JP1764738S - ガス混合器 - Google Patents
ガス混合器Info
- Publication number
- JP1764738S JP1764738S JP2023003708F JP2023003708F JP1764738S JP 1764738 S JP1764738 S JP 1764738S JP 2023003708 F JP2023003708 F JP 2023003708F JP 2023003708 F JP2023003708 F JP 2023003708F JP 1764738 S JP1764738 S JP 1764738S
- Authority
- JP
- Japan
- Prior art keywords
- gas mixer
- designated
- mixing channel
- gas
- article
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000010586 diagram Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Abstract
この物品は、ガス体積空間と連通する混合チャネル内部に配置されるガス混合器である。使用状態参考図において、ガス混合器は符号１５０で示され、混合チャネルは符号１２０で示される。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/897,452 US20240068095A1 (en) | 2022-08-29 | 2022-08-29 | Gas distribution apparatuses for improving mixing uniformity |
| US202229857731 | 2022-10-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP1764738S true JP1764738S (ja) | 2024-03-04 |
Family
ID=90098559
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023003708F Active JP1764738S (ja) | 2022-08-29 | 2023-02-27 | ガス混合器 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP1764738S (ja) |
| WO (1) | WO2024049751A1 (ja) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6451692B1 (en) * | 2000-08-18 | 2002-09-17 | Micron Technology, Inc. | Preheating of chemical vapor deposition precursors |
| US20090120364A1 (en) * | 2007-11-09 | 2009-05-14 | Applied Materials, Inc. | Gas mixing swirl insert assembly |
| KR20160147482A (ko) * | 2015-06-15 | 2016-12-23 | 삼성전자주식회사 | 가스 혼합부를 갖는 반도체 소자 제조 설비 |
| KR102071501B1 (ko) * | 2015-07-07 | 2020-01-30 | 주식회사 원익아이피에스 | 기판 처리 장치 |
| US11549183B2 (en) * | 2019-05-24 | 2023-01-10 | Applied Materials, Inc. | Showerhead with inlet mixer |
-
2023
- 2023-02-27 JP JP2023003708F patent/JP1764738S/ja active Active
- 2023-08-28 WO PCT/US2023/031265 patent/WO2024049751A1/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024049751A1 (en) | 2024-03-07 |
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