ITUB20152900A1 - Coated insert for food extruder - Google Patents

Coated insert for food extruder

Info

Publication number
ITUB20152900A1
ITUB20152900A1 ITUB2015A002900A ITUB20152900A ITUB20152900A1 IT UB20152900 A1 ITUB20152900 A1 IT UB20152900A1 IT UB2015A002900 A ITUB2015A002900 A IT UB2015A002900A IT UB20152900 A ITUB20152900 A IT UB20152900A IT UB20152900 A1 ITUB20152900 A1 IT UB20152900A1
Authority
IT
Italy
Prior art keywords
coated insert
food extruder
extruder
food
insert
Prior art date
Application number
ITUB2015A002900A
Other languages
Italian (it)
Inventor
Giancarlo Addario
Italo Bardiani
Manuel Mariani
Mariangiola Brisotto
Laura Borgese
Original Assignee
Barilla Flli G & R
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Barilla Flli G & R filed Critical Barilla Flli G & R
Priority to ITUB2015A002900A priority Critical patent/ITUB20152900A1/en
Priority to PCT/EP2016/068425 priority patent/WO2017021407A1/en
Publication of ITUB20152900A1 publication Critical patent/ITUB20152900A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
    • A—HUMAN NECESSITIES
    • A21—BAKING; EDIBLE DOUGHS
    • A21C—MACHINES OR EQUIPMENT FOR MAKING OR PROCESSING DOUGHS; HANDLING BAKED ARTICLES MADE FROM DOUGH
    • A21C11/00—Other machines for forming the dough into its final shape before cooking or baking
    • A21C11/16—Extruding machines
    • A—HUMAN NECESSITIES
    • A21—BAKING; EDIBLE DOUGHS
    • A21C—MACHINES OR EQUIPMENT FOR MAKING OR PROCESSING DOUGHS; HANDLING BAKED ARTICLES MADE FROM DOUGH
    • A21C3/00—Machines or apparatus for shaping batches of dough before subdivision
    • A21C3/04—Dough-extruding machines ; Hoppers with moving elements, e.g. rollers or belts as wall elements for drawing the dough
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1655—Process features
    • C23C18/1662—Use of incorporated material in the solution or dispersion, e.g. particles, whiskers, wires
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
ITUB2015A002900A 2015-08-05 2015-08-05 Coated insert for food extruder ITUB20152900A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
ITUB2015A002900A ITUB20152900A1 (en) 2015-08-05 2015-08-05 Coated insert for food extruder
PCT/EP2016/068425 WO2017021407A1 (en) 2015-08-05 2016-08-02 Coated insert for food extruder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITUB2015A002900A ITUB20152900A1 (en) 2015-08-05 2015-08-05 Coated insert for food extruder

Publications (1)

Publication Number Publication Date
ITUB20152900A1 true ITUB20152900A1 (en) 2017-02-05

Family

ID=54884137

Family Applications (1)

Application Number Title Priority Date Filing Date
ITUB2015A002900A ITUB20152900A1 (en) 2015-08-05 2015-08-05 Coated insert for food extruder

Country Status (2)

Country Link
IT (1) ITUB20152900A1 (en)
WO (1) WO2017021407A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117651637A (en) 2021-08-09 2024-03-05 埃克森美孚化学专利公司 Polymer extrusion apparatus and method using polycrystalline diamond elements

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3851084A (en) * 1972-07-05 1974-11-26 Nabisco Inc Method of producing laminated comestible products
US20070178198A1 (en) * 2006-01-30 2007-08-02 Lichtenstein David M Making pastry shells
US20080089970A1 (en) * 2002-12-30 2008-04-17 Hunter Thomas B Cutter assembly for extruding shaped food pieces
US20130078328A1 (en) * 2011-09-27 2013-03-28 Kennametal, Inc. Coated Pelletizing Dies

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1011884B1 (en) 1997-09-10 2002-11-20 WEFA Singen GmbH Extrusion die and its production
US20060216548A1 (en) * 2005-03-22 2006-09-28 Ming Mao Nanolaminate thin films and method for forming the same using atomic layer deposition
DE102007027668A1 (en) 2007-06-15 2008-12-18 Robert Bosch Gmbh Extrusion mouthpiece for the production of ceramic honeycomb bodies
JP5496205B2 (en) 2008-08-28 2014-05-21 コーニング インコーポレイテッド Abrasion resistant coating for tool dies
KR20120135214A (en) 2010-02-12 2012-12-12 노르스크 히드로 아에스아 Modular extrusion die

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3851084A (en) * 1972-07-05 1974-11-26 Nabisco Inc Method of producing laminated comestible products
US20080089970A1 (en) * 2002-12-30 2008-04-17 Hunter Thomas B Cutter assembly for extruding shaped food pieces
US20070178198A1 (en) * 2006-01-30 2007-08-02 Lichtenstein David M Making pastry shells
US20130078328A1 (en) * 2011-09-27 2013-03-28 Kennametal, Inc. Coated Pelletizing Dies

Also Published As

Publication number Publication date
WO2017021407A1 (en) 2017-02-09

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