IT1089957B - METHOD FOR MAKING DIARYLONIUM SALTS - Google Patents
METHOD FOR MAKING DIARYLONIUM SALTSInfo
- Publication number
- IT1089957B IT1089957B IT30568/77A IT3056877A IT1089957B IT 1089957 B IT1089957 B IT 1089957B IT 30568/77 A IT30568/77 A IT 30568/77A IT 3056877 A IT3056877 A IT 3056877A IT 1089957 B IT1089957 B IT 1089957B
- Authority
- IT
- Italy
- Prior art keywords
- diarylonium
- salts
- making
- making diarylonium
- diarylonium salts
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/44—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members
- C07D207/444—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5
- C07D207/448—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. maleimide
- C07D207/452—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. maleimide with hydrocarbon radicals, substituted by hetero atoms, directly attached to the ring nitrogen atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C25/00—Compounds containing at least one halogen atom bound to a six-membered aromatic ring
- C07C25/18—Polycyclic aromatic halogenated hydrocarbons
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/749,116 US4151175A (en) | 1976-12-09 | 1976-12-09 | Method for making diarylhalonium salts |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IT1089957B true IT1089957B (en) | 1985-06-18 |
Family
ID=25012329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT30568/77A IT1089957B (en) | 1976-12-09 | 1977-12-09 | METHOD FOR MAKING DIARYLONIUM SALTS |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4151175A (en) |
| JP (1) | JPS53101331A (en) |
| DE (1) | DE2754853A1 (en) |
| FR (1) | FR2373505A1 (en) |
| GB (1) | GB1572620A (en) |
| IT (1) | IT1089957B (en) |
| NL (1) | NL189607C (en) |
Families Citing this family (45)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4196138A (en) * | 1977-05-20 | 1980-04-01 | General Electric Company | Dicarbonyl chelate salts |
| US4238394A (en) * | 1978-10-30 | 1980-12-09 | General Electric Company | Method for making diaryliodonium salts |
| US4329300A (en) * | 1980-06-27 | 1982-05-11 | General Electric Company | Method for making diaryliodonium polyhalometalloid salts |
| US4537725A (en) * | 1982-09-18 | 1985-08-27 | Ciba-Geigy Corporation | Diaryliodosyl salts |
| JPS59163336A (en) * | 1983-03-09 | 1984-09-14 | Nippon Petrochem Co Ltd | Production of aldehyde |
| JPS59163330A (en) * | 1983-03-09 | 1984-09-14 | Nippon Petrochem Co Ltd | Preparation of diaryl iodonium salt |
| US4623666A (en) | 1984-11-06 | 1986-11-18 | Kennedy Thomas P | Pharmacological applications of diphenylhalonium ion |
| US5362607A (en) * | 1986-06-13 | 1994-11-08 | Microsi, Inc. | Method for making a patterned resist substrate composite |
| US5310619A (en) * | 1986-06-13 | 1994-05-10 | Microsi, Inc. | Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable |
| US4845159A (en) * | 1987-10-01 | 1989-07-04 | General Electric Company | Photoactive and thermally active polymeric iodonium salts, use, and method for making |
| US4840977A (en) * | 1987-10-01 | 1989-06-20 | General Electric Company | Polymeric iodonium salts, method for making, and heat curable compositions |
| DE3902114A1 (en) * | 1989-01-25 | 1990-08-02 | Basf Ag | RADIATION-SENSITIVE, ETHYLENICALLY UNSATURATED, COPOLYMERIZABLE SULFONIUM SALTS AND METHOD FOR THE PRODUCTION THEREOF |
| DE69029104T2 (en) | 1989-07-12 | 1997-03-20 | Fuji Photo Film Co Ltd | Polysiloxanes and positive working resist |
| US5488147A (en) * | 1994-07-21 | 1996-01-30 | Minnesota Mining And Manufacturing Company | Diaryliodonium fluoroalkyl sulfonate salts and a method of making |
| JPH0954437A (en) | 1995-06-05 | 1997-02-25 | Fuji Photo Film Co Ltd | Chemical amplification type positive resist composition |
| EP2236488A1 (en) | 2001-03-30 | 2010-10-06 | The Arizona Board of Regents on behalf of the University of Arizona | Materials, methods and uses for photochemical generation of acids and/or radical species |
| US7192681B2 (en) | 2001-07-05 | 2007-03-20 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
| EP1566694B1 (en) | 2004-02-20 | 2014-04-02 | FUJIFILM Corporation | Positive resist composition and pattern forming method using the same |
| EP1637927A1 (en) | 2004-09-02 | 2006-03-22 | Fuji Photo Film Co., Ltd. | Positive resist composition and pattern forming method using the same |
| GB2450975B (en) | 2007-07-12 | 2010-02-24 | Ciba Holding Inc | Yellow radiation curing inks |
| CN100577671C (en) * | 2007-09-05 | 2010-01-06 | 武汉工程大学 | 4,4'-didodecylbenziodonium hexafluoroantimonate synthesis method |
| US8975203B2 (en) | 2009-05-08 | 2015-03-10 | Nippon Shokubai Co., Ltd. | Diaryliodonium salt mixture and process for production thereof, and process for production of diaryliodonium compound |
| US8343608B2 (en) | 2010-08-31 | 2013-01-01 | General Electric Company | Use of appended dyes in optical data storage media |
| BR112013032523B1 (en) | 2011-06-21 | 2021-02-02 | Basf Se | method for the formation of a surface relief microstructure |
| WO2013186167A2 (en) | 2012-06-14 | 2013-12-19 | Basf Se | Method for manufacturing security elements and holograms |
| AU2013314269B2 (en) | 2012-09-17 | 2017-07-06 | Basf Se | Security elements and method for their manufacture |
| RU2663063C2 (en) | 2013-05-21 | 2018-08-01 | Басф Се | Security elements and method for their manufacture |
| EP3052701B1 (en) | 2013-10-04 | 2017-06-28 | Basf Se | High gloss metal effect papers |
| CN107429491A (en) | 2015-03-30 | 2017-12-01 | 巴斯夫欧洲公司 | High-gloss metal effect paper and plate |
| MX2017013601A (en) | 2015-04-29 | 2018-07-06 | Bsn Medical Gmbh | Multi-step process for no production. |
| CA2984033C (en) | 2015-04-29 | 2023-08-15 | Bsn Medical Gmbh | Medical bathing equipment |
| AU2019260116A1 (en) | 2018-04-25 | 2020-10-01 | Basf Se | Process for the production of strongly adherent (embossed) films on flexible substrates |
| JP2022502557A (en) | 2018-09-24 | 2022-01-11 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | UV curable composition for use in 3D printing |
| JP2022514433A (en) | 2018-09-24 | 2022-02-10 | ビーエーエスエフ ソシエタス・ヨーロピア | Photocurable composition for use in 3D printing |
| CA3116462A1 (en) | 2018-10-25 | 2020-04-30 | Basf Se | Compositions, comprising silver nanoplatelets |
| EP3680263A1 (en) | 2019-01-14 | 2020-07-15 | Basf Se | Limonene-based (meth)acrylates for use in 3d printing |
| EP3680274A1 (en) | 2019-01-14 | 2020-07-15 | Basf Se | Hydroxyurethane (meth)acrylate prepolymers for use in 3d printing |
| EP3914458B1 (en) | 2019-01-21 | 2022-12-21 | Basf Se | Security element |
| EP3917703A1 (en) | 2019-01-29 | 2021-12-08 | Basf Se | Security element |
| CN113811409A (en) | 2019-05-06 | 2021-12-17 | 巴斯夫欧洲公司 | Compositions comprising silver nanoplates |
| EP4055071A1 (en) | 2019-11-07 | 2022-09-14 | Basf Se | Water-washable compositions for use in 3d printing |
| CN115279518A (en) | 2020-04-23 | 2022-11-01 | 巴斯夫欧洲公司 | Composition comprising flaky transition metal particles |
| FR3125056A1 (en) | 2021-07-12 | 2023-01-13 | Bostik Sa | Composition based on (meth)acrylate monomers |
| FR3125055A1 (en) | 2021-07-12 | 2023-01-13 | Bostik Sa | Composition based on (meth)acrylate monomers |
| WO2023170132A1 (en) | 2022-03-10 | 2023-09-14 | Basf Se | Casting lacquer for screen printing |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3729313A (en) * | 1971-12-06 | 1973-04-24 | Minnesota Mining & Mfg | Novel photosensitive systems comprising diaryliodonium compounds and their use |
| US3808006A (en) * | 1971-12-06 | 1974-04-30 | Minnesota Mining & Mfg | Photosensitive material containing a diaryliodium compound, a sensitizer and a color former |
| US3981897A (en) * | 1975-05-02 | 1976-09-21 | General Electric Company | Method for making certain halonium salt photoinitiators |
-
1976
- 1976-12-09 US US05/749,116 patent/US4151175A/en not_active Expired - Lifetime
-
1977
- 1977-12-07 JP JP14769177A patent/JPS53101331A/en active Granted
- 1977-12-07 GB GB51044/77A patent/GB1572620A/en not_active Expired
- 1977-12-09 DE DE19772754853 patent/DE2754853A1/en active Granted
- 1977-12-09 FR FR7737221A patent/FR2373505A1/en active Granted
- 1977-12-09 NL NLAANVRAGE7713695,A patent/NL189607C/en not_active IP Right Cessation
- 1977-12-09 IT IT30568/77A patent/IT1089957B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| NL7713695A (en) | 1978-06-13 |
| US4151175A (en) | 1979-04-24 |
| DE2754853C2 (en) | 1988-03-17 |
| DE2754853A1 (en) | 1978-06-22 |
| NL189607C (en) | 1993-06-01 |
| FR2373505A1 (en) | 1978-07-07 |
| FR2373505B1 (en) | 1984-03-30 |
| JPS6236015B2 (en) | 1987-08-05 |
| NL189607B (en) | 1993-01-04 |
| JPS53101331A (en) | 1978-09-04 |
| GB1572620A (en) | 1980-07-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19921216 |