JP2000300937A - Gas treatment method - Google Patents

Gas treatment method

Info

Publication number
JP2000300937A
JP2000300937A JP11108517A JP10851799A JP2000300937A JP 2000300937 A JP2000300937 A JP 2000300937A JP 11108517 A JP11108517 A JP 11108517A JP 10851799 A JP10851799 A JP 10851799A JP 2000300937 A JP2000300937 A JP 2000300937A
Authority
JP
Japan
Prior art keywords
gas
treatment
liquid
tower
treated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP11108517A
Other languages
Japanese (ja)
Inventor
Yasuto Naruse
康人 成瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP11108517A priority Critical patent/JP2000300937A/en
Publication of JP2000300937A publication Critical patent/JP2000300937A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02ATECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A50/00TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
    • Y02A50/20Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters

Abstract

PROBLEM TO BE SOLVED: To obtain an excellent gas treatment method capable of removing a target gas component from a gas (exhaust gas) containing an org. gas such as org. solvent gas efficiently, inexpensively and simply by decomposition or the like. SOLUTION: The gas-liquid contact of a gas to be treated containing an org. gas component with a gas treatgment liquid is performed in a gas treatment tower and a part of the gas obtained after the gas-liquid contact in the gas treatment tower is again brought into contact with the gas treatment liquid in the gas treatment tower and the org. gas component dissolved in the gas treatment liquid is decomposed or removed by pref. using a microbiological treatment method to extremely efficiently treat objective gas to be treated.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ガスの新規処理
法、より詳しくは、例えば有機質ガスである有機溶剤を
含有する排ガスを、好ましくは活性汚泥等を含む溶液に
特定の条件下に接触後、当該溶液中に溶解する有機質ガ
ス成分を分解又は除去することにより目的とする被処理
ガスを効率よく処理する方法に関する。
The present invention relates to a novel gas treatment method, more specifically, for example, after contacting an exhaust gas containing an organic solvent, which is an organic gas, preferably with a solution containing activated sludge under specific conditions. And a method for efficiently treating a target gas to be treated by decomposing or removing an organic gas component dissolved in the solution.

【0002】[0002]

【従来の技術】例えば、有機溶剤を含有する排ガスを分
解処理する方法として、直接燃焼する方法、蓄熱型の媒
体を用いて燃焼する方法(蓄熱燃焼法)、或いは活性炭
等の吸着剤を用いて吸着回収する方法等が知られてい
る。
2. Description of the Related Art For example, as a method of decomposing exhaust gas containing an organic solvent, a method of directly burning, a method of burning using a heat storage type medium (heat storage combustion method), or a method of using an adsorbent such as activated carbon is used. Methods for adsorption and recovery are known.

【0003】また、有機溶剤ではないが、下水等の臭気
を脱臭する方法としては微生物を用いる処理方法が知ら
れている。例えば、特開平5−123527号公報には
余剰汚泥を用いて臭気成分を含む排ガスを効率よく脱臭
する方法が開示されている。
As a method for removing odors, such as sewage, which is not an organic solvent, a treatment method using microorganisms is known. For example, Japanese Patent Application Laid-Open No. 5-123527 discloses a method for efficiently deodorizing exhaust gas containing odor components using excess sludge.

【0004】更に、一般の活性汚泥処理装置では汚泥槽
に空気を送入する方法が採用されているが、この方法で
は空気と処理液の混合効率が非常に低くかつそのための
動力費用が多大になるという欠点を有している。
Further, in a general activated sludge treatment apparatus, a method of feeding air into a sludge tank is adopted. However, in this method, the mixing efficiency of air and a treatment liquid is extremely low and the power cost for the treatment is very large. Disadvantage.

【0005】[0005]

【発明が解決しようとする課題】前記したような従来か
ら知られている方法のうち、燃焼方式についてはコスト
が高く、蓄熱燃焼法においてもガス濃度が500ppm
を超えるような高濃度での使用で、更に補助燃料が必要
であり、故にランニングコストが高くなる。また、汚泥
を用いる方法は下水道等の臭気を脱臭する方式としては
用いられているものの、有機溶剤ガス等の有機質ガスを
含有する排ガスを処理する方法としては適用性が分かっ
ておらず、広く実用化されるまでには到っていない。
Of the above-mentioned conventional methods, the combustion method is expensive and the heat storage combustion method has a gas concentration of 500 ppm.
Use at high concentrations, such as above, requires additional auxiliary fuel and therefore increases running costs. In addition, although the method using sludge is used as a method for deodorizing odors in sewage and the like, its applicability is not known as a method for treating exhaust gas containing an organic gas such as an organic solvent gas. Not yet.

【0006】このような情況下に、有機質ガス成分を含
む排ガス等被処理ガスを効率よく実用的で工業的に簡便
にかつ低コストで処理できる優れた方法の開発が求めら
れている。
Under these circumstances, there is a need for the development of an excellent method capable of efficiently and practically treating a gas to be treated such as exhaust gas containing an organic gas component, industrially simply and at low cost.

【0007】本発明の目的は、上記のような課題を解決
して、汚泥等を用いる微生物学的処理方法を適用するこ
とが可能で、有機質ガス成分を含む被処理ガスを効率よ
く処理することができる優れたガス処理法を開発するこ
とにある。
[0007] An object of the present invention is to solve the above-mentioned problems and to apply a microbiological treatment method using sludge or the like to efficiently treat a gas to be treated containing an organic gas component. It is to develop an excellent gas processing method that can perform the above.

【0008】[0008]

【課題を解決するための手段】本発明者は、前記の課題
を解決し、本発明の目的達成に向けて鋭意検討を行った
結果、ガス処理塔内で有機質ガス成分を含む被処理ガス
(処理すべきガス)とガス処理液(当該ガスを処理する
ための溶液)との気液接触を行い、当該ガス処理塔内で
の気液接触後に得られた気体の少なくとも一部を、再度
ガス処理塔内でガス処理液と接触せしめて、その結果得
られるガス処理液に含有する処理すべきガス成分を、微
生物学的処理方法等により処理することにより、極めて
効率よく当該有機質ガス成分を分解等処理することがで
きることを見出し、本発明を完成するに到った。通常の
気液接触後、得られた気体中に残存する有機質ガス成分
が、本発明による一部リサイクル法により格段と改善さ
れることを見出したものであり、更に、複数のガス処理
塔を使用して一のガス処理塔内で得られた気体の少なく
とも一部を別のガス処理塔で再度気液接触を行い、処理
することもできる。
Means for Solving the Problems The present inventor has solved the above-mentioned problems and made intensive studies to achieve the object of the present invention. As a result, the gas to be treated containing an organic gas component in the gas treatment tower was obtained. Gas-liquid contact between a gas to be treated) and a gas treatment liquid (solution for treating the gas) is performed, and at least a part of the gas obtained after the gas-liquid contact in the gas treatment tower is re-gasified. The organic gas component is decomposed extremely efficiently by contacting it with the gas treatment liquid in the treatment tower and treating the gas component to be treated contained in the resulting gas treatment solution by a microbiological treatment method or the like. The inventors have found that the same processing can be performed, and have completed the present invention. After normal gas-liquid contact, organic gas components remaining in the obtained gas have been found to be remarkably improved by the partial recycling method according to the present invention. At least a part of the gas obtained in one gas processing tower can be treated again by another gas processing tower in gas-liquid contact.

【0009】即ち、本発明は、ガス処理塔内で有機質ガ
ス成分を含む被処理ガス(処理すべきガス)とガス処理
液との気液接触を行い、当該処理塔内での気液接触後に
得られた気体の少なくとも一部を、再度ガス処理塔内で
ガス処理液と接触せしめて、前記ガス処理液に溶解する
目的とする有機質ガス成分を分解又は除去することによ
るガス処理法に存する。
That is, according to the present invention, a gas to be treated (a gas to be treated) containing an organic gas component is brought into gas-liquid contact with a gas treatment liquid in a gas treatment tower, and after gas-liquid contact in the treatment tower, The present invention resides in a gas treatment method in which at least a part of the obtained gas is brought into contact with a gas treatment liquid in a gas treatment tower again to decompose or remove a target organic gas component dissolved in the gas treatment liquid.

【0010】ガス処理塔としては、気体成分と液体成分
とが有効に気液接触して目的とする必要な気体成分が液
体中に効率よく溶解するために使用される気液接触のた
めの気液接触装置を有する処理塔であればよい。通常
は、ガス処理液は上方から下降し、一方処理すべきガス
(被処理ガス)は下方から上昇して両者が気液接触して
目的とするガス成分をガス処理液中に溶解せしめる。
[0010] The gas treatment tower is used for gas-liquid contact, which is used for effective gas-liquid contact between a gas component and a liquid component so that a desired gas component is efficiently dissolved in a liquid. Any processing tower having a liquid contact device may be used. Normally, the gas treatment liquid descends from above, while the gas to be treated (the gas to be treated) rises from below, and they come into gas-liquid contact to dissolve the target gas component in the gas treatment liquid.

【0011】本発明には以下の内容も含まれる。 1.ガス処理塔が気液接触装置であり、好ましくは多孔
板等を内部に有する棚段塔、充填剤を内部に保持する充
填塔、或いは濡壁塔であり、更に好ましくは被処理ガス
とガス処理液を当該処理塔に供給する配管等を有する装
置を使用して行われる上記の処理法。
The present invention also includes the following contents. 1. The gas treatment tower is a gas-liquid contacting device, preferably a plate tower having a perforated plate or the like inside, a packed tower holding a filler inside, or a wet wall tower, and more preferably the gas to be treated and the gas treatment. The above-mentioned processing method performed using an apparatus having a pipe or the like for supplying a liquid to the processing tower.

【0012】本発明において使用するガス処理塔の数は
一つで十分であるが、複数使用することもできる。複数
使用する場合塔内の気液接触の方式は上記棚段塔等、各
種複数の接触手段を組み合わせることもできる。
In the present invention, one gas treatment tower is sufficient, but a plurality of gas treatment towers may be used. When a plurality of contact means are used, the gas-liquid contact system in the tower may be a combination of various contact means such as the above-mentioned tray tower.

【0013】2.上記処理法において、ガス処理塔内で
の気液接触後に得られた気体の少なくとも一部をガス処
理塔に供給される被処理ガスに混合する処理法。
2. In the above processing method, a processing method in which at least a part of the gas obtained after the gas-liquid contact in the gas processing tower is mixed with the gas to be processed supplied to the gas processing tower.

【0014】被処理ガスのガス処理塔の、例えば段塔下
部への供給配管の経路に気液接触後の前記気体が供給さ
れ、被処理ガスと一緒にガス処理液と気液接触して目的
とするガス成分をガス処理液に溶解せしめることができ
る。そのためにはこのような処理が可能な配管を設ける
必要がある。
The gas after the gas-liquid contact is supplied to the path of the supply pipe of the gas to be treated, for example, to the lower part of the step tower, and the gas is contacted with the gas treatment liquid together with the gas to be treated. Can be dissolved in the gas treatment liquid. For that purpose, it is necessary to provide a pipe capable of performing such processing.

【0015】被処理ガスに混合する前記気液接触後に得
られた気体を混合する場合の混合量について、ガス成分
の種類や流量、その混合方法、ガス処理液と供給される
被処理ガスの温度等により混合割合は変化する必要があ
る。通常は、当初供給された被処理ガス中の有機質ガス
成分の濃度が高い。一方、気液接触後に得られた気体中
に存在する有機質ガス成分の濃度はかなり低いのでこれ
を大量に混合すると処理すべき有機質ガス成分の濃度が
低くなり、処理効率が低下し好ましくない。混合比率
(容積比)について、被処理ガスに対して好ましくは1
0〜90%程度、より好ましくは20〜80%程度、更
に好ましくは30〜50%程度の混合により、また後記
循環率について好ましくは20〜80%程度、より好ま
しくは30〜70%程度、更に好ましくは35〜60%
程度が効率よく接触できる。
The mixing amount when mixing the gas obtained after the gas-liquid contact to be mixed with the gas to be treated, the type and flow rate of the gas component, the mixing method, the temperature of the gas to be treated and the temperature of the gas to be supplied For example, the mixing ratio needs to be changed depending on the conditions. Usually, the concentration of the organic gas component in the gas to be treated initially supplied is high. On the other hand, since the concentration of the organic gas component present in the gas obtained after the gas-liquid contact is considerably low, if the gas is mixed in a large amount, the concentration of the organic gas component to be treated becomes low, and the treatment efficiency is undesirably reduced. The mixing ratio (volume ratio) is preferably 1 to the gas to be treated.
About 0 to 90%, more preferably about 20 to 80%, and still more preferably about 30 to 50%, and the circulation rate described below is preferably about 20 to 80%, more preferably about 30 to 70%, Preferably 35-60%
The degree can be contacted efficiently.

【0016】分解率と処理風量はトレードオフの関係が
あり、要求分解率と要求処理風量より混合比や循環率を
適宜選択、決定することができる。
There is a trade-off between the decomposition rate and the processing air volume, and the mixing ratio and the circulation rate can be appropriately selected and determined from the required decomposition rate and the required processing air volume.

【0017】3.ガス処理液に溶解したガスを微生物学
的処理方法により分解してガスの処理を行う上記の処理
法。
3. The above treatment method in which the gas dissolved in the gas treatment liquid is decomposed by a microbiological treatment method to treat the gas.

【0018】ガス成分を分解したり、除去するための方
法としては、公知方法その他種々の方法を適用可能であ
るが、微生物学的方法が多くのガス成分の処理に適用で
き、また低コストかつ簡便に行うことができる。
As a method for decomposing or removing gas components, known methods and various other methods can be applied, but microbiological methods can be applied to the treatment of many gas components, and are low in cost and cost. It can be easily performed.

【0019】4.ガス処理液が、活性汚泥処理液又は活
性汚泥処理液に存在し、又は使用可能な微生物を含む溶
液を含有する上記の処理法。
4. The above-mentioned treatment method, wherein the gas treatment liquid is present in the activated sludge treatment liquid or the activated sludge treatment liquid or contains a solution containing a usable microorganism.

【0020】5.有機質ガスが有機溶剤ガスの少なくと
も1種である上記処理法。
[5] The above treatment method, wherein the organic gas is at least one kind of organic solvent gas.

【0021】6.上記処理法において、当該処理塔内で
の気液接触後に得られた気体の少なくとも一部を、当該
気液接触処理を行ったガス処理塔とは異なるガス処理塔
内でガス処理液と気液接触を行う処理法。
6. In the above treatment method, at least a part of the gas obtained after the gas-liquid contact in the treatment tower is converted into a gas treatment liquid and a gas-liquid mixture in a gas treatment tower different from the gas treatment tower that has performed the gas-liquid contact treatment. A treatment method that makes contact.

【0022】本発明において、特に好適な発明の実施態
様として次の方法が含まれる。 イ.少なくとも1つの塔型の気液接触装置で有機質ガス
成分又はそれを含む気体とガス処理液とを一の気液接触
装置内で接触せしめ、気液接触後の有機質ガス成分を含
む気体の少なくとも一部を被処理ガスの供給部を通し又
は直接気液接触装置(前記と同一の気液接触装置でも別
の装置でもよい。)に戻し、又は供給することによるガ
ス処理法。
In the present invention, particularly preferred embodiments of the invention include the following method. I. The organic gas component or a gas containing the same is brought into contact with the gas treatment liquid in one gas-liquid contact device by at least one column-type gas-liquid contact device, and at least one of the gases containing the organic gas component after the gas-liquid contact is obtained. A gas processing method in which the gas is passed through a supply section of the gas to be treated or returned directly to a gas-liquid contact device (the same gas-liquid contact device as described above or another device) or supplied.

【0023】ロ.上記イ.の処理法において、塔型の気
液接触装置が内部に充填剤の層、濡壁及び多孔板等を有
する棚段の何れかを含む処理法。
B. Above a. In the treatment method, the tower-type gas-liquid contact device includes any one of a tray having a filler layer, a wet wall, a perforated plate, and the like inside.

【0024】複数の塔を使用する場合、気液接触装置内
の接触手段を各塔で変更することもできる。
When a plurality of columns are used, the contact means in the gas-liquid contact device can be changed for each column.

【0025】ハ.前記処理法において、ガス処理液が活
性汚泥処理液又は活性汚泥処理液中に存在する微生物を
含む溶液を含有するガス分解処理方法。
C. In the above treatment method, a gas decomposition treatment method wherein the gas treatment liquid contains an activated sludge treatment liquid or a solution containing microorganisms present in the activated sludge treatment liquid.

【0026】[0026]

【発明の実施の形態】本発明は、被処理ガスとガス処理
液との前記特徴的な気液接触後、好ましくは活性汚泥法
を使用し、微生物の作用により微生物学的にガス処理液
に含まれる有機質ガス成分を分解、その他除去する処理
方法である。活性汚泥法による場合、使用する活性汚泥
にはその接触により有機質ガス成分を分解処理、或いは
その他除去できる活性汚泥が使用可能である。活性汚泥
処理法における処理方法自体も従来から公知の方法が使
用可能である(例えば、特開平5−123527号、特
開昭58−186418号、特公昭57−52066
号、特開昭64−2569号公報等参照。)。
BEST MODE FOR CARRYING OUT THE INVENTION The present invention is characterized in that after the above-mentioned characteristic gas-liquid contact between the gas to be treated and the gas treatment liquid, the activated sludge method is preferably used to microbiologically convert the gas treatment liquid by the action of microorganisms. This is a treatment method for decomposing and removing other organic gas components. In the case of the activated sludge method, activated sludge which can decompose or remove organic gas components by contact with the activated sludge to be used can be used. As the treatment method itself in the activated sludge treatment method, a conventionally known method can be used (for example, JP-A-5-123527, JP-A-58-186418, and JP-B-57-52066).
And JP-A-64-2569. ).

【0027】また、本発明方法に使用するガス処理液に
は、微生物学的処理以外の方法、例えば活性汚泥を用い
ず、薬液、その他を用いて目的とするガスを分解或いは
その他により分離、除去できる方法も利用することがで
きる。更に、今後開発される分解方法等を利用すること
もできる。
The gas treatment liquid used in the method of the present invention may be separated or removed by a method other than microbiological treatment, for example, decomposition or other decomposition of the target gas using a chemical solution or the like without using activated sludge. The available methods can also be used. Further, a decomposition method developed in the future can be used.

【0028】活性汚泥法によりガス処理を行う場合に使
用する活性汚泥としては、生活廃水や工場廃水を好気性
又は嫌気性処理する方法や、この際生成する余剰汚泥か
ら得た固定化微生物を使用することができる。
As the activated sludge used for the gas treatment by the activated sludge method, a method of aerobic or anaerobic treatment of domestic wastewater or industrial wastewater or immobilized microorganisms obtained from excess sludge generated at this time is used. can do.

【0029】本発明において処理可能なガス成分(被処
理ガス)としては、有機質のガス成分であれば特に制限
は無い。活性汚泥処理法等微生物学的に処理を行う場
合、分解等処理可能な微生物を適宜選択して使用できる
ので、広く有機質ガスを処理することができる。
The gas component (gas to be treated) that can be treated in the present invention is not particularly limited as long as it is an organic gas component. In the case of microbiological treatment such as an activated sludge treatment method, microorganisms capable of treatment such as decomposition can be appropriately selected and used, so that organic gas can be treated widely.

【0030】本発明において処理可能な有機質ガス成分
は1種類に限らない。複数成分を含む混合ガスでも同様
に処理することができる。
The organic gas component that can be treated in the present invention is not limited to one type. A mixed gas containing a plurality of components can be similarly treated.

【0031】次に、好ましい実施形態について図1に基
づいて説明するが、勿論本発明はこれに限定されること
はない。
Next, a preferred embodiment will be described with reference to FIG. 1, but of course the present invention is not limited to this.

【0032】図1は本発明において排ガスを処理する装
置の代表的な1例を示す概略図である。
FIG. 1 is a schematic view showing a typical example of an apparatus for treating exhaust gas in the present invention.

【0033】図1に示すように、ガス処理塔として気液
接触可能な充填塔、濡壁塔又は棚段塔等(ガス処理塔1
0)を使用し、その下部より、被処理ガスである有機質
ガスとして溶剤ガスを含む空気等の気体(被処理ガス
1)を送入する。ガス処理塔10内で気液接触後にガス
処理塔の上部から排出される、気液接触後に得られた気
体4の一部を再びガス処理塔10の下部に戻し、ガス処
理塔に供給される被処理ガス1に混合、合流させ、再び
ガス処理塔に送入する。気液接触処理後に得られた気体
4のうち下部に戻される気体6の比率(「循環率」と記
す。)は任意でよいが、ガスの分解率を高めるには循環
率を高くするのが好ましい。一方、循環率が高過ぎると
被処理ガスの処理風量が低下する。通常、20〜80%
程度の循環率が採用される。
As shown in FIG. 1, as a gas treatment tower, a packed tower capable of gas-liquid contact, a wet wall tower, a plate tower, etc. (gas treatment tower 1)
0), and a gas such as air (solvent gas 1) containing a solvent gas as an organic gas, which is a gas to be treated, is fed from the lower portion thereof. A part of the gas 4 obtained after the gas-liquid contact, which is discharged from the upper part of the gas processing tower after the gas-liquid contact in the gas processing tower 10, is returned to the lower part of the gas processing tower 10 again, and is supplied to the gas processing tower. It is mixed with and merged with the gas to be treated 1 and sent again to the gas treatment tower. The ratio (referred to as “circulation rate”) of the gas 6 returned to the lower part of the gas 4 obtained after the gas-liquid contact treatment may be arbitrary, but it is necessary to increase the circulation rate in order to increase the gas decomposition rate. preferable. On the other hand, if the circulation rate is too high, the processing air volume of the gas to be processed decreases. Usually 20-80%
A degree of circulation rate is employed.

【0034】また、別の実施形態として図2に示すよう
にガス処理塔内での処理後の気体を直接ガス処理塔の内
部に戻すこともできる。この場合、気液接触後処理後に
得られた気体を戻す位置は、通常はできるだけ下部が好
ましいが、被処理ガス1の供給位置とあまりに近接して
いるとガス処理塔内での気体の流れに偏流が発生したり
する場合があるので好ましくない。また、戻す位置の数
は一個所でも複数でもよいが、循環率が高い場合は複数
箇所に戻した方が接触効率の上で好ましい。複数箇所に
戻す場合、ダンパー等により戻す気体の配分を決めるこ
ともできるし、戻す位置を適当に変更、調節することも
できる。この場合も、気液接触後に得られた気体の循環
率については、前記の通り通常20〜80%程度が採用
される。
As another embodiment, as shown in FIG. 2, the gas after the treatment in the gas treatment tower can be returned directly to the inside of the gas treatment tower. In this case, the position where the gas obtained after the gas-liquid contact post-treatment is returned is usually preferably as low as possible, but if it is too close to the supply position of the gas 1 to be treated, the gas flow in the gas treatment tower may be reduced. It is not preferable because drift may occur. The number of positions to be returned may be one or more. However, when the circulation rate is high, returning to a plurality of positions is preferable in terms of contact efficiency. When returning to a plurality of places, the distribution of the gas to be returned can be determined by a damper or the like, and the return position can be appropriately changed and adjusted. Also in this case, the circulation rate of the gas obtained after the gas-liquid contact is usually about 20 to 80% as described above.

【0035】更に、気液接触後の気体を一部は直接ガス
処理塔下部へ戻し、他の一部は被処理ガスに混合してガ
ス処理塔に再度供給することもできる。図2において、
点線部分を配管することにより可能となる。
Further, part of the gas after gas-liquid contact may be returned directly to the lower part of the gas processing tower, and the other part may be mixed with the gas to be processed and supplied to the gas processing tower again. In FIG.
This is possible by piping the dotted line.

【0036】また、複数のガス処理塔を並べて適宜一の
ガス処理塔での気液接触後の気体の少なくとも一部を別
の塔で再度気液接触処理を行うこともでき、このような
ガスの処理法も本発明に含まれる。
A plurality of gas treatment towers can be arranged, and at least part of the gas after gas-liquid contact in one gas treatment tower can be subjected again to gas-liquid contact treatment in another tower. Is included in the present invention.

【0037】前記の通り本発明において被処理ガス中に
存在する処理可能なガス成分(処理すべきガス成分)は
特に制限されないが、例えばメチルエチルケトン、アセ
トン、メチルイソブチルケトン、メタノール、エタノー
ル、n−プロピルアルコール、イソプロピルアルコー
ル、ブタノール類、酢酸エチル、トルエン、キシレン、
エーテル、メチレングリコール、メチレングリコールモ
ノメチルアセテート、メチレングリコールモノエチルア
セテート、メチレングリコールモノメチルエーテル、メ
チレングリコールモノエチルエーテル、エチレングリコ
ールモノメチルエーテル、エチレングリコールモノエチ
ルエーテル、プロピレングリコールモノメチルエーテル
等を挙げることができ、また前述の如く、これら単独の
ガス成分に限らず複数成分の混合ガスを含む被処理ガス
を本発明において処理することができる。
As described above, in the present invention, the gas components that can be treated (gas components to be treated) present in the gas to be treated are not particularly limited. For example, methyl ethyl ketone, acetone, methyl isobutyl ketone, methanol, ethanol, n-propyl Alcohol, isopropyl alcohol, butanols, ethyl acetate, toluene, xylene,
Ether, methylene glycol, methylene glycol monomethyl acetate, methylene glycol monoethyl acetate, methylene glycol monomethyl ether, methylene glycol monoethyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, and the like. As described above, a gas to be treated including not only a single gas component but also a mixed gas of a plurality of components can be treated in the present invention.

【0038】被処理ガス(被処理ガス1)の濃度の適用
範囲については、ガスの種類により異なるが、通常好ま
しくは最大で5000ppm位までであり、より好まし
くは最大で3000ppm位まで、更に好ましくは最大
で2000ppm位までである。
The applicable range of the concentration of the gas to be treated (the gas to be treated 1) varies depending on the type of the gas, but is usually preferably up to about 5000 ppm, more preferably up to about 3000 ppm, further preferably up to about 3000 ppm. It is up to about 2000 ppm.

【0039】被処理ガス(戻された場合の全気体を含
む。)のガス処理塔内での平均断面速度は0.01〜1
0m/sec程度である。
The average sectional velocity of the gas to be treated (including all gases when returned) in the gas treatment tower is 0.01 to 1
It is about 0 m / sec.

【0040】[0040]

【実施例】以下に実施例及び比較例を示し、本発明を詳
細に説明する。
The present invention will be described in detail below with reference to examples and comparative examples.

【0041】(実施例1)図1に示すガス処理装置を使
用して、メチルエチルケトンガスの処理をガス処理液に
活性汚泥処理液を用いて行った。
Example 1 Using the gas treatment apparatus shown in FIG. 1, the treatment of methyl ethyl ketone gas was carried out using an activated sludge treatment liquid as the gas treatment liquid.

【0042】図1において、空気中にメチルエチルケト
ンガス2000ppmを含有する被処理ガス1をガス処
理塔10に供給する。気液接触後に得られた気体4のう
ちその35%(戻される気体6)を被処理ガス供給部に
戻し、被処理ガス1と合流させ、ガス処理塔10に再度
供給する。
In FIG. 1, a gas to be treated 1 containing 2000 ppm of methyl ethyl ketone gas in the air is supplied to a gas treatment tower 10. Of the gas 4 obtained after the gas-liquid contact, 35% of the gas 4 (returned gas 6) is returned to the gas to be treated supply unit, merged with the gas to be treated 1, and supplied to the gas treatment tower 10 again.

【0043】このときの空気の空塔スピードは0.9m
/secである。ガス処理液(活性汚泥処理液)の平均断
面スピードは0.3m/secである。このときガス処理
塔10から排出される気体5中のメチルエチルケトンの
ガス濃度は230ppmであった。
At this time, the air tower speed is 0.9 m.
/ Sec. The average sectional speed of the gas treatment liquid (activated sludge treatment liquid) is 0.3 m / sec. At this time, the gas concentration of methyl ethyl ketone in the gas 5 discharged from the gas treatment tower 10 was 230 ppm.

【0044】(比較例1)実施例1において、気液接触
後に得られた気体4をガス処理塔10に戻すことなく、
それ以外の処理条件は実施例1と同様にガス処理を行っ
た。このとき、ガス処理塔10から排出される気体5中
のメチルエチルケトンのガス濃度は390ppmであっ
た。
(Comparative Example 1) In Example 1, the gas 4 obtained after the gas-liquid contact was returned to the gas treatment tower 10 without
Other processing conditions were the same as in Example 1. At this time, the gas concentration of methyl ethyl ketone in the gas 5 discharged from the gas treatment tower 10 was 390 ppm.

【0045】(実施例2)図2に示すガス処理装置を使
用して、メタノールガスの処理をガス処理液に活性汚泥
処理液を用いて行った。
Example 2 Using the gas treatment apparatus shown in FIG. 2, treatment of methanol gas was carried out using activated sludge treatment liquid as the gas treatment liquid.

【0046】図2において、空気中にメタノールガス2
500ppmを含有する被処理ガス1をガス処理塔10
に供給する。気液接触後に得られた気体4の20%に相
当する気体13をガス処理塔10に供給する。
In FIG. 2, methanol gas 2 was introduced into air.
The gas to be treated 1 containing 500 ppm
To supply. The gas 13 corresponding to 20% of the gas 4 obtained after the gas-liquid contact is supplied to the gas treatment tower 10.

【0047】このときの空気の空塔スピードは1.1m
/secである。ガス処理液(活性汚泥処理液)の平均断
面スピードは0.4m/secである。このときガス処理
塔10から排出される気体5中のメタノールのガス濃度
は92ppmであった。
At this time, the air tower speed is 1.1 m.
/ Sec. The average sectional speed of the gas treatment liquid (activated sludge treatment liquid) is 0.4 m / sec. At this time, the gas concentration of methanol in the gas 5 discharged from the gas treatment tower 10 was 92 ppm.

【0048】(比較例2)実施例2において、気液接触
後に得られた気体4をガス処理塔10に戻すことなく外
部に放出し、それ以外の処理条件は実施例2と同様にガ
ス処理を行った。このとき、ガス処理塔10から排出さ
れる気体5中のメタノールのガス濃度は210ppmで
あった。
(Comparative Example 2) In Example 2, the gas 4 obtained after the gas-liquid contact was discharged to the outside without returning to the gas processing tower 10, and other processing conditions were the same as in Example 2. Was done. At this time, the gas concentration of methanol in the gas 5 discharged from the gas processing tower 10 was 210 ppm.

【0049】以上の実施例及び比較例の結果から明らか
なように、特にガス処理液に活性汚泥処理液を使用し、
ガス処理塔内で気液接触後に得られた気体の一部を戻し
て被処理ガス中に混合し、又は直接ガス処理塔へ供給す
ることにより、目的とする被処理ガスの処理効率を一段
と増加させることができる。
As is apparent from the results of the above Examples and Comparative Examples, the activated sludge treatment liquid was used particularly for the gas treatment liquid,
Part of the gas obtained after gas-liquid contact in the gas treatment tower is returned and mixed into the gas to be treated, or supplied directly to the gas treatment tower, further increasing the processing efficiency of the target gas to be treated Can be done.

【0050】[0050]

【発明の効果】ガス処理塔内で、処理すべきガス(被処
理ガス)、例えば有機質ガスとして有機溶剤ガス等を含
有する気体と、ガス処理液とを接触せしめ、接触後に得
られた気体の少なくとも一部を、再度ガス処理塔へ戻す
ことによりガス処理液に溶解する処理すべきガス成分
を、特に微生物学的に処理することにより目的とするガ
ス(被処理ガス)を極めて効率よく分解(ガス分解率の
向上)又は除去することができる。
In the gas treatment tower, a gas to be treated (a gas to be treated), for example, a gas containing an organic solvent gas or the like as an organic gas, is brought into contact with a gas treatment liquid. At least a part of the gas component to be treated, which is dissolved in the gas treatment liquid by returning it to the gas treatment tower again, and particularly, the target gas (gas to be treated) is decomposed very efficiently by microbiological treatment ( Gas decomposition rate) or can be eliminated.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明において排ガスを処理する装置の代表的
な1例を示す概略図である。
FIG. 1 is a schematic view showing one typical example of an apparatus for treating exhaust gas in the present invention.

【図2】本発明において排ガスを処理する装置の別の1
例を示す概略図である。
FIG. 2 shows another apparatus for treating exhaust gas in the present invention.
It is a schematic diagram showing an example.

【符号の説明】[Explanation of symbols]

1: 被処理ガス 2: ファン 4: 気液接触後に得られた気体 5: 排出される気体 6: 戻される気体 7: ポンプ 8: ガス処理液 9: 処理槽 10: ガス処理塔 11〜13: ガス処理塔へのリターンガス 14〜17: ダンパー 1: Gas to be processed 2: Fan 4: Gas obtained after gas-liquid contact 5: Gas to be exhausted 6: Returned gas 7: Pump 8: Gas processing liquid 9: Processing tank 10: Gas processing tower 11 to 13: Return gas to gas treatment tower 14-17: Damper

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】ガス処理塔内で有機質ガス成分を含む被処
理ガスとガス処理液との気液接触を行い、当該ガス処理
塔内での気液接触後に得られた気体の少なくとも一部
を、再度ガス処理塔内でガス処理液と接触せしめて、前
記ガス処理液に溶解する有機質ガス成分を分解又は除去
することを特徴とするガスの処理法。
A gas-liquid contact between a gas to be treated containing an organic gas component and a gas treatment liquid is performed in a gas treatment tower, and at least a part of the gas obtained after the gas-liquid contact in the gas treatment tower is removed. A gas treatment method comprising contacting the gas treatment liquid again in the gas treatment tower to decompose or remove an organic gas component dissolved in the gas treatment liquid.
【請求項2】ガス処理塔が気液接触装置を含み、かつ被
処理ガス及びガス処理液を当該ガス処理塔に供給する配
管を少なくとも有する請求項1記載の処理法。
2. The processing method according to claim 1, wherein the gas processing tower includes a gas-liquid contact device, and has at least a pipe for supplying the gas to be processed and the gas processing liquid to the gas processing tower.
【請求項3】当該気液接触後に得られた気体の少なくと
も一部が、ガス処理塔内に供給される被処理ガスに混合
する請求項1記載の処理法。
3. The processing method according to claim 1, wherein at least a part of the gas obtained after the gas-liquid contact is mixed with the gas to be processed supplied into the gas processing tower.
【請求項4】有機質ガス成分の分解又は除去が微生物学
的処理方法で行われる請求項1記載の処理法。
4. The treatment method according to claim 1, wherein the decomposition or removal of the organic gas component is performed by a microbiological treatment method.
【請求項5】ガス処理液が、活性汚泥処理液又は活性汚
泥処理液に使用可能な微生物を含む溶液を含有する請求
項1記載の処理法。
5. The treatment method according to claim 1, wherein the gas treatment liquid contains an activated sludge treatment liquid or a solution containing microorganisms usable in the activated sludge treatment liquid.
【請求項6】有機質ガスが有機溶剤ガスの少なくとも1
種である請求項1記載の処理法。
6. An organic solvent gas comprising at least one organic solvent gas.
The method of claim 1 which is a seed.
【請求項7】当該ガス処理塔内での気液接触後に得られ
た気体の少なくとも一部を、当該気液接触処理を行った
ガス処理塔とは異なるガス処理塔内でガス処理液と気液
接触を行う請求項1記載の処理法。
7. At least a part of the gas obtained after the gas-liquid contact in the gas treatment tower is separated from the gas treatment liquid in a gas treatment tower different from the gas treatment tower that has performed the gas-liquid contact treatment. The treatment method according to claim 1, wherein liquid contact is performed.
JP11108517A 1999-04-15 1999-04-15 Gas treatment method Withdrawn JP2000300937A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11108517A JP2000300937A (en) 1999-04-15 1999-04-15 Gas treatment method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11108517A JP2000300937A (en) 1999-04-15 1999-04-15 Gas treatment method

Publications (1)

Publication Number Publication Date
JP2000300937A true JP2000300937A (en) 2000-10-31

Family

ID=14486810

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11108517A Withdrawn JP2000300937A (en) 1999-04-15 1999-04-15 Gas treatment method

Country Status (1)

Country Link
JP (1) JP2000300937A (en)

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