IT1115989B - Procedimento e composizione per il trattamento di superfici per la eliminazione di scariche a scintilla dovute a cariche negative triboelettriche - Google Patents

Procedimento e composizione per il trattamento di superfici per la eliminazione di scariche a scintilla dovute a cariche negative triboelettriche

Info

Publication number
IT1115989B
IT1115989B IT49038/79A IT4903879A IT1115989B IT 1115989 B IT1115989 B IT 1115989B IT 49038/79 A IT49038/79 A IT 49038/79A IT 4903879 A IT4903879 A IT 4903879A IT 1115989 B IT1115989 B IT 1115989B
Authority
IT
Italy
Prior art keywords
elimination
treatment
composition
negative charges
spark discharges
Prior art date
Application number
IT49038/79A
Other languages
English (en)
Other versions
IT7949038A0 (it
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Publication of IT7949038A0 publication Critical patent/IT7949038A0/it
Application granted granted Critical
Publication of IT1115989B publication Critical patent/IT1115989B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C53/00—Saturated compounds having only one carboxyl group bound to an acyclic carbon atom or hydrogen
    • C07C53/15—Saturated compounds having only one carboxyl group bound to an acyclic carbon atom or hydrogen containing halogen
    • C07C53/19—Acids containing three or more carbon atoms
    • C07C53/21—Acids containing three or more carbon atoms containing fluorine
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S260/00—Chemistry of carbon compounds
    • Y10S260/15—Antistatic agents not otherwise provided for
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/913—Material designed to be responsive to temperature, light, moisture
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31786—Of polyester [e.g., alkyd, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Elimination Of Static Electricity (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Laminated Bodies (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
IT49038/79A 1978-05-15 1979-05-14 Procedimento e composizione per il trattamento di superfici per la eliminazione di scariche a scintilla dovute a cariche negative triboelettriche IT1115989B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1955478 1978-05-15

Publications (2)

Publication Number Publication Date
IT7949038A0 IT7949038A0 (it) 1979-05-14
IT1115989B true IT1115989B (it) 1986-02-10

Family

ID=10131319

Family Applications (2)

Application Number Title Priority Date Filing Date
IT49039/79A IT1116858B (it) 1978-05-15 1979-05-14 Procedimento per la preparazione di derivati isopropilenici e prodotto ottenuto
IT49038/79A IT1115989B (it) 1978-05-15 1979-05-14 Procedimento e composizione per il trattamento di superfici per la eliminazione di scariche a scintilla dovute a cariche negative triboelettriche

Family Applications Before (1)

Application Number Title Priority Date Filing Date
IT49039/79A IT1116858B (it) 1978-05-15 1979-05-14 Procedimento per la preparazione di derivati isopropilenici e prodotto ottenuto

Country Status (7)

Country Link
US (2) US4328280A (it)
JP (2) JPS559681A (it)
BE (2) BE876237A (it)
CA (2) CA1142399A (it)
DE (2) DE2919351A1 (it)
FR (2) FR2426383A1 (it)
IT (2) IT1116858B (it)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59111607A (ja) * 1982-12-17 1984-06-27 Mitsubishi Rayon Co Ltd 繊維シ−ト製造用ドラム
US4834921A (en) * 1987-12-17 1989-05-30 Eastman Kodak Company Quaternary ammonium salts
DE69220313T2 (de) * 1991-09-27 1998-01-08 Bridgestone Corp Kontaktaufladegerät und Verfahren
US6855202B2 (en) * 2001-11-30 2005-02-15 The Regents Of The University Of California Shaped nanocrystal particles and methods for making the same
US6372829B1 (en) 1999-10-06 2002-04-16 3M Innovative Properties Company Antistatic composition
US20030054172A1 (en) 2001-05-10 2003-03-20 3M Innovative Properties Company Polyoxyalkylene ammonium salts and their use as antistatic agents
ATE354815T1 (de) * 2001-10-24 2007-03-15 Univ California Halbleiter-flüssigkristallzusammensetzung und verfahren zu ihrer herstellung
US6924329B2 (en) 2001-11-05 2005-08-02 3M Innovative Properties Company Water- and oil-repellent, antistatic compositions
US6740413B2 (en) 2001-11-05 2004-05-25 3M Innovative Properties Company Antistatic compositions
US20040174171A1 (en) * 2003-02-05 2004-09-09 Guido Desie Fast characterizing method for triboelectrical properties
EP1445015A1 (en) * 2003-02-05 2004-08-11 Agfa-Gevaert Fast characterizing method for triboelectrical properties
DE102018204157A1 (de) * 2018-03-19 2019-09-19 Mahle International Gmbh Verfahren zum Laden von elektrischen Verbrauchern

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3264108A (en) * 1963-03-19 1966-08-02 Gen Aniline & Film Corp Antistatic photographic film
DE1966931C3 (de) * 1969-06-11 1978-11-02 Bayer Ag, 5090 Leverkusen Perfluoralkylsubstituierte, quartäre Ammoniumsalze
US3850642A (en) * 1971-07-16 1974-11-26 Eastman Kodak Co Multilayer radiation sensitive element having controlled triboelectric charging characteristics
CA999465A (en) * 1972-07-22 1976-11-09 Masakazu Yoneyama Antistatic photographic light-sensitive material
IT966734B (it) * 1972-07-24 1974-02-20 Minnesota Mining & Mfg Metodo per ridurre la caricabilita statica di strati fotografici e di elementi fotografici strati fotografici ed elementi fotografici ottenuti con tale metodo
US4039521A (en) * 1973-04-23 1977-08-02 Minnesota Mining And Manufacturing Company Aromatic diazonium bis(fluorinated alkylsulfonyl) methides

Also Published As

Publication number Publication date
BE876238A (fr) 1979-11-14
IT1116858B (it) 1986-02-10
IT7949038A0 (it) 1979-05-14
DE2919351C2 (it) 1988-06-23
US4350644A (en) 1982-09-21
CA1142399A (en) 1983-03-08
JPS554368A (en) 1980-01-12
IT7949039A0 (it) 1979-05-14
US4328280A (en) 1982-05-04
JPS6229474B2 (it) 1987-06-26
BE876237A (fr) 1979-11-14
FR2426383A1 (fr) 1979-12-14
JPS559681A (en) 1980-01-23
FR2426038B1 (it) 1985-03-08
FR2426038A1 (fr) 1979-12-14
DE2919352A1 (de) 1980-05-22
FR2426383B1 (it) 1982-04-09
DE2919352C2 (it) 1988-02-04
CA1128548A (en) 1982-07-27
JPS6328900B2 (it) 1988-06-10
DE2919351A1 (de) 1979-11-22

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