIG. 3, and the hole 2c of the heater container 2 and the hole 5a of the shield container 5 are both open. The gas heated by the object to be heated in the heater container 2 rises in the heater container 2 and flows out of the hole 2c of the heater container 2 to the outside. Part of the gas flowing out of the heater container 2 is generated by a gap 7 between the outside of the heater container 2 and the inside of the shield container 5.
And the remainder flows out of the hole 5c of the shield container 5 to the outside. The gas flowing out of the shield container 5 is
Since the inner surface is cooled by the cooling jacket 4, it is cooled there, and descends through the gap 8 between the outer surface of the shield container 5 and the inner surface of the closed container 3. The low-temperature gas that has flowed down the gaps 7 and 8 between the inner surface and the outer surface of the shield container 5 flows into the heater container 2 from the lower end of the heater container 2, raises the temperature while cooling the object to be heated, and rises inside the heater container 2. . Since the convection is performed as described above, the article to be heated 1 is rapidly cooled.
【0020】このように、蓋6の位置が最下位置、中間
位置、最上位置の3段階に変化するのに対応して、被加
熱物の昇温、均熱、冷却が行われるので、均熱化による
品質の向上と昇温および冷却時間の短縮による生産性の
向上が図れる。As described above, the temperature of the object to be heated is increased, soaked, and cooled in response to the change of the position of the lid 6 to the lowermost position, the intermediate position, and the uppermost position. It is possible to improve the quality by thermalization and the productivity by shortening the heating time and the cooling time.
【0021】本発明は以上述べた実施形態に限定される
ものではなく、発明の要旨を逸脱しない範囲で種々の変
更が可能である。例えば、酸化炉など熱処理中に反応ガ
スを導入する場合には、被加熱物は密閉された反応容器
内に収容し、反応容器内に反応ガスを導入するようにし
てもよい。また、図では密閉容器の天井と底は円板とし
て画かれているが、高圧容器とするためには皿形にする
ことが好ましい。The present invention is not limited to the embodiments described above, and various changes can be made without departing from the gist of the invention. For example, when introducing a reaction gas during heat treatment such as in an oxidation furnace, the object to be heated may be housed in a closed reaction vessel, and the reaction gas may be introduced into the reaction vessel. Further, although the ceiling and the bottom of the closed container are drawn as disks in the figure, it is preferable that the container is dish-shaped in order to form a high-pressure container.
【0022】[0022]
【発明の効果】以上、述べたように本発明の加熱装置は
ヒータ容器の外側にシールド容器を設け、ヒータ容器お
よびシールド容器の天井の中心に孔を明け、昇降可能な
蓋によって、それらの孔のいずれか一方を塞ぐか両方を
開くようにしたので、熱処理中の被加熱物の均熱化が図
れて品質が向上するとともに、昇温および冷却が急速に
行われて熱処理のサイクルタイムの短縮が図られ、加熱
装置の生産性が向上するなどの優れた効果を有する。As described above, in the heating device of the present invention, the shield container is provided outside the heater container, holes are formed in the center of the ceiling of the heater container and the shield container, and the holes are formed by the lid which can be raised and lowered. Either one of them is closed or both are opened, so that the quality of the material to be heated during heat treatment is improved and quality is improved, and the temperature rise and cooling are performed rapidly to shorten the cycle time of heat treatment. And has excellent effects such as improvement in the productivity of the heating device.
【図1】本発明の加熱装置の断面図であり、蓋が最下位
置の状態を示している。FIG. 1 is a cross-sectional view of a heating device of the present invention, showing a state where a lid is at a lowermost position.
【図2】本発明の加熱装置の断面図であり、蓋が中間位
置の状態を示している。FIG. 2 is a cross-sectional view of the heating device of the present invention, showing a state where a lid is at an intermediate position.
【図3】本発明の加熱装置の断面図であり、蓋が最上位
置の状態を示している。FIG. 3 is a cross-sectional view of the heating device of the present invention, showing a state where a lid is at an uppermost position.
【図4】従来の加熱装置の断面図である。FIG. 4 is a sectional view of a conventional heating device.
1 被加熱物 2 ヒータ容器 2a ヒータ 2b 下部ヒータ 2c 孔 3 密閉容器 4 冷却ジャケット 5 シールド容器 5a 孔 6 蓋 DESCRIPTION OF SYMBOLS 1 Heated object 2 Heater container 2a Heater 2b Lower heater 2c Hole 3 Airtight container 4 Cooling jacket 5 Shield container 5a Hole 6 Lid
Claims (3)
下部が開放され上部が密閉された竪型円筒状で内面にヒ
ータが貼付してあるヒータ容器と、上記ヒータ容器の下
端からわずかに離れて下方に設けられ、被加熱物を下か
ら加熱する下部ヒータと、ヒータ容器に上から被せるよ
うに囲繞し、下部が開放され上部が密閉された竪型円筒
状のシールド容器と、これらを収容する竪型円筒状で底
部が開放可能な密閉容器とを有してなる加熱装置であっ
て、上記ヒータ容器と上記シールド容器の天井中心には
同心状に孔があけられているとともに、それらの孔を塞
ぐ昇降可能な蓋が設けられていて、蓋が最下位置にある
ときにはヒータ容器の孔が塞がれており、蓋が中間位置
にあるときにはヒータ容器の孔は開き、シールド容器の
孔が塞がれており、蓋が最上位置にあるときには、ヒー
タ容器の孔とシールド容器の孔は共に開いているように
なっていることを特徴とする加熱装置。1. Surrounding an object to be heated so as to cover the object from above,
A heater container having a vertical cylindrical shape with an open lower portion and a closed upper portion and a heater attached to the inner surface, and a lower portion provided slightly below and slightly below the lower end of the heater container to heat an object to be heated from below. A heater, a vertical cylindrical shielded container surrounding the heater container so as to cover the heater container from above, and having a lower portion opened and an upper portion sealed, and a vertical cylindrical shape closed container that can open the bottom portion and accommodates these. In the heating device having, the heater container and the shield container are provided with holes concentrically at the center of the ceiling, and a liftable lid that covers those holes is provided, and the lid is When at the lowermost position, the hole in the heater container is closed, when the lid is at the intermediate position, the hole in the heater container is open, when the hole in the shield container is closed, and when the lid is at the uppermost position, Heater vessel holes and seals Heating apparatus characterized by the de container bore is adapted to open both.
されている請求項1記載の加熱装置。2. The heating apparatus according to claim 1, wherein a gas at 1 to 50 atm is sealed in the closed vessel.
付けられている請求項1または請求項2記載の加熱装
置。3. The heating device according to claim 1, wherein a cooling jacket is attached to an outer surface of the closed vessel.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13235399A JP3874151B2 (en) | 1999-05-13 | 1999-05-13 | Heating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13235399A JP3874151B2 (en) | 1999-05-13 | 1999-05-13 | Heating device |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2000323485A true JP2000323485A (en) | 2000-11-24 |
JP3874151B2 JP3874151B2 (en) | 2007-01-31 |
Family
ID=15079387
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13235399A Expired - Fee Related JP3874151B2 (en) | 1999-05-13 | 1999-05-13 | Heating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3874151B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010050301A (en) * | 2008-08-22 | 2010-03-04 | National Institute Of Advanced Industrial Science & Technology | Annealing furnace |
CN105531808A (en) * | 2013-09-10 | 2016-04-27 | 泰拉半导体株式会社 | Chamber for heat treatment device and method for manufacturing same |
-
1999
- 1999-05-13 JP JP13235399A patent/JP3874151B2/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010050301A (en) * | 2008-08-22 | 2010-03-04 | National Institute Of Advanced Industrial Science & Technology | Annealing furnace |
CN105531808A (en) * | 2013-09-10 | 2016-04-27 | 泰拉半导体株式会社 | Chamber for heat treatment device and method for manufacturing same |
JP2016538730A (en) * | 2013-09-10 | 2016-12-08 | テラセミコン コーポレイション | Chamber of heat treatment apparatus and manufacturing method thereof |
Also Published As
Publication number | Publication date |
---|---|
JP3874151B2 (en) | 2007-01-31 |
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