IT1011089B - METHOD OF OBTAINING RELIEF DRAWINGS - Google Patents

METHOD OF OBTAINING RELIEF DRAWINGS

Info

Publication number
IT1011089B
IT1011089B IT4934374A IT4934374A IT1011089B IT 1011089 B IT1011089 B IT 1011089B IT 4934374 A IT4934374 A IT 4934374A IT 4934374 A IT4934374 A IT 4934374A IT 1011089 B IT1011089 B IT 1011089B
Authority
IT
Italy
Prior art keywords
obtaining relief
relief drawings
drawings
obtaining
relief
Prior art date
Application number
IT4934374A
Other languages
Italian (it)
Inventor
Kokawa Tomoo
Nakao Yoshikathu
Akiyama Kunio
Original Assignee
Kansai Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2939473A external-priority patent/JPS49119623A/ja
Priority claimed from JP3505273A external-priority patent/JPS49123035A/ja
Application filed by Kansai Paint Co Ltd filed Critical Kansai Paint Co Ltd
Application granted granted Critical
Publication of IT1011089B publication Critical patent/IT1011089B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
IT4934374A 1973-03-15 1974-03-15 METHOD OF OBTAINING RELIEF DRAWINGS IT1011089B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2939473A JPS49119623A (en) 1973-03-15 1973-03-15
JP3505273A JPS49123035A (en) 1973-03-29 1973-03-29

Publications (1)

Publication Number Publication Date
IT1011089B true IT1011089B (en) 1977-01-20

Family

ID=26367590

Family Applications (1)

Application Number Title Priority Date Filing Date
IT4934374A IT1011089B (en) 1973-03-15 1974-03-15 METHOD OF OBTAINING RELIEF DRAWINGS

Country Status (5)

Country Link
DE (1) DE2412537A1 (en)
FR (1) FR2221755A1 (en)
GB (1) GB1462511A (en)
IT (1) IT1011089B (en)
NL (1) NL7403403A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2526316B2 (en) * 1989-10-31 1996-08-21 イー・アイ・デュポン・ドゥ・ヌムール・アンド・カンパニー Release layer for flexographic printing plates which can be treated with water or semi-water
DE4315136A1 (en) * 1993-05-07 1994-11-17 Voralp Ets Device for masking substrates to be processed

Also Published As

Publication number Publication date
FR2221755A1 (en) 1974-10-11
NL7403403A (en) 1974-09-17
GB1462511A (en) 1977-01-26
DE2412537A1 (en) 1974-09-26

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