JP2000131831A5 - - Google Patents
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- Publication number
- JP2000131831A5 JP2000131831A5 JP1999105136A JP10513699A JP2000131831A5 JP 2000131831 A5 JP2000131831 A5 JP 2000131831A5 JP 1999105136 A JP1999105136 A JP 1999105136A JP 10513699 A JP10513699 A JP 10513699A JP 2000131831 A5 JP2000131831 A5 JP 2000131831A5
- Authority
- JP
- Japan
- Prior art keywords
- surfactant
- lithographic printing
- image forming
- forming element
- mode image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004094 surface-active agent Substances 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 2
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- 230000005660 hydrophilic surface Effects 0.000 description 1
- 229920001600 hydrophobic polymer Polymers 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- -1 polysiloxane Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
Description
【特許請求の範囲】
【請求項１】
親水性表面を有する平版印刷ベース上に、水性アルカリ性溶液中に可溶性のポリマーを含む第１層ならびに平版印刷ベースの第１層と同じ側の上の最上層を有し、最上層はＩＲ−感受性で且つ水性アルカリ性現像液に関して非浸透性である平版印刷版の作製のためのヒートモード画像形成要素であって；該第１層及び該最上層の少なくとも１つが界面活性剤を含むことを特徴とするヒートモード画像形成要素。
【請求項２】
該界面活性剤がペルフルオロアルキル界面活性剤及びアルキルフェニル界面活性剤から成る群より選ばれる界面活性剤である請求項１に記載の平版印刷版の作製のためのヒートモード画像形成要素。
【請求項３】
該界面活性剤がポリシロキサン界面活性剤である請求項１に記載の平版印刷版の作製のためのヒートモード画像形成要素。
【請求項４】
界面活性剤が０．００３〜０．０５０ｇ／ｍ ２ の範囲の量で存在する請求項１〜３のいずれかに記載の平版印刷版の作製のためのヒートモード画像形成要素。
【請求項５】
第１層に含まれる該ポリマーが疎水性ポリマーである請求項１〜４のいずれかに記載の平版印刷版の作製のためのヒートモード画像形成要素。
[Claims]
[Claim 1]
On a lithographic printing base with a hydrophilic surface, there is a first layer containing a polymer soluble in an aqueous alkaline solution and an uppermost layer on the same side as the first layer of the lithographic printing base, the uppermost layer being IR-sensitive. It is a heat mode image forming element for producing a lithographic printing plate that is impermeable to an aqueous alkaline developer; at least one of the first layer and the top layer contains a surfactant. Heat mode image forming element.
2.
The heat mode image forming element for producing a lithographic printing plate according to claim 1, wherein the surfactant is a surfactant selected from the group consisting of a perfluoroalkyl surfactant and an alkylphenyl surfactant.
3.
The heat mode image forming element for producing a lithographic printing plate according to claim 1, wherein the surfactant is a polysiloxane surfactant.
4.
The heat mode image forming element for producing a lithographic printing plate according to any one of claims 1 to 3, wherein the surfactant is present in an amount in the range of 0.003 to 0.050 g / m 2.
5.
The heat mode image forming element for producing a lithographic printing plate according to any one of claims 1 to 4, wherein the polymer contained in the first layer is a hydrophobic polymer.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP98201215.5 | 1998-04-15 | ||
| EP98201215 | 1998-04-15 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000131831A JP2000131831A (en) | 2000-05-12 |
| JP2000131831A5 true JP2000131831A5 (en) | 2006-06-08 |
| JP4208339B2 JP4208339B2 (en) | 2009-01-14 |
Family
ID=8233604
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10513699A Expired - Lifetime JP4208339B2 (en) | 1998-04-15 | 1999-04-13 | Heat mode sensitive imaging element for the production of positive working printing plates |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP4208339B2 (en) |
| DE (1) | DE69900799T2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5319097B2 (en) | 2007-10-16 | 2013-10-16 | イーストマン コダック カンパニー | Positive lithographic printing plate precursor and its plate making method |
-
1999
- 1999-02-23 DE DE1999600799 patent/DE69900799T2/en not_active Expired - Lifetime
- 1999-04-13 JP JP10513699A patent/JP4208339B2/en not_active Expired - Lifetime
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