JP2000111921A - Photosensitive resin material, alignment film material for liquid crystal and liquid crystal element using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To form org. polymeric alignment film, which has a uniform thickness with excellent flatness and which is excellent in uniformity of liq. crystal alignment by contg. a specific polymer and if necessary photo-polymerization initiator and one or more kinds of photo-sensitizer. SOLUTION: This photosensitive resin material contains a polymer having a structure expressed by a formula I as a main component and if necessary a photo-polymerization initiator and at least one kind of photo-polymerization. In the formula I, R is selected from a formula II and L is 1 or 2, and carboxyl group is bonded at a ortho-position against carbonyl group comprising a main chain. And each of m and n is individually 0 or 1, o is an integer of from 2 to 10, and R1 means hydrogen atom or 1-4C lower alkyl group. In this way, after coating on a full surface of substrate with spinner or the like, a chemical beam is irradiated with a fixed mask, and by removing an undesired area with developing treatment, an org. polymeric alignment film, which has uniform thickness with excellent flatness and which is excellent in uniformity of liq. crystal alignment is obtained.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive resin material, a liquid crystal alignment film material, and a liquid crystal device using the same. TECHNICAL FIELD The present invention relates to a photosensitive resin material used as an alignment film material of a liquid crystal element used for a light valve of a flat panel display, a projection display, a printer, and the like, a liquid crystal alignment film material using the same, and a liquid crystal element.

[0002]

2. Description of the Related Art Conventionally, in a nematic liquid crystal display device, an active matrix (for example, a TF) in which an active element such as a transistor is disposed in each pixel.
A liquid crystal element called T) is being developed. At present, as a mode of a nematic liquid crystal used for a liquid crystal display device using this TFT, for example, M. Shut (M.
Schadt) and W. Helfrich (W. He)
Ifrich), "Applied Physics"
Letters, Vol. 18, No. 4 (February 1, 1971
5th edition) Twisted Nemat shown on pages 127 to 128
ic) mode is widely used.

Further, recently, in-plane switching (In-Plane Switch) using a lateral electric field has been proposed.
(hing) mode has been announced, and the viewing angle characteristic which has been a drawback of the twisted nematic mode liquid crystal display has been improved. In addition, as a typical example of a nematic liquid crystal display element that does not use an active element such as a TFT described above, a super twisted nematic (Su)
per Twisted Nematic) mode.

In order to improve the disadvantage that the response speed of the liquid crystal in the conventional nematic liquid crystal device takes several tens of milliseconds or more, devices using a liquid crystal exhibiting bistability include Clark and Clark. Proposed by Lagerwell (JP-A-56-107216, U.S. Pat. No. 4,436,792).
No. 4 specification). As the liquid crystal exhibiting this bistability, a ferroelectric liquid crystal exhibiting a chiral smectic C phase is generally used. Since the ferroelectric liquid crystal performs inversion switching by spontaneous polarization, a very fast response speed can be obtained and a bistable state having a memory property can be developed. Further, since the viewing angle characteristics are also excellent, it is considered that they are suitable as a high-speed, high-definition, large-area display element or light valve.

On the other hand, recently, antiferroelectric liquid crystals exhibiting three stability have attracted attention. This antiferroelectric liquid crystal performs reversal switching by spontaneous polarization similarly to the ferroelectric liquid crystal, so that a very fast response speed can be obtained. This liquid crystal material
When an electric field is not applied, the liquid crystal molecules have a molecular alignment structure that cancels out each other's spontaneous polarization. Therefore, it is characterized in that there is no spontaneous polarization when no electric field is applied. More recently, a thresholdless antiferroelectric liquid crystal developed to drive this antiferroelectric liquid crystal by an active matrix element has been reported.

[0006] The ferroelectric liquid crystal and the antiferroelectric liquid crystal which perform inversion switching by such spontaneous polarization are liquid crystals exhibiting a smectic liquid crystal phase. That is, the realization of a liquid crystal display device using a smectic liquid crystal is expected in the sense that the problem relating to the response speed of the conventional nematic liquid crystal can be solved.

FIG. 3 is a plan view of these general liquid crystal elements. FIG. 4 is a sectional view taken along the line AA 'in FIG. 3 and 4, reference numerals 1la and 1lb denote transparent substrates, 12a and 12b denote transparent electrode films (patterns), 17a and 17b denote connection portions with drive circuits for sending electric signals to the transparent electrode films 12a and 12b, and 13a and 13b. Are upper and lower transparent electrode films 12a, 12b
An inorganic oxide insulating film for preventing short circuit between them, 14
a and 14b are alignment films for regulating the alignment of the liquid crystal;
Is a liquid crystal material, and 16 is a spacer.

In such a liquid crystal element, oblique vapor deposition of SiO, LB
Although methods using a film are known, these alignment methods are not suitable for uniformly aligning a large screen. Therefore, it is desirable to perform an alignment treatment by rubbing, which has a simple manufacturing process and excellent productivity.

Generally, a liquid crystal device as shown in FIGS. 3 and 4 is manufactured by a series of steps as follows. That is, first, transparent electrode films 12a and 12b are formed on a pair of transparent substrates 1la and 1lb, respectively, as needed,
Further, the inorganic oxide insulating films 13a and 13b, the alignment film 14
a and 14b are sequentially formed. And the obtained alignment film 14
a and 14b are each subjected to an alignment treatment by rubbing and then opposed to each other with a spacer 16 therebetween.
5 to fill a liquid crystal element.

Incidentally, the alignment film 1 in the above-described manufacturing method is used.
4a and 14b must be formed only in the region inside the sealant 18 in order to maintain the reliability against humidity and maintain the adhesive strength of the sealant 18. Therefore, conventionally, as a method for forming the alignment films 14a and 14b, a method of applying a solution such as polyimide or polyimide amide or a precursor thereof only in that region by flexographic printing and then performing a heat treatment, or a method of forming a photosensitive polyimide or polyamide After applying the imide solution or its precursor entirely with a spinner or the like, masking and irradiating with actinic radiation, developing and removing unnecessary parts, and then performing heat treatment to form the film. .

[0011]

However, in a conventional method for forming an alignment film, a solution such as polyimide or polyamideimide or a precursor thereof is applied only in that region by flexographic printing and then heated. Is caused by solvent resistance in solution such as polyimide, falling off the rubber surface of the printing plate during flexographic printing, falling off of dust due to contact with the developed plate, etc., which may result in lowering the yield There were many. Further, when the size is increased, the uniformity of the film thickness distribution is deteriorated, and the electric characteristics at the time of driving are often deteriorated.

Further, after a photosensitive polyimide or polyamideimide solution or its precursor is coated on the entire surface by a spinner or the like, masking and irradiation with actinic radiation are performed, development is performed to remove unnecessary portions, and heating is performed. In such a method, a material that can achieve both good photosensitivity and uniform alignment of liquid crystal over a large area is required.

The present invention has been made to solve such problems of the prior art. When an alignment film for a liquid crystal element is manufactured, the entire surface is coated on a substrate by a spinner or the like, and then a predetermined amount is applied. By irradiating actinic radiation through a mask and removing unnecessary areas by development processing, an organic polymer alignment film with excellent flatness and uniform thickness and excellent liquid crystal uniform alignment It is an object of the present invention to provide a photosensitive material capable of forming a photosensitive material.

Further, the present invention provides a liquid crystal element which is excellent in uniform liquid crystal alignment by using the photosensitive resin material as an alignment film material for liquid crystal and using an alignment film made of the alignment film material for liquid crystal. It is intended to do so.

[0015]

That is, the present invention provides (1)
A photosensitive resin material characterized by containing a polymer having a structure represented by the following general formula (I) as a main component and (2) at least one of a photopolymerization initiator and a photosensitizer as required. is there.

[0016]

Embedded image (Where R is

[0017]

Embedded image Selected from.

L represents 1 or 2, and the carboxyl group is bonded ortho to the carbonyl group constituting the main chain. m and n are each independently 0 or 1,
o is an integer of 2 to 10. R ₁ represents a hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms. )

In the present invention, the polymer having the structure represented by the general formula (I) as a main component is represented by the following general formula (I)
It is preferably a polymer having the structure represented by I) as a main component.

[0020]

Embedded image (Wherein, m and n are each independently 0 or 1,
o is an integer of 2 to 10. R ₁ represents a hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms. )

According to the present invention, there is provided an alignment film material for liquid crystal, comprising the above photosensitive resin material. Furthermore, the present invention is a liquid crystal device using an alignment film made of the above-mentioned alignment film material for liquid crystal.

[0022]

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail.
The photosensitive resin material of the present invention is a material suitable as an alignment film material for a liquid crystal element, and (1) a polymer having a structure represented by the following general formula (I) as a main component; A photosensitive polyimide or polyamide imide material containing at least one of a photopolymerization initiator and a photosensitizer.

[0023]

Embedded image In the general formula (I), R is

[0024]

Embedded image Selected from.

L represents 1 or 2, and the carboxyl group is bonded ortho to the carbonyl group constituting the main chain. m and n are each independently 0 or 1,
o is an integer of 2 to 10. R ₁ represents a hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a plan view showing one embodiment of the liquid crystal element of the present invention. FIG. 2 is a sectional view taken along the line BB 'of FIG. 1 and 1, 1 la and 1 lb are transparent substrates, 12
a and 12b are transparent electrode films (patterns), 17a and 17b
Is a connection portion with a drive circuit for sending an electric signal to the transparent electrode films 12a and 12b, 13a and 13b are inorganic oxide insulating films for preventing short circuit between the upper and lower transparent electrode films 12a and 12b, 24a and 24b Is an alignment film made of the photosensitive resin material of the present invention for regulating the alignment of liquid crystal, 15 is a liquid crystal material, and 16 is a spacer.

In the method of manufacturing a liquid crystal device as shown in FIGS. 1 and 2, first, transparent electrode films 12a and 12b are formed on a pair of transparent substrates 1la and 1lb, respectively, as necessary, and then an inorganic oxide film is formed. The insulating films 13a and 13b and the alignment films 24a and 24b are sequentially formed. Then, the obtained alignment films 24a and 24b are each subjected to an alignment treatment by rubbing, and then disposed to face each other via a spacer 16, and a liquid crystal material 15 is filled between them to manufacture a liquid crystal element.

A highly transparent material such as glass or plastic is preferably used for the substrates 1la and 1lb, and a transparent electrode such as ITO is used for the electrodes 12a and 12b.

The liquid crystal material constituting the liquid crystal material 15 includes
Preferably, a chiral smectic liquid crystal showing ferroelectricity or antiferroelectricity is used. In this case, the cell gap (distance between substrates) is preferably about 0.5 to 5 μm in order to realize bistability based on the Clark and Ragawell models described above. Nematic liquid crystal can also be used as a liquid crystal material.

Various types of photosensitive resins are known as the photosensitive resin for forming the alignment film.
It is preferable to use polyimide from the viewpoint of other various film properties.

Various methods are known for imparting photosensitivity to the polyimide resin. However, since the storage stability of the photosensitive resin composition is excellent, a photosensitive monomer is bonded to the skeleton. It is preferable to use a photosensitive resin made of Preferably, the above-mentioned photosensitive resin material, that is, (1) a polymer having a structure represented by the general formula (I) as a main component, and (2) at least one of a photopolymerization initiator and a photosensitizer as required A photosensitive polyimide or polyamideimide resin containing

In the structure represented by the general formula (I),
From the viewpoint of ease of raw material procurement

[0033]

Embedded image And more preferably

[0034]

Embedded image Is used. m and n both preferably represent 1, and o preferably represents an integer of 4 to 8.

The specific structure of the polyimide represented by the general formula (I) includes, for example, the following repeating unit structures.

[0036]

Embedded image

[0037]

Embedded image

[0038]

Embedded image

[0039]

Embedded image

[0040]

Embedded image

[0041]

Embedded image

[0042]

Embedded image

[0043]

Embedded image

The content of the polymer of the general formula (1) is not particularly limited, since an appropriate value can be selected depending on the method of coating, the thickness of the alignment film to be formed, the molecular weight of the polymer, and the like. For example, when applying by a spin coating method, the solid content of the polymer is 0.02 to 10%.
It is manufactured so that it may become weight%.

As the photopolymerization initiator or photosensitizer used in the present invention, various known materials can be used. For example, benzophenone, Michler's ketone,
4,4'-diethylaminobenzophenone, xanthone, thioxanthone, 2-chlorothioxanthone, 2-
Methylthioxanthone, 2-isopropylthioxanthone, 2,4-diethylthioxanthone, acetophenone, 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, benzyl,
Ethyl anthraquinone, 2-hydroxy-2-methylpropiophenone, 2-hydroxy-4'-isopropyl-2-methylpropiophenone, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- [4- (methylthio) phenyl 2-morpholino-1-propanone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -1-butanone, isopropyl benzoin ether, isobutyl benzoin ether, benzoin methyl ether, benzoin ethyl ether,
2,2-diethoxybenzophenone, camphorquinone, benzuanthrone, 3,3 ′, 4,4′-tetra (t-butylperoxycarbonyl) benzophenone,
N-phenyl-glycine, p-hydroxy-N-phenylglycine, tetramethylthiuram monosulfide, tetramethylthiuram disulfide, p-tolyl disulfide, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 3,3 '-Carbonyl-
Examples thereof include bis (7-diethylamino) coumarin and the like, but are not limited thereto. The addition amount of the photopolymerization initiator or the photosensitizer is 0.05 to 20 parts by weight based on 100 parts by weight of the polymer material (the photosensitive monomer portion bonded to the polymer skeleton represented by the general formula (I)). Is preferred.

The photosensitive resin material of the present invention is applied on a substrate by a method such as spin coating, dipping, spraying, printing, and the like, and then heated at 30 to 150 ° C. using a heating means such as an electric furnace or a hot plate. By performing prebaking for several minutes to tens of minutes at a temperature, most of the solvent in the coating film is removed. Put a negative mask on this coating, X-ray, electron beam,
The pattern is formed by irradiating actinic rays such as ultraviolet rays or visible rays. Thereafter, the unexposed portions are dissolved and removed with a developer to obtain a relief pattern.

As the developing solution, N-methyl-2-pyrrolidone, N, N-dimethylacetamide, N, N-dimethylformamide and the like, methanol, ethanol, isopropyl alcohol, water and the like are used alone or in combination. As a developing method, a system such as spray, paddle, immersion, and ultrasonic wave can be used. Next, the relief pattern is rinsed with a rinse liquid such as methanol, ethanol, or isopropyl alcohol. Since the polymer of the relief pattern obtained by development is in the form of a precursor, it is patterned by heating it at a temperature of 150 to 450 ° C., preferably 150 to 300 ° C. for several tens to several hours by the above-mentioned heating means. The photosensitive component cured by actinic radiation is decomposed and volatilized by heat to obtain a polyimide relief pattern substantially consisting of a main skeleton. Thereafter, the surface is rubbed with a fibrous material such as velvet, cloth or paper to form an alignment film.

The spacer 16 determines the distance between the substrates (cell gap), and for example, silica beads are used. In addition to the spacer 16, the substrate 1l
Adhesive particles made of a resin material such as an epoxy resin may be dispersed between the substrates in order to improve the adhesiveness between a and 1 lb.

The driving method of the liquid crystal element of the present invention is described in, for example, JP-A-59-193426 and JP-A-59-19.
The driving method described in JP-A-3427, JP-A-60-156046, and JP-A-60-156047 can be used.

[0050]

Hereinafter, the present invention will be described in detail with reference to specific examples, but the present invention is not limited to the following examples.

Example 1 Preparation of Liquid Crystal Composition Liquid crystal composition LC-1 was prepared using the following liquid crystal compounds.

[0052]

Embedded image

[0053]

Embedded image

The physical property parameters are shown below.

[0055]

(Equation 1)

Preparation of photosensitive polyimide resin composition (photosensitive resin material) 1 A 50 ml four-necked flask equipped with a stirrer, a nitrogen inlet tube, a discharge tube equipped with a calcium chloride tube, and a thermometer was previously filled with nitrogen gas. Replaced. 1.85 g (5.0 mmol) of a diamine represented by the following formula was added to this flask under a nitrogen stream.
l) and charged with special grade N, N-dimethylacetamide 15
was dissolved in ml. 1.09 pyromellitic anhydride
g (5.0 mmol) as a solid was added, and the solid content on the reaction vessel wall was reduced to a special grade N, N-dimethylacetamide 5m
l. Then, after reacting at 30 ° C. for 5 hours, the reaction solution was poured into methanol, and the precipitated polyamic acid was filtered and dried under reduced pressure.

[0057]

Embedded image

The obtained reaction product (1.35 g) was dissolved in dimethylacetamide (8.65 g) to obtain a polyamic acid solution (A) having a solid content of 13.5%.

A 300 ml four-necked flask equipped with a stirrer, a nitrogen inlet tube, a discharge tube equipped with a calcium chloride tube, and a thermometer was replaced with nitrogen gas in advance. In this flask, 10 g of the previously synthesized polyamic acid solution (A) (2.
36 mmol), and 16.74 g of special grade N, N-dimethylacetamide was added to obtain a solution (B). On the other hand, under a nitrogen stream, 5.7 g of a photopolymerization initiator Irgacure 651 (manufactured by Ciba Geigy) and a sensitizer Dytocure PAA
2.85 g (manufactured by Daito Chemical Industry Co., Ltd.) was treated with special grade N, N-dimethylacetamide Solution dissolved in Ig (C)
Was prepared.

To the solution (B) obtained above, 0.26 g of the solution (C) was added and mixed in an ultrasonic wave.
It filtered by pressure using a filter of a micrometer hole, and produced the photosensitive polyimide resin composition (PI-A) whose solid content concentration is 5.3% (solid content concentration of polyamic acid is 5.0%).

Preparation of Cell A matrix cell (simple matrix type cell) used in the embodiment was prepared as follows.

Cell A A pair of 1.1 mm-thick glass substrates on which a stripe-patterned ITO film (thickness: about 70 nm, width of one line: 16 μm, interval between adjacent lines: 4 μm) was formed as a transparent electrode was prepared.

A ladder-type polysiloxane ethanol solution was applied to each of the glass substrates by spin coating, and then pre-dried at 80 ° C. for 5 minutes.
Heat drying was performed at 200 ° C. for one hour to obtain a polysiloxane layer having a thickness of 3 nm. The previously prepared photosensitive polyimide resin composition (PI-A) was applied onto the polysiloxane layer by spin coating, and then pre-dried at 100 ° C. for 5 minutes.

Next, a mask was arranged on the polyimide film on each glass substrate so that light was irradiated only to the region inside the sealant. Subsequently, exposure was performed using a high-pressure mercury lamp at a UV intensity at which the light energy amount at a wavelength of 365 nm was 1.44 J / cm ² . Next, development was performed for 15 seconds using a developing solution of dimethylformamide / ethanol = 5/5, followed by washing in ethanol and drying the substrate. Thereafter, the substrate is heated and baked at 200 ° C. for 1 hour, and is composed of a portion where the polyimide film is present on the substrate in a thickness of 50 nm corresponding to the region in the sealant and a portion where the polyimide film corresponding to the sealant and the drive circuit connection portion is not present. A polyimide film pattern was obtained.

Subsequently, the polyimide on the substrate was subjected to a rubbing treatment with a nylon cloth as a uniaxial orientation treatment. The conditions of the rubbing treatment were as follows: a rubbing roll having nylon (NF-77 / manufactured by Teijin) adhered to a roll having a diameter of 10 cm, a pushing amount of 0.3 mm, and a feed speed of 10 c
m / sec, rotation speed 1000 rpm. The number of times of feeding was four times. The direction of the rubbing treatment is I
The direction was set perpendicular to the stripe direction of TO, and the other substrate was set parallel to the stripe direction of ITO.

Subsequently, as a spacer on one of the substrates,
Spraying silica beads having an average particle size of 2.0 μm, and positioning the other substrate so that the electrodes of each substrate are orthogonal to each other and have a matrix electrode arrangement, and the rubbing direction in the polyimide film is the same, A cell (empty cell) having a sectional structure as shown in FIG. 2 was prepared.

Cell B As the photosensitive polyimide resin composition, lithocoat (LI)
THOCOAT) PI-400 (manufactured by Ube Industries, Ltd.)
A cell (empty cell) was prepared in the same manner and under the same conditions as for the cell A, except for using.

Each of the cells produced by the above-described processes has a small gap defect due to the entry of dust, and can be produced with a high yield. Next, the liquid crystal composition LC-1 is injected into the cells A and B at an isotropic phase temperature, the liquid crystal is cooled to a temperature at which a chiral smectic liquid crystal phase is exhibited, and the chiral smectic liquid crystal element samples A and B exhibiting bistability are cooled. Produced.

These samples were evaluated for alignment uniformity. A voltage was applied to the liquid crystal element in a state of a chiral smectic liquid crystal phase to switch the chiral smectic liquid crystal to one state, and the uniformity of alignment was evaluated by visual observation with a deflection microscope. Table 1 shows the results.

[0070]

[Table 1]

From these results, it is possible to manufacture a cell with a high yield with little gap failure in a liquid crystal element manufactured using a photosensitive resin material as an alignment film material. Furthermore, the cell A using the photosensitive polyimide material according to the present invention was able to realize uniform alignment over the entire surface.

[0072]

As described in detail above, according to the present invention,
In the method for manufacturing a liquid crystal element, when forming an organic polymer alignment film on a substrate, a photosensitive polyimide or polyamideimide solution as a photosensitive resin material or a precursor thereof is applied over the entire surface by a spinner or the like, and then masked. Irradiation with actinic radiation, development processing to remove unnecessary parts, and heat treatment to form an alignment film with good flatness and uniform thickness with no gap failure and high yield It has become possible to manufacture with good productivity.

Further, by using a photosensitive polyimide or polyamideimide material as a photosensitive resin material for the liquid crystal element of the present invention, uniform alignment over the entire surface of the liquid crystal element could be realized.

[Brief description of the drawings]

FIG. 1 is a plan view showing one embodiment of a liquid crystal element of the present invention.

FIG. 2 is a sectional view taken along line BB ′ of FIG. 1;

FIG. 3 is a plan view showing a general liquid crystal element.

FIG. 4 is a sectional view taken along line AA ′ of FIG. 3;

[Explanation of symbols]

 1la, 1lb Transparent substrate 12a, 12b Transparent electrode film 13a, 13b Inorganic oxide insulating film 14a, 14b, 24a, 24b Organic polymer alignment film 15 Liquid crystal material 16 Spacer 17a, 17b Connection portion with drive circuit 18 Sealant

Continuing from the front page (72) Inventor Yasufumi Asao 3-30-2 Shimomaruko, Ota-ku, Tokyo Within Canon Inc. (72) Inventor Akino Katanosaka 2-6-1 Nishinagasu-cho, Amagasaki-shi, Hyogo Co., Ltd. Inside Nard Research Institute (72) Inventor Noriko Matoba 2-6-1 Nishi-Nagasu-cho, Amagasaki-shi, Hyogo Co., Ltd. Inside Nard Research Institute (72) Inventor Kazuyuki Masahara 2-6-Nishi-Nagasu-cho, Amagasaki-shi, Hyogo No.1 F-term in Nard Research Institute Co., Ltd. (reference) 2H025 AA00 AA10 AB17 AC01 AC04 AC05 AC06 AD01 BC15 BC69 CA01 CA20 CA27 CA31 FA03 FA15 FA29 2H090 HA14 HB08Y HB17Y HC05 HC11 HD14 KA13 LA01 LA03 MA05 MB01 4J038 DJ021 DJ021 PA14 PA17 PB08 PC03 4J043 ZB23

Claims (4)

[Claims] 1. A composition comprising (1) a polymer having a structure represented by the following general formula (I) as a main component and (2) at least one of a photopolymerization initiator and a photosensitizer as required. Characteristic photosensitive resin material. Embedded image (Wherein R is Selected from. L represents 1 or 2, and the carboxyl group is bonded ortho to the carbonyl group constituting the main chain. m and n are each independently 0 or 1, and o is an integer of 2 to 10. R ₁ represents a hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms. ) 2. The photosensitive resin material according to claim 1, wherein the polymer having a structure represented by the general formula (I) as a main component is a polymer having a structure represented by the following general formula (II) as a main component. . Embedded image (Wherein, m and n are each independently 0 or 1,
o is an integer of 2 to 10. R ₁ represents a hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms. ) 3. An alignment film material for a liquid crystal, comprising the photosensitive resin material according to claim 1. 4. A liquid crystal device using an alignment film made of the alignment film material for a liquid crystal according to claim 3.