IT978048B - Composizione contenente un polie ne ed un politiolo - Google Patents

Composizione contenente un polie ne ed un politiolo

Info

Publication number
IT978048B
IT978048B IT19079/73A IT1907973A IT978048B IT 978048 B IT978048 B IT 978048B IT 19079/73 A IT19079/73 A IT 19079/73A IT 1907973 A IT1907973 A IT 1907973A IT 978048 B IT978048 B IT 978048B
Authority
IT
Italy
Prior art keywords
politiol
polie
composition containing
composition
Prior art date
Application number
IT19079/73A
Other languages
English (en)
Italian (it)
Original Assignee
Grace W R & Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Grace W R & Co filed Critical Grace W R & Co
Application granted granted Critical
Publication of IT978048B publication Critical patent/IT978048B/it

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/224—Anti-weld compositions; Braze stop-off compositions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02—Polythioethers
    • C08G75/04—Polythioethers from mercapto compounds or metallic derivatives thereof
    • C08G75/045—Polythioethers from mercapto compounds or metallic derivatives thereof from mercapto compounds and unsaturated compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/12—Polythioether-ethers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
IT19079/73A 1972-01-10 1973-01-08 Composizione contenente un polie ne ed un politiolo IT978048B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US21682472A 1972-01-10 1972-01-10

Publications (1)

Publication Number Publication Date
IT978048B true IT978048B (it) 1974-09-20

Family

ID=22808656

Family Applications (1)

Application Number Title Priority Date Filing Date
IT19079/73A IT978048B (it) 1972-01-10 1973-01-08 Composizione contenente un polie ne ed un politiolo

Country Status (6)

Country Link
US (1) US3753720A (US06653308-20031125-C00199.png)
BE (1) BE793732A (US06653308-20031125-C00199.png)
DE (1) DE2300653A1 (US06653308-20031125-C00199.png)
FR (1) FR2167820B1 (US06653308-20031125-C00199.png)
GB (1) GB1354429A (US06653308-20031125-C00199.png)
IT (1) IT978048B (US06653308-20031125-C00199.png)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL177718C (nl) * 1973-02-22 1985-11-01 Siemens Ag Werkwijze ter vervaardiging van reliefstructuren uit warmte-bestendige polymeren.
US3847767A (en) * 1973-03-13 1974-11-12 Grace W R & Co Method of producing a screen printable photocurable solder resist
US3883352A (en) * 1973-04-05 1975-05-13 Grace W R & Co Process for forming a photocured solder resist
US4146916A (en) * 1974-03-26 1979-03-27 P. R. Mallory & Co. Inc. Radiation cured material disposed over an electrical device body to help maintain the configuration of the body and method
US3953214A (en) * 1974-05-24 1976-04-27 Dynachem Corporation Photopolymerizable screen printing inks and use thereof
US4039905A (en) * 1974-07-01 1977-08-02 P. R. Mallory & Co., Inc. Electrical device of the electrolytic type having means for confining mobile electrolyte and method of making same
USRE30186E (en) * 1974-08-02 1980-01-08 Siemens Aktiengesellschaft Method for the preparation of relief structures
DE2437348B2 (de) * 1974-08-02 1976-10-07 Ausscheidung in: 24 62 105 Verfahren zur herstellung von reliefstrukturen
AT341792B (de) * 1974-08-02 1978-02-27 Siemens Ag Verfahren zur herstellung von schichtstrukturen
AT352406B (de) * 1974-08-02 1979-09-25 Siemens Ag Verfahren zur herstellung von reliefstrukturen
US4644380A (en) * 1977-12-08 1987-02-17 University Of Pennsylvania Substance-sensitive electrical structures
US4270985A (en) * 1978-07-21 1981-06-02 Dynachem Corporation Screen printing of photopolymerizable inks
GB2030584B (en) * 1978-10-03 1983-03-23 Lankro Chem Ltd Photopolymerisable solder resist compositions
US4197173A (en) * 1978-10-19 1980-04-08 General Electric Company Photocurable polyene-polythiol-siloxane-polyester composition for coating
ZA8244B (en) * 1981-01-16 1982-11-24 Grace W R & Co Method and apparatus for making printed circuit boards
US4396140A (en) * 1981-01-27 1983-08-02 Bell Telephone Laboratories, Incorporated Method of bonding electronic components
DE3171729D1 (en) * 1981-02-23 1985-09-12 Matsushita Electric Ind Co Ltd Soldering apparatus
US4483759A (en) * 1982-07-02 1984-11-20 Thermedics, Inc. Actinic radiation cured polyurethane acrylic copolymer
US4836782A (en) * 1983-05-06 1989-06-06 Dentsply Research & Development Corp. Method for providing direct cool beam incident light on dental target
EP0207188B1 (en) * 1985-06-29 1996-06-19 Dainippon Ink And Chemicals, Inc. Resin composition for solder resist ink
JPS62290705A (ja) * 1986-06-10 1987-12-17 Mitsubishi Chem Ind Ltd 光重合性組成物
EP0409169A3 (en) * 1989-07-20 1992-03-25 Ciba-Geigy Ag Exposing method
JP2000502463A (ja) 1995-12-21 2000-02-29 ザ ダウ ケミカル カンパニー はんだマスク組成物
KR100267229B1 (ko) * 1997-09-03 2000-10-16 윤종용 인쇄회로기판의금도금단자부오염방지방법
US10080287B2 (en) * 2012-09-27 2018-09-18 Dell Products L.P. Blind via printed circuit board fabrication supporting press fit connectors

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3537853A (en) * 1968-02-21 1970-11-03 Grace W R & Co Process of forming printing plates,including the step of subjecting the mounted transparency to a surface static electricity eliminator
US3619393A (en) * 1969-12-04 1971-11-09 Grace W R & Co Process for the preparation of shelf-stable, photocurable polythiols
US3708413A (en) * 1970-06-23 1973-01-02 Grace W R & Co High energy curable liquid polyene-polythiol polymer composition
US3701721A (en) * 1971-12-06 1972-10-31 Grace W R & Co Curable liquid polyene-polythiol compositions containing polyacrylic acid and derivatives thereof

Also Published As

Publication number Publication date
GB1354429A (en) 1974-06-05
FR2167820B1 (US06653308-20031125-C00199.png) 1977-09-02
US3753720A (en) 1973-08-21
FR2167820A1 (US06653308-20031125-C00199.png) 1973-08-24
BE793732A (fr) 1973-05-02
DE2300653A1 (de) 1973-07-19

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