JP2000225175A - Sterilizer for liquid - Google Patents

Sterilizer for liquid

Info

Publication number
JP2000225175A
JP2000225175A JP11027422A JP2742299A JP2000225175A JP 2000225175 A JP2000225175 A JP 2000225175A JP 11027422 A JP11027422 A JP 11027422A JP 2742299 A JP2742299 A JP 2742299A JP 2000225175 A JP2000225175 A JP 2000225175A
Authority
JP
Japan
Prior art keywords
sterilization
liquid material
temperature
pulse
supplied
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11027422A
Other languages
Japanese (ja)
Inventor
Akira Senbayashi
暁 千林
Kouichi Naeshiro
晃一 苗代
Shigeru Kato
茂 加藤
Tamotsu Kawakita
有 川北
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Electric Co Ltd
Original Assignee
Nissin Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Electric Co Ltd filed Critical Nissin Electric Co Ltd
Priority to JP11027422A priority Critical patent/JP2000225175A/en
Publication of JP2000225175A publication Critical patent/JP2000225175A/en
Pending legal-status Critical Current

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  • Food Preservation Except Freezing, Refrigeration, And Drying (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)

Abstract

PROBLEM TO BE SOLVED: To eliminate variance of sterilization effect by compensating variance to eliminate variance in sterilizing treatment temperature even when the variance is produced in preheating temperature of liquid by a preheater. SOLUTION: This sterilizer is equipped with a controller 20a and an entrance temperature meter 26 which measures temperature T1 of just before sterilizing treatment of liquid supplied to the sterilization part 10 from the preheater 8 and gives the temperature the controller 20a. Using the temperature T1 of just before sterilizing treatment measured by the entrance temperature meter 26 and a target temperature T2 of the temperature reaching after sterilization of the liquid 2 at the sterilization part 10, the controller 20a calculates the optimum repeating frequency f0, which is a repeating frequency (f) of the pulse voltage Vp supplied to the sterilization part 10 from the pulse power source 19, of the liquid 2 at the sterilization part 10 and controls the repeating frequency (f) of the pulse voltage Vp supplied to the sterilization part 10 from the pulse power source 18 so as to be the optimum repeating frequency f0.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、飲料(ジュー
ス、牛乳等)、液卵、水、化粧水、液体医薬品、水耕
液、培養液等の液状物(液体を含む)に高電界のパルス
電界を印加して殺菌処理を施す殺菌装置に関し、より具
体的には、液状物の殺菌処理後到達温度のばらつきを防
止して、殺菌効果のばらつきを防止する手段に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pulse of a high electric field on liquids (including liquids) such as beverages (juice, milk, etc.), liquid eggs, water, lotion, liquid medicines, hydroponic liquids, culture liquids and the like. The present invention relates to a sterilization apparatus for performing a sterilization treatment by applying an electric field, and more specifically, to a means for preventing a variation in a temperature reached after a sterilization treatment of a liquid material to prevent a variation in a sterilization effect.

【0002】[0002]

【従来の技術】液状物の殺菌法として、広く一般的に
は、液状物を加熱する熱殺菌法が知られているが、熱殺
菌法では、液状物を例えば70℃〜140℃程度にまで
加熱することから、食品等の液状物の風味や栄養価等
が低下する、殺菌に多くのエネルギーが必要である、
等の課題がある。
2. Description of the Related Art As a method for sterilizing a liquid material, a heat sterilization method of heating a liquid material is widely known. In the heat sterilization method, a liquid material is heated to, for example, about 70 ° C. to 140 ° C. Due to heating, the flavor and nutritional value of liquids such as foods are reduced, a lot of energy is required for sterilization,
And other issues.

【0003】熱殺菌法に代わる殺菌法として、パルス電
界印加による電界殺菌法が注目されており、これに関す
る技術が例えば特公平3−11755号公報に記載され
ている。この電界殺菌法は、簡単に言えば、液状物にパ
ルス電界(具体的にはパルス高電界)をある回数印加す
ることにより、液状物中の細菌の細胞膜を破壊して殺菌
する方法である。この方法によると、従来の熱殺菌法の
ように液状物を加熱しなくても殺菌を行うことができ
る。従って、この電界殺菌法は、低温殺菌が可能であ
り、液状物の風味や栄養価等を低下させない、殺菌に
多くのエネルギーを必要としないので省エネルギーが可
能である、という特長を有している。
[0003] As a sterilization method replacing the heat sterilization method, an electric field sterilization method using a pulsed electric field has attracted attention, and a technique relating to this is described in, for example, Japanese Patent Publication No. 3-11755. In brief, the electric field sterilization method is a method of applying a pulsed electric field (specifically, a pulsed high electric field) to a liquid material a certain number of times, thereby destroying and sterilizing bacterial cell membranes in the liquid material. According to this method, sterilization can be performed without heating the liquid material as in the conventional heat sterilization method. Therefore, this electric field sterilization method has the features that it can be pasteurized, does not reduce the flavor and nutritional value of the liquid material, and can save energy because it does not require much energy for sterilization. .

【0004】しかし、電界殺菌法においても、液状物を
予め、従来の熱殺菌法による場合よりも低い温度(例え
ば40℃程度)に予備的に加熱した後に、パルス電界印
加殺菌処理を行えば、殺菌効果がより高まることが知ら
れている。この方法による殺菌装置の従来例を図3に示
す。
However, also in the electric field sterilization method, if the liquid material is preliminarily heated to a lower temperature (for example, about 40 ° C.) than the conventional heat sterilization method, and then the pulse electric field application sterilization treatment is performed, It is known that the bactericidal effect is further enhanced. FIG. 3 shows a conventional example of a sterilizer according to this method.

【0005】この殺菌装置は、殺菌処理前の液状物2を
貯める未処理槽4と、この未処理槽4から液状物2を送
出するポンプ6と、殺菌処理部10へ供給する液状物2
を予備的に加熱する予備加熱器8と、液状物2をパルス
電界EP によって殺菌処理する殺菌処理部10と、この
殺菌処理部10にパルス電圧VP を繰り返して印加する
パルス電源18と、このパルス電源18を制御する制御
装置20と、殺菌処理部10から出た殺菌処理済の液状
物2を貯める処理済槽22とを備えている。
[0005] This sterilizer comprises an untreated tank 4 for storing the liquid 2 before sterilization, a pump 6 for sending out the liquid 2 from the untreated tank 4, and a liquid 2 to be supplied to the sterilization section 10.
The a preheater 8 to preliminarily heated, the sterilizing unit 10 for sterilizing the liquid substance 2 by the pulse electric field E P, a pulse power source 18 for applying repeatedly a pulse voltage V P to the sterilization unit 10, The apparatus includes a control device 20 for controlling the pulse power supply 18 and a treated tank 22 for storing the sterilized liquid 2 discharged from the sterilization processing unit 10.

【0006】殺菌処理部10は、この例では、互いに沿
って配置された二つの電極12および14を有してい
て、両電極12、14間に液状物2が流される。両電極
12、14間に上記パルス電源18からパルス電圧VP
を繰り返して供給することによって、両電極12、14
間の液状物2にパルス電界EP が繰り返して印加され、
それによって液状物2に対する殺菌処理が行われる。二
つの電極12、14は、この例では一例として平行平板
状をしているが、同軸円筒状等であっても良い。16は
絶縁物である。
In this example, the sterilizing section 10 has two electrodes 12 and 14 arranged alongside each other, and the liquid 2 flows between the electrodes 12 and 14. The pulse voltage V P is applied between the electrodes 12 and 14 from the pulse power supply 18.
Are supplied repeatedly, so that the two electrodes 12, 14
Pulsed electric field E P in the liquid product 2 between is applied repeatedly,
Thereby, the liquid material 2 is sterilized. In this example, the two electrodes 12 and 14 have a parallel plate shape as an example, but may have a coaxial cylindrical shape or the like. Reference numeral 16 denotes an insulator.

【0007】なお、殺菌処理部10において液状物2に
印加されるパルス電界EP のパルス数Nは、殺菌処理部
10を流れる液状物2の流量をQ[cc/s]、二つの
電極12、14間の電界処理空間の体積をM[cc]、
パルス電界EP の繰返し周波数をf[Hz]とした場
合、次式で表される。なお、この式におけるM/Qは、
殺菌処理部10を液状物2が通過する時間[s]を表し
ている。
[0007] Incidentally, the pulse number N of the pulse electric field E P applied to the liquid product 2 in the sterilization unit 10, the flow rate of the liquid product 2 through the sterilizing section 10 Q [cc / s], the two electrodes 12 , 14, the volume of the electric field processing space is M [cc],
If the repetition frequency of the pulsed electric field E P was f [Hz], it is expressed by the following equation. Note that M / Q in this equation is
The time [s] that the liquid material 2 passes through the sterilizing section 10 is shown.

【0008】[0008]

【数1】N=M・f/QN = M · f / Q

【0009】上記予備加熱器8を用いる等して、電界殺
菌処理前に液状物2を予備的に加熱することにより、そ
の加熱を行わない場合に比べて、少なくとも100倍程
度の殺菌効果(菌の殺菌率)が向上することが知られて
いる。
[0010] By preliminarily heating the liquid material 2 before the electric field sterilization treatment by using the preheater 8 or the like, the sterilization effect (bacterial activity) is at least about 100 times that in the case where the heating is not performed. It is known that the germicidal rate is improved.

【0010】液状物2の予備的な加熱の程度は、液状物
2中の菌種等によって異なるが、液状物2の到達温度に
して、35℃〜60℃程度が好ましく、40℃〜50℃
程度がより好ましい。
The degree of preliminary heating of the liquid material 2 varies depending on the kind of bacteria in the liquid material 2 and the like, but the ultimate temperature of the liquid material 2 is preferably about 35 ° C. to 60 ° C., more preferably 40 ° C. to 50 ° C.
The degree is more preferred.

【0011】液状物2の予備的な加熱温度を高めるほど
殺菌効果は高まるけれども、加熱温度を高めれば高める
ほど、従来の熱殺菌法に対する電界殺菌法の上記効果
(即ち、低温殺菌が可能、省エネルギーが可能)が
小さくなるため、予備的な加熱は必要最小限にするのが
好ましい。
The higher the preliminary heating temperature of the liquid material 2, the higher the sterilizing effect. However, the higher the heating temperature, the higher the effect of the electric field sterilization method compared to the conventional heat sterilization method (that is, pasteurization is possible, energy saving is possible). Is small), so that the preliminary heating is preferably minimized.

【0012】また、殺菌処理部10におけるパルス電界
P の印加によるジュール加熱によっても液状物2の温
度は上昇するので、液状物2の風味等の低下防止等のた
めには、液状物2の予備加熱による温度上昇とパルス電
界EP 印加による温度上昇とを含めた、殺菌処理部10
における液状物2の殺菌処理後到達温度もなるべく低く
するのが好ましい。
Further, since the temperature of the liquid substance 2 is raised by Joule heating by application of the pulse electric field E P in the sterilization unit 10, for preventing decrease such as flavor of the liquid substance 2, the liquid material 2 including the temperature rise due to the temperature rise and the pulse electric field E P applied by preheating, sterilizing unit 10
It is preferable that the temperature reached after the sterilization treatment of the liquid material 2 in the above is also made as low as possible.

【0013】[0013]

【発明が解決しようとする課題】上記従来の殺菌装置に
おいて、予備加熱器8による液状物2の予備的な加熱温
度にばらつきがあった場合、殺菌処理部10における液
状物2の前述した殺菌処理後到達温度にもばらつきが生
じる。パルス電界殺菌効果と液状物温度には密接な関連
性のあることが分かっており、従って液状物2の予備的
な加熱温度のばらつきによって、殺菌処理部10におけ
る殺菌効果に大きなばらつきが生じる。例えば、殺菌処
理部10における殺菌処理後到達温度に5℃程度のばら
つきが生じた場合、液状物2に対する殺菌効果は、細菌
種によっては10倍以上にばらつくケースがある。
In the above-mentioned conventional sterilizing apparatus, when the preliminary heating temperature of the liquid material 2 by the pre-heater 8 varies, the sterilizing process of the liquid material 2 in the sterilizing section 10 is performed as described above. The post-attainment temperature also varies. It has been found that there is a close relationship between the pulsed electric field sterilization effect and the temperature of the liquid material. Therefore, the fluctuation of the preliminary heating temperature of the liquid material 2 causes a large fluctuation in the sterilization effect in the sterilization processing unit 10. For example, when the temperature reached after the sterilization process in the sterilization processing unit 10 fluctuates by about 5 ° C., the sterilization effect on the liquid material 2 may vary by a factor of 10 or more depending on the bacterial species.

【0014】この解決策として、殺菌処理部10におけ
る液状物2の殺菌処理後到達温度の多少のばらつきを無
視することができる程度に、予備加熱器8による予備的
な加熱を十分に(十分に高温に)行うという方法が考え
られるけれども、この方法では、殺菌処理後の液状物2
の温度が必要以上に高まるので、低温殺菌および省エネ
ルギーが可能であるという電界殺菌法の前述した効果が
低下する。特に、殺菌処理部10における液状物2の殺
菌処理後到達温度については、これを低下させたいとい
う要望が強いので、安易に上記方法を採ることはできな
い。
As a solution to this, the preliminary heating by the pre-heater 8 is sufficiently (sufficiently) sufficient that a slight variation in the temperature reached after sterilization of the liquid material 2 in the sterilization processing section 10 can be ignored. However, in this method, the liquid material 2 after the sterilization treatment is used.
Of the electric field sterilization method, which is capable of pasteurization and energy saving, is reduced. In particular, as for the temperature reached after the sterilization of the liquid material 2 in the sterilization processing section 10, there is a strong demand to lower the temperature, so that the above method cannot be easily adopted.

【0015】また、予備加熱器8の出口温度を計測して
予備加熱器8にフィードバック制御をかけて、予備加熱
器8による液状物2の予備的な加熱の精度を高めるとい
う考えもあるけれども、この方法では、予備加熱器8に
おける温度制御の時間応答性が悪いので高精度の温度制
御が困難である。これは、予備加熱器8は、一般的に、
ヒータを用いて間接的に(即ち熱交換器等を介して)液
状物2を加熱するものであり、予備加熱器8の出口温度
計測→ヒータ電流増減→ヒータ温度増減→液状物温度増
減というフィードバック制御に、不可避的に応答遅れが
生じるからである。またこのような原因から、殺菌装置
の立ち上げ時等の過渡的な温度条件時には特に、予備加
熱温度が一定にならず、殺菌効果のばらつきが大きくな
る。
There is also an idea that the outlet temperature of the pre-heater 8 is measured and feedback control is performed on the pre-heater 8 to improve the accuracy of preliminary heating of the liquid material 2 by the pre-heater 8. In this method, it is difficult to perform high-precision temperature control because the time response of the temperature control in the pre-heater 8 is poor. This is because the pre-heater 8 is generally
The heater 2 is used to indirectly heat the liquid material 2 (ie, via a heat exchanger or the like), and measures the temperature of the outlet of the pre-heater 8 → increases / decreases the heater current → increases / decreases the heater temperature → increases / decreases the liquid material temperature This is because a response delay inevitably occurs in control. In addition, due to such a cause, especially in a transitional temperature condition such as when starting up the sterilizing apparatus, the preheating temperature is not constant, and the sterilizing effect varies greatly.

【0016】そこでこの発明は、予備加熱器による液状
物の予備的な加熱温度にばらつきが生じても、これを速
やかに補償して、殺菌処理部における液状物の殺菌処理
後到達温度のばらつきを無くして、殺菌効果のばらつき
を防止することのできる殺菌装置を提供することを主た
る目的とする。
Accordingly, the present invention compensates for any variation in the preliminary heating temperature of the liquid material by the pre-heater quickly, and reduces the variation in the temperature reached after the sterilization of the liquid material in the sterilization section. A main object of the present invention is to provide a sterilization apparatus that can eliminate the sterilization effect and prevent the dispersion of the sterilization effect.

【0017】[0017]

【課題を解決するための手段】この発明に係る殺菌装置
の一つは、前記殺菌処理部に供給される液状物の殺菌処
理直前温度を計測する入口温度計測器と、この入口温度
計測器で計測した殺菌処理直前温度と前記殺菌処理部に
おける液状物の殺菌処理後到達温度の目標値とを用い
て、前記パルス電源から前記殺菌処理部へ供給するパル
ス電圧の繰返し周波数であって、前記殺菌処理部におけ
る液状物の殺菌処理後到達温度が前記目標値になる最適
繰返し周波数を演算し、この最適繰返し周波数になるよ
うに、前記パルス電源から前記殺菌処理部へ供給するパ
ルス電圧の繰返し周波数を制御する制御装置とを備える
ことを特徴としている(請求項1)。
According to one aspect of the present invention, there is provided a sterilization apparatus comprising: an inlet temperature measuring device for measuring a temperature immediately before a sterilizing process of a liquid material supplied to the sterilizing section; Using the measured temperature immediately before the sterilization treatment and the target value of the temperature reached after the sterilization treatment of the liquid material in the sterilization treatment section, the repetition frequency of the pulse voltage supplied from the pulse power supply to the sterilization treatment section, Calculate the optimum repetition frequency at which the temperature reached after the sterilization treatment of the liquid material in the processing unit is the target value, and calculate the repetition frequency of the pulse voltage supplied from the pulse power supply to the sterilization processing unit so as to be the optimum repetition frequency. And a control device for controlling (claim 1).

【0018】殺菌処理部へ供給するパルス電圧の繰返し
周波数を制御することによって、殺菌処理部におけるパ
ルス電界印加による殺菌処理に伴う液状物の温度上昇を
正確にかつ速やかに制御することができる。
By controlling the repetition frequency of the pulse voltage supplied to the sterilizing section, it is possible to accurately and promptly control the temperature rise of the liquid material due to the sterilizing process by applying the pulse electric field in the sterilizing section.

【0019】従って、上記制御装置によって、入口温度
計測器で計測した殺菌処理直前温度と殺菌処理部におけ
る液状物の殺菌処理後到達温度の目標値とを用いて、パ
ルス電源から殺菌処理部へ供給するパルス電圧の繰返し
周波数であって、殺菌処理部における液状物の殺菌処理
後到達温度が前記目標値になる最適繰返し周波数を演算
し、この最適繰返し周波数になるように、パルス電源か
ら殺菌処理部へ供給するパルス電圧の繰返し周波数を制
御することによって、予備加熱器による液状物の予備的
な加熱温度にばらつきが生じても、これを速やかに補償
して、殺菌処理部における液状物の殺菌処理後到達温度
のばらつきを無くして、殺菌効果のばらつきを防止する
ことができる。
Therefore, the controller supplies the sterilization processing section from the pulse power source using the temperature immediately before the sterilization processing measured by the inlet temperature measuring device and the target value of the attained temperature after the sterilization processing of the liquid material in the sterilization processing section. The repetition frequency of the pulse voltage to be applied, and the optimum repetition frequency at which the temperature reached after the sterilization of the liquid material in the sterilization processing unit reaches the target value is calculated. By controlling the repetition frequency of the pulse voltage to be supplied to the liquid material, even if the preliminary heating temperature of the liquid material by the pre-heater fluctuates, this is quickly compensated for and the sterilization processing of the liquid material in the sterilization processing section Variations in the post-reaching temperature can be eliminated, and variations in the sterilization effect can be prevented.

【0020】上記パルス電圧の繰返し周波数制御の代わ
りに、パルス電圧の電圧値を制御しても良い(請求項
2)。
Instead of controlling the repetition frequency of the pulse voltage, a voltage value of the pulse voltage may be controlled.

【0021】また、上記入口温度計測器の代わりに、殺
菌処理部から出た直後の液状物の殺菌処理後到達温度を
計測する出口温度計測器を設けて、それで計測した温度
と目標温度との差が0になるように制御しても良い(請
求項3、4)。
Further, instead of the inlet temperature measuring device, an outlet temperature measuring device for measuring the temperature reached after the sterilization of the liquid material immediately after leaving the sterilizing section is provided, and the temperature measured by the outlet and the target temperature are measured. The control may be performed so that the difference becomes 0 (claims 3 and 4).

【0022】[0022]

【発明の実施の形態】図1は、この発明に係る殺菌装置
の一例を示す概略図である。図3に示した従来例と同一
または相当する部分には同一符号を付し、以下において
は当該従来例との相違点を主に説明する。
FIG. 1 is a schematic view showing an example of a sterilizer according to the present invention. Parts that are the same as or correspond to those of the conventional example shown in FIG. 3 are denoted by the same reference numerals, and differences from the conventional example will be mainly described below.

【0023】この殺菌装置は、前述したような未処理槽
4、ポンプ6、予備加熱器8、殺菌処理部10、パルス
電源18および処理済槽22の他に、次のような制御装
置20aおよび入口温度計測器26を備えている。
The sterilizing apparatus includes a control unit 20a as described below in addition to the untreated tank 4, the pump 6, the preheater 8, the sterilizing unit 10, the pulse power supply 18, and the treated tank 22 as described above. An inlet temperature measuring device 26 is provided.

【0024】入口温度計測器26は、殺菌処理部10の
入口付近に設けられていて、予備加熱器8から殺菌処理
部10に供給される液状物2の殺菌処理直前温度T1
計測して、この計測した殺菌処理直前温度T1 を制御装
置20aに与える。
The inlet temperature measuring device 26 is provided near the inlet of the sterilizing section 10 and measures the temperature T 1 immediately before the sterilizing process of the liquid 2 supplied to the sterilizing section 10 from the preheater 8. gives the sterilizing treatment just before temperatures T 1 which is the measurement to the controller 20a.

【0025】制御装置20aは、入口温度計測器26で
計測した殺菌処理直前温度T1 と殺菌処理部10におけ
る液状物2の殺菌処理後到達温度の目標値T2 とを用い
て、パルス電源18から殺菌処理部10へ供給するパル
ス電圧VP の繰返し周波数fであって、殺菌処理部10
における液状物2の殺菌処理後到達温度が前記目標値T
2 になる最適繰返し周波数f0 を演算し、この最適繰返
し周波数f0 になるように、パルス電源18から殺菌処
理部10へ供給するパルス電圧VP の繰返し周波数fを
制御する。
The control device 20a uses the temperature T 1 immediately before the sterilization process measured by the inlet temperature measuring device 26 and the target value T 2 of the attained temperature after the sterilization process of the liquid material 2 in the sterilization processing section 10 for the pulse power supply 18. a repetition frequency f of the pulse voltage V P supplied to the sterilization unit 10, sterilizing unit 10
Attained after the sterilization treatment of the liquid material 2 at the target value T
The optimum repetition frequency f 0 becomes 2 calculated, so as to the optimum repetition frequency f 0, and controls the repetition frequency f of the pulse voltage V P supplied from the pulse power source 18 to the sterilization unit 10.

【0026】従って、この例のパルス電源18は、それ
から出力するパルス電圧VP の少なくとも繰返し周波数
fが可変(制御装置20aからの制御によって可変)の
ものである。
[0026] Accordingly, the pulse power source 18 in this example, then at least the repetition frequency f of the pulse voltage V P to be output is of a variable (variable by control of the control unit 20a).

【0027】詳述すると、殺菌処理部10において、1
ショットのパルス電界EP の印加により、液状物2に
は、その単位体積当たり、次式で表されるエネルギーG
が投入される。ここで、Eはパルス電界EP の電界強度
[V/cm]、τはパルス電界EP のパルス幅[s]、
ρは液状物2の比抵抗[Ωcm]である。
More specifically, in the sterilization processing section 10, 1
The application of shot pulse electric field E P, the liquid substance 2, per unit volume, energy G represented by the following formula
Is input. Here, the electric field strength E is pulsed electric field E P [V / cm], the pulse width of τ is the pulse electric field E P [s],
ρ is the specific resistance [Ωcm] of the liquid material 2.

【0028】[0028]

【数2】G=E2 τ/ρ [J]G = E 2 τ / ρ [J]

【0029】その結果、液状物2のパルス電界1ショッ
ト当たりの上昇温度ΔTは、次式で表される。
As a result, the temperature rise ΔT per one shot of the pulsed electric field of the liquid material 2 is expressed by the following equation.

【0030】[0030]

【数3】 ΔT=G/4.2=E2 τ/4.2ρ [℃]ΔT = G / 4.2 = E 2 τ / 4.2ρ [° C.]

【0031】例えば、電界強度Eが50kV/cm、パ
ルス幅τが1μs、比抵抗ρが300Ωcmのときは、
殺菌処理部10においては液状物2はパルス電界EP
1ショット当たり約2℃上昇する。
For example, when the electric field strength E is 50 kV / cm, the pulse width τ is 1 μs, and the specific resistance ρ is 300 Ωcm,
The liquid substance in the sterilizing treatment unit 10 2 is raised about 2 ℃ per shot pulse electric field E P.

【0032】ここで、制御装置20aによる制御の具体
例を簡単に説明すると、例えば処理条件の一例として、
予備加熱器8から殺菌処理部10に供給される液状物2
の殺菌処理直前温度T1 が40℃であり、殺菌処理部1
0における10パルスのパルス電界EP 印加後の液状物
2の殺菌処理後到達温度が60℃(即ち上記ΔT=2
℃)である場合、何らかの理由で(例えば予備加熱器8
における加熱温度の変動等によって)、上記殺菌処理直
前温度T1 が36℃になったとしても、殺菌処理部10
において液状物2に印加するパルス電界EP のパルス数
N(これは全印加パルス数である)を12パルスにすれ
ば、殺菌処理部10における液状物2の殺菌処理後到達
温度を60℃の一定値に維持することができ、液状物2
の予備的な加熱温度のばらつきを補償することができ
る。このような制御を制御装置20aによって行う。
Here, a specific example of the control by the control device 20a will be briefly described.
Liquid material 2 supplied from preheater 8 to sterilization section 10
The temperature T 1 immediately before the sterilization treatment is 40 ° C.
0 temperature reached after sterilization of the liquid product 2 after pulsed electric field E P application of 10 pulses at the 60 ° C. (i.e. the [Delta] T = 2
° C) for some reason (eg preheater 8
), The temperature T 1 immediately before the sterilization treatment reaches 36 ° C.
In (which is a total number of applied pulses) pulse number N of the pulse electric field E P applied to the liquid material 2 if the 12 pulse, of 60 ° C. The sterilized after reaching the temperature of the liquid substance 2 in the sterilization unit 10 It can be maintained at a constant value,
Can compensate for variations in the preliminary heating temperature. Such control is performed by the control device 20a.

【0033】即ち、制御装置20aには、入口温度計測
器26から上記殺菌処理直前温度T 1 が与えられる。更
にこの例では、制御装置20aには、殺菌処理部10に
おける液状物2の殺菌処理後到達温度の目標値T2 、上
記数3に示した1ショット当たりの上昇温度ΔTおよび
上記数1の所で説明した殺菌処理部10の電界処理空間
の体積Mが設定される。更にこの例では、殺菌処理部1
0に供給される液状物2の上記流量Qを計測する流量計
24を殺菌処理部10の入口側に設けており、この流量
Qが制御装置20aに与えられる。但し、通常は殺菌処
理中に流量Qを変化させないので(即ち流量Qは一定で
あるので)、流量計24を設けずに、当該流量Qを制御
装置20aに設定しても良い。
That is, the controller 20a has an inlet temperature measurement.
From the vessel 26, the temperature T immediately before the sterilization treatment 1Is given. Change
In this example, the control device 20a includes a
Target value T of the temperature reached after the sterilization treatment of the liquid material 2Two,Up
The temperature rise ΔT per one shot shown in the notation 3 and
The electric field processing space of the sterilization processing unit 10 described in the above equation (1)
Is set. Further, in this example, the sterilizing section 1
Flow meter for measuring the above flow rate Q of the liquid material 2 supplied to 0
24 is provided on the inlet side of the sterilizing section 10 and the flow rate
Q is provided to control device 20a. However, usually sterilization
Since the flow rate Q is not changed during processing (that is, the flow rate Q is
Control of the flow rate Q without providing the flow meter 24
It may be set in the device 20a.

【0034】殺菌処理直前温度がT1 で殺菌処理後到達
温度の目標値がT2 とすると、殺菌処理部10において
液状物2に印加する最適パルス数N0 は、次式で表され
る。最適とは、殺菌処理部10における液状物2の殺菌
処理後到達温度とその目標値との差を無くすることがで
きる温度、という意味である。
Assuming that the temperature immediately before the sterilization process is T 1 and the target value of the attained temperature after the sterilization process is T 2 , the optimum number of pulses N 0 applied to the liquid material 2 in the sterilization processing unit 10 is expressed by the following equation. The term “optimal” means a temperature at which the difference between the temperature reached after sterilization of the liquid material 2 in the sterilization processing unit 10 and its target value can be eliminated.

【0035】[0035]

【数4】N0 =(T2 −T1 )/ΔTN 0 = (T 2 −T 1 ) / ΔT

【0036】この数4と前記数1および数3とにより、
殺菌処理部10における液状物2の殺菌処理後到達温度
が前記目標値T2 になる最適繰返し周波数f0 を求める
ことができる。それを次式に示す。
## EQU4 ## From Equation (4) and Equations (1) and (3) above,
The optimum repetition frequency f 0 at which the temperature reached after the sterilization of the liquid material 2 in the sterilization processing section 10 becomes the target value T 2 can be obtained. It is shown in the following equation.

【0037】[0037]

【数5】f0 =(T2 −T1 )Q/ΔTM [Hz]F 0 = (T 2 −T 1 ) Q / ΔTM [Hz]

【0038】制御装置20aは、例えばこの数5のよう
な演算を行い、この演算で求めた最適繰返し周波数f0
になるように、パルス電源18から殺菌処理部10に供
給するパルス電圧VP の繰返し周波数fを制御する。
The control device 20a performs an operation such as the following equation (5), and determines the optimum repetition frequency f 0 obtained by this operation.
So that, to control the repetition frequency f of the pulse voltage V P to be supplied to the sterilization unit 10 from the pulse power source 18.

【0039】殺菌処理部10へ供給するパルス電圧VP
の繰返し周波数fを制御することによって、殺菌処理部
10におけるパルス電界印加殺菌処理に伴う液状物2の
温度上昇を正確にかつ速やかに制御することができる。
The pulse voltage V P supplied to the sterilizing section 10
By controlling the repetition frequency f, the temperature rise of the liquid material 2 due to the pulsed electric field sterilization in the sterilization processing unit 10 can be accurately and promptly controlled.

【0040】即ち、パルス電界EP の印加による液状物
2の温度上昇は、ヒータ等を用いて液状物2を間接的に
加熱する予備加熱器8の場合と違って、液状物2にエネ
ルギーが直接投入されるので、上記数3から正確に把握
することができる。従って、パルス電界EP の制御、よ
り具体的にはその繰返し周波数fの制御によって、液状
物2の温度上昇を正確に制御することができる。
[0040] That is, the temperature rise of the liquid product 2 due to the application of the pulsed electric field E P, unlike the case of the preheater 8 to indirectly heat the liquid material 2 by using a heater or the like, the energy in the liquid substance 2 Since it is directly input, it can be accurately grasped from the above equation (3). Therefore, control of the pulse electric field E P, more specifically can be the control of the repetition frequency f, to precisely control the temperature rise of the liquid product 2.

【0041】しかも、パルス電界EP の印加によって液
状物2にエネルギーを直接投入して液状物2の温度を制
御することができるので、ヒータ等を有する予備加熱器
8およびそのフィードバック制御系を用いた場合に比べ
て、液状物2の温度制御を速やかに(即ち時間応答性良
く)行うことができる。従って、この殺菌装置の立ち上
げ時等の過渡的な温度条件時においても、素早く温度制
御を行うことができる。
[0041] Moreover, it is possible to the energy in the liquid substance 2 by the application of pulsed electric field E P directly introduced to control the temperature of the liquid product 2, use the preheater 8 and a feedback control system having a heater The temperature control of the liquid material 2 can be performed promptly (that is, with a good time response) as compared with the case where the liquid material 2 is provided. Therefore, temperature control can be performed quickly even under transient temperature conditions such as when the sterilizer is started.

【0042】また、制御装置20aによる上記制御は、
言わば、殺菌処理部10における液状物2の殺菌処理後
到達温度を事前に予測して制御するものであるので、一
種のフィードフォワード制御であり、殺菌処理部10に
おける液状物2の実際の殺菌処理後到達温度を計測して
それに補正をかけるフィードバック制御よりも、時間応
答性が高いと言える。
The control by the control device 20a is as follows.
In other words, it is a kind of feed-forward control because the temperature reached after the sterilization of the liquid material 2 in the sterilization processing unit 10 is predicted and controlled in advance, and the actual sterilization processing of the liquid material 2 in the sterilization processing unit 10 is performed. It can be said that the time responsiveness is higher than that of feedback control in which the post-attainment temperature is measured and corrected.

【0043】従って、制御装置20aによって、上記の
ような繰返し周波数fの制御を行うことによって、予備
加熱器8による液状物2の予備的な加熱温度にばらつき
が生じても、これを速やかに補償して、殺菌処理部10
における液状物2の殺菌処理後到達温度のばらつきを無
くして一定にすることができる。その結果、液状物2に
対する殺菌効果のばらつきを防止することができる。
Accordingly, by controlling the repetition frequency f as described above by the control device 20a, even if the preliminary heating temperature of the liquid material 2 by the preliminary heater 8 fluctuates, it is quickly compensated. And sterilization processing unit 10
In this case, it is possible to eliminate the variation in the temperature reached after the sterilization treatment of the liquid material 2 and keep the temperature constant. As a result, it is possible to prevent variations in the germicidal effect on the liquid material 2.

【0044】また、図3の所で説明した従来のフィード
バック制御系では、時間応答性を高めて予備加熱の精度
を上げるためには、系全体を応答性の非常に高い高級な
ものにせざるを得ず、従って予備加熱器8およびそのフ
ィードバック制御系を含めた予備加熱系のコストが非常
に嵩むという問題が生じるけれども、この発明の殺菌装
置では、前述したように元々(本来)時間応答性が良い
ので、予備加熱の精度を高める方法に比べて、装置のコ
ストを安くすることができる。
Further, in the conventional feedback control system described with reference to FIG. 3, in order to improve the time response and the accuracy of the preheating, the entire system has to be of a very high-grade high response. Although the cost of the pre-heating system including the pre-heating device 8 and its feedback control system is extremely high, the sterilizing apparatus of the present invention originally has a time response as originally described. As a result, the cost of the apparatus can be reduced as compared with the method of increasing the accuracy of the preheating.

【0045】上記例は、殺菌処理部10に供給するパル
ス電圧VP の繰返し周波数f、即ち殺菌処理部10にお
いて液状物2に印加するパルス電界EP の繰返し周波数
fを制御することによって、液状物2の予備加熱温度の
ばらつきを補償するものであるが、繰返し周波数fを制
御する代わりに(即ち繰返し周波数fは一定としておい
て)、殺菌処理部10において液状物2に印加するパル
ス電界EP の電界強度Eを制御しても良い。電界強度E
の制御によっても、上記数3からも分かるように、繰返
し周波数fの制御の場合と同様に、殺菌処理部10にお
ける液状物2の温度上昇を正確にかつ応答性良く制御す
ることができるからである。従って、繰返し周波数fを
制御する上記例と同様の効果を奏する。電界強度Eの制
御は、具体的には殺菌処理部10に供給するパルス電圧
P の電圧値Vの制御によって行う。
In the above example, the repetition frequency f of the pulse voltage V P supplied to the sterilizing section 10, that is, the repetition frequency f of the pulse electric field E P applied to the liquid material 2 in the sterilizing section 10 is controlled. In order to compensate for the variation in the preheating temperature of the object 2, instead of controlling the repetition frequency f (that is, keeping the repetition frequency f constant), the pulse electric field E applied to the liquid material 2 in the sterilization processing unit 10 The electric field intensity E of P may be controlled. Electric field strength E
As can be seen from the above equation (3), similarly to the case of the control of the repetition frequency f, the temperature rise of the liquid material 2 in the sterilizing section 10 can be controlled accurately and with good responsiveness. is there. Therefore, the same effect as in the above example in which the repetition frequency f is controlled is obtained. Control of the electric field strength E is specifically performed by controlling the voltage value V of the pulse voltage V P to be supplied to the sterilization unit 10.

【0046】即ち、上記数3および数4から、殺菌処理
部10における液状物2の殺菌処理後到達温度が前記目
標値T2 になる最適電界強度E0 は、次式で表される。
That is, from the above equations (3) and (4), the optimum electric field intensity E 0 at which the temperature after the sterilization of the liquid material 2 in the sterilization processing section 10 reaches the target value T 2 is expressed by the following equation.

【0047】[0047]

【数6】E0 =√{(T2 −T1 )Q4.2ρ/Mf
τ} [V/cm]
E 0 = √ {(T 2 −T 1 ) Q4.2ρ / Mf
τ} [V / cm]

【0048】一方、殺菌処理部10の両電極12、14
間の距離をd[cm]とすると、殺菌処理部10に印加
するパルス電圧VP の電圧値(換言すれば電圧の大き
さ、または振幅)Vと、殺菌処理部10におけるパルス
電界EP の電界強度Eとの間には、次式の関係が成立す
る。
On the other hand, both electrodes 12, 14 of the sterilizing section 10
When the distance between the d [cm], the voltage value of the pulse voltage V P applied to the sterilizing unit 10 (in other words, the voltage magnitude, or amplitude) and V, of the pulse electric field E P in the sterilization unit 10 The following relationship is established with the electric field strength E.

【0049】[0049]

【数7】E=V/d [V/cm]E = V / d [V / cm]

【0050】従ってこの数7および上記数6から、殺菌
処理部10における液状物2の殺菌処理後到達温度が前
記目標値T2 になる最適電圧値V0 は、次式で表され
る。
Accordingly, from the equations (7) and (6), the optimum voltage value V 0 at which the temperature after the sterilization of the liquid material 2 in the sterilization section 10 reaches the target value T 2 is expressed by the following equation.

【0051】[0051]

【数8】V0 =E0 d=√{(T2 −T1 )Q4.2ρ
/Mfτ}×d [V]
V 0 = E 0 d = √ {(T 2 −T 1 ) Q4.2ρ
/ Mfτ} × d [V]

【0052】従って、制御装置20aは、例えばこの数
8のような演算を行って、この演算で求めた最適電圧値
0 になるように、パルス電源18から殺菌処理部10
に供給するパルス電圧VP の電圧値Vを制御するように
しても良い。その場合は、制御装置20aには、上記上
昇温度ΔTの代わりに、上記数8を構成する比抵抗ρ、
繰返し周波数f、パルス幅τおよび距離dを設定すれば
良い。また、パルス電源18は、それから出力するパル
ス電圧VP の少なくとも電圧値Vが可変(制御装置20
aからの制御によって可変)のものとしておけば良い。
Therefore, the control device 20a performs an operation, for example, as shown in the following equation (8), and controls the sterilization processing unit 10 from the pulse power supply 18 so that the optimum voltage value V 0 obtained by the operation is obtained.
It may be to control the voltage value V of the pulse voltage V P to be supplied to. In this case, instead of the temperature increase ΔT, the control device 20a provides the specific resistance ρ that constitutes Expression 8 above,
What is necessary is just to set the repetition frequency f, the pulse width τ, and the distance d. The pulse power supply 18, then at least the voltage value V variable (controller of the pulse voltage V P to output 20
(variable under control from a).

【0053】なお、殺菌処理部10に印加するパルス電
圧VP のパルス幅τを制御するという考えもあるけれど
も、パルス幅τは通常はパルス電源18の回路定数によ
って一つの値に固定されていて、任意に制御することは
困難であるので、この考えを採用することは好ましくな
い。
[0053] Incidentally, although there is also considered that controls the pulse width τ of the pulse voltage V P applied to the sterilization unit 10, the pulse width τ usually be fixed to a single value by a circuit constant of the pulse power source 18 It is not preferable to adopt this idea because it is difficult to arbitrarily control.

【0054】図2は、この発明に係る殺菌装置の他の例
を示す概略図である。以下においては、図1の例との相
違点を主体に説明する。
FIG. 2 is a schematic view showing another example of the sterilizer according to the present invention. The following mainly describes the differences from the example of FIG.

【0055】この例の殺菌装置は、簡単に言えば、殺菌
処理部10から出た直後の液状物2の殺菌処理後到達温
度T3 と上記目標温度(目標値)T2 とのずれを検出
し、殺菌処理後到達温度T3 が目標温度T2 より低けれ
ばそれに応じてパルス電圧VPの繰返し周波数f(また
は電圧値V)を増加し、逆であればパルス電圧VP の繰
返し周波数f(または電圧値V)を減少させるものであ
る。このような制御を、制御装置20bによって行う。
In brief, the sterilization apparatus of this example detects a difference between the temperature T 3 after the sterilization of the liquid material 2 immediately after it has exited from the sterilization processing section 10 and the target temperature (target value) T 2. and, if the post-sterilization temperature reached T 3 lower than the target temperature T 2 increases the pulse voltage V P of the repetition frequency f (or the voltage value V) accordingly, if the reverse pulse voltage V P repetition frequency f (Or the voltage value V). Such control is performed by the control device 20b.

【0056】そのために、この例では、前記入口温度計
測器26(図1参照)の代わりに、殺菌処理部10の出
口付近に、殺菌処理部10から出た直後の液状物2の殺
菌処理後到達温度T3 を計測する出口温度計測器28を
設けており、これによって計測した殺菌処理後到達温度
3 を制御装置20bに与える。
For this purpose, in this example, instead of the inlet temperature measuring device 26 (see FIG. 1), the liquid material 2 immediately after exiting from the sterilizing section 10 is sterilized near the outlet of the sterilizing section 10. An outlet temperature measuring device 28 for measuring the attained temperature T 3 is provided, and the after-sterilization attained temperature T 3 measured by this is given to the control device 20b.

【0057】殺菌処理後到達温度の目標値T2 と計測値
3 との差を0にするためには、パルス電源18から殺
菌処理部10に印加するパルス電圧VP のパルス数Nを
次式分だけ増減させれば良い。ΔTは、前述した1ショ
ット当たりの上昇温度である。
[0057] To a difference between the target value T 2 of the post-sterilization temperature reached and the measured value T 3 to 0, the pulse number N of the pulse voltage V P applied to the sterilization unit 10 from the pulse power source 18 following What is necessary is just to increase or decrease by the formula. ΔT is the above-mentioned temperature rise per shot.

【0058】[0058]

【数9】ΔN=(T2 −T3 )/ΔT## EQU9 ## ΔN = (T 2 −T 3 ) / ΔT

【0059】これを、上記数1の関係を用いて、パルス
電源18から殺菌処理部10に印加するパルス電圧VP
の繰返し周波数fに直すと、繰返し周波数fの増減分Δ
fは、次式で表される。
The pulse voltage V P applied to the sterilization unit 10 from the pulse power source 18 is calculated using the above equation (1).
To the repetition frequency f, the increase / decrease Δ of the repetition frequency f
f is represented by the following equation.

【0060】[0060]

【数10】 Δf=(T2 −T3 )Q/ΔTM [Hz]Δf = (T 2 −T 3 ) Q / ΔTM [Hz]

【0061】この数10に従って繰返し周波数fを増減
させる制御(フィードバック制御)を、この例では制御
装置20bが行う。従って、この例のパルス電源18
は、それから出力するパルス電圧VP の少なくとも繰返
し周波数fが可変(制御装置20bからの制御によって
可変)のものである。
Control (feedback control) for increasing or decreasing the repetition frequency f according to the equation (10) is performed by the control device 20b in this example. Therefore, the pulse power supply 18 of this example
Is then at least the repetition frequency f of the pulse voltage V P to be output is of a variable (variable by control of the control unit 20b).

【0062】これによって、予備加熱器8による液状物
2の予備的な加熱温度にばらつきが生じても、これを補
償して、殺菌処理部10における液状物2の殺菌処理後
到達温度のばらつきを無くして一定にすることができ
る。その結果、液状物2に対する殺菌効果のばらつきを
防止することができる。
As a result, even if the preliminary heating temperature of the liquid 2 by the pre-heater 8 fluctuates, this is compensated for, and the fluctuation of the temperature reached after the sterilization of the liquid 2 in the sterilization section 10 is compensated for. It can be kept constant without it. As a result, it is possible to prevent variations in the germicidal effect on the liquid material 2.

【0063】しかも、この例の場合も、図1の例の場合
と同様、殺菌処理部10における液状物2に印加するパ
ルス電界EP の制御によって液状物2の温度上昇を制御
するので、液状物2の温度制御を正確にかつ速やかに
(即ち時間応答性良く)行うことができる。
[0063] Moreover, in the case of this example, as in the example of FIG. 1, and controls the temperature rise of the liquid product 2 under the control of the pulsed electric field E P applied to the liquid substance 2 in the sterilization unit 10, the liquid The temperature of the object 2 can be controlled accurately and promptly (that is, with good time response).

【0064】また、この図2の例の場合も、上記図1の
例の場合と同様、繰返し周波数fを増減する代わりに
(即ち繰返し周波数fは一定としておいて)、殺菌処理
部10に印加するパルス電圧VP の電圧値Vを増減させ
ても良い。その場合も、繰返し周波数fを制御する場合
と同様の効果を奏する。
Also in the case of the example of FIG. 2, instead of increasing / decreasing the repetition frequency f (that is, keeping the repetition frequency f constant), as in the example of FIG. the voltage value V of the pulse voltage V P may be increased or decreased to. In this case, the same effect as in the case where the repetition frequency f is controlled can be obtained.

【0065】この場合、殺菌処理後到達温度の目標値T
2 と計測値T3 との差を0にするためには、パルス電源
18から殺菌処理部10へ印加するパルス電圧VP の電
圧値Vを次式に従って増減させれば良い。
In this case, the target value T of the temperature reached after the sterilization treatment
The difference between the 2 and the measured value T 3 to 0, the voltage value V of the pulse voltage V P applied from the pulse power source 18 to the sterilization unit 10 may be increased or decreased according to the following equation.

【0066】[0066]

【数11】ΔV=√{(T2 −T3 )Q4.2ρ/Mf
τ}×d [V]
ΔV = √ {(T 2 −T 3 ) Q4.2ρ / Mf
τ} × d [V]

【0067】この数11に従って電圧値Vを増減する制
御(フィードバック制御)を、この例では制御装置20
bが行う。この場合の制御装置20bに設定するパラメ
ータは、図1の例においてパルス電圧VP の電圧値Vを
制御する場合と同様である。また、パルス電源18は、
それから出力するパルス電圧VP の少なくとも電圧値V
が可変(制御装置20bからの制御によって可変)のも
のとしておけば良い。
The control (feedback control) for increasing or decreasing the voltage value V according to the equation (11) is performed in this example.
b does. Parameters to be set in the control unit 20b in this case is similar to the case of controlling the voltage value V of the pulse voltage V P in the example of FIG. The pulse power supply 18
At least the voltage value V of the pulse voltage V P therefrom to output
Is variable (variable by control from the control device 20b).

【0068】なお、殺菌処理部10へ未処理の液状物2
を供給し、かつ殺菌処理部10から処理済の液状物2を
回収する手段は、上記例のものに限らない。
The untreated liquid material 2 is added to the sterilizing section 10.
The means for supplying the liquid and recovering the processed liquid material 2 from the sterilization processing unit 10 is not limited to the above example.

【0069】また、殺菌処理部10における殺菌処理後
の液状物2を、長期保存等の目的で、冷却するようにし
ても良い。
Further, the liquid material 2 after the sterilization treatment in the sterilization treatment section 10 may be cooled for the purpose of long-term storage or the like.

【0070】また、殺菌処理後の液状物2の冷却と殺菌
処理前の液状物2の予備加熱とを兼ねて、省エネルギー
等の観点から、双方の液状物2を熱交換するようにして
も良い。
Further, both cooling of the liquid material 2 after the sterilization process and preheating of the liquid material 2 before the sterilization process may be performed so that both the liquid materials 2 are heat-exchanged from the viewpoint of energy saving. .

【0071】殺菌処理部10の構造が、平行平板状電極
に限らず、他の構造、例えば同軸状電極等でも良いこと
は前述のとおりである。
As described above, the structure of the sterilizing section 10 is not limited to the parallel plate electrode, but may be another structure such as a coaxial electrode.

【0072】また、パルス電源18から殺菌処理部10
に供給するパルス電圧VP の波形は、特定のものに限定
されるものではなく、例えば矩形波形、指数減衰波形、
正弦波形、これらの合成波形等でも良い。
Further, the pulse power source 18 supplies the sterilizing section 10
The waveform of the pulse voltage V P supplied to, is not limited to a specific one, for example, a rectangular waveform, exponential decay waveform,
A sine waveform, a composite waveform thereof, or the like may be used.

【0073】[0073]

【発明の効果】以上のようにこの発明は、殺菌処理部に
印加するパルス電圧の繰返し周波数または電圧値を制御
することによって、殺菌処理部における液状物に加える
エネルギーを直接制御して液状物の温度上昇を制御する
ことができるので、液状物の温度制御を正確にかつ速や
かに行うことができる。従って、予備加熱器による液状
物の予備的な加熱温度にばらつきが生じても、これを速
やかに補償して、殺菌処理部における液状物の殺菌処理
後到達温度のばらつきを無くして一定にすることがで
き、それによって液状物に対する殺菌効果のばらつきを
防止することができる。
As described above, according to the present invention, by controlling the repetition frequency or the voltage value of the pulse voltage applied to the sterilizing section, the energy applied to the liquid in the sterilizing section is directly controlled to control the liquid substance. Since the temperature rise can be controlled, the temperature of the liquid material can be accurately and promptly controlled. Therefore, even if there is a variation in the preliminary heating temperature of the liquid material by the pre-heater, it is to be compensated promptly to eliminate the variation in the temperature reached after the sterilization processing of the liquid material in the sterilization processing section and to keep it constant. Thus, it is possible to prevent the germicidal effect on the liquid material from fluctuating.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明に係る殺菌装置の一例を示す概略図で
ある。
FIG. 1 is a schematic view showing an example of a sterilizer according to the present invention.

【図2】この発明に係る殺菌装置の他の例を示す概略図
である。
FIG. 2 is a schematic view showing another example of the sterilizing apparatus according to the present invention.

【図3】従来の殺菌装置の一例を示す概略図である。FIG. 3 is a schematic view showing an example of a conventional sterilization apparatus.

【符号の説明】[Explanation of symbols]

2 液状物 8 予備加熱器 10 殺菌処理部 12、14 電極 18 パルス電源 20a、20b 制御装置 26 入口温度計測器 28 出口温度計測器 VP パルス電圧 EP パルス電界2 liquid material 8 preheater 10 sterilization section 12, 14 electrodes 18 pulse power supply 20a, 20b control unit 26 inlet temperature instruments 28 outlet temperature instruments V P pulse voltage E P pulse field

───────────────────────────────────────────────────── フロントページの続き (72)発明者 加藤 茂 京都府京都市右京区梅津高畝町47番地 日 新電機株式会社内 (72)発明者 川北 有 京都府京都市右京区梅津高畝町47番地 日 新電機株式会社内 Fターム(参考) 4B021 LA42 LP01 LT03 LT06 LW06 4C058 AA21 AA22 AA30 BB02 BB10 CC01 CC02 DD02 DD04 DD12 DD20 EE12 EE26 4D061 DA03 DA10 DB01 EA02 EB01 EB07 EB14 EB18 EB19 EB37 EB39 FA01 GA09 GC11 GC14 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Shigeru Kato 47-47 Umezu Takaune-cho, Ukyo-ku, Kyoto-shi, Kyoto (72) Inventor Kawakita Yes 47-47 Umezu-Takaune-cho, Ukyo-ku, Kyoto, Kyoto Nissin Electric In-house F term (reference) 4B021 LA42 LP01 LT03 LT06 LW06 4C058 AA21 AA22 AA30 BB02 BB10 CC01 CC02 DD02 DD04 DD12 DD20 EE12 EE26 4D061 DA03 DA10 DB01 EA02 EB01 EB07 EB14 EB18 EB19 GC01 EB39 GA01

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 互いに沿って配置された二つの電極を有
していて両電極間に液状物が流される殺菌処理部と、こ
の殺菌処理部の二つの電極間にパルス電圧を繰り返して
供給して両電極間の液状物にパルス電界を繰り返して印
加するパルス電源と、前記殺菌処理部へ供給する液状物
を予備的に加熱する予備加熱器とを備える液状物の殺菌
装置において、 前記殺菌処理部に供給される液状物の殺菌処理直前温度
を計測する入口温度計測器と、 この入口温度計測器で計測した殺菌処理直前温度と前記
殺菌処理部における液状物の殺菌処理後到達温度の目標
値とを用いて、前記パルス電源から前記殺菌処理部へ供
給するパルス電圧の繰返し周波数であって、前記殺菌処
理部における液状物の殺菌処理後到達温度が前記目標値
になる最適繰返し周波数を演算し、この最適繰返し周波
数になるように、前記パルス電源から前記殺菌処理部へ
供給するパルス電圧の繰返し周波数を制御する制御装置
とを備えることを特徴とする液状物の殺菌装置。
1. A sterilization section having two electrodes arranged alongside each other and through which a liquid material flows, and a pulse voltage is repeatedly supplied between the two electrodes of the sterilization section. A sterilizing apparatus for a liquid material, comprising: a pulse power supply for repeatedly applying a pulse electric field to the liquid material between the two electrodes; and a preheater for preliminarily heating the liquid material to be supplied to the sterilizing unit. An inlet temperature measuring device for measuring the temperature immediately before the sterilization treatment of the liquid material supplied to the part, and a target value of the temperature immediately before the sterilization treatment measured by the inlet temperature measuring device and the attained temperature after the sterilization treatment of the liquid material in the sterilization processing part. Using, the repetition frequency of the pulse voltage supplied from the pulse power supply to the sterilization processing unit, the optimal repetition frequency at which the temperature reached after the sterilization processing of the liquid material in the sterilization processing unit is the target value. Calculated, and the optimum so that the repetition frequency, the sterilizer of the liquid material, characterized in that it comprises a control device for controlling the repetition frequency of the pulse voltage supplied from the pulse power source to the sterilization section.
【請求項2】 互いに沿って配置された二つの電極を有
していて両電極間に液状物が流される殺菌処理部と、こ
の殺菌処理部の二つの電極間にパルス電圧を繰り返して
供給して両電極間の液状物にパルス電界を繰り返して印
加するパルス電源と、前記殺菌処理部へ供給する液状物
を予備的に加熱する予備加熱器とを備える液状物の殺菌
装置において、 前記殺菌処理部に供給される液状物の殺菌処理直前温度
を計測する入口温度計測器と、 この入口温度計測器で計測した殺菌処理直前温度と前記
殺菌処理部における液状物の殺菌処理後到達温度の目標
値とを用いて、前記パルス電源から前記殺菌処理部へ供
給するパルス電圧の電圧値であって、前記殺菌処理部に
おける液状物の殺菌処理後到達温度が前記目標値になる
最適電圧値を演算し、この最適電圧値になるように、前
記パルス電源から前記殺菌処理部へ供給するパルス電圧
の電圧値を制御する制御装置とを備えることを特徴とす
る液状物の殺菌装置。
2. A sterilizing section having two electrodes arranged alongside each other, through which a liquid material flows between the two electrodes, and a pulse voltage is repeatedly supplied between the two electrodes of the sterilizing section. A sterilizing apparatus for a liquid material, comprising: a pulse power supply for repeatedly applying a pulse electric field to the liquid material between the two electrodes; and a preheater for preliminarily heating the liquid material to be supplied to the sterilizing unit. An inlet temperature measuring device for measuring the temperature immediately before the sterilization treatment of the liquid material supplied to the part, and a target value of the temperature immediately before the sterilization treatment measured by the inlet temperature measuring device and the attained temperature after the sterilization treatment of the liquid material in the sterilization processing part. With the use of the pulse power supply from the pulse power supply to the sterilization processing unit is a voltage value of the pulse voltage, the optimal voltage value at which the target temperature after the sterilization processing of the liquid material in the sterilization processing unit reaches the target value. ,this So that the proper voltage value, sterilizer liquid product, characterized in that it comprises a control device for controlling a voltage value of the pulse voltage supplied from the pulse power source to the sterilization section.
【請求項3】 互いに沿って配置された二つの電極を有
していて両電極間に液状物が流される殺菌処理部と、こ
の殺菌処理部の二つの電極間にパルス電圧を繰り返して
供給して両電極間の液状物にパルス電界を繰り返して印
加するパルス電源と、前記殺菌処理部へ供給する液状物
を予備的に加熱する予備加熱器とを備える液状物の殺菌
装置において、 前記殺菌処理部から出た直後の液状物の殺菌処理後到達
温度を計測する出口温度計測器と、 この出口温度計測器で計測した殺菌処理後到達温度と前
記殺菌処理部における液状物の殺菌処理後到達温度の目
標値とを用いて、両温度の差が0になるように、前記パ
ルス電源から前記殺菌処理部へ供給するパルス電圧の繰
返し周波数を増減させる制御装置とを備えることを特徴
とする液状物の殺菌装置。
3. A sterilizing section having two electrodes arranged alongside each other, through which a liquid material flows, and a pulse voltage is repeatedly supplied between the two electrodes of the sterilizing section. A sterilizing apparatus for a liquid material, comprising: a pulse power supply for repeatedly applying a pulse electric field to the liquid material between the two electrodes; and a preheater for preliminarily heating the liquid material to be supplied to the sterilizing unit. Outlet temperature measuring device for measuring the temperature reached after the sterilization of the liquid material immediately after leaving the section, and the temperature reached after the sterilization treatment measured by the outlet temperature measuring device and the temperature reached after the sterilization of the liquid material in the sterilization processing section And a control device for increasing or decreasing the repetition frequency of a pulse voltage supplied from the pulse power supply to the sterilization processing unit so that the difference between the two temperatures becomes zero using the target value of the liquid material. Sterilization equipment .
【請求項4】 互いに沿って配置された二つの電極を有
していて両電極間に液状物が流される殺菌処理部と、こ
の殺菌処理部の二つの電極間にパルス電圧を繰り返して
供給して両電極間の液状物にパルス電界を繰り返して印
加するパルス電源と、前記殺菌処理部へ供給する液状物
を予備的に加熱する予備加熱器とを備える液状物の殺菌
装置において、 前記殺菌処理部から出た直後の液状物の殺菌処理後到達
温度を計測する出口温度計測器と、 この出口温度計測器で計測した殺菌処理後到達温度と前
記殺菌処理部における液状物の殺菌処理後到達温度の目
標値とを用いて、両温度の差が0になるように、前記パ
ルス電源から前記殺菌処理部へ供給するパルス電圧の電
圧値を増減させる制御装置とを備えることを特徴とする
液状物の殺菌装置。
4. A sterilizing section having two electrodes arranged alongside each other and through which a liquid material flows, and a pulse voltage is repeatedly supplied between the two electrodes of the sterilizing section. A sterilizing apparatus for a liquid material, comprising: a pulse power supply for repeatedly applying a pulse electric field to the liquid material between the two electrodes; and a preheater for preliminarily heating the liquid material to be supplied to the sterilizing unit. Outlet temperature measuring device for measuring the temperature reached after the sterilization of the liquid material immediately after leaving the section, and the temperature reached after the sterilization treatment measured by the outlet temperature measuring device and the temperature reached after the sterilization of the liquid material in the sterilization processing section And a control device for increasing or decreasing a voltage value of a pulse voltage supplied from the pulse power supply to the sterilization processing unit so that a difference between the two temperatures becomes zero using the target value of the liquid material. Sterilization equipment.
JP11027422A 1999-02-04 1999-02-04 Sterilizer for liquid Pending JP2000225175A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11027422A JP2000225175A (en) 1999-02-04 1999-02-04 Sterilizer for liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11027422A JP2000225175A (en) 1999-02-04 1999-02-04 Sterilizer for liquid

Publications (1)

Publication Number Publication Date
JP2000225175A true JP2000225175A (en) 2000-08-15

Family

ID=12220676

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2000225175A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008510617A (en) * 2004-08-23 2008-04-10 オーテック・リサーチ・インコーポレーテッド Method and apparatus for preparing water with high oxygen solubility
JP2015536640A (en) * 2012-09-24 2015-12-24 ネステク ソシエテ アノニム Method and system for energy balance control against supply flow rate and supply temperature turbulence
KR20180110263A (en) * 2017-03-27 2018-10-10 서울대학교산학협력단 Pulse ohmic heating apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008510617A (en) * 2004-08-23 2008-04-10 オーテック・リサーチ・インコーポレーテッド Method and apparatus for preparing water with high oxygen solubility
JP2015536640A (en) * 2012-09-24 2015-12-24 ネステク ソシエテ アノニム Method and system for energy balance control against supply flow rate and supply temperature turbulence
KR20180110263A (en) * 2017-03-27 2018-10-10 서울대학교산학협력단 Pulse ohmic heating apparatus
KR101975294B1 (en) 2017-03-27 2019-05-08 서울대학교 산학협력단 Pulse ohmic heating apparatus

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