IN2014DN01967A - - Google Patents
Info
- Publication number
- IN2014DN01967A IN2014DN01967A IN1967DEN2014A IN2014DN01967A IN 2014DN01967 A IN2014DN01967 A IN 2014DN01967A IN 1967DEN2014 A IN1967DEN2014 A IN 1967DEN2014A IN 2014DN01967 A IN2014DN01967 A IN 2014DN01967A
- Authority
- IN
- India
- Prior art keywords
- filament
- source housing
- potential drop
- source
- plasma source
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/022—Details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32018—Glow discharge
- H01J37/32045—Circuits specially adapted for controlling the glow discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
- H01J37/32064—Circuits specially adapted for controlling the arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
- Plasma Technology (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Chemical Vapour Deposition (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention relates to a plasma source which is arranged in floating fashion on a vacuum chamber wherein the plasma source comprises a source housing and a filament is provided in the source housing and is arranged so as to be insulated therefrom wherein means for measuring the potential drop between the source housing and the filament are provided. The measured potential drop can be used for regulating the voltage heating the filament. According to the invention corresponding means are provided.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102011112759A DE102011112759A1 (en) | 2011-09-08 | 2011-09-08 | plasma source |
PCT/EP2012/003623 WO2013034258A1 (en) | 2011-09-08 | 2012-08-29 | Plasma source |
Publications (1)
Publication Number | Publication Date |
---|---|
IN2014DN01967A true IN2014DN01967A (en) | 2015-05-15 |
Family
ID=46980879
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IN1967DEN2014 IN2014DN01967A (en) | 2011-09-08 | 2012-08-29 |
Country Status (21)
Country | Link |
---|---|
US (1) | US9226379B2 (en) |
EP (1) | EP2754167B1 (en) |
JP (1) | JP6251676B2 (en) |
KR (1) | KR102028767B1 (en) |
CN (1) | CN103765551B (en) |
AR (1) | AR087804A1 (en) |
BR (1) | BR112014004654B1 (en) |
CA (1) | CA2846679C (en) |
DE (1) | DE102011112759A1 (en) |
DK (1) | DK2754167T3 (en) |
ES (1) | ES2704708T3 (en) |
HU (1) | HUE040659T2 (en) |
IN (1) | IN2014DN01967A (en) |
MX (1) | MX340593B (en) |
MY (1) | MY172720A (en) |
PL (1) | PL2754167T3 (en) |
RU (1) | RU2622048C2 (en) |
SG (1) | SG2014013429A (en) |
SI (1) | SI2754167T1 (en) |
TR (1) | TR201900085T4 (en) |
WO (1) | WO2013034258A1 (en) |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3956666A (en) * | 1975-01-27 | 1976-05-11 | Ion Tech, Inc. | Electron-bombardment ion sources |
US4301391A (en) * | 1979-04-26 | 1981-11-17 | Hughes Aircraft Company | Dual discharge plasma device |
US4647818A (en) * | 1984-04-16 | 1987-03-03 | Sfe Technologies | Nonthermionic hollow anode gas discharge electron beam source |
JPS6343240A (en) * | 1986-08-07 | 1988-02-24 | Seiko Instr & Electronics Ltd | Ion source |
JPH01267943A (en) * | 1988-04-19 | 1989-10-25 | Agency Of Ind Science & Technol | Ion source device |
US4910435A (en) * | 1988-07-20 | 1990-03-20 | American International Technologies, Inc. | Remote ion source plasma electron gun |
JPH0536370A (en) * | 1991-07-26 | 1993-02-12 | Origin Electric Co Ltd | Power supply device of ion source |
JPH0574395A (en) * | 1991-09-18 | 1993-03-26 | Hitachi Ltd | Electron source system and its control meth0d |
US5198677A (en) * | 1991-10-11 | 1993-03-30 | The United States Of America As Represented By The United States Department Of Energy | Production of N+ ions from a multicusp ion beam apparatus |
JPH05275047A (en) * | 1992-03-23 | 1993-10-22 | Tokyo Electron Ltd | Ion implanter |
CH687111A5 (en) * | 1992-05-26 | 1996-09-13 | Balzers Hochvakuum | A method for generating a low voltage discharge, vacuum treatment system here, as well as for application of the method. |
US5523652A (en) * | 1994-09-26 | 1996-06-04 | Eaton Corporation | Microwave energized ion source for ion implantation |
US6137231A (en) * | 1996-09-10 | 2000-10-24 | The Regents Of The University Of California | Constricted glow discharge plasma source |
US6388381B2 (en) * | 1996-09-10 | 2002-05-14 | The Regents Of The University Of California | Constricted glow discharge plasma source |
JP2965293B1 (en) * | 1998-11-10 | 1999-10-18 | 川崎重工業株式会社 | Electron beam excited plasma generator |
JP3414380B2 (en) * | 2000-11-14 | 2003-06-09 | 日新電機株式会社 | Ion beam irradiation method and related method and apparatus |
US6454910B1 (en) * | 2001-09-21 | 2002-09-24 | Kaufman & Robinson, Inc. | Ion-assisted magnetron deposition |
US6724160B2 (en) * | 2002-04-12 | 2004-04-20 | Kaufman & Robinson, Inc. | Ion-source neutralization with a hot-filament cathode-neutralizer |
US7138768B2 (en) * | 2002-05-23 | 2006-11-21 | Varian Semiconductor Equipment Associates, Inc. | Indirectly heated cathode ion source |
US7411352B2 (en) * | 2002-09-19 | 2008-08-12 | Applied Process Technologies, Inc. | Dual plasma beam sources and method |
EP1554412B1 (en) * | 2002-09-19 | 2013-08-14 | General Plasma, Inc. | Plasma enhanced chemical vapor deposition apparatus |
JP2004165034A (en) * | 2002-11-14 | 2004-06-10 | Nissin Electric Co Ltd | Ion source filament life prediction method, and ion source device |
US7038389B2 (en) * | 2003-05-02 | 2006-05-02 | Applied Process Technologies, Inc. | Magnetron plasma source |
JP2004362901A (en) * | 2003-06-04 | 2004-12-24 | Sharp Corp | Ion doping device, ion doping method, and semiconductor device |
KR20080048433A (en) * | 2006-11-28 | 2008-06-02 | 가부시키가이샤 쇼와 신쿠 | Charged particle beam apparatus, method for controlling charged particle, and frequency adjustment apparatus |
CN101842868B (en) * | 2007-11-01 | 2012-12-26 | 欧瑞康贸易股份公司(特吕巴赫) | Method for manufacturing a treated surface and vacuum plasma sources |
JP4463310B2 (en) * | 2008-03-07 | 2010-05-19 | 三井造船株式会社 | Ion source |
US7843138B2 (en) * | 2008-06-11 | 2010-11-30 | Kaufman & Robinson, Inc. | Power supply for a hot-filament cathode |
-
2011
- 2011-09-08 DE DE102011112759A patent/DE102011112759A1/en not_active Withdrawn
-
2012
- 2012-08-29 CA CA2846679A patent/CA2846679C/en active Active
- 2012-08-29 KR KR1020147006192A patent/KR102028767B1/en active IP Right Grant
- 2012-08-29 DK DK12769011.3T patent/DK2754167T3/en active
- 2012-08-29 SI SI201231494T patent/SI2754167T1/en unknown
- 2012-08-29 RU RU2014113560A patent/RU2622048C2/en active
- 2012-08-29 WO PCT/EP2012/003623 patent/WO2013034258A1/en active Application Filing
- 2012-08-29 PL PL12769011T patent/PL2754167T3/en unknown
- 2012-08-29 CN CN201280043726.2A patent/CN103765551B/en active Active
- 2012-08-29 IN IN1967DEN2014 patent/IN2014DN01967A/en unknown
- 2012-08-29 EP EP12769011.3A patent/EP2754167B1/en active Active
- 2012-08-29 TR TR2019/00085T patent/TR201900085T4/en unknown
- 2012-08-29 SG SG2014013429A patent/SG2014013429A/en unknown
- 2012-08-29 HU HUE12769011A patent/HUE040659T2/en unknown
- 2012-08-29 MY MYPI2014000663A patent/MY172720A/en unknown
- 2012-08-29 US US14/343,549 patent/US9226379B2/en active Active
- 2012-08-29 JP JP2014528885A patent/JP6251676B2/en active Active
- 2012-08-29 BR BR112014004654-9A patent/BR112014004654B1/en active IP Right Grant
- 2012-08-29 ES ES12769011T patent/ES2704708T3/en active Active
- 2012-08-29 MX MX2014002777A patent/MX340593B/en active IP Right Grant
- 2012-09-07 AR ARP120103300A patent/AR087804A1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
RU2014113560A (en) | 2015-10-20 |
JP2014526771A (en) | 2014-10-06 |
CA2846679A1 (en) | 2013-03-14 |
BR112014004654A2 (en) | 2017-03-28 |
KR102028767B1 (en) | 2019-10-04 |
EP2754167B1 (en) | 2018-10-10 |
BR112014004654B1 (en) | 2021-09-21 |
WO2013034258A1 (en) | 2013-03-14 |
EP2754167A1 (en) | 2014-07-16 |
PL2754167T3 (en) | 2019-03-29 |
CN103765551B (en) | 2016-07-06 |
SG2014013429A (en) | 2014-07-30 |
TR201900085T4 (en) | 2019-02-21 |
JP6251676B2 (en) | 2017-12-20 |
US9226379B2 (en) | 2015-12-29 |
CA2846679C (en) | 2019-10-22 |
SI2754167T1 (en) | 2019-02-28 |
CN103765551A (en) | 2014-04-30 |
MX2014002777A (en) | 2014-12-05 |
HUE040659T2 (en) | 2019-03-28 |
KR20140074288A (en) | 2014-06-17 |
AR087804A1 (en) | 2014-04-16 |
DE102011112759A1 (en) | 2013-03-14 |
MY172720A (en) | 2019-12-11 |
DK2754167T3 (en) | 2019-01-21 |
RU2622048C2 (en) | 2017-06-09 |
ES2704708T3 (en) | 2019-03-19 |
US20140217892A1 (en) | 2014-08-07 |
MX340593B (en) | 2016-07-15 |
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