IT201900021501A1 - Treatment assembly with loading / unloading unit and epitaxial reactor - Google Patents
Treatment assembly with loading / unloading unit and epitaxial reactorInfo
- Publication number
- IT201900021501A1 IT201900021501A1 IT102019000021501A IT201900021501A IT201900021501A1 IT 201900021501 A1 IT201900021501 A1 IT 201900021501A1 IT 102019000021501 A IT102019000021501 A IT 102019000021501A IT 201900021501 A IT201900021501 A IT 201900021501A IT 201900021501 A1 IT201900021501 A1 IT 201900021501A1
- Authority
- IT
- Italy
- Prior art keywords
- loading
- unloading unit
- treatment assembly
- epitaxial reactor
- epitaxial
- Prior art date
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D3/00—Charging; Discharging; Manipulation of charge
- F27D3/12—Travelling or movable supports or containers for the charge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
Priority Applications (16)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT102019000021501A IT201900021501A1 (en) | 2019-11-19 | 2019-11-19 | Treatment assembly with loading / unloading unit and epitaxial reactor |
CN202080068619.XA CN114502780A (en) | 2019-10-03 | 2020-10-02 | Processing apparatus with transfer chamber and epitaxial reactor |
EP20796926.2A EP4022240A1 (en) | 2019-10-03 | 2020-10-02 | Treating arrangement with storage chamber and epitaxial reactor |
PCT/IB2020/059237 WO2021064653A1 (en) | 2019-10-03 | 2020-10-02 | Treating arrangement with storage chamber and epitaxial reactor |
JP2022520798A JP2022550900A (en) | 2019-10-03 | 2020-10-02 | Processing apparatus with loading or unloading group and epitaxial reactor |
CN202080068618.5A CN114450439A (en) | 2019-10-03 | 2020-10-02 | Processing device and epitaxial reactor with storage chamber |
EP20796649.0A EP4022238A1 (en) | 2019-10-03 | 2020-10-02 | Treating arrangement with transfer chamber and epitaxial reactor |
PCT/IB2020/059234 WO2021064650A1 (en) | 2019-10-03 | 2020-10-02 | Treating arrangement with transfer chamber and epitaxial reactor |
US17/763,915 US20220341058A1 (en) | 2019-10-03 | 2020-10-02 | Treating arrangement with loading/unloading group and epitaxial reactor |
US17/763,890 US20220333271A1 (en) | 2019-10-03 | 2020-10-02 | Treating arrangement with transfer chamber and epitaxial reactor |
CN202080068626.XA CN114450781A (en) | 2019-10-03 | 2020-10-02 | Processing apparatus with loading/unloading group and epitaxial reactor |
JP2022520808A JP2022550902A (en) | 2019-10-03 | 2020-10-02 | Processing apparatus with storage chamber and epitaxial reactor |
US17/763,933 US20220333272A1 (en) | 2019-10-03 | 2020-10-02 | Treating arrangement with storage chamber and epitaxial reactor |
EP20796650.8A EP4022239A1 (en) | 2019-10-03 | 2020-10-02 | Treating arrangement with loading/unloading group and epitaxial reactor |
JP2022520795A JP2022550898A (en) | 2019-10-03 | 2020-10-02 | Processing apparatus with transport chamber and epitaxial reactor |
PCT/IB2020/059235 WO2021064651A1 (en) | 2019-10-03 | 2020-10-02 | Treating arrangement with loading/unloading group and epitaxial reactor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT102019000021501A IT201900021501A1 (en) | 2019-11-19 | 2019-11-19 | Treatment assembly with loading / unloading unit and epitaxial reactor |
Publications (1)
Publication Number | Publication Date |
---|---|
IT201900021501A1 true IT201900021501A1 (en) | 2021-05-19 |
Family
ID=69903957
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT102019000021501A IT201900021501A1 (en) | 2019-10-03 | 2019-11-19 | Treatment assembly with loading / unloading unit and epitaxial reactor |
Country Status (1)
Country | Link |
---|---|
IT (1) | IT201900021501A1 (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110163065A1 (en) * | 2010-01-05 | 2011-07-07 | Applied Materials, Inc. | System for batch processing of magnetic media |
US20110232569A1 (en) * | 2010-03-25 | 2011-09-29 | Applied Materials, Inc. | Segmented substrate loading for multiple substrate processing |
US20130221595A1 (en) * | 2012-02-28 | 2013-08-29 | Applied Materials, Inc. | Substrate carrier plate |
US20150059978A1 (en) * | 2012-03-28 | 2015-03-05 | Kookje Electric Korea Co., Ltd. | Cluster apparatus for treating substrate |
US20170040204A1 (en) * | 2015-08-07 | 2017-02-09 | Asm Ip Holdings B.V. | Substrate processing apparatus |
-
2019
- 2019-11-19 IT IT102019000021501A patent/IT201900021501A1/en unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110163065A1 (en) * | 2010-01-05 | 2011-07-07 | Applied Materials, Inc. | System for batch processing of magnetic media |
US20110232569A1 (en) * | 2010-03-25 | 2011-09-29 | Applied Materials, Inc. | Segmented substrate loading for multiple substrate processing |
US20130221595A1 (en) * | 2012-02-28 | 2013-08-29 | Applied Materials, Inc. | Substrate carrier plate |
US20150059978A1 (en) * | 2012-03-28 | 2015-03-05 | Kookje Electric Korea Co., Ltd. | Cluster apparatus for treating substrate |
US20170040204A1 (en) * | 2015-08-07 | 2017-02-09 | Asm Ip Holdings B.V. | Substrate processing apparatus |
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