JP2000275688A - Wavelength selective and variable wavelength selective waveguide device, and material for this waveguide device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a wavelength selective and variable wavelength selective waveguide element, which can change the wavelength of light selectively to be transmitted by forming a grating structure in a nonlinear optical material to impart wavelength selectivity and varying the refractive index of the nonlinear optical material, by a proper means to vary the refractive index. SOLUTION: This nonlinear optical material consists of a polymer material, containing an optically nonlinear component having one electron withdrawing group and one electron donating group coupled in a π-electron conjugate system and having one group selected from urethane group, urea group, amide group, carboxyl group and hydroxy group in the recurring unit of the polymer. By incorporating one or more kinds of the groups, these groups form hydrogen bond in the molecule or among molecules to form a pseudo-crosslinked structure. With he pseudo-crosslinked structure, the glass transition temp. of the polymer increases, to improve the heat resistance of the polymer material. As a result, even when the waveguide device is disposed in heating or high temp. environments, fracture or changes similar to the fracture of the grating structure can be prevented.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wavelength-selective variable wavelength-selective waveguide element having a wavelength selectivity based on a grating structure of a waveguide layer and capable of reversibly changing the refractive index of the grating structure. And a waveguide element material used for a core portion of the waveguide element.

[0002]

2. Description of the Related Art A wavelength-selective variable wavelength-selective waveguide element can be used for applications such as a wavelength-selective element in wavelength division multiplexing communication and a wavelength-variable mirror of a parametric oscillator type laser. The application field is further expanded by integrating with an optical modulator.

Regarding waveguides, “Appl. Phys. Lett. 66
(10), 6 March 1995, P1166-1168 ''
hy et al., Laser-induced holographic surface reli
In efgratings on nonlinear optical polymer films, the use of a wavelength-selective variable-wavelength-selective waveguide element has not been considered, but a waveguide made of a polymer material having a grating structure with a repeating uneven structure has been studied. I have.

On the other hand, Deac in US Pat. No. 5,732,177
on et al.'s Controllable BeamDirector using Poled
In "Structure", a wavelength-selective variable wavelength-selective waveguide element using an inorganic material is proposed.

[0005]

However, the above Tr
In a study by ipathy et al., although a polymer material has optical non-linearity, the polymer material (polymerized acrylic polymer) has a heat-resistant property of causing collapse or a change equivalent to the grating structure by heating. Tripathy et al. Himself acknowledged that it was associated with performance and reliability problems.

Also, in the proposal of Deacon et al., Since an inorganic material is used, the cost is increased, the manufacturing process of the grating structure is complicated, and it is difficult to manufacture a sheet-shaped integrated element group. Is accompanied by a defect such as

Accordingly, the present invention provides a material suitable for a wavelength-selectable variable wavelength-selective waveguide element which does not have the above-mentioned various disadvantages, and further provides a wavelength-selectable variable-type waveguide element using the material. The problem to be solved is to provide a wavelength-selective waveguide element.

[0008]

(Structure of the first invention) The structure of the first invention (the invention described in claim 1) for solving the above-mentioned problem is to form at least a part of the waveguide layer portion. A wavelength selective tunable waveguide element, comprising: an optical waveguide having a grating structure provided in a nonlinear optical material to be provided with wavelength selectivity; and means for reversibly changing the refractive index of the nonlinear optical material. In the above, the nonlinear optical material includes an optical nonlinear component in which at least one electron-withdrawing group and at least one electron-donating group are bonded to a π-electron conjugated system, and a urethane group and a urea are contained in a repeating unit of the polymer. The waveguide element is a polymer material having at least one group selected from a group, an amide group, a carboxyl group, and a hydroxyl group.

(Structure of the Second Invention) The structure of the second invention of the present application (the invention according to claim 2) for solving the above problems is as follows.
The nonlinear optical material according to the first invention comprises the optical nonlinear component and a photoreactive component which causes at least one of photoisomerization, photodimerization and photodecomposition by light irradiation, A waveguide element having a grating structure formed by repeating a refractive index modulation or a concavo-convex structure in the non-linear optical material using a photoreaction of a photoreactive component.

(Structure of Third Invention) The structure of the third invention of the present application (the invention according to claim 3) for solving the above problems is as follows.
The optical non-linear component contained in the non-linear optical material according to the first invention also has a property of a photo-reactive component which causes at least one of photo-isomerization, photo-dimerization and photo-decomposition by light irradiation. A waveguide element having a grating structure formed by repeating a refractive index modulation or a concavo-convex structure in the nonlinear optical material using the photoreaction as the photoreactive component.

(Structure of the Fourth Invention) The structure of the fourth invention of the present application (the invention according to claim 4) for solving the above problems is as follows.
A waveguide element used for the waveguide layer in a wavelength selective variable wavelength selective waveguide element having a wavelength selectivity based on the grating structure of the waveguide layer and capable of reversibly changing the refractive index of the grating structure. Material for
An optical nonlinear component in which at least one electron-withdrawing group and at least one electron-donating group are bonded to a π-electron conjugated system, and at least one photoreaction among photoisomerization, photodimerization, and photodecomposition by light irradiation Including a photoreactive component that causes
Further, it is a waveguide element material made of a polymer material having at least one group selected from a urethane group, a urea group, an amide group, a carboxyl group, and a hydroxyl group in a polymer repeating unit.

(Structure of Fifth Invention) The structure of the fifth invention of the present application (the invention according to claim 5) for solving the above problems is as follows.
A waveguide element used for the waveguide layer in a wavelength selective variable wavelength selective waveguide element having a wavelength selectivity based on the grating structure of the waveguide layer and capable of reversibly changing the refractive index of the grating structure. Material for
It is an optically non-linear component in which at least one electron-withdrawing group and at least one electron-donating group are bonded to a π-electron conjugated system, and at least one of light of photoisomerization, photodimerization, and photodecomposition by light irradiation. It contains a component having the property of a photoreactive component that causes a reaction, and has at least one group selected from urethane groups, urea groups, amide groups, carboxyl groups or hydroxyl groups in the repeating unit of the polymer. A waveguide element material made of a molecular material.

[0013]

Operation and Effect of the Invention (Operation and Effect of the First Invention) In the first invention, since the nonlinear optical material has a grating structure to provide wavelength selectivity, appropriate means for changing the refractive index thereof. By changing the refractive index of the nonlinear optical material (grating structure material) by (voltage application by an electrode, etc.), the wavelength of light that is selectively transmitted can be changed. Therefore, it also serves as an on / off means for transmitting light of a specific wavelength. These effects can be freely and reversibly expressed by causing the refractive index change to be reversible.

Next, since a polymer material is used as a material having a grating structure, it is possible to provide an element which is inexpensive as compared with an inorganic material. Is easy and
Since an integrated element group in the form of a sheet or the like can be manufactured, the elements can be arranged on, for example, a curved surface, and the latitude in system design is expanded.

Furthermore, components necessary for imparting optical non-linearity and forming a grating structure can be simply dispersed in a polymer material. For example, by combining these components for each repeating unit of the polymer, it is possible to stabilize it at a high concentration and thermally and with time (without aggregation or crystallization of the components). , These components can be included.

The nonlinear optical material is provided with optical nonlinearity by including an optical nonlinear component in which at least one electron-withdrawing group and at least one electron-donating group are bonded to a π-electron conjugated system. At the same time, it is a heat-resistant polymer material having at least one group selected from a urethane group, a urea group, an amide group, a carboxyl group and a hydroxyl group in the repeating unit of the polymer.

It is known that each of these groups forms a strong hydrogen bond between the same kind of group or between different kinds of groups. Therefore, when one or more of these groups are contained in the repeating unit of the polymer, these groups perform intramolecular or intermolecular hydrogen bonding to form a pseudo crosslinked structure.

The pseudo-crosslinked structure increases the glass transition point of the polymer and improves the heat resistance of the polymer material. As a result, even when the waveguide element is placed in a heating / high-temperature environment, the grating structure collapses. Alternatively, a change corresponding thereto is not easily caused, and heat resistance and reliability are excellent. For example, even at a temperature equal to or higher than the glass transition point of the polymer material, the pseudo crosslinked structure resists deformation of the material or molecular motion in the material, and prevents the grating structure from collapsing or changing according to the same.

(Function / Effect of the Second Invention) In the second invention, in addition to the function / effect of the first invention, the nonlinear optical material contains a photoreactive component together with an optical nonlinear component. The following operations and effects can be obtained.

That is, the photoreactive component causes at least one of photoisomerization, photodimerization and photodecomposition by light irradiation, and as a result, repetition of refractive index modulation by low intensity light irradiation of a predetermined pattern. Grating structure consisting of
By irradiating a predetermined pattern of high-intensity light, a grating structure composed of a repetition of a concavo-convex structure can be formed.

Therefore, in the second invention, the wavelength selectivity and the tunability of the wavelength selection can be simultaneously realized by a single kind of polymer material. Further, since the grating structure can be formed by optical means, there is an advantage that precise processing can be achieved as compared with the case of forming a grating structure having a concave-convex structure by mechanical means. ), The grating structure can be completed by light irradiation.
There is an advantage that two or more processes of development are not required.

(Actions and effects of the third invention) In the third invention, in addition to the actions and effects of the first and second inventions,
Since the optical non-linear component contained in the non-linear optical material also has the property of the photoreactive component, it is easy to increase the concentration of these components in the material. Further, there is an advantage that the process for designing and polymerizing a polymer can be simplified.

(Operation and Effect of Fourth Invention) According to the fourth invention, a material for a waveguide element suitable for manufacturing the waveguide element according to the first invention or the second invention is provided.

(Function / Effect of Fifth Invention) According to the fifth invention, a waveguide element material suitable for manufacturing the waveguide element according to the first invention or the third invention is provided.

[0025]

Next, embodiments of the first to fifth inventions will be described. Hereinafter, the "present invention" indicates the first to fifth inventions collectively.

[Waveguide Element] A waveguide element according to the present invention comprises an optical waveguide in which a nonlinear optical material constituting at least a part of a waveguide layer portion is provided with a grating structure to provide wavelength selectivity; Means for changing the selected wavelength by reversibly changing the refractive index of the material.

The non-linear optical material may constitute the entire waveguide layer portion, or may constitute a part of the waveguide layer portion. For example, the entire waveguide layer portion may be made of a non-linear optical material, and the material may exhibit a grating structure including repetition of refractive index modulation. or,
In addition to providing a nonlinear optical material with a grating structure consisting of repetition of irregularities in the waveguide layer part along the optical waveguide direction, this is in contact with the air layer, or another material with a different refractive index from this nonlinear optical material is used. The grating structure surface may be provided in close contact with the interface.

The means for reversibly changing the refractive index of the nonlinear optical material is not limited. For example, a pair of electrodes for applying a voltage may be provided on both sides of the optical waveguide in the optical waveguide direction to use the Pockels effect. Alternatively, a means of irradiating light having a wavelength different from that of the guided light and utilizing the optical Kerr effect may be employed.

FIG. 1 shows an example of the configuration of a waveguide element in which electrodes are provided as means for changing the refractive index. The waveguide element 1 is composed of an optical waveguide 4 sandwiched between a pair of electrodes 3 on a substrate 2. The optical waveguide 4 has a configuration in which the waveguide layer 5 is sandwiched between the under clad 6 and the over clad 7, and both ends of the waveguide layer 5 in the optical waveguide direction are incident fiber 8 and emission fiber 9.
Are optically coupled to each other. In FIG. 1, the zigzag-shaped line described inside the waveguide layer 5 is a symbolic representation of the grating structure.

Although there is no particular restriction on the incident light, light having a wavelength in the visible to near infrared region is mainly used.

The method of manufacturing the optical waveguide is not particularly limited, but generally, the optical waveguide can be manufactured using reactive ion etching with oxygen plasma or using a photobleaching technique.

The method of manufacturing the grating structure is not particularly limited, but various methods such as a method using light irradiation, a drawing method using an electron beam, and a method of pressing a stamper to form the grating structure are possible. As a method using light irradiation, a desired grating structure can be manufactured by a method using a phase mask, a two-beam interference method, or the like. The grating structure is used for selectively transmitting or reflecting light of a predetermined wavelength, and the wavelength of the reflected light in that case is determined by the repetition period (pitch) and the refractive index of the grating structure.

The type of the grating structure may be a repetition of a concavo-convex structure or a repetition in a state where the refractive index is modulated. In the latter case, when causing a change in the refractive index that causes a change in the selected wavelength in the waveguide layer due to the application of a voltage or the like, the refractive index of a part of the relative refractive index modulation structure constituting the grating structure (for example, The part where the rate is n _1
The case where only n ₁ or only n ₂ changes when there is a portion ₂ and the case where all the refractive indexes (for example, n ₁ and n _{2 in the above} ) change are included without limitation.

[Polymer Material] The polymer material of the present invention has optical non-linearity by including an optical non-linear component, and has a pseudo-crosslinked structure by hydrogen bonding in a repeating unit of the polymer. It is a heat-resistant polymer material having at least one group selected from a urethane group, a urea group, an amide group, a carboxyl group and a hydroxyl group to be formed.

In the above, the urethane group is -O-CO-
An NH- group is a urea group, which is a -NH-CO-NH- group,-
An NH-CO-N = group or a -NH-CO-N <group, and an amide group refers to a -CO-NH- group. Hydrogen bonds formed by these groups may be formed between the main chain skeletons of the polymer, or between the optical nonlinearity component or the photoreactive component and the main chain skeleton of the polymer. It may be formed.

The type of the polymer material is not particularly limited as long as the above embodiment is followed, but generally, a so-called condensation-based heat-resistant polymer having excellent heat resistance, particularly, urethane-based polymer.
Urea copolymers, polysulfones and the like are preferred, and when higher heat resistance is desired, those having a ring structure such as a phenylene group in the main chain thereof are particularly preferred.

A homopolymer as a polymerized form of a polymer,
For copolymers, block copolymers, random copolymers, graft copolymers, linear, branched, ladder, star, etc., degree of polymerization and molecular weight distribution, etc. There is no limitation as long as it has physical properties to the extent that it can be formed.

As a mode in which an optical non-linear component and a photoreactive component described later are included in the polymer material, these components can be simply dispersed in the polymer material, and more preferably, these components can be used. May be bonded to the polymer chain as a constituent of the main chain or as a constituent of the side chain bonded to the main chain. In particular, by combining these components for each repeating unit of the polymer as described above, these components can be contained in a high concentration and in a state that is thermally and temporally stable.

[Optical Nonlinearity Component] In the present invention, the optical nonlinearity component is a component in which at least one electron withdrawing group and at least one electron donating group are bonded to a π-electron conjugated system. Here, examples of the π-electron conjugated system include a polyene structure, an azobenzene structure, a stilbene structure, a polycyclic aromatic ring such as naphthyl, and a heteroaromatic ring such as quinoline, and the electron-withdrawing group is a nitro group or a cyano group. ,
A carboxyl group, an aldehyde group and the like can be exemplified. As the electron donating group, an amino group, a dialkylamino group, a methoxy group and the like can be exemplified.

[Photoreactive Component] In the present invention, the photoreactive component refers to a component which causes at least one of photoisomerization, photodimerization and photodecomposition by light irradiation. In short, it suffices if a grating structure composed of repetition of refractive index modulation or uneven structure can be formed by these reactions. From such a point, it is necessary to avoid components that cause the grating structure to be destroyed by a slow thermal reaction or the like or undergo a destructive change equivalent thereto.

As a preferred example of the photoreactive component, an azo group capable of trans-cis photoisomerization, a C ＝ C group or a C
= N groups having at least one group. When these photoreactive components are irradiated with light of normal intensity, the ratio of the isomers of trans and cis isomers having different refractive indexes changes between the irradiated portion and the non-irradiated portion, and a grating structure can be formed by refractive index modulation. . When these photoreactive components are irradiated with high intensity light, an azo group, C = C group or C = N
Breakage of the double bond of the group occurs, and the low molecular weight component evaporates out of the material due to the breakage, and changes in the shape of the polymer material (such as dents)
Is generated, whereby a grating structure with an uneven structure can be formed.

[Optical Nonlinearity / Photoreactive Component] In the present invention, as in the third and fifth aspects of the present invention, the case where the optical nonlinearity component also has the property of a photoreactive component, Particularly preferred. Representative examples of such components include those having an azobenzene structure or a stilbene structure capable of causing a change in the refractive index through a photoisomerization reaction by light irradiation among the above-mentioned optical non-linear components. Among them, a component having an azobenzene structure is particularly preferable because it can simultaneously exhibit a concave-convex structure in addition to a change in refractive index by light irradiation.

Tripathy et al. Also disclose an azobenzene derivative introduced into an acrylic main chain skeleton.
As described above, the grating structure causes thermal degradation or thermal destruction.

In the present invention, such a thermal deterioration and a thermal destruction are prevented by providing at least one kind of the group having the hydrogen bonding ability in the repeating unit of the polymer. Furthermore, by introducing the electron donating group or the electron withdrawing group into the azobenzene structure, a photoreaction for forming the grating structure can be more efficiently caused. [Specific examples of polymer material] From the above points, specific examples of particularly preferable polymer materials used in the present invention include, in addition to those described in Examples, optical non-linear components and photoreactive components. As an example including a component also having the above-mentioned property, those having a polymer structure represented by the following “Chemical Formula 1” to “Chemical Formula 12” are exemplified.

[0045]

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[0046]

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[0047]

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[0048]

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[0049]

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[0050]

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[0051]

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[0052]

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[0053]

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[0054]

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[0055]

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[0056]

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[0057]

Next, an embodiment of the present invention will be described.

(Synthesis of Compound) 7.61 g of 2-methyl-4-nitroaniline was dissolved in a mixed solution of 100 mL of water and 45 mL of a 36% hydrochloric acid aqueous solution, and cooled to 3 ° C. Sodium nitrite 3.80 dissolved in 18 mL of water was added to the solution.
g was added. This solution was stirred at 3 ° C. for 1 hour.

Further, a solution obtained by dissolving 9.76 g of m-tolyldiethanolamine in a mixed solution of 125 mL of water and 7.5 mL of 36% hydrochloric acid aqueous solution was added to this solution over 30 minutes, followed by stirring at 3 ° C. for 20 minutes. 6 at 20 ° C
The reaction was stirred for 0 minutes.

The reaction mixture was neutralized by adding a solution prepared by dissolving 35.4 g of potassium hydroxide in 200 mL of water, and the precipitated crude product was separated by filtration, washed with water and dried. This product was recrystallized twice from ethanol to give 4-N, N-bis (2-hydroxylethyl) amino-2,2′dimethyl4′-nitroazobenzene represented by “Chemical formula 13”. 80%, melting point 169 ° C).

[0061]

Embedded image Dissolve 2.00 g of the compound of the above-mentioned “Formula 13” and 2.095 g of 4,4′-diphenylmethanediisocyanate in 50 mL of N-methyl-2-pyrrolidone, react at room temperature for 15 minutes, and further react at 100 ° The mixture was stirred at C for 60 minutes to react.

After the solution was cooled to 50 ° C., trans-solution dissolved in 20 mL of N-methyl-2-pyrrolidone was used.
0.319 g of 2,5-dimethylpiperazine was added, and 20
The mixture was reacted by stirring at 5 ° C for 5 hours. Further under reduced pressure 115
Heated to ° C., 52 mL of N-methyl-2-pyrrolidone was slowly distilled off over 150 minutes.

The obtained reaction mixture was diluted with 180 mL of pyridine and filtered through a 0.1 μm filter.
The polymer was charged into ethanol and the precipitated polymer was filtered off. The obtained polymer was purified twice by the reprecipitation method, and
(Yield: 92%, glass transition point: 141 ° C., 30 in N-methyl-2-pyrrolidone)
Intrinsic clay at ° C: 0.69 dL / g, absorption maximum wavelength 475 nm).

[0064]

Embedded image (Production method of film) The polymer of the above formula [14] was dissolved in pyridine to prepare a 6.5 wt% solution. After filtering this through a 0.2 μm filter, the number of rotations was 1000.
Spin coat on a slide glass under the condition of rpm,
Vacuum drying was performed at 80 ° C. for 20 hours to obtain a thin film having a thickness of about 1 μm.

(Grating production method, heat resistance test)
As shown in FIG. 2, a two-beam interference exposure optical system comprising a light source 10, a mirror 11, a pinhole 12, a beam splitter 13, and mirrors 14 and 15 for irradiating a sample 16 with light as shown in FIG. The film was irradiated with interference light to produce a grating. Nd: YAG as light source
Exposure was performed with a single shot (pulse width: about 8 nS) using the third harmonic (wavelength: 355 nm) of the laser.

FIG. 3 shows an atomic force microscope image of the obtained film. Grading could be formed at a grating period of 1.05 μm and a depth of 0.4 μm.
After heat-treating this sample in a thermostat at 150 ° C. for 30 minutes, an atomic force microscope image was measured again. Grading similar to that shown in FIG. 3 was maintained without losing shape.

Using an Ar laser (wavelength 488 nm) with a two-beam interference exposure optical system slightly modified from FIG.
Similarly, a grating was formed on the film. FIG. 4 shows an atomic force microscope image. Grading depth is 3
It was 0 nm. Similarly, heat treatment was performed at 150 ° C. for 30 minutes. Grading similar to that shown in FIG. 4 was maintained without losing shape.

(Preparation of Wavelength Selective Element) After the silicon wafer was washed with an aqueous solution of HF, aluminum was evaporated to a thickness of 1 μm using an EB evaporation apparatus (lower electrode). After applying a PIQ coupler (manufactured by Hitachi Chemical Co., Ltd.) and heat-treating, a polyimide (PIQ2200 manufactured by Hitachi Chemical) is applied by a spin coat method and heat-treated (150 ° C. for 1 hour, 30 hours).
(1.5 hours at 0 ° C.) to form underclad. Its thickness was 7 μm.

The polymer of Chemical Formula 14 was dissolved in pyridine to prepare a 6.5 wt% solution. This was filtered through a 0.2 μm filter, spin-coated on the under clad at a predetermined number of revolutions, and vacuum dried at 80 ° C. for 20 hours to obtain a thin film having a thickness of about 1 μm. Next, the CYTOP (produced by Asahi Glass) solution was spin-coated in the same manner to obtain a 100 ° C.
After vacuum drying for 4 hours at C, aluminum was again EB deposited.

After applying a photoresist and drying, a width of 10
Exposure was performed using a mask pattern of a μm linear waveguide, and the resist other than the mask portion was removed with acetone. Next, phosphoric acid,
After aluminum was etched with a mixed solution of acetic acid and nitric acid, cytops, waveguide layers, and polyimide layers were removed by ion etching in oxygen plasma. The etching was performed for 5 minutes, cooled once (5 minutes), and performed again by etching repeatedly. Subsequently, the aluminum of the mask portion was peeled off with CYTOP with Fluorinert to produce a channel type waveguide.

Next, the light source was set to the third harmonic (wavelength: 355 nm) of Nd: YAG by the two-beam interference method shown in FIG. 2, and the grating was written on the waveguide. Next, place the sample on an aluminum substrate that can be heated,
While heating to C, corona polling was performed using a needle electrode. Polling time was 2 minutes. Again, the CYTOP solution was applied by a spin coat method, and heat treatment was repeated to form an over clad. Next, an upper electrode was EB-deposited on the waveguide through a mask to form an upper electrode.

The sample was cleaved together with the silicon wafer to expose a smooth waveguide end face. An optical fiber was coupled to both sides of the end face to form a pigtail type waveguide element. FIG. 1 is a schematic view of the obtained device.

Laser light having a wavelength of 1.3 μm was incident and coupled into the device from one fiber. The outgoing light was taken out from the opposite fiber, and the light intensity was measured with a photodetector. Next, when a voltage was applied to the waveguide from the upper and lower electrodes and the change in the intensity of the emitted light was measured, the intensity of the emitted light was reduced by the application of the voltage. When an AC voltage was applied at a frequency of 1 kHz, the output light intensity was turned on and off in accordance with the frequency.

[Brief description of the drawings]

FIG. 1 is a diagram showing a configuration example of a waveguide element.

FIG. 2 is a diagram conceptually showing a two-beam interference exposure optical system used in an embodiment.

FIG. 3 is a diagram showing an observation image of an atomic force microscope in an example.

FIG. 4 is a diagram showing an observation image of an atomic force microscope in an example.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Waveguide element 3 Electrode 4 Optical waveguide 5 Waveguide layer 6 Under clad 7 Over clad 8 Incident fiber 9 Outgoing fiber

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor, Hirohiro Sugihara 5-15-15, Kamijima, Hamamatsu-shi, Shizuoka Prefecture (72) Inventor, Riki Egami 154-100, Wago-cho, Hamamatsu-shi, Shizuoka Prefecture (72) Inventor Yoshimasa Kawada, Hamamatsu, Shizuoka Prefecture 24-5, Ichiyamate-cho (72) Naomichi Okamoto, Inventor 2578, Masurakucho, Hamamatsu-shi, Shizuoka F-term (reference) 2K002 AA02 AB34 AB40 BA01 CA06 DA03 EA05 EA07 FA19 FA30 HA13 HA26 4J034 CA02 CA04 CA13 CA15 CB03 CB07 CB08 CC12 CC23 CC26 CC33 CC34 CC45 CC52 CC61 CC62 CC65 CC67 CC68 CD01 CD04 CD12 HA01 HA07 HB17 HC12 HC61 HC64 HC67 HC71 RA13 RA14

Claims (5)

[Claims] 1. An optical waveguide in which a nonlinear optical material constituting at least a part of a waveguide layer portion has a grating structure to provide wavelength selectivity, and means for reversibly changing a refractive index of the nonlinear optical material. A wavelength-selective variable wavelength-selective waveguide element comprising: the nonlinear optical material, an optical nonlinearity component in which at least one electron-withdrawing group and at least one electron-donating group are bonded to a π-electron conjugated system. And a polymer material having at least one group selected from a urethane group, a urea group, an amide group, a carboxyl group, and a hydroxyl group in a polymer repeating unit. 2. The non-linear optical material includes the optical non-linear component and a photo-reactive component which causes at least one of photo-isomerization, photo-dimerization and photo-decomposition by light irradiation, 2. The waveguide element according to claim 1, wherein a grating structure formed by repeating a refractive index modulation or a concavo-convex structure in the nonlinear optical material is formed by utilizing a photoreaction of a photoreactive component. 3. An optical nonlinear component contained in the nonlinear optical material also has a property of a photoreactive component which causes at least one photoreaction among photoisomerization, photodimerization and photodecomposition by light irradiation. 2. The waveguide according to claim 1, wherein a grating structure comprising a repetition of a refractive index modulation or a concavo-convex structure in the nonlinear optical material is formed by utilizing a photoreaction as the photoreactive component. element. 4. The waveguide layer portion of a wavelength selective variable wavelength selective waveguide element having a wavelength selectivity based on the grating structure of the waveguide layer portion and capable of reversibly changing the refractive index of the grating structure. A material for a waveguide element used for: a non-linear component in which at least one electron-withdrawing group and at least one electron-donating group are bonded to a π-electron conjugated system, and photoisomerization, photodimerization and A photoreactive component that causes at least one photoreaction of photolysis,
Further, a waveguide element material comprising a polymer material having at least one group selected from a urethane group, a urea group, an amide group, a carboxyl group and a hydroxyl group in a polymer repeating unit. 5. The waveguide layer portion of a wavelength selective variable wavelength selective waveguide element having a wavelength selectivity based on the grating structure of the waveguide layer portion and capable of reversibly changing the refractive index of the grating structure. A material for a waveguide element used for a π-electron conjugated system, which is an optically nonlinear component in which at least one electron-withdrawing group and at least one electron-donating group are bonded to a π-electron conjugated system. A component having the property of a photoreactive component that causes at least one photoreaction of quantification and photodecomposition, and a urethane group, a urea group, an amide group, a carboxyl group, or a hydroxyl group in a repeating unit of the polymer. A waveguide element material comprising a polymer material having at least one group selected from the group consisting of: