JP2000263046A - Generator of electrolyzed water for cleaning - Google Patents

Generator of electrolyzed water for cleaning

Info

Publication number
JP2000263046A
JP2000263046A JP11070025A JP7002599A JP2000263046A JP 2000263046 A JP2000263046 A JP 2000263046A JP 11070025 A JP11070025 A JP 11070025A JP 7002599 A JP7002599 A JP 7002599A JP 2000263046 A JP2000263046 A JP 2000263046A
Authority
JP
Japan
Prior art keywords
water
cleaning
anode
cathode
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11070025A
Other languages
Japanese (ja)
Inventor
Takuro Kato
琢朗 加藤
Kazuhiro Kubota
一浩 久保田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Carlit Co Ltd
Original Assignee
Japan Carlit Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Carlit Co Ltd filed Critical Japan Carlit Co Ltd
Priority to JP11070025A priority Critical patent/JP2000263046A/en
Publication of JP2000263046A publication Critical patent/JP2000263046A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a generator of electrolyzed water for cleaning, which generates electrolyzed water without metallic impurities and solid fine particles, can work stably even in continuous operation over a long term, and can exchange electrodes easily without interrupting the operation. SOLUTION: A generator of electrolyzed water for cleaning has a plurality of two-chamber type diaphragm electrolytic cell units 2 each of which consists of an anode chamber 3 accommodating an anode and an anode feeder each formed by covering the surface of an expand titanium substrate, which has been subjected to flat processing of smoothness of 10-80%, with an active layer, a solid polymer electrolyte diaphragm, and a cathode chamber 4 accommodating a cathode and a cathode feeder, and it is arranged with piping for water supply and piping for water discharge.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明に属する技術分野】本発明は、半導体用基板、液
晶表示素子用基板等、清浄度が要求される基板表面、特
にエッチングをきらう基板表面の洗浄に関し、金属不純
物及び固体微粒子のない洗浄用電解水を得るための生成
装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the cleaning of a substrate surface, such as a semiconductor substrate and a liquid crystal display device substrate, which requires a high degree of cleanliness, particularly a substrate surface which is difficult to be etched. The present invention relates to a generator for obtaining electrolyzed water.

【0002】[0002]

【従来の技術】半導体用基板、液晶表示素子用基板等、
清浄度が要求される基板表面の洗浄は、塩酸/過水、ア
ンモニア/過水及び希フッ酸を基準にした洗浄が広く行
われてきた。この方法は、米国RCA社が電子管の洗浄
のために開発したRCA洗浄を基本に改良されたもので
ある。
2. Description of the Related Art Semiconductor substrates, liquid crystal display element substrates, etc.
For cleaning of the substrate surface requiring cleanliness, cleaning based on hydrochloric acid / hydrogen peroxide, ammonia / hydrogen peroxide and dilute hydrofluoric acid has been widely performed. This method is an improvement based on RCA cleaning developed by RCA in the United States for cleaning electron tubes.

【0003】特開平10−1794号公報には、酸性水
及びアルカリ性水の電解水を用いた洗浄方法が開示され
ており、供給される塩酸、アンモニア等の電解質を電気
分解して、生成させた酸性水及びアルカリ性水が、金属
不純物除去及び固体微粒子除去のための洗浄水として用
いられている。
[0003] Japanese Patent Application Laid-Open No. Hei 10-1794 discloses a washing method using electrolytic water of acidic water and alkaline water, in which an electrolyte such as hydrochloric acid or ammonia to be supplied is electrolyzed and generated. Acid water and alkaline water are used as washing water for removing metal impurities and solid fine particles.

【0004】半導体基板表面の洗浄は、数多くの工程が
あり、洗浄水には、酸化性及び還元性の両特性が要求さ
れるが、上記電解水は、酸化性洗浄水である酸性水と還
元性洗浄水であるアルカリ性水とが同時に得られるとい
う点で非常に有用である。
There are many processes for cleaning the surface of a semiconductor substrate, and both oxidizing and reducing properties are required for the cleaning water. This is very useful in that alkaline washing water, which is an acidic washing water, can be obtained at the same time.

【0005】しかしながら、最終洗浄に近くなると、金
属露出部分の洗浄が必要となるが、基板表面へのエッチ
ングの問題により、上記電解水を用いることができな
い。
[0005] However, near the final cleaning, it is necessary to clean the exposed metal portion, but the electrolytic water cannot be used due to the problem of etching on the substrate surface.

【0006】特開平10−286571号公報には、固
体高分子電解質(以下「SPE」と略記)隔膜を利用し
た、電解質を添加しない超純水の電解方法が開示されて
いる。当該公報により得られる電解水を洗浄に用いた場
合、基板表面へのエッチング作用なしでの洗浄が可能で
ある。
JP-A-10-286571 discloses a method for electrolyzing ultrapure water using a solid polymer electrolyte (hereinafter abbreviated as "SPE") diaphragm without adding an electrolyte. When the electrolyzed water obtained according to the publication is used for cleaning, cleaning can be performed without etching the substrate surface.

【0007】しかしながら、当該公報は、オゾン生成用
電解から派生したものであり、金属不純物は非常に少な
いものの、陽極との接触によりSPE隔膜が損傷を受
け、多量の固体微粒子が発生するという問題点がある。
さらに、長期間に渡って運転した場合、陽極からの金属
不純物の溶出も問題となる。
[0007] However, this publication is derived from the electrolysis for ozone generation, and has a problem that although the amount of metal impurities is very small, the SPE diaphragm is damaged by contact with the anode and a large amount of solid fine particles are generated. There is.
Further, when the operation is performed for a long period, elution of metal impurities from the anode becomes a problem.

【0008】[0008]

【発明が解決しようとする課題】本発明の目的は、上記
問題を解決するために、長期間の連続運転でも安定して
運転ができ、かつ電極交換時でも運転を中断することな
く、容易に交換作業ができる洗浄用電解水の生成装置を
提供することである。
SUMMARY OF THE INVENTION It is an object of the present invention to solve the above-mentioned problems by stably operating even a long-term continuous operation and easily stopping the operation even when replacing electrodes. An object of the present invention is to provide an apparatus for generating electrolyzed water for cleaning that can be replaced.

【0009】[0009]

【課題を解決するための手段】本発明者らは、上記課題
を解決するために、鋭意研究を重ねた結果、本発明を完
成するに至った。
Means for Solving the Problems The present inventors have made intensive studies to solve the above-mentioned problems, and as a result, have completed the present invention.

【0010】すなわち、本発明は、平滑度10〜80%にフ
ラット加工されたエキスパンドチタン基体表面に活性層
を被覆させた陽極及び陽極給電体を収納した陽極室、固
体高分子電解質隔膜、陰極及び陰極給電体を収納した陰
極室からなる二室型隔膜電解槽ユニットを有し、供給水
及び排出水用配管が各々配されてなる洗浄用電解水の生
成装置において、前記電解槽ユニットが、複数であるこ
とを特徴とする洗浄用電解水の生成装置である。
That is, the present invention provides an anode chamber in which an active layer is coated on the surface of an expanded titanium substrate flat-processed to a smoothness of 10 to 80%, an anode chamber containing an anode power supply, a solid polymer electrolyte membrane, a cathode, An apparatus for generating electrolyzed water for cleaning comprising a two-chamber diaphragm electrolyzer unit comprising a cathode chamber accommodating a cathode power supply, and a pipe for supply water and a drainage water, each being provided with a plurality of electrolyzer units. An electrolytic water generating apparatus for washing, characterized in that:

【0011】本発明について、以下、図面を参照して詳
細に説明する。図1は、本発明の洗浄用電解水の生成装
置の概略を示したものであり、二室型隔膜電解槽ユニッ
トを並列に4つ用いた例である。
The present invention will be described below in detail with reference to the drawings. FIG. 1 shows an outline of an apparatus for generating electrolytic water for cleaning according to the present invention, in which four two-chamber diaphragm electrolytic cell units are used in parallel.

【0012】本発明の洗浄用電解水の生成装置は、SP
E隔膜両側面に各々密着配置させた陽極及び陰極、つい
で、その両外側面に各々配置させた給電体、さらに、そ
の両外側面に配置させた槽体からなり、SPE隔膜によ
り分離された陽極室3と陰極室4とからなる二室型隔膜
電解槽ユニット2を複数備えている。
The apparatus for generating electrolytic water for cleaning according to the present invention comprises an SP
An anode and a cathode, each of which is disposed in close contact with both sides of the E-membrane, a feeder disposed on each of its outer sides, and a tank disposed on each of its outer sides, and the anode is separated by the SPE diaphragm. A plurality of two-chamber diaphragm electrolytic cell units 2 each including a chamber 3 and a cathode chamber 4 are provided.

【0013】SPE隔膜は、テフロン製陽イオン交換膜
であり、1枚でも複数枚重ねて使用してもよい。
The SPE membrane is a cation exchange membrane made of Teflon, and one or a plurality of SPE membranes may be used.

【0014】陽極の基体は、平滑度10〜80%にフラット
加工されたエキスパンドチタン基体であり、平滑度は、
上記金属板を引っ張り、網目状の形状としたものを「平
滑度0%」、また圧延されて、水平面が平滑にされたも
のを「平滑度100%」とする。
The substrate of the anode is an expanded titanium substrate flat-processed to a smoothness of 10 to 80%.
The metal plate that is pulled and formed into a mesh shape is referred to as “smoothness 0%”, and the one obtained by rolling and smoothing the horizontal surface is referred to as “smoothness 100%”.

【0015】平滑度が10%未満の場合、SPE隔膜と接
触させる際に、SPE隔膜を損傷させ、また80%より大
の場合、ガス抜けが悪くなり不都合である。
If the smoothness is less than 10%, the SPE diaphragm will be damaged when it comes into contact with the SPE diaphragm, and if it is more than 80%, outgassing will be poor and disadvantageous.

【0016】エキスパンドチタン基体の刻み幅(別名
「ストランド幅」ともいう。)は、0.5〜2.0mmであり、
刻み幅が0.5mm未満の場合、基体の強度が弱くなり、ま
た2.0mmより大の場合、ガス抜けが悪くなり不都合であ
る。
The step width (also called “strand width”) of the expanded titanium substrate is 0.5 to 2.0 mm,
If the step width is less than 0.5 mm, the strength of the substrate becomes weak. If the step width is more than 2.0 mm, outgassing becomes worse, which is inconvenient.

【0017】陽極は、平滑度10〜80%にフラット加工さ
れたエキスパンドチタン基体表面に、焼成法、メッキ法
またはスパッタリング法のいずれかにより、白金、酸化
白金、タンタル、酸化タンタル及び/または酸化イリジ
ウムからなる群から選ばれた少なくとも1種以上を活性
層として被覆させて作製される。
The anode is made of platinum, platinum oxide, tantalum, tantalum oxide and / or iridium oxide on a surface of an expanded titanium substrate which has been flat-processed to a smoothness of 10 to 80% by any of a firing method, a plating method and a sputtering method. At least one selected from the group consisting of:

【0018】平滑度10〜80%にフラット加工されたエキ
スパンドチタン基体表面に活性層を被覆させた陽極とS
PE隔膜とを接触させても、SPE隔膜を損傷させずか
つ均一に密着するため、安定した電流及び電圧での電気
分解が可能であるとともに、従来の陽極とSPE隔膜と
の接触に起因する固体微粒子が発生しない。
An anode in which an active layer is coated on the surface of an expanded titanium substrate flat-processed to a smoothness of 10 to 80%, and S
Even when the PE membrane is brought into contact with the PE membrane, it does not damage the SPE membrane and adheres uniformly, so that it is possible to perform electrolysis at a stable current and voltage, and it is also possible to obtain solids caused by the conventional contact between the anode and the SPE membrane. No fine particles are generated.

【0019】オゾン生成用電解から派生した従来の陽極
は、エキスパンドチタン基体表面にサンドブラスト等の
処理を施し、基体表面に凹凸を設けた点接触を基本とし
ており、陽極とSPE隔膜とを接触させる際にSPE隔
膜を損傷して多量の固体微粒子を発生させる。また、長
期間に渡って運転した場合、陽極から金属不純物が溶出
してしまう。
The conventional anode derived from the electrolysis for ozone generation is based on point contact, in which the surface of an expanded titanium substrate is subjected to a treatment such as sandblasting and the surface of the substrate is provided with irregularities. Then, the SPE diaphragm is damaged to generate a large amount of solid fine particles. In addition, when the operation is performed for a long time, metal impurities elute from the anode.

【0020】陰極は、ポーラスチタン基体またはパンチ
ングチタン基体表面に、焼成法、メッキ法またはスパッ
タリング法のいずれかにより、白金、酸化白金、タンタ
ル、酸化タンタル及び/または酸化イリジウムからなる
群から選ばれた少なくとも1種以上を活性層として被覆
させて作製される。
The cathode is selected from the group consisting of platinum, platinum oxide, tantalum, tantalum oxide and / or iridium oxide on the surface of a porous titanium substrate or a punched titanium substrate by any of a firing method, a plating method and a sputtering method. It is manufactured by coating at least one or more as an active layer.

【0021】給電体は、リング状チタン基体またはパン
チングチタン基体表面に、焼成法、メッキ法またはスパ
ッタリング法のいずれかにより、白金、酸化白金、タン
タル、酸化タンタル及び/または酸化イリジウムからな
る群から選ばれた少なくとも1種以上を被覆させて作製
される。なお、リング状の場合には、陽極及び陰極に溶
接させて用いられる。
The power supply body is selected from the group consisting of platinum, platinum oxide, tantalum, tantalum oxide and / or iridium oxide on the surface of the ring-shaped titanium substrate or the punched titanium substrate by any of a firing method, a plating method and a sputtering method. It is produced by coating at least one or more kinds obtained. In the case of a ring shape, it is used by welding to an anode and a cathode.

【0022】陽極室3及び陰極室4の槽体は、テフロン
製である。
The tanks of the anode chamber 3 and the cathode chamber 4 are made of Teflon.

【0023】電解槽ユニット2の陽極室3及び陰極室4
への供給水1,1’用配管に、電解槽ユニットの着脱の
ためのテフロン製バルブ及びフランジかが各々取り付け
られる。また、陽極室排出水6及び陰極室排出水7用配
管にも、同様にテフロン製バルブ及びフランジを各々取
り付けられる。各配管に取り付けられたバルブ及びフラ
ンジにより電解槽ユニット2内の電極交換等の緊急時に
は、当該電解槽ユニットの遮断が容易にできる。
The anode chamber 3 and the cathode chamber 4 of the electrolytic cell unit 2
A Teflon valve and a flange for attaching and detaching the electrolytic cell unit are respectively attached to the pipes for the supply water 1 and 1 '. Also, the Teflon valve and the flange are similarly attached to the pipes for the anode chamber discharge water 6 and the cathode chamber discharge water 7, respectively. In the event of an emergency such as electrode replacement in the electrolytic cell unit 2, the valve and flange attached to each pipe can easily shut off the electrolytic cell unit.

【0024】電解槽ユニット2の数は、長期間の連続運
転での安定性や電極交換時の作業性を考慮すると、少な
くとも3つ以上が好ましい。
The number of the electrolytic cell units 2 is preferably at least three in consideration of stability in long-term continuous operation and workability at the time of electrode replacement.

【0025】図1は、二室型隔膜電解槽ユニット2を4
つ並列に配した並列形式であるが、複数の電解槽ユニッ
ト2が一体化された一体型形式や一体型が並列に配され
た一帯型並列形式等、目的に応じて、どのような形式で
もよい。
FIG. 1 shows a two-chamber diaphragm cell unit 2
Any type, depending on the purpose, such as an integrated type in which a plurality of electrolytic cell units 2 are integrated or a one-band type in parallel type in which integrated types are arranged in parallel. Good.

【0026】本発明の洗浄用電解水の生成装置では、二
室型隔膜電解槽ユニット2の陽極室3及び陰極室4に供
給水1、1’として純水または超純水が供給され、給電
体、に直流電流5を通電して電気分解して、陽極室3よ
り、金属不純物がなくかつ実質的に固体微粒子のない、
中性で酸化性の陽極室排出水6が、また、陰極室4よ
り、金属不純物がなくかつごく微量の固体微粒子を含
む、中性で還元性の陰極室排出水7が生成される。
In the apparatus for producing electrolytic water for cleaning according to the present invention, pure water or ultrapure water is supplied to the anode chamber 3 and the cathode chamber 4 of the two-chamber diaphragm electrolyzer unit 2 as the supply water 1 and 1 ′. The body is subjected to a direct current 5 to be electrolyzed, and from the anode chamber 3, there is no metal impurity and substantially no solid fine particles.
The neutral oxidizing anode chamber discharge water 6 is generated from the cathode chamber 4, and the cathode chamber 4 generates neutral and reducing cathode chamber discharge water 7 containing no metal impurities and containing a very small amount of solid fine particles.

【0027】陽極室排出水5は、供給水1より高い酸化
還元電位(以下「ORP」と略記)を有し、金属を酸化
溶解させ、かつ基板表面へのエッチング作用がない。ま
た、陰極室排出水7は、供給水1’より低いORPを有
し、固体微粒子除去能力を有し、かつ基体表面へのエッ
チング作用がない。
The anode chamber discharge water 5 has a higher oxidation-reduction potential (hereinafter abbreviated as "ORP") than the supply water 1, oxidizes and dissolves the metal, and has no etching effect on the substrate surface. The cathode chamber discharge water 7 has an ORP lower than that of the supply water 1 ', has a capability of removing solid fine particles, and has no etching action on the substrate surface.

【0028】本発明に用いられる陽極は、平滑度10〜80
%にフラット加工されたエキスパンドチタン基体が用い
られており、SPE隔膜に密着させても、損傷させるこ
とがなく、得られる陽極室排出水6は、従来のように陽
極とSPE隔膜との接触により発生する固体微粒子もな
く、また金属不純物もない。
The anode used in the present invention has a smoothness of 10 to 80.
% Of the expanded titanium substrate is used. Even if the expanded titanium substrate is brought into close contact with the SPE diaphragm, it is not damaged, and the obtained anode chamber discharge water 6 can be removed by contact between the anode and the SPE diaphragm as in the conventional case. There are no solid fine particles generated and no metal impurities.

【0029】陽極室排出水6用配管にガス溶解フィルタ
ー9を接続させて、溶存ガス濃度を高め、さらに酸化還
元電位を高めてもよい。
A gas dissolving filter 9 may be connected to the pipe for the anode chamber discharge water 6 to increase the dissolved gas concentration and further increase the oxidation-reduction potential.

【0030】陽極洗浄用電解水10は、金属不純物がな
くかつ実質的に固体微粒子がなく、基板表面へのエッチ
ング作用がなく、中性で酸化性である。
The electrolytic water for anode cleaning 10 is neutral and oxidizing, having no metallic impurities, substantially no solid fine particles, no etching effect on the substrate surface.

【0031】一方、陰極室排出水7は、金属不純物はな
いものの、ごく微量の固体微粒子が発生するが、通常、
特に問題とはならないが、これをも問題とするような場
合には、陰極室排出水7用配管に固体微粒子除去フィル
ター8を接続させて、ごく微量の固体微粒子を除去させ
た後に用いられる。
On the other hand, although the cathode chamber discharge water 7 has no metal impurities, a very small amount of solid fine particles are generated.
Although this does not cause any particular problem, if this is also a problem, it is used after a very small amount of solid fine particles is removed by connecting a solid fine particle removing filter 8 to the pipe for the cathode chamber discharge water 7.

【0032】微粒子除去フィルター8としては、テフロ
ン製中空糸フィルターやテフロン製メンブランフィルタ
ーがあげられる。
Examples of the fine particle removal filter 8 include a Teflon hollow fiber filter and a Teflon membrane filter.

【0033】また、陰極室排出水7用配管にガス溶解フ
ィルター9’を接続させて、溶存ガス濃度を高め、さら
に酸化還元電位を低めてもよい。
Further, a gas dissolving filter 9 'may be connected to the pipe for the discharge water 7 of the cathode chamber to increase the dissolved gas concentration and further reduce the oxidation-reduction potential.

【0034】陰極洗浄用電解水11は、金属不純物がな
くかつ実質的に固体微粒子がなく、基板表面へのエッチ
ング作用がなく、中性で還元性である。
The electrolytic water 11 for cleaning the cathode has no metal impurities, substantially no solid fine particles, has no etching effect on the substrate surface, is neutral and reducible.

【0035】本発明の生成装置は、電解質をなんら添加
することなく、純水または超純水を供給するだけで電気
分解できる。
The generator of the present invention can be electrolyzed only by supplying pure water or ultrapure water without adding any electrolyte.

【0036】本発明の生成装置により得られる陽極洗浄
用電解水10は、基板表面へのエッチング作用なしで、
金属の酸化溶解により金属不純物を除去することができ
る。また、最終洗浄に用いた場合、均一で薄く非常に良
好な酸化保護膜を形成することができる。一方、陰極洗
浄用電解水11は、基板表面へのエッチング作用なし
で、固体微粒子を除去することことができる。
The electrolytic water for anode cleaning 10 obtained by the generator of the present invention can be used without etching the substrate surface.
Metal impurities can be removed by oxidative dissolution of the metal. In addition, when used for final cleaning, a uniform, thin and very good oxidation protection film can be formed. On the other hand, the electrolytic water for cathode cleaning 11 can remove solid fine particles without etching the substrate surface.

【0037】本発明の生成装置は、より得られる陽極洗
浄用電解水及び陰極洗浄用電解水を組み合わせて洗浄す
ることにより、清浄度が非常に高められた基板表面を得
ることができる。
The apparatus of the present invention can obtain a substrate surface with extremely high cleanliness by washing by combining the obtained electrolytic water for anode cleaning and electrolytic water for cathode cleaning.

【0038】本発明の生成装置は、長期間の連続運転で
も安定して運転ができ、かつ電極交換時でも運転を中断
することなく、容易に交換作業をすることができる
The generator of the present invention can be operated stably even during long-term continuous operation, and can be easily replaced without interrupting the operation even during electrode replacement.

【0039】[0039]

【発明の実施の形態】以下、発明の実施の形態を、図1
を参照して、実施例に基き説明する。なお、本発明は実
施例になんら限定されない。
BRIEF DESCRIPTION OF THE DRAWINGS FIG.
An example will be described with reference to FIG. Note that the present invention is not limited to the embodiments.

【0040】実施例 本発明の洗浄用電解水の生成装置を以下のようにして作
製した。
Example An apparatus for producing electrolytic water for cleaning according to the present invention was produced as follows.

【0041】平滑度50%にフラット加工した刻み幅1.0m
mのエキスパンドチタン基体表面に、焼成法により酸化
イリジウム/酸化タンタル=7/3の混合物を被覆させ
た陽極、ポーラスチタン基体表面に焼成法により酸化白
金を被覆させた陰極、及びリング状チタン基体表面に焼
成法により酸化白金を被覆させた給電体を作製した後、
陽極と給電体及び陰極と給電体とを各々溶接した。
Step width 1.0m flat processed to 50% smoothness
An anode in which a mixture of iridium oxide / tantalum oxide = 7/3 is coated on the surface of an expanded titanium substrate by a firing method, a cathode in which platinum oxide is coated on a porous titanium substrate surface by a firing method, and a ring-shaped titanium substrate surface After preparing a power supply body coated with platinum oxide by a firing method,
The anode and the power supply, and the cathode and the power supply were welded, respectively.

【0042】SPE隔膜(登録商標:ナフィオン11
7、(株)デュポン製)を2枚重ね合わせ、その両側面
に、給電体を溶接した陽極と、給電体を溶接した陰極と
を各々配置させ、さらにその両外側面にテフロン製槽体
を各々配置させて、SPE隔膜により分離された陽極室
3及び陰極室4からなる二室型隔膜電解槽ユニット2を
作製した。各接触部分は、テフロン製パッキンにより封
水されている。
SPE diaphragm (registered trademark: Nafion 11)
7, manufactured by Dupont Co., Ltd.), an anode to which a power supply is welded, and a cathode to which a power supply is welded are arranged on both side surfaces thereof, and a Teflon tank body is provided on both outer surfaces thereof. A two-chamber type membrane electrolytic cell unit 2 including an anode chamber 3 and a cathode chamber 4 separated by an SPE membrane was prepared. Each contact portion is sealed with Teflon packing.

【0043】作製した電解槽ユニット2を4つ並列に配
置し、電解槽ユニット2の陽極室3及び陰極室4への供
給水1,1’用配管に、電解槽ユニットの着脱のための
テフロン製バルブ及びフランジを各々取り付けた。ま
た、陽極室排出水6及び陰極室排出水7用配管にも、同
様にテフロン製バルブ及びフランジを各々取り付けた。
Four of the prepared electrolytic cell units 2 are arranged in parallel, and Teflon for attaching / detaching the electrolytic cell unit is installed in the piping for the water 1, 1 ′ supplied to the anode chamber 3 and the cathode chamber 4 of the electrolytic cell unit 2. A valve and a flange were attached. Also, a Teflon valve and a flange were similarly attached to the pipes for the anode chamber discharge water 6 and the cathode chamber discharge water 7, respectively.

【0044】ついで、各電解槽ユニットの陽極室排出水
6用配管に、テフロン製ガス溶解フィルター9を接続し
た。
Next, a gas dissolving filter 9 made of Teflon was connected to the piping for the anode chamber discharge water 6 of each electrolytic cell unit.

【0045】各電解槽ユニット2の陰極室排出水8用配
管に、テフロン製微粒子除去フィルター8を接続し、さ
らに、テフロン製ガス溶解フィルター9’を接続した。
The Teflon fine particle removal filter 8 and the Teflon gas dissolving filter 9 ′ were connected to the cathode chamber discharge water 8 pipe of each electrolytic cell unit 2.

【0046】各電解槽ユニット2の陽極室3及び陰極室
4に、供給水1、1’として超純水を2L/分で各々供
給し、電流10Aで通電して、50時間電気分解して、陽極
室より中性の酸化性洗浄水を、陰極室より中性の還元性
洗浄水を各々生成させた。
Ultrapure water was supplied at a rate of 2 L / min to each of the anode chamber 3 and the cathode chamber 4 of each electrolytic cell unit 2 as the supply water 1 and 1 ′, and was supplied with a current of 10 A and electrolyzed for 50 hours. Then, neutral oxidizing cleaning water was generated from the anode chamber, and neutral reducing cleaning water was generated from the cathode chamber.

【0047】陽極室排出水6は、ガス溶解フィルター9
を通して溶存ガス濃度を高めさせて、金属不純物がなく
かつ実質的に固体微粒子がない陽極洗浄用電解水10を
得た。
The anode chamber discharge water 6 is supplied to the gas dissolving filter 9
To increase the dissolved gas concentration to obtain electrolytic water for anode cleaning 10 having no metal impurities and substantially no solid fine particles.

【0048】ORP計(電気化学計器(株)製HBM−1
02)を用いて、50時間電解後の陽極洗浄用電解水のO
RPを測定したところ、供給水のORPと比べ+80mV
であった。結果を表1に示す。
ORP meter (HBM-1 manufactured by Electrochemical Instruments Inc.)
02), electrolysis water for anode cleaning after electrolysis for 50 hours
Measured RP, + 80mV compared to ORP of feed water
Met. Table 1 shows the results.

【0049】また、誘導結合プラズマ重量分析装置(横
川電機(株)製PMS2000)を用いて、50時間電解後
の陽極室排出水及び陽極洗浄用電解水中の金属不純物
(B(検出限界50ppt)、Na(検出限界1ppt)、Mg(検出
限界1ppt)、Al(検出限界1ppt)、K(検出限界10pp
t)、Ca(検出限界10ppt)、Ti(検出限界50ppt)、Cr
(検出限界10ppt)、Mn(検出限界5ppt)、Fe(検出限界
5ppt)、Ni(検出限界5ppt)、Cu(検出限界5ppt)、
Zn(検出限界15ppt)、Sn(検出限界30ppt)、Ba(検出限
界50ppt)、W(検出限界50ppt)、Ir(検出限界5ppt)、
Pt(検出限界40ppt)、Ta(検出限界50ppt)、Pb(検出限
界10ppt))を測定したところ、陽極室排出水及び陽極洗
浄用電解水共に全て検出限界以下であった。結果を表1
に示す。
Also, using an inductively coupled plasma gravimetric analyzer (PMS2000 manufactured by Yokogawa Electric Corporation), metal impurities (B (detection limit: 50 ppt)) in the discharge water of the anode chamber and the electrolytic water for anode cleaning after electrolysis for 50 hours, Na (detection limit 1ppt), Mg (detection limit 1ppt), Al (detection limit 1ppt), K (detection limit 10ppt)
t), Ca (detection limit 10ppt), Ti (detection limit 50ppt), Cr
(Detection limit 10ppt), Mn (detection limit 5ppt), Fe (detection limit 5ppt), Ni (detection limit 5ppt), Cu (detection limit 5ppt),
Zn (detection limit 15 ppt), Sn (detection limit 30 ppt), Ba (detection limit 50 ppt), W (detection limit 50 ppt), Ir (detection limit 5 ppt),
When Pt (detection limit: 40 ppt), Ta (detection limit: 50 ppt), and Pb (detection limit: 10 ppt)), all of the water discharged from the anode chamber and the electrolytic water for anode cleaning were below the detection limit. Table 1 shows the results
Shown in

【0050】また、パーティクルカウンター(リオン
(株)製KL−26)を用いて、50時間電解後の陽極室排
出水及び陽極洗浄用電解水中の固体微粒子(粒径0.2μm
以上)を測定したところ、陽極室排出水及び陽極洗浄用
電解水共に1個/1mlであった。
Further, a particle counter (Rion
Using KL-26 (manufactured by Co., Ltd.), solid fine particles (particle diameter: 0.2 μm) in the anode chamber discharge water after the electrolysis for 50 hours and the electrolytic water for anode cleaning.
As a result, the water discharged from the anode chamber and the electrolytic water for cleaning the anode were 1 / ml.

【0051】陰極室排出水7は、微粒子除去フィルター
8で、液中の固体微粒子を除去させた後、ガス溶解フィ
ルター9’を通して溶存ガス濃度を高めさせ、金属不純
物がなくかつ実質的に固体微粒子のない陰極洗浄用電解
水11を得た。
The cathode chamber discharge water 7 is removed by a fine particle removing filter 8 to remove solid fine particles in the liquid, and then the dissolved gas concentration is increased through a gas dissolving filter 9 ′. No electrolytic water 11 for cathode cleaning was obtained.

【0052】50時間電解後の陰極室排出水の金属不純物
及び固体微粒子は、全て検出限界以下、10個/1mlであ
り、また陰極洗浄用電解水のORP、金属不純物及び固
体微粒子は、−620mV、全て検出限界以下0個/1mlで
あった。
The metal impurities and solid fine particles discharged from the cathode chamber after the electrolysis for 50 hours were all below the detection limit, that is, 10 particles / ml, and the ORP, metal impurities and solid fine particles of the electrolytic water for cathode cleaning were -620 mV. All were below the detection limit: 0 / ml.

【0053】2,000時間連続電解後の陽極室排出水の金
属不純物及び固体微粒子は、全て検出限界以下、2個/
1mlであり、また陽極洗浄用電解水のORP、金属不純
物及び固体微粒子は、+80mV、全て検出限界以下、2
個/1mlであった。
After the continuous electrolysis for 2,000 hours, the metal impurities and solid fine particles discharged from the anode chamber were all below the detection limit.
1 ml, and ORP, electrolyzed water for anode cleaning, metal impurities and solid fine particles were +80 mV, all below the detection limit.
Pieces / ml.

【0054】2,000時間連続電解後の陰極室排出水の金
属不純物及び固体微粒子は、全て検出限界以下、12個/
1mlであり、また陰極洗浄用電解水のORP、金属不純
物及び固体微粒子は、−630mV、全て検出限界以下、0
個/1mlであった。
The metal impurities and solid fine particles in the cathode chamber discharge water after continuous electrolysis for 2,000 hours were all below the detection limit, and 12
The ORP, electrolysis water for cathode cleaning, metal impurities and solid fine particles were -630 mV, all of which were below the detection limit.
Pieces / ml.

【0055】[0055]

【発明の効果】本発明の生成装置は、電解質をなんら添
加することなく、純水または超純水を供給するだけで電
解できる。
The production apparatus of the present invention can perform electrolysis only by supplying pure water or ultrapure water without adding any electrolyte.

【0056】本発明の生成装置によれば、陽極室より、
金属不純物がなくかつ実質的に固体微粒子のない中性の
酸化性洗浄水と、陰極室より、金属不純物がなくかつ実
質的に固体微粒子のない中性の還元性洗浄水とが同時に
得られる。
According to the generator of the present invention, the anode chamber
Neutral oxidizing cleaning water free of metal impurities and substantially free of solid fine particles, and neutral reducing cleaning water free of metal impurities and substantially free of solid fine particles are simultaneously obtained from the cathode chamber.

【0057】本発明の生成装置により得られる陽極洗浄
用電解水は、基板表面へのエッチング作用なしで、金属
の酸化溶解により金属不純物を除去することができ、最
終洗浄に用いた場合には、均一で薄く非常に良好な酸化
保護膜を形成することができる。また、陰極洗浄用電解
水は、基板表面へのエッチング作用なしで、固体微粒子
を除去することことができる。
The electrolytic water for anode cleaning obtained by the production apparatus of the present invention can remove metal impurities by oxidative dissolution of metal without etching action on the substrate surface. A very good and uniform oxide protective film can be formed. Further, the electrolytic water for cleaning the cathode can remove solid fine particles without etching the substrate surface.

【0058】本発明の生成装置により得られる陽極洗浄
用電解水及び陰極洗浄用電解水を組み合わせて、基板表
面を洗浄することにより、清浄度が非常に高められた基
板表面を得ることができる。
By cleaning the substrate surface by combining the electrolyzed water for anode cleaning and the electrolyzed water for cathode cleaning obtained by the production apparatus of the present invention, it is possible to obtain a highly clean substrate surface.

【0059】本発明の生成装置は、長期間の連続運転で
も安定して運転ができ、かつ電極交換時でも運転を中断
することなく、容易に交換作業をすることができる
The generator of the present invention can be operated stably even during long-term continuous operation, and can be easily replaced even when replacing electrodes without interrupting the operation.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の洗浄用電解水の生成装置の概略を示す
図であり、電解槽ユニットが4つ並列に配置されたもの
である。
FIG. 1 is a view schematically showing an apparatus for producing electrolytic water for cleaning according to the present invention, in which four electrolytic cell units are arranged in parallel.

【符号の説明】[Explanation of symbols]

1、1’ 供給水 2 電解槽ユニット 3 陽極室 4 陰極室 5 直流電源 6 陽極室排出水 7 陰極室排出水 8 微粒子除去フィルター 9,9’ ガス溶解フィルター 10 陽極洗浄用電解水 11 陰極洗浄用電解水 1, 1 'supply water 2 electrolytic cell unit 3 anode compartment 4 cathode compartment 5 DC power supply 6 anode compartment discharge water 7 cathode compartment discharge water 8 particulate removal filter 9, 9' gas dissolution filter 10 anode cleaning electrolysis water 11 cathode cleaning Electrolyzed water

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 平滑度10〜80%にフラット加工されたエ
キスパンドチタン基体表面に活性層を被覆させた陽極及
び陽極給電体を収納した陽極室、固体高分子電解質隔
膜、陰極及び陰極給電体を収納した陰極室からなる二室
型隔膜電解槽ユニットを有し、供給水及び排出水用配管
が各々配されてなる洗浄用電解水の生成装置において、
前記電解槽ユニットが、複数であることを特徴とする洗
浄用電解水の生成装置。
1. An anode chamber in which an active layer is coated on the surface of an expanded titanium substrate flat-processed to have a smoothness of 10 to 80%, an anode chamber containing an anode feeder, a solid polymer electrolyte membrane, a cathode and a cathode feeder. In the apparatus for generating electrolytic water for cleaning, comprising a two-chamber diaphragm electrolyzer unit comprising a housed cathode chamber, and a pipe for supply water and a pipe for discharge water are arranged,
An apparatus for generating electrolyzed water for cleaning, comprising a plurality of the electrolyzer units.
【請求項2】 電解槽ユニットが、少なくとも3つ以上
であることを特徴とする請求項1に記載の洗浄用電解水
の生成装置。
2. The apparatus for producing electrolytic water for cleaning according to claim 1, wherein the number of electrolytic cell units is at least three or more.
【請求項3】 電解槽ユニットの供給水及び排出水用配
管にバルブ及びフランジが各々配されてなることを特徴
とする請求項1または請求項2に記載の洗浄用電解水の
生成装置。
3. The apparatus for producing electrolytic water for cleaning according to claim 1, wherein a valve and a flange are respectively provided on supply water and discharge water pipes of the electrolytic cell unit.
【請求項4】 陽極室排出水が、ガス溶解フィルターに
通されることを特徴とする請求項1から請求項3のいず
れか1項に記載の洗浄用電解水の生成装置。
4. The apparatus for producing electrolytic water for cleaning according to claim 1, wherein the water discharged from the anode chamber is passed through a gas dissolving filter.
【請求項5】 陰極室排出水が、固体微粒子除去フィル
ターに通されることを特徴とする請求項1から請求項4
のいずれか1項に記載の洗浄用電解水の生成装置。
5. The cathode chamber discharge water is passed through a filter for removing solid fine particles.
The apparatus for generating electrolytic water for cleaning according to any one of the above.
【請求項6】 陰極室排出水が、ガス溶解フィルターに
通されることを特徴とする請求項1から請求項5のいず
れか1項に記載の洗浄用電解水の生成装置。
6. The apparatus for producing electrolytic water for cleaning according to claim 1, wherein the water discharged from the cathode chamber is passed through a gas dissolving filter.
JP11070025A 1999-03-16 1999-03-16 Generator of electrolyzed water for cleaning Pending JP2000263046A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11070025A JP2000263046A (en) 1999-03-16 1999-03-16 Generator of electrolyzed water for cleaning

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Publication Number Publication Date
JP2000263046A true JP2000263046A (en) 2000-09-26

Family

ID=13419660

Family Applications (1)

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Country Link
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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5134153B1 (en) * 2012-07-09 2013-01-30 日科ミクロン株式会社 Ozone water generator
JP5687789B1 (en) * 2014-03-19 2015-03-18 優章 荒井 Electrolyzed water generator
WO2015141329A1 (en) * 2014-03-19 2015-09-24 株式会社 東芝 Device for yielding electrolyzed water, method for yielding electrolyzed water, and electrolyzed water
JP2016131963A (en) * 2015-01-22 2016-07-25 株式会社日本トリム Electrolytic water generator
CN108633270A (en) * 2017-01-18 2018-10-09 日本多宁股份有限公司 Electrolytic water generating device
WO2019225414A1 (en) * 2018-05-25 2019-11-28 パナソニックIpマネジメント株式会社 Electrolyzed water generator and electrolyzed water generation system
JP2019202296A (en) * 2018-05-25 2019-11-28 パナソニックIpマネジメント株式会社 Electrolytic water generator
JP2019202297A (en) * 2018-05-25 2019-11-28 パナソニックIpマネジメント株式会社 Electrolytic water generation system
JP2019202295A (en) * 2018-05-25 2019-11-28 パナソニックIpマネジメント株式会社 Electrolytic water generator and electrolytic water generating system

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5134153B1 (en) * 2012-07-09 2013-01-30 日科ミクロン株式会社 Ozone water generator
JP5687789B1 (en) * 2014-03-19 2015-03-18 優章 荒井 Electrolyzed water generator
WO2015141329A1 (en) * 2014-03-19 2015-09-24 株式会社 東芝 Device for yielding electrolyzed water, method for yielding electrolyzed water, and electrolyzed water
JPWO2015141329A1 (en) * 2014-03-19 2017-04-06 株式会社東芝 Electrolyzed water generating apparatus and electrolyzed water generating method
JP2016131963A (en) * 2015-01-22 2016-07-25 株式会社日本トリム Electrolytic water generator
CN108633270A (en) * 2017-01-18 2018-10-09 日本多宁股份有限公司 Electrolytic water generating device
WO2019225414A1 (en) * 2018-05-25 2019-11-28 パナソニックIpマネジメント株式会社 Electrolyzed water generator and electrolyzed water generation system
JP2019202296A (en) * 2018-05-25 2019-11-28 パナソニックIpマネジメント株式会社 Electrolytic water generator
JP2019202297A (en) * 2018-05-25 2019-11-28 パナソニックIpマネジメント株式会社 Electrolytic water generation system
JP2019202295A (en) * 2018-05-25 2019-11-28 パナソニックIpマネジメント株式会社 Electrolytic water generator and electrolytic water generating system
CN112154124A (en) * 2018-05-25 2020-12-29 松下知识产权经营株式会社 Electrolyzed water generation device and electrolyzed water generation system
US11795072B2 (en) 2018-05-25 2023-10-24 Panasonic Intellectual Property Management Co., Ltd. Electrolyzed water generator and electrolyzed water generation system

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