IT1027852B - Processo per la fabricazione di una maschera fotoresistivea dop pic strato - Google Patents

Processo per la fabricazione di una maschera fotoresistivea dop pic strato

Info

Publication number
IT1027852B
IT1027852B IT3080274A IT3080274A IT1027852B IT 1027852 B IT1027852 B IT 1027852B IT 3080274 A IT3080274 A IT 3080274A IT 3080274 A IT3080274 A IT 3080274A IT 1027852 B IT1027852 B IT 1027852B
Authority
IT
Italy
Prior art keywords
dop
manufacture
photoresistive mask
pic layer
pic
Prior art date
Application number
IT3080274A
Other languages
English (en)
Italian (it)
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of IT1027852B publication Critical patent/IT1027852B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
IT3080274A 1974-02-28 1974-12-20 Processo per la fabricazione di una maschera fotoresistivea dop pic strato IT1027852B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH286974A CH584422A5 (de) 1974-02-28 1974-02-28

Publications (1)

Publication Number Publication Date
IT1027852B true IT1027852B (it) 1978-12-20

Family

ID=4243404

Family Applications (1)

Application Number Title Priority Date Filing Date
IT3080274A IT1027852B (it) 1974-02-28 1974-12-20 Processo per la fabricazione di una maschera fotoresistivea dop pic strato

Country Status (6)

Country Link
JP (1) JPS5527476B2 (de)
CH (1) CH584422A5 (de)
DE (1) DE2459183C2 (de)
FR (1) FR2262818B1 (de)
GB (1) GB1443917A (de)
IT (1) IT1027852B (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4248960A (en) * 1978-01-23 1981-02-03 W. R. Grace & Co. Radiation responsive relief imageable plastic laminate
US4716097A (en) * 1986-02-03 1987-12-29 E. I. Du Pont De Nemours And Company Increased photopolymer photospeed employing yellow light preexposure
DE3626708A1 (de) * 1986-08-07 1988-02-11 Mania Gmbh Verfahren zur herstellung von leiterplatten

Also Published As

Publication number Publication date
CH584422A5 (de) 1977-01-31
FR2262818A1 (de) 1975-09-26
GB1443917A (en) 1976-07-28
FR2262818B1 (de) 1977-07-01
DE2459183A1 (de) 1975-09-04
JPS50119971A (de) 1975-09-19
JPS5527476B2 (de) 1980-07-21
DE2459183C2 (de) 1983-02-24

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