JP2000047207A - Diffusion reflector for liquid crystal display and its production - Google Patents
Diffusion reflector for liquid crystal display and its productionInfo
- Publication number
- JP2000047207A JP2000047207A JP11222454A JP22245499A JP2000047207A JP 2000047207 A JP2000047207 A JP 2000047207A JP 11222454 A JP11222454 A JP 11222454A JP 22245499 A JP22245499 A JP 22245499A JP 2000047207 A JP2000047207 A JP 2000047207A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- liquid crystal
- crystal display
- film layer
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は液晶表示体に用いら
れる拡散反射板に関する。The present invention relates to a diffuse reflection plate used for a liquid crystal display.
【０００２】[0002]
【従来の技術】従来の液晶表示体用拡散反射板は、フィ
ルム状の物（反射板のみの物や、反射板と偏光板とが一
体となった物）で表示体の液晶パネル（偏光板を含む）
の下部に配置していた。2. Description of the Related Art A conventional diffuse reflection plate for a liquid crystal display is a liquid crystal panel (a polarizing plate) comprising a film-like material (a material having only a reflector or an integrated reflector and a polarizing plate). including)
Was located at the bottom.
【０００３】[0003]
【発明が解決しようとする課題】しかし、前述した従来
の構成においては反射型表示体の明るさが不足であると
いう課題を有していた。However, in the above-described conventional structure, there is a problem that the brightness of the reflective display is insufficient.
【０００４】すなわち、反射型液晶表示体の入射光は、
液晶パネル（偏光板ーガラス基板ー透明電極層ー配向膜
層ー液晶層ー配向膜層ー透明電極層ーガラス基板ー偏光
板）を通過し反射板に到達する。反射板により反射され
た反射光は、液晶パネルを通過し液晶表示体外部へと到
達する。すなわち、光は液晶パネルを２回通過すること
になり、よって反射型液晶表示体の入射光に対して反射
光の光量は液晶表示体の液晶パネル（偏光板を含む）の
光損失を考慮するとその３分の１以下に落ちて暗くなっ
てしまうという問題点があった。That is, the incident light of the reflection type liquid crystal display is
It passes through a liquid crystal panel (polarizing plate-glass substrate-transparent electrode layer-alignment film layer-liquid crystal layer-alignment film layer-transparent electrode layer-glass substrate-polarizing plate) and reaches the reflection plate. The light reflected by the reflector passes through the liquid crystal panel and reaches the outside of the liquid crystal display. That is, the light passes through the liquid crystal panel twice, so that the amount of the reflected light with respect to the incident light of the reflective liquid crystal display is determined in consideration of the light loss of the liquid crystal panel (including the polarizing plate) of the liquid crystal display. There is a problem that the light falls below one-third and becomes dark.
【０００５】そこで本発明は、このような従来技術の問
題点を克服するものであって、その目的とするところ
は、明るい反射型表示体を実現するための液晶表示体用
拡散反射板およびその容易な製造方法を提供するところ
にある。Accordingly, the present invention is to overcome such problems of the prior art, and an object of the present invention is to provide a diffuse reflection plate for a liquid crystal display for realizing a bright reflection type display and a diffuse reflection plate therefor. It is intended to provide an easy manufacturing method.
【０００６】[0006]
【課題を解決するための手段】本発明の液晶表示体用拡
散反射板は、平面基板上に反射電極を具備した液晶表示
体用拡散反射板において、前記平面基板と前記反射電極
との間に、前記反射電極と熱膨張率の異なる薄膜層を持
つことを特徴とし、また前記反射電極は金属薄膜であり
拡散反射のための凹凸を有することを特徴とし、また前
記薄膜層が有機物であることを特徴とし、また前記反射
電極が表示体用の電極を兼ねることを特徴とする。According to the present invention, there is provided a diffuse reflection plate for a liquid crystal display according to the present invention, wherein a reflection electrode is provided on a plane substrate. Characterized in that the reflective electrode has a thin film layer having a different coefficient of thermal expansion from that of the reflective electrode, the reflective electrode is a metal thin film and has irregularities for diffuse reflection, and the thin film layer is an organic material. And the reflective electrode doubles as an electrode for a display.
【０００７】本発明の液晶表示体用拡散反射板の製造方
法は、平面基板上に、薄膜層を形成する工程と、前記薄
膜層上に前記薄膜層を加熱しながら反射層を堆積する工
程と、前記反射層をエッチング加工し反射電極を形成す
る工程を含むことを特徴とし、平面基板上に、凹凸を有
する薄膜層を形成する工程と、前記薄膜層上に反射層を
堆積する工程と、前記反射層をエッチング加工し反射電
極を形成する工程を含むことを特徴とし、また平面基板
上に、凹凸を有する薄膜層を形成する工程と、前記薄膜
層上に前記薄膜層を加熱しながら反射層を堆積する工程
と、前記反射層をエッチング加工し反射電極を形成する
工程を含むことを特徴とする。The method of manufacturing a diffuse reflection plate for a liquid crystal display according to the present invention comprises the steps of forming a thin film layer on a flat substrate, and depositing a reflection layer on the thin film layer while heating the thin film layer. Forming a reflective electrode by etching the reflective layer, a step of forming a thin film layer having irregularities on a flat substrate, and a step of depositing a reflective layer on the thin film layer, Forming a reflective electrode by etching the reflective layer, forming a thin film layer having irregularities on a flat substrate, and reflecting the thin film layer on the thin film layer while heating the thin film layer. The method includes a step of depositing a layer and a step of forming a reflective electrode by etching the reflective layer.
【０００８】[0008]
【実施例】（実施例１）図１（ａ）及び（ｂ）は、本発
明の実施例を説明するものであって、液晶表示体用拡散
反射板の概略平面図及びＡ−Ａ’線に沿った概略断面図
である。(Embodiment 1) FIGS. 1 (a) and 1 (b) illustrate an embodiment of the present invention, and are a schematic plan view and a line AA 'of a diffuse reflection plate for a liquid crystal display. FIG.
【０００９】この液晶表示体用拡散反射板は、平面基板
１の上に有機薄膜層２を持ち、その上にパターン形成さ
れた反射電極３を設けた構造である。前記有機薄膜２は
レジストであり、前記反射電極３はスパッタ法もしくは
蒸着法により堆積され、エッチングによってパターン形
成されている。The diffuse reflection plate for a liquid crystal display has a structure in which an organic thin film layer 2 is provided on a plane substrate 1 and a patterned reflection electrode 3 is provided thereon. The organic thin film 2 is a resist, and the reflective electrode 3 is deposited by a sputtering method or a vapor deposition method, and is patterned by etching.
【００１０】図２（ａ）〜（ｄ）は、前述した液晶表示
体用拡散反射板の製造方法を説明するものであって、重
要な製造工程終了後のガラス基板の概略断面図である。
図２に基づき液晶表示体用拡散反射板の製造工程を説明
する。FIGS. 2 (a) to 2 (d) are views for explaining a method of manufacturing the above-mentioned diffuse reflection plate for a liquid crystal display, and are schematic cross-sectional views of a glass substrate after an important manufacturing step.
The manufacturing process of the diffuse reflection plate for a liquid crystal display will be described with reference to FIG.
【００１１】まず、平面基板１の表面を有機洗浄したの
ち、さらにプラズマもしくはＵＶ＋Ｏ3により完全に基
板表面の有機物及び異物の除去を行なう（図２
（ａ））。次に、平面基板１の表面に、レジストをスピ
ンコート法により１〜１０μｍの厚みに塗布し、それを
１００〜２００℃でベーキングして有機薄膜層２を形成
する（同図（ｂ））。次に、有機薄膜層２の表面全体
に、スパッタ法もしくは蒸着法によりＡｌ薄膜もしくは
Ｐｔ薄膜よりなる反射薄膜層４を堆積する（同図
（ｃ））。このとき、有機薄膜層２を含む平面基板１を
１００〜２５０℃に加熱することによって、拡散反射に
必要な微細な凹凸が同時に形成される。これは有機薄膜
層２と反射薄膜層４との熱膨張率の違いにより有機薄膜
層２にシワが発生し、また、スパッタ時あるいは蒸着時
にＡｌ薄膜もしくはＰｔ薄膜自身がグレーン成長するた
めである。次に、反射薄膜層４をエッチングによってパ
ターン形成し反射電極３を形成する（同図（ｄ））。First, after the surface of the flat substrate 1 is organically cleaned, organic substances and foreign substances on the substrate surface are completely removed by plasma or UV + O 3 (FIG. 2).
(A)). Next, a resist is applied to the surface of the planar substrate 1 to a thickness of 1 to 10 μm by spin coating, and is baked at 100 to 200 ° C. to form an organic thin film layer 2 (FIG. 2B). Next, a reflective thin film layer 4 made of an Al thin film or a Pt thin film is deposited on the entire surface of the organic thin film layer 2 by sputtering or vapor deposition (FIG. 3C). At this time, by heating the flat substrate 1 including the organic thin film layer 2 to 100 to 250 ° C., fine irregularities necessary for diffuse reflection are simultaneously formed. This is because wrinkles occur in the organic thin film layer 2 due to a difference in the coefficient of thermal expansion between the organic thin film layer 2 and the reflective thin film layer 4, and the Al thin film or the Pt thin film itself grows at the time of sputtering or vapor deposition. Next, the reflective thin film layer 4 is patterned by etching to form the reflective electrode 3 (FIG. 4D).
【００１２】図３（ａ）〜（ｄ）は、前述した液晶表示
体用拡散反射板のもう一つの製造方法を説明するもので
あって、重要な製造工程終了後のガラス基板の概略断面
図である。図３に基づき液晶表示体用拡散反射板の製造
工程を説明する。FIGS. 3A to 3D illustrate another method of manufacturing the above-described diffuse reflection plate for a liquid crystal display, and are schematic cross-sectional views of a glass substrate after an important manufacturing process is completed. It is. The manufacturing process of the diffuse reflection plate for a liquid crystal display will be described with reference to FIG.
【００１３】まず、平面基板１の表面を有機洗浄したの
ち、さらにプラズマもしくはＵＶ＋Ｏ3により完全に基
板表面の有機物及び異物の除去を行なう（図３
（ａ））。次に、平面基板１の表面に、レジストを印刷
法により１〜５μｍの厚みに塗布し、それを１００〜２
００℃でベーキングして凹凸の有する有機薄膜層２を形
成する。次に、有機薄膜層２の表面全体に、スパッタ法
もしくは蒸着法によりＡｌ薄膜もしくはＰｔ薄膜よりな
る反射薄膜層４を堆積する（同図（ｃ））。このとき、
有機薄膜層２を含む平面基板１を１００〜２５０℃に加
熱することによって、拡散反射に必要な凹凸が同時に形
成される（この凹凸は、前述した印刷法によって形成さ
れた凹凸より更に微細な凹凸であり、印刷法により形成
された凹凸の上に形成される）。これは有機薄膜層２と
反射薄膜層４との熱膨張率の違いにより有機薄膜層２に
シワが発生し、また、、スパッタ時あるいは蒸着時にＡ
ｌ薄膜もしくはＰｔ薄膜自身がグレーン成長するためで
ある。次に、反射薄膜層４をエッチングによってパター
ン形成し反射電極３を形成する（同図（ｄ））。First, after the surface of the planar substrate 1 is organically cleaned, organic substances and foreign substances on the substrate surface are completely removed by plasma or UV + O 3 (FIG. 3).
(A)). Next, a resist is applied to the surface of the flat substrate 1 by a printing method so as to have a thickness of 1 to 5 μm.
Baking is performed at 00 ° C. to form the organic thin film layer 2 having irregularities. Next, a reflective thin film layer 4 made of an Al thin film or a Pt thin film is deposited on the entire surface of the organic thin film layer 2 by sputtering or vapor deposition (FIG. 3C). At this time,
By heating the flat substrate 1 including the organic thin film layer 2 to 100 to 250 ° C., irregularities required for diffuse reflection are simultaneously formed (the irregularities are finer than the irregularities formed by the above-described printing method). And is formed on the irregularities formed by the printing method). This is because wrinkles are generated in the organic thin film layer 2 due to a difference in the coefficient of thermal expansion between the organic thin film layer 2 and the reflective thin film layer 4.
This is because the l thin film or the Pt thin film itself grows grain. Next, the reflective thin film layer 4 is patterned by etching to form the reflective electrode 3 (FIG. 4D).
【００１４】（実施例２）図４は、本発明の液晶表示体
用拡散反射板を用て作成した反射型液晶パネルの概略断
面図であり、図５は、従来の反射型液晶パネルの概略断
面図である。従来の反射型液晶パネルにおいて、入射光
１０は、偏光板９−対向平面基板８−透明電極７−配向
膜５−液晶層６−配向膜５−透明電極７−平面基板１−
偏光板９を通過し反射フィルム１２に達し反射する。反
射板により反射された反射光１１は、その逆を通過して
液晶パネル外部へと到達するため、入射光に対し反射光
は３分の１以下となる。しかし、本発明の液晶表示体用
拡散反射板を用いた反射型液晶パネルでは、入射光１０
は、偏光板９−対向平面基板８−透明電極７−配向膜５
−液晶層６−配向膜５を通過し反射電極３に達し反射す
る。反射板により反射された反射光１１は、その逆を通
過して液晶パネルの外部に達するので、従来の反射型液
晶パネルより光の損失が少なく明るさも従来より２倍以
上明るくなった。また、反射電極３は、金属薄膜で反射
板と電極とを兼ねるので、従来の透明電極による配線抵
抗より低抵抗になるため、液晶パネル駆動時のクロスト
ークを無くし表示品質も向上した。以上、単純マトリク
スを例に述べたが、アクティブマトリクスにおいては、
アクティブ素子の形成されていない対向基板上に本発明
の液晶表示体用拡散反射板を形成することにより応用が
可能である。(Example 2) FIG. 4 is a schematic sectional view of a reflection type liquid crystal panel prepared by using the diffuse reflection plate for a liquid crystal display of the present invention, and FIG. 5 is a schematic view of a conventional reflection type liquid crystal panel. It is sectional drawing. In the conventional reflection type liquid crystal panel, the incident light 10 is polarized by a polarizing plate 9-a facing flat substrate 8-a transparent electrode 7-an alignment film 5-a liquid crystal layer 6-an alignment film 5-a transparent electrode 7-a flat substrate 1-
The light passes through the polarizing plate 9 and reaches the reflection film 12 where it is reflected. The reflected light 11 reflected by the reflecting plate passes through the opposite direction and reaches the outside of the liquid crystal panel, so that the reflected light is one third or less of the incident light. However, in the reflection type liquid crystal panel using the diffuse reflection plate for a liquid crystal display of the present invention, the incident light 10
Denotes a polarizing plate 9-a counter flat substrate 8-a transparent electrode 7-an alignment film 5
-The liquid crystal layer 6-passes through the alignment film 5, reaches the reflective electrode 3, and is reflected. Since the reflected light 11 reflected by the reflector passes through the opposite direction and reaches the outside of the liquid crystal panel, the loss of light is smaller than that of the conventional reflection type liquid crystal panel, and the brightness is more than twice as bright as that of the conventional liquid crystal panel. In addition, since the reflective electrode 3 is a metal thin film that serves as both a reflective plate and an electrode, the resistance is lower than the wiring resistance of a conventional transparent electrode. Therefore, crosstalk during driving of a liquid crystal panel is eliminated and display quality is improved. As described above, the simple matrix has been described as an example.
The present invention can be applied by forming the diffuse reflection plate for a liquid crystal display of the present invention on a counter substrate on which an active element is not formed.
【００１５】以上実施例を述べたが、本発明は以上の実
施例における平面基板上に形成される液晶表示体用拡散
反射板のみに限定されるものではなく、各種の反射板等
に応用が可能である。Although the embodiments have been described above, the present invention is not limited to only the diffuse reflection plate for a liquid crystal display formed on a flat substrate in the above embodiments, but is applicable to various reflection plates and the like. It is possible.
【００１６】[0016]
【発明の効果】以上述べたように本発明によれば、液晶
表示体の液晶パネル（偏光板を含む）の光損失を減少し
反射型液晶表示体の明るさを確保し、また、配線抵抗の
低抵抗化により液晶表示におけるクロストークをなくし
表示品質を向上させ、明るく見やすい反射型液晶表示体
を提供するという効果を有する。As described above, according to the present invention, the light loss of the liquid crystal panel (including the polarizing plate) of the liquid crystal display is reduced, the brightness of the reflective liquid crystal display is ensured, and the wiring resistance is reduced. Has the effect of eliminating crosstalk in liquid crystal display and improving display quality, and providing a bright and easy-to-see reflective liquid crystal display.
【図１】（ａ）は実施例１における液晶表示体用拡散反
射板の概略平面図であり、（ｂ）はＡ−Ａ’線に沿った
概略断面図である。FIG. 1A is a schematic plan view of a liquid crystal display diffuse reflection plate in Example 1, and FIG. 1B is a schematic cross-sectional view taken along line AA ′.
【図２】（ａ）〜（ｄ）は実施例１における液晶表示体
用拡散反射板の製造プロセスを説明するものであって、
重要な製造工程終了後の基板の概略断面図である。FIGS. 2 (a) to 2 (d) illustrate a process for manufacturing a diffuse reflection plate for a liquid crystal display in Example 1. FIGS.
It is a schematic sectional drawing of a board | substrate after an important manufacturing process completes.
【図３】（ａ）〜（ｄ）は実施例１における液晶表示体
用拡散反射板のもう一つの製造プロセスを説明するもの
であって、重要な製造工程終了後の基板の概略断面図で
ある。FIGS. 3 (a) to 3 (d) illustrate another manufacturing process of the diffuse reflection plate for a liquid crystal display in Example 1, and are schematic cross-sectional views of the substrate after an important manufacturing process is completed. is there.
【図４】実施例２における本発明の液晶表示体用拡散反
射板を用いた反射型液晶パネルの概略断面図。FIG. 4 is a schematic cross-sectional view of a reflective liquid crystal panel using a diffuse reflection plate for a liquid crystal display of the present invention in Example 2.
【図５】従来の反射型液晶パネルの概略断面図。FIG. 5 is a schematic sectional view of a conventional reflective liquid crystal panel.
１ 平面基板 ２ 有機薄膜層 ３ 反射電極 ４ 反射薄膜層 ５ 配向膜 ６ 液晶層 ７ 透明電極 ８ 対向平面基板 ９ 偏光板 １０ 入射光 １１ 反射光 １２ 反射フィルム １３ シール剤 REFERENCE SIGNS LIST 1 flat substrate 2 organic thin film layer 3 reflective electrode 4 reflective thin film layer 5 alignment film 6 liquid crystal layer 7 transparent electrode 8 opposed flat substrate 9 polarizing plate 10 incident light 11 reflected light 12 reflective film 13 sealant
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【手続補正書】[Procedure amendment]
【提出日】平成１１年８月３０日（１９９９．８．３
０）[Submission date] August 30, 1999 (1999.8.3)
0)
【手続補正１】[Procedure amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】発明の名称[Correction target item name] Name of invention
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【発明の名称】液晶表示体用拡散板及び液晶表示体Patent application title: Diffusion plate for liquid crystal display and liquid crystal display
【手続補正２】[Procedure amendment 2]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】特許請求の範囲[Correction target item name] Claims
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【特許請求の範囲】[Claims]
【手続補正３】[Procedure amendment 3]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】０００１[Correction target item name] 0001
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【０００１】[0001]
【産業上の利用分野】本発明は液晶表示体及び液晶表示
体用拡散板に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display and a diffusion plate for the liquid crystal display.
【手続補正４】[Procedure amendment 4]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】０００５[Correction target item name] 0005
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【０００５】そこで本発明は、このような従来技術にお
ける問題点を克服し、明るい表示を可能とする液晶表示
体及び液晶表示体用拡散板を得ることを目的とする。Accordingly, an object of the present invention is to overcome the problems in the prior art and to provide a liquid crystal display and a diffusion plate for a liquid crystal display which enable bright display.
【手続補正５】[Procedure amendment 5]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】０００６[Correction target item name] 0006
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【０００６】[0006]
【課題を解決するための手段】本発明の液晶表示体は、
一対の基板間に液晶層を有しており一方の前記基板上に
は薄膜層が形成され、 該薄膜層上には反射膜が形成さ
れてなる液晶表示体において、前記反射膜は前記薄膜層
上に加熱堆積されてなり、前記前記薄膜層と前記反射膜
とでは熱膨脹率が異なることを特徴とする。The liquid crystal display of the present invention comprises:
In a liquid crystal display having a liquid crystal layer between a pair of substrates, a thin film layer formed on one of the substrates, and a reflective film formed on the thin film layer, the reflective film is the thin film layer The thin film layer and the reflective film have different coefficients of thermal expansion.
【手続補正６】[Procedure amendment 6]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】０００７[Correction target item name] 0007
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【０００７】また、一対の基板間に液晶層を有しており
一方の前記基板上には有機膜が形成され、該有機膜上に
は金属からなる反射膜が形成されてなる液晶表示体にお
いて、前記金属膜は前記有機層上に加熱堆積されてなる
ことを特徴とする。In a liquid crystal display having a liquid crystal layer between a pair of substrates, an organic film is formed on one of the substrates, and a reflective film made of metal is formed on the organic film. The metal film is formed by heating and depositing on the organic layer.
【手続補正７】[Procedure amendment 7]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】００１６[Correction target item name] 0016
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【００１６】[0016]
【発明の効果】以上述べてきたように、本発明の液晶表
示体及び液晶表示体用拡散板は、基板上には有機膜が形
成され、有機膜上には反射膜が形成され、有機膜は反射
膜側に凹凸を有しており、その凹凸にはその凹凸より微
細な凹凸が形成されている。そしてその微細な凹凸によ
り良好な散乱面が得られ、それにより明るい液晶表示体
が実現する。As described above, in the liquid crystal display and the diffusion plate for the liquid crystal display of the present invention, an organic film is formed on a substrate, a reflection film is formed on the organic film, and an organic film is formed. Has irregularities on the reflective film side, and irregularities finer than the irregularities are formed in the irregularities. Then, a fine scattering surface is obtained by the fine unevenness, thereby realizing a bright liquid crystal display.
Claims (7)
示体用拡散反射板において、前記平面基板と前記反射電
極との間に、前記反射電極と熱膨張率の異なる薄膜層を
持つことを特徴とする液晶表示体用拡散反射板。1. A diffuse reflection plate for a liquid crystal display having a reflection electrode on a flat substrate, wherein a thin film layer having a different coefficient of thermal expansion from that of the reflection electrode is provided between the flat substrate and the reflection electrode. Characteristic diffuse reflector for liquid crystal display.
のための凹凸を有することを特徴とする請求項１記載の
液晶表示体用拡散反射板。2. The diffuse reflection plate for a liquid crystal display according to claim 1, wherein the reflection electrode is a metal thin film and has irregularities for diffuse reflection.
する請求項１記載の液晶表示体用拡散反射板。3. The diffuse reflector according to claim 1, wherein the thin film layer is made of an organic material.
いることを特徴とする請求項１記載の液晶表示体用拡散
反射板。4. The diffuse reflection plate for a liquid crystal display according to claim 1, wherein the reflection electrode also serves as an electrode for a display.
と、前記薄膜層上に前記薄膜層を加熱しながら反射層を
堆積する工程と、前記反射層をエッチング加工し反射電
極を形成する工程を含むことを特徴とする液晶表示体用
拡散反射板の製造方法。5. A step of forming a thin film layer on a flat substrate, a step of depositing a reflective layer on the thin film layer while heating the thin film layer, and forming a reflective electrode by etching the reflective layer. A method for producing a diffuse reflection plate for a liquid crystal display, comprising the steps of:
成する工程と、前記薄膜層上に反射層を堆積する工程
と、前記反射層をエッチング加工し反射電極を形成する
工程を含むことを特徴とする液晶表示体用拡散反射板の
製造方法。6. A step of forming a thin layer having irregularities on a flat substrate, a step of depositing a reflective layer on the thin layer, and a step of forming a reflective electrode by etching the reflective layer. A method for producing a diffuse reflection plate for a liquid crystal display, comprising:
成する工程と、前記薄膜層上に前記薄膜層を加熱しなが
ら反射層を堆積する工程と、前記反射層をエッチング加
工し反射電極を形成する工程を含むことを特徴とする液
晶表示体用拡散反射板の製造方法。7. A step of forming a thin layer having irregularities on a flat substrate, a step of depositing a reflective layer on the thin layer while heating the thin layer, and a step of etching the reflective layer to form a reflective electrode. Forming a diffuse reflection plate for a liquid crystal display.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22245499A JP3686556B2 (en) | 1999-08-05 | 1999-08-05 | Liquid crystal display, diffusion plate for liquid crystal display |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22245499A JP3686556B2 (en) | 1999-08-05 | 1999-08-05 | Liquid crystal display, diffusion plate for liquid crystal display |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP03243632A Division JP3094546B2 (en) | 1991-09-24 | 1991-09-24 | Method for manufacturing a diffuse reflection plate for a liquid crystal display, and method for manufacturing a liquid crystal display |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002263198A Division JP2003114429A (en) | 2002-09-09 | 2002-09-09 | Diffusion reflection plate for liquid crystal display body and method for manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000047207A true JP2000047207A (en) | 2000-02-18 |
| JP3686556B2 JP3686556B2 (en) | 2005-08-24 |
Family
ID=16782676
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22245499A Expired - Lifetime JP3686556B2 (en) | 1999-08-05 | 1999-08-05 | Liquid crystal display, diffusion plate for liquid crystal display |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3686556B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6966662B2 (en) | 2003-01-10 | 2005-11-22 | Alps Electric Co., Ltd. | Reflector and liquid crystal display device |
| KR100821525B1 (en) * | 2001-09-04 | 2008-04-11 | 삼성전자주식회사 | Liquid crystal device having reflective electrode and method of manufacturing the same |
-
1999
- 1999-08-05 JP JP22245499A patent/JP3686556B2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100821525B1 (en) * | 2001-09-04 | 2008-04-11 | 삼성전자주식회사 | Liquid crystal device having reflective electrode and method of manufacturing the same |
| US6966662B2 (en) | 2003-01-10 | 2005-11-22 | Alps Electric Co., Ltd. | Reflector and liquid crystal display device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3686556B2 (en) | 2005-08-24 |
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