IT940949B - PROCEDURE AND APPARATUS FOR THE CONTROL OF THE VAPOR DENSITY IN PLANTS FOR THE DEPOSITION OF MATERIALS FROM THE STEAM PHASE - Google Patents

PROCEDURE AND APPARATUS FOR THE CONTROL OF THE VAPOR DENSITY IN PLANTS FOR THE DEPOSITION OF MATERIALS FROM THE STEAM PHASE

Info

Publication number
IT940949B
IT940949B IT5311471A IT5311471A IT940949B IT 940949 B IT940949 B IT 940949B IT 5311471 A IT5311471 A IT 5311471A IT 5311471 A IT5311471 A IT 5311471A IT 940949 B IT940949 B IT 940949B
Authority
IT
Italy
Prior art keywords
plants
deposition
procedure
materials
control
Prior art date
Application number
IT5311471A
Other languages
Italian (it)
Original Assignee
Air Reduction
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Reduction filed Critical Air Reduction
Application granted granted Critical
Publication of IT940949B publication Critical patent/IT940949B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L21/00—Vacuum gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/3103—Atomic absorption analysis

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Immunology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
IT5311471A 1970-10-12 1971-09-27 PROCEDURE AND APPARATUS FOR THE CONTROL OF THE VAPOR DENSITY IN PLANTS FOR THE DEPOSITION OF MATERIALS FROM THE STEAM PHASE IT940949B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US8006370A 1970-10-12 1970-10-12

Publications (1)

Publication Number Publication Date
IT940949B true IT940949B (en) 1973-02-20

Family

ID=22155025

Family Applications (1)

Application Number Title Priority Date Filing Date
IT5311471A IT940949B (en) 1970-10-12 1971-09-27 PROCEDURE AND APPARATUS FOR THE CONTROL OF THE VAPOR DENSITY IN PLANTS FOR THE DEPOSITION OF MATERIALS FROM THE STEAM PHASE

Country Status (5)

Country Link
CA (1) CA974377A (en)
DE (1) DE2149234A1 (en)
FR (1) FR2109887A5 (en)
GB (1) GB1333993A (en)
IT (1) IT940949B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4845041A (en) * 1985-11-20 1989-07-04 Analyte Corporation Atomic-absorption sputtering chamber and system
US7130062B2 (en) 2005-01-28 2006-10-31 Raytheon Company Rapid-response electron-beam deposition system having a controller utilizing leading and trailing deposition indicators

Also Published As

Publication number Publication date
CA974377A (en) 1975-09-16
GB1333993A (en) 1973-10-17
DE2149234A1 (en) 1972-04-13
FR2109887A5 (en) 1972-05-26

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