IT1042624B - PHOTOPOLYMERIZABLE COMPOSITION AND PROCESS OF ITS POLYMERIZATION - Google Patents

PHOTOPOLYMERIZABLE COMPOSITION AND PROCESS OF ITS POLYMERIZATION

Info

Publication number
IT1042624B
IT1042624B IT2733475A IT2733475A IT1042624B IT 1042624 B IT1042624 B IT 1042624B IT 2733475 A IT2733475 A IT 2733475A IT 2733475 A IT2733475 A IT 2733475A IT 1042624 B IT1042624 B IT 1042624B
Authority
IT
Italy
Prior art keywords
polymerization
photopolymerizable composition
photopolymerizable
composition
Prior art date
Application number
IT2733475A
Other languages
Italian (it)
Original Assignee
Ici Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB40682/74A external-priority patent/GB1526923A/en
Application filed by Ici Ltd filed Critical Ici Ltd
Application granted granted Critical
Publication of IT1042624B publication Critical patent/IT1042624B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
IT2733475A 1974-09-18 1975-09-17 PHOTOPOLYMERIZABLE COMPOSITION AND PROCESS OF ITS POLYMERIZATION IT1042624B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB40682/74A GB1526923A (en) 1974-09-18 1974-09-18 Photopolymerisable compositions
GB759875 1975-02-24

Publications (1)

Publication Number Publication Date
IT1042624B true IT1042624B (en) 1980-01-30

Family

ID=26241548

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2733475A IT1042624B (en) 1974-09-18 1975-09-17 PHOTOPOLYMERIZABLE COMPOSITION AND PROCESS OF ITS POLYMERIZATION

Country Status (9)

Country Link
JP (1) JPS6057442B2 (en)
DE (1) DE2541709C2 (en)
DK (1) DK415875A (en)
FR (1) FR2285423A1 (en)
IE (1) IE42085B1 (en)
IT (1) IT1042624B (en)
NL (1) NL179654C (en)
NZ (1) NZ178699A (en)
SE (1) SE425399B (en)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
US4108747A (en) * 1976-07-14 1978-08-22 General Electric Company Curable compositions and method for curing such compositions
US4102687A (en) * 1977-02-14 1978-07-25 General Electric Company UV Curable composition of a thermosetting condensation resin and Group VIa onium salt
GB1604953A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
GB1604954A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
US4273668A (en) * 1977-09-14 1981-06-16 General Electric Company Arylsulfonium salt-solvent mixtures
GB1596000A (en) * 1977-09-14 1981-08-19 Gen Electric Heterocyclic onium salts their preparation and their use for photopolymerisable organic materials
US4186108A (en) * 1978-02-08 1980-01-29 Minnesota Mining And Manufacturing Company Liquid compositions containing triarylsulfonium complex salts and oxyethylene material
US4218531A (en) * 1978-02-08 1980-08-19 Minnesota Mining And Manufacturing Company Addition of ethylenically unsaturated materials to control odor in photopolymerizable epoxy compositions
DE2966764D1 (en) * 1978-10-27 1984-04-12 Ici Plc Polymerisable compositions, derived coatings and other polymerised products
US4231886A (en) * 1979-01-29 1980-11-04 Minnesota Mining And Manufacturing Company Ester solutions of complex salts
EP0014785B1 (en) * 1979-02-12 1985-06-12 General Electric Company Coating method and curable compositions
SE8901048D0 (en) * 1989-03-23 1989-03-23 Becker Wilhelm Ab polymerisation
DE3909688A1 (en) * 1989-03-23 1990-09-27 Espe Stiftung METHOD FOR GLUING OR POOLING SUBSTRATES AND DEVICE FOR CARRYING OUT ITSELF
EP0410606B1 (en) 1989-07-12 1996-11-13 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
US6723483B1 (en) * 1999-12-27 2004-04-20 Wako Pure Chemical Industries, Ltd. Sulfonium salt compounds
EP1314725B1 (en) * 2000-08-30 2008-03-19 Wako Pure Chemical Industries, Ltd. Sulfonium salt compound
JP4448730B2 (en) 2004-04-20 2010-04-14 富士フイルム株式会社 Photosensitive composition, compound used for photosensitive composition, and pattern formation method using the photosensitive composition
US8980968B2 (en) 2010-02-05 2015-03-17 Canon Kabushiki Kaisha Photosensitive resin composition, method for producing structure, and liquid discharge head
US9061499B2 (en) 2010-02-05 2015-06-23 Canon Kabushiki Kaisha Negative photosensitive resin composition, pattern formation method, and liquid discharge head

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3412046A (en) * 1965-07-01 1968-11-19 Dexter Corp Catalyzed polyepoxide-anhydride resin systems

Also Published As

Publication number Publication date
SE7510390L (en) 1976-03-19
NZ178699A (en) 1978-03-06
SE425399B (en) 1982-09-27
FR2285423B1 (en) 1979-08-31
AU8489975A (en) 1977-03-24
NL179654B (en) 1986-05-16
JPS6057442B2 (en) 1985-12-14
IE42085L (en) 1976-03-18
NL7510920A (en) 1976-03-22
DE2541709C2 (en) 1985-02-21
DE2541709A1 (en) 1976-04-01
JPS5156885A (en) 1976-05-18
FR2285423A1 (en) 1976-04-16
IE42085B1 (en) 1980-06-04
DK415875A (en) 1976-03-19
NL179654C (en) 1986-10-16

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