JP2000036530A - Carrier mechanism and treating device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain the articulated-carrying arm having the rigidity in compliance with the formation of the large-scale body to be processed such as LCD substrate. SOLUTION: This carrying unit 5 has an articulated carrying arm 11 which conveys a substrate 1 for LCD, and a driving mechanism which drives this carrying arm 11 and gives and takes the LCD substrate 1 through a load-locking chamber 12 between a processing chamber 2 and a carryer. In this carrying unit 5, the load-locking chamber 12 is provided in the carrying unit 5 so as to be connected to the processing chamber 2. Furthermore, a carrying arm 11 is provided in the load-locking chamber 12. At the same time, a direct driving mechanism 19 which moves the carrying arm 11 for the processing chamber 2 or the carrying facing the carrying arm 11 back and forth is provided in the load-locking chamber.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a transport mechanism and a processing apparatus, and more particularly, to a substrate for a liquid crystal display (hereinafter, referred to as a substrate).
It is called "LCD substrate". The present invention relates to a transfer mechanism having an improved articulated transfer arm for transferring an object to be processed such as a semiconductor wafer and a semiconductor wafer, and a processing apparatus provided with the transfer mechanism.

[0002]

2. Description of the Related Art As a conventional processing apparatus of this type, for example, a multi-chamber processing apparatus is widely used.
The multi-chamber processing apparatus includes, for example, a plurality of (for example, three) processing chambers for performing the same or different kinds of processing on an object to be processed (for example, an LCD substrate) under reduced pressure, and is connected to these processing chambers. A transfer chamber, a load lock chamber connected to the transfer chamber in the same manner as the processing chamber, and a transfer mechanism for exchanging the LCD substrate between the load lock chamber and a carrier arranged in the mounting mechanism. ing.

When performing a predetermined process on the LCD substrate, the articulated transfer arm of the transfer mechanism is bent and extended, and the LCD substrates are taken out one by one from the carrier arranged on the mounting mechanism. Moves from the carrier to the processing chamber and confronts the load lock chamber. Next, the gate valve at the loading / unloading entrance of the load lock chamber is opened, the substrate for LCD is loaded into the load lock chamber via the transfer arm at atmospheric pressure, and the transfer arm retreats from the load lock chamber. Seal the lock room. Thereafter, the air in the load lock chamber is replaced with an inert gas such as nitrogen gas, and the inert gas in the load lock chamber is exhausted, so that the pressure in the load lock chamber is reduced to the same level as the transfer chamber. Next, after the gate valve on the transfer chamber side is opened and the load lock chamber and the transfer chamber communicate with each other, the transfer arm in the transfer chamber is driven, and the LC in the load lock chamber is driven via the transfer arm.
The substrate for D is carried into the transfer chamber, and the gate valve is closed. When the transfer chamber is shut off from the load lock chamber, the gate valve on the processing chamber side opens, and the LC enters the processing chamber via the transfer arm.
After the substrate for D is carried in, the transfer arm retreats from the processing chamber and the gate valve closes to shut off the processing chamber and the transfer chamber, and processing such as etching and film formation is started in the processing chamber.
When the processing of the LCD substrate is completed in the processing chamber, the LCD substrate after processing is returned from the processing chamber to the original place in the carrier by following the reverse path via the transfer arm and the transfer mechanism in the transfer chamber. Back. If another process is to be performed on the LCD substrate continuously, the processed LCD substrate is loaded into a processing chamber to be processed next via the transfer arm in the transfer chamber, and the processing is performed. Return the processed LCD substrate to its original location in the carrier.

[0004]

However, in the case of the conventional transfer mechanism, when the size of the object to be processed such as an LCD substrate is increased, the distance between the transfer arm and the transfer position of the object is increased. It becomes longer according to the body, and moreover, FIG.
As shown in FIG.
1, the first and second arms 10
The length L'L1 'of each arm 102, 103 is increased, and each arm 102,
Although it is necessary to increase the rigidity of the 103, there is a limit to this rigidity enhancement, and there is a problem that it is difficult to obtain an articulated transfer arm having a rigidity corresponding to the increase in the size of the object to be processed. . Further, there is a problem that the operation time becomes longer as the transfer arm becomes longer.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and it is not necessary to lengthen each arm of the transfer arm in accordance with an increase in the size of an object to be processed such as an LCD substrate. It is an object of the present invention to provide a transport mechanism and a processing device capable of reducing operation time.

[0006]

A transfer arm according to a first aspect of the present invention comprises an articulated transfer arm for transferring an object to be processed, and driving the transfer arm to move the transfer arm between a processing chamber and a carrier. And a drive mechanism for exchanging the object through a load lock chamber, wherein a linear drive mechanism for moving the transfer arm forward and backward with respect to the processing chamber or the carrier facing the transfer arm. It is characterized by having been provided.

According to a second aspect of the present invention, there is provided a transfer mechanism for transferring an object to be processed, and a load lock chamber between the processing chamber and the carrier by driving the transfer arm. A transfer mechanism for exchanging the object to be processed through the transfer mechanism, wherein the load lock chamber is provided in the transfer mechanism so as to be connectable to the processing chamber, and the transfer arm is provided in the load lock chamber. A linear drive mechanism for moving the transfer arm forward and backward with respect to the processing chamber or the carrier facing the transfer arm is provided in the load lock chamber.

According to a third aspect of the present invention, there is provided a transfer mechanism for transferring an object to be processed, and a load lock chamber between the processing chamber and the carrier by driving the transfer arm. And a drive mechanism for exchanging the object to be processed through the load lock chamber, wherein the load lock chamber is provided with a ventilation mechanism for ventilating the internal air with clean air, and the load lock chamber is connected to the processing chamber. The load lock is provided on the transfer mechanism, and the transfer arm is provided in the load lock chamber, and a linear drive mechanism for moving the transfer arm forward and backward with respect to the processing chamber or the carrier facing the transfer arm. It is characterized by being provided indoors.

According to a fourth aspect of the present invention, in the transport mechanism according to any one of the first to third aspects, the linear drive mechanism guides the transport arm in a moving direction. And an endless belt for reciprocating the transfer arm along the guide rail, and a rotation drive mechanism for rotating the endless belt.

According to a fifth aspect of the present invention, in the transport mechanism according to any one of the first to fourth aspects, the linear drive mechanism guides the transport arm in a moving direction. And a cylinder mechanism for reciprocating the transfer arm along the guide rail.

Further, the processing apparatus according to claim 6 of the present invention is arranged such that at least one processing chamber for performing a predetermined processing on the object under reduced pressure, and between the processing chamber and at least one carrier. And a transfer mechanism for transferring the object to be processed between the processing chamber and the carrier, and the transfer mechanism is an articulated transfer arm for transferring the object to be processed,
A drive mechanism for driving the transfer arm to exchange the object to be processed between the processing chamber and the carrier via the load lock chamber, wherein the load lock chamber is moved relative to the processing chamber. Provided in the transport mechanism so that it can be connected,
The transfer arm is provided in the load lock chamber, and a linear drive mechanism for moving the transfer arm forward and backward with respect to the processing chamber or the carrier facing the transfer arm is provided in the load lock chamber. Is what you do.

According to a seventh aspect of the present invention, there is provided a processing apparatus, comprising: at least one processing chamber for performing a predetermined processing on an object under reduced pressure; and a processing chamber and at least one carrier. And a transfer mechanism for transferring the object to be processed between the processing chamber and the carrier, and the transfer mechanism is an articulated transfer arm for transferring the object to be processed,
A drive mechanism for driving the transfer arm to transfer the object to be processed between the processing chamber and the carrier through the load lock chamber. Providing a ventilation mechanism for ventilating with air, providing the load lock chamber to the transfer mechanism so as to be connectable to the processing chamber, and providing the transfer arm in the load lock chamber and facing the transfer arm; A linear drive mechanism for moving the transfer arm forward and backward with respect to the chamber or the carrier is provided in the load lock chamber.

In the processing apparatus according to the present invention, the linear drive mechanism may further include: a guide rail for guiding the transfer arm in a moving direction; An endless belt for reciprocating the transfer arm along the guide rail, and a rotation drive mechanism for driving the endless belt to rotate.

According to a ninth aspect of the present invention, in the processing apparatus according to the sixth to eighth aspects, the linear drive mechanism includes a guide rail for guiding the transfer arm in a moving direction; A cylinder mechanism for reciprocating the transfer arm along the guide rail.

[0015]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the embodiments shown in FIGS. The processing apparatus of the present embodiment, for example, as shown in FIG. 1, performs a predetermined process (for example, an LCD substrate) 1
A processing unit 3 having two processing chambers 2 for performing an etching process, a film forming process, and the like, and a carrier C containing, for example, 25 LCD substrates 1 to be processed by the processing unit 3
And three mounting units 4 for mounting the
And a transport unit 5 for transporting the LCD substrate 1 between them. The LCD substrate 1 in the carrier C is taken out one by one via the transport unit 4 and is put into each processing chamber 2.
The substrate 1 for CD is carried in and subjected to a predetermined processing therein.
After the processing, the processing chamber 2 is returned to the original position in the carrier C by following the reverse route.

A gate valve unit 6 and a connection unit 7 are mounted on the front of the processing chamber 2 in an airtight manner, and the processing chamber 2 and the transfer unit 5 are connected via the connection unit 7. They are connected directly. An openable / closable lid 8 is attached to an upper portion of the processing chamber 2. For example, the lid 8 is opened to a position shown by a dashed line as shown by an arrow in FIG. It is. A vacuum pump 9 is provided in the processing unit 3, and the inside of the processing chamber 2 is depressurized by the vacuum pump 9 to maintain a predetermined degree of vacuum. still,
Both the mounting unit 4 and the transport unit 5 are arranged, for example, on the base 10.

As shown in FIGS. 1 and 2, the transfer unit 5 includes an articulated transfer arm 11 for transferring the LCD substrate 1 and a substantially rectangular load lock chamber in which the transfer arm 11 is stored. And a drive unit 13 for moving the load lock chamber 12 between the processing chamber 2 and the mounting unit 4.
And the driving unit 13 is connected to the processing chamber 2 and the mounting unit 4.
And a pair of guide rails 14 that guide movement between the guide rails. The drive unit 13 is, for example, the load lock chamber 1
A swing drive mechanism 15 mainly comprising a motor (not shown) for rotating the rotary shaft 2 and a lifting drive mechanism 16 mainly comprising a rack and pinion for vertically moving the swing drive mechanism 15. The chamber 12 is rotated, for example, by 180 ° between the processing chamber 2 and the mounting unit 4, and the load lock chamber 1 is moved via the lifting drive mechanism 16.
2 is an arbitrary LCD substrate 1 in the carrier C and a processing chamber 2
Is moved up and down in accordance with the height of each of the gate valve units 6. As shown in FIGS. 1 and 2, the load lock chamber 12 is disposed on a substrate 15A constituting the turning drive mechanism 15, and is turned through the substrate 15A.

As shown in FIGS. 1 and 2, the load lock chamber 12 reciprocates according to each guide rail 17 via a pair of air cylinders 18 provided on the substrate 15A. That is, the pair of air cylinders 18
Are fixed on the substrate 15A outside and parallel to the pair of guide rails 17. The distal end of the rod 18A of the air cylinder 18 is connected to a connecting member 12C fixed to both side surfaces of the load lock chamber 12. Therefore, an LCD is provided between the transport unit 5 and the carrier C or the processing chamber 2.
When exchanging the substrate 1, the load lock chamber 12 reciprocates on the substrate 15A according to the guide rail 17 via the air cylinder 18. In FIG. 2, the air cylinder 18 is not shown.

Further, as shown in FIGS. 3A and 3B, the transfer arm 11 includes a motor 11A fixed to the back surface of the substrate 19A, a motor 11A and a rotating shaft 11A.
B, a first arm 11C connected to the front side of the substrate 19A and a fork-shaped hand 11E connected to the first arm 11C and the second arm 11D and supporting the LCD substrate 1; And the first and second arms 11C and 11D and the hand 1 driven by the motor 11A.
1E, the hand 11E is inserted and removed from the loading / unloading port 12A of the load lock chamber 12. In addition, the transfer arm 11 moves forward and backward in the load lock chamber 12 via the linear drive mechanism 19, and directly transfers the LCD substrate 1 between the carrier C and the processing chamber 2. As described above, the transfer arm 11 is
9, the first and second arms 11C, 1C are moved by a distance commensurate with the amount of movement.
Even if the 1D is shortened, the distance between the carrier C and the processing chamber 2 is low.
The CD substrate 1 can be exchanged. Since the first and second arms 11C and 11D can be shortened, the rigidity of each arm 11C and 11D can be enhanced, and the operation time of the first and second arms 11C and 11D can be shortened to increase the throughput. be able to.

The linear drive mechanism 19 includes the transfer arm 11
, A pair of guide rails 19D disposed on a base 19B spaced from the substrate 19A and engaged with an engaging member 19C fixed to the back surface of the substrate 19A. A drive mechanism 19E for moving the transfer arm 11 according to the guide rail 19D. The drive mechanism 19E includes a motor 19F and the motor 1F.
9F, a driven pulley 19G that rotates forward and backward, a driven pulley 19H that forms a pair with the driven pulley 19G, and an endless wound around the pulleys 19G and 19H and arranged side by side with the guide rail 19D. And a belt 19I. The transfer arm 11 is connected to an endless belt 19I via a substrate 19A. A long hole 19J through which the motor 11A of the transfer arm 11 penetrates is formed in the base 19B, and the motor 11A moves within the long hole 19J when the transfer arm 11 moves according to the guide rail 19D.

In the present invention, a straight drive mechanism 20 shown in FIG. 4 may be used instead of the straight drive mechanism 19 shown in FIGS. 3 (a) and 3 (b). The rectilinear drive mechanism 20 is substantially the same as the rectilinear drive 19 except that an air cylinder 20F is connected to a substrate 20A supporting the transfer arm 11 as a drive mechanism 20E, as shown in FIG. I have.

Incidentally, the load lock chamber 12 has an LC
When the substrate 1 for D is exchanged, it is open in the clean room, so that air around the device may enter the load lock chamber 12 and the inside may be contaminated by particles generated around the device. is there. In order to prevent such contamination, the load lock chamber 120 shown in FIGS. 5 and 6 uses a ventilation mechanism to always maintain a positive pressure inside the load lock chamber 120 when the load lock chamber 120 is open to the atmosphere. The surrounding air is prevented from entering the load lock chamber 120. Otherwise, the load lock chamber 1
2 is configured.

That is, the load lock chamber 1 shown in FIGS.
A ventilation mechanism 121 is attached to the back surface of 20.
As shown in FIGS. 5 and 6, the ventilation mechanism 121 includes, for example, a gate valve unit 122 and a HEPA filter 12.
3 and a blower fan 124, and are sequentially arranged from the rear side to the outside in this order. Therefore, the load lock chamber 1
When the LCD substrate 20 transfers the LCD substrate 1 between the carrier C and the processing chamber 2, the gate valve unit 122 and the blower fan 124 are driven, and the gate valve 122A is opened at the back of the load lock chamber 120. At the same time, the air in the clean room is blown into the load lock chamber 120 from the blower fan 124, and flows out of the load / unload port 120A to keep the load lock chamber 120 always in a positive pressure state. Room 120
It is designed not to get inside. Load lock room 12
The air flowing through the inside 0 is cleaned by removing particles generated around the device contained in the air through the HEPA filter 123, and is clean, and there is no possibility of contaminating the LCD substrate 1.

The load lock chamber 120 'shown in FIG. 7 is constructed in accordance with the load lock chamber 120 shown in FIGS. 5 and 6, except that a double arm transfer arm 11' of the frog-leg type is used as the transfer arm. . That is, the load lock chamber 120 'is provided with the gate valve unit 122' and the HEPA filter 12 as the ventilation mechanism 121 '.
3 ′ and the blower fan 124 ′, and the load lock chamber 1
The inside of 20 'is always kept at a positive pressure with clean air so that air around the apparatus does not enter. By adopting the double arm in this way, it is possible to increase the loading / unloading efficiency of the LCD substrate 1.

The load lock chamber 12 and the processing chamber 2
When the LCD substrate 1 is exchanged between the load lock chamber 12 and the gate valve unit 6 of the processing chamber 2 via the connection unit 7 as shown in FIGS. The inside of the chamber 12 is evacuated in accordance with the degree of vacuum in the processing chamber 2. FIG. 8 shows only the load lock chamber 12 of the transport unit 4 for convenience of explanation.

That is, as shown in FIGS. 9 and 10, the gate valve unit 6 includes a gate valve 6A that opens and closes a loading / unloading port of the processing chamber 2 and opens and closes the gate valve 6A.
And a frame body 6B to which is attached. Seal members 6C made of O-rings or the like are mounted on both surfaces of the frame body 6B, and the seal members 6C maintain airtightness between the gate valve unit 6, the processing chamber 2, and the connection unit 7. . Further, as shown in FIG. 9, seal members 6D are mounted on the upper end and the lower end of the gate valve 6A, and the gate valve 6A is attached by these seal members 6D.
Airtightness between A and the processing chamber 2 is maintained. An introduction pipe 6E for introducing an inert gas such as nitrogen gas is attached to an upper portion of the frame 6B, and an exhaust pipe 6
F is attached. Then, as shown by the arrow in FIG. 9, the inert gas is introduced from the introduction pipe 6E and exhausted from the exhaust pipe 6F, and the load lock chamber 12
Is connected, the air in the load lock chamber 12 is replaced with an inert gas, and the inside of the load lock chamber 12 is evacuated until a predetermined degree of vacuum is reached.

As shown in FIGS. 8A and 9, the connection unit 7 is joined to the gate valve unit 6 in an airtight state. The connection unit 7 includes a frame 7A joined to the frame 6B, and a pair of lock mechanisms 7B attached to both sides of the frame 7A, and is joined to the connection unit 7 via the lock mechanism 7B. The load lock chamber 12 is locked so that the load lock chamber 12 is connected to the processing chamber 2 side. Each of the lock mechanisms 7B includes, as shown in FIGS. 8A and 8B and FIG.
A right and left guide rails 7C fixed to both sides of the front,
Flanges 1 respectively engaged with these guide rails 7C and formed on the left and right of the loading / unloading entrance of the load lock chamber 12.
Left and right engaging members 7D respectively engaging with the 2D, first and left and right first air cylinders 7E respectively connected to these engaging members 7D and moving the engaging members 7D up and down in accordance with the guide rails 7C, A second air cylinder 7F is attached to the member 7D and presses the flanges 12D of the load lock chamber 12 engaged with the member 7D evenly to bring the load lock chamber 12 into close contact with the frame 7A. Therefore, when the load lock chamber 12 is joined to the processing chamber 2 as shown in FIG. 8A, the lock mechanism 7B is driven so that the load lock chamber 12 comes into close contact with the frame 7A of the connection unit 7. It is. As shown in FIG. 8B, for example, a spring 22 is mounted behind the load lock chamber 12, and the load lock chamber 12 is elastically contacted with the processing chamber 2 via the spring 22, and a lock mechanism 7 is provided.
B may function smoothly. In FIG. 9, 7G is a seal member made of an O-ring or the like.

In the present invention, a lock mechanism 23 shown in FIGS. 12A and 12B may be attached in place of the lock mechanism 7B. As shown in the drawing, the lock mechanism 23 includes a clamp 23A that rotates in the forward and reverse directions, and an air cylinder 23B that moves the clamp 23A forward and backward, and is attached to the peripheral surface of the frame 7A. On the other hand, the load lock chamber 12 has a flange 12E formed all around the carry-in / out port, and the load lock chamber 12 is locked to the processing chamber 2 via the flange 12E.

In the present invention, the load lock chamber has a floating structure as shown in FIGS. 13 and 14, so that the alignment between the load lock chamber and the processing chamber can be performed more smoothly. The load lock chamber 51 is supported by a floating mechanism 52 as shown in each figure. The floating mechanism 52 includes a substrate 52A having an L-shaped side surface, and a first substrate 52A disposed on the substrate 52A and elastically supporting the load lock chamber 51.
Second and third springs 52B, 52C, 52D are provided. The first spring 52 </ b> B is connected to support columns 52 </ b> E erected on both sides of the load lock chamber 51 and the load lock chamber 5.
The second spring 52C is elastically mounted between the vertical wall surface of the base 52 and the back surface of the load lock chamber 51, and is further elastically mounted between the flanges 51A extending laterally from the upper surface of the first spring 52.
D is mounted between the lower surface of the load lock chamber 51 and the substrate 52A. Then, the substrate 52A of the load lock chamber 51
The support mechanism 19 is attached to the support. Therefore, when the load lock chamber 51 is connected to the processing chamber 2, the first,
As shown by arrows in FIG. 13, the load lock chamber 51 slightly fluctuates in all directions via the second and third springs 52B, 52C, and 52D to absorb a positional shift between the load lock chamber 51 and the processing chamber 2, The load lock chamber 51 and the processing chamber 2 are connected smoothly without impact. In FIG. 13, reference numeral 50 denotes an articulated transfer arm, and 53, a bellows, which are configured in the same manner as described above.

Next, a processing method of the present invention using the processing apparatus of the present embodiment will be described with reference to FIGS. First, when removing the LCD substrate 1 from the carrier C, the transport unit 4 moves to a predetermined carrier C on the mounting mechanism 4 according to the guide rails 14 on the base 10, and then as shown in FIG. Turning drive mechanism 15
The loading / unloading port 12A of the load lock chamber 12 is made to face the carrier C via the. Next, the load lock chamber 12 is moved up and down via the elevating drive mechanism 16, and the height of the hand 11E of the transfer arm 11 is adjusted to the height of the LCD substrate 1 to be taken out.

In this state, the air cylinder 18 is driven to move the load lock chamber 12 according to the guide rail 17,
The load lock chamber 12 approaches the carrier C and stops as shown in FIG. At this time, the rectilinear driving mechanism 19 is driven, and the transport arm 11 moves according to the guide rail 19D, and comes closer to the carrier C than the load lock chamber 12. Further, the motor 11A rotates to rotate the first and second arms 11C and 11D and the hand 11 via the rotation shaft 11B.
E extends, and the hand 11E enters the carrier C. Next, the load lock chamber 12 is slightly moved up and down via the elevation drive mechanism 16, and the LCD substrate 1 in the carrier C is placed on the hand 11E.

Next, the transfer arm 11 retreats in the load lock chamber 12 via the linear drive mechanism 19, and the motor 11A of the transfer arm 11 rotates in the reverse direction, as shown in FIG.
, The first and second arms 1 via the rotating shaft 11B.
1C, 11D and the hand 11E are bent to carry the LCD substrate 1 from the carrier C into the load lock chamber 12.
Thereafter, the air cylinder 18 is driven to load the load lock chamber 1.
2 moves in accordance with the guide rail 17, and the load lock chamber 12 returns from the carrier C to the original position.

Thereafter, as shown in FIG. 2D, the load lock chamber 12 is turned by the turning drive mechanism 15 and the lifting drive mechanism 16.
And stops at a state where the carry-in / out port 12A is adjusted to the height of the connection unit 7 of the processing chamber 2. Next, the air cylinder 18 is driven, and (e) of FIG.
As shown in FIG. 7, the load lock chamber 12 approaches the processing chamber 2 and the loading / unloading port 12A is connected to the frame 7 of the connection unit 7 on the processing chamber 2 side.
Contact with A. At the same time, the first air cylinder 7E of the lock mechanism 7B of the connection unit 7 is driven, and the engagement member 7D
Rises according to the guide rail 7C and the load lock chamber 1
The second air cylinder 7F is driven simultaneously with the engagement with the second flange 12E to connect the load lock chamber 12 to the connection unit 7.
To the frame 7A.

At this time, if the load lock chamber 51 has a floating structure as shown in FIGS.
The load lock chamber 51 comes into contact with the connection unit 7 without any impact, and even if there is a slight displacement with respect to the connection unit 7, the displacement is absorbed by the floating mechanism 52, and the load lock chamber 51 and the connection unit 7 are connected. 7 can be smoothly connected via the lock mechanism 7B.

Subsequently, an inert gas (for example, nitrogen gas) is introduced from the introduction pipe 6E of the gate valve unit 6, and the air in the load lock chamber 12 is exhausted from the exhaust pipe 6F, thereby replacing the air inside with the nitrogen gas. At the same time, the inside of the load lock chamber 12 is evacuated to a state close to the degree of vacuum in the processing chamber 2.

After the inside of the load lock chamber 12 reaches a predetermined degree of vacuum, the gate valve 6A is opened and the load lock chamber 12 is opened.
The transfer arm 11 advances to the processing chamber 2 side as shown in FIG. 16, and the motor 11A of the transfer arm 11 rotates, as shown in FIG. The first and second arms 11C, 1C are connected via a shaft 11B.
1D and the hand 11E are extended and the hand 11E is in the processing chamber 2.
Then, the LCD substrate 1 on the hand 11E is delivered to the mounting table 2A in the processing chamber 2. At this time, the processed LC
If the D substrate 1 exists on the mounting table 2A, the hand 11E
, The linear drive mechanism 19 drives the transport arm 11 to retreat into the load lock chamber 12, and the motor 11A of the transport arm 11 drives to transfer the LCD substrate 1 from the processing chamber 2 into the load lock chamber 12. LCD substrate 1
Bring in. Subsequently, the processed LCD substrate 1 is processed in the reverse order to the case where the LCD substrate 1 is carried into the processing chamber 2.
To the original position in the carrier C.

The load lock chamber 1 shown in FIGS.
20 and 120 ', load lock chamber 1
When exchanging the LCD substrate 1 between the carrier C and the processing chamber 2 via 20, 20 ', the ventilation mechanism 121,
121 ′ is driven to blow air into the load lock chambers 120, 120 ′ while purifying the outside air, and the inside is always maintained at a positive pressure with clean air, so that the air around the device does not enter the inside of the LCD. Substrate 1 is protected from particle contamination. That is, when the ventilation mechanisms 121, 121 'are driven, the blower fans 124, 124' are started, and the gate valves 122A, 122'A are driven to open the openings 120C, 120'C of the load lock chambers 120, 120 '. Open, and the outside air is
After being cleaned in 3 ', the load lock chambers 120, 12
It flows into the inside through the openings 120C, 120'C of 0 ', and flows out through the carry-in / out entrances 120A, 120'A. As a result, air around the apparatus does not enter the load lock chambers 120 and 120 ', and the interior is always kept clean. Then, when the load lock chambers 120, 120 'are connected to the processing chamber 2, the ventilation mechanisms 121, 121' are stopped, and the confidentiality in the load lock chambers 120, 120 'is maintained. Subsequent steps are as described above. Also, when receiving the processed LCD substrate 1 from the processing chamber 2 and returning the LCD substrate 1 into the carrier C, the ventilation mechanisms 121 and 121 ′ also work, and the air around the measures is introduced into the load lock chambers 120 and 120 ′. To prevent direct intrusion.

As described above, according to the present embodiment,
A linear drive mechanism 19 for moving the transfer arm 11 forward and backward with respect to the processing chamber 2 or the carrier C facing the transfer arm 11.
Is provided in the load lock chamber 12, so that the transfer arm 11 is extended in the load lock chamber 12 by the moving distance of the transfer arm 11 by the linear drive mechanism 19, that is, the first and second distances.
The lengths L and L1 of the arms 11C and 11D can be shortened, and thus the rigidity of the first and second arms 11C and 11D can be strengthened according to the importance of the LCD substrate 1. Further, in the present embodiment, it is not necessary to lengthen the first and second arms 11C and 11D in accordance with the enlargement of the LCD substrate 1, so that the operation time of the transfer arm 11 can be shortened to increase the throughput. it can.

Further, according to the present embodiment, since the ventilation mechanisms 121, 121 'are provided in the load lock chambers 120, 120', when exchanging the LCD substrate 1 under the atmospheric pressure, the load lock chambers 120, 120 'are provided. In this case, a clean environment is always maintained, and contamination of the LCD substrate 1 by particles can be reliably prevented.

It should be noted that the present invention is not limited to the above-described embodiment at all, and each component can be appropriately designed and changed as needed. For example, in the above-described embodiment, a transfer mechanism applied to a novel processing apparatus which is not configured in the related art and has the load lock chamber 12 movable as a part of the transfer unit 5 has been described. , That is, a processing device in which the load lock chamber is connected as a part of the processing chamber.
In this case, the transfer arm of the transfer mechanism transfers an object to be processed such as an LCD substrate between the load lock chamber of the processing chamber and the carrier.

[0041]

According to the first to ninth aspects of the present invention, it is not necessary to lengthen each arm of the transfer arm in accordance with an increase in the size of an object to be processed such as an LCD substrate. In addition, it is possible to provide a transfer mechanism and a processing device capable of shortening the operation time of the transfer arm.

[0042] Claims 3 to 5 and 7 of the present invention.
According to the present invention, the environment in the load lock chamber can be always kept clean even when the object is transported under the atmospheric pressure, and the object to be processed may be contaminated during the transport process. It is possible to provide a transfer mechanism and a processing apparatus which do not have any.

[Brief description of the drawings]

FIG. 1 is a perspective view showing an embodiment of a processing apparatus of the present invention.

2 is a perspective view showing a mounting mechanism and a transport unit of the processing apparatus shown in FIG.

FIGS. 3A and 3B are views showing a main part of an embodiment of the transport mechanism of the present invention housed in a load lock chamber of the transport unit shown in FIG. 2, wherein FIG. 3A is a perspective view and FIG. FIG.

FIG. 4 is a plan view illustrating a main part of another embodiment of the transport mechanism of the present invention.

FIG. 5 is a perspective view showing a main part of a load lock chamber of another type different from the load lock chamber shown in FIG. 2;

FIG. 6 is a sectional view showing a main part of the load lock chamber shown in FIG.

FIG. 7 is a perspective view showing a main part of a load lock chamber of still another type different from the load lock chamber shown in FIG. 2;

8 is a partially enlarged view showing a state in which the load lock chamber and the processing chamber shown in FIG. 1 are connected, (a) is a perspective view thereof, and (b) is a part of (a). It is sectional drawing.

FIG. 9 is a cross-sectional view showing a gate valve unit and a connection unit of the processing chamber shown in FIG.

FIG. 10 is a perspective view showing the gate valve unit shown in FIG.

FIG. 11 is a perspective view showing a lock mechanism of the connection unit shown in FIG.

FIGS. 12A and 12B are views showing another type of lock mechanism different from the lock mechanism shown in FIGS. 11A and 11B, wherein FIG. 12A is a perspective view showing a state immediately before the processing chamber and the load lock chamber are connected, and FIG. a)
FIG. 4 is a perspective view showing a state where the load lock chamber is connected to the processing chamber by the lock mechanism of FIG.

FIG. 13 is a perspective view showing a floating type load lock chamber.

14 is a cross-sectional view of a main part in a state immediately before connecting the load lock chamber and the processing chamber shown in FIG.

FIGS. 15 (a) to (f) are explanatory views for explaining a transporting step of the processing apparatus shown in FIG. 1;

FIG. 16 is a conceptual diagram illustrating the configuration and operation of the transfer arm shown in FIGS. 3 and 4.

FIG. 17 is a conceptual diagram illustrating the configuration and operation of a transfer arm of a conventional transfer mechanism.

[Explanation of symbols]

 Reference Signs List 1 LCD substrate (substrate to be processed) 2 Processing chamber 4 Mounting unit (mounting mechanism) 5 Transport unit (transport mechanism) 6F Exhaust pipe (exhaust means) 7B Lock mechanism 11 Transport arms 12, 120, 120 'Load lock chamber Reference Signs List 13 drive unit (drive mechanism) 19 straight drive mechanism 19D guide rail 19E drive mechanism 19F motor 19G drive side pulley 19H driven side pulley 19I endless belt 20 straight drive mechanism 20E drive mechanism 20F air cylinder (cylinder mechanism) 121, 121 ventilation mechanism

Claims (9)

[Claims] An articulated transfer arm for transferring an object to be processed, and a drive mechanism for driving the transfer arm to transfer the object to be processed between a processing chamber and a carrier via a load lock chamber. A transport mechanism, comprising: a linear drive mechanism that moves the transport arm forward and backward with respect to the processing chamber or the carrier facing the transport arm. 2. An articulated transfer arm for transferring an object to be processed, and a drive mechanism for driving the transfer arm to transfer the object to be processed between a processing chamber and a carrier via a load lock chamber. In the transfer mechanism, the load lock chamber is provided in the transfer mechanism so as to be connectable to the processing chamber, and the transfer arm is provided in the load lock chamber, and the processing chamber or the carrier facing the transfer arm. A transfer mechanism for moving the transfer arm forward and backward with respect to the load lock chamber. 3. A multi-joint transfer arm for transferring an object to be processed, and a drive mechanism for driving the transfer arm to transfer the object to be processed between a processing chamber and a carrier via a load lock chamber. In the transfer mechanism, a ventilation mechanism for ventilating the internal air with clean air is provided in the load lock chamber, and the load lock chamber is provided in the transfer mechanism so as to be connectable to the processing chamber, and the transfer arm is provided. And a linear drive mechanism for moving the transfer arm forward and backward with respect to the processing chamber or the carrier facing the transfer arm, the transfer mechanism being provided in the load lock chamber. 4. The linear drive mechanism includes a guide rail that guides the transfer arm in a moving direction, an endless belt that reciprocates the transfer arm along the guide rail, and rotationally drives the endless belt. The transport mechanism according to any one of claims 1 to 3, further comprising a rotation drive mechanism. 5. The linear drive mechanism according to claim 1, further comprising a guide rail for guiding the transfer arm in a moving direction, and a cylinder mechanism for reciprocating the transfer arm along the guide rail. Alternatively, the transport mechanism according to claim 2. 6. At least one processing chamber for performing a predetermined processing on an object to be processed under reduced pressure, and disposed between the processing chamber and at least one carrier, and between the processing chamber and the carrier. A transfer mechanism for transferring the object to be processed, and the transfer mechanism includes an articulated transfer arm for transferring the object to be processed, and a load lock chamber between the processing chamber and the carrier by driving the transfer arm. A drive mechanism for exchanging the object to be processed through the processing mechanism, wherein the load lock chamber is provided in the transfer mechanism so as to be connectable to the processing chamber, and the transfer arm is connected to the load lock. A processing unit provided in the chamber and a linear drive mechanism for moving the transfer arm forward and backward with respect to the processing chamber or the carrier facing the transfer arm is provided in the load lock chamber. Place. 7. At least one processing chamber for performing a predetermined processing on an object to be processed under reduced pressure, and disposed between the processing chamber and at least one carrier, and between the processing chamber and the carrier. A transfer mechanism for transferring the object to be processed, and the transfer mechanism includes an articulated transfer arm for transferring the object to be processed, and a load lock chamber between the processing chamber and the carrier by driving the transfer arm. And a drive mechanism for exchanging the object to be processed through the processing device, wherein the load lock chamber is provided with a ventilation mechanism for ventilating the internal air with clean air, and the load lock chamber is provided in the processing chamber. The transfer arm is provided so as to be connectable to the transfer mechanism, and the transfer arm is provided in the load lock chamber, and the transfer arm is advanced to the processing chamber or the carrier facing the transfer arm. A processing device wherein a rectilinear drive mechanism for retreating is provided in the load lock chamber. 8. The linear drive mechanism includes a guide rail that guides the transfer arm in a moving direction, an endless belt that reciprocates the transfer arm along the guide rail, and rotationally drives the endless belt. The transport mechanism according to claim 6, further comprising a rotation drive mechanism. 9. The linear drive mechanism includes a guide rail for guiding the transfer arm in a movement direction, and a cylinder mechanism for reciprocating the transfer arm along the guide rail. The transport mechanism according to claim 8.