IT1255551B - Light-sensitive positive or negative acting layer - contg. substd. diazo resin, polymeric resin and hindered phenol or polyphenol - Google Patents
Light-sensitive positive or negative acting layer - contg. substd. diazo resin, polymeric resin and hindered phenol or polyphenolInfo
- Publication number
- IT1255551B IT1255551B ITMI922441A IT1255551B IT 1255551 B IT1255551 B IT 1255551B IT MI922441 A ITMI922441 A IT MI922441A IT 1255551 B IT1255551 B IT 1255551B
- Authority
- IT
- Italy
- Prior art keywords
- light
- resin
- substd
- polyphenol
- contg
- Prior art date
Links
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 title abstract 2
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 title abstract 2
- 239000002952 polymeric resin Substances 0.000 title abstract 2
- 150000008442 polyphenolic compounds Chemical class 0.000 title abstract 2
- 235000013824 polyphenols Nutrition 0.000 title abstract 2
- 229920005989 resin Polymers 0.000 title abstract 2
- 239000011347 resin Substances 0.000 title abstract 2
- 229920003002 synthetic resin Polymers 0.000 title abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 238000001816 cooling Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Light-sensitive positive-acting layer comprises 4- and/or 5-substd. diazo resin, polymeric resin and hindered phenol or polyphenol having a mol.wt. higher than 108. Processed for obtaining negative and positive images are also claimed. Pref. (a) Negative image: process comprises imagewise exposing through an original, material contg. a light-sensitive layer as claimed, heating it to render the exposed portion alkali-insol., cooling it, totally exposing it to light and developing it with an alkaline developer; (b) Positive image: process comprises imagewise exposing, through an original, a material contg. a light-sensitive layer as claimed and developing it with an alkaline developer.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT002441 IT1255551B (en) | 1992-10-26 | 1992-10-26 | Light-sensitive positive or negative acting layer - contg. substd. diazo resin, polymeric resin and hindered phenol or polyphenol |
EP92121970A EP0550893A1 (en) | 1992-01-10 | 1992-12-24 | Light sensitive layer for positive-negative copying material |
JP5001670A JPH05273751A (en) | 1992-01-10 | 1993-01-08 | Positive-negative photosensitive layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT002441 IT1255551B (en) | 1992-10-26 | 1992-10-26 | Light-sensitive positive or negative acting layer - contg. substd. diazo resin, polymeric resin and hindered phenol or polyphenol |
Publications (3)
Publication Number | Publication Date |
---|---|
ITMI922441A0 ITMI922441A0 (en) | 1992-10-26 |
ITMI922441A1 ITMI922441A1 (en) | 1994-04-26 |
IT1255551B true IT1255551B (en) | 1995-11-09 |
Family
ID=11364166
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT002441 IT1255551B (en) | 1992-01-10 | 1992-10-26 | Light-sensitive positive or negative acting layer - contg. substd. diazo resin, polymeric resin and hindered phenol or polyphenol |
Country Status (1)
Country | Link |
---|---|
IT (1) | IT1255551B (en) |
-
1992
- 1992-10-26 IT IT002441 patent/IT1255551B/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
ITMI922441A0 (en) | 1992-10-26 |
ITMI922441A1 (en) | 1994-04-26 |
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