JP2000228032A - Optical information medium - Google Patents

Optical information medium

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Publication number
JP2000228032A
JP2000228032A JP11030045A JP3004599A JP2000228032A JP 2000228032 A JP2000228032 A JP 2000228032A JP 11030045 A JP11030045 A JP 11030045A JP 3004599 A JP3004599 A JP 3004599A JP 2000228032 A JP2000228032 A JP 2000228032A
Authority
JP
Japan
Prior art keywords
layer
film
optical information
information medium
medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11030045A
Other languages
Japanese (ja)
Inventor
Takashi Tomie
崇 冨江
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP11030045A priority Critical patent/JP2000228032A/en
Publication of JP2000228032A publication Critical patent/JP2000228032A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To obtain an optical information recording medium having high performance and excellent in aging stability by forming a metallic reflecting layer with an Ag alloy obtained by incorporating a specified amount of Cu into Ag and then disposing a sulfur-free organic or inorganic protective layer or an adhesive layer on the metallic reflecting layer. SOLUTION: The optical information medium, which is not a magneto-optical recording medium, has a metallic reflecting layer comprising an Ag alloy obtained by incorporating 0.5-30 at.% Cu into Ag and has an organic or inorganic protective layer not substantially containing elemental sulfur or an adhesive layer on the metallic reflecting layer. When the reflecting layer comprises an Ag alloy obtained by incorporating 0.5-30 at.% Cu and 0.5-12 at.% at least one of Ta and Ti into Ag, considerably enhanced recording sensitivity and corrosion resistance are ensured. The metallic reflecting layer is preferably applied to a phase change type optical recording medium.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はレーザー等の光によ
り、情報の再生、記録、消去等を行なう、金属反射層を
有する光情報媒体に関する。特にディスク状媒体に関
し、更に詳細には、集光レーザー光の照射によって生じ
た物質の非晶質状態と結晶状態の間の可逆的な構造変化
(相変化)を、情報の記録・消去に利用する相変化型光
記録媒体に関する。更に、近年、研究開発が進んでいる
膜面入射タイプの光情報媒体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical information medium having a metal reflective layer for reproducing, recording, and erasing information with light from a laser or the like. In particular, regarding a disk-shaped medium, more specifically, a reversible structural change (phase change) between an amorphous state and a crystalline state of a substance caused by irradiation of a focused laser beam is used for recording and erasing information. And a phase change type optical recording medium. Furthermore, the present invention relates to a film-surface incident type optical information medium, which has been researched and developed in recent years.

【0002】[0002]

【従来の技術】種々の光情報媒体(光ディスク)が実用
されている。再生専用タイプとしてはCD(コンパクト
ディスク)とCD−ROMディスクが有名であり、一度
のみ書き込めるタイプとしてはCD−Rディスクがあ
り、記録・消去可能タイプとしては光磁気記録ディスク
と相変化記録ディスクがある。相変化ディスクとしては
CD−RWディスクとPDディスクとDVD−RAMデ
ィスクが市販されている。特に、近年は相変化型光記録
媒体がDVD−RWなどの大容量書き換えタイプとして
注目され、また、将来のビデオテープに代わる大容量の
動画記録媒体として最も重要な媒体となっている。
2. Description of the Related Art Various optical information media (optical disks) have been put to practical use. CD (compact disc) and CD-ROM discs are well-known as read-only types, CD-R discs can be written only once, and magneto-optical discs and phase-change recording discs are recordable / erasable types. is there. As phase change disks, CD-RW disks, PD disks, and DVD-RAM disks are commercially available. In particular, in recent years, phase-change optical recording media have attracted attention as large-capacity rewritable media such as DVD-RWs, and have become the most important media as large-capacity moving-image recording media in place of future video tapes.

【0003】相変化型光記録媒体は、光照射(レーザー
光照射)による昇温・冷却の熱履歴の違いにより誘起さ
れる記録層の非晶質状態と結晶状態の間の可逆的な構造
変化(相変化)を、情報の記録・消去に利用している。
すなわち、記録層を加熱溶融し急冷することにより非晶
化させ記録を行い、また、結晶化温度以上に一定時間保
持することにより結晶化させ消去を行う。記録層(代表
的なGeSbTe膜)の温度は、記録の時は約600℃
に、消去の時は約170℃になる、と推定されている。
信号の再生は非晶質状態と結晶状態の間の反射率差を利
用して行われる。こうした相変化型光記録媒体は、情報
の高速処理能力に加えて記録容量が大きい。また、ドラ
イブ(光ヘッドなど)の構造が光磁気記録ドライブより
簡単なことより、廉価にできるメリットもある。かかる
相変化型光記録媒体では、通常は、記録膜の結晶状態を
情報の消去状態とし、高レーザパワーによる膜の溶融、
急冷により生成する非晶質状態(非晶質マーク)を記録
状態とする。
A phase-change optical recording medium has a reversible structural change between an amorphous state and a crystalline state of a recording layer induced by a difference in heat history of heating and cooling by light irradiation (laser light irradiation). (Phase change) is used for recording / erasing information.
That is, the recording layer is heated and melted and rapidly cooled to make the recording layer amorphous, thereby performing the recording. Further, the recording layer is kept at a temperature higher than the crystallization temperature for a certain time to be crystallized and erased. The temperature of the recording layer (typical GeSbTe film) is about 600 ° C. during recording.
It is estimated that the temperature will be about 170 ° C. at the time of erasing.
Reproduction of a signal is performed using a difference in reflectance between an amorphous state and a crystalline state. Such a phase-change optical recording medium has a large recording capacity in addition to a high-speed information processing capability. In addition, since the structure of the drive (such as an optical head) is simpler than that of a magneto-optical recording drive, there is an advantage that the cost can be reduced. In such a phase-change optical recording medium, usually, the crystal state of the recording film is set to an erasing state of information, and the film is melted by high laser power.
An amorphous state (amorphous mark) generated by rapid cooling is defined as a recording state.

【0004】(社)電子情報通信学会 技術研究報告
[電子部品・材料]CPM90−35、pp43−48
『ZnS−SiO2誘電体を用いた急冷構造相変化光情
報媒体』(1990年7月27日)には、現在に実用さ
れている代表的な相変化ディスクの構造が示されてい
る。その構造は、ポリカーボネート基板(通常は0.6
mmか1.2mmの厚さ)/下部誘電体層(ZnS・S
iO2膜)/記録層(GeSbTe膜)/上部誘電体層
(ZnS・SiO2膜)/反射層(Al合金)/接着
層、である。
Technical report of the Institute of Electronics, Information and Communication Engineers [Electronic parts and materials] CPM90-35, pp43-48
The "rapid cooling structure phase change optical information medium using a ZnS-SiO 2 dielectric" (July 27, 1990) has the structure of a typical phase-change disk which is practically the current is shown. Its structure is a polycarbonate substrate (usually 0.6
mm or 1.2 mm thickness) / Lower dielectric layer (ZnS · S
iO 2 film) / recording layer (GeSbTe film) / the upper dielectric layer (ZnS · SiO 2 film) / reflective layer (Al alloy) / adhesive layer is.

【0005】また、これらの現在の市販の通常媒体に対
して、研究が開始された膜面入射タイプ媒体では基板か
らの薄膜の積層順序を逆にするのが通常の考えである。
すなわち、基板/反射膜/下部誘電体/記録膜/上部誘
電体の構成で研究されている。用いられる光ヘッド(ピ
ックアップ)は、媒体面に対物レンズを近接させる必要
により、ハードディスクと同様の構造が提案されてい
る。すなわち、スライダーに対物レンズを搭載した浮上
ヘッドの利用が検討されている。
[0005] It is a common idea to reverse the stacking order of thin films from a substrate in a film-incidence type medium, which has been studied, with respect to these current commercially available normal media.
That is, research has been conducted on the configuration of a substrate / reflective film / lower dielectric / recording film / upper dielectric. As an optical head (pickup) to be used, a structure similar to a hard disk has been proposed because an objective lens needs to be brought close to a medium surface. That is, utilization of a flying head having an objective lens mounted on a slider is being studied.

【0006】前記の文献に見られる如く、相変化型光記
録媒体の記録層はGeSbTeやAgInSbTeなど
のカルコゲン合金が使用されている。誘電体膜にはZn
S・SiO2などのZnS系の膜が使用される。反射層
はAl合金膜、Au膜、Ag膜などが実用されている。
Al合金では、数%のTiやCrを含有したAlTi
膜、AlCr膜が多用されている。有機色素を記録層と
する媒体(CD−Rディスクなど)ではAu膜やAg膜
が反射層として使用されている。再生専用のCD(コン
パクトディスク)ではAl膜が一般に用いられている。
As can be seen from the above-mentioned literature, a chalcogen alloy such as GeSbTe or AgInSbTe is used for a recording layer of a phase change type optical recording medium. Zn for the dielectric film
A ZnS-based film such as S.SiO 2 is used. As the reflective layer, an Al alloy film, an Au film, an Ag film, or the like has been practically used.
For Al alloys, AlTi containing several percent of Ti or Cr
Films and AlCr films are frequently used. In a medium (such as a CD-R disc) having an organic dye as a recording layer, an Au film or an Ag film is used as a reflective layer. In a read-only CD (compact disk), an Al film is generally used.

【0007】[0007]

【発明が解決しようとする課題】前記の実用されている
Al合金膜、Au膜、Ag膜は以下の課題を有する。A
l合金膜は該合金からなるターゲットを用いたスパッタ
法で製膜されるが、該合金ターゲットは融点が大きく異
なる2種類の金属の合金でつくらなければならないので
製造が容易でない、またAlのスパッタ収率が悪いこと
によりスパッタリングの膜堆積速度が遅い、また反射率
が(膜単体の反射率)が80〜85%と比較的低い、な
どの欠点がある。Ag膜は100%近い反射率を有する
が耐腐食性が良くない、という欠点を有する。Au膜は
安定であるが極めて高価である。すなわち、性能、価
格、生産スピード、などの全てを同時満足する反射層の
探索が継続されているのが現状である。
The above-mentioned practically used Al alloy film, Au film and Ag film have the following problems. A
The alloy film is formed by a sputtering method using a target made of the alloy. However, the alloy target must be made of an alloy of two kinds of metals having greatly different melting points. Due to the low yield, there are disadvantages such as a low film deposition rate of sputtering and a relatively low reflectance (reflectance of the film alone) of 80 to 85%. The Ag film has a reflectance of nearly 100%, but has a disadvantage that corrosion resistance is not good. Au films are stable but very expensive. That is, at present, the search for a reflective layer that simultaneously satisfies all of performance, price, production speed, and the like is continued.

【0008】本発明者らは以前にAgCuTi合金、A
gCuTa合金の反射層を提案した。その際の合金膜は
光磁気記録媒体に適用して一定の成果を上げたが光磁気
記録媒体以外への適用では課題ある場合があり、十分な
成果が得られていなかった。特に、相変化型光記録媒体
ではZnS・SiO2膜を誘電体層として使用すること
より、Ag系合金の反射層上に該誘電体膜をスパッタ製
膜するとAgが硫化して反射率が低下するという課題が
あった。
The present inventors have previously described AgCuTi alloy, A
A reflective layer of gCuTa alloy was proposed. At that time, the alloy film was applied to a magneto-optical recording medium and achieved a certain result. However, there were cases where there was a problem in applying the alloy film to a medium other than the magneto-optical recording medium, and a satisfactory result was not obtained. In particular, in a phase-change optical recording medium, a ZnS.SiO 2 film is used as a dielectric layer. When the dielectric film is formed on the reflective layer of an Ag-based alloy by sputtering, Ag is sulfurized and the reflectance is reduced. There was a problem to do.

【0009】本発明はかかる現状に鑑みなされたもの
で、反射率が高く、耐食性に優れ、生産性の良い反射層
と、その上の保護層を特定することで、高性能で廉価な
光情報媒体、特に相変化型光記録媒体を提供することを
目的としたものである。
The present invention has been made in view of the above-mentioned circumstances. By specifying a reflective layer having high reflectivity, excellent corrosion resistance and good productivity, and a protective layer thereon, a high-performance and inexpensive optical information can be obtained. It is an object of the present invention to provide a medium, particularly a phase change type optical recording medium.

【0010】[0010]

【課題を解決するための手段】本発明者らは、前記の如
く性能、価格、生産スピード、などの全てを同時満足す
る金属反射層の改良を鋭意検討した結果、AgCu合金
で金属反射層を形成し、かつ該金属反射層上にS(イオ
ウ)を含まない有機、若しくは無機の保護層または接着
層を設けることにより高性能で廉価で生産性に優れ、更
に経時安定性に優れた光情報媒体が得られることを見出
した。
Means for Solving the Problems As described above, the present inventors have intensively studied the improvement of the metal reflection layer which simultaneously satisfies all of the performance, price, production speed, and the like, and as a result, the metal reflection layer was made of AgCu alloy. By forming an organic or inorganic protective layer or an adhesive layer containing no S (sulfur) on the metal reflective layer, the optical information has high performance, is inexpensive, has excellent productivity, and has excellent stability over time. It has been found that a medium can be obtained.

【0011】すなわち、本発明は、金属反射層を有する
光磁気記録媒体を除く光情報媒体において、該金属反射
層がAg(銀)にCu(銅)を0.5〜30原子%含有
せしめたAg合金からなり、かつ該金属反射層上にS元
素を実質的に含有しない有機、若しくは無機の保護層ま
たは接着層を形成したことを特徴とする光情報媒体であ
る。更に、本発明はAgにCuを0.5〜30原子%含
有せしめ、さらにTa(タンタル)またはTi(チタ
ン)の少くとも一種を0.5〜12原子%含有せしめた
Ag合金を反射層とする光情報媒体である。また、本発
明の金属反射層は相変化型光記録媒体に好ましく適用さ
れる。
That is, according to the present invention, in an optical information medium other than a magneto-optical recording medium having a metal reflection layer, the metal reflection layer contains Ag (silver) containing 0.5 to 30 atomic% of Cu (copper). An optical information medium comprising an Ag alloy and having an organic or inorganic protective layer or an adhesive layer substantially free of S element formed on the metal reflective layer. Further, the present invention provides a reflective layer comprising an Ag alloy containing 0.5 to 30 atomic% of Cu in Ag and further containing 0.5 to 12 atomic% of at least one of Ta (tantalum) and Ti (titanium). Optical information medium. Further, the metal reflection layer of the present invention is preferably applied to a phase change type optical recording medium.

【0012】[0012]

【発明の実施の形態】本発明者らは、再生信号ノイズ比
(C/N)向上目的に高反射率のAg膜に着目したが、
Agは耐食性のわるい材料であり、Ag膜のみでは実用
的でない。そこで、この改良として他金属の添加を検討
したところ、スライドガラス上に形成したCuを0.5
〜30原子%添加したAgCu合金膜は高反射率で、光
情報媒体の標準的な加速劣化テスト条件である80℃8
5%相対湿度雰囲気下で72時間以上放置しても反射率
が低下せず、耐久性もあることが判明した。なお、Cu
の含有量が0.5原子%より少くても、30原子%より
多くても24時間以内に反射率は初期値の9割以下に低
下した。AgCu合金膜は上述の通り高反射率(例えば
Ag85Cu15(添字は原子%組成)合金膜では780n
mの波長で98%の反射率)であり、耐久性も悪くない
ので再生専用の光情報媒体には好適なことが判明した。
しかし、このAgCu膜は熱伝導性が高く、そのためこ
れを反射膜とする相変化型光記録媒体では記録感度が低
下することがさらに判明した。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present inventors have focused on an Ag film having a high reflectance for the purpose of improving the reproduction signal noise ratio (C / N).
Ag is a material having poor corrosion resistance, and is not practical with only an Ag film. Therefore, when the addition of another metal was examined as an improvement, Cu formed on the slide glass was reduced by 0.5%.
The AgCu alloy film doped with 3030 atomic% has a high reflectivity, and 80 ° C.8 which is a standard accelerated deterioration test condition of an optical information medium.
It was found that the reflectance did not decrease even when left in an atmosphere of 5% relative humidity for 72 hours or more, and that the sample had durability. Note that Cu
Even if the content of is less than 0.5 atomic% or more than 30 atomic%, the reflectance dropped to 90% or less of the initial value within 24 hours. As described above, the AgCu alloy film has a high reflectance (for example, Ag 85 Cu 15 (subscript is an atomic% composition) alloy film of 780 n).
(reflectance of 98% at a wavelength of m), and the durability is not bad.
However, it has been further found that the AgCu film has a high thermal conductivity, so that the recording sensitivity is reduced in a phase-change optical recording medium using the AgCu film as a reflection film.

【0013】本発明者らは、さらにこの点の改良を第3
元素の添加に着目し、鋭意研究の結果、AgCu膜にT
aまたはTiの少なくとも一種を0.5〜12原子%添
加すると、記録感度と耐食性が大きく向上することを見
い出した。なお、Ta、Tiの含有量がこの範囲より少
いと記録感度の向上の効果はなく、また逆に多くなると
反射が低下し、C/Nが悪くなる。更に、相変化型光記
録媒体では、Ta、Tiの含有量は、感度向上効果が大
きく、且つC/N向上の効果が阻害されない点で1.5
〜10原子%がより好ましい。なお、経時安定性を更に
改善するために、Cr、Nb、Reなどの他の元素を少
量添加してもよい。
The present inventors have further improved this point in the third.
Focusing on the addition of elements, as a result of intensive research, the AgCu film
It has been found that when at least one of a and Ti is added in an amount of 0.5 to 12 atomic%, recording sensitivity and corrosion resistance are greatly improved. If the content of Ta or Ti is less than this range, there is no effect of improving the recording sensitivity, and if the content is too large, the reflection is reduced and the C / N is deteriorated. Further, in the phase-change optical recording medium, the contents of Ta and Ti are set to 1.5 because the effect of improving sensitivity is large and the effect of improving C / N is not impaired.
-10 at% is more preferred. In order to further improve the stability over time, other elements such as Cr, Nb, and Re may be added in small amounts.

【0014】この金属反射層の膜厚は3〜200nmが
好ましく用いられる。相変化型光記録媒体で、記録層が
結晶状態の時の光吸収率をアモルファス状態の時の光吸
収率より大きくする吸収率補正構成を媒体構成(記録膜
構成)とする時は15nm以下の反射層が用いられる。
The thickness of the metal reflective layer is preferably 3 to 200 nm. In a phase-change optical recording medium, when the medium configuration (recording film configuration) is used as the medium configuration (recording film configuration), the absorbance correction configuration that makes the light absorption rate when the recording layer is in a crystalline state larger than the light absorption rate when the recording layer is in an amorphous state A reflective layer is used.

【0015】本発明では、該Ag合金反射層上にS元素
を実質的に含有しない有機、若しくは無機の保護層また
は接着層を形成する必要がある。AgCu合金は前述の
ように80℃85%相対湿度雰囲気下のような酸化性雰
囲気下では十分な耐久性を示したが、S元素を含有する
雰囲気(H2Sガス雰囲気など)では容易に黒化した。
これを防止する目的で有機、若しくは無機の保護層また
は接着層を形成する必要がある。有機の保護層としては
紫外線硬化型のアクリル樹脂などが用いられる。
In the present invention, it is necessary to form an organic or inorganic protective layer or an adhesive layer substantially containing no S element on the Ag alloy reflecting layer. As described above, the AgCu alloy exhibited sufficient durability in an oxidizing atmosphere such as an atmosphere at 80 ° C. and 85% relative humidity, but easily blackened in an atmosphere containing an S element (H 2 S gas atmosphere, etc.). It has become.
In order to prevent this, it is necessary to form an organic or inorganic protective layer or an adhesive layer. As the organic protective layer, an ultraviolet curable acrylic resin or the like is used.

【0016】0.6mm厚さ基板の媒体を2枚貼り合わ
せて両面媒体とする時は、粘着シートやホットメルト接
着剤や紫外線硬化型の接着剤が用いられる。S元素を含
有しない無機薄膜の保護層としては、SiN、GeNな
どの窒化膜が好ましい。相変化型光記録媒体に多用され
ているZnS・SiO2膜は、該AgCu系の反射層上
に形成してはならないが、逆にZnS・SiO2膜上に
AgCu合金の反射層を形成することは可能である。
When two sheets of a medium having a thickness of 0.6 mm are bonded to each other to form a double-sided medium, an adhesive sheet, a hot melt adhesive, or an ultraviolet curable adhesive is used. As a protective layer of the inorganic thin film not containing the S element, a nitride film such as SiN or GeN is preferable. ZnS · SiO 2 film which are widely used in phase-change optical recording medium is not formed on the reflective layer of the AgCu system to form a reflective layer of AgCu alloy ZnS · SiO 2 film on the opposite It is possible.

【0017】前記金属反射層の形成方法としては、公知
の真空蒸着法、スパッタリング法、イオンビームスパッ
タリング法、CVD法などが考えられるが、下地層との
接着性、合金組成の制御性、組成分布などの点でスパッ
タリング法が好ましい。また膜の堆積速度、スパッタガ
ス圧などの製膜条件は、生産性、膜応力を考慮し、適宜
選択される。
As a method for forming the metal reflection layer, known vacuum evaporation, sputtering, ion beam sputtering, CVD, etc., can be considered. Adhesion with the underlayer, controllability of alloy composition, composition distribution, etc. For example, a sputtering method is preferable. Film forming conditions such as a film deposition rate and a sputtering gas pressure are appropriately selected in consideration of productivity and film stress.

【0018】本発明の光情報媒体が相変化型光記録媒体
である時の記録層はGeSbTeやAgInSbTeな
どのカルコゲン合金が使用される。特に、組成比が略
2:2:5のGe2Sb2Te5(Ge:Sb:Te=約
22.2:22.2:55.6原子%)薄膜は繰り返し
オーバライト性能が高く、また高速消去が可能なことよ
り、本発明でも好ましく使用される。
When the optical information medium of the present invention is a phase-change optical recording medium, the recording layer is made of a chalcogen alloy such as GeSbTe or AgInSbTe. In particular, a Ge 2 Sb 2 Te 5 (Ge: Sb: Te = about 22.2: 22.2: 55.6 at%) thin film having a composition ratio of about 2: 2: 5 has a high repetitive overwrite performance, and Since high-speed erasing is possible, it is preferably used in the present invention.

【0019】相変化型光記録媒体に用いられる誘電体層
としては、その目的により断熱効果や光干渉効果等の効
果を奏することが必要で、ある程度以上の硬度と高屈折
率を有することが好ましい。また使用するレーザー光に
透明であることが必要であり、透明誘電体層としては公
知の通り金属の酸化物、窒化物、硫化物、炭化物、弗化
物もしくはこれらの複合体が適用できる。具体的には酸
化ケイ素、酸化チタン、酸化インジウム、酸化タンタ
ル、酸化アルミニウム、チッ化ケイ素、チッ化ゲルマニ
ウム、チッ化タンタル、チッ化アルミニウム、チッ化チ
タン、硫化亜鉛、フッ化マグネシウム、フッ化アルミニ
ウム、炭化ケイ素およびこれらの複合物が挙げられる
が、これに限定されないことは言うまでもない。これら
透明誘電体層の膜厚は、媒体構成、屈折率により最適値
が変化し、一義的に決めることはできないが、通常10
nm〜150nm程度が好適に用いられる。これら透明
電体層は生産の連続性より金属反射層の膜作製方法と同
じ方法により形成される。
The dielectric layer used in the phase-change type optical recording medium is required to exhibit effects such as a heat insulating effect and an optical interference effect according to the purpose, and preferably has a certain degree of hardness and a high refractive index. . Further, it is necessary that the transparent dielectric layer is transparent to the laser beam to be used. As the transparent dielectric layer, metal oxides, nitrides, sulfides, carbides, fluorides or composites thereof can be applied as is well known. Specifically, silicon oxide, titanium oxide, indium oxide, tantalum oxide, aluminum oxide, silicon nitride, germanium nitride, tantalum nitride, aluminum nitride, titanium nitride, zinc sulfide, magnesium fluoride, aluminum fluoride, Needless to say, it includes, but is not limited to, silicon carbide and composites thereof. The optimum thickness of these transparent dielectric layers varies depending on the medium configuration and the refractive index, and cannot be determined uniquely.
A thickness of about nm to 150 nm is preferably used. These transparent electric layers are formed by the same method as that for forming the metal reflection layer due to the continuity of production.

【0020】基板としては、ガラス、アクリル樹脂、ポ
リカーボネート樹脂、エポキシ樹脂、ポリオレフィン樹
脂、およびそれらの変成品などが好適に用いられるが、
機械的強度、価格、耐候性、耐熱性、透湿性の点でポリ
カーボネート樹脂が好ましい。相変化型光記録媒体に用
いられる基板は、射出成形で作製される0.6mmから
2.0mm程度の厚さで直径60mmから120mm程
度のポリカーボネート製円板が好ましく使用される。
As the substrate, glass, acrylic resin, polycarbonate resin, epoxy resin, polyolefin resin, and their modified products are preferably used.
Polycarbonate resins are preferred in terms of mechanical strength, price, weather resistance, heat resistance, and moisture permeability. As the substrate used for the phase-change type optical recording medium, a polycarbonate disk having a thickness of about 0.6 mm to 2.0 mm and a diameter of about 60 mm to 120 mm produced by injection molding is preferably used.

【0021】以上に主に述べた相変化型光記録媒体の構
成は、基板/下部誘電体層/記録層/上部誘電体層/反
射層(AgCu合金)/有機、若しくは無機の保護層ま
たは接着層、という構造である。これに対して、膜面入
射タイプの相変化型光記録媒体は、プラスチック基板の
片面または両面に、基板面から順に、反射層/下部誘電
体層/記録層/上部誘電体層からなる基本構成を有し、
基板を通さずに薄膜積層体側から記録再生される。基板
と反射層の間に接着層や、基板が耐熱温度の低いプラス
チック基板では熱の悪影響を防止する為の断熱層があっ
ても良い。かかる膜面入射タイプの相変化型光記録媒体
は格段に優れた記録容量が期待されることから反射層に
も高反射率、熱伝導性、耐久性などの優れた特性が要求
されることより、本発明の金属反射層がより好ましく適
応される。この膜面入射タイプの相変化型光記録媒体で
はAgCu合金反射層上の保護層は、上記の下部誘電体
層が相当する層となる。ゆえに、該下部誘電体層はS元
素を、不純物レベル以上に(実質的に)含有してはいけ
ない。かかる下部誘電体層は前記のチッ化物が好まし
い。
The structure of the phase-change type optical recording medium mainly described above is as follows: substrate / lower dielectric layer / recording layer / upper dielectric layer / reflective layer (AgCu alloy) / organic or inorganic protective layer or adhesive It is a structure called a layer. On the other hand, a phase change type optical recording medium of the film surface incidence type has a basic structure of a reflective layer / lower dielectric layer / recording layer / upper dielectric layer on one or both surfaces of a plastic substrate in order from the substrate surface. Has,
Recording and reproduction are performed from the thin film laminate side without passing through the substrate. An adhesive layer may be provided between the substrate and the reflective layer, or a heat insulating layer for preventing the adverse effect of heat on a plastic substrate whose substrate has a low heat-resistant temperature. Such a film-surface incident type phase change optical recording medium is expected to have a remarkably excellent recording capacity, so that the reflective layer is also required to have excellent properties such as high reflectance, thermal conductivity, and durability. The metal reflection layer of the present invention is more preferably applied. In this film surface incident type phase change optical recording medium, the protective layer on the AgCu alloy reflective layer is a layer corresponding to the lower dielectric layer. Therefore, the lower dielectric layer must not (substantially) contain the S element above the impurity level. Such a lower dielectric layer is preferably the aforementioned nitride.

【0022】本発明のAgCu合金の金属反射層は、相
変化型光記録媒体のみでなく、金属反射層を有する全て
の光情報媒体(光磁気記録媒体を除く)で利用できる。
ポリカーボネート基板上にシアニン色素などの光吸収性
の有機色素を塗布し、該色素膜上に金属反射膜を形成
し、さらに該金属反射膜上に保護層を塗布して作製され
るCD−RディスクやDVD−Rディスクの金属反射層
にも適応可能である。さらに、CDなどの再生専用ディ
スクの反射層にも利用できる。AgCu合金は、Al合
金よりも材料は高価であるが、反射率が高いことから薄
くても同等の性能があり、また、使用済みの原料(ター
ゲット)を再生利用することで、媒体1枚当たりの材料
コストはAl合金膜より安くすることも可能である。
The metal reflective layer of the AgCu alloy of the present invention can be used not only in a phase-change optical recording medium but also in all optical information media having a metal reflective layer (excluding magneto-optical recording media).
A CD-R disc manufactured by applying a light-absorbing organic dye such as a cyanine dye on a polycarbonate substrate, forming a metal reflective film on the dye film, and further coating a protective layer on the metal reflective film. Also, the present invention can be applied to a metal reflection layer of a DVD-R disc. Further, it can be used as a reflection layer of a read-only disk such as a CD. The AgCu alloy is more expensive than the Al alloy, but has the same performance even if it is thin because of its high reflectivity. Can be made cheaper than the Al alloy film.

【0023】[0023]

【実施例1〜5、比較例1、2】1.2mm厚さ、12
0mm直径で、内径15mmのセンターホールを有する
ポリカーボネイト製の光ディスク用プラスチック基板の
片面に、基板面から順に、95nmのZnS・SiO2
下部誘電体層、20nmのGeSbTe記録層、16n
mのZnS・SiO2上部誘電体層、150nmのAg
CuTi反射層、紫外線硬化型有機樹脂保護層からなる
構成を有する相変化型光記録媒体(実施例1〜5)を作
製した。実施例1〜5は表1に記載のようにAgCuT
i反射膜のTi含有量を変えた媒体である。比較例1の
媒体は、同構成であるが反射層のみAg膜とした媒体、
比較例2の媒体は、同構成であるが反射層のみAlTi
膜とした媒体である。基板には、射出成形により、連続
サーボ用の螺旋溝(グルーブ)が半径24mm〜58m
mの範囲に形成されている。溝深さは80nmであり、
トラックピッチは1.20μmで、グルーブ幅とランド
幅は共に約0.60μm幅である。
Examples 1 to 5, Comparative Examples 1 and 2 1.2 mm thick, 12
On one surface of a polycarbonate optical disc plastic substrate having a center hole with a diameter of 0 mm and an inner diameter of 15 mm, 95 nm ZnS.SiO 2
Lower dielectric layer, 20 nm GeSbTe recording layer, 16 n
m ZnS.SiO 2 upper dielectric layer, 150 nm Ag
Phase-change optical recording media (Examples 1 to 5) having a configuration including a CuTi reflection layer and an ultraviolet-curable organic resin protective layer were produced. Examples 1 to 5 used AgCuT as described in Table 1.
This is a medium in which the Ti content of the i-reflection film is changed. The medium of Comparative Example 1 has the same configuration, except that only the reflective layer is an Ag film.
The medium of Comparative Example 2 had the same configuration but only the reflective layer was made of AlTi.
It is a medium that is a film. A spiral groove (groove) for continuous servo has a radius of 24 mm to 58 m on the substrate by injection molding.
m. The groove depth is 80 nm,
The track pitch is 1.20 μm, and both the groove width and the land width are about 0.60 μm.

【0024】使用したスパッタ装置は、光ディスク基板
を取り付け可能なように基板ホルダー部を改造した高周
波マグネトロンスパッタ装置(アネルバ(株)製SPF
−430H型)である。この装置は3個のターゲットを
1つの真空槽に設置し、3種類の膜を連続して形成可能
である。用いたターゲットは直径101mm、厚さ5m
mのサイズであり、ZnSとSiO2を80:20mo
l%の割合で混合焼結したZnS・SiO2ターゲッ
ト、Ge:Sb:Te=約2:2:5原子比のGeSb
Te合金ターゲット、AgCu(Cu:10原子%)合
金ターゲット、AlTi(Ti:2.0原子%)合金タ
ーゲットである。AgCuTi膜を作製する時はAgC
uターゲット上に1mm厚さ、5mm角のTi金属チッ
プを配置してスパッタした。Tiチップの個数とターゲ
ット上の配置は表1記載のTi含有量になるように調節
した。ターゲットから基板の距離を約120mmとし、
ターゲット中心から約100mm離れた位置を回転中心
として基板を20rpmで回転(自転)させながらスパ
ッタ製膜した。
The sputtering apparatus used was a high-frequency magnetron sputtering apparatus (SPF manufactured by Anelva Co., Ltd.) in which the substrate holder was modified so that an optical disk substrate could be mounted.
-430H type). In this apparatus, three targets are set in one vacuum chamber, and three types of films can be formed continuously. The target used was 101 mm in diameter and 5 m in thickness
m: ZnS and SiO 2 are 80:20 mo
ZnS.SiO 2 target mixed and sintered at a ratio of 1%, Ge: Sb: Te = GeSb having an atomic ratio of about 2: 2: 5
A Te alloy target, an AgCu (Cu: 10 atomic%) alloy target, and an AlTi (Ti: 2.0 atomic%) alloy target. When producing AgCuTi film, use AgC
A 1 mm thick, 5 mm square Ti metal tip was placed on the u target and sputtered. The number of Ti chips and the arrangement on the target were adjusted so that the Ti content shown in Table 1 was obtained. The distance between the target and the substrate is about 120 mm,
Sputter deposition was performed while the substrate was rotated (rotated) at 20 rpm about a position about 100 mm away from the center of the target as the center of rotation.

【0025】この装置の真空槽内に基板を配置し、8×
10-5Paになるまで排気し、次にArガスを真空槽内
に流量75SCCMで導入し、圧力0.8Paになるよ
うに主バルブ上のオリフィスを調整した。投入電力はZ
nS・SiO2焼結体スパッタ時は500Wattの高
周波電力、GeSbTeターゲットのスパッタは50W
attの直流電力を用いた。AgCuターゲットスパッ
タ時は200Wattの直流電力、AlTiターゲット
スパッタ時は400Wattの直流電力を用いた。それ
ぞれ膜の堆積速度は、それぞれZnS・SiO2膜が2
3.3nm/min.、AlTi膜が10.2nm/m
in.、AgCu膜とAgCuTi膜が17.3nm/
min.、そしてGeSbTe膜が20.5nm/mi
n.であった。本発明のAgCuTi膜の堆積速度は、
現在多用されているAlTi膜などのAl合金膜に比べ
て電力は半分で堆積速度は1.7倍であった。同じ電力
で比較すれば、3.4倍の堆積速度となり、生産性が極
めて良好なことが判明した。
The substrate is placed in a vacuum chamber of this apparatus,
Evacuation was performed until the pressure reached 10 −5 Pa, and then Ar gas was introduced into the vacuum chamber at a flow rate of 75 SCCM, and the orifice on the main valve was adjusted to a pressure of 0.8 Pa. Input power is Z
High frequency power of 500 Watt during sputtering of nS.SiO 2 sintered body, 50 W under sputtering of GeSbTe target
att DC power was used. 200 Watt DC power was used for AgCu target sputtering, and 400 Watt DC power was used for AlTi target sputtering. The deposition rate of each film was 2 for ZnS.SiO 2 film.
3.3 nm / min. , AlTi film is 10.2 nm / m
in. , AgCu film and AgCuTi film are 17.3 nm /
min. And a GeSbTe film of 20.5 nm / mi
n. Met. The deposition rate of the AgCuTi film of the present invention is:
The electric power was half and the deposition rate was 1.7 times that of an Al alloy film such as an AlTi film which is frequently used at present. When compared at the same power, the deposition rate was 3.4 times higher, and the productivity was found to be extremely good.

【0026】さらに、AlCr反射層上に、スピンコー
ターで紫外線硬化型のS(イオウ元素)を含有しないフ
ェノールノボラックエポキシアクリレート樹脂を塗布
し、紫外線照射により硬化させ、約11μmの有機保護
層を設け相変化型光記録媒体とした。
Further, an ultraviolet-curable phenol novolak epoxy acrylate resin containing no S (sulfur element) is applied on the AlCr reflective layer by a spin coater, and cured by irradiation with ultraviolet light to form an organic protective layer of about 11 μm. A changeable optical recording medium was used.

【0027】初期化(アニール結晶化)に使用した初期
化装置は(株)シバソク製のバルクイレーザ装置(LK
101A型)である。ただし、使用した光ヘッドは、レ
ーザビーム強度がディスク盤面で最大約1watt、波
長=810nm、NA(対物レンズ開口数)=0.3
4、スポットサイズ=125μm(長軸長さ)×1.2
7μm(短軸長さ)のものを、ディスク半径方向からビ
ーム長軸を30度傾けて取り付けて用いた。初期化は、
線速度5m/sec一定でディスクを回転させながら、
光ヘッドを送り速度86μm/回転(ディスク1回転時
に光ヘッドは半径方向に86μm進む速度)で送りなが
ら、レーザパワーを最大値の65%(すなわち、約65
0mW)にして行った。
The initialization apparatus used for the initialization (annealing crystallization) is a bulk eraser apparatus (LK, manufactured by Shibasoku Co., Ltd.).
101A type). However, the optical head used had a maximum laser beam intensity of about 1 watt on the disk surface, a wavelength of 810 nm, and an NA (objective lens numerical aperture) of 0.3.
4. Spot size = 125 μm (long axis length) × 1.2
7 μm (short axis length) was used with the beam major axis inclined at 30 ° from the disk radial direction. Initialization is
While rotating the disk at a constant linear velocity of 5 m / sec,
While feeding the optical head at a feed speed of 86 μm / rotation (the speed at which the optical head advances 86 μm in the radial direction during one rotation of the disk), the laser power is increased to 65% of the maximum value (ie, about 65%).
0 mW).

【0028】媒体の電気特性評価は、波長780nm、
対物レンズの開口数NA=0.55の光ヘッドを有する
パルステック工業(株)製DDU−1000型電気特性
評価装置を用いて行った。ディスクの回転速度2030
rpm、半径26mmの所で、書込み周波数4MHz、
パルス幅62nsecの単一周波数で、バイアスパワー
4.5mWatt一定として記録ピークパワーを可変と
して記録し、再生パワー1mWattで再生した信号を
スペクトルアナライザーでCNR(信号ノイズ比)を測
定した。記録ピークパワーを順に大きくしていった時の
CNRの立ち上がりカーブにおいて、CNR=30dB
となった時の記録ピークパワーを記録感度の評価値とし
た。記録感度が高すぎる(小さい過ぎるパワーで記録が
なされる)時は、オーバライトの繰り返し耐久性が悪く
なり、感度が低いと過大なパワーが要求され、ドライブ
の負担が大きくなる。記録感度は8〜12mWatt程
度が好ましい。なお、CNRの値は大きい方が良い。評
価結果を表1に示す。
The electrical characteristics of the medium were evaluated at a wavelength of 780 nm.
The measurement was performed using a DDU-1000 type electrical characteristic evaluation device manufactured by Pulstec Industrial Co., Ltd. having an optical head having a numerical aperture NA = 0.55 of the objective lens. Disk rotation speed 2030
rpm, radius of 26 mm, writing frequency 4 MHz,
Recording was performed at a single frequency with a pulse width of 62 nsec with a constant bias power of 4.5 mWatt and a variable recording peak power, and a signal reproduced at a reproduction power of 1 mWatt was measured for CNR (signal noise ratio) with a spectrum analyzer. In the rising curve of CNR when the recording peak power was sequentially increased, CNR = 30 dB
The recording peak power at the time of was set as the evaluation value of the recording sensitivity. When the recording sensitivity is too high (recording is performed with too low power), the durability of repeated overwriting is deteriorated, and when the sensitivity is low, excessive power is required and the load on the drive increases. The recording sensitivity is preferably about 8 to 12 mWatt. The larger the value of CNR, the better. Table 1 shows the evaluation results.

【0029】以上の実施例より、Agのみの反射膜では
記録感度が小さ過ぎること、AlTi反射膜ではCNR
が低いことが判明した。さらに、これらのサンプルを、
温度80℃、湿度85%の条件で1000時間の加速劣
化試験を行なったところ、比較例1のみにピンホールが
30数個発生したが、他のサンプルではまったく変化が
見られなかった。
From the above examples, it was found that the recording sensitivity was too low with the Ag-only reflective film, and that the CNR was not sufficient with the AlTi reflective film.
Turned out to be low. In addition, these samples
When an accelerated deterioration test was performed for 1000 hours under the conditions of a temperature of 80 ° C. and a humidity of 85%, 30 or more pinholes were generated only in Comparative Example 1, but no change was observed in other samples.

【0030】さらに、反射層をスパッタで形成する所ま
では同様にしたサンプルを再度作製し、今回は(有機保
護層を塗布しないで)該反射層上にZnS・SiO2
を20nmスパッタ形成したところ、AlTi反射層の
媒体は上記と同じ性能を示したが、他のAg反射層、A
gCuTi反射層の媒体は、ZnS・SiO2スパッタ
直後既に表面の変色が認められ、硫化銀が生成されたと
推定された。かつ、CNRも46dB程度まで劣化し
た。さらに、該反射層上にZnS・SiO2ではなく、
GeN(チッ化ゲルマニウム)膜をスパッタ形成した時
は、全てのサンプルで、なんらの変化も見られず、特性
も満足できるものだった。
Further, the same sample was prepared again up to the point where the reflective layer was formed by sputtering, and this time (without coating the organic protective layer), a ZnS.SiO 2 film was formed on the reflective layer by 20 nm by sputtering. However, although the medium of the AlTi reflective layer showed the same performance as the above, other Ag reflective layers and A
The discoloration of the surface of the medium of the gCuTi reflection layer was already observed immediately after the sputtering of ZnS.SiO 2 , and it was presumed that silver sulfide was generated. In addition, the CNR also deteriorated to about 46 dB. Furthermore, instead of ZnS · SiO 2 on the reflective layer,
When a GeN (germanium nitride) film was formed by sputtering, no change was observed in any of the samples, and the characteristics were satisfactory.

【0031】[0031]

【実施例6〜8】更に、実施例1〜5と同じにして、た
だTiのかかわりにTaのチップをAgCuターゲット
上に配置して金属反射層を表2のAgCuTa合金とし
た以外は全く同じ構成の相変化型光ディスクを作製し、
同じようにして評価した。その結果を表2に示す。
Examples 6 to 8 The same as Examples 1 to 5 except that a Ta chip was placed on an AgCu target instead of Ti and the metal reflective layer was made of an AgCuTa alloy shown in Table 2. Produce a phase change optical disk with the configuration
Evaluation was performed in the same manner. Table 2 shows the results.

【0032】この実施例より、AgCuTa膜でもAg
CuTi膜と同様の効果が確認された。さらに、有機保
護層を塗布した該サンプル(実施例6,7,8)を温度
80℃、湿度85%の条件で1000時間の加速劣化試
験を行なったところ、全てのサンプルでまったく変化が
見られず良好な環境耐久性を示した。
From this example, it can be seen that the AgCuTa
The same effect as the CuTi film was confirmed. Further, when the samples (Examples 6, 7, and 8) coated with an organic protective layer were subjected to an accelerated deterioration test for 1000 hours at a temperature of 80 ° C. and a humidity of 85%, no change was observed in all the samples. Good environmental durability.

【0033】以上の実施例に示した如く、本発明のCu
と、TaまたはTiの少なくとも一方とを含有したAg
合金からなる金属反射膜を持つ相変化型光記録媒体で
は、CNR、感度が優れ、かつ耐久性も高い光情報媒体
を得ることができる。特にTa、Tiの含有量が1.5
原子%以上の範囲では、最適記録レーザーパワーの低下
すなわち記録感度の向上が顕著で、かつCNRも公知
の、例えばAlTi合金膜を反射膜とする相変化型光デ
ィスクより格段にすぐれている。かかる効果の点でT
a、Tiの含有量は1.5〜10原子%が特に好まし
い。
As shown in the above embodiments, the Cu
Containing Ag and at least one of Ta and Ti
With a phase change optical recording medium having a metal reflective film made of an alloy, an optical information medium having excellent CNR and sensitivity and high durability can be obtained. In particular, when the content of Ta and Ti is 1.5
In the range of at least atomic%, the reduction of the optimum recording laser power, that is, the improvement of the recording sensitivity is remarkable, and the CNR is much better than the well-known phase change type optical disk using, for example, an AlTi alloy film as a reflection film. T in terms of such effects
The content of a and Ti is particularly preferably 1.5 to 10 atomic%.

【0034】[0034]

【表1】 [Table 1]

【0035】[0035]

【表2】 [Table 2]

【0036】[0036]

【発明の効果】以上、本発明の光情報媒体によれば、A
gCu合金、AgCuTi合金、または、AgCuTa
合金を反射層として採用することにより、廉価で性能が
良く、かつ、耐環境性に優れた媒体を生産性良く製造す
ることが可能になった。
As described above, according to the optical information medium of the present invention, A
gCu alloy, AgCuTi alloy, or AgCuTa
By employing an alloy as the reflective layer, it has become possible to manufacture a medium that is inexpensive, has good performance, and has excellent environmental resistance with good productivity.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 金属反射層を有する光磁気記録媒体を除
く光情報媒体において、金属反射層がAgにCuを0.
5〜30原子%含有せしめたAg合金からなり、かつ金
属反射層上にS(イオウ)元素を実質的に含有しない保
護層または接着層を形成したことを特徴とする光情報媒
体。
In an optical information medium excluding a magneto-optical recording medium having a metal reflection layer, the metal reflection layer is formed by adding Ag to Cu in an amount of 0.1 to 0.1%.
An optical information medium comprising an Ag alloy containing 5 to 30 atomic% and a protective layer or an adhesive layer substantially free of S (sulfur) element formed on the metal reflective layer.
【請求項2】 金属反射層がAgにCuを0.5〜30
原子%含有せしめ、さらにTaまたはTiの少くとも一
種を0.5〜12原子%含有せしめたAg合金からなる
ことを特徴とする請求項1記載の光情報媒体。
2. The method according to claim 1, wherein the metal reflection layer is formed by adding 0.5 to 30 Cu to Ag.
2. The optical information medium according to claim 1, wherein the optical information medium is made of an Ag alloy containing at least one of Ta and Ti in an amount of 0.5 to 12 at%.
【請求項3】 光情報媒体が相変化型光記録媒体である
ことを特徴とする請求項2記載の光情報媒体。
3. The optical information medium according to claim 2, wherein the optical information medium is a phase change type optical recording medium.
【請求項4】 光情報媒体が基板上に少なくとも1つの
記録層を形成した構造を有し、レーザ光による情報の読
み出し(再生)および/または情報の書き込み(記録)
を基板を通さずに記録層側から行う膜面入射タイプであ
ることを特徴とする特許請求項1〜3のいずれかに記載
の光情報媒体。
4. An optical information medium having a structure in which at least one recording layer is formed on a substrate, and reads (reproduces) information and / or writes (records) information by using a laser beam.
The optical information medium according to any one of claims 1 to 3, wherein the optical information medium is of a film surface incident type in which the light is incident from the recording layer side without passing through the substrate.
【請求項5】 光情報媒体の記録層がGe、Sb、Te
を主成分とし、膜厚が10〜40nmであることを特徴
とする請求項3〜4のいずれかに記載の光情報媒体。
5. The recording layer of an optical information medium is made of Ge, Sb, Te.
The optical information medium according to any one of claims 3 to 4, wherein the optical information medium has a thickness of 10 to 40 nm.
JP11030045A 1999-02-08 1999-02-08 Optical information medium Pending JP2000228032A (en)

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002054396A1 (en) * 2000-12-28 2002-07-11 Sony Corporation Optical recording medium
US6764735B2 (en) 1998-06-22 2004-07-20 Target Technology Company, Llc Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
US6790503B2 (en) 1998-06-22 2004-09-14 Target Technology Company, Llc Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
WO2004081929A1 (en) * 2003-03-13 2004-09-23 Mitsubishi Materials Corporation Silver alloy sputtering target for forming reflective layer of optical recording medium
US6841219B2 (en) 1998-06-22 2005-01-11 Han H. Nee Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
JP2009057580A (en) * 2007-08-29 2009-03-19 Kobelco Kaken:Kk Ag ALLOY SPUTTERING TARGET, AND ITS MANUFACTURING METHOD
US7645500B2 (en) 2003-04-18 2010-01-12 Target Technology Company, Llc Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
US8187689B2 (en) * 2006-06-15 2012-05-29 Sony Corporation Optical recording medium having write once metal reflective film

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6841219B2 (en) 1998-06-22 2005-01-11 Han H. Nee Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
US6764735B2 (en) 1998-06-22 2004-07-20 Target Technology Company, Llc Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
US6790503B2 (en) 1998-06-22 2004-09-14 Target Technology Company, Llc Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
US6852384B2 (en) 1998-06-22 2005-02-08 Han H. Nee Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
KR100894972B1 (en) * 2000-12-28 2009-04-24 소니 가부시끼 가이샤 Optical recording medium
US6985429B2 (en) 2000-12-28 2006-01-10 Sony Corporation Optical recording medium
AU2002219540B2 (en) * 2000-12-28 2007-03-29 Sony Corporation Optical recording medium
WO2002054396A1 (en) * 2000-12-28 2002-07-11 Sony Corporation Optical recording medium
WO2004081929A1 (en) * 2003-03-13 2004-09-23 Mitsubishi Materials Corporation Silver alloy sputtering target for forming reflective layer of optical recording medium
US7645500B2 (en) 2003-04-18 2010-01-12 Target Technology Company, Llc Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
US8187689B2 (en) * 2006-06-15 2012-05-29 Sony Corporation Optical recording medium having write once metal reflective film
JP2009057580A (en) * 2007-08-29 2009-03-19 Kobelco Kaken:Kk Ag ALLOY SPUTTERING TARGET, AND ITS MANUFACTURING METHOD
JP4694543B2 (en) * 2007-08-29 2011-06-08 株式会社コベルコ科研 Ag-based alloy sputtering target and manufacturing method thereof

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