JP2000239847A - Substrate heating device having cooler - Google Patents

Substrate heating device having cooler

Info

Publication number
JP2000239847A
JP2000239847A JP11044324A JP4432499A JP2000239847A JP 2000239847 A JP2000239847 A JP 2000239847A JP 11044324 A JP11044324 A JP 11044324A JP 4432499 A JP4432499 A JP 4432499A JP 2000239847 A JP2000239847 A JP 2000239847A
Authority
JP
Japan
Prior art keywords
substrate
cooler
plate
heaters
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11044324A
Other languages
Japanese (ja)
Other versions
JP3065065B1 (en
Inventor
Yuji Abe
勇治 阿部
Kuniaki Miura
邦明 三浦
Makoto Asaha
信 浅葉
Yuzo Teruyama
雄三 照山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sukegawa Electric Co Ltd
Original Assignee
Sukegawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Application filed by Sukegawa Electric Co Ltd filed Critical Sukegawa Electric Co Ltd
Priority to JP11044324A priority Critical patent/JP3065065B1/en
Application granted granted Critical
Publication of JP3065065B1 publication Critical patent/JP3065065B1/en
Publication of JP2000239847A publication Critical patent/JP2000239847A/en
Anticipated expiration legal-status Critical
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Links

Abstract

PROBLEM TO BE SOLVED: To not only heat a substrate, but also to cool the substrate sufficiently. SOLUTION: A substrate heating device having a cooler comprises a soaking plate 10 excellent in heat conductivity to uniformly heat a substrate (a) under uniform temperature distribution, plural sets of heaters 25, 26 which are separately embedded on an outer peripheral side and an inner peripheral side of the soaking plate 10, a clearance part 24 which is formed between the heaters 25, 26 of the soaking plate 10 and free from any heaters 25, 26, and a cooler 13 which is on the back side of the soaking plate 10 to cool the substrate (a) through the soaking plate 10. This device is provided with a heating plate 1 on which the substrate (a) is placed, and the soaking plate 10 is arranged in contact with the back side of the heating plate 1.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体装置の製造
の分野において使用され、冷却器とヒータとを備え、半
導体ウエハに成膜或いは加工する工程において、半導体
ウエハ等の基板を加熱すると共に冷却し、半導体ウエハ
を所定の温度に維持する冷却器付基板加熱装置に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is used in the field of the manufacture of semiconductor devices and includes a cooler and a heater. In a process of forming or processing a semiconductor wafer, a substrate such as a semiconductor wafer is heated and cooled. And a substrate heating device with a cooler for maintaining the semiconductor wafer at a predetermined temperature.

【0002】[0002]

【従来の技術】半導体ウエハ等の基板を加熱する冷却器
付基板装置では、半導体ウエハを加熱するマイクロヒー
タ(シーズヒータ)と水冷管からなる冷却器の双方を備
えている。ヒータは加熱する基板を載せる加熱板に近い
側に配置し、冷却器は加熱板に対してヒータより遠い位
置に配置する。これは、この逆に冷却器を加熱板に近い
側に配置し、ヒータを加熱板に対して遠い位置に配置す
ると、基板の冷却は効率よく行えるが、基板を加熱する
ときは、冷却器側の空間によってヒータからの熱伝達が
遮断され、基板の加熱ができなくなるからである。
2. Description of the Related Art A substrate device with a cooler for heating a substrate such as a semiconductor wafer is provided with both a microheater (seed heater) for heating the semiconductor wafer and a cooler comprising a water cooling tube. The heater is arranged on the side closer to the heating plate on which the substrate to be heated is placed, and the cooler is arranged farther from the heating plate than the heater. Conversely, if the cooler is placed closer to the heating plate and the heater is placed farther from the heating plate, the substrate can be cooled efficiently, but when the substrate is heated, the cooling device side This is because heat transfer from the heater is interrupted by the space, and the substrate cannot be heated.

【0003】前記ヒータは、熱を均等に伝達するための
熱伝導率良好な均熱板に螺旋状に掘られた溝の中に埋め
込まれ、ロウ付け等の手段で固定されている。また、冷
却器を構成する水冷管は、螺旋状に曲げられると共に、
均熱板の前記ヒータを埋め込んだ側の面に当てた状態で
ロウ付けすることにより固定されている。
The heater is embedded in a spirally dug groove in a heat equalizing plate having good thermal conductivity for uniformly transmitting heat, and is fixed by means such as brazing. In addition, the water cooling tube that constitutes the cooler is spirally bent,
It is fixed by brazing while being in contact with the surface of the soaking plate where the heater is embedded.

【0004】[0004]

【発明が解決しようとしている課題】このような冷却器
付基板加熱装置を使用し、化学的気相成長法(CVD
法)等を用いてシリコンウエハ等の基板上に金属膜を成
膜する場合、成膜雰囲気は300〜500℃である。こ
の雰囲気温度で、基板を500℃前後に加熱する場合と
50℃以下に冷却して成膜する場合がある。このうち冷
却する条件のもとでは、基板をそれが常温になるように
常に冷却する必要がある。このときは、冷却器を構成す
る冷却管に水を流し、均熱板及び加熱板を介して基板を
冷却する。
SUMMARY OF THE INVENTION Using such a substrate heating device with a cooler, a chemical vapor deposition (CVD) method is used.
When a metal film is formed on a substrate such as a silicon wafer by using (method) or the like, the film formation atmosphere is 300 to 500 ° C. At this ambient temperature, the substrate may be heated to about 500 ° C. or may be cooled to 50 ° C. or lower to form a film. Under these cooling conditions, it is necessary to always cool the substrate so that it becomes room temperature. At this time, water is caused to flow through a cooling pipe constituting the cooler, and the substrate is cooled via the soaking plate and the heating plate.

【0005】ところが、基板を載せる加熱板と冷却器と
の間にマイクロヒータがあると、ヒータの中に熱伝導率
が小さなマグネシア等の絶縁材が充填されているため、
加熱板側から冷却器に吸収させるべき熱が遮断され、基
板の冷却が十分に行えないという課題がある。本発明
は、このような従来の冷却器付基板加熱装置における課
題に鑑み、基板の加熱だけでなく、基板の冷却も十分に
行える冷却器付基板加熱装置を提供することを目的とす
る。
However, if there is a micro heater between the heating plate on which the substrate is mounted and the cooler, the heater is filled with an insulating material such as magnesia having a small thermal conductivity.
There is a problem that heat to be absorbed by the cooler is cut off from the heating plate side, and the substrate cannot be sufficiently cooled. An object of the present invention is to provide a substrate heating device with a cooler that can sufficiently cool not only the substrate but also the substrate in view of the problems in the conventional substrate heating device with a cooler.

【0006】[0006]

【課題を解決するための手段】本発明では、前記の目的
を達成するため、複数組のヒータ25、26を、熱伝導
率が良好な均熱板10の外周側と内周側に分離して配置
し、これらヒータ25、26の間にヒータ25、26が
無い間隙部分24を設け、この間隙部分24を通して、
均熱板10の背後側にある冷却器13から加熱板1上に
載せた基板側に熱が伝達できるようにしたものである。
According to the present invention, in order to achieve the above object, a plurality of sets of heaters 25 and 26 are separated into an outer peripheral side and an inner peripheral side of a heat equalizing plate 10 having good thermal conductivity. And a gap portion 24 without the heaters 25 and 26 is provided between the heaters 25 and 26, and through the gap portion 24,
The heat can be transferred from the cooler 13 located behind the soaking plate 10 to the substrate placed on the heating plate 1.

【0007】本発明により冷却器付基板加熱装置は、基
板aを加熱するヒータ25、26と、基板を冷却する冷
却器13とを備え、温度分布を均一にして基板aを均一
に加熱する熱伝導良好な均熱板10と、この均熱板10
の外周側と内周側とに分けて埋め込まれた複数組のヒー
タ25、26と、均熱板10の前記ヒータ25、26の
間に形成され、ヒータ25、26が無い間隙部分24
と、この均熱板10の背後側にあって、均熱板10を介
して基板aを冷却する冷却器13とを有することを特徴
とするものである。この装置では、基板aを載せる加熱
板1を備え、この加熱板1の背後に均熱板10が接する
ように配置され、ロー付等で接合されている。
The substrate heating apparatus with a cooler according to the present invention includes heaters 25 and 26 for heating the substrate a and a cooler 13 for cooling the substrate, and has a uniform temperature distribution to heat the substrate a uniformly. A heat equalizing plate 10 having good conductivity, and the heat equalizing plate 10
A plurality of sets of heaters 25 and 26 embedded separately on the outer peripheral side and the inner peripheral side of the heater, and a gap portion 24 formed between the heaters 25 and 26 of the heat equalizing plate 10 and having no heaters 25 and 26
And a cooler 13 behind the heat equalizing plate 10 for cooling the substrate a via the heat equalizing plate 10. This apparatus includes a heating plate 1 on which a substrate a is placed. A heating plate 10 is arranged behind the heating plate 1 so as to be in contact with the heating plate 1 and joined by brazing or the like.

【0008】このような冷却器付器基板加熱装置では、
加熱板1上に載せられる基板aに対して、冷却器13が
ヒータ25、26の背後側にあるが、均熱板10の中間
部に第一と第二のヒータ25、26が無い間隙部分24
があるため、加熱板1側からこの間隙部分24を通して
冷却器13側に熱を伝導させ、基板aを確実に冷却する
ことができる。しかも、ヒータ25、26と冷却器13
は、熱伝導良好な均熱板10を直接加熱または冷却する
ように設けられているため、加熱及び冷却時の温度分布
を均一にすることができ、基板aを均一な温度分布で加
熱または冷却することができる。
[0008] In such a substrate heating apparatus with a cooler,
A gap portion where the cooler 13 is located behind the heaters 25 and 26 with respect to the substrate a mounted on the heating plate 1, but where the first and second heaters 25 and 26 are not provided at an intermediate portion of the heat equalizing plate 10. 24
Therefore, heat is conducted from the heating plate 1 side to the cooler 13 side through the gap portion 24, and the substrate a can be cooled reliably. Moreover, the heaters 25 and 26 and the cooler 13
Is provided so as to directly heat or cool the heat equalizing plate 10 having good heat conduction, so that the temperature distribution during heating and cooling can be made uniform, and the substrate a can be heated or cooled with a uniform temperature distribution. can do.

【0009】例えば、ヒータ25、26は、均熱板10
の外周と内周に配置された第一と第二のヒータ25、2
6からなり、この第一と第二のヒータ25、25の間に
ヒータ25、26が無い間隙部分24がある。これらの
ヒータ25、26は、均熱板10の表面に螺旋状に設け
られた溝27に埋め込まれ、固定されている。また、冷
却器13は、均熱板10のヒータ25、26が取り付け
られた面側に当接して固定された螺旋状の水冷管14を
備える。
For example, the heaters 25 and 26
The first and second heaters 25, 2 arranged on the outer and inner circumferences of the
6, there is a gap portion 24 between the first and second heaters 25, 25 where no heaters 25, 26 are provided. These heaters 25 and 26 are embedded and fixed in grooves 27 provided spirally on the surface of the heat equalizing plate 10. In addition, the cooler 13 includes a spiral water-cooled tube 14 that is fixed in contact with the surface of the soaking plate 10 to which the heaters 25 and 26 are attached.

【0010】[0010]

【発明の実施の形態】次に、図面を参照しながら、本発
明の実施の形態について、具体的且つ詳細に説明する。
図1〜図3は、本発明による冷却器付基板加熱装置の加
熱部分を示すものであり、加熱電源、冷却水供給源、反
応性ガス供給源等は図示を省略してある。
Embodiments of the present invention will now be described specifically and in detail with reference to the drawings.
1 to 3 show a heating portion of a substrate heating apparatus with a cooler according to the present invention, in which a heating power source, a cooling water supply source, a reactive gas supply source, and the like are omitted.

【0011】パイプ4の上端にフランジ状に円盤状の底
板3が固着されており、このパイプ4の下端には真空チ
ャンバのポートフランジ(図示せず)に取り付けられる
フランジ(図示せず)が設けられている。パイプ4の先
端側を真空チャンバのポートからその中に導入し、前記
フランジをポートフランジに固定することにより、冷却
器付基板加熱装置が真空チャンバ内に設置される。
A disk-shaped bottom plate 3 is fixed to an upper end of the pipe 4 in a flange shape, and a lower end of the pipe 4 is provided with a flange (not shown) attached to a port flange (not shown) of a vacuum chamber. Have been. By introducing the distal end of the pipe 4 into the port from the vacuum chamber and fixing the flange to the port flange, the substrate heating apparatus with a cooler is installed in the vacuum chamber.

【0012】パイプ4の中心位置にガスパイプ12が配
置され、このガスパイプ12は後述する加熱板1と均熱
板10の中心を貫通し、固定されている。このガスパイ
プ12を介してシランガスやホスフィンガス等の反応性
原料ガスが基板aの成膜面上に供給される。前記底板3
は円盤状の加熱板1と平行に対向された状態で、これら
底板3と加熱板1の外周に嵌め込まれた円筒形の側板2
により互いに固定されている。加熱板1の上面は平坦で
あり、この上に加熱される半導体ウエハ等の図示してな
い基板aが搭載される。
A gas pipe 12 is disposed at the center of the pipe 4, and the gas pipe 12 passes through the centers of a heating plate 1 and a heat equalizing plate 10, which will be described later, and is fixed. Through this gas pipe 12, a reactive source gas such as a silane gas or a phosphine gas is supplied onto the film formation surface of the substrate a. The bottom plate 3
The bottom plate 3 and the cylindrical side plate 2 fitted around the outer periphery of the heating plate 1 in a state of being opposed to the disk-shaped heating plate 1 in parallel.
Are fixed to each other. The upper surface of the heating plate 1 is flat, and a substrate a (not shown) such as a semiconductor wafer to be heated is mounted thereon.

【0013】加熱板1の下面には、均熱板10が重ね合
わせられており、この均熱板10は熱伝導性の良い銅板
等でできており、前記側板2の内側に嵌め込まれてい
る。均熱板10の下面には、螺旋状の溝27が形成され
ている。この溝27にヒータ25、26が埋め込まれ、
ロウ付け等の手段で固定されている。さらに、均熱板1
0の下面に45゜間隔でヒータサポート16が放射状に
取り付けられ、このヒータサポート16がネジ9により
均熱板10の下面に固定されている。
A heat equalizing plate 10 is superposed on the lower surface of the heating plate 1. The heat equalizing plate 10 is made of a copper plate or the like having good heat conductivity, and is fitted inside the side plate 2. . A spiral groove 27 is formed on the lower surface of the heat equalizing plate 10. Heaters 25 and 26 are embedded in the grooves 27,
It is fixed by means such as brazing. Furthermore, the heat equalizing plate 1
The heater supports 16 are radially attached to the lower surface of the heater 0 at 45 ° intervals, and the heater supports 16 are fixed to the lower surface of the heat equalizing plate 10 by screws 9.

【0014】図2はこのヒータ25、26の配置を示し
ている。ヒータ25、26は、均熱板10の外周側に配
置した第一のヒータ25と均熱板10の内周側に配置し
た第二のヒータ26とからなっている。均熱板10の第
一と第二のヒータ25、26が配置された部分の間にヒ
ータ25、26が存在しない間隙部分24が設けられて
いる。この間隙部分には、加熱板1、均熱板10及び底
板3を貫通するように、円筒棒状のガイドパイプ11が
設けられ、また前記ヒータサポート16を均熱板10の
下面に固定するネジ9が設けられている。
FIG. 2 shows the arrangement of the heaters 25 and 26. The heaters 25 and 26 include a first heater 25 disposed on the outer peripheral side of the heat equalizing plate 10 and a second heater 26 disposed on the inner peripheral side of the heat equalizing plate 10. A gap portion 24 where the heaters 25 and 26 do not exist is provided between the portions of the heat equalizing plate 10 where the first and second heaters 25 and 26 are arranged. In this gap portion, a cylindrical rod-shaped guide pipe 11 is provided so as to penetrate the heating plate 1, the soaking plate 10 and the bottom plate 3, and a screw 9 for fixing the heater support 16 to the lower surface of the soaking plate 10 is provided. Is provided.

【0015】この均熱板10には、その温度を測定する
測温素子として熱電対27、28が配置されている。図
示の実施形態では、熱電対27、28が2つ配置されて
いる。第一の熱電対27は、第一のヒータ25が配置さ
れた均熱板10の外周側に配置され、第二の熱電対は、
第二のヒータ26が配置された均熱板10の内周側に配
置されている。これら熱電対27、28は、加熱板1上
に載せた基板aを加熱、冷却するときに、その加熱、冷
却温度を制御するために使用する。
On the heat equalizing plate 10, thermocouples 27 and 28 are arranged as temperature measuring elements for measuring the temperature. In the illustrated embodiment, two thermocouples 27 and 28 are arranged. The first thermocouple 27 is arranged on the outer peripheral side of the heat equalizing plate 10 on which the first heater 25 is arranged, and the second thermocouple is
It is arranged on the inner peripheral side of the heat equalizing plate 10 on which the second heater 26 is arranged. These thermocouples 27 and 28 are used to control the heating and cooling temperatures when the substrate a placed on the heating plate 1 is heated and cooled.

【0016】図1に示すように、均熱板10の下面に
は、前記ヒータサポート16を介して冷却器13を構成
する水冷管14が取り付けられている。図3は、この冷
却管14の配置を示している。冷却管14は、二条の冷
却管14を水冷ジョイント15を介して接続しており、
ここに水やその他の冷却液を送ることにより、均熱板1
0を冷却することができる。均熱板10の冷却性能を高
める為、冷却管14は均熱板10やヒータサポート16
にロー付等にて接合されている。
As shown in FIG. 1, a water cooling tube 14 constituting a cooler 13 is attached to the lower surface of the heat equalizing plate 10 via the heater support 16. FIG. 3 shows the arrangement of the cooling pipes 14. The cooling pipe 14 connects the two cooling pipes 14 via a water cooling joint 15,
By sending water or other cooling liquid here, the heat equalizing plate 1
0 can be cooled. In order to enhance the cooling performance of the soaking plate 10, the cooling pipes 14 are provided with a soaking plate 10 and a heater support 16.
Are joined by brazing or the like.

【0017】加熱板1側の熱は、均熱板10を通して水
冷管14に吸収される。特に前述のように均熱板10
は、その外周側と内周側の中間部にヒータ25、26が
無い間隙部分24を有するため、均熱板10の間隙部分
24が熱の通路となり、加熱板1側の熱が水冷管14に
円滑に吸収される。これにより、加熱板1の上に載せた
基板aを迅速且つ確実に冷却することが可能となる。な
お、前記の実施形態では、ヒータ25、26が2組のヒ
ータからなるが、ヒータ25、26は3組以上であって
もよい。例えば、3組みのヒータの場合は、ヒータの無
い間隙部分は2個所設けることができる。
The heat from the heating plate 1 is absorbed by the water cooling tube 14 through the soaking plate 10. In particular, as described above, the heat equalizing plate 10
Has a gap portion 24 without the heaters 25 and 26 at an intermediate portion between the outer circumference side and the inner circumference side, so that the gap portion 24 of the heat equalizing plate 10 becomes a heat passage, and the heat of the heating plate 1 side is Is absorbed smoothly. This makes it possible to quickly and surely cool the substrate a placed on the heating plate 1. In the above embodiment, the heaters 25 and 26 include two sets of heaters, but the number of the heaters 25 and 26 may be three or more. For example, in the case of three sets of heaters, two gap portions without heaters can be provided.

【0018】[0018]

【発明の効果】以上説明した通り、本発明によれば、冷
却器13をヒータ25、26の背後に配置しても、均熱
板10にヒータ25、26が無い間隙部分24を有する
ため、ヒータ25、26に含まれるマグネシア等の絶縁
材があっても、前記間隙部分24を介して加熱板1側と
冷却器13との熱伝達が行われることにより、均熱板1
0と加熱板1を介して加熱板1上の基板aを円滑且つ確
実に冷却することができる。これにより、基板aの加熱
と冷却を応答性よく行うことが可能となり、基板aの正
確な温度制御ができるようになる。
As described above, according to the present invention, even when the cooler 13 is disposed behind the heaters 25 and 26, the heat equalizing plate 10 has the gap portion 24 without the heaters 25 and 26. Even if there is an insulating material such as magnesia contained in the heaters 25 and 26, heat transfer between the heating plate 1 and the cooler 13 is performed through the gap portion 24, so that the heat equalizing plate 1
0 and the substrate a on the heating plate 1 can be cooled smoothly and reliably via the heating plate 1. Thereby, the heating and cooling of the substrate a can be performed with good responsiveness, and accurate temperature control of the substrate a can be performed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明による冷却器付基板加熱装置の基板加熱
部を示す要部縦断側面図である。
FIG. 1 is a vertical sectional side view showing a main part of a substrate heating unit of a substrate heating apparatus with a cooler according to the present invention.

【図2】図1のA−A線断面図である。FIG. 2 is a sectional view taken along line AA of FIG.

【図3】図1のB−B線断面図である。FIG. 3 is a sectional view taken along line BB of FIG. 1;

【符号の説明】[Explanation of symbols]

1 加熱板 10 均熱板 13 冷却器 14 水冷管 25 ヒータ 26 ヒータ 24 間隙部分 27 溝 a 基板 DESCRIPTION OF SYMBOLS 1 Heating plate 10 Heat equalizing plate 13 Cooler 14 Water cooling tube 25 Heater 26 Heater 24 Gap part 27 Groove a Substrate

───────────────────────────────────────────────────── フロントページの続き (72)発明者 浅葉 信 茨城県日立市滑川本町3丁目19番5号 助 川電気工業株式会社内 (72)発明者 照山 雄三 茨城県日立市滑川本町3丁目19番5号 助 川電気工業株式会社内 Fターム(参考) 4K030 CA04 KA24 KA26 4M104 DD44 HH20 5F045 AC01 EJ02 EJ09 EK08 EK22 EM02  ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Shin Asaba 3-195-5 Namekawa Honcho, Hitachi City, Ibaraki Prefecture Inside Sukegawa Electric Industry Co., Ltd. No. 5 Sukegawa Electric Industry Co., Ltd. F term (reference) 4K030 CA04 KA24 KA26 4M104 DD44 HH20 5F045 AC01 EJ02 EJ09 EK08 EK22 EM02

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 基板(a)を加熱するヒータ(25)、
(26)と、基板を冷却する冷却器(13)とを備えた
冷却器付基板加熱装置において、温度分布を均一にして
基板(a)を均一に加熱する熱伝導良好な均熱板(1
0)と、この均熱板(10)の外周側と内周側とに分け
て埋め込まれた複数組のヒータ(25)、(26)と、
均熱板(10)の前記ヒータ(25)、(26)の間に
形成され、ヒータ(25)、(26)が無い間隙部分
(24)と、この均熱板(10)の背後側にあって、均
熱板(10)を介して基板(a)を冷却する冷却器(1
3)とを有することを特徴とする冷却器付基板加熱装
置。
A heater (25) for heating the substrate (a);
(26) and a cooler (13) for cooling a substrate, provided with a cooler (13) that cools the substrate and heats the substrate (a) uniformly with uniform temperature distribution.
0), a plurality of sets of heaters (25), (26) embedded separately on the outer peripheral side and inner peripheral side of the heat equalizing plate (10);
A gap (24) formed between the heaters (25) and (26) of the heat equalizing plate (10) and without the heaters (25) and (26), and a rear side of the heat equalizing plate (10). And a cooler (1) for cooling the substrate (a) via the soaking plate (10).
3) A substrate heating apparatus with a cooler, comprising:
【請求項2】 基板(a)を載せる加熱板(1)を備
え、この加熱板(1)の背後に均熱板(10)が接する
ように配置されていることを特徴とする請求項1に記載
の冷却器付基板加熱装置。
2. A heating plate (1) on which a substrate (a) is placed, wherein a soaking plate (10) is arranged behind the heating plate (1). A substrate heating device with a cooler according to item 1.
【請求項3】 冷却器(13)は、ヒータ(25)、
(26)が無い間隙部分(24)にも設けられているこ
とを特徴とする請求項1または2に記載の冷却器付基板
加熱装置。
3. The cooler (13) includes a heater (25),
The substrate heating device with a cooler according to claim 1 or 2, wherein the substrate heating device is provided also in a gap portion (24) having no (26).
【請求項4】 ヒータ(25)、(26)は、均熱板
(10)の外周と内周に配置された第一と第二のヒータ
(25)、(26)からなることを特徴とする請求項2
〜3に記載の冷却器付基板加熱装置。
4. The heaters (25) and (26) comprise first and second heaters (25) and (26) arranged on the outer and inner circumferences of the heat equalizing plate (10). Claim 2
4. The substrate heating device with a cooler according to any one of items 1 to 3.
【請求項5】 ヒータ(25)、(26)は、均熱板
(10)の表面に螺旋状に設けられた溝(27)に埋め
込まれ、固定されていることを特徴とする請求項2〜4
の何れかに記載の冷却器付基板加熱装置。
5. The heater (25), (26) is embedded and fixed in a spiral groove (27) formed on the surface of the heat equalizing plate (10). ~ 4
The substrate heating device with a cooler according to any one of the above.
【請求項6】 冷却器(13)は、均熱板(10)のヒ
ータ(25)、(26)が取り付けられた面側に当接し
て固定された螺旋状の水冷管(14)を備えることを特
徴とする請求項2〜5の何れかに記載の冷却器付基板加
熱装置。
6. The cooler (13) includes a helical water cooling tube (14) abutting and fixed to a surface of the soaking plate (10) to which the heaters (25) and (26) are attached. The substrate heating device with a cooler according to any one of claims 2 to 5, wherein
JP11044324A 1999-02-23 1999-02-23 Substrate heating device with cooler Expired - Fee Related JP3065065B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11044324A JP3065065B1 (en) 1999-02-23 1999-02-23 Substrate heating device with cooler

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11044324A JP3065065B1 (en) 1999-02-23 1999-02-23 Substrate heating device with cooler

Publications (2)

Publication Number Publication Date
JP3065065B1 JP3065065B1 (en) 2000-07-12
JP2000239847A true JP2000239847A (en) 2000-09-05

Family

ID=12688328

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11044324A Expired - Fee Related JP3065065B1 (en) 1999-02-23 1999-02-23 Substrate heating device with cooler

Country Status (1)

Country Link
JP (1) JP3065065B1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022252708A1 (en) * 2021-06-01 2022-12-08 浙江求是半导体设备有限公司 Heating body of epitaxial growth apparatus

Also Published As

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