JP2000160317A - Plasma thermal spraying device - Google Patents

Plasma thermal spraying device

Info

Publication number
JP2000160317A
JP2000160317A JP10333578A JP33357898A JP2000160317A JP 2000160317 A JP2000160317 A JP 2000160317A JP 10333578 A JP10333578 A JP 10333578A JP 33357898 A JP33357898 A JP 33357898A JP 2000160317 A JP2000160317 A JP 2000160317A
Authority
JP
Japan
Prior art keywords
anode
hole
cathode
gas
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP10333578A
Other languages
Japanese (ja)
Inventor
Tetsuya Matsuo
哲也 松尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP10333578A priority Critical patent/JP2000160317A/en
Publication of JP2000160317A publication Critical patent/JP2000160317A/en
Withdrawn legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a plasma thermal spraying device which is capable of effectively using a flux to improve the thermal spraying efficiency. SOLUTION: A plasma thermal spraying device is provided with an anode 11 having a through hole 11a passing through one end side and the other end side, a cathode 12 which is arranged in the vicinity of one end side of the through hole 11a of the anode 11, a working gas feeding means to feed a working gas 4 to one end side of the through hole 11a of the anode 11, a power source 13 which is connected to the anode 11 and the cathode 12 to generate a plasma arc 5 between the anode 11 and the cathode 12, a guide vane 14 which is provided on an inner circumferential surface of the through hole 11a of the anode 11 to give the spirally whirling flow to a plasma gas 6 circulating in the through hole 11a, and a flux feeding means to feed a flux 2 together with a carrying gas 3 to the plasma gas 6 ejected from the other end side of the through hole 11a of the anode 11, and the staying time of the flux 2 in the plasma gas 6 is increased to surely melt the flux 2 by melting the flux 2 while spirally whirling the flux together with the plasma gas 6.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、プラズマ溶射装置
に関する。
[0001] The present invention relates to a plasma spraying apparatus.

【0002】[0002]

【従来の技術】従来のプラズマ溶射装置の概略構造を図
4に示す。図4に示すように、一端側と他端側とを貫通
する貫通穴111aを有する陽極111の一端側(基端
側)近傍には、円柱状の陰極112が当該陽極111の
貫通穴111aの同軸上に配設されている。陽極111
と陰極112とは、電源113に接続している。陽極1
11の貫通穴111aの基端側には、アルゴンガスやヘ
リウムガスや窒素ガスなどのような作動ガス4を送給す
る図示しない作動ガス送給手段が連絡している。一方、
陽極111の貫通穴111aの他端側(先端側)近傍に
は、セラミックスや金属などからなる粒子状の被覆材2
をアルゴンガスなどのような搬送ガス3と共に当該貫通
穴111aの径方向に向けて送給する図示しない被覆材
送給手段が連絡している。
2. Description of the Related Art FIG. 4 shows a schematic structure of a conventional plasma spraying apparatus. As shown in FIG. 4, in the vicinity of one end (base end) of the anode 111 having a through hole 111 a penetrating the one end and the other end, a columnar cathode 112 is connected to the through hole 111 a of the anode 111. They are arranged coaxially. Anode 111
And the cathode 112 are connected to a power supply 113. Anode 1
A working gas supply unit (not shown) for supplying a working gas 4 such as an argon gas, a helium gas, or a nitrogen gas is connected to a base end side of the through hole 111a. on the other hand,
In the vicinity of the other end (front end side) of the through hole 111a of the anode 111, a particulate coating material 2 made of ceramic, metal, or the like is provided.
Is connected to the carrier gas 3 such as argon gas in the radial direction of the through-hole 111a.

【0003】このようなプラズマ溶射装置の作用を次に
説明する。前記作動ガス送給手段から陽極111の貫通
穴111aに作動ガス4を送給すると共に、電源113
を作動して陽極111と陰極112との間に電圧を印加
すると、当該電極111,112間でプラズマアーク5
が発生し、上記作動ガス4が高温高圧のプラズマガス6
となって陽極111の貫通穴111aから噴出する。こ
れと同時に、前記被覆材送給手段から被覆材2を搬送ガ
ス3と共にプラズマガス6へ向けて送給すると、当該被
覆材2がプラズマガス6と共に流れながら溶融し、陽極
111の貫通穴111aに対面している基材1に被着し
て、基材1に被覆材2の溶射被膜が形成される。
[0003] The operation of such a plasma spraying apparatus will be described below. The working gas supply means supplies the working gas 4 to the through-hole 111 a of the anode 111 and a power supply 113.
Is operated to apply a voltage between the anode 111 and the cathode 112, and the plasma arc 5 is applied between the electrodes 111 and 112.
Is generated, and the working gas 4 is converted into a high-temperature and high-pressure plasma gas 6.
And squirts from the through hole 111a of the anode 111. At the same time, when the coating material 2 is fed together with the carrier gas 3 toward the plasma gas 6 from the coating material feeding means, the coating material 2 melts while flowing together with the plasma gas 6, and passes through the through-hole 111 a of the anode 111. The thermal spray coating of the coating material 2 is formed on the facing substrate 1 by being applied to the facing substrate 1.

【0004】[0004]

【発明が解決しようとする課題】前述したような従来の
プラズマ溶射装置においては、以下のような問題があっ
た。 プラズマガス6が高速度であるため、被覆材2のプラ
ズマガス6中での滞留時間が非常に短くなってしまう。
このため、被覆材2は、粒子径サイズや搬送ガス3の流
速によって、その一部が充分に溶融しきれずに基材1に
到着してしまう場合がある。その結果、被覆材2に無駄
を生じてしまう場合があった。 前記被覆材送給手段から送給した被覆材2は、粒子径
サイズや搬送ガス3の流速によって、その一部がプラズ
マガス6の流れに乗らずに通過したり、はじかれたりし
てしまう場合がある。その結果、被覆材2に無駄を生じ
てしまう場合があった。
The above-described conventional plasma spraying apparatus has the following problems. Since the plasma gas 6 has a high velocity, the residence time of the coating material 2 in the plasma gas 6 is very short.
For this reason, depending on the particle diameter size and the flow rate of the carrier gas 3, the coating material 2 may reach the base material 1 without being partially melted sufficiently. As a result, there was a case where the coating material 2 wasted. A case where a part of the coating material 2 fed from the coating material feeding means passes or is repelled without riding on the flow of the plasma gas 6 depending on the particle diameter size and the flow rate of the carrier gas 3. There is. As a result, there was a case where the coating material 2 wasted.

【0005】このようなことから、本発明は、被覆材を
有効に使用して溶射効率を向上させることができるプラ
ズマ溶射装置を提供することを目的とした。
[0005] In view of the above, an object of the present invention is to provide a plasma spraying apparatus capable of improving the spraying efficiency by effectively using a coating material.

【0006】[0006]

【課題を解決するための手段】前述した課題を解決する
ための、第一番目の発明によるプラズマ溶射装置は、一
端側と他端側とを貫通する貫通穴を有する陽極と、前記
陽極の前記貫通穴の一端側近傍に配設された陰極と、前
記陽極の前記貫通穴の一端側に作動ガスを送給する作動
ガス送給手段と、前記陽極と前記陰極とに接続されて当
該陽極と当該陰極との間にプラズマアークを発生させる
電源と、前記陽極の前記貫通穴の内周面に設けられ、当
該貫通穴内を流通するプラズマガスに螺旋状の旋回流を
与えるガイドベーンと、前記陽極の前記貫通穴の他端側
から噴出された前記プラズマガスに被覆材を送給する被
覆材送給手段とを備えてなることを特徴とする。
According to a first aspect of the present invention, there is provided a plasma spraying apparatus having a through hole penetrating through one end and the other end thereof, and A cathode disposed in the vicinity of one end of the through-hole, a working gas supply means for supplying a working gas to one end of the through-hole of the anode, and the anode connected to the anode and the cathode; A power source for generating a plasma arc between the cathode, a guide vane provided on the inner peripheral surface of the through hole of the anode, and providing a spiral swirling flow to the plasma gas flowing through the through hole; And a coating material feeding means for feeding a coating material to the plasma gas ejected from the other end of the through hole.

【0007】前述した課題を解決するための、第二番目
の発明によるプラズマ溶射装置は、一端側と他端側とを
貫通する貫通穴を有する陽極と、一端側と他端側とを貫
通する中空穴を有し、当該中空穴を前記陽極の前記貫通
穴の同軸上に位置させるように当該陽極の当該貫通穴の
一端側近傍に配設された陰極と、前記陽極の前記貫通穴
の一端側に作動ガスを送給する作動ガス送給手段と、前
記陽極と前記陰極とに接続されて当該陽極と当該陰極と
の間にプラズマアークを発生させる電源と、前記陰極の
前記中空穴内に同軸をなして配設された仕切管と、前記
仕切管に被覆材を送給する被覆材送給手段と、前記陰極
の前記中空穴と前記仕切管との間に熱シールドガスを送
給する熱シールドガス送給手段とを備えてなることを特
徴とする。
A plasma spraying apparatus according to a second aspect of the present invention for solving the above-mentioned problems has an anode having a through hole penetrating one end and the other end, and penetrating one end and the other end. A cathode having a hollow hole, the cathode disposed near one end of the through hole of the anode such that the hollow hole is positioned coaxially with the through hole of the anode, and one end of the through hole of the anode; A working gas supply means for supplying a working gas to a side, a power supply connected to the anode and the cathode to generate a plasma arc between the anode and the cathode, and a coaxial inside the hollow hole of the cathode. A partition tube arranged in such a manner; a coating material feeding means for feeding a coating material to the partition tube; and a heat source for feeding a heat shielding gas between the hollow hole of the cathode and the partition tube. And a shielding gas supply means.

【0008】第二番目の発明によるプラズマ溶射装置に
おいて、前記陽極の前記貫通穴内を流通するプラズマガ
スに螺旋状の旋回流を与えるガイドベーンを当該陽極の
当該貫通穴の内周面に設けたことを特徴とする。
In the plasma spraying apparatus according to a second aspect of the present invention, a guide vane for providing a spiral swirling flow to the plasma gas flowing through the through hole of the anode is provided on an inner peripheral surface of the through hole of the anode. It is characterized by.

【0009】[0009]

【発明の実施の形態】第一番目の発明によるプラズマ溶
射装置の実施の形態を図1,2を用いて説明する。な
お、図1は、その要部の概略構成図、図2は、陽極の内
周面展開図である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a plasma spraying apparatus according to the first invention will be described with reference to FIGS. FIG. 1 is a schematic configuration diagram of a main part thereof, and FIG. 2 is an inner peripheral surface development diagram of the anode.

【0010】図1に示すように、一端側と他端側とを貫
通する貫通穴11aを有する陽極11の一端側(基端
側)近傍には、円柱状の陰極12が当該陽極11の貫通
穴11aの同軸上に配設されている。陽極11と陰極1
2とは、電源13に接続している。陽極11の貫通穴1
1aの基端側には、アルゴンガスやヘリウムガスや窒素
ガスなどのような作動ガス4を送給する図示しない作動
ガス送給手段が連絡している。一方、陽極11の貫通穴
11aの他端側(先端側)近傍には、セラミックスや金
属などからなる粒子状の被覆材2をアルゴンガスなどの
ような搬送ガス3と共に当該貫通穴11aの径方向に向
けて送給する図示しない被覆材送給手段が連絡してい
る。図1,2に示すように、陽極11の貫通穴11aの
内周面には、当該貫通穴11aを流通するプラズマガス
6に螺旋状の旋回流を与えるガイドベーン14が設けら
れている。
As shown in FIG. 1, in the vicinity of one end (base end) of an anode 11 having a through hole 11a penetrating through one end and the other end, a columnar cathode 12 penetrates the anode 11. It is arranged coaxially with the hole 11a. Anode 11 and cathode 1
2 is connected to the power supply 13. Through hole 1 of anode 11
A working gas supply means (not shown) for supplying a working gas 4 such as an argon gas, a helium gas, a nitrogen gas, or the like is connected to the base end side of 1a. On the other hand, in the vicinity of the other end (front end side) of the through hole 11a of the anode 11, a particulate coating material 2 made of ceramics, metal, or the like is provided together with a carrier gas 3 such as argon gas in the radial direction of the through hole 11a. (Not shown) is connected. As shown in FIGS. 1 and 2, a guide vane 14 for providing a spiral swirling flow to the plasma gas 6 flowing through the through hole 11 a is provided on the inner peripheral surface of the through hole 11 a of the anode 11.

【0011】このようなプラズマ溶射装置の作用を次に
説明する。前記作動ガス送給手段から陽極11の貫通穴
11aに作動ガス4を送給すると共に、電源13を作動
して陽極11と陰極12との間に電圧を印加すると、当
該電極11,12間でプラズマアーク5が発生し、上記
作動ガス4が高温高圧のプラズマガス6となって、上記
ガイドベーン14に沿って当該貫通穴11aから螺旋状
に旋回しながら噴出する。これと同時に、前記被覆材送
給手段から被覆材2を搬送ガス3と共にプラズマガス6
へ向けて送給すると、当該被覆材2がプラズマガス6の
旋回流に乗って当該プラズマガス6と共に螺旋状に旋回
しながら溶融し、陽極11の貫通穴11aに対面してい
る基材1に被着して、基材1に被覆材2の溶射被膜を形
成することができる。
The operation of such a plasma spraying apparatus will be described below. When the working gas 4 is supplied from the working gas supply means to the through hole 11a of the anode 11 and a voltage is applied between the anode 11 and the cathode 12 by operating the power supply 13, the electrode 11 A plasma arc 5 is generated, and the working gas 4 becomes a high-temperature and high-pressure plasma gas 6 and is ejected along the guide vane 14 from the through hole 11a while spiraling. At the same time, the coating material 2 is transferred from the coating material feeding means together with the carrier gas 3 to the plasma gas 6.
When the coating material 2 is fed toward the substrate 1, the coating material 2 rides on the swirling flow of the plasma gas 6 and spirally melts together with the plasma gas 6 to melt and form the base material 1 facing the through hole 11 a of the anode 11. The thermal spray coating of the coating material 2 can be formed on the substrate 1 by being applied.

【0012】すなわち、プラズマガス6をガイドベーン
14で螺旋状に旋回させながら噴出させることにより、
被覆材2をプラズマガス6と共に螺旋状に旋回させなが
ら溶融させるようにしたのである。
That is, the plasma gas 6 is ejected while being spirally swirled by the guide vanes 14,
The coating material 2 is melted while being spirally swirled together with the plasma gas 6.

【0013】このため、被覆材2のプラズマガス6中で
の滞留時間を長くすることができ、被覆材2を確実に溶
融して基材1に被着することができる。
Therefore, the residence time of the coating material 2 in the plasma gas 6 can be lengthened, and the coating material 2 can be reliably melted and adhered to the substrate 1.

【0014】したがって、このようなプラズマ溶射装置
によれば、被覆材2を無駄にすることなく有効に使用す
ることができるので、被覆材2の溶射効率を向上させる
ことができる。
Therefore, according to such a plasma spraying apparatus, since the coating material 2 can be used effectively without wasting, the spraying efficiency of the coating material 2 can be improved.

【0015】第二番目の発明によるプラズマ溶射装置の
実施の形態を図3を用いて説明する。なお、図3は、そ
の要部の抽出概略構成図である。ただし、前述した実施
の形態と同様な部材については、前述した実施の形態の
説明で用いた符号と同一の符号を用いることにより、そ
の説明を省略する。
An embodiment of the plasma spraying apparatus according to the second invention will be described with reference to FIG. FIG. 3 is a schematic diagram showing the extraction of the main parts. However, the same members as those in the above-described embodiment will be denoted by the same reference numerals as those used in the description of the above-described embodiment, and the description thereof will be omitted.

【0016】図3に示すように、陽極11の貫通穴11
aの基端側近傍には、一端側と他端側とを貫通する中空
穴22aを有する中空陰極(ホロカソード)22が当該
陽極11の貫通穴11aの同軸上に位置するように設け
られている。陽極11と陰極22とは、電源13に接続
している。陽極11の貫通穴11aの基端側には、作動
ガス4を送給する図示しない作動ガス送給手段が連絡し
ている。
As shown in FIG.
In the vicinity of the base end side of a, a hollow cathode (holo cathode) 22 having a hollow hole 22a penetrating the one end side and the other end side is provided so as to be located coaxially with the through hole 11a of the anode 11. . The anode 11 and the cathode 22 are connected to a power supply 13. A working gas supply means (not shown) for supplying the working gas 4 is connected to the base end side of the through hole 11 a of the anode 11.

【0017】一方、陰極22の中空穴22a内には、ボ
ロンナイトライドなどのような絶縁材からなる円筒状の
仕切管25が当該陰極22の中空穴22aの同軸上で当
該中空穴22aと隙間を有するようにして配設されてい
る。仕切管25の一端側(基端側)には、搬送ガス3と
共に粒子状の被覆材2を送給する図示しない被覆材送給
手段が接続されている。陰極22の中空穴22aの一端
側(基端側)には、低熱伝導率で電離電圧の大きいアル
ゴンガスなどのような熱シールドガス7を送給する図示
しない熱シールドガス送給手段が接続されている。
On the other hand, in the hollow hole 22a of the cathode 22, a cylindrical partition tube 25 made of an insulating material such as boron nitride is coaxially formed with the hollow hole 22a of the cathode 22. It is arranged so that it may have. One end side (base end side) of the partition tube 25 is connected to a coating material feeding unit (not shown) for feeding the particulate coating material 2 together with the carrier gas 3. One end (base end) of the hollow hole 22a of the cathode 22 is connected to a heat shield gas supply means (not shown) for supplying a heat shield gas 7 such as argon gas having a low thermal conductivity and a high ionization voltage. ing.

【0018】つまり、前記被覆材送給手段から被覆材2
を搬送ガスと共に送給すると、被覆材2は、仕切管25
の内部を流通して陽極11の貫通穴11a内に送給さ
れ、前記熱シールドガス送給手段から熱シールドガス7
を送給すると、熱シールドガス7は、陰極22の中空穴
22aの内周面と仕切管25の外周面との間を流通して
陽極11の貫通穴11a内に送給される、言い換えれ
ば、被覆材2は、熱シールドガス7で包囲されながら陰
極22に接することなく陽極11の貫通穴11a内に送
給されるのである。
That is, the coating material 2 is supplied from the coating material feeding means.
Is supplied together with the carrier gas, the coating material 2
Is supplied to the through hole 11a of the anode 11 through the inside of the heat shield gas supply means.
Is supplied, the heat shielding gas 7 flows between the inner peripheral surface of the hollow hole 22a of the cathode 22 and the outer peripheral surface of the partition tube 25 and is supplied into the through-hole 11a of the anode 11. In other words, The coating material 2 is fed into the through hole 11 a of the anode 11 without being in contact with the cathode 22 while being surrounded by the heat shielding gas 7.

【0019】このようなプラズマ溶射装置の作用を次に
説明する。前記作動ガス送給手段から陽極11の貫通穴
11aに作動ガス4を送給すると共に、電源13を作動
して陽極11と陰極22との間に電圧を印加すると、当
該電極11,22間でプラズマアーク5が発生し、上記
作動ガス4が高温高圧のプラズマガス6となって当該陽
極11の貫通穴11aから噴出する。これと同時に、前
記被覆材送給手段から被覆材2を搬送ガス3と共に仕切
管25の内部へ送給しながら、前記熱シールドガス送給
手段から熱シールドガス7を陰極22の中空穴22aの
内周面と仕切管25の外周面との間に送給すると、被覆
材2は、熱シールドガス7で保護されながら陽極11の
貫通穴11aへ送給され、前記プラズマガス6と共に陽
極11の貫通穴11aから噴出されて、当該プラズマガ
ス6の熱により熱シールドガス7および搬送ガス3を介
して加熱されて徐々に溶融していき、陽極11の貫通穴
11aに対面している基材1に被着して、基材1に被覆
材2の溶射被膜を形成することができる。
The operation of such a plasma spraying apparatus will be described below. When the working gas 4 is supplied from the working gas supply means to the through hole 11a of the anode 11 and a voltage is applied between the anode 11 and the cathode 22 by operating the power supply 13, the electrode 11 A plasma arc 5 is generated, and the working gas 4 becomes a high-temperature and high-pressure plasma gas 6 and is ejected from the through hole 11 a of the anode 11. At the same time, the heat shield gas 7 is supplied from the heat shield gas supply means to the hollow hole 22 a of the cathode 22 while the coating material 2 is supplied from the cover material supply means together with the carrier gas 3 to the inside of the partition tube 25. When the coating material 2 is fed between the inner peripheral surface and the outer peripheral surface of the partition tube 25, the coating material 2 is supplied to the through hole 11 a of the anode 11 while being protected by the heat shield gas 7, and is supplied to the anode 11 together with the plasma gas 6. The base material 1 is ejected from the through-hole 11a, is heated by the heat of the plasma gas 6 via the heat shield gas 7 and the carrier gas 3 and gradually melts, and faces the through-hole 11a of the anode 11. To form a thermal spray coating of the coating material 2 on the substrate 1.

【0020】このため、プラズマガス6の噴出方向と
同一方向で被覆材2を送給することができるので、被覆
材2をプラズマガス6の流れに確実に乗せることができ
る。被覆材2を熱シールドガス7で包囲しながらプラ
ズマガス6中に送給するので、被覆材2が急激に加熱さ
れることを抑制することができ、陰極22の中空穴22
aや陽極11の貫通穴11aへの被覆材2の付着に伴う
当該穴11a,22a部分の閉塞を確実に防止すること
ができる。
Therefore, the coating material 2 can be fed in the same direction as the ejection direction of the plasma gas 6, so that the coating material 2 can be surely put on the flow of the plasma gas 6. Since the coating material 2 is supplied into the plasma gas 6 while being surrounded by the heat shield gas 7, the coating material 2 can be prevented from being rapidly heated, and the hollow hole 22 of the cathode 22 can be suppressed.
and the holes 11a and 22a due to the attachment of the coating material 2 to the through holes 11a of the anode 11 and the anode 11 can be reliably prevented.

【0021】したがって、このようなプラズマ溶射装置
によれば、前述した実施の形態の場合と同様に、被覆材
2を無駄にすることなく有効に使用することができるの
で、被覆材2の溶射効率を向上させることができる。
Therefore, according to such a plasma spraying apparatus, the coating material 2 can be effectively used without wasting as in the case of the above-described embodiment, and the spraying efficiency of the coating material 2 can be improved. Can be improved.

【0022】また、第一番目の発明と第二番目の発明と
を組み合わせる、すなわち、上述した第二番目の発明の
実施の形態において、陽極11の貫通穴11aの内周面
にガイドベーン14を設ければ、被覆材2をさらに確実
に加熱溶融させることができるので、融点が比較的高く
て溶融しにくい被覆材2を用いる場合であっても、被覆
材2を無駄にすることなく有効に使用することができ、
被覆材2の溶射効率を大幅に向上させることができる。
Further, the first invention and the second invention are combined, that is, in the above-described embodiment of the second invention, the guide vane 14 is provided on the inner peripheral surface of the through hole 11a of the anode 11. If provided, the coating material 2 can be more reliably heated and melted. Therefore, even when the coating material 2 having a relatively high melting point and hard to melt is used, the coating material 2 can be effectively used without being wasted. Can be used,
The spraying efficiency of the coating material 2 can be greatly improved.

【0023】[0023]

【発明の効果】第一番目の発明によるプラズマ溶射装置
は、一端側と他端側とを貫通する貫通穴を有する陽極
と、前記陽極の前記貫通穴の一端側近傍に配設された陰
極と、前記陽極の前記貫通穴の一端側に作動ガスを送給
する作動ガス送給手段と、前記陽極と前記陰極とに接続
されて当該陽極と当該陰極との間にプラズマアークを発
生させる電源と、前記陽極の前記貫通穴の内周面に設け
られ、当該貫通穴内を流通するプラズマガスに螺旋状の
旋回流を与えるガイドベーンと、前記陽極の前記貫通穴
の他端側から噴出された前記プラズマガスに被覆材を送
給する被覆材送給手段とを備えてなることから、作動ガ
ス送給手段から陽極の貫通穴に作動ガスを送給すると共
に、電源を作動して陽極と陰極との間に電圧を印加する
と、電極間でプラズマアークが発生し、作動ガスが高温
高圧のプラズマガスとなって、ガイドベーンに沿って当
該貫通穴から螺旋状に旋回しながら噴出する。これと同
時に、被覆材送給手段から被覆材を搬送ガスと共にプラ
ズマガスへ向けて送給すると、被覆材がプラズマガスの
旋回流に乗って当該プラズマガスと共に螺旋状に旋回し
ながら溶融し、陽極の貫通穴に対面している基材に被着
させることができ、基材に被覆材の溶射被膜を形成する
ことができる。このため、被覆材のプラズマガス中での
滞留時間を長くすることができ、被覆材を確実に溶融し
て基材に被着することができるので、被覆材を無駄にす
ることなく有効に使用することができ、被覆材の溶射効
率を向上させることができる。
According to the first aspect of the present invention, there is provided a plasma spraying apparatus comprising: an anode having a through hole penetrating one end and the other end; and a cathode disposed near one end of the through hole of the anode. A working gas supply means for supplying a working gas to one end of the through hole of the anode, and a power supply connected to the anode and the cathode to generate a plasma arc between the anode and the cathode. A guide vane provided on the inner peripheral surface of the through hole of the anode, for providing a spiral swirling flow to the plasma gas flowing in the through hole, and the guide vane ejected from the other end side of the through hole of the anode. Since it is provided with a coating material feeding means for feeding the coating material to the plasma gas, the working gas is supplied from the working gas feeding means to the through hole of the anode, and the power source is operated to operate the anode and the cathode. When a voltage is applied between Arc is generated, the working gas becomes high temperature and high pressure of the plasma gas, along a guide vane ejected while rotating from the through hole helically. At the same time, when the coating material is fed from the coating material feeding means to the plasma gas together with the carrier gas, the coating material is melted while spirally swirling with the plasma gas on the swirling flow of the plasma gas. Can be adhered to the base material facing the through hole, and a sprayed coating of the coating material can be formed on the base material. For this reason, the residence time of the coating material in the plasma gas can be lengthened, and the coating material can be reliably melted and adhered to the base material, so that the coating material can be effectively used without being wasted. And the thermal spraying efficiency of the coating material can be improved.

【0024】また、第二番目の発明によるプラズマ溶射
装置は、一端側と他端側とを貫通する貫通穴を有する陽
極と、一端側と他端側とを貫通する中空穴を有し、当該
中空穴を前記陽極の前記貫通穴の同軸上に位置させるよ
うに当該陽極の当該貫通穴の一端側近傍に配設された陰
極と、前記陽極の前記貫通穴の一端側に作動ガスを送給
する作動ガス送給手段と、前記陽極と前記陰極とに接続
されて当該陽極と当該陰極との間にプラズマアークを発
生させる電源と、前記陰極の前記中空穴内に同軸をなし
て配設された仕切管と、前記仕切管に被覆材を送給する
被覆材送給手段と、前記陰極の前記中空穴と前記仕切管
との間に熱シールドガスを送給する熱シールドガス送給
手段とを備えてなることから、作動ガス送給手段から陽
極の貫通穴に作動ガスを送給すると共に、電源を作動し
て陽極と陰極との間に電圧を印加すると、電極間でプラ
ズマアークが発生し、作動ガスが高温高圧のプラズマガ
スとなって陽極の貫通穴から噴出する。これと同時に、
被覆材送給手段から被覆材を仕切管の内部へ送給しなが
ら、熱シールドガス送給手段から熱シールドガスを陰極
の中空穴の内周面と仕切管の外周面との間に送給する
と、被覆材は、熱シールドガスで保護されながら陽極の
貫通穴へ送給され、プラズマガスと共に陽極の貫通穴か
ら噴出されて、プラズマガスの熱により熱シールドガス
および搬送ガスを介して加熱されて徐々に溶融してい
き、陽極の貫通穴に対面している基材に被着させること
ができ、基材に被覆材の溶射被膜を形成することができ
る。このため、プラズマガスの噴出方向と同一方向で被
覆材を送給することができ、被覆材をプラズマガスの流
れに確実に乗せることができると共に、被覆材を熱シー
ルドガスで包囲しながらプラズマガス中に送給して、被
覆材が急激に加熱されることを抑制することができ、陰
極の中空穴や陽極の貫通穴への被覆材の付着に伴う当該
穴部分の閉塞を確実に防止することができるので、被覆
材を無駄にすることなく有効に使用することができ、被
覆材の溶射効率を向上させることができる。
Further, the plasma spraying apparatus according to the second invention has an anode having a through hole penetrating one end and the other end, and a hollow hole penetrating one end and the other end. A cathode disposed near one end of the through hole of the anode so that the hollow hole is positioned coaxially with the through hole of the anode, and a working gas is supplied to one end of the through hole of the anode. A working gas supply means, a power supply connected to the anode and the cathode to generate a plasma arc between the anode and the cathode, and a coaxial power supply disposed in the hollow hole of the cathode. A partition pipe, a coating material feeding means for feeding a coating material to the partition pipe, and a heat shield gas feeding means for feeding a heat shielding gas between the hollow hole of the cathode and the partition pipe. Since it is equipped, it operates from the working gas supply means to the through hole of the anode When a voltage is applied between the anode and the cathode by operating the power supply and a voltage is applied between the anode and the cathode, a plasma arc is generated between the electrodes, and the working gas becomes a high-temperature and high-pressure plasma gas and is ejected from the through hole of the anode. I do. At the same time,
While supplying the coating material into the partition tube from the coating material supply means, the heat shielding gas is supplied from the heat shield gas supply means between the inner peripheral surface of the hollow hole of the cathode and the outer peripheral surface of the partition tube. Then, the coating material is fed to the anode through-hole while being protected by the heat shield gas, is ejected from the anode through-hole together with the plasma gas, and is heated by the heat of the plasma gas via the heat shield gas and the carrier gas. And gradually adhere to the base material facing the through hole of the anode, and a sprayed coating of the coating material can be formed on the base material. Therefore, the coating material can be fed in the same direction as the plasma gas ejection direction, and the coating material can be reliably put on the flow of the plasma gas. To prevent the coating material from being rapidly heated, and to reliably prevent the hole portion from being closed due to the coating material being attached to the hollow hole of the cathode or the through hole of the anode. Therefore, the coating material can be effectively used without wasting, and the spraying efficiency of the coating material can be improved.

【0025】また、第二番目の発明によるプラズマ溶射
装置において、前記陽極の前記貫通穴内を流通するプラ
ズマガスに螺旋状の旋回流を与えるガイドベーンを当該
陽極の当該貫通穴の内周面に設ければ、被覆材をさらに
確実に加熱溶融させることができるので、融点が比較的
高くて溶融しにくい被覆材を用いる場合であっても、被
覆材を無駄にすることなく有効に使用することができ、
被覆材の溶射効率を大幅に向上させることができる。
In the plasma spraying apparatus according to the second aspect of the present invention, a guide vane for providing a spiral swirling flow to the plasma gas flowing through the through hole of the anode is provided on an inner peripheral surface of the through hole of the anode. Then, the coating material can be heated and melted more reliably, so that even when using a coating material having a relatively high melting point and being hard to melt, it is possible to effectively use the coating material without wasting it. Can,
The spraying efficiency of the coating material can be greatly improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】第一番目の発明によるプラズマ溶射装置の実施
の形態の要部の概略構成図である。
FIG. 1 is a schematic configuration diagram of a main part of an embodiment of a plasma spraying apparatus according to a first invention.

【図2】図1の陽極の内周面展開図である。FIG. 2 is an inner peripheral surface development view of the anode of FIG.

【図3】第二番目の発明によるプラズマ溶射装置の実施
の形態の要部の抽出概略構成図である。
FIG. 3 is an extraction schematic configuration diagram of a main part of the embodiment of the plasma spraying apparatus according to the second invention.

【図4】従来のプラズマ溶射装置の一例の要部の概略構
成図である。
FIG. 4 is a schematic configuration diagram of a main part of an example of a conventional plasma spraying apparatus.

【符号の説明】[Explanation of symbols]

1 基材 2 被覆材 3 搬送ガス 4 作動ガス 5 プラズマアーク 6 プラズマガス 7 熱シールドガス 11 陽極 11a 貫通穴 12 陰極 13 電源 14 ガイドベーン 22 陰極 22a 中空穴 25 仕切管 DESCRIPTION OF SYMBOLS 1 Base material 2 Coating material 3 Carrier gas 4 Working gas 5 Plasma arc 6 Plasma gas 7 Heat shield gas 11 Anode 11a Through hole 12 Cathode 13 Power supply 14 Guide vane 22 Cathode 22a Hollow hole 25 Partition tube

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 一端側と他端側とを貫通する貫通穴を有
する陽極と、 前記陽極の前記貫通穴の一端側近傍に配設された陰極
と、 前記陽極の前記貫通穴の一端側に作動ガスを送給する作
動ガス送給手段と、 前記陽極と前記陰極とに接続されて当該陽極と当該陰極
との間にプラズマアークを発生させる電源と、 前記陽極の前記貫通穴の内周面に設けられ、当該貫通穴
内を流通するプラズマガスに螺旋状の旋回流を与えるガ
イドベーンと、 前記陽極の前記貫通穴の他端側から噴出された前記プラ
ズマガスに被覆材を送給する被覆材送給手段とを備えて
なることを特徴とするプラズマ溶射装置。
An anode having a through-hole penetrating one end and the other end; a cathode disposed near one end of the through-hole of the anode; and a cathode disposed at one end of the through-hole of the anode. A working gas supply means for supplying a working gas; a power supply connected to the anode and the cathode to generate a plasma arc between the anode and the cathode; and an inner peripheral surface of the through hole of the anode. And a guide vane for providing a spiral swirling flow to the plasma gas flowing through the through-hole, and a coating material for feeding a coating material to the plasma gas ejected from the other end of the through-hole of the anode. A plasma spraying apparatus comprising: a feeding unit.
【請求項2】 一端側と他端側とを貫通する貫通穴を有
する陽極と、 一端側と他端側とを貫通する中空穴を有し、当該中空穴
を前記陽極の前記貫通穴の同軸上に位置させるように当
該陽極の当該貫通穴の一端側近傍に配設された陰極と、 前記陽極の前記貫通穴の一端側に作動ガスを送給する作
動ガス送給手段と、 前記陽極と前記陰極とに接続されて当該陽極と当該陰極
との間にプラズマアークを発生させる電源と、 前記陰極の前記中空穴内に同軸をなして配設された仕切
管と、 前記仕切管に被覆材を送給する被覆材送給手段と、 前記陰極の前記中空穴と前記仕切管との間に熱シールド
ガスを送給する熱シールドガス送給手段とを備えてなる
ことを特徴とするプラズマ溶射装置。
2. An anode having a through hole penetrating one end and the other end, and a hollow hole penetrating one end and the other end, wherein the hollow hole is coaxial with the through hole of the anode. A cathode disposed near one end of the through-hole of the anode so as to be located on the upper side; a working gas supply unit configured to supply a working gas to one end of the through-hole of the anode; A power source connected to the cathode to generate a plasma arc between the anode and the cathode; a partition tube disposed coaxially in the hollow hole of the cathode; and a coating material on the partition tube. A plasma spraying apparatus comprising: a coating material feeding means for feeding; and a heat shielding gas feeding means for feeding a heat shielding gas between the hollow hole of the cathode and the partition tube. .
【請求項3】 請求項2に記載のプラズマ溶射装置にお
いて、前記陽極の前記貫通穴内を流通するプラズマガス
に螺旋状の旋回流を与えるガイドベーンを当該陽極の当
該貫通穴の内周面に設けたことを特徴とするプラズマ溶
射装置。
3. The plasma spraying apparatus according to claim 2, wherein a guide vane for providing a spiral swirling flow to the plasma gas flowing through the through hole of the anode is provided on an inner peripheral surface of the through hole of the anode. A plasma spraying apparatus.
JP10333578A 1998-11-25 1998-11-25 Plasma thermal spraying device Withdrawn JP2000160317A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10333578A JP2000160317A (en) 1998-11-25 1998-11-25 Plasma thermal spraying device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10333578A JP2000160317A (en) 1998-11-25 1998-11-25 Plasma thermal spraying device

Publications (1)

Publication Number Publication Date
JP2000160317A true JP2000160317A (en) 2000-06-13

Family

ID=18267621

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10333578A Withdrawn JP2000160317A (en) 1998-11-25 1998-11-25 Plasma thermal spraying device

Country Status (1)

Country Link
JP (1) JP2000160317A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004284944A (en) * 2003-03-03 2004-10-14 Sumitomo Electric Ind Ltd Method and apparatus for working glass
CN114086107A (en) * 2021-12-28 2022-02-25 河北复朗施纳米科技有限公司 Nano antibacterial coating device
WO2024009422A1 (en) * 2022-07-06 2024-01-11 株式会社Fuji Plasma head and plasma generation device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004284944A (en) * 2003-03-03 2004-10-14 Sumitomo Electric Ind Ltd Method and apparatus for working glass
CN114086107A (en) * 2021-12-28 2022-02-25 河北复朗施纳米科技有限公司 Nano antibacterial coating device
WO2024009422A1 (en) * 2022-07-06 2024-01-11 株式会社Fuji Plasma head and plasma generation device

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