IT1010440B - Composizioni pastose fotopolimeriz zabili e loro uso - Google Patents

Composizioni pastose fotopolimeriz zabili e loro uso

Info

Publication number
IT1010440B
IT1010440B IT22329/74A IT2232974A IT1010440B IT 1010440 B IT1010440 B IT 1010440B IT 22329/74 A IT22329/74 A IT 22329/74A IT 2232974 A IT2232974 A IT 2232974A IT 1010440 B IT1010440 B IT 1010440B
Authority
IT
Italy
Prior art keywords
photopolymerizable
pasty compositions
pasty
compositions
photopolymerizable pasty
Prior art date
Application number
IT22329/74A
Other languages
English (en)
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Application granted granted Critical
Publication of IT1010440B publication Critical patent/IT1010440B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/09—Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092—Dispersed materials, e.g. conductive pastes or inks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0502—Patterning and lithography
    • H05K2203/0514—Photodevelopable thick film, e.g. conductive or insulating paste
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/109—Polyester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Polymers & Plastics (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Polymerisation Methods In General (AREA)
IT22329/74A 1973-05-07 1974-05-06 Composizioni pastose fotopolimeriz zabili e loro uso IT1010440B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/357,525 US3958996A (en) 1973-05-07 1973-05-07 Photopolymerizable paste composition

Publications (1)

Publication Number Publication Date
IT1010440B true IT1010440B (it) 1977-01-10

Family

ID=23405980

Family Applications (1)

Application Number Title Priority Date Filing Date
IT22329/74A IT1010440B (it) 1973-05-07 1974-05-06 Composizioni pastose fotopolimeriz zabili e loro uso

Country Status (6)

Country Link
US (1) US3958996A (it)
JP (1) JPS5041985A (it)
CA (1) CA1029234A (it)
DE (1) DE2422020A1 (it)
FR (1) FR2228797B1 (it)
IT (1) IT1010440B (it)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4119480A (en) * 1976-05-13 1978-10-10 Tokyo Shibaura Electric Co., Ltd. Method of manufacturing thick-film circuit devices
DE2926235A1 (de) * 1979-06-29 1981-01-08 Hoechst Ag Photopolymerisierbares kopiermaterial und verfahren zur herstellung von reliefbildern
WO1981000310A1 (en) * 1979-07-16 1981-02-05 Minnesota Mining & Mfg Plating resist with improved resistance to extraneous plating
BR8103183A (pt) * 1980-05-27 1982-02-09 Du Pont Camada foto-sensivel fina;elemento foto-resistor;substrato com uma camada foto-sensivel fina laminada;e processo para aparacao de camada foto-sensivel e de um material polimerico fino
US4394434A (en) * 1980-12-08 1983-07-19 Minnesota Mining And Manufacturing Company Plating resist with improved resistance to extraneous plating
US4533445A (en) * 1983-07-06 1985-08-06 Shipley Company Inc. U.V. Curable composition
US4598037A (en) * 1984-12-21 1986-07-01 E. I. Du Pont De Nemours And Company Photosensitive conductive metal composition
US4613560A (en) * 1984-12-28 1986-09-23 E. I. Du Pont De Nemours And Company Photosensitive ceramic coating composition
US5032478A (en) * 1989-08-21 1991-07-16 E. I. Du Pont De Nemours And Company Photosensitive aqueous developable gold conductor composition
US5032490A (en) * 1989-08-21 1991-07-16 E. I. Du Pont De Nemours And Company Photosensitive aqueous developable copper conductor composition
US5204210A (en) * 1990-12-07 1993-04-20 Xerox Corporation Method for the direct patterning of diamond films
DE4116957A1 (de) * 1991-05-24 1992-11-26 Ruetgerswerke Ag Durch strahlung vernetzbare beschichtungsmittel und ihre verwendung
US6360562B1 (en) 1998-02-24 2002-03-26 Superior Micropowders Llc Methods for producing glass powders
DE69910335T2 (de) 1998-12-11 2004-07-01 E.I. Du Pont De Nemours And Co., Wilmington Zusammensetzung für ein Silber enthaltendes, lichtempfindliches, leitendes Band und das damit behandelte Band
JP3674501B2 (ja) * 2000-11-30 2005-07-20 株式会社村田製作所 感光性銅ペースト、銅パターンの形成方法、及びセラミック多層基板の製造方法
EP2444148A1 (de) * 2010-10-25 2012-04-25 Bayer Material Science AG Metallpartikelsol mit dotierten Silbernanopartikeln
KR102174883B1 (ko) * 2013-03-08 2020-11-06 쓰리본드 화인 케미칼 가부시키가이샤 광경화성 조성물
US9966480B2 (en) * 2015-04-28 2018-05-08 Samsung Sdi Co., Ltd. Electrode composition, electrode manufactured using the same, and solar cell

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3474718A (en) * 1966-02-08 1969-10-28 Sperry Rand Corp Photosensitive method for depositing thin uniform glass films on substrates
US3615457A (en) * 1969-04-02 1971-10-26 Du Pont Photopolymerizable compositions and processes of applying the same
US3573908A (en) * 1969-06-06 1971-04-06 Bell Telephone Labor Inc Photographic technique for the selective deposition of a ceramic substrate glaze
US3877950A (en) * 1974-03-21 1975-04-15 Du Pont Photosensitive gold compositions

Also Published As

Publication number Publication date
CA1029234A (en) 1978-04-11
FR2228797A1 (it) 1974-12-06
FR2228797B1 (it) 1976-12-17
DE2422020A1 (de) 1974-11-14
JPS5041985A (it) 1975-04-16
US3958996A (en) 1976-05-25

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