JP2000084340A - Gas treating equipment - Google Patents

Abstract

PROBLEM TO BE SOLVED: To make a purifying device small-sized for a gas treating equipment for removing pollutant in gas by the purifying device. SOLUTION: An adsorbent X or absorbent for absorbing or absorbing a pollutant to decrease the pollutant concn. of a gas G to be treated and sent to a purifying device 2 against an increase in the pollutant concn. of the gas G and discharging the adsorbed or absorbed pollutant to increase the pollutant concn. of the gas G to be sent to the purifying device 2 against a decrease in the pollutant concn. of the gas G is provided in a gas line 3 for introducing the gas G to the purifying device 2. Further, the adsorbent X or absorbent to decrease the pollutant concn. of the gas G to be sent to the purifying device 2 is provided, and gas introducing means 7A and 7B for sending a clean gas A to the purifying device 2 through a part 5 packed with the adsorbent X or absorbent when the delivery of the gas G from its source 1 is stopped are furnished.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a purifier for removing contaminants contained in a gas to be treated sent from a source (hereinafter, simply referred to as a source) of contaminants (odor components and various harmful components). And a gas treatment facility for deodorizing and detoxifying a gas to be treated.

[0002]

2. Description of the Related Art Conventionally, in this type of gas treatment equipment, when the concentration of a pollutant component in the gas to be treated sent from the source fluctuates, the change in the concentration is directly applied to the purification device, resulting in a variation in the processing load in the purification device. I was

[0003]

However, in such conventional equipment, in order to ensure the desired deodorization and detoxification, the maximum concentration of the contaminant components in the gas to be treated sent from the source is reduced. It is necessary to equip a purification device with a large capacity that can sufficiently cope with the concentration, and when the concentration of the contaminant component of the gas to be treated sent from the source is low, there is no waste when this purification device becomes a device with excessive capacity. there were.

Similarly, in the conventional equipment, when the gas to be treated is intermittently delivered from the source, the concentration of the contaminant component of the gas to be treated sent from the source (if there is a fluctuation, the maximum There is also a waste that the purifying device equipped with the capability selected so as to be able to cope with the above becomes an entirely idle device when the gas delivery is stopped.

[0005] In view of this situation, the main problems of the present invention are:
The point is that the above-mentioned problem is effectively solved by adding a rational configuration.

[0006]

Means for Solving the Problems [1] In the invention according to the first aspect, the contamination of the gas to be treated sent from the generation source to a gas path for guiding the gas to be treated to a purification device for removing polluting components in the gas. In response to the increase in the component concentration, the concentration of the contaminant component of the gas to be treated sent from the source is reduced by adsorbing or absorbing the contaminant component in the gas and sending it to the purification device. An adsorbent or absorbent is provided to release the adsorbed or absorbed contaminants and increase the concentration of the contaminants in the gas to be treated sent to the purification device.

That is, according to this configuration, a positive correlation exists between the adsorbed amount of the adsorbent or the absorbed amount of the adsorbent and the concentration of the contaminant in the gas, that is, the contaminant in the gas. The higher the concentration, the higher the amount of adsorbent adsorbed or absorbed by the contaminant, and conversely, the lower the concentration of contaminant in the gas, the lower the amount of adsorbent adsorbed on the contaminant or the amount of adsorbent. Using the relationship where the amount of absorption decreases, the fluctuations in the concentration of pollutants in the gas to be treated introduced into the purification device are suppressed, and the introduction of the fluctuations in the concentration of pollutants in the gas to be treated sent from the source is controlled. The concentration can be leveled.

That is, when the concentration of the contaminant component of the gas to be treated sent from the source fluctuates, a purifying apparatus capable of coping with the maximum concentration in the fluctuation is required. It is possible to reduce the maximum capacity required of the device, to reduce the size of the purification device, and to reduce the equipment cost.

[2] According to the second aspect of the present invention, the purifying device is configured to adsorb or absorb the contaminant in the gas to be treated into a gas passage for guiding the gas to be treated to the purifying device for removing the contaminant in the gas. Provide an adsorbent or absorbent to reduce the concentration of contaminant components of the gas to be processed to be sent to, and when the sending of the gas to be processed from the generation source is stopped, the clean gas is passed through the adsorbent or the disposing part of the absorbent. A means for introducing clean gas to be sent to the purification device is provided.

That is, according to this configuration, similarly to the first aspect of the invention, the positive correlation existing between the amount of adsorbent adsorbed on the contaminant or the amount of adsorbent absorbed and the concentration of the contaminant in the gas. In the state where the relationship is used, the supply of the gas to be treated from the source is intermittent, whereas the supply of the gas to be treated from the source is sent to the purification device by adsorption or absorption by the adsorbent or absorbent. When the concentration of the contaminants in the gas to be treated is reduced, and when the delivery of the gas to be treated from the source is stopped, the adsorbent or the adsorbent or the clean gas sent to the purification device through the adsorbent or the absorbent is disposed by the clean gas introducing means. The contaminant component previously adsorbed or absorbed from the absorbent can be efficiently released, and the introduction of the contaminant-containing gas into the purification device can be continued.

In other words, this means that, conventionally, when the gas to be treated is intermittently sent from the source, the concentration of the contaminant component of the gas to be treated sent from the source (if there is a fluctuation, the highest concentration). As compared with the necessity of a purifying device capable of coping with
The purifier can be reduced in size by reducing the maximum capacity required of the purifier, and the equipment cost can be reduced.

[3] In the invention according to claim 3, the clean gas introducing means allows the clean gas to be sent to the purifying device to pass through the portion where the adsorbent or the absorbent is disposed, in a direction opposite to the gas to be treated. Configure.

In other words, according to this configuration, in the passage of the gas to be treated through the adsorbent or absorbent arrangement portion, the more the upstream side of the arrangement portion, the denser the adsorption state or absorption state of the contaminant component becomes. On the other hand, when the clean gas for releasing the contaminant component from the adsorbent or the absorbent is ventilated, the discharged contaminant is passed through the clean gas in a direction opposite to the gas to be treated, so that the contaminated component is removed from the inner side of the adsorbent or the absorber. The contaminant can be more efficiently released from the portion where the adsorbent or the absorbent is disposed in a state in which a decrease in the release efficiency due to re-adsorption or re-absorption is prevented by preventing the adsorbent or the absorbent from being passed through as much as possible.

That is, when the supply of the gas to be treated is stopped from the source, the concentration of the pollutant component in the gas (the above-mentioned clean gas containing the polluted pollutant) to be sent to the purifying device in place of the gas to be treated can be efficiently controlled. It is possible to increase the amount of adsorption and absorption when the contaminant is adsorbed or absorbed by the adsorbent or absorbent next. The difference between the concentration of the contaminant component of the gas introduced into the purifying apparatus at the time of feeding and the time when the feeding is stopped can be reduced, and the reduction of the maximum capacity required for the purifying apparatus can be achieved more effectively.

[4] The invention according to claim 4 is provided with a decompression means for promoting the release of the contaminant from the adsorbent or the absorbent by decompression.

That is, according to this configuration, in response to a decrease in the concentration of the contaminant component of the gas to be processed sent from the source, the contaminant component previously adsorbed or absorbed is released from the adsorbent or the absorbent and sent to the purification device. In order to increase the concentration of the contaminant component of the gas to be treated, or to stop sending out the gas to be treated from the source, the previously adsorbed or absorbed contaminant is removed from the adsorbent or the absorbent by the clean gas introducing means. In order to release the contaminated component-containing gas into the purification device by releasing it into the introduced clean gas, the release of the contaminated component from the adsorbent or the absorbent is promoted by reducing the pressure by the above-described decompression means. It is possible to more efficiently increase the concentration of the contaminant in the gas introduced into the purification device when the concentration of the contaminant decreases or when the supply of the gas to be treated is stopped from the source. By leaving promoting, then contaminant adsorbent or absorbent in the non-reduced pressure can be enhanced adsorption and absorption when adsorbed or absorbed.

That is, with this, even if the concentration of the contaminant component of the gas to be treated sent from the source fluctuates, the concentration of the contaminant component of the gas to be treated sent to the purification device is more effectively leveled. In addition, the intermittent delivery of the gas to be treated from the generation source can be considered as the contamination of the gas introduced into the purification device when the gas to be treated is delivered from the source and when the delivery is stopped. The difference between the component concentrations can be reduced, and in any case, the reduction in the maximum capacity required of the purification device can be more effectively achieved.

The promotion of the release of the contaminant from the adsorbent or the absorbent due to the reduced pressure is due to a positive correlation existing between the amount of the adsorbent adsorbed on the contaminant or the amount of the absorbent absorbed and the gas pressure. is there.

[5] In the invention according to claim 5, a heating means is provided for promoting the release of contaminants from the adsorbent or the absorbent by heating.

That is, according to this configuration, in response to a decrease in the concentration of the contaminant component of the gas to be processed sent from the source, the contaminant component previously adsorbed or absorbed is released from the adsorbent or absorbent and sent to the purification device. In order to increase the concentration of the contaminant component of the gas to be treated, or to stop sending out the gas to be treated from the source, the previously adsorbed or absorbed contaminant is removed from the adsorbent or the absorbent by the clean gas introducing means. In order to release the contaminated component-containing gas into the purification device by releasing it into the introduced clean gas, the release of the contaminated component from the adsorbent or the absorbent is promoted by heating by the above-mentioned heating means, so that the gas to be treated can be discharged. It is possible to more efficiently increase the concentration of the contaminant in the gas introduced into the purification device when the concentration of the contaminant decreases or when the supply of the gas to be treated is stopped from the source. By leaving promoting, then contaminant adsorbent or absorbent in the unheated under can be enhanced adsorption and absorption when adsorbed or absorbed.

That is, in the same manner as in the fourth aspect of the present invention, when the concentration of the contaminant component of the gas to be treated sent from the source fluctuates, the concentration of the contaminant component of the gas to be treated sent to the purification device is reduced. Can be more effectively leveled, and the intermittent delivery of the gas to be treated from the generation source can be considered when the delivery of the gas to be processed from the source and the stop of the delivery. The difference between the concentration of the contaminants in the gas introduced into the purifier at the time can be reduced,
In any case, the reduction of the maximum capacity required of the purification device can be achieved more effectively.

The promotion of the release of the contaminant from the adsorbent or the absorbent by heating is due to a negative correlation existing between the amount of the adsorbent adsorbed on the contaminant or the amount of the absorbent absorbed and the temperature. .

The heating target of the heating means may be a gas to be treated having a reduced concentration of contaminants to be passed through the adsorbent or the absorbent, the clean gas introduced by the clean gas introducing means, or the adsorbed clean gas. Any of the agent and the absorbent itself may be used.

[6] In the invention according to claim 6, a concentration sensor for detecting the concentration of the contaminant component of the gas introduced into the purifying device is provided, and the cleaning by the clean gas introducing means is performed based on information detected by the concentration sensor. Control means is provided for adjusting the amount of gas introduced, the amount of pressure reduction by the pressure reducing means, or the amount of heating by the heating means.

That is, according to this configuration, the control means adjusts the clean gas introduction amount, the pressure reduction amount, or the heating amount based on the information detected by the concentration sensor, thereby controlling the amount of the contaminant component from the adsorbent or the absorbent. By adjusting the release state, the concentration of the contaminant component of the gas introduced into the purifier can be automatically adjusted to an appropriate value when the concentration of the contaminant component of the gas to be treated decreases or when the delivery of the gas to be treated from the source is stopped. Operation management can be facilitated and the operation stability of the equipment can be effectively improved.

[0026]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows a gas treatment facility for deodorizing a gas G to be treated discharged from a source 1 such as a production / processing section in a factory. Reference numeral 2 denotes a pollutant component (in this example, odorous gas) in the gas. This is a deodorizing device as a purifying device for removing the component), and the deodorizing device 2 continuously processes the introduced gas by an appropriate deodorizing method such as oxidizing an odorous component by burning or discharging.

The gas path 3 for guiding the gas to be treated G to the deodorizing device 2 is used for changing the concentration of the odor component of the gas to be treated G sent out from the source 1 and for intermittent discharge of the gas to be treated from the source 1. On the other hand, a stabilizing tank 4 for suppressing the fluctuation of the processing load in the deodorizing device 2 is provided. Inside the stabilizing tank 4, a suitable adsorbent X such as activated carbon or zeolite is used as a buffer means for suppressing fluctuation. A breathable adsorption layer 5 is provided as a constituent material.

The stabilizing tank 4 has a main gas inlet 6A for introducing the gas G to be treated from the generator 1 and an adsorbing layer 5
In addition to providing a main gas outlet 6B for sending the gas to be treated G that has passed through the deodorizing device 2 to one end and the other end of the tank with the adsorption layer 5 interposed therebetween, clean gas is supplied to the adsorption layer 5 On the other hand, as a clean gas introducing means that is passed in the opposite direction to the gas to be treated G and then sent to the deodorizing device 2, a clean gas inlet 7A for introducing external clean air A (an example of a clean gas) into the tank is provided. Further, the clean gas outlet 7B that sends the clean air A that has passed through the adsorption layer 5 to the deodorizing device 2 is changed so that the main gas inlet 6A and the main gas outlet 6B are opposite in the positional relationship between the inlet side and the outlet side. In a state in which the adsorption layer 5 is interposed between the two ends 6A, 6B, 7A, 7B
Are provided with dampers D1 to D4 for opening and closing.

With this configuration, when the gas G to be treated is discharged from the source 1, the dampers D1 and D4 for the main gas inlet 6A and the main gas outlet 6B are opened, and the clean gas inlet 7A and the clean gas inlet 6A are opened. Damper D for exit 7B
3, D2 is closed, and the gas G to be treated from the source 1 is passed through the adsorption layer 5 and then sent to the deodorizer 2, whereby the gas G to be treated from the source 1 is removed. With respect to the increase in the concentration of the odor component, the concentration of the odor component of the gas G to be treated is reduced by adsorption with the adsorbent X. On the other hand, with the decrease in the concentration of the odor component of the gas G to be treated from the generation source 1, The concentration of the odor component of the gas G to be sent to the deodorizing device 2 is equalized by increasing the concentration of the odor component of the gas G to be treated by releasing the adsorbed odor component from the adsorbent X (so-called desorption). .

On the other hand, when the discharge of the gas to be treated from the source 1 is stopped, the dampers D1 and D4 for the main gas inlet 6A and the main gas outlet 6B are closed, and the clean gas inlet 7A and the clean gas Damper D for outlet 7B
3. With D2 opened, the clean air A was passed through the adsorption layer 5 and sent to the deodorizer 2 instead of the gas G to be treated from the generation source 1, whereby the gas was adsorbed first. The processing of the odorous component-containing gas in the deodorizing device 2 is continued in a form in which the odorous component is released into the clean air A and introduced into the deodorizing device 2 together with the clean air A.

That is, in this gas treatment equipment, when the concentration of the odor component of the gas G to be treated from the source 1 is high, the gas G to be treated is sent to the deodorizing device 2 by adsorption with the adsorbent X.
For the adsorbed odor component, the concentration of the odor component of the gas G to be treated from the source 1 is low or the discharge of the gas to be treated from the source 1 is stopped. In this way, the deodorizing device 2 is used for processing, whereby fluctuations in the processing load on the deodorizing device 2 are suppressed and the deodorizing device 2 can be reduced in size.

Reference numeral 8 denotes heating means (eg, an electric heater or a high-temperature fluid coil ), 9 are concentration sensors for detecting the concentration of the odor component of the gas introduced into the deodorizing device, and 10 is each of the dampers D1 to D in connection with the intermittent discharge of the gas to be treated from the generation source 1.
In addition to automatically performing the switching operation of the open / close operation of the heating unit 4 and automatically adjusting the heating amount of the heating means 8 based on the detection information of the concentration sensor 9 when introducing the clean air A, the release of the odor component from the adsorbent X is adjusted. Control means for keeping the concentration of the odor component of the gas introduced into the deodorizing device at a set value.

Reference numeral 11 denotes the gas G to be treated from the source 1
Is a suction fan that introduces the gas to be treated G into the deodorizing device 2 through the stabilizing tank 4 when discharging the gas, and introduces the clean air A from the stabilizing tank 4 into the deodorizing device 2 when introducing the clean air A.

[Another Embodiment] Next, another embodiment will be described. In response to an increase in the concentration of the contaminant component of the gas to be treated from the source or the sending of the gas to be treated from the source, the concentration of the contaminant component in the gas introduced into the purification device is reduced, and the contamination of the gas to be treated from the source. When the adsorbent is used as in the above-described embodiment to increase the concentration of the contaminated components of the gas introduced into the purification device in response to the decrease in the component concentration or the stoppage of the delivery of the gas to be treated from the generation source, Various materials such as activated carbon, impregnated activated carbon, zeolite, and activated alumina can be used as long as they have a positive correlation between the concentration of contaminants in the gas and the amount of adsorption.

In addition to the adsorbent, for example, pure water or various aqueous solutions are used for the purpose of deodorization, and there is a positive correlation between the concentration of the pollutant component in the gas and the amount absorbed, and the release of the pollutant component. May be used.

The purpose of the gas treatment is not limited to deodorization, but may be a detoxification purpose other than deodorization.

In the above-described embodiment, an example is shown in which both the fluctuation of the concentration of the contaminant component of the gas to be processed sent from the source and the intermittent supply of the gas to be processed from the source are described. The introduction means may be omitted, and a form corresponding to only the fluctuation of the concentration of the contaminant component of the gas to be processed sent from the generation source may be adopted, and conversely, only the intermittent supply of the processing gas from the generation source may be supported. It may take a form.

The clean gas sent to the purifier by the clean gas introduction means through the adsorbent or absorbent arrangement portion is not limited to external air, and may be, for example, water vapor or nitrogen gas.
In addition, various gases can be used.

In the above-described embodiment, the release of the contaminant from the adsorbent is promoted by heating the clean gas introduced by the fresh gas introducing means. The release of the contaminant from the agent or the absorbent may be promoted, or the release of the contaminant from the adsorbent or the absorbent may be promoted by heating the adsorbent or the absorbent itself.

In addition to the emission promotion by heating, for example, in the above-described embodiment, when the concentration of the contaminant component (odor component) of the gas G to be treated from the source decreases, the damper D1 is opened with respect to the main gas inlet 6A. The pressure inside the stabilizing tank 4 is reduced by adjusting the temperature and adjusting the output of the suction fan 11, and the adsorbent X
Of the pollutant component (odor component) from the air, and the stabilization tank by adjusting the opening of the damper D3 with respect to the clean gas inlet 7A and the output of the suction fan 11 when the clean gas A (clean air) is introduced. The pressure in the tank of No. 4 is reduced, and the adsorbent X
The release of the contaminant component from the adsorbent or the absorbent may be promoted by reducing the pressure by an appropriate decompression means, such as by promoting the release of the contaminant component (odor component) from the water.

As in the above-described embodiment, the amount of heating of the heating means is automatically adjusted based on the detection information of the concentration sensor to adjust the release of contaminant components from the adsorbent or the absorbent. The release of the contaminant component from the adsorbent or the absorbent may be adjusted by automatically adjusting the amount of the clean gas introduced by the gas introducing unit and the amount of the reduced pressure by the decompressing unit.

The adsorbent and the absorbent are not limited to the form in which the adsorbent and the absorbent are disposed in the gas path as fixed layers as in the above-described embodiment, but may be in the form of a circulating moving bed or in the form of circulating spray.

The purifier may be of any type, depending on the contaminant to be removed, such as a combustion method or a catalytic combustion method, or a discharge method, a cleaning method, a biological treatment method or an adsorption method. You may.

[Brief description of the drawings]

FIG. 1 is a diagram showing a configuration of an embodiment.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Source 2 Purifier 3 Gas path 7A, 7B Clean gas introduction means 8 Heating means 9 Concentration sensor 11 Control means G Gas to be treated X Adsorbent (or absorbent)

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4D002 AB02 AC10 BA03 BA04 BA05 BA07 CA07 DA35 DA41 DA45 DA46 EA02 EA08 EA09 EA13 FA10 GA02 GA03 GB02 GB03 GB04 GB06 HA01 4D012 CA09 CB12 CD02 CD03 CD04 CD05 CD07 CE01 CE02 CF02 CF03 CF05 CF08 CG01

Claims (6)

[Claims] 1. A gas passage for guiding a gas to be treated to a purification device for removing the polluting component in the gas. The components are adsorbed or absorbed to reduce the concentration of the contaminant components of the gas to be treated sent to the purification device, and the concentration of the contaminant components of the gas to be treated sent from the source of the contaminants is absorbed or absorbed. A gas treatment facility provided with an adsorbent or an absorbent that releases pollutants and increases the concentration of the pollutants in the gas to be treated sent to the purification device. 2. A contaminant concentration of a gas to be treated, which is adsorbed or absorbed in a gas path for guiding the gas to be treated to a purification device for removing the pollutants in the gas and sent to the purification device. An adsorbent or an absorbent that reduces the amount of contaminants, and when the sending of the gas to be treated is stopped from the source of the contaminant component, the clean gas that sends the clean gas to the purifying device through the adsorbent or the absorbent. Gas processing equipment provided with introduction means. 3. The cleaning gas introducing means is configured to pass a cleaning gas to be sent to the purification device in a direction opposite to a gas to be processed, to a portion where the adsorbent or the absorbent is provided. 2. The gas processing equipment according to 2. 4. The gas processing facility according to claim 1, further comprising a pressure reducing means for promoting the release of the contaminant from the adsorbent or the absorbent by reducing the pressure. 5. The gas treatment facility according to claim 1, further comprising a heating means for heating to release a contaminant from the adsorbent or the absorbent. 6. A concentration sensor for detecting a concentration of a contaminant component of a gas introduced into the purifying device, wherein the amount of the clean gas introduced by the clean gas introducing means or the pressure reduction based on information detected by the concentration sensor. The gas processing equipment according to any one of claims 2 to 5, further comprising control means for adjusting a reduced pressure amount by means or a heating amount by the heating means.