IT985372B - CONCENTRATED COMPOSITION FOR THE PRODUCTION OF NICKELING SOLUTIONS WITHOUT ELECTRIC CURRENT NICKELING SOLUTION AND RELATED PROCEDURE FOR USE - Google Patents

CONCENTRATED COMPOSITION FOR THE PRODUCTION OF NICKELING SOLUTIONS WITHOUT ELECTRIC CURRENT NICKELING SOLUTION AND RELATED PROCEDURE FOR USE

Info

Publication number
IT985372B
IT985372B IT5059473A IT5059473A IT985372B IT 985372 B IT985372 B IT 985372B IT 5059473 A IT5059473 A IT 5059473A IT 5059473 A IT5059473 A IT 5059473A IT 985372 B IT985372 B IT 985372B
Authority
IT
Italy
Prior art keywords
nickeling
solutions
production
solution
electric current
Prior art date
Application number
IT5059473A
Other languages
Italian (it)
Original Assignee
Imasa Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imasa Sa filed Critical Imasa Sa
Application granted granted Critical
Publication of IT985372B publication Critical patent/IT985372B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
IT5059473A 1972-06-09 1973-06-08 CONCENTRATED COMPOSITION FOR THE PRODUCTION OF NICKELING SOLUTIONS WITHOUT ELECTRIC CURRENT NICKELING SOLUTION AND RELATED PROCEDURE FOR USE IT985372B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26117672A 1972-06-09 1972-06-09

Publications (1)

Publication Number Publication Date
IT985372B true IT985372B (en) 1974-11-30

Family

ID=22992213

Family Applications (1)

Application Number Title Priority Date Filing Date
IT5059473A IT985372B (en) 1972-06-09 1973-06-08 CONCENTRATED COMPOSITION FOR THE PRODUCTION OF NICKELING SOLUTIONS WITHOUT ELECTRIC CURRENT NICKELING SOLUTION AND RELATED PROCEDURE FOR USE

Country Status (4)

Country Link
JP (1) JPS4962331A (en)
DE (1) DE2329429A1 (en)
FR (1) FR2187940A1 (en)
IT (1) IT985372B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03104875A (en) * 1989-09-19 1991-05-01 Ebara Yuujiraito Kk Method for plating molybdenum
FR2703366B1 (en) * 1993-04-01 1999-01-22 Electro Rech CHEMICAL PRE-TREATMENT PROCESS BEFORE GALVANIZATION OF STEEL SHEETS DISTINGUISHED BY A PARTICULAR SILICON AND PHOSPHORUS CONTENT.
FR2754831B1 (en) * 1996-10-21 1998-11-20 Sgs Thomson Microelectronics SELF-CATALYTIC BATH AND METHOD OF DEPOSITING A NICKEL-PHOSPHORUS ALLOY ON A SUBSTRATE
DE10246453A1 (en) * 2002-10-04 2004-04-15 Enthone Inc., West Haven Electrolyte used in process for high speed electroless plating with nickel film having residual compressive stress is based on nickel acetate and also contains reducing agent, chelant, accelerator and stabilizer
DE102012016463A1 (en) 2012-08-18 2014-02-20 Clariant International Ltd. Process for the preparation of carboxymethyloxysuccinic acid and its salts starting from glyoxal

Also Published As

Publication number Publication date
DE2329429A1 (en) 1973-12-20
JPS4962331A (en) 1974-06-17
FR2187940B3 (en) 1976-05-28
FR2187940A1 (en) 1974-01-18

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