JP2000157907A - Sheet coating method and sheet coating device and production of color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To perform coating with a thinner coating film, coating with a thin film with paints in a wide range, or the like by a die coating by applying or scattering in advance treating liquid for reducing a contact angle of paint on the surface to be coated and applying paint before the treating liquid is dried. SOLUTION: A cap 12 is provided with a manifold 11, and paint is fed to the cap 12 from a paint tank by a fixed delivery pump. The cap 12 is provided with a slit 7 through a partition plate 3, and treating liquid is fed there and is discharged. The treating liquid is liquid that performs surface reforming treatment of material to be coated to reduces a contact angle of paint on the surface of the material to be coated by applying or scattering it to the surface of the material to be coated. The treating liquid is fed to the cap 12 from a treating liquid tank through piping by a fixed delivery pump in the same way of the paint. First, the treating liquid is applied to the material to be coated 9 at the tip of the cap 12, and next, paint is applied to the material to be coated 9 which has been subjected to the surface reforming treatment by the treating liquid.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION The present invention relates to a method of supplying a liquid paint in a single-wafer system in precision coating such as resist coating in a semiconductor manufacturing field and ultraviolet absorbing layer coating in an optical filter manufacturing field. The present invention relates to a sheet-fed coating method for coating a surface of a material to be coated using a die coater, a sheet-fed coating apparatus for performing the method, and a method for manufacturing a color filter using the method.

[0002]

2. Description of the Related Art Conventionally, a small substrate such as a plastic substrate for an optical filter, a glass substrate for a liquid crystal display, and a glass substrate for a color filter, having a length of less than 1 m in a coating direction. It is strongly demanded that various paints be applied thinly and uniformly.
In order to form a coating film on such a substrate industrially, a single-wafer coating method is used in which the material to be coated is supplied one by one to a coater, the coating material is applied, and the coating material is conveyed to the next process such as drying. Will do.

[0003] In forming a coating film on a material to be coated, a spin coater, a bar coater, and a roll coater are widely used.

[0004] Among them, a method using a spin coater is as follows.
This method is widely used for applying a photoresist to a semiconductor wafer, and a coating film can be formed by dropping a coating material on the center of the surface of a rotating workpiece. By setting the kind of coating material suitable for this method to the coating film obtained by this method, the film thickness can be fairly accurately uniformed over the entire range of the material to be coated. However, the amount of paint used to obtain a coating film having a predetermined thickness is extremely large, which is uneconomical. In addition, paint may adhere to the edge or back surface of the material to be coated, or the paint scattered in the apparatus may gel or solidify, and the process lacks stability and cleanliness. It causes quality deterioration.

A method using a roll coater is a method of transferring a coating material to a material to be coated via a roller, and is used for coating a long material to be coated or a material wound on a roll. Can be performed. However, because the paint is sequentially sent from the pan to the application roll and the material to be coated, the paint is exposed to the air for a long time, and as a result, the moisture absorption of the paint,
Not only is it easy to deteriorate due to oxidation, but also foreign substances are likely to be mixed. As a result, the quality of the coated product is reduced.

The method using a bar coater is a method in which a coating material is applied to a material to be coated using a bar in which a thin wire is wound around a rod. In this method, the wire wound on the rod comes into contact with the material to be coated.

In consideration of such inconvenience, a die coating method using a die coater has been recently proposed. Proposals for applying a die coater to the production of a color filter have been proposed in Japanese Patent Application Laid-Open Nos.
42407 and JP-A-6-339656.

[0008] Die coaters have been widely used for thick film coating and continuous application of high-viscosity paints, and US Pat. 230,793, U.S. Pat. No. 4,696,8
No. 85, U.S. Pat. No. 2,761,791, coating methods such as a curtain flow method, an extrusion method and a bead method are known. Above all, in the above-mentioned bead method, paint is discharged from a slit provided in a die coater die, and a paint pool called a paint bead is formed between the die and a work material that relatively moves while maintaining a certain interval. Then, in this state, the paint is drawn out as the material to be coated travels to form a coating film.
If the bead method is used to continuously form a coating film by supplying the same amount of paint from the slit as the amount consumed by coating film formation, the formed coating film will have considerable film thickness uniformity. High accuracy can be achieved. In addition, there is almost no waste of paint, and since the paint feed path is sealed until it is discharged from the slit, it is possible to prevent the deterioration of paint and the intrusion of foreign matter, and maintain the quality of the obtained coating film high. it can.

[0009]

However, most of the films applied in the production of color filters for liquid crystal displays are thin films having a dry thickness of 10 μm or less. When trying to apply such a thinner coating,
The paint bead volume will be smaller. In the case where the volume of the paint bead is small, if the adsorbing force between the paint and the surface of the material to be coated is not sufficiently obtained, the paint bead cannot be continuously held in the coating width direction and is interrupted. As a result, a defect in which the coating film becomes streak-like occurs.

[0010] The die coating method generally has a narrower allowable range for the surface energy than the spin coating method. Therefore, when a thinner coating film is to be applied, or when a coating material having a low surface energy is used, it is required. Defects are likely to occur.

An object of the present invention is to solve the above-mentioned problems and to apply a thinner coating film, a thin film coating using a wide range of coating materials, and a coating method in the case where a base film or pattern already exists on the surface of the material to be coated. Another object of the present invention is to provide a single-wafer coating method which can be favorably performed by a die coating method, and further provide an apparatus used for the method and a method for manufacturing a color filter using the method.

[0012]

According to a first aspect of the present invention, there is provided a coating material discharge device on a surface of a coating material while at least one of the material to be coated and the coating material discharging device is relatively moved with respect to the other. This is a single-wafer coating method in which a paint is discharged from a slit to form a coating film, and a treatment liquid for reducing the contact angle of the paint on the surface of the material to be coated is applied or sprayed on the surface of the material in advance. ,
A single-wafer coating method characterized in that a coating material is applied before the treatment liquid is dried.

A second aspect of the present invention is a single-wafer coating apparatus used in the single-wafer coating method according to the present invention, wherein the two paint supply apparatuses are provided for a paint and a processing liquid. Has two slits for discharging the coating material and the processing liquid supplied from the apparatus toward the workpiece, respectively, and discharges the processing liquid from the preceding slit in the relative traveling direction of the coating material supply device. An apparatus, a stage for holding the material to be coated, and means for moving at least one of the paint discharge device and the stage relative to the other, the sheet-fed coating device being provided. .

A third aspect of the present invention is a sheet-fed coating apparatus used in the single-wafer coating method of the present invention, comprising two paint supply apparatuses for a paint and a processing liquid, and A paint discharge device having two bases each having a slit for discharging the supplied paint and the processing liquid toward the material to be coated, a stage for holding the material to be coated, the paint discharge device and the stage And a means for moving at least one of them relative to the other.

Still another aspect of the present invention is a method of manufacturing a color filter having a light-shielding layer having an opening on a transparent substrate, a colored layer filling at least the opening, and a protective layer. A layer, a colored layer, a protective layer, and a method for producing a color filter, wherein the step of forming at least one layer of a resist used in the step of producing these layers comprises using the above-described single-wafer coating method of the present invention. is there.

In the case of applying a thinner coating film, a thin film coating with a wide range of coating materials, and a coating material having a base film or pattern already on the surface of the material to be coated, using a die coater. It is desirable to increase the surface energy of the coating material on the surface of the coating material in advance by performing some surface modification treatment on the surface of the coating material. The present inventor has proposed that the above-mentioned coating can be satisfactorily performed by a die coater by previously applying or spraying a treatment liquid for reducing the contact angle of the paint on the surface of the material to be coated, in advance. Was found. Further, by using the treatment liquid as described above, it is possible to use a coating material having a high surface energy, thereby increasing the stability of coating and suppressing the occurrence of defects due to coating instability. can get.

[0017]

FIG. 2 is a schematic view showing the entire structure of an embodiment of the sheet-fed coating apparatus according to the present invention. FIG. 1 is an enlarged view around the base. 1 and 2, the paint supply device is represented by a base 12. Further, the paint supply device according to the present invention is a paint tank 25 shown in FIG.
-Metering pump 21 and processing liquid tank 35-Metering pump 3
Means up to 1 system.

The base 12 comprising the front lip 1 and the rear lip 2 has a manifold 11 for making the pressure distribution of the paint uniform while flowing from the paint supply port (not shown) to the slit 6. The paint is supplied from the paint tank 25 to the base 12 by the metering pump 21. This metering pump 21 includes a gear pump, a diaphragm pump,
1 shows a positive displacement pump such as a syringe pump. Further, as another paint supply mechanism of the pump, a paint tank 25 is provided.
Is put in a pressure vessel, and pressurized air is supplied to the pressure vessel by a pressure pump to extrude the paint. Dispensing pump 21 from paint tank 25
A filter 22 and an on-off valve 23 are provided in the path of the pipe 24 up to the necessity.

On the other hand, the base 12 is provided with a slit 7 through the partition plate 3, and a processing liquid is supplied to the slit 7.
Discharged. In the present invention, the treatment liquid is applied or sprayed on the surface of the material to be coated to perform a surface modification treatment of the material to be coated, thereby reducing the contact angle of the paint on the surface of the material to be coated. The liquid to be used is a liquid having a high affinity for the paint, specifically, a solvent component of the paint, ethyl lactate, N-methyl-2-pyrrolidone, propylene glycol monomethyl ether acetate and the like are preferably used. This processing liquid is supplied from the processing liquid tank 35 to the base 12 by the metering pump 31 via the pipe 34 in the same manner as the paint. In some cases, a manifold is provided in the supply path of the processing liquid to the slit 7, but in some cases, an inlet is provided directly on the slit wall surface. In the die 12, preferred slit gaps (widths of the slits 6 and 7 in FIG. 1 in the coating direction) are 10 to 200 μm for the slit 6 and 10 to 100 μm for the slit 7, and the interval between these slits is 50 to 100 μm.
It is desirable to leave a gap of 2000 μm.

In FIG. 1, the processing liquid is supplied to the slit 7 without a manifold. With this structure,
First, a treatment liquid is applied to the material to be coated 9 at the tip of the die 12, and then a coating material is applied to the material to be coated 9 that has been subjected to a surface modification treatment with the treatment liquid.

In the step of applying a coating material to a material to be coated using the sheet-fed coating apparatus of the present invention, as shown in FIG. 2, the base 12 is coated with a predetermined gap (clearance). It is installed facing the material 9. This clearance is 25-50
0 μm is preferred. The material 9 to be coated is a flat transfer stage 1.
3 and is vacuum-adsorbed so as not to shift during coating.

FIG. 3 shows a configuration of a coating apparatus using a paint discharging apparatus provided with a paint base 12a and a processing liquid base 12b. Also according to this configuration, the surface of the workpiece 9 is transported by the transport stage 10 so that the coating liquid is discharged from the base 12a after the processing liquid is discharged from the base 12b, so that the surface is modified by the processing liquid. The coating material is applied to the material to be coated, and a good coating film is formed. Although the preferred slit gap in this configuration is the same as that in FIG. 1, it is desirable to set the distance between the bases 12a and 12b so that the respective slits 6 and 7 are about 5 to 200 mm.

The sheet-fed coating method of the present invention is the same as that shown in FIG.
In addition to using the apparatus having the configuration shown in FIG. 3, after applying or spraying a treatment liquid on a material to be coated in advance by a spin coating method or a spray coating method, only the conventional paint is discharged onto the material to be coated. The paint may be applied using a coating device provided with a paint discharge device.

The coating method using the single-wafer coating apparatus of the present invention is preferably applied to a process of manufacturing a color filter which is a component of a liquid crystal element for color display. Usually, a color filter is formed by forming a black metal or black resin light-shielding layer called a black matrix or a black stripe on a transparent substrate, and forming an opening of the light-shielding layer as a colored pixel.
A colored layer having colored pixels of three primary colors (red), G (green), and B (blue) and a protective layer provided as needed are formed. Therefore, the coating method of the present invention using the single-wafer coating apparatus of the present invention is used for coating the resist used for forming the light-shielding layer, the colored layer, and the protective layer or for patterning the coating film. As a result, a coating film having a small film thickness can be formed with a good yield by a die coater, and a good color filter can be formed with a good yield.

[0025]

Example 1 A transparent substrate (Nippon Electric Glass) after washing a photosensitive resin (alkali-soluble negative resist “CFPR BK-416” manufactured by Tokyo Ohka Kogyo Co., Ltd.) in which a black pigment is dispersed. "OA-2" manufactured by Co., Ltd., substrate size: 3
(60 mm × 465 mm) using a spin coater, and then prebaked on a hot plate at 90 ° C. for 5 minutes. Next, after performing exposure through a photomask having a desired shape, development is performed using a spin developing machine ("NA" manufactured by Tokyo Ohka Kogyo Co., Ltd. as a developing solution).
3K ") and a rinsing treatment (pure water). After removing the pure water on the surface by spin drying, the substrate was finally post-baked at 200 ° C. for 60 minutes in a hot air circulating drier to form a black matrix pattern. At this time, the thickness of the black matrix was 1.0 μm.

An acrylic photosensitive resin composition having the following composition was used as a coating material, and coating was performed using the coating device shown in FIG. 2 equipped with a coating material discharging device having a die having the structure shown in FIG.

[Composition of Photosensitive Resin Composition] Terpolymer having the following composition 10.0 parts by weight Methyl methacrylate 5.0 parts by weight Hydroxymethyl methacrylate 3.0 parts by weight 2.0 parts by weight N-methylolacrylamide Triphenylsulfonium triflate 0.3 parts by weight (“TPS-105” manufactured by Midori Kagaku) Ethyl cellosolve 89.7 parts by weight

Ethyl cellosolve, a solvent for the paint, was used as the treatment liquid. The slit gap of the paint slit is 50 μm, and the slit gap of the processing liquid slit is 20
μm, the interval between both slits was set to 100 μm, and the clearance was set to 75 μm. A diaphragm pump was used as a metering pump for feeding the paint, and a processing liquid tank was placed in a pressurized canister as a metering pump for feeding the processing liquid, and was pressurized with 0.4 kg / cm ² of pressurized air. A high-precision servomotor was used to drive the transfer stage.

The above paint was charged into a paint tank, and the inside of the liquid feed path up to the die was previously filled with the paint. Ethyl cellosolve was charged into the treatment liquid tank, and the inside of the liquid supply path up to the die was filled with this solvent in advance.

The coating width was set to 355 mm, the substrate transfer speed was set to 20 mm / s, and the discharge of the processing liquid and the paint was started from a position 2 mm from the end of the material to be coated. 49.5μl of paint
The processing liquid was discharged at a discharge rate of 20 μl / s at a discharge rate of 20 μl / s.

Next, a part of the photosensitive resin composition (paint) layer is pattern-exposed through a photomask having an opening in a region where a black matrix is formed, and further exposed to a hot plate at 120 ° C. Heat treatment was performed for minutes. By this step, a partial curing treatment of the photosensitive resin composition layer was performed. The coated substrate was prebaked on a hot plate at 90 ° C. to form a 0.7 μm-thick photosensitive resin composition layer having a thickness measured at the opening of the black matrix.

Next, the ink jet recording apparatus
R, G, B using the ink having the following ink composition
The desired pattern consisting of three colors was formed.

(Ink composition) 5 parts by weight of dye R: C.I. I. Acid Red 118 G: C.I. I. Acid Green 25 B: C.I. I. Acid Blue 113 Ethylene glycol 10 parts by weight Isopropyl alcohol 3 parts by weight Deionized water 82 parts by weight

Subsequently, the ink was dried in an oven at 90 ° C. for 20 minutes, and then heat-treated in an oven at 230 ° C. for 60 minutes to cure the colored photosensitive resin composition layer to form a colored portion.

Further, a two-component thermosetting resin ("SS-6500" manufactured by JSR Corporation) was spin-coated on the colored portion as a protective layer so as to have a thickness of 1 μm, and the coating was performed at 230 ° C. for 1 hour. Heat treatment was performed to cure.

When a liquid crystal device was assembled using the color filters thus obtained, an image having no defect and excellent color characteristics was obtained.

Example 2 A black matrix was formed on a transparent substrate using only the paint supply system of a coating apparatus having two bases as shown in FIG. As a transparent substrate, a 360 mm × 465 mm × 0.7 mm glass substrate “1737” manufactured by Corning Incorporated was used, and as a coating material, an alkali-soluble negative resist (“V259-” manufactured by Nippon Steel Corporation) was used.
BK739P "). Slit gap is 30μ
m and clearance were set to 50 μm. A diaphragm pump was used as the metering pump for feeding the paint, and a high-precision servomotor was used to drive the transfer stage.

The above-mentioned paint was charged into a paint tank, and the inside of the liquid feeding passage up to the die was filled with the paint in advance. Coating width is 35
The discharge of the paint was started at a position of 5 mm, a substrate transfer speed of 26 mm / s, and a position 2 mm from the end of the material to be coated. Paint 6
Discharge was performed at a discharge rate of 0.0 μl / s.

The obtained coated substrate was heated on a hot plate for 8 hours.
Prebaking was performed at 0 ° C. for 3 minutes. Next, after performing exposure through a photomask having a desired shape,
Development (using an alkali developer “V-259ID” manufactured by Nippon Steel Chemical Co., Ltd.) and rinsing treatment (using pure water) were performed using a spin developing device. After removing the pure water on the surface by spin drying, finally at 200 ° C.
A post-bake for 0 minutes was performed to form a black matrix pattern. The thickness of the black matrix was 1.0 μm.

An aqueous ink-absorbing resin composition having the following composition was applied as a paint to the obtained black matrix substrate using the coating apparatus having the same configuration as that shown in FIG.

[Composition of Resin Composition] 10 parts by weight of a binary copolymer having the following composition (monomer composition weight ratio: 50:50): N-methoxymethylacrylamide methyl methacrylate triphenylsulfonium triflate 0.3 part by weight (midori) 89.7 parts by weight of ethyl cellosolve. A paint was charged into a paint tank, and the inside of a liquid feeding passage up to a base was filled with the paint in advance. Ethyl cellosolve as a processing liquid was charged into a processing liquid tank, and the inside of a liquid feeding path up to a die was previously filled with this solvent.

The slit gap of the die for supplying the paint was set to 40 μm, the clearance was set to 75 μm, the slit gap of the die for supplying the treatment liquid was set to 30 μm, and the clearance was set to 40 μm. A high-precision diaphragm pump was used for both the quantitative pump for feeding paint and the quantitative pump for sending processing liquid, and a high-precision servomotor was used to drive the substrate transfer stage.

The coating width is 355 m for both the paint and the processing liquid.
m, the substrate transfer speed is 20 mm / s, the paint discharge rate is 49.5 μl / s, and the processing liquid discharge rate is 20.0 μl / s.
It was set to μl / s. What is the processing liquid base and paint base?
Discharge is started at a position 2 mm from the front end of the material to be coated, and 3 m from the rear end of the material to be coated.
The discharge was stopped at the position of m.

The coated substrate thus obtained was placed on a hot plate 9
Heat treatment was performed at 0 ° C. for 1 minute. The film thickness was 1.0 μm at the opening of the black matrix.

Subsequently, a color filter was prepared by coloring the resin layer in the same manner as in Example 1, and a liquid crystal element for color display was assembled using the color filter. A color image was obtained.

Example 3 After forming a black matrix on a glass substrate in the same manner as in Example 2, 20 ml of ethyl cellosolve was dropped on the substrate, and the number of rotations was 1500 rpm.
m for 20 seconds and spin coated. On this board,
The same resin composition as in Example 2 was used as a coating material and was applied using only the coating material supply system of the coating apparatus having the configuration shown in FIG. The slit gap of the mouthpiece was set to 40 μm, the clearance was set to 75 μm, and the paint was charged into a paint tank, and the inside of the liquid feed path up to the mouthpiece was previously filled with the paint.

The coating width is 355 mm and the substrate transfer speed is 20
mm / s, the discharge rate is 49.5 μl / s, and the discharge of the paint is started from a position 2 mm from the front end of the workpiece,
The discharge was stopped at a position 3 mm from the rear end. The obtained coated substrate was subjected to a heat treatment at 90 ° C. for 1 minute on a hot plate. In this step, the resin layer was cured, and the film thickness was 1.0 μm.

Subsequently, in the same manner as in Example 1, the above resin layer was colored to produce a color filter, and a liquid crystal element for color display was assembled using the color filter. A color image was obtained.

(Comparative Example 1) Example 1 was performed using a coating apparatus having a die having one slit as shown in FIG.
The same photosensitive resin composition as in Example 1 was applied as a coating material.
The slit gap of the die was set to 50 μm, and the clearance was set to 75 μm. A diaphragm pump was used as a fixed-quantity pump for feeding paint, and a high-precision servomotor was used to drive the transfer stage.

The paint was charged into a paint tank, and the inside of the liquid feed path up to the die was filled with the paint in advance. The coating width is 355m
m, the discharge speed of the coating material is started from a position 2 mm from the front end of the coating material, the coating material conveyance speed is 20 mm / s, and 49.
The paint was discharged at a discharge rate of 5 μl / s.

The coating film of the obtained coated substrate had streak-like defects as shown in FIG.

(Comparative Example 2) The photosensitive resin composition used in Example 1 was used as a coating material on a glass substrate on which a black matrix was formed in the same manner as in Example 2 using a coating apparatus having the structure shown in FIG. Coating was performed. 40μ slit gap
m, the clearance was set to 75 μm, and a diaphragm pump was used as a fixed-quantity pump for feeding paint, and a high-precision servomotor was used for driving the transfer stage.

The paint is charged into the paint tank, and the inside of the liquid supply path up to the base is filled with the paint in advance, and the coating width is 355 m.
m, the substrate transfer speed was 20 mm / s, and the discharge of paint was started from a position 2 mm from the front end of the material to be coated, and 49.5 μl /
The paint was discharged at a discharge rate of s.

The coating film of the obtained coated substrate had streak-like defects as shown in FIG.

[0055]

As described above, according to the present invention,
The surface energy for the coating material is low, even for a coating material that is difficult to apply a thin film coating, since it can be coated well by a die coater, the application range of the die coater is expanded, and the present invention By adopting the coating method for coating each layer of the color filter, a high-quality color filter can be manufactured at low cost.

[Brief description of the drawings]

FIG. 1 is a schematic cross-sectional view showing a configuration example of a die of a paint discharge device used in an embodiment of a coating device of the present invention.

FIG. 2 is a schematic diagram showing a configuration of an embodiment of a coating apparatus of the present invention.

FIG. 3 is a schematic view showing the configuration of another embodiment of the coating apparatus of the present invention.

FIG. 4 is a schematic diagram showing a configuration of a coating apparatus used in a comparative example of the present invention.

FIG. 5 is a view showing streak-like defects of a coating film obtained in a comparative example of the present invention.

[Explanation of symbols]

 REFERENCE SIGNS LIST 1 front lip 2 rear lip 3 partition plate 4, 5 shim 6 paint slit 7 treatment liquid slit 8 coating film 9 coating material 10 paint bead 11 manifold 12 base 12 a paint base 12 b treatment liquid base 13 transport stage 21, 31 Metering pump 22, 32 Filter 23, 33 On-off valve 24, 34 Piping 25 Paint tank 35 Treatment liquid tank

 ──────────────────────────────────────────────────続 き Continued on the front page F-term (reference) 2H025 AA00 AB13 AB16 EA01 EA04 EA10 FA01 FA04 FA17 FA29 FA37 2H048 AA09 BA16 BA17 BA25 BA27 4D075 AC14 AC94 BB95Y CA48 DA06 DB13 DC22 DC24 4F041 AA02 AA06 CA02 CA04 CA15 CA16 CA15F

Claims (4)

[Claims] 1. A coating film is formed by discharging a coating material from a slit of a coating material discharging device on the surface of the coating material while moving at least one of a coating material and a coating material discharging device relative to the other. A coating solution that reduces the contact angle of the coating material on the surface of the material to be coated is applied or sprayed on the surface of the material to be coated in advance, and the coating material is dried before the processing solution is dried. A sheet-fed coating method characterized by coating. 2. A single-wafer coating apparatus used in the single-wafer coating method according to claim 1, comprising two paint supply devices for a paint and a treatment liquid, and a paint supplied from the paint supply device. A paint discharging device having two slits for discharging the processing liquid toward the material to be coated, and discharging the processing liquid from a preceding slit in a relative advancing direction of the coating material supply device; A sheet-fed coating apparatus comprising: a stage for holding a work material; and means for moving at least one of the paint discharge device and the stage relative to the other. 3. A single-wafer coating apparatus used in the single-wafer coating method according to claim 1, comprising two paint supply devices for a paint and a processing liquid, and a paint supplied from the paint supply device. A paint discharge device having two bases each having a slit for discharging the processing liquid toward the material to be coated, a stage for holding the material to be coated, and at least one of the paint discharge device and the stage being the other And a means for relatively moving the sheet coating apparatus. 4. A method for manufacturing a color filter having a light-shielding layer having an opening, a colored layer filling at least the opening, and a protective layer on a transparent substrate, wherein the light-shielding layer comprises:
A method for producing a color filter, comprising using the single-wafer coating method according to claim 1 in a step of forming at least one layer of a colored layer, a protective layer, and a resist used in the steps of producing these layers.