JP2000239610A - Production of reflecting stainproof board - Google Patents
Production of reflecting stainproof boardInfo
- Publication number
- JP2000239610A JP2000239610A JP11047619A JP4761999A JP2000239610A JP 2000239610 A JP2000239610 A JP 2000239610A JP 11047619 A JP11047619 A JP 11047619A JP 4761999 A JP4761999 A JP 4761999A JP 2000239610 A JP2000239610 A JP 2000239610A
- Authority
- JP
- Japan
- Prior art keywords
- antifouling
- film
- forming
- lower layer
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、基材表面の反射特
性を損なわず防汚性を付与することを可能とする表面処
理である高反射防汚性板の製造方法に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a highly reflective antifouling plate, which is a surface treatment capable of imparting antifouling properties without impairing the reflection characteristics of the substrate surface.
【０００２】[0002]
【従来の技術】基材表面の撥水撥油防汚性を改善する方
法として、フッ素ポリマーを塗布焼き付けたり、フロロ
カーボン系の化学吸着単分子膜を形成する方法が提案さ
れている（特開平８−１８８４４８号公報参照）。ま
た、熱線反射能を有する方法として、金属膜及び金属酸
化物膜をガラス表面に設けた熱線反射ガラスも提案され
ている（特開平７−１４９５４２号公報参照）。また、
フッ素ポリマー中にアルミフレークを分散させ、塗布焼
き付ける方法で反射及び防汚効果を付与する方法も提案
されている。2. Description of the Related Art As a method for improving the water / oil / oil repellency of a substrate surface, there has been proposed a method of applying and baking a fluoropolymer or forming a fluorocarbon-based chemically adsorbed monomolecular film (Japanese Patent Laid-Open No. Hei 8 (1996) -1996). -188448). Further, as a method having heat ray reflection capability, a heat ray reflection glass in which a metal film and a metal oxide film are provided on a glass surface has been proposed (see Japanese Patent Application Laid-Open No. 149542/1995). Also,
There has also been proposed a method of dispersing aluminum flakes in a fluoropolymer and applying and baking to impart a reflection and antifouling effect.
【０００３】[0003]
【発明が解決しようとする課題】しかし、金属膜及び金
属酸化物膜よりなる熱線反射膜は反射特性を有するもの
の、防汚性を有するものはなく、オーブン電子レンジ等
の加熱調理器に用いた場合、油などの汚れが焼き付き、
それにより初期の反射性能を保てない等の問題を有して
いた。また、フッ素ポリマー中にアルミフレークを分散
させ反射と防汚の両効果を付与した場合においては、金
属膜及び金属酸化物から成る熱線反射膜に比べて、反射
能がかなり劣る。また、塗膜の耐久性の面でも、ピンホ
ールの発生により劣化する等の問題を有していた。However, the heat ray reflective film composed of a metal film and a metal oxide film has a reflection characteristic, but does not have an antifouling property, and has been used for a heating cooker such as an oven microwave oven. In the case, dirt such as oil burns,
As a result, there was a problem that the initial reflection performance could not be maintained. In addition, when aluminum flakes are dispersed in a fluoropolymer to provide both reflection and antifouling effects, the reflectivity is considerably inferior to that of a heat ray reflective film composed of a metal film and a metal oxide. In addition, the durability of the coating film also has a problem such as deterioration due to generation of pinholes.
【０００４】一方、フロロカーボン系の化学吸着単分子
膜は、基材表面の活性水素との縮合反応により基材表面
に密着するが、金属基材等表面に活性水素が少ない基材
では、吸着膜の耐久性が劣る。また、その膜厚（数nm）
が非常に薄いため、基材表面に酸化によりテンパーカラ
ーが付く等の問題を有していた。On the other hand, a fluorocarbon-based chemisorption monomolecular film adheres to the surface of a substrate by a condensation reaction with active hydrogen on the surface of the substrate. Is inferior in durability. Also, its film thickness (several nm)
Was very thin, so that there was a problem that a temper color was attached to the surface of the base material by oxidation.
【０００５】本発明は、上記従来の問題点を解決するも
ので、反射特性に優れ、かつ防汚性、耐久性、耐酸化性
を兼ね備えた高反射防汚性板の製造方法を提供すること
を目的とする。The present invention solves the above-mentioned conventional problems and provides a method for producing a high-reflection antifouling plate having excellent reflection characteristics and having antifouling properties, durability and oxidation resistance. With the goal.
【０００６】[0006]
【課題を解決するための手段】前記目的を達成するため
に本発明の反射防汚性板の製造方法は、反射特性を示す
基材表面に、親水性を示す下層膜を形成する工程と、前
記下層膜表面に、シラン系界面活性剤を吸着させること
で防汚性を有する薄膜を形成する工程とから成る高反射
防汚性板の製造方法とする。この構成により、高反射
性、防汚性、耐熱性、耐酸化性を兼ね備えた表面処理を
実現できる。In order to achieve the above object, a method for producing a reflective antifouling plate according to the present invention comprises the steps of: forming a hydrophilic lower layer film on a surface of a substrate exhibiting reflective characteristics; Forming a thin film having antifouling properties by adsorbing a silane-based surfactant on the surface of the lower layer film. With this configuration, a surface treatment having high reflectivity, antifouling property, heat resistance, and oxidation resistance can be realized.
【０００７】[0007]
【発明の実施の形態】本発明の請求項１記載の発明は、
反射特性を示す基材表面に下層膜を形成する工程と、さ
らにその上に防汚性を有する薄膜を形成する工程からな
ることを特徴とする高反射防汚性板の製造方法であり、
これにより、反射特性と防汚性を兼ね備えた表面処理を
実現できる。BEST MODE FOR CARRYING OUT THE INVENTION
A step of forming a lower layer film on the surface of the base material exhibiting reflection characteristics, and a method for producing a high-reflection anti-fouling plate, comprising a step of forming a thin film having anti-fouling properties thereon,
As a result, a surface treatment having both reflection characteristics and antifouling properties can be realized.
【０００８】本発明の請求項２記載の発明は、反射特性
を示す基材表面に、親水性を示す下層膜を形成する工程
と、前記下層膜表面上に化学結合により密着した防汚性
を有する薄膜を形成する工程とを有することを特徴とす
る高反射防汚性板の製造方法であり、親水性を示す下層
膜表面の活性水素を有する官能基と、防汚性を有する薄
膜の官能基が化学結合するものである。よって防汚性を
有する膜を密着させるため、アンカー効果により密着し
ている従来フッ素ポリマーの塗膜に比べ、耐久性に優れ
た塗膜を形成することができる。また、金属表面等親水
性が低く活性水素を有する官能基の少ない基材表面上に
も、親水性を示す下層膜を介することでより多くの化学
結合が形成され、防汚性を有する緻密な薄膜にできるた
め、結果として防汚性及び耐久性の優れた塗膜を形成す
ることができる。According to a second aspect of the present invention, there is provided a method of forming a hydrophilic lower layer film on a surface of a base material exhibiting a reflection characteristic, and a method of forming a film on the surface of the lower layer film by means of a chemical bond. Forming a thin film having a function of producing a highly reflective antifouling plate, wherein the functional group having active hydrogen on the surface of the lower layer film exhibiting hydrophilicity and the function of the thin film having the antifouling property are provided. The groups are chemically bonded. Therefore, since a film having antifouling properties is adhered, a film having excellent durability can be formed as compared with a conventional fluoropolymer film adhered by an anchor effect. Further, also on the surface of the base material having a low hydrophilicity such as a metal surface and a small number of functional groups having active hydrogen, more chemical bonds are formed through a lower layer film having hydrophilicity, and a dense antifouling property is provided. Since a thin film can be formed, a coating film having excellent antifouling properties and durability can be formed as a result.
【０００９】本発明の請求項３記載の発明は、反射特性
を示す基材表面に着色処理またはエンボス加工をするこ
とにより意匠性を付与することを特徴とする請求項１ま
たは２に記載の高反射防汚性板の製造方法であり、反射
特性及び防汚性と、意匠性の向上等視覚的な効果も併せ
てもつことができる。また、エンボス加工により基材表
面に凹凸を設けると、単位面積当たりの表面積が増加
し、反射率を向上することができる。The invention according to claim 3 of the present invention is characterized in that the surface of a substrate exhibiting reflection characteristics is imparted with a design property by coloring or embossing. This is a method for producing a reflective antifouling plate, and can also have a visual effect such as an improvement in design properties and reflection characteristics and antifouling properties. In addition, when unevenness is provided on the surface of the base material by embossing, the surface area per unit area increases, and the reflectance can be improved.
【００１０】本発明の請求項４記載の発明は、親水性を
示す下層膜を形成する工程が、金属アルコキシド、金属
アルコキシドの部分加水分解物、ポリシラザン、シラノ
ールのうち少なくとも１種と、アルコール、ケトン、エ
ステル、水、酸のうち少なくとも１種とを含む溶液を塗
布する工程と、形成した下層膜表面を親水化する工程と
を有することを特徴とする請求項１〜３のいずれか１項
に記載の高反射防汚性板の製造方法であり、金属酸化物
（例えば、Ｍｇ、Ａｌ、Ｓｉ、Ｔｉ、Ｚｒ、Ｍｏ、Ｉ
ｎ、Ｓｎ、Ｓｂ等の酸化物）をユニットとした繰り返し
で構成されたセラミックスとなるため耐熱性が優れ、膜
も緻密であるため、酸化による基材の変色劣化を防ぐこ
とも可能となり、初期の反射特性を保持することができ
る。According to a fourth aspect of the present invention, the step of forming a hydrophilic lower layer film comprises the step of forming at least one of a metal alkoxide, a partial hydrolyzate of a metal alkoxide, polysilazane and silanol, an alcohol and a ketone. The method according to any one of claims 1 to 3, further comprising a step of applying a solution containing at least one of an ester, water, and an acid, and a step of hydrophilizing the surface of the formed lower film. The method for producing a highly reflective antifouling plate according to the above, wherein the metal oxide (for example, Mg, Al, Si, Ti, Zr, Mo, I
(oxides such as n, Sn, Sb, etc.) as a unit, and has excellent heat resistance because it is a repetitive ceramic unit. Since the film is dense, discoloration and deterioration of the base material due to oxidation can be prevented. Can be maintained.
【００１１】本発明の請求項５記載の発明は、下層膜表
面を親水化する工程が、酸処理、アルカリ処理、熱処理
のいずれかであることを特徴とする請求項１〜４のいず
れか１項に記載の高反射防汚性板の製造方法であり、こ
れらの処理により活性水素を含む官能基を有する下層膜
表面を実現できる。The invention according to claim 5 of the present invention is characterized in that the step of hydrophilizing the surface of the underlayer film is any one of an acid treatment, an alkali treatment and a heat treatment. The method for producing a highly reflective antifouling plate according to the above item, wherein a surface of an underlayer film having a functional group containing active hydrogen can be realized by these treatments.
【００１２】本発明の請求項６記載の発明は、下層膜表
面を親水化する熱処理工程での処理温度が３００℃〜４
５０℃であることを特徴とする請求項１〜５のいずれか
１項に記載の高反射防汚性板の製造方法であり、この温
度で熱処理することにより、下層膜表面を水酸基化する
ことができる。さらにこの温度域での焼成は、下層膜を
緻密化することにもなっている。また、熱線を遮断（吸
収）し反射率を低下させる有機分の分解除去も可能とす
ることから、基材の反射特性を損なわない。The invention according to claim 6 of the present invention is characterized in that the treatment temperature in the heat treatment step for hydrophilizing the surface of the underlayer film is from 300 ° C to 4 ° C.
The method for producing a highly reflective antifouling plate according to any one of claims 1 to 5, wherein the temperature is 50 ° C, and the surface of the lower film is hydroxylated by heat treatment at this temperature. Can be. Furthermore, firing in this temperature range also densifies the lower layer film. Further, since the organic component that blocks (absorbs) heat rays and reduces the reflectance can be removed, the reflection characteristics of the base material are not impaired.
【００１３】本発明の請求項７記載の発明は、防汚性を
有する薄膜を形成する工程が、親水性を示す下層膜表面
に、一端にはＣＦ3基またはＣＨ3基を有し、他端にはシ
ラノール基、クロロシリル基またはアルコキシシリル基
を有するシラン系界面活性剤を吸着することを特徴とす
る請求項２〜６のいずれか１項に記載の高反射防汚性板
の製造方法であり、これにより、下層膜表面と化学結合
により密着した防汚性を有する薄膜を焼成過程を必要と
せず形成することができる。According to a seventh aspect of the present invention, in the step of forming a thin film having an antifouling property, the step of forming a thin film having an antifouling property has a CF 3 group or a CH 3 group at one end on the surface of a hydrophilic lower layer film. The method for producing a highly reflective antifouling plate according to any one of claims 2 to 6, wherein a silane-based surfactant having a silanol group, a chlorosilyl group, or an alkoxysilyl group is adsorbed to the end. Accordingly, a thin film having an antifouling property, which is in close contact with the surface of the lower film by chemical bonding, can be formed without the need for a firing step.
【００１４】[0014]
【実施例】以下、本発明の一実施例について、図面を参
照しながら説明する。図１において、本発明の高反射防
汚性板の製造方法は、反射特性を示す基材表面に前処理
を行う前処理工程１と、基材表面に親水性を示す下層膜
を形成する下層膜形成工程２と、さらにその下層膜表面
上に防汚性を有する薄膜を形成する工程３からなる。An embodiment of the present invention will be described below with reference to the drawings. In FIG. 1, the method for producing a highly reflective antifouling plate of the present invention includes a pretreatment step 1 of performing a pretreatment on the surface of a base material exhibiting reflection characteristics, and an underlayer forming a hydrophilic underlayer film on the surface of the base material. It comprises a film forming step 2 and a step 3 of forming a thin film having antifouling properties on the surface of the lower film.
【００１５】例えば、前処理工程１において脱脂及び洗
浄は、より効果的に基材表面に下層膜形成試薬塗布を行
うための工程である。エンボス加工またはディンプル加
工は意匠性の向上と表面の凹凸化による反射率向上を可
能とする。着色方法としては、熱処理によるテンパーカ
ラー着色、化成処理、蒸着等がある。For example, degreasing and washing in the pretreatment step 1 are steps for more effectively applying the underlayer film forming reagent on the substrate surface. The embossing or the dimple processing enables the improvement of the design and the improvement of the reflectance by making the surface uneven. Coloring methods include temper color coloring by heat treatment, chemical conversion treatment, and vapor deposition.
【００１６】下層膜形成工程２は、金属アルコキシド、
金属アルコキシドの部分加水分解物、ポリシラザン、シ
ラノールのうち少なくとも１種と、アルコール、ケト
ン、エステル、水、酸のうち少なくとも１種とを含む溶
液を基材に塗布する工程２−１と、その後の乾燥、焼成
等の熱処理２−２と、更にその後の酸処理、アルカリ処
理、熱処理等下層膜表面を親水性化する工程２−３とを
有する。In the lower film forming step 2, a metal alkoxide,
Step 2-1 of applying a solution containing at least one of a metal alkoxide partial hydrolyzate, polysilazane, and silanol and at least one of alcohol, ketone, ester, water, and acid to a substrate, The method includes a heat treatment 2-2 such as drying and baking, and a subsequent step 2-3 for making the surface of the lower layer film hydrophilic such as an acid treatment, an alkali treatment, and a heat treatment.
【００１７】塗布方法としては、薄膜塗布可能なスプレ
イ法、スピン法、ディップ法、ロールコータ法等があげ
られる。Examples of the coating method include a spray method, a spin method, a dipping method, and a roll coater method that can apply a thin film.
【００１８】親水性を示す下層膜表面とは、以下のよう
な活性水素を含む官能基を有することを示す。例えば、
ＣＯＯＨ基、ＯＨ基、ＮＨ2基、ＳＯ3Ｈ基、ＳＨ基等が
あげられる。本発明は、酸処理、アルカリ処理、熱処理
等によりこれらの官能基を有する下層膜表面を得られる
ものすべてを含む。The surface of the lower layer film exhibiting hydrophilicity has the following functional group containing active hydrogen. For example,
COOH group, OH group, NH 2 group, SO 3 H group, SH group and the like can be mentioned. The present invention includes all those which can obtain the surface of the underlayer film having these functional groups by an acid treatment, an alkali treatment, a heat treatment or the like.
【００１９】上記のようにして得られた親水性を示す下
層膜表面に、防汚性を有する薄膜を形成する工程３は、
塗布工程３−１と、乾燥工程３−２とを有する。Step 3 of forming a thin film having antifouling properties on the surface of the hydrophilic lower layer film obtained as described above comprises:
It has a coating step 3-1 and a drying step 3-2.
【００２０】一端にはＣＦ3基またはＣＨ3基を有し、他
端にはシラノール基、クロロシリル基またはアルコキシ
シリル基を有するシラン系界面活性剤を塗布する方法と
して浸漬法、スプレイ法、スピン法、ディップ法、ロー
ルコータ法等があげられる。As a method of applying a silane-based surfactant having a CF 3 group or a CH 3 group at one end and a silanol group, a chlorosilyl group or an alkoxysilyl group at the other end, a dipping method, a spray method, a spin method, etc. , Dip method, roll coater method and the like.
【００２１】親水性を示す基材表面の活性水素との反応
に寄与できなかった過剰なシラン系界面活性剤が表面に
残存し、白色物質となり外観を損なう場合があるが、反
応が終了後、洗浄、ブローによる除去、また拭き取り等
の処理を行うことで効果的に除去可能である。Excess silane-based surfactant which has not been able to contribute to the reaction with active hydrogen on the surface of the substrate exhibiting hydrophilicity remains on the surface and becomes a white substance, which may impair the appearance. It can be effectively removed by performing processes such as cleaning, removal by blowing, and wiping.
【００２２】次に実際に本発明により作成した高反射防
汚性板を実施例１〜１４に示し詳細に説明するが、本発
明はこれらに限定されるものではない。Next, the highly reflective antifouling plate actually produced according to the present invention is shown in Examples 1 to 14 and will be described in detail, but the present invention is not limited to these.
【００２３】基材は、フェライト系ステンレスのＳＵＳ
４３０のＢＡ仕上げを用い、防汚性を有する膜は、パー
フルオロオクチルエチルトリクロロシランをオクタメチ
ルシクロテトラシロキサンに１％（重量％）溶かした溶
液を用い、浸漬法により塗布後、室温放置して乾燥し
た。The base material is SUS made of ferritic stainless steel.
Using a BA finish of 430, an antifouling film is formed by applying a solution of perfluorooctylethyltrichlorosilane in octamethylcyclotetrasiloxane in a concentration of 1% (% by weight). Dried.
【００２４】（実施例１）東京応化工業（株）のOCD製
品P-80315-SGをディップ法により引き上げ速度2mm／sec
で塗布後、150℃で5分程度乾燥し、各温度（200、300、
450、600℃）で30分程度焼成する。(Example 1) OCD product P-80315-SG manufactured by Tokyo Ohka Kogyo Co., Ltd. was pulled up by a dipping method at a pulling speed of 2 mm / sec.
After drying at 150 ° C, dry for about 5 minutes at each temperature (200, 300,
(450, 600 ° C) for about 30 minutes.
【００２５】（実施例２）東京応化工業（株）のOCD製
品12000-Tをディップ法により引き上げ速度2mm／secで
塗布後、150℃で5分程度乾燥し、各温度（300、450、60
0℃）で30分程度焼成する。Example 2 An OCD product 12000-T of Tokyo Ohka Kogyo Co., Ltd. was applied by a dipping method at a pulling rate of 2 mm / sec, dried at 150 ° C. for about 5 minutes, and dried at each temperature (300, 450, 60).
(0 ° C) for about 30 minutes.
【００２６】（実施例３）三菱化学（株）のＭＳ５１Ｓ
Ｇ１をディップ法により引き上げ速度2mm／secで塗布
後、300℃で30分程度焼成し、さらに塩酸処理すること
により、薄膜表面のメトキシ基を水酸基へ変換する。(Example 3) MS51S of Mitsubishi Chemical Corporation
G1 is applied by a dipping method at a lifting speed of 2 mm / sec, baked at 300 ° C. for about 30 minutes, and further treated with hydrochloric acid to convert methoxy groups on the surface of the thin film into hydroxyl groups.
【００２７】（実施例４）コルコート（株）の帯電防止
塗料コルコートＮ−１０３Ｘディッピング法により引き
上げ速度2mm／sec、4mm／sec（実施例１１）で塗布後、
150℃で5分程度乾燥した後、各温度（300、400、450
℃）で30分程度焼成する。(Embodiment 4) An antistatic paint manufactured by Colcoat Co., Ltd. Coating with a colcoat N-103X dipping method at a lifting speed of 2 mm / sec, 4 mm / sec (Example 11)
After drying at 150 ℃ for about 5 minutes, each temperature (300, 400, 450
B) for about 30 minutes.
【００２８】（実施例５）東燃（株）のポリシラザンコ
ーティング液Ｎ−Ｎ１１０をディップ法により引き上げ
速度2mm／secで塗布後、150℃で5分程度乾燥し、得られ
るポリシラザン薄膜を、300℃で焼成する。Example 5 A polysilazane coating solution N-N110 from Tonen Co., Ltd. was applied by a dipping method at a pulling rate of 2 mm / sec, dried at 150 ° C. for about 5 minutes, and the obtained polysilazane thin film was dried at 300 ° C. Bake.
【００２９】（実施例６）東燃（株）のポリシラザンコ
ーティング液Ｎ−Ｎ５１０をディップ法により引き上げ
速度2mm／secで塗布後、150℃で5分程度乾燥し、得られ
るポリシラザン薄膜を、450℃で焼成する。(Example 6) A polysilazane coating solution N-N510 from Tonen Co., Ltd. was applied by a dipping method at a pulling rate of 2 mm / sec, dried at 150 ° C for about 5 minutes, and the obtained polysilazane thin film was dried at 450 ° C. Bake.
【００３０】上記各実施例によって得られた各サンプル
１〜１４の性能を（表１）に示す。Table 1 shows the performance of each of the samples 1 to 14 obtained by the above examples.
【００３１】[0031]
【表１】 [Table 1]
【００３２】反射率は次式（（１−防汚膜の輻射率）／
（１−基材の輻射率（０．１３）））×１００により、
輻射率から換算し求めた。輻射率はDEVICE&SERVICE COM
PANY社製の簡易型輻射率計を用いて3〜30μmの波長範囲
で測定した。防汚性は、サラダ油を表面に塗布し、250
℃で30分焼き付けた後、水を含ませた綿布を用いて拭き
取りが可能であるかどうかで判断した。完全に拭き取れ
た場合を○、若干残った場合を△、ほとんど拭き取れな
かった場合を×とした。耐熱性は、300℃、100時間の熱
履歴を加えた後の水に対する接触角を測定し、90°以上
保っていた場合を○、80°〜90°の場合を△、80°以下
を×とした。The reflectance is given by the following equation ((1−emissivity of antifouling film) /
(1−emissivity of substrate (0.13))) × 100,
It was calculated from the emissivity. Emissivity is DEVICE & SERVICE COM
The measurement was performed in a wavelength range of 3 to 30 μm using a simple emissivity meter manufactured by PANY. Antifouling, apply salad oil on the surface, 250
After baking at 30 ° C. for 30 minutes, it was determined whether or not wiping was possible using a cotton cloth moistened with water.場合 indicates that the sample was completely wiped off, Δ indicates that the sample was slightly removed, and x indicates that the sample was hardly wiped. Heat resistance is measured at 300 ° C, the contact angle to water after adding a heat history of 100 hours. And
【００３３】焼成温度が200℃である実施例１におい
て、防汚性及び耐熱性ともに悪いのは、緻密な膜が形成
できていないためである。反射率も２、３、４に比較し
て悪く、熱線を遮断（吸収）する有機分が完全には除去
されていないことが示唆される。また、焼成温度が600
℃である実施例４は、表面がかなりポーラスになり、防
汚性及び耐熱性が悪くなった。よって焼成温度として
は、300〜450℃程度が適していることが解る。In Example 1 in which the sintering temperature was 200 ° C., both the antifouling property and the heat resistance were poor because a dense film could not be formed. The reflectance is also poor as compared with 2, 3, and 4, suggesting that the organic component that blocks (absorbs) heat rays has not been completely removed. The firing temperature is 600
In Example 4 where the temperature was ° C, the surface became considerably porous, and the antifouling property and heat resistance deteriorated. Therefore, it is understood that a firing temperature of about 300 to 450 ° C. is suitable.
【００３４】[0034]
【発明の効果】以上から明らかなように、請求項１記載
の発明によれば、反射特性に優れ、かつ防汚性を兼ね備
えた高反射防汚性板の製造方法を提供することができ
る。As is apparent from the above, according to the first aspect of the present invention, it is possible to provide a method for manufacturing a highly reflective antifouling plate having excellent reflection characteristics and having antifouling properties.
【００３５】請求項２記載の発明によれば、アンカー効
果により密着している従来フッ素ポリマーの塗膜に比
べ、耐久性に優れた塗膜を形成することができる。ま
た、金属表面等親水性が低く活性水素を有する官能基の
少ない基材表面上にも、防汚性を有する緻密な薄膜を形
成することができる。According to the second aspect of the present invention, a coating film having excellent durability can be formed as compared with a conventional fluoropolymer coating film adhered by the anchor effect. Also, a dense thin film having antifouling properties can be formed on a substrate surface such as a metal surface having a low hydrophilicity and a small number of functional groups having active hydrogen.
【００３６】本発明の請求項３記載の発明によれば、反
射特性及び防汚性と、意匠性の向上という視覚的な効果
も併せてもつことができる。オーブン電子レンジ庫内の
従来フッ素コート鋼板に代替した場合、庫内が明るくな
る等の効果が期待できる。また、エンボス加工により、
反射率を向上することもできる。According to the invention of claim 3 of the present invention, it is possible to have the visual effect of improving the reflection characteristic and the antifouling property and the design property. When a conventional fluorine-coated steel plate in an oven microwave oven is replaced, effects such as brightening of the oven can be expected. Also, by embossing,
The reflectivity can also be improved.
【００３７】本発明の請求項４記載の発明によれば、酸
化による基材の変色劣化を防ぐことも可能となり、初期
の反射特性を保持することができる。According to the invention of claim 4 of the present invention, it is possible to prevent discoloration and deterioration of the substrate due to oxidation, and it is possible to maintain the initial reflection characteristics.
【００３８】本発明の請求項５記載の発明によれば、効
果的に親水性を示す下層膜表面（活性水素を含む官能基
を有する下層膜表面）を実現できる。According to the invention of claim 5 of the present invention, it is possible to effectively realize the surface of the lower layer film having hydrophilicity (the surface of the lower layer film having a functional group containing active hydrogen).
【００３９】本発明の請求項６記載の発明によれば、下
層膜表面を水酸基化することができる。更に、下層膜の
緻密化、熱線を遮断し反射率を低下させる有機分の分解
除去、およびその結果として反射率を向上することがで
きる。According to the sixth aspect of the present invention, the surface of the lower film can be hydroxylated. Further, it is possible to densify the lower layer film, decompose and remove organic components that block heat rays and reduce reflectance, and as a result, improve reflectance.
【００４０】本発明の請求項７記載の発明によれば、下
層膜表面と化学結合により密着した防汚性を有する薄膜
を焼成過程を必要とせず形成することができる。なる。According to the seventh aspect of the present invention, it is possible to form a thin film having an antifouling property which is in close contact with the surface of the lower layer film by chemical bonding without requiring a firing step. Become.
【図１】本発明の実施例を示す高反射防汚板の製造方法
を示すフローチャートFIG. 1 is a flowchart showing a method for manufacturing a highly reflective antifouling plate according to an embodiment of the present invention.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｂ３２Ｂ 9/04 Ｂ３２Ｂ 9/04 17/06 17/06 Ｃ０９Ｄ 5/16 Ｃ０９Ｄ 5/16 183/04 183/04 Ｇ０２Ｂ 1/10 Ａ４７Ｊ 36/02 Ｂ // Ａ４７Ｊ 36/02 Ｇ０２Ｂ 1/10 Ｚ (72)発明者 ▲徳▼▲満▼ 修三 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 Ｆターム(参考） 2K009 BB06 CC02 CC42 DD02 EE05 4B055 AA01 BA13 BA14 BA52 BA56 CA01 CA13 CB16 FA04 FA16 FB01 FB32 FB34 FB36 FC12 FD03 FE01 4D075 AA01 AB01 AC23 BB06X BB21X BB21Y BB24Y BB24Z BB28Y BB65X BB77X BB77Y CA34 CA37 CB04 DC18 4F100 AB04 AH02B AH03B AH06B AH06C AH08B AK52C AR00A AR00C BA03 BA07 BA10A BA10C CC00B EH461 EH462 EJ011 EJ391 EJ421 GB48 HB00A HB21A JB05B JK06C JL00 JL06C JL10A JM02C JN06A JN28 4J038 DL171 DM021 GA12 GA15 JA23 KA06 KA09 NA05 NA06 PA07 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) B32B 9/04 B32B 9/04 17/06 17/06 C09D 5/16 C09D 5/16 183/04 183 / 04 G02B 1/10 A47J 36/02 B // A47J 36/02 G02B 1/10 Z (72) Inventor ▲ Toku ▼ ▲ Men ▼ Shuzo 1006 Kazuma Kazuma, Kadoma-shi, Osaka Matsushita Electric Industrial Co., Ltd. F-term ( Reference) 2K009 BB06 CC02 CC42 DD02 EE05 4B055 AA01 BA13 BA14 BA52 BA56 CA01 CA13 CB16 FA04 FA16 FB01 FB32 FB34 FB36 FC12 FD03 FE01 4D075 AA01 AB01 AC23 BB06X BB21X BB21Y BB24A BB24BBBYB24YBB24BBBYB24A AK52C AR00A AR00C BA03 BA07 BA10A BA10C CC00B EH461 EH462 EJ011 EJ391 EJ421 GB48 HB00A HB21A JB05B JK06C JL00 JL06C JL10A JM02C JN06A JN28 4J038 DL171 DM021 GA12 GA 15 JA23 KA06 KA09 NA05 NA06 PA07
Claims (7)
する工程と、さらにその上に防汚性を有する薄膜を形成
する工程からなることを特徴とする高反射防汚性板の製
造方法。1. A method for producing a highly reflective antifouling plate, comprising: a step of forming a lower layer film on a surface of a base material exhibiting reflective properties; and a step of forming a thin film having antifouling properties thereon. Method.
す下層膜を形成する工程と、前記下層膜表面上に化学結
合により密着した防汚性を有する薄膜を形成する工程と
を有することを特徴とする高反射防汚性板の製造方法。2. A method comprising the steps of: forming a hydrophilic lower layer film on the surface of a substrate exhibiting reflection characteristics; and forming a thin film having an antifouling property adhered to the surface of the lower film film by chemical bonding. A method for producing a highly reflective antifouling plate, comprising:
はエンボス加工をすることにより意匠性を付与すること
を特徴とする請求項１または２に記載の高反射防汚性体
の製造方法。3. The method for producing a highly reflective antifouling body according to claim 1, wherein a design property is imparted by coloring or embossing the surface of the substrate exhibiting reflection characteristics.
金属アルコキシド、金属アルコキシドの部分加水分解
物、ポリシラザン、シラノールのうち少なくとも１種
と、アルコール、ケトン、エステル、水、酸のうち少な
くとも１種とを含む溶液を塗布する工程と、形成した下
層膜表面を親水化する工程とを有することを特徴とする
請求項１〜３のいずれか１項に記載の高反射防汚性板の
製造方法。4. The step of forming a hydrophilic lower layer film comprises:
A step of applying a solution containing at least one of a metal alkoxide, a partial hydrolyzate of a metal alkoxide, polysilazane, and silanol, and at least one of an alcohol, a ketone, an ester, water, and an acid; The method for producing a highly reflective antifouling plate according to any one of claims 1 to 3, further comprising a step of hydrophilizing the plate.
理、アルカリ処理、熱処理のいずれかであることを特徴
とする請求項１〜４のいずれか１項に記載の高反射防汚
性板の製造方法。5. The high reflection antifouling property according to claim 1, wherein the step of hydrophilizing the surface of the underlayer film is any one of an acid treatment, an alkali treatment and a heat treatment. Plate manufacturing method.
処理温度が３００℃〜４５０℃であることを特徴とする
請求項１〜５のいずれか１項に記載の高反射防汚性板の
製造方法。6. The highly reflective antifouling plate according to claim 1, wherein the treatment temperature in the heat treatment step for hydrophilizing the surface of the lower layer film is 300 ° C. to 450 ° C. Manufacturing method.
親水性を示す下層膜表面に、一端にはＣＦ3基またはＣ
Ｈ3基を有し、他端にはシラノール基、クロロシリル基
またはアルコキシシリル基を有するシラン系界面活性剤
を吸着することを特徴とする請求項２〜６のいずれか１
項に記載の高反射防汚性板の製造方法。7. The step of forming a thin film having antifouling properties comprises:
On the surface of the hydrophilic lower layer film, a CF 3 group or C
Has of H 3 group, a silanol group at the other end, one of the claims 2-6, characterized in that the adsorption of a silane-based surface active agent having a chlorosilyl group or an alkoxysilyl group 1
Item 14. The method for producing a highly reflective antifouling plate according to item 8.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11047619A JP2000239610A (en) | 1999-02-25 | 1999-02-25 | Production of reflecting stainproof board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11047619A JP2000239610A (en) | 1999-02-25 | 1999-02-25 | Production of reflecting stainproof board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000239610A true JP2000239610A (en) | 2000-09-05 |
Family
ID=12780243
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11047619A Withdrawn JP2000239610A (en) | 1999-02-25 | 1999-02-25 | Production of reflecting stainproof board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000239610A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002282770A (en) * | 2001-03-26 | 2002-10-02 | Soft 99 Corp | Tool and method for forming antifouling coating film |
| JP2006524277A (en) * | 2003-04-22 | 2006-10-26 | クラリアント・プロドゥクテ・（ドイチュラント）・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング | Method of using polysilazane to form hydrophobic and oleophobic modified surfaces |
-
1999
- 1999-02-25 JP JP11047619A patent/JP2000239610A/en not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002282770A (en) * | 2001-03-26 | 2002-10-02 | Soft 99 Corp | Tool and method for forming antifouling coating film |
| JP2006524277A (en) * | 2003-04-22 | 2006-10-26 | クラリアント・プロドゥクテ・（ドイチュラント）・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング | Method of using polysilazane to form hydrophobic and oleophobic modified surfaces |
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