JP2000079564A - Abrasive and its manufacture - Google Patents

Abstract

PROBLEM TO BE SOLVED: To manufacture an abrasive material having high polishing perfor mance by reducing cost, and attain the processing of abrasive waste and reduc tion of weight. SOLUTION: This method of manufacture comprises a physical treating process making an abrasive waste mixing spent abrasive and impurities as a base material to remove impurities except the base material of the abrasive, heat treatment process for heating the impurity removed base material in a range of 1000 to 1700 deg.C temperature, and a classification process for classifying into a grain size within a specified value by crushing the base material after the heat treatment process. In this way, the material can be manufactured with high manufacturing yield, productivity and mass productivity, and the abrasive of stable new quality with a low cost is obtained.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an abrasive for polishing silicon wafers for semiconductors, ceramics for electronics, glass and the like, and a method for producing the same.

[0002]

2. Description of the Related Art Heretofore, abrasives (abrasives) used as industrial abrasives have been selected from compositions of materials suitable for each object to be polished. For example, fused alumina is one of the general-purpose abrasives, and there are brown alumina made directly from bauxite and white alumina made from aluminum hydroxide refined by a via method. There are also abrasives in which zircon is mixed with these, and occupy the mainstream of lapping agents for silicon wafers, optical glass, and ceramics for electronics.
Generally, the performance of abrasives used for polishing depends on its hardness, toughness, particle size and distribution, and grinding speed depending on particle shape,
The grinding amount, surface roughness, scratch and the like are determined. Among these, the hardness and toughness are determined by the inherent properties of the abrasive material. Therefore, for the same material, the performance is adjusted according to the particle size and its distribution, and furthermore, the particle shape. In particular, the particle size is the factor that has the greatest effect on the performance of the abrasive. If the particle size is large, the polishing efficiency is high, but the polished surface becomes rough, and defects such as scratching and chipping increase. On the other hand, a material having a small particle diameter has a good polished surface roughness, but has a low polishing rate, so that it is usually used for so-called finish polishing after rough polishing.

[0003] Further, since the actually manufactured abrasive has a particle size distribution and includes coarse particles to fine particles, the particle size distribution is also an important factor. The presence of coarse particles often causes scratches (scratches) and requires sufficient control. Extremely fine particles do not contribute to polishing and are not only unnecessary. Inhibits and has a rather bad effect. Therefore, it is generally considered that a narrow and stable particle size distribution has a good balance between the polishing rate and the quality of the polished surface, and the importance of classification is regarded as important. Further, the influence of the particle shape on the polishing performance is important, and it is said that those having a flat shape or those having edges and corners have a higher polishing rate than those having a shape close to a sphere.

Most of the polishing agents currently used for polishing silicon wafers for semiconductors and ceramics for electronics use a mixture of brown alumina (Al 2 O 3) and zircon (ZrSiO 4) and have a particle diameter within a specified value of 5%. It is manufactured and used by setting a micron to 20 microns and removing other fine particles and coarse particles. Further, a polishing agent has been proposed in which zirconium oxide is used as a main component and calcium aluminate or magnesium sulfate is added as a polishing agent for glass polishing, or a mixture of a plate-like alumina single crystal powder and the above polishing agent. (JP-A-08-113773, JP-A-03-14
No. 6584)

As described above, the polishing rate and the quality of the polished surface are substantially determined by the combination of the particle shape, the particle size and the distribution thereof. Therefore, there is a demand for an optimum particle shape and particle size that balance the two.

[0006]

The above-mentioned conventional abrasives have been manufactured in consideration of various problems. However, such abrasives prevent scratches (scratches) from occurring during polishing.
The grinding time is long (over pulverization) to sharpen the sharp part of the particle surface into a sphere, but due to the over pulverization, the fine particles of 5 microns or less, which is the lower limit of the particle diameter within the specified value Is generated in large quantities, and about 40% of the raw material is wasted. Therefore, many of the current abrasives are very expensive, and there is a problem in that limited valuable resources are wasted.

[0007] On the other hand, once used abrasives include ceramics and silicon or other cutting chips generated from the object to be polished during polishing, iron powder generated from a lapping disk, and fine particles generated by abrasion of the abrasive itself. At present, it is treated as waste because the impurities are mixed. Therefore, in order to solve these problems, a method of collecting an abrasive has been proposed. (Japanese Patent Application Laid-Open No. 08-003554)
No. 3)

The content of the above-mentioned Japanese Patent Application Laid-Open No. 08-003543 is that a polishing waste mainly composed of brown alumina and zircon sand, in which used abrasives and impurities generated by polishing are mixed, is used as a raw material to chemically treat soluble impurities. And then pulverizing to remove fine particles outside the specified value, which is an excellent method for reusing waste.

However, in the above-mentioned method, since a strong acid such as hydrochloric acid or sulfuric acid is used as a chemical treatment, dangers at the time of work and environmental problems of these wastewater treatments are greatly increased, and reproducibility and workability are largely restricted. was there. Further, there is a problem that a change in the component ratio occurs when the raw material itself is dissolved, and the characteristics thereof are largely lost.

The present invention solves the above-mentioned conventional problems. An object of the present invention is to provide a polishing agent which is high in accuracy without losing the conventional high polishing performance, has a high production yield, and is excellent in productivity and mass productivity. An object of the present invention is to provide an abrasive which can be manufactured at low cost and which can greatly contribute to reduction of polishing waste, and a method for manufacturing the same.

[0011]

SUMMARY OF THE INVENTION In order to achieve the above object, the present invention relates to a polishing agent comprising a mixture of a used molten alumina (Al2O3) component and a zircon (ZrSiO4) component as a polishing material base. Abrasive waste mixed with impurities generated by the above is used as a base material of the abrasive, a physical treatment step of removing impurities other than the base material of the abrasive from the abrasive waste, and a temperature in the range of 1000 to 1700 ° C. And a classification step of pulverizing the base material of the abrasive waste after the heat treatment step to divide the base material into particle diameters within a specified value. As a result, it is possible to regenerate a used abrasive which has been conventionally treated as polishing waste, and to obtain an abrasive having better performance than an unused abrasive at a lower cost.

In addition, used molten alumina (Al2O)
3) After removing impurities other than the base material of the abrasive from the abrasive waste in which the abrasive comprising the mixture of the component and the zircon (ZrSiO4) component and the impurities generated by polishing are mixed, a new inorganic component is added. It is an object of the present invention to provide a novel polishing agent that has never existed before.

[0013]

BEST MODE FOR CARRYING OUT THE INVENTION The invention according to claim 1 of the present invention relates to a method of using a used molten alumina (Al
A polishing slurry consisting of a mixture of a 2O3) component and a zircon (ZrSiO4) component and an abrasive waste mixed with impurities generated by polishing are used as a base material of the polishing slurry. A physical treatment step of removing impurities, a heat treatment step of treating the base material of the abrasive waste from which the impurities have been removed at a temperature in the range of 1000 to 1700 ° C., and removing the abrasive waste material after the heat treatment step. It has a configuration including a classification step of pulverizing the base material and dividing it into particle diameters within a specified value.

By using, as a base material of the abrasive, an abrasive consisting of a mixture of a molten alumina (Al 2 O 3) component and a zircon (ZrSiO 4) component and an abrasive waste mixed with impurities generated by polishing, the polishing agent is used. The acute angle portion of the surface is fine particles as they are, and the sintering reaction at the time of heat treatment is facilitated, so that a base material having an excellent effect for obtaining a desired reaction product is obtained. By performing a physical treatment for removing impurities other than the base material of the abrasive, a base material having a high purity and a reproducible effect as a stable abrasive can be obtained. By subjecting the abrasive waste base material from which impurities have been removed to a heat treatment at a temperature in the range of 1000 to 1700 ° C., a new abrasive base material having a new crystal phase can be obtained. If the temperature is lower than 1000 ° C., the particle diameter is unstable and the polishing effect is reduced, which is not preferable. If the temperature is 1700 ° C. or higher, crystal grains grow remarkably and the particles become brittle, so that the effect of obtaining a stable quality abrasive is weakened, which is not preferable.

An abrasive having a completely new stable particle size within a specified value by subjecting a substrate of the abrasive waste material after heat treatment to a pulverization treatment and classification into particles having a specified value within a specified value. Has the effect of obtaining

According to a second aspect of the present invention, as a physical treatment step for removing impurities other than the base material of the abrasive from the abrasive waste, the used abrasive and the impurities generated by polishing are removed. The method includes a step of wet-dispersing mixed abrasive waste and removing metal impurity components by magnetic force.

In addition, by dispersing abrasive waste in which used abrasive and impurities generated by polishing are mixed, the metal impurity component firmly attached to the abrasive is separated and dispersed from the abrasive. The base material has a function of completely removing metal impurities by utilizing magnetic force, has a high purity, and has a reproducible and stable function as a polishing agent.

According to a third aspect of the present invention, there is provided an abrasive material comprising a molten alumina (Al 2 O 3) component and a zircon (ZrSiO 4) component in which a used abrasive and impurities generated by polishing are mixed. The abrasive waste containing the mixture is used as the base material of the abrasive, and after removing impurities other than the base material of the abrasive from the abrasive waste, a mixture of the above-mentioned molten alumina (Al2O3) component and zircon (ZrSiO4) component MgO, Ca with respect to the abrasive substrate 100 containing
O, Al2O3, ZnO, NiO, ZrO2, SiO
2, one or two or more of CeO2 and La2O3 components are added within a range of 1 to 15.5 wt% and a temperature of 1
The heat treatment is performed in the range of 000 to 1700 ° C.

A new abrasive having a new crystal phase can be obtained by adding the above-mentioned additional components in an added amount within the range and performing a heat treatment at a temperature range of 1000 to 1700 ° C. It has excellent hardness as an abrasive and has the effect of controlling the physical properties of particles, and has a good effect as a base material of the abrasive.

As an operation of the additional component, the addition of MgO can increase the temperature range of the reaction product and control the particle size of the stable crystal particle phase, thereby obtaining a fine abrasive powder. . The addition of CaO can widen the sintering temperature range of the reaction product. Addition of Al2O3 can increase the sintering temperature range of the reaction product and increase the hardness of the powder particles. Addition of ZnO can lower the sintering temperature of the reaction product and suppress the growth of the crystal grain size. Addition of NiO can increase the sintering temperature range of the reaction product, improve sinterability, and obtain dense powder particles. ZrO
Addition of 2 can increase the sintering temperature range of the reaction product, improve sinterability, and obtain powder particles having high hardness. Addition of SiO2 can increase the sintering temperature range of the reaction product, improve sinterability, and obtain powder particles having high hardness. Addition of CeO2 increases the sintering temperature range, improves sinterability, and can obtain dense powder particles. Addition of La2O3 can suppress the growth of the crystal grain size, and as a result, dense powder particles can be obtained.

Incidentally, as MgO as an additive becomes less than 1 wt% with respect to the abrasive base material 100, the temperature range of the reaction product can be widened and the particle size of the stable crystal particle phase can be controlled to be small. And it becomes difficult to obtain a dense abrasive powder, which is not preferable. M
As gO exceeds 15.5 wt%, the sinterability of the powder deteriorates and the amount of porosity tends to increase, which is not preferable. Ca
As O becomes less than 1 wt%, the effect of expanding the sintering temperature range of the reaction product is small. As CaO exceeds 15.5 wt%, it becomes difficult to obtain a dense abrasive powder, which is not preferable. As Al2O3 becomes less than 1 wt%, the effect of increasing the sintering temperature of the reaction product decreases, and as a result, the effect of obtaining a powder having high hardness decreases. Al2
As O3 exceeds 15.5 wt%, the sinterability of the powder deteriorates and the porosity tends to increase, which is not preferable.

As ZnO becomes less than 1 wt%, the effect of lowering the sintering temperature of the reaction product and obtaining a stable crystal grain size is small. As ZnO exceeds 15.5 wt%, the effect of lowering the sintering temperature of the powder and increasing the compactness is weak. NiO is 1w
The effect of increasing the sintering temperature range of the reaction product and improving the sinterability is small as the amount becomes less than t%. 15.5wt NiO
%, The effect of obtaining dense powder particles is undesirably weakened. As ZrO2 becomes less than 1 wt%, the effect of increasing the sintering temperature range of the reaction product and improving the sinterability is weakened, and as a result, it becomes difficult to obtain powder particles having high hardness. As ZrO2 exceeds 15.5% by weight, the porosity of the powder tends to increase, which is not preferable.

As the content of SiO 2 becomes less than 1 wt%, the effect of increasing the sintering temperature range of the reaction product and improving the sinterability is small. As the content of SiO2 exceeds 15.5 wt%, the sinterability of the powder becomes unstable, and as a result, it becomes difficult to obtain powder particles having high hardness, which is not preferable. CeO
As 2 becomes less than 1 wt%, the effect of expanding the sintering temperature range and improving the sinterability is small. CeO2 is 15.5wt%
As the temperature exceeds the range, the effect of widening the sintering temperature range of the powder decreases, and it becomes difficult to obtain dense powder particles, which is not preferable. As La2O3 becomes less than 1 wt%, the effect of obtaining a stable crystal grain size becomes weaker. La2O3
As the content exceeds 15.5 wt%, the effect of obtaining stable and dense powder particles tends to decrease, which is not preferable.

In the heat treatment of the abrasive substrate to which the above components are added within the range, as the firing temperature becomes lower than 1000 ° C., the sintering of the powder does not proceed sufficiently and good powder particles cannot be obtained. It is not preferable because it becomes smaller. On the other hand, if the temperature is 1700 ° C. or higher, the crystal grains tend to grow remarkably, and the grains become brittle, thus deteriorating various desired properties.

The invention according to claim 4 of the present invention is characterized in that the temperature is 1
The main component crystal phase of the abrasive after heat treatment in the range of 000 to 1700 ° C. is a mixed phase of fused alumina (Al 2 O 3) and zircon (ZrSiO 4), and a zirconium (Z
rO2) and mullite (Al2SiO5).

The main component crystal phase is fused alumina (Al
Abrasives in the mixed phase of 2O3) and zircon (ZrSiO4) have relatively hard particles, and have the effect of increasing the grinding speed of the polished material. Further, the abrasive in the mixed phase of zirconium (ZrO2) and mullite (Al2SiO5) has an effect that the particles are relatively soft and the surface quality of the polished material is improved.

According to a fifth aspect of the present invention, there is provided a classification step of pulverizing a base material of abrasive waste after a heat treatment step and dividing the base material into particles having a particle diameter within a specified value of 5.0 to 30.0 microns. The effect of the present invention is to obtain an entirely new, stable abrasive having a particle diameter within a new specified value from waste.

According to a sixth aspect of the present invention, there is provided an abrasive formed by the manufacturing method according to the first to fifth aspects, which is used for polishing silicon wafers for semiconductors, ceramics for electronics, glass and the like. As a result, it has a stable working effect of performance and quality.

Hereinafter, embodiments of the present invention will be described with reference to (Table 1), (Table 2), and (Table 3).

[0030]

[Table 1]

[0031]

[Table 2]

[0032]

[Table 3]

[0033]

Next, specific examples of the present invention will be described. A method for producing an abrasive in the present embodiment will be described with reference to Examples 1 and 2. In Example 1, as a base material of an abrasive, a used molten alumina (A) formed by polishing a silicon wafer was used.
l2O3, about 56% by weight) and zircon (ZrSiO
Abrasive waste containing a mixture of (4, about 42% by weight) components and impurities (about 2% by weight) generated by polishing was used as a base material of the abrasive. The abrasive waste is semi-solid (less than 20% water), contains more than about 65% by weight of abrasive, and contains fused alumina (Al2O3).
3) A mixture of a component and a zircon (ZrSiO4) component is contained in an amount of about 65% by weight or more, and the mixed impurities are about 1% by weight or less of an Fe component (a substance that can be removed by magnetic force) generated from a lapping machine. 1% by weight or less of Si components and dusts.

First, as a physical treatment step for removing impurities other than the base material of the abrasive from the abrasive waste, the base material of the abrasive waste is wet-dispersed to form a silicon wafer, chips and dusts of 50 μm or more. To remove the impurities, then completely remove the Fe component using a permanent magnet having a magnetic force of about 4500 gauss, put it into a urethane ball mill, add zirconia balls and water, and add Grinding and pulverization were performed by wet mixing for hours.

A dry powder was obtained from the crushed and crushed material by using a hot-air spray-type drying spray dryer. Next, as a heat treatment step, the dried powder was placed in a high-purity alumina jar, and heated to a temperature of 98% by an electric furnace using a kanthal heater.
Heat treatment was performed in the range of 0 to 1720 ° C. Next, as a classification step, the calcined powder that has been subjected to the heat treatment is pulverized and classified by a classifier, and within a specified value (5.0 microns, 1 μm).
(1.0 micron, 17.0 micron) to obtain an abrasive.

For comparison with the reclaimed abrasive obtained in the above manner, the chemical composition of an unused new abrasive and the result of X-ray diffraction analysis are shown in Table 1. In addition, the example which is out of the range was given * mark. As is clear from Table 1, NO1
950 to 1400 ° C where the heat treatment temperature of ~ NO5 is relatively low
In the temperature range of Alumina crystal form (corundum, Al2
O3), zircon crystal form (ZrSiO4) and SiO
2, formed as a mixture of unknown phases. In addition, No2
No. to No. 5 were found to have almost completely lost SiO2 and unknown phases. In a temperature range of 1500 to 1720 ° C. where the heat treatment temperature of NO 6 to NO 10 is high, a zirconia crystal form (ZrO 2) and a mullite crystal form (Al 2 S
It was found to be formed in the form of a two-phase mixture of iO5). Also, as is clear from the results of the chemical components, the recycled abrasives NO2 to NO9 have the same chemical component values as the new abrasives, and it can be confirmed that there is no inferiority at all. However, a sample in which the heat treatment temperature of NO1 was as low as 980 ° C. contained a large amount of Fe component, and the X-ray diffraction results tended to precipitate an unknown phase, which was not preferable. Also,
In a sample in which the heat treatment temperature of NO10 was as high as 1720 ° C., the pulverization of the powder became extremely difficult, which was not practical.

Next, a polishing performance test was carried out using a recycled abrasive and a new abrasive, and the results are shown in Table 2. As a test method, the reclaimed abrasive was divided into particles having a particle size of about 17 μm, about 10 μm, and about 5 μm, each of which was suspended (slurry) in water and wrapping oil. The performance test (grinding speed, surface roughness, scratch) was performed by polishing the wafer (using 20 wafers) in the following manner. Grinding speed-Using a machine manufactured by SPEED FAM Co. as a lapping machine, loading a carrier for 3 inches φ with a load of 100 g / cm ² , a rotation speed of 60 rpm,
Polishing was performed at a slurry injection rate of 100 ml / min. The composition of the polishing slurry is 450 g of lapping oil and 2250 ml of water with respect to 600 g of the abrasive. Surface roughness-The roughness of the surface of the object to be polished was measured using a roughness meter (manufactured by Tokyo Seimitsu). Scratch—Scratch on the surface was measured using an optical microscope at a magnification of × 50.

As is clear from the results in Table 2, when the heat treatment temperature of the reclaimed abrasives NO1 to NO2 is low at 980 ° C., the polishing rate is low, though slightly related to the particle size of the abrasive. Three to five sheets tended to be defective and unfavorable. However, with NO3 to NO10 within the range, good results were obtained in all characteristics such as polishing rate, surface roughness, and scratch. In particular, the samples having heat treatment temperatures of NO5 to NO6 at 1300 ° C. showed remarkably stable and good characteristics, and the polishing rate was better than that of the comparative example of NO12.

Incidentally, the samples having high heat treatment temperatures of NO7 to NO10 tended to have a relatively low polishing rate, but had good surface roughness. From these results, it is considered that there is probably a relationship with the formed crystal phase.
That is, for NO3 to NO6, the alumina-based crystal form (Al2O
3) and a zircon-based crystal form (ZrSiO4) in the form of a mixture of two phases (see Table 1).
At a high heat treatment temperature of 1500 to 1700 ° C., a zirconia crystal form (ZrO 2) and a mullite crystal form (Al
2SiO5) (see Table 1). From these results, although there is a relationship with the particle size of the powder, it is preferable to use an abrasive having a high heat treatment temperature for the surface finish of the object to be polished. Also, the particle size of No13 to No14 is out of the range 3
At μm and 35 μm, the characteristics were poor.

As Example 2, the base material 10 obtained by removing impurities other than the base material of the abrasive from the abrasive waste obtained in Example 1 was used.
0, MgO, CaCO3, Al2O3, Zn
O, NiO, ZrO2, SiO2, CeO2, La2O
Using the three components and the like, they were weighed and blended so as to have the amounts shown in Table 3. The blended raw materials were put into a urethane ball mill, and zirconia cobblestone and water were added. Thereafter, the mixture was ground by wet mixing for 12 hours. A dry powder was obtained from the crushed and crushed material by using a hot-air spray-type drying spray dryer. Next, as a heat treatment step, the dried powder was placed in a high-purity alumina squirrel pot and placed in an electric furnace using a Kanthal heater at a temperature of 9 ° C.
Heat treatment was performed in the range of 80 to 1720 ° C. Table 3 also shows the results of X-ray diffraction analysis of the heat-treated powder.

Next, as a classification step, the heat-treated calcined powder is pulverized and classified by a dry-type classifier to obtain a particle diameter within a specified value (5.0 to 30.0 microns) and polished. Agent was obtained. Using a sample having a particle size of about 11 μm obtained as described above, a polishing test was performed (testing was performed in the same manner as in Example 1), and the results are shown in Table 3. As is clear from the results in Table 3, samples NO1 to NO
In No. 4, the heat treatment temperature was kept constant at 1300 ° C. by changing the amount of the Al 2 O 3 component as an additive. As a result, NO2
NO3 was a characteristically stable value, but NO1 with a small amount of addition and NO4 with a large amount of addition were unstable values in terms of characteristics.

Samples NO5 to NO12 are the additives Al
The heat treatment temperature is 980 ° C. to 1720 ° C. with the addition amounts of the 2O3 component 2.5 wt% and the ZrO 2 component 2.5 wt% constant.
Was changed to. As a result, it was found that in NO5 to NO9, the crystal phase was formed as a mixture of two phases of an alumina-based crystal form (Al2O3) and a zircon-based crystal form (ZrO2.SiO2). The polishing rate was good for the sample in which the heat treatment temperature of NO8 was 1300 ° C., and the polishing rate was remarkable. NO10-NO12
It was found that the crystal phase at a high heat treatment temperature was formed as a mixture of two phases of a zirconia-based crystal form (ZrO2) and a mullite-based crystal form (Al2SiO5). The surface roughness was good, but NO12 outside the range had poor properties.

NO13-NO14, NO16-N
The sample of O17 also showed good characteristics, and in particular, La2O3 component 3.0 Wt%, Al2O3
Component 3.0Wt%, SiO2 component 3.0Wt%, ZrO
The NO16 powder to which two components of 3.0 Wt% were added was a sharp abrasive having a sharp crystal grain shape and a good abrasive, and also had a good polishing test characteristic. However, NO15 out of the range, in which the addition amount exceeded 15.5 Wt%, had remarkably poor surface roughness, and in the scratch test, 3 out of 20 sheets were defective. From these results, it could be confirmed that the examples within the range fulfilled a sufficient function as an abrasive. Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments. For example, in Example 2, an oxide was used as an additive, but other salts or compounds may be used. It is possible.

[0044]

As is apparent from the above, according to the present invention, the abrasive generated by the polishing and polishing made of the mixture of the used molten alumina (Al2O3) component and the zircon (ZrSiO4) component which has been conventionally treated as waste. The abrasive waste mixed with the impurities as a base material of the abrasive, a physical treatment step of removing impurities other than the base material of the abrasive, and a heat treatment step of heat-treating the base material of the abrasive with the impurities removed. , A method for producing an abrasive comprising a classification step of pulverizing the base material of the abrasive after the heat treatment step and dividing it into particle diameters within a specified value, and producing a completely new stable novel abrasive from waste. There is an effective effect that has the effect of gaining.

Further, a process for wet-dispersing abrasive waste in which used abrasive and impurities generated by polishing are mixed and utilizing magnetic force is provided, so that metal impurities can be completely removed. In addition, the base material has a high purity and a reproducible effect as a stable abrasive. In addition, after removing impurities other than the abrasive base material from the abrasive waste containing impurities, a new inorganic component is added, and further, the abrasive base material after the heat treatment and the heat treatment step is pulverized to be within a specified value. By providing a classification process for dividing the particle size into particles, there is an effective effect of obtaining a new stable abrasive having a new crystal phase.

Further, it has the characteristics of improved polishing speed and quality of the polished surface as compared with conventional general-purpose abrasives, and can use resources effectively, and has a high production yield and stable reliability. It has an effective effect that it can be manufactured with high productivity and high mass productivity. And the obtained abrasive has an effect that it is a cheap and stable new-quality abrasive. Further, since the amount of abrasive waste that needs to be disposed of can be significantly reduced, it is possible to contribute to improvement of environmental problems, and it is also possible to reduce wasteful costs required for waste disposal.

 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Hiromitsu Taki 7078-2, Shimanouchi, Oaza, Miyazaki City, Miyazaki Prefecture 3C058 AA07 AA09 CA04 CA05 CA06 DA02 3C063 BB01 BB03 BB07 BB19 CC04 EE10 EE15 EE16 FF23

Claims (6)

[Claims] An abrasive material comprising a mixture of a used molten alumina (Al 2 O 3) component and a zircon (ZrSiO 4) component and an impurity generated by polishing are used as an abrasive substrate. And a physical treatment step of removing impurities other than the base material of the abrasive from the abrasive waste, and subjecting the base material of the abrasive waste from which the impurities have been removed to a temperature of 1000 to 1700 ° C. And a classification step of pulverizing the base material of the abrasive waste after the heat treatment step and dividing the substrate into a particle diameter within a specified value. 2. The method according to claim 1, wherein the polishing step includes removing the abrasive waste other than the base material of the abrasive from the abrasive waste. 2. The method for producing an abrasive according to claim 1, wherein the metal impurity component is removed by dispersing and using a magnetic force. 3. A polishing slurry containing a mixture of a fused alumina (Al2O3) component and a zircon (ZrSiO4) component in which a used polishing agent and impurities generated by polishing are mixed is used as a polishing agent base material. After removing impurities other than the abrasive substrate from the abrasive waste, the abrasive substrate 100 containing the mixture of the molten alumina (Al2O3) component and the zircon (ZrSiO4) component
For MgO, CaO, Al2O3, ZnO, Ni
One or more of O, ZrO2, SiO2, CeO2, and La2O3 components are added within a range of 1 to 15.5 wt% and heat-treated at a temperature of 1000 to 1700C. Method for producing an abrasive. 4. The main component crystal phase of the abrasive after heat treatment at a temperature in the range of 1000 to 1700 ° C. is fused alumina (Al
The method for producing an abrasive according to any one of claims 1 to 3, wherein the polishing slurry comprises a mixed phase of 2O3) and zircon (ZrSiO4) or a ZrO2 and Al2SiO5 phase. 5. The method according to claim 1, further comprising a classification step of crushing the base material of the abrasive waste after the heat treatment step and dividing the base material into particles having a particle size within a specified value of 5.0 to 30.0 microns. The method for producing an abrasive according to claim 1 or claim 3. 6. An abrasive formed by the production method according to claim 1.