JP2000315463A - Display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a display device having an inconspicuous seam of adjacent screens and increased display quality. SOLUTION: In this display device, a phosphor screen is divided into a plurality of areas by an electron beam from a plurality of electron gun structural bodies and each area is scanned in the main scanned direction and in the sub- scanned direction. Each scanned area has an overlapped part overlapped with an adjacent-scanned area. A shadow mask 40 is provided with a plurality of effective opening areas A and B formed of a plurality of electron beam through holes corresponding to the scanned areas. Each effective opening area has superposed parts A1 and B1 formed of electron beam through hole rows 52a, 52b, 52c and 52d which correspond to the superposed parts on the phosphor screen and are passed through the electron beam and has non-superposed parts A2 and B2 formed of electron through holes 52 which correspond to the scanned areas other than the superposed parts A1 and B1 and are passed through the electron beam. The arranged pitch in the sub-scanned direction of the electron beam through holes of each superposed part is set greater than that in the sub-scanned direction of the electron beam through holes of each non-superposed part.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a display device,
In particular, the present invention relates to a display device in which one phosphor screen is divided into a plurality of regions and scanned, and images drawn in the respective regions are combined to obtain one image.

[0002]

2. Description of the Related Art In recent years, various studies have been made on a high-definition picture tube having a high-definition broadcast or a large screen associated therewith. Generally, in order to achieve high resolution of a picture tube, the spot diameter of an electron beam on the phosphor screen must be reduced. In contrast,
Attempts have been made to improve the electrode structure of the electron gun or to enlarge and extend the diameter of the electron gun itself, but no satisfactory results have yet been obtained.

The biggest cause of this is that the distance from the electron gun to the phosphor screen becomes longer as the tube becomes larger, and the magnification of the electron lens becomes too large. Therefore, in order to realize high resolution, it is important to shorten the distance (depth) from the electron gun to the phosphor screen. Also, in this case, wide-angle deflection causes an increase in the magnification difference between the center and the periphery of the screen, so that it is not advisable to increase the resolution.

Therefore, conventionally, a single phosphor layer is divided into a plurality of areas by using a plurality of electron guns and a plurality of deflection yokes, and a large screen is formed by connecting images of the respective areas. Has been proposed, for example, JP-A-7-45215,
Japanese Patent Application Laid-Open No. 2-51831 discloses a display device for connecting two images to obtain a large screen.
JP-A-256552 and JP-A-61-256551 propose a display device for connecting a larger number of images to obtain a large screen.

[0005]

A display device of the type in which the phosphor screen formed on the inside of the panel is divided into a plurality of regions and scanned as described above has a high resolution, a short depth, and a simple structure. However, it is very difficult to continuously connect a plurality of adjacent images naturally without discomfort. For example, when a luminance difference or a chromaticity difference occurs between adjacent small screens due to a change in cathode current characteristics of the electron gun, a change over time, a change in a drive circuit and a change over time, the continuation of the screen at the boundary between the small screens And the boundary becomes visible.

Therefore, various methods for connecting a plurality of images have been conventionally proposed. For example, in the apparatus disclosed in the above-mentioned Japanese Patent Application Laid-Open No. 61-256552, when adjacent small screens are connected, By superimposing the peripheral portions of adjacent images on each other, the joints of the screens are made inconspicuous. In such a method, since there are portions that overlap each other, the differences are alleviated with respect to the image distortion and the luminance difference between the adjacent images, and the joints are difficult to see.

However, when the peripheral portions of the adjacent screens are superimposed and displayed, the electron beam emitted from the electron gun corresponding to each screen also scans the peripheral portions of the adjacent screens. The electron beams from a plurality of electron guns collide with the phosphor corresponding to the portion. Therefore, the light emission of the phosphor in this portion is doubled, and the change in luminance becomes more conspicuous.

The present invention has been made in view of the above points, and an object of the present invention is to provide a display device that scans a single phosphor screen by dividing the screen into a plurality of regions, in which a joint between a plurality of images is noticeable. An object of the present invention is to provide a display device with improved display quality of an image.

[0009]

In order to achieve the above object, a display device according to the present invention comprises: a vacuum envelope having a substantially rectangular panel having a phosphor screen formed on an inner surface thereof; A shadow mask provided in the container so as to face the phosphor screen, and a plurality of electron gun assemblies each provided in the vacuum envelope and emitting an electron beam to the phosphor screen via the shadow mask. The, the electron beam, the phosphor screen is divided into a plurality of regions and each is scanned in a sub-scanning direction orthogonal to the main scanning direction and the main scanning direction, the scanning region of the plurality of electron beams, On the phosphor screen, there is an overlapping portion overlapping another scanning region adjacent in the main scanning direction, and the shadow masks correspond to the scanning regions, respectively. A number of electron beam passage apertures and a plurality of effective apertures region formed with.

[0010] Each of the effective aperture areas corresponds to a superimposed portion having an electron beam passage hole through which an electron beam corresponding to the overlapping portion on the phosphor screen passes, and a scanning region other than the overlapping portion. And a non-overlapping portion formed with an electron beam passage hole through which the formed electron beam passes, and an arrangement pitch of the electron beam passage holes provided in the overlap portion of each of the effective aperture regions along the sub-scanning direction. Is characterized by being set to be larger than the arrangement pitch of the electron beam passage holes provided in the non-overlapping portion in the sub-scanning direction.

Further, a display device according to the present invention has a vacuum envelope having a substantially rectangular panel having a phosphor screen formed on an inner surface thereof, and a vacuum envelope facing the phosphor screen in the vacuum envelope. Provided a shadow mask, and a plurality of electron gun assemblies each provided in the vacuum envelope and emitting an electron beam to the phosphor screen through the shadow mask, wherein the electron beam is The phosphor screen is divided into a plurality of regions, each of which is scanned in a main scanning direction and a sub-scanning direction orthogonal to the main scanning direction. The plurality of electron beam scanning regions are arranged on the phosphor screen in the main scanning direction. The shadow mask has an overlapping portion that overlaps with another scanning region adjacent to the scanning region. And a plurality of effective apertures region made.

Each of the effective aperture regions corresponds to a superimposed portion having an electron beam passage hole through which an electron beam corresponding to the overlapping portion on the phosphor screen passes, and a scanning region other than the overlapping portion. A non-overlapping portion formed with an electron beam passage hole through which the electron beam passes, and a pitch along the main scanning direction of the electron beam passage hole provided in the overlap portion of each of the effective aperture regions is The pitch of the electron beam passage holes provided in the non-overlapping portion is set larger than the pitch along the main scanning direction.

According to the display device having the above-described structure, the arrangement pitch of the electron beam passage holes provided in the overlapping portion in the sub-scanning direction or the main scanning direction in the adjacent effective aperture regions of the shadow mask. The arrangement pitch along the sub-scanning direction is set larger than the arrangement pitch along the sub-scanning direction or the arrangement pitch along the main scanning direction in the non-overlapping portion. As a result, in the overlapping portion of two scanning regions adjacent to each other in the main scanning direction, the electron beam passing through the overlapping portion of one effective aperture region of the shadow mask and the overlapping portion of the other effective aperture region adjacent to the electron beam. Are alternately arranged along the main scanning direction or the sub-scanning direction.

Therefore, even when there is a slight luminance difference between the images displayed in the two adjacent scanning areas, the luminance difference is reduced in the overlapping portion, the boundary between the scanning areas is made inconspicuous, and the continuity of the image is maintained. You can do it. As a result, a display device with improved display screen quality can be obtained.

[0015]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment in which a display device according to the present invention is applied to a color cathode ray tube will be described below in detail with reference to the drawings. As shown in FIGS. 1 and 2, the color cathode ray tube includes a vacuum envelope 10, which is composed of a glass panel 12 and two funnels provided opposite to the panel. And a rear envelope 14 made of glass and integrally having 18. The panel 12 integrally includes a substantially rectangular face plate 22 having a rectangular phosphor screen 20 formed on an inner surface thereof, and a skirt portion 24 erected on a peripheral portion of the face plate. The panel 12 has a horizontal axis H and a vertical axis V that are orthogonal to each other through the center.

The phosphor screen 20 has a plurality of stripe-shaped three-color phosphor layers extending in the vertical axis V direction and emitting blue, rim, and red light, and a black layer provided between these three-color phosphor layers. And stripes. The phosphor screen 20 is integrated over the entire screen area and is formed continuously without any seams.

The rear envelope 14 is joined to the end face of the skirt 24 of the panel 12 by, for example, frit glass 27 in a state where the rear envelope 14 abuts against the end face. The rear envelope 14
It has a flat bottom wall 14a facing the face plate 22, and a pair of circular openings 26 are formed in the bottom wall 14a along the horizontal axis H direction.

The two funnels 18 correspond to the corresponding openings 2
6 while covering the bottom wall 14 of the rear envelope 14 respectively.
a. A neck 16 made of glass is joined to a small-diameter end of each funnel 18, and an electron gun structure 28 that emits an electron beam toward the phosphor screen 20 is arranged in each neck 16. . A deflecting device 30 for deflecting the electron beam emitted from the electron gun assembly 28 is provided outside each funnel 18.
Is installed.

A substantially rectangular shadow mask 40 having a large number of electron beam passage holes is provided in the vacuum envelope 10 and is located opposite to the phosphor screen 20. The shadow mask 40 is attached to the panel 1 via a holder 42 fixed to the mask frame and stud pins 44 projecting from the skirt 24 of the panel 12.
2 supported.

As can be seen from FIG. 2, in the present embodiment, the phosphor screen 20 is
Two scanning regions a arranged in the horizontal axis H direction around
b. These scanning areas a and b have the same shape as each other, and their side edges on the vertical axis V side overlap each other by a predetermined width. The two funnels 18 and the electron gun assembly 28 are arranged such that their central axes C coincide with a normal passing substantially through the centers of the corresponding scanning areas a and b. Therefore, the two necks 16
They run almost parallel to each other.

According to the above-structured color cathode ray tube, the electron beams emitted from the two electron gun assemblies 28 are deflected by the magnetic fields generated from the corresponding deflection devices 30, respectively.
The phosphor screen 20 is divided into two regions a and b for scanning via the shadow mask 40. At this time, the electron beam is applied to the regions a and b in the horizontal direction as the main scanning direction,
And scanning in the vertical direction as the sub-scanning direction. By this divided scanning, each scanning area a, b of the phosphor screen 20
Although the images drawn above are separate from each other, they are connected to each other by controlling the signals applied to the electron gun structure 28 and the deflection device 30 to reproduce one large image without a break on the entire surface of the phosphor screen.

Next, the configuration of the shadow mask 40 will be described in detail. As shown in FIGS. 2 to 4, the shadow mask 40 includes a substantially rectangular mask body 46 and a substantially rectangular mask frame 48 attached to a peripheral portion of the mask body. The mask body 46 has rectangular effective aperture areas A and B respectively corresponding to the scanning areas a and b of the phosphor screen 20, and a non-porous portion 50 located around each of the effective aperture areas. are doing. In the effective aperture areas A and B, a large number of slit-shaped electron beam passage holes 52 are formed, respectively.

The electron beam passage holes 52 are formed by arranging a large number of passage hole rows formed by arranging a plurality of electron beam passage holes at a predetermined pitch in the vertical axis V direction at a predetermined pitch in the horizontal axis H direction. They are arranged side by side.

As described above, the scanning areas a and b of the phosphor screen 20 overlap at the side edges on the vertical axis V side. The emitted electron beams collide.

Correspondingly, the effective aperture area A of the shadow mask 40 has an overlapping portion A1 through which the electron beam incident on the overlapping portion d of the scanning region a passes and a non-overlapping portion A1 through which the other electron beams pass. A2. In FIG. 3, the overlapping portion A <b> 1 is located on the side edge on the vertical axis V side in the effective aperture area A, and extends along the vertical axis V.

Similarly, the effective aperture area B of the shadow mask 40 includes an overlapping portion B1 through which the electron beam incident on the overlapping portion d of the scanning region b passes, and a non-overlapping portion B2 through which the other electron beams pass. ,have. In FIG. 3, the overlapping portion B <b> 1 is located at a side edge of the effective aperture area B on the vertical axis V side, and extends along the vertical axis V.

According to the present embodiment, as can be clearly understood from FIG.
B1 has, for example, four electron beam passage hole arrays 5 each.
1a, 52b, 52c, and 52d are formed, and the arrangement pitch P2 along the vertical axis V direction of the electron beam passage holes 52 constituting each electron beam passage hole row is the non-overlapping portion A2, B
The pitch P1 of the electron beam passage holes in the vertical axis V direction in Step 2 is larger than, for example, 0.8 mm, for example, 1.6 times which is twice as large. In addition, the superimposed portions A1, B1
, The electron beam passage hole arrays 51a, 52b, 52c at
The arrangement pitch of 52d in the horizontal axis H direction is the non-overlapping portion A2,
It is set to be the same as the arrangement pitch of the electron beam passage holes 52 in the horizontal direction H in B2.

Further, the electron beam passing holes 52 provided in one overlapping portion A1 are shifted from the electron beam passing holes provided in the other overlapping portion B1 by a predetermined pitch in the vertical axis V direction. For example, they are provided shifted by the pitch P1. That is, the electron beam passage holes 52 constituting the electron beam passage hole array 52a in the overlapping portion A1 are
No. 1 is displaced from the electron beam passage holes constituting the electron beam passage hole array 52d by a pitch P1. Similarly, the electron beam passage hole array 5 in the overlapping portion A1
Electron beam passage holes 52 constituting 2b, 52c, 52d
Are the electron beam passage hole arrays 5 in the overlapping portion B1.
The holes 2c, 52b and 52a are arranged so as to be shifted from each other by the pitch P1 with respect to the electron beam passage holes.

FIG. 6A shows a dark beam pattern A formed on the scanning area a of the phosphor screen 20 by the electron beam passing through the effective aperture area A of the shadow mask 40.
FIG. 6B shows a bright beam pattern B formed in the scanning area b of the phosphor screen 20 by the electron beam passing through the effective aperture area B of the shadow mask 40.
3 is shown.

As shown in FIG. 6 (a), four beams corresponding to the electron beam passage hole arrays 52a to 52d provided in the overlapping portion A1 of the shadow mask 40 are provided in the overlapping portion d of the scanning region a. Patterns 60a, 60b, 60
c, 60d are formed. Then, each beam pattern is arranged on one stripe-shaped phosphor layer, and the arrangement pitch P2 of the electron beam passage holes in the electron beam passage hole row.
And a number of beam spots arranged at substantially the same pitch.

Similarly, as shown in FIG. 6B, the overlapping portion d of the scanning area b is overlapped with the overlapping portion B1 of the shadow mask 40.
Beam patterns 61a and 61 corresponding to the electron beam passage hole arrays 52a to 52d provided in
b, 61c and 61d are formed. Each beam pattern is composed of a large number of beam spots arranged on one stripe-shaped phosphor layer and arranged at a pitch substantially equal to the arrangement pitch P2 of the electron beam passage holes in the electron beam passage hole array. .

In the actual operation, the electron beam patterns A3 and B3 are simultaneously formed on the phosphor screen 20, as shown in FIG. Therefore, in the overlapping portion d, the beam pattern 60a on the scanning region a side and the beam pattern 61d on the scanning region b side are formed on a common striped phosphor layer. At this time, since the beam pattern 60a and the beam pattern 61d are displaced from each other by the pitch P1 in the direction of the vertical axis V, the beam patterns 60a and the beam pattern 61d are alternately located on the common stripe-shaped phosphor layer without overlapping each other and are continuously connected.

Similarly, beam patterns 60b and 61c,
Beam patterns 60c and 61b, beam pattern 60d
And 61a are respectively formed on a common striped phosphor layer and are continuously connected.

Therefore, according to the color cathode ray tube provided with the shadow mask 40 having the above configuration, as shown in FIG. 6D, the brightness of the displayed image is the brightness of the dark beam pattern A3 at the overlapping portion d. And bright beam pattern B3
The luminance becomes an intermediate luminance with the luminance of. Then, the appearance of the actually displayed image is determined as shown in FIG.
Is an image in which the luminance continuously changes from the dark side to the bright side. Therefore, the brightness does not change abruptly at the boundary between two adjacent scanning areas a and b, and the scanning areas a and b do not change.
Therefore, even when there is a luminance difference in the image displayed on the screen, the boundaries between the scanning regions can be made inconspicuous and the continuity of the image can be maintained. As a result, a color cathode ray tube with improved display screen quality can be obtained.

Next, a shadow mask 40 of a color cathode ray tube according to a second embodiment of the present invention will be described. As shown in FIG. 7, according to the second embodiment, the overlapping portions A1 and B1 of the effective aperture regions A and B are different from the non-overlapping portions A
2, the opening area is gradually reduced as the distance from B2 increases.

That is, in the overlapping portions A1 and B1, the arrangement pitch of the electron beam passing holes 52 along the vertical axis V direction is such that the electron beam passing holes of the first row located on the side of the non-overlapping portions A2 and B2. A second row, a third row, and a fourth row of electron beam passage hole rows 52b located on the vertical axis V side from the row 52a;
It is formed so as to increase as it goes to 52c and 52d. At the same time, the opening diameter of the electron beam passage hole 52 in the vertical axis V direction is the second hole located on the vertical axis V side from the first electron beam passage hole row 52a located on the side of the non-overlapping portions A2 and B2. The electron beam passage holes 52b, 52c, and 52d in the third, fourth, and fourth rows are formed so as to become gradually smaller.

Further, the electron beam passage hole 52 provided in one overlapping portion A1 is formed to have the opposite intermittentness with respect to the electron beam passing hole provided in the other overlapping portion B1. That is, the electron beam passing through the electron beam passage holes constituting the electron beam passage hole array 52a in the superimposition portion A1 and the electron beam passage hole array 52 in the superimposition portion B1
The electron beam that has passed through the electron beam passage hole constituting d enters the same stripe-shaped phosphor layer of the phosphor screen 20 without overlapping each other, and the formed beam spot is 1 It is set to connect to the column.

FIG. 8A shows a dark beam pattern A formed on the scanning area a of the phosphor screen 20 by the electron beam passing through the effective aperture area A of the shadow mask 40.
FIG. 8B shows a bright beam pattern B formed in the scanning area b of the phosphor screen 20 by the electron beam that has passed through the effective aperture area B of the shadow mask 40.
3 is shown.

As shown in FIG. 8A, in the overlapping portion d of the scanning area a, four beams corresponding to the electron beam passing hole arrays 52a to 52d provided in the overlapping portion A1 of the shadow mask 40, respectively. Patterns 60a, 60b, 60
c, 60d are formed. These four beam patterns are formed on the four stripe-shaped phosphor layers, respectively, and are arranged at a pitch substantially equal to the arrangement pitch of the electron beam passage holes 52 in the electron beam passage hole array. Each is constituted by a spot.

Similarly, as shown in FIG. 8B, the overlapping portion d of the scanning area b is overlapped with the overlapping portion B1 of the shadow mask 40.
Beam patterns 61a and 61 corresponding to the electron beam passage hole arrays 52a to 52d provided in
b, 61c and 61d are formed. These four beam patterns are formed on the four stripe-shaped phosphor layers, respectively, and are arranged in a large number of beam spots arranged at substantially the same pitch as the arrangement pitch of the electron beam passage holes in the electron beam passage hole array. , Respectively.

At the time of actual operation, as shown in FIG. 8C, electron beam patterns A3 and B3 are simultaneously formed on the phosphor screen 20, and at the overlapping portion d, the beam patterns 60a on the scanning area a side are formed. The beam pattern 61d on the scanning region b side is formed on the common striped phosphor layer. At this time, since the beam pattern 60a and the beam pattern 61d are formed with the intermittent characteristics opposite to each other, the beam patterns 60a and the beam patterns 61d are alternately located on the common striped phosphor layer without being overlapped with each other and are continuously connected. Similarly, the beam patterns 60b and 61c, the beam patterns 60c and 61b, and the beam patterns 60d and 61a are respectively formed on a common striped phosphor layer and are continuously connected.

According to the color cathode ray tube provided with the shadow mask 40 having the above configuration, as shown in FIG. 8D, the brightness of the displayed image is higher than the brightness of the dark beam pattern A3 at the overlapping portion d. The brightness changes in a plurality of steps to the brightness of the beam pattern B3. Then, the appearance of the actually displayed image becomes an image in which the luminance continuously changes from the dark side to the bright side in the overlapping portion d as shown in FIG. 8E. Therefore, according to the second embodiment, the luminance does not suddenly change at the boundary between two adjacent scanning areas a and b, and even if there is a luminance difference between the images displayed in the scanning areas a and b. In addition, the boundaries between the scanning areas can be made less noticeable, and the continuity of the image can be improved. As a result, a color cathode ray tube with further improved display screen quality can be obtained.

In the first and second embodiments described above, the phosphor screen formed of the phosphor layers in the form of stripes is used. However, as shown in FIG. A phosphor screen having a body layer may be used. In this case, the electron gun arrangement also becomes a delta arrangement, and the electron beam passage holes 52 formed in the shadow mask are formed.
Is formed in a dot shape instead of a slit shape.

However, as in the above-described embodiment, the arrangement of the electron beam passage holes in each superimposed portion is set to be larger than the arrangement pitch of the electron beam passage holes in the non-superimposed portion along the vertical axis V direction. Is done. Alternatively, the arrangement of the electron beam passage holes in each superimposed portion is formed such that the arrangement pitch in the vertical axis V direction increases and the width in the vertical axis V direction decreases as the distance from the non-overlapping portion increases. The other configuration of the color cathode ray tube is the same as that of the above-described embodiment, and a detailed description thereof will be omitted.

Even when the dot-shaped phosphor layer and the electron beam passage hole are used as described above, FIGS.
As shown in (d), the effective aperture area A of the shadow mask
The dark beam pattern A3 formed in the scanning area a of the phosphor screen by the electron beam that has passed through, and the bright beam formed in the scanning area b of the phosphor screen by the electron beam that has passed through the effective aperture area B of the shadow mask. By matching with the pattern B3, a change in luminance at the boundary of the scanning area can be reduced, and the image quality can be improved.

Next, a shadow mask 40 of a color cathode ray tube according to a third embodiment of the present invention will be described. According to the present embodiment, as shown in FIG. 10, for example, three electron beam passage hole arrays 51a, 52b, and 52c are formed in the overlapping portions A1 and B1 of the shadow mask 40, respectively. The arrangement pitch along the vertical axis V direction of the electron beam passage holes constituting the hole array is the same as the arrangement pitch of the electron beam passage holes in the vertical axis V direction in the non-overlapping portions A2 and B2, for example, 0.8 mm. Is set. The array pitch P4 of the electron beam passage holes 51a, 52b, 52c in the horizontal axis H direction in the overlapping portions A1, B1 is the array pitch P3 in the horizontal direction H of the electron beam passing holes in the non-overlapping portions A2, B2, for example. It is set to be larger than 0.8 mm, for example, 1.6 mm which is twice as large.

Further, the electron beam passage hole arrays 52a, 52b and 52c provided in the superimposition portions A1 and B1 are provided with electron beam passage hole arrays 52a and 52
b and 52c, the beam pattern formed by the electron beam passing through the
The beam patterns formed by the electron beams passing through a, 52b, and 52c are arranged so as to be alternately positioned along the horizontal axis H direction. The other configuration is the same as that of the above-described first embodiment, and a detailed description thereof will be omitted.

FIG. 11A shows a dark beam pattern A3 formed in the scanning area a of the phosphor screen 20 by the electron beam passing through the effective aperture area A of the shadow mask 40, and FIG. 3 shows a bright beam pattern B3 formed in the scanning area b of the phosphor screen 20 by the electron beam passing through the effective aperture area B of the shadow mask 40.

As shown in FIG. 11A, in the overlapping portion d of the scanning area a, three beams corresponding to the electron beam passing hole arrays 52a to 52c provided in the overlapping portion A1 of the shadow mask 40, respectively. Patterns 60a, 60b, 60
c is formed. Each beam pattern is constituted by a large number of beam spots arranged on one stripe-shaped phosphor layer and arranged at a pitch substantially equal to the arrangement pitch P1 of the electron beam passage holes in the electron beam passage hole array. .

Similarly, as shown in FIG. 11B, the overlapping portion d of the shadow area
1, the electron beam passage hole arrays 52a, 52b, 5
Three beam patterns 61a respectively corresponding to 2c,
61b and 61c are formed. Each of the beam patterns is arranged on one stripe-shaped phosphor layer, and the arrangement pitch P of the electron beam passage holes in the electron beam passage hole row is formed.
It is composed of a number of beam spots arranged at a pitch substantially equal to 1.

During the actual operation, the electron beam patterns A3 and B3 are simultaneously formed on the phosphor screen 20, as shown in FIG. Therefore, in the overlapping portion d, the beam patterns 60a to 60c on the scanning region a side and the beam patterns 61a to 61c on the scanning region b side are formed on the stripe-shaped phosphor layer alternately in the horizontal axis H direction. You.

Therefore, according to the third embodiment, FIG.
As shown in FIG. 1 (d), in the overlapping portion d, the dark beam pattern and the bright beam pattern are alternately positioned, and the luminance thereof is almost intermediate between the luminance of the dark beam pattern A3 and the luminance of the bright beam pattern B3. Brightness. Then, the appearance of the image actually displayed is such that the luminance continuously changes from the dark side to the bright side at the overlapping portion d as shown in FIG. 11E. Therefore, even when there is a luminance difference between the images displayed in the two adjacent scanning areas a and b, the luminance does not change abruptly at these boundaries, the boundaries between the scanning areas are not noticeable, and the continuity of the image is reduced. Can be maintained. As a result, a color cathode ray tube with improved display screen quality can be obtained.

In the third embodiment described above, the electron gun and the phosphor layer of the phosphor screen are formed as shown in FIG.
Alternatively, an electron gun having a delta arrangement and a dot-shaped phosphor layer having a delta arrangement may be used. In this case, the electron beam passage hole formed in the shadow mask is also formed in a dot shape instead of a slit shape. However, as in the third embodiment, the arrangement of the electron beam passage holes in each overlapping portion is larger than the arrangement pitch of the electron beam passage holes in the non-overlapping portion along the horizontal axis H direction, and is about twice as large. Set to pitch.

Even when the dot-shaped phosphor layer and the electron beam passage hole are used in this way, as shown in FIGS. 12B to 12D, the light passes through the effective aperture area A of the shadow mask. A dark beam pattern A3 formed in the scanning area a of the phosphor screen by the electron beam, and a bright beam pattern B3 formed in the scanning area b of the phosphor screen by the electron beam passing through the effective aperture area B of the shadow mask. , The change in luminance at the boundary of the scanning area can be reduced, and the image quality can be improved.

Further, in the third embodiment, the electron gun and the phosphor layer of the phosphor screen are formed as shown in FIG.
As shown in the above, an electron gun having an in-line arrangement and a dot-shaped phosphor layer having an in-line arrangement may be used. in this case,
The electron beam passage hole formed in the shadow mask is also formed in a dot shape instead of a slit shape. However, in each overlapping portion, the pitch of the electron beam passing holes along the vertical axis V direction is larger than the arrangement pitch of the electron beam passing holes along the vertical axis V direction in the non-overlapping portion, and is about twice. The set pitch along the horizontal axis H direction is set to be the same as the arrangement pitch of the electron beam passage holes in the non-overlapping portion along the horizontal axis H direction.

As described above, even when the dot-shaped phosphor layers and the electron beam passage holes in the in-line arrangement are used, FIG.
As shown in FIG. 13B to FIG. 13D, the dark beam pattern A3 formed in the scanning area a of the phosphor screen by the electron beam passing through the effective aperture area A of the shadow mask and the effective opening of the shadow mask By combining the bright beam pattern B3 formed in the scanning area b of the phosphor screen by the electron beam passing through the hole area B, the bright beam pattern and the dark beam pattern are formed along the vertical axis direction at the overlapping portion d. Are located alternately. Therefore, it is possible to alleviate the luminance change at the boundary of the scanning area and improve the image quality.

The present invention is not limited to the above-described embodiment, but can be variously modified within the scope of the present invention. For example, the number of scanning areas of the phosphor screen is 2
The number is not limited to one and can be increased as needed. At the same time, the arrangement direction of the scanning region is not limited to the horizontal axis direction and may be the vertical axis direction. In this case, according to the arrangement direction of the scanning region,
By adjusting the opening area of the electron beam passage hole in the overlapping portion of the effective opening region of the shadow mask, the same operation and effect as in the above-described embodiment can be obtained.

Further, in the above-described embodiment, the display device having the integrated shadow mask has been described. However, the present invention can be applied to any device that performs scanning by dividing the phosphor screen. The configuration may be divided into two.

[0059]

As described above in detail, according to the present invention, the pitch of the electron beam passage holes provided in the overlapping portion of the shadow mask is larger than the arrangement pitch of the electron beam passage holes provided in the non-overlapping portion. By arranging at pitches, during operation, even when screens having relatively different luminances are displayed in adjacent scanning areas, the luminance at the boundary between the scanning areas can be set to an intermediate luminance. It is possible to provide a display device with improved display quality, in which the boundaries between screens are not noticeable.

[Brief description of the drawings]

FIG. 1 is a perspective view showing the back side of a color cathode ray tube according to an embodiment of the present invention.

FIG. 2 is a sectional view of the color cathode ray tube.

FIG. 3 is a plan view schematically showing a shadow mask in the color cathode ray tube.

FIG. 4 is an enlarged plan view showing a part of an overlapping portion and a non-overlapping portion of the shadow mask.

FIG. 5 is a sectional view schematically showing a relationship between a phosphor screen, a shadow mask, and an electron beam.

FIG. 6 is a diagram schematically showing a beam pattern, a luminance change, and an actual appearance formed on a phosphor screen by an electron beam passing through an electron beam passage hole in an effective aperture area adjacent to the shadow mask. .

FIG. 7 is an enlarged plan view showing a part of an overlapping portion and a non-overlapping portion of a shadow mask in a color cathode ray tube according to a second embodiment of the present invention.

FIG. 8 shows a beam pattern, a luminance change, and an actual appearance formed on a phosphor screen by an electron beam passing through an electron beam passage hole in an effective aperture area adjacent to the shadow mask in the second embodiment. FIG.

FIG. 9 is a view schematically showing an electron beam pattern according to a modification using an electron gun, a phosphor layer, and an electron beam passage hole in a delta arrangement.

FIG. 10 is an enlarged plan view showing a part of an overlapping portion and a non-overlapping portion of a shadow mask in a color cathode ray tube according to a third embodiment of the present invention.

FIG. 11 shows a beam pattern, a luminance change, and an actual appearance formed on a phosphor screen by an electron beam passing through an electron beam passage hole in an effective aperture area adjacent to the shadow mask in the third embodiment. FIG.

FIG. 12 is a view schematically showing an electron beam pattern according to a modification using an electron gun, a phosphor layer, and an electron beam passage hole in a delta arrangement in the third embodiment.

FIG. 13 is a view schematically showing an electron beam pattern according to a modification using an electron gun, a phosphor layer, and an electron beam passage hole in an in-line arrangement in the third embodiment.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 ... Vacuum envelope 12 ... Panel 14 ... Rear envelope 16 ... Neck 18 ... Funnel 20 ... Phosphor screen 28 ... Electron gun assembly 40 ... Shadow mask 52 ... Electron beam passage hole 52a, 52b, 52c, 52d ... Electron Beam passing hole array a, b: scanning area d: overlapping part A, B: effective aperture area A1, B1: overlapping part A2, B2: non-overlapping part A3, B3: beam pattern

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Tokuo Hashimoto 1-9-2, Hara-cho, Fukaya-shi, Saitama F-term in Fukaya Electronics Factory, Toshiba Corporation (reference) 5C031 EE02 EF05 EG07 EG09 EG09 EG11

Claims (9)

[Claims] A vacuum envelope having a substantially rectangular panel having a phosphor screen formed on an inner surface thereof; a shadow mask provided in the vacuum envelope so as to face the phosphor screen; A plurality of electron gun assemblies each provided in the vacuum envelope and emitting an electron beam to the phosphor screen through the shadow mask, wherein the electron beam extends the phosphor screen through a plurality of regions. Are scanned in a main scanning direction and a sub-scanning direction orthogonal to the main scanning direction. The scanning region of the plurality of electron beams is another scanning region adjacent to the main scanning direction on the phosphor screen. A plurality of effective aperture areas each of which corresponds to the scanning area and in which a number of electron beam passage apertures are formed. Wherein each of the effective aperture areas has an overlapping portion formed with an electron beam passage hole through which an electron beam corresponding to the overlapping portion on the phosphor screen passes, and an electron beam corresponding to a scanning region other than the overlapping portion. A non-overlapping portion formed with an electron beam passage hole through which the electron beam passes, and the arrangement pitch along the sub-scanning direction of the electron beam passage hole provided in the overlap portion of each of the effective aperture regions is as described above. A display device, wherein an arrangement pitch of electron beam passage holes provided in a non-overlapping portion is set larger than an arrangement pitch along the sub-scanning direction. 2. The electron beam passage hole of each superimposed portion forms a plurality of electron beam passage hole arrays extending along the sub-scanning direction, and the electron beam passage hole of one electron beam passage hole array is formed. The electron beam that has passed through the hole and the electron beam that has passed through the electron beam passage hole of one electron beam passage hole row of the other overlapping portion are alternately arranged in the sub-scanning direction on the overlapping portion of the phosphor screen. The display device according to claim 1, wherein the display device is arranged so as to be continuous. 3. The arrangement pitch of the electron beam passage holes constituting each electron beam passage row of each superimposed portion along the sub-scanning direction is determined by the sub-scanning of the electron beam passage holes provided in the non-superimposed portion. The display device according to claim 2, wherein the display device is formed to be approximately twice as large as the arrangement pitch in the direction. 4. The arrangement pitch of the electron beam passage holes constituting the electron beam passage hole array of each of the superimposed portions along the sub-scanning direction increases as the electron beam passage hole array separated from the non-overlapping portion. The display device according to claim 2, wherein: 5. The display according to claim 1, wherein the aperture area of the electron beam passage hole formed in each of the overlapping portions gradually decreases as the distance from the non-overlapping portion increases. apparatus. 6. An electron beam passage hole provided in each of the overlapping portions is formed such that an electron beam passage hole farther from the non-overlapping portion has a smaller opening width in the sub-scanning direction. The display device according to claim 1, wherein: 7. A vacuum envelope having a substantially rectangular panel having a phosphor screen formed on an inner surface thereof; a shadow mask provided in the vacuum envelope so as to face the phosphor screen; A plurality of electron gun assemblies each provided in the vacuum envelope and emitting an electron beam to the phosphor screen through the shadow mask, wherein the electron beam extends the phosphor screen through a plurality of regions. Are scanned in a main scanning direction and a sub-scanning direction orthogonal to the main scanning direction. The scanning region of the plurality of electron beams is another scanning region adjacent to the main scanning direction on the phosphor screen. A plurality of effective aperture areas each of which corresponds to the scanning area and in which a number of electron beam passage apertures are formed. Wherein each of the effective aperture areas has an overlapping portion formed with an electron beam passage hole through which an electron beam corresponding to the overlapping portion on the phosphor screen passes, and an electron beam corresponding to a scanning region other than the overlapping portion. And a non-overlapping portion formed with an electron beam passage hole through which the electron beam passes. The pitch along the main scanning direction of the electron beam passage hole provided at the overlap portion of each of the effective aperture regions is the non-overlapping portion. A display device wherein the pitch of the electron beam passage holes provided in the superimposing portion is set to be larger than the pitch along the main scanning direction. 8. A pitch along the main scanning direction of an electron beam passage hole provided in a superimposed portion of each of the effective aperture regions is:
8. The display device according to claim 7, wherein a pitch of the electron beam passage holes provided in the non-overlapping portion is set to about twice a pitch along the main scanning direction. 9. The electron beam passage holes of each superimposing portion form a plurality of electron beam passage hole arrays extending along the sub-scanning direction, respectively. The electron beam that has passed through the beam passage hole and the electron beam that has passed through the electron beam passage hole of the electron beam passage hole row of another adjacent superimposed portion are alternately arranged in the main scanning direction on the overlapping portion of the phosphor screen. The display device according to claim 7, wherein the display device is arranged so as to be arranged side by side.