JP2000284305A - Liquid crystal panel substrate, its production and liquid crystal display device and electronic appliance using liquid crystal panel substrate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a liquid crystal panel substrate which has a function to scatter light without darkening the display and which can be produced without using a special device for the production. SOLUTION: This liquid crystal panel substrate 30 is prepared by forming a display electrode 32 on a substrate 31. The display electrode 32 consists of a lower film 36 and an upper film 34 formed on the lower film 36, and the lower film 36 consists of an ITO film by depositing a granular material 37. The upper film 34 consists of a metal essentially comprising aluminum or silver and has openings 35. The granular material 37 to form the lower film 36 is deposited at an about 1 to 10 μm pitch to about 0.1 to 1.5 μm height.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal panel substrate, a method for manufacturing the same, a liquid crystal display device and an electronic apparatus using the liquid crystal panel substrate.

[0002]

2. Description of the Related Art In a reflection type or transflective type liquid crystal display device, reflection of a user and a background is reduced, and a mirror-like display is avoided. It is common to provide a scattering layer for the purpose of ensuring brightness at a wide viewing angle.

However, when a scattering layer is added to a liquid crystal display device, light absorption is also caused by the layer, and there is a problem that the display becomes dark.

Further, as disclosed in Japanese Patent Application Laid-Open No. Hei 7-333598, for example, it is considered that the absorption of light due to the provision of the scattering layer is reduced by making the polarizer also function as a scattering layer. Can be However, the technique disclosed in this publication involves the addition and processing of a transparent film made of a resin, and requires a special manufacturing apparatus that is not usually used for manufacturing a liquid crystal display device.

The present invention has been made in view of the above points, and has as its object to provide a function of scattering light without darkening a display and to use a special manufacturing apparatus. An object of the present invention is to provide a liquid crystal panel substrate that can be manufactured, a method of manufacturing the same, a liquid crystal display device and an electronic device using the liquid crystal panel substrate.

[0006]

(1) A liquid crystal panel substrate according to the present invention is a liquid crystal panel substrate including a substrate and a display electrode formed on the substrate, wherein the display electrode is And a conductive lower layer film formed by laminating granular materials, and an upper layer film made of metal and formed on the lower layer film.

In the liquid crystal panel substrate according to the present invention, a display electrode is formed by forming an upper layer film made of metal on a conductive lower layer film formed by laminating particles. Therefore, the unevenness of the lower layer film caused by the formation of the granules stacked on each other also appears in the upper layer film formed on the lower layer film. Therefore, the display electrode can also function as a reflective layer having an uneven surface, and can reflect and scatter incident light.

When a liquid crystal display device is formed by using a liquid crystal panel substrate having such display electrodes as a liquid crystal panel substrate on the back side, light can be scattered without adding a light scattering layer. As in the case where light is additionally scattered, the display is not darkened due to light absorption by the scattering layer, and a bright liquid crystal display device can be obtained. In addition, since the display electrode that is close to the liquid crystal also functions as a reflective layer, the liquid crystal layer that controls the amount of transmitted light and the reflective layer are close to each other, and display quality degradation due to parallax when viewed obliquely is reduced. A small number of liquid crystal display devices can be formed.

Further, the display electrodes can be formed using a usual manufacturing apparatus used for manufacturing a liquid crystal panel substrate, and no special equipment is required.

(2) The liquid crystal panel substrate according to the present invention comprises:
The lower film is made of a transparent material, and an opening is formed in the upper film.

According to the present invention, in such a liquid crystal panel substrate, since the upper layer film made of metal has an opening and the lower layer film is made of a transparent material, the display electrode is formed on the upper layer film. Part of the light can be transmitted through the opening, and part of the light can be reflected at a portion other than the opening of the upper layer film. Therefore, the display electrode can also serve as the transflective film, and a transflective liquid crystal display device can be formed by using such a liquid crystal panel substrate as the rear liquid crystal panel substrate.

(3) The liquid crystal panel substrate according to the present invention comprises:
The lower film is made of ITO (Indium Tin Oxide).

According to the present invention, the lower layer film of the display electrode is formed of highly conductive ITO which is very commonly used for a liquid crystal panel substrate. Therefore, the lower layer film can be manufactured by using a manufacturing apparatus generally used for a liquid crystal panel substrate. Further, a display electrode with low resistance can be formed.

(4) The liquid crystal panel substrate according to the present invention comprises:
The upper layer film is formed of a metal containing aluminum or silver as a main component.

According to the present invention, aluminum or silver has good conductivity, and can form a reflective film with little coloring and high reflectivity, so that a display electrode with low resistance can be formed. Thus, a display electrode that also functions as a reflective layer having a high reflectance can be obtained.

(5) The liquid crystal panel substrate according to the present invention comprises:
In the lower layer film, the granules are arranged at a pitch of about 1 to 10 μm, and the height of the granules is about 0.1 to 1.5 μm.

According to the present invention, there is provided a liquid crystal panel substrate provided with a display electrode which has been experimentally confirmed to function properly as a scattering layer.

(6) In the liquid crystal display device according to the present invention, any one of the liquid crystal panel substrates and a transparent electrode are provided on a side of the liquid crystal panel substrate facing the electrodes, and are disposed on a front side of the liquid crystal panel substrate. Front side liquid crystal panel substrate,
And a liquid crystal sealed between the liquid crystal panel substrate and the front side liquid crystal panel substrate.

In the liquid crystal display device according to the present invention, light can be scattered forward without adding a light scattering layer. The display does not become dark due to absorption of light, and a bright display can be performed. In addition, since the electrode close to the liquid crystal also functions as a reflective layer, the liquid crystal layer that controls the amount of transmitted light and the reflective layer come close to each other, and the display quality deteriorates due to parallax when viewing the display surface from an oblique direction. Thus, a liquid crystal display device with less noise can be formed.

(7) An electronic apparatus according to the present invention includes the liquid crystal display device as a display unit.

(8) In the method of manufacturing a liquid crystal panel substrate according to the present invention, the method of manufacturing a liquid crystal panel substrate may include the steps of:
A step of forming an O film by vapor deposition, a step of patterning the ITO film into a shape of a display electrode, and a step of forming an upper layer film made of a metal containing aluminum or silver as a main component on the ITO film. Patterning the upper layer film into a shape of a display electrode having an opening. The vapor deposition in the ITO film forming step includes oxygen partial pressure,
At least one of the SnO ₂ concentration and the vapor deposition speed is performed under the condition of granular enlargement different from the normal condition, wherein the normal condition is that the oxygen partial pressure is 1 × 10 ⁻³ to 5 × 10 ⁻³ Pa About SnO ₂ concentration of about ^{3 to} 7 wt% Deposition speed is about 30 to 50 nm / s, and the conditions for enlarging the granular material are as follows: oxygen partial pressure: 1 × 10 ^{−4 to} 3 × 10 ⁻³ Pa Approximately 5 to 15 wt% at a SnO ₂ concentration and approximately 40 to 200 nm / s at a deposition rate.

According to the present invention, the granular material forming the ITO film becomes larger and more appropriate in size than that obtained by vapor deposition under normal conditions, so that the upper layer film formed on the ITO film is formed. Can be provided with suitable asperities to scatter light.

Further, since an opening is formed in the upper layer film,
A display electrode which can function as a transflective film can be formed.

(9) In the method of manufacturing a liquid crystal panel substrate according to the present invention, an IT in which a granular material is laminated on a substrate is formed.
A step of forming an O film by vapor deposition, a step of forming an upper layer film made of a metal containing aluminum or silver as a main component on the ITO film, and forming the ITO film and the upper layer film in a shape of a display electrode. Patterning, and the vapor deposition in the ITO film forming step includes oxygen partial pressure, SnO 2
_{(2) At} least one of the concentration and the deposition speed is performed under a condition for enlarging the granular material which is different from the normal condition. Here, the normal condition means that the oxygen partial pressure is 1 × 10 ^{−3 to} 5 × 10 ⁻³ Pa About SnO ₂ concentration of about ^{3 to} 7 wt% Deposition speed is about 30 to 50 nm / s, and the conditions for enlarging the granular material are as follows: oxygen partial pressure: 1 × 10 ^{−4 to} 3 × About 10 ⁻³ Pa About 5 to 15 wt% at a SnO ₂ concentration, about 40 to 200 nm / s at a deposition rate.

According to the present invention, the granular material forming the ITO film becomes larger and has an appropriate size as compared with the case of vapor deposition under normal conditions, so that the aluminum film formed on the ITO film is formed. Can be provided with suitable asperities to scatter light.

Further, since the patterning of ITO and the patterning of aluminum are performed simultaneously, a liquid crystal panel substrate can be manufactured with a small number of steps.

[0027]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below more specifically with reference to the drawings.

1. First Embodiment 1.1 Structure and Function of Liquid Crystal Display Device FIG. 1 is a schematic cross-sectional view showing a liquid crystal display device 10 of the present embodiment. As shown in FIG.
Has a polarizer 14 and a retardation plate 16 disposed on the front side (display surface side) of the liquid crystal cell 18, and a polarizer 60 and a light guide plate 64 as an illumination device disposed on the rear side of the liquid crystal cell 18. It is formed. In FIG. 1 and other similar drawings, there is a gap between each of the elements constituting the liquid crystal display device. However, this is for convenience of illustration. They are almost in close contact with each other.

The phase difference plate 16 is composed of an STN type liquid crystal cell 18.
This is to eliminate coloring caused by the refractive index anisotropy of. The retardation plate 16 is formed as a polymer film formed by stretching a polymer material such as polystyrene or polycarbonate, and has a refractive index anisotropy.

The light guide plate 64 guides the light from the light source 66 through, for example, the inside of the panel fixing frame 68, enters the end face 65, and emits the light toward the liquid crystal cell 18. The light guide plate 64 is formed of, for example, a polyolefin resin that is optically substantially isotropic. The panel fixing frame 68 for guiding the light from the light source 66 to the light guide plate 64 is made of an optically isotropic polyolefin resin, a polycarbonate resin, an acrylic resin, or the like. The light emitted from the light source 66 is transmitted to the light guide plate 6 by the panel fixing frame 68.
The light is guided to the end face 65 of the light guide 4, introduced into the light guide plate 64, and emitted toward the liquid crystal cell 18. As the light source 52, an LED (light emitting diode) or a fluorescent tube is used.

The liquid crystal cell 18 includes a liquid crystal panel substrate 20 on the display surface side as a front liquid crystal panel substrate having a stripe-shaped transparent electrode 22 formed on one side on a substrate 21, and a substrate 3.
A liquid crystal panel substrate 30 on which a striped display electrode 32 is formed on one side is separated from the liquid crystal panel substrate 30 by a gap material (not shown) or the like.
Transparent electrode 22 and display electrode 32 of liquid crystal panel substrate 30
Matrix type liquid crystal cell 1 in which
It is 8. The pair of liquid crystal panel substrates 20 and 3
STN-type liquid crystal 50 is filled between 0, and the opposing peripheral edges of the liquid crystal panel substrates 20 and 30 are sealed with a sealing material 52. In FIG. 1, the pair of liquid crystal panel substrates 20 and 30 are drawn widely apart, but this is for clarity of illustration, and actually, the pair of liquid crystal panel substrates 20 and 30 are They face each other with a narrow gap of μm to several tens μm. Although only a few stripe-shaped transparent electrodes 22 and display electrodes 32 are shown in FIG. 1, a large number of stripe-shaped transparent electrodes 22 and display electrodes 32 are actually provided corresponding to the resolution of matrix display. Provided as an electrode for use.

Further, as schematically shown in FIG. 1, a color filter 24 is provided on the liquid crystal panel substrate 20 on the display surface side, and the surface of the color filter 24 is covered with a flat coat (top coat) 26. Covered. On the surface of the flattening film 26, the above-mentioned transparent electrode 22 in a stripe shape is provided.

The back side liquid crystal panel substrate 30 will be described in detail below.

The liquid crystal display device 10 also includes, in addition to the components shown in FIG. 1, an alignment film provided facing the liquid crystal 24, and a drive circuit for driving the electrodes 22, 32.

1.2 Liquid Crystal Panel Substrate Of the two liquid crystal panel substrates constituting the liquid crystal cell 18,
The liquid crystal panel substrate 30 on the side far from the display surface, that is, on the back side
2 is shown as a schematic plan view, and FIG. 3 is a schematic cross-sectional view showing the vicinity of the display surface side of the liquid crystal panel substrate 30 in more detail. As shown in these figures, a liquid crystal panel substrate 30 includes a substrate 31, a display electrode 32 formed on the substrate 31, and a display electrode 32 also formed on the substrate 31,
And connection terminals 40 connected to the corresponding display electrodes 32. Note that the dotted lines in FIG. 2 indicate that a large number of display electrodes 32 or connection terminals 40 provided are omitted.

As shown in FIGS. 1 and 3, the display electrode 32 is formed of two layers: a lower film 36 formed on the substrate 31 and an upper film 34 formed on the lower film 36. .

As shown in FIG. 3, the lower layer film 36 is made of ITO (Indium Tin Oxid) having a structure in which granular bodies 37 are stacked.
e) A film that is transparent and conductive. Thus, I
Since the lower layer film 36 made of TO has a structure in which the granular bodies 37 are stacked, the surface has irregularities. As shown in FIG. 4 which is an enlarged view of FIG. 3, in the lower layer film 36, the granular bodies 37 are arranged at a pitch P of about 1 to 10 μm, and the height H of the granular bodies 37 is 0.1 to 1.5 μm. It has become about. By forming the granules 37 at such a pitch and height, a liquid crystal panel substrate including the display electrode 32 that has been experimentally confirmed to function properly as a scattering layer can be obtained. In addition, the lower layer film 36 formed of ITO, which is generally used in a liquid crystal panel substrate and has high conductivity, can be manufactured using a manufacturing apparatus generally used for manufacturing a liquid crystal panel substrate.

The upper layer film 34 is formed of a metal containing aluminum or silver as a main component. Aluminum or silver has good conductivity, and can form a reflective film with little coloring and high reflectance, so that the display electrode 32 with low resistance can be formed and also functions as a reflective layer with high reflectance. The display electrode 32 is obtained. In addition, the unevenness of the lower layer film 36 caused by the formation of the granular bodies 37 also appears on the upper layer film 34 formed on the lower layer film 36. Therefore, the display electrode 32 can also function as a reflective layer having an uneven surface, and can reflect and scatter incident light.
As shown in FIG. 4, the irregularities of the upper layer film 34 are such that the granular bodies 37 forming the lower layer film 36 are arranged at a pitch P of about 1 to 10 μm, and the height H of the granular bodies 37 is 0.1 to 10 μm. 1.5
Since the thickness is on the order of μm, the shape corresponds to the unevenness of the surface of the lower layer film 36 that occurs. It has been experimentally confirmed that the upper layer film 34 having such irregularities functions properly as a scattering layer.

When the liquid crystal display device 10 is formed by using the liquid crystal panel substrate 30 having the above-described display electrodes 32 as the liquid crystal panel substrate 30 on the rear side, light can be scattered without adding a light scattering layer. Therefore, unlike the case where light is scattered by adding a scattering layer, the display does not become dark due to absorption of light by the scattering layer, and a bright liquid crystal display device 10 can be obtained. In addition, since the display electrode 32 close to the liquid crystal also functions as a reflective layer, the liquid crystal 50 for controlling the amount of transmitted light is close to the reflective layer, and the display quality is degraded due to parallax when viewed obliquely. It is possible to form the liquid crystal display device 10 with less number.

The upper layer film has an opening 35 as shown in FIGS. The display electrode 32 includes an upper film 34 and a lower film 36, and the opening 3
Since the lower layer 36 made of ITO, which is a transparent conductive material, also exists in the portion 5, a region where no electric field is applied to the liquid crystal 50 due to the presence of the opening 35 provided in the upper layer 34. Will not occur. In such a liquid crystal panel substrate 30, the upper layer film 34 made of metal has the opening 3
5, and the lower layer film 36 is made of ITO, which is a transparent material. Therefore, the display electrode 32 transmits light through the opening 35 formed in the upper layer film 34, and
Light can be reflected at other parts. Therefore,
The display electrode 32 can also serve as a transflective film. When the transflective liquid crystal display device 10 is formed by using such a liquid crystal panel substrate 30 as the liquid crystal panel substrate 30 on the rear side, a transflective liquid crystal is formed. The display device 10 is obtained.

As described above, in the liquid crystal display device 10 of the present embodiment, the display electrode 3 which also functions as a reflective layer
2, the light incident on the liquid crystal display device 10 is scattered, so that the display is not darkened by the absorption by the scattering layer as in the case where the scattering layer is separately provided, and the reflection of the user and the background is small. In addition, it is possible to avoid a mirror display.

1.3 Method of Manufacturing Liquid Crystal Panel Substrate Next, a method of manufacturing the liquid crystal panel substrate 30 on the side remote from the display surface, that is, on the back side, of the two liquid crystal panel substrates constituting the liquid crystal cell 18 will be described.

First, the I as the lower layer film 36 is formed on the substrate 31.
A TO film is formed by vapor deposition. In this deposition, I
Of the three main conditions in the deposition of the TO film, two conditions, namely, the oxygen partial pressure, the SnO ₂ concentration, and the deposition speed, are two normal conditions, and one condition is an appropriate condition (granularity) for enlarging the granular material. Under the conditions of body hypertrophy), irregularities are formed on the surface of the ITO film. For example, the oxygen partial pressure is set to 4 × 10 ⁻³ Pa, the SnO ₂ concentration is set to 5 wt%, and the vapor deposition speed is set to 150 nm / 150 which is about three times the normal speed.
By setting s, the granular material forming the ITO film becomes larger than under normal conditions, and the granular material 37 becomes 1 to 10
The particles are arranged at a pitch P of about μm, and the height H of the granular material is 0.
4 to about 1.5 μm.
At the same time, the irregularities described above can be formed on the surface of the ITO film.

It is to be noted that the granular material is enlarged and the I
In order to form appropriate irregularities on the surface of the TO film, it is necessary to use ITO.
It can be formed by setting any one of the three main conditions in the vapor deposition as the condition for enlarging the granular material and setting the other two conditions as the normal condition.

Here, the normal condition is that the oxygen partial pressure is about 1 × 10 ^{−3 to} 5 × 10 ⁻³ Pa, the SnO ₂ concentration is about ^{3 to} 7 wt%, and the deposition speed is about 30 to 50 nm / s. The conditions for the enlargement of the granular material are as follows: about 1 × 10 ^{−4 to} 3 × 10 ⁻³ Pa at oxygen partial pressure, about 5 to 15 wt% at SnO ₂ concentration, and about 40 to 200 nm / s at the deposition speed. .

Next, the ITO film as the lower layer film 36 is subjected to photolithography and etching to pattern the ITO film into the shape of the display electrode 32.

Next, an upper film 34 mainly containing aluminum or silver is formed on the substrate 31 on which the lower film 36 is formed. This film formation is performed by depositing aluminum by a sputtering method at a degree of vacuum of about 10 ^-1 Pa, for example.

Thereafter, the upper film 34 is patterned into a shape of the display electrode 32 having the opening 35 by performing photolithography and etching on the upper film 34. Thereby, the display electrode 3 having a predetermined shape is formed.
2 is formed on the substrate 31 to obtain the liquid crystal panel substrate 30.

According to the method of manufacturing the liquid crystal panel substrate 30 of the present embodiment, the granular material 37 forming the ITO film as the lower layer film 36 becomes larger and more suitable than the case of vapor deposition under normal conditions. Therefore, the lower layer film 36, that is, the upper layer film 34 formed on the ITO film can have appropriate unevenness for scattering light.

Further, since the openings 35 are formed in the upper layer film 34 made of a metal containing aluminum or silver as a main component, it is possible to form the display electrode 32 which can function as a transflective film. .

1.4 Electronic Equipment Equipped with Liquid Crystal Display Device FIGS. 5A, 5B, and 5C show examples of electronic equipment using the liquid crystal display device 10 of the present embodiment as a display unit. It is an external view. FIG. 5A shows a mobile phone 88 having a liquid crystal display device 10 at the upper front thereof. FIG. 5B shows a wristwatch 92, in which a display unit using the liquid crystal display device 10 is provided at the center of the front of the main body. FIG.
(C) is a portable information device 96, which is a liquid crystal display device 10.
And an input unit 98. These electronic devices are not shown, in addition to the liquid crystal display device 10,
It is configured to include various circuits such as a display information output source, a display information processing circuit, and a clock generation circuit, and a display signal generation unit including a power supply circuit that supplies power to those circuits. For example, in the case of a portable information device, a display image is formed by supplying a display signal generated by a display signal generation unit based on information input from the input unit 98 to the display unit.

The electronic devices into which the liquid crystal display device 10 of the present embodiment is incorporated are not limited to portable telephones, watches, and portable information devices, but may be notebook computers, electronic notebooks, pagers, calculators, POS terminals, IC cards, and the like. And various electronic devices such as a mini-disc player.

1.5 Modification of First Embodiment The present invention is not limited to the above-described embodiment.
Various modifications can be made within the scope of the present invention or within the equivalent scope of the claims.

1.5.1 In the above description, an example in which an ITO film is used as the lower layer film has been described. The film may be another conductor, such as SnO ₂ , or ZnO ₂ . Note that, in this case, the film forming method for making the granular body an appropriate size is not limited to vapor deposition, and may be, for example, CVD or sputtering.
Further, even when vapor deposition is used, it is necessary to select an appropriate condition for the conductor used.

1.5.2 In the above, the transflective liquid crystal display device 10 is provided by providing an opening 35 in the upper layer film 34 of the display electrode 32 so that a part of light can be transmitted. The example of forming is shown. However, even if the upper layer film 34 of the display electrode 32 is formed to have a sufficiently small thickness (for example, 10 to 30 nm when formed of aluminum), the display electrode 32 reflects a part of light and To Penetrate. Therefore, if the upper layer film 34 of the display electrode 32 is formed with such a thickness, the transflective liquid crystal can be formed without providing the opening 35 in the upper layer film 34 of the display electrode 32 as in the above-described example. A display device can be formed.

1.5.3 In the above, an example has been shown in which the retardation plate 16 is used to eliminate coloring caused by the optical anisotropy of the liquid crystal cell 18 using STN type liquid crystal. If such coloring does not pose a problem, or if a liquid crystal cell using a liquid crystal with low optical anisotropy, for example, a TN type liquid crystal, it is not necessary to provide the retardation plate 16.

1.5.4 In the above description, an example was given in which the color filter 24 and the flattening film 26 covering the color filter 24 were provided. However, in the case of a monochrome liquid crystal display device, the color filter 24 and the flattening film 26 were provided. Need not be provided.

1.5.5 In the above, an example of a simple matrix liquid crystal display device using STN type liquid crystal has been described. However, as a liquid crystal display device, a static drive liquid crystal display device, , A three-terminal type thin film transistor element represented by a TFT (Thin Film Transistor) using a switching element or a TFD (Thin Film Diode).
de) Active matrix liquid crystal display device using two-terminal nonlinear element represented by
Various types of liquid crystal display devices such as a TN type, a guest host type, a phase transition type, and a ferroelectric type can be used.

2. <Second Embodiment> A second embodiment is characterized in that an opening is not provided in an upper layer film of a display electrode in a liquid crystal panel substrate on a back side, and accordingly, a method of manufacturing a liquid crystal panel substrate is somewhat simplified. The second embodiment differs from the first embodiment in that the liquid crystal display device is formed as a reflection type. Other points are the same as in the first embodiment, and a description thereof will be omitted. In the drawings, corresponding parts are denoted by the same reference numerals as in the first embodiment.

2.1 Liquid Crystal Display Device and Liquid Crystal Panel Substrate FIG. 6 is a schematic sectional view showing a liquid crystal display device 70 of the present embodiment. As shown in FIG.
Is a reflection type liquid crystal display device, the liquid crystal display device 10 of the first embodiment is not provided with the polarizer 60 and the light guide plate 64 located on the back side of the liquid crystal cell 18.
The liquid crystal display device 70 is formed by arranging the polarizer 14 and the retardation plate 16 on the front side (display surface side) of the liquid crystal cell 18.

FIG. 7 is a schematic plan view showing the liquid crystal panel substrate 72 on the rear side constituting the liquid crystal display device 70 of the present embodiment of the present embodiment, and corresponds to FIG. 2 in the first embodiment. . As shown in this figure, the liquid crystal panel substrate 72 on the rear side constituting the liquid crystal display device 70 of the present embodiment is:
The difference from the liquid crystal panel substrate on the back side in the first embodiment is that the display electrode 74 has no opening.

2.2 Method of Manufacturing Liquid Crystal Panel Substrate Two liquid crystal panel substrates 20 and 7 constituting the liquid crystal cell 71
Among them, a method of manufacturing the liquid crystal panel substrate 72 on the side farther from the display surface, that is, on the back side, will be described.

First, an ITO film is formed on the substrate 31 by vapor deposition. This vapor deposition is performed in the same manner as in the first embodiment, and the granular material 37 forming the ITO film is enlarged as compared with the case of the normal condition, and as shown in FIG. The granular material 37 is formed at a pitch P of the order of about 0.1 to 1.5 μm.

Next, the ITO film as the lower layer film 36 is subjected to photolithography and etching to pattern the ITO film into the shape of the display electrode 74.

In the next step, the patterning of the ITO film shown in the first embodiment is not performed, and the upper film 34 made of a metal mainly containing aluminum or silver is formed on the substrate 31 on which the lower film 36 is formed. Is formed. This film formation is performed by depositing aluminum by a sputtering method at a degree of vacuum of about 10 ^-1 Pa, for example.

Thereafter, the upper film 34 and the lower film 36 are subjected to photolithography and etching,
The two layers of the upper film 34 and the lower film 36 are simultaneously patterned into the shape of the display electrode 74. Thus, the liquid crystal panel substrate 72 in which the display electrodes 74 having a predetermined shape are formed on the substrate 31 is obtained.

Also in the method of manufacturing the liquid crystal panel substrate 30 of the present embodiment, the granular material 37 forming the ITO film as the lower layer film 36 becomes larger and more suitable than the case of vapor deposition under normal conditions. Because of the size, the upper layer film 34 formed on the lower layer film 36 can have appropriate unevenness for scattering light.

2.3 Modifications of Second Embodiment Also in the second embodiment, modifications 1.5.3, 1.5.4, and 1.5.5 of the first embodiment described above are similarly applied. Can be implemented. In the present embodiment, the following modified examples are also possible.

2.2.1 In the above, an example has been shown in which a transparent ITO film is used as the lower film. However, the lower layer film may be made of another transparent conductor, for example, SnO ₂ or ZnO ₂ , or may be opaque as long as irregularities having an appropriate shape can be formed on the surface by the structure in which the granular materials are stacked. It may be a conductor. Note that, in this case, the film forming method for making the granular body an appropriate size is not limited to vapor deposition, and may be, for example, CVD or sputtering. Further, even when vapor deposition is used, it is necessary to select an appropriate condition for the conductor used.

[Brief description of the drawings]

FIG. 1 is a schematic cross-sectional view illustrating a liquid crystal display device according to a first embodiment.

FIG. 2 is a schematic plan view showing a liquid crystal panel substrate on the back side of the first embodiment.

FIG. 3 is a schematic sectional view showing details in the vicinity of the surface of the liquid crystal panel substrate shown in FIG. 2;

FIG. 4 is a schematic sectional view showing FIG. 3 in a further enlarged manner.

FIGS. 5A and 5B are external views illustrating an electronic device using the liquid crystal display device according to the first embodiment; FIG.
(B) is a wristwatch, and (C) is a portable information device.

FIG. 6 is a schematic cross-sectional view illustrating a liquid crystal display device according to a second embodiment.

FIG. 7 is a schematic plan view showing a liquid crystal panel substrate on the rear side according to a second embodiment.

[Explanation of symbols]

 10, 70 Liquid crystal display device 18, 71 Liquid crystal cell 20 Liquid crystal panel substrate (display surface side) 22 Transparent electrode 30, 72 Liquid crystal panel substrate (rear side) 31 Substrate 32, 74 Display electrode 34, 75 Upper layer film 35 Opening 36 Lower layer film 37 Granular material 50 Liquid crystal

Continued on the front page F-term (reference) 2H088 EA03 FA10 FA18 FA30 GA02 HA02 HA12 HA15 JA13 MA06 MA07 2H092 GA05 GA16 GA17 GA19 HA02 HA05 MA04 MA13 MA17 MA35 MA37 NA01 NA25 PA08 PA10 PA12 QA10 5C094 AA07 AA12 AA22 DB04 CA19 CA19 EA05 EA06 EB02 EB04 ED03 ED11 ED13 FA01 FA02 FB02 FB12 GB10 JA01 JA08 JA20

Claims (9)

[Claims] 1. A liquid crystal panel substrate comprising: a substrate; and a display electrode formed on the substrate, wherein the display electrode is a conductive lower layer film formed by laminating particles. A liquid crystal panel substrate comprising: a metal; and an upper layer film formed on the lower layer film. 2. The liquid crystal panel substrate according to claim 1, wherein the lower layer film is made of a transparent material, and an opening is formed in the upper layer film. 3. The liquid crystal panel substrate according to claim 1, wherein the lower film is made of ITO (Indium Tin Oxide). 4. The liquid crystal panel substrate according to claim 1, wherein the upper layer film is formed of a metal containing aluminum or silver as a main component. 5. The lower layer film according to claim 1, wherein the granular material is arranged at a pitch of about 1 to 10 μm, and the height of the granular material is 0.1 to 1.5 μm. A liquid crystal panel substrate characterized in that: 6. The liquid crystal panel substrate according to claim 1, further comprising: a transparent electrode provided on a side of the liquid crystal panel substrate facing the electrode, wherein the transparent electrode is provided on a front side of the liquid crystal panel substrate. A liquid crystal display device comprising: a front liquid crystal panel substrate; and liquid crystal sealed between the liquid crystal panel substrate and the front liquid crystal panel substrate. 7. An electronic apparatus comprising the liquid crystal display device according to claim 6 as display means. 8. A step of depositing an ITO film formed by laminating a granular material on a substrate by vapor deposition; a step of patterning the ITO film into a shape of a display electrode; A step of forming an upper layer film made of a metal containing silver as a main component; and a step of patterning the upper layer film into a shape of a display electrode having an opening. Is the oxygen partial pressure, Sn
At least one of the O ₂ concentration and the vapor deposition speed is performed under the condition of the granular body enlargement different from the normal condition. Here, the normal condition means that the oxygen partial pressure is 1 × 10 ⁻³ to About 5 × 10 ⁻³ Pa SnO ₂ concentration is about ^{3 to} 7 wt% Deposition speed is about 30 to 50 nm / s, and the conditions for enlarging the granular material are as follows: Oxygen partial pressure: 1 × 10 ^{−4 to} 3 A method of manufacturing a liquid crystal panel substrate, wherein the concentration is about 5 to 15 wt% at a SnO ₂ concentration of about 10 to ³ Pa at a deposition rate of about 40 to 200 nm / s. 9. A step of depositing an ITO film formed by laminating granular materials on a substrate by vapor deposition, and forming an upper layer film made of a metal containing aluminum or silver as a main component on the ITO film. And a step of patterning the ITO film and the upper layer film into a shape of a display electrode. The vapor deposition in the ITO film forming step includes oxygen partial pressure, Sn
At least one of the O ₂ concentration and the vapor deposition speed is performed under the condition of granular body enlargement different from the normal condition. Here, the normal condition means that the oxygen partial pressure is 1 × 10 ⁻³ to 5 × 10 ⁻³ Pa About SnO ₂ concentration of about ^{3 to} 7 wt% Deposition speed is about 30 to 50 nm / s, and the conditions for enlarging the granular body are as follows: Oxygen partial pressure: 1 × 10 ^{−4 to} 3 × in ¹⁰ -3 Pa approximately SnO ₂ concentration, in the 5 to 15 wt% about deposition speed, a method of manufacturing a liquid crystal panel substrate, wherein the range of about 40 to 200 nm / s.