IT201900021501A1 - Treatment assembly with loading / unloading unit and epitaxial reactor - Google Patents

Treatment assembly with loading / unloading unit and epitaxial reactor

Info

Publication number
IT201900021501A1
IT201900021501A1 IT102019000021501A IT201900021501A IT201900021501A1 IT 201900021501 A1 IT201900021501 A1 IT 201900021501A1 IT 102019000021501 A IT102019000021501 A IT 102019000021501A IT 201900021501 A IT201900021501 A IT 201900021501A IT 201900021501 A1 IT201900021501 A1 IT 201900021501A1
Authority
IT
Italy
Prior art keywords
loading
unloading unit
treatment assembly
epitaxial reactor
epitaxial
Prior art date
Application number
IT102019000021501A
Other languages
Italian (it)
Inventor
Francesco Corea
Silvio Preti
Original Assignee
Lpe Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lpe Spa filed Critical Lpe Spa
Priority to IT102019000021501A priority Critical patent/IT201900021501A1/en
Priority to CN202080068619.XA priority patent/CN114502780A/en
Priority to EP20796926.2A priority patent/EP4022240A1/en
Priority to PCT/IB2020/059237 priority patent/WO2021064653A1/en
Priority to JP2022520798A priority patent/JP2022550900A/en
Priority to CN202080068618.5A priority patent/CN114450439A/en
Priority to EP20796649.0A priority patent/EP4022238A1/en
Priority to PCT/IB2020/059234 priority patent/WO2021064650A1/en
Priority to US17/763,915 priority patent/US20220341058A1/en
Priority to US17/763,890 priority patent/US20220333271A1/en
Priority to CN202080068626.XA priority patent/CN114450781A/en
Priority to JP2022520808A priority patent/JP2022550902A/en
Priority to US17/763,933 priority patent/US20220333272A1/en
Priority to EP20796650.8A priority patent/EP4022239A1/en
Priority to JP2022520795A priority patent/JP2022550898A/en
Priority to PCT/IB2020/059235 priority patent/WO2021064651A1/en
Publication of IT201900021501A1 publication Critical patent/IT201900021501A1/en

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any preceding group
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D3/00—Charging; Discharging; Manipulation of charge
    • F27D3/12—Travelling or movable supports or containers for the charge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
IT102019000021501A 2019-10-03 2019-11-19 Treatment assembly with loading / unloading unit and epitaxial reactor IT201900021501A1 (en)

Priority Applications (16)

Application Number Priority Date Filing Date Title
IT102019000021501A IT201900021501A1 (en) 2019-11-19 2019-11-19 Treatment assembly with loading / unloading unit and epitaxial reactor
CN202080068619.XA CN114502780A (en) 2019-10-03 2020-10-02 Processing apparatus with transfer chamber and epitaxial reactor
EP20796926.2A EP4022240A1 (en) 2019-10-03 2020-10-02 Treating arrangement with storage chamber and epitaxial reactor
PCT/IB2020/059237 WO2021064653A1 (en) 2019-10-03 2020-10-02 Treating arrangement with storage chamber and epitaxial reactor
JP2022520798A JP2022550900A (en) 2019-10-03 2020-10-02 Processing apparatus with loading or unloading group and epitaxial reactor
CN202080068618.5A CN114450439A (en) 2019-10-03 2020-10-02 Processing device and epitaxial reactor with storage chamber
EP20796649.0A EP4022238A1 (en) 2019-10-03 2020-10-02 Treating arrangement with transfer chamber and epitaxial reactor
PCT/IB2020/059234 WO2021064650A1 (en) 2019-10-03 2020-10-02 Treating arrangement with transfer chamber and epitaxial reactor
US17/763,915 US20220341058A1 (en) 2019-10-03 2020-10-02 Treating arrangement with loading/unloading group and epitaxial reactor
US17/763,890 US20220333271A1 (en) 2019-10-03 2020-10-02 Treating arrangement with transfer chamber and epitaxial reactor
CN202080068626.XA CN114450781A (en) 2019-10-03 2020-10-02 Processing apparatus with loading/unloading group and epitaxial reactor
JP2022520808A JP2022550902A (en) 2019-10-03 2020-10-02 Processing apparatus with storage chamber and epitaxial reactor
US17/763,933 US20220333272A1 (en) 2019-10-03 2020-10-02 Treating arrangement with storage chamber and epitaxial reactor
EP20796650.8A EP4022239A1 (en) 2019-10-03 2020-10-02 Treating arrangement with loading/unloading group and epitaxial reactor
JP2022520795A JP2022550898A (en) 2019-10-03 2020-10-02 Processing apparatus with transport chamber and epitaxial reactor
PCT/IB2020/059235 WO2021064651A1 (en) 2019-10-03 2020-10-02 Treating arrangement with loading/unloading group and epitaxial reactor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT102019000021501A IT201900021501A1 (en) 2019-11-19 2019-11-19 Treatment assembly with loading / unloading unit and epitaxial reactor

Publications (1)

Publication Number Publication Date
IT201900021501A1 true IT201900021501A1 (en) 2021-05-19

Family

ID=69903957

Family Applications (1)

Application Number Title Priority Date Filing Date
IT102019000021501A IT201900021501A1 (en) 2019-10-03 2019-11-19 Treatment assembly with loading / unloading unit and epitaxial reactor

Country Status (1)

Country Link
IT (1) IT201900021501A1 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110163065A1 (en) * 2010-01-05 2011-07-07 Applied Materials, Inc. System for batch processing of magnetic media
US20110232569A1 (en) * 2010-03-25 2011-09-29 Applied Materials, Inc. Segmented substrate loading for multiple substrate processing
US20130221595A1 (en) * 2012-02-28 2013-08-29 Applied Materials, Inc. Substrate carrier plate
US20150059978A1 (en) * 2012-03-28 2015-03-05 Kookje Electric Korea Co., Ltd. Cluster apparatus for treating substrate
US20170040204A1 (en) * 2015-08-07 2017-02-09 Asm Ip Holdings B.V. Substrate processing apparatus

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110163065A1 (en) * 2010-01-05 2011-07-07 Applied Materials, Inc. System for batch processing of magnetic media
US20110232569A1 (en) * 2010-03-25 2011-09-29 Applied Materials, Inc. Segmented substrate loading for multiple substrate processing
US20130221595A1 (en) * 2012-02-28 2013-08-29 Applied Materials, Inc. Substrate carrier plate
US20150059978A1 (en) * 2012-03-28 2015-03-05 Kookje Electric Korea Co., Ltd. Cluster apparatus for treating substrate
US20170040204A1 (en) * 2015-08-07 2017-02-09 Asm Ip Holdings B.V. Substrate processing apparatus

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