IT1011068B - Apparato di proiezione ottica e di scansione per allineamento di im magini - Google Patents

Apparato di proiezione ottica e di scansione per allineamento di im magini

Info

Publication number
IT1011068B
IT1011068B IT4921274A IT4921274A IT1011068B IT 1011068 B IT1011068 B IT 1011068B IT 4921274 A IT4921274 A IT 4921274A IT 4921274 A IT4921274 A IT 4921274A IT 1011068 B IT1011068 B IT 1011068B
Authority
IT
Italy
Prior art keywords
magini
alignment
optical projection
scanning equipment
scanning
Prior art date
Application number
IT4921274A
Other languages
English (en)
Italian (it)
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Application granted granted Critical
Publication of IT1011068B publication Critical patent/IT1011068B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25—Movable or adjustable work or tool supports
    • B23Q1/26—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
    • B23Q1/34—Relative movement obtained by use of deformable elements, e.g. piezoelectric, magnetostrictive, elastic or thermally-dilatable elements
    • B23Q1/36—Springs
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0615—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in wich all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
IT4921274A 1973-03-09 1974-03-08 Apparato di proiezione ottica e di scansione per allineamento di im magini IT1011068B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US33986073A 1973-03-09 1973-03-09

Publications (1)

Publication Number Publication Date
IT1011068B true IT1011068B (it) 1977-01-20

Family

ID=23330939

Family Applications (1)

Application Number Title Priority Date Filing Date
IT4921274A IT1011068B (it) 1973-03-09 1974-03-08 Apparato di proiezione ottica e di scansione per allineamento di im magini

Country Status (7)

Country Link
JP (1) JPS5026561A (OSRAM)
CA (1) CA1011979A (OSRAM)
CH (1) CH569985A5 (OSRAM)
DE (1) DE2410924A1 (OSRAM)
FR (1) FR2220807B3 (OSRAM)
GB (1) GB1459272A (OSRAM)
IT (1) IT1011068B (OSRAM)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3878419A (en) * 1973-12-17 1975-04-15 Carlo F Lafiandra Precision base mercury vapor lamp
CA1090183A (en) * 1976-09-22 1980-11-25 David A. Markle System for illuminating an annular field
JPS5467443A (en) * 1977-11-09 1979-05-30 Canon Inc Observer
JPS54123877A (en) * 1978-03-18 1979-09-26 Canon Inc Baking unit
JPS5576444U (OSRAM) * 1978-11-13 1980-05-26
FR2586853B1 (fr) * 1985-08-30 1988-07-29 Suisse Electronique Microtech Dispositif de micropositionnement
JP2567811B2 (ja) * 1994-02-14 1996-12-25 キヤノン株式会社 走査型露光装置

Also Published As

Publication number Publication date
DE2410924A1 (de) 1974-09-26
GB1459272A (en) 1976-12-22
FR2220807B3 (OSRAM) 1978-11-10
CA1011979A (en) 1977-06-14
FR2220807A1 (OSRAM) 1974-10-04
JPS5026561A (OSRAM) 1975-03-19
CH569985A5 (OSRAM) 1975-11-28

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