IL99607A - Carbon dioxide laser with tissue treatment pulse - Google Patents
Carbon dioxide laser with tissue treatment pulseInfo
- Publication number
- IL99607A IL99607A IL9960791A IL9960791A IL99607A IL 99607 A IL99607 A IL 99607A IL 9960791 A IL9960791 A IL 9960791A IL 9960791 A IL9960791 A IL 9960791A IL 99607 A IL99607 A IL 99607A
- Authority
- IL
- Israel
- Prior art keywords
- laser
- electrodes
- mirrors
- resonator
- sheets
- Prior art date
Links
- 238000012360 testing method Methods 0.000 claims description 4
- 230000001427 coherent effect Effects 0.000 claims 5
- 229910002092 carbon dioxide Inorganic materials 0.000 description 36
- 239000007789 gas Substances 0.000 description 17
- 238000013461 design Methods 0.000 description 14
- 238000013459 approach Methods 0.000 description 11
- 238000001816 cooling Methods 0.000 description 11
- 230000015556 catabolic process Effects 0.000 description 10
- 238000006731 degradation reaction Methods 0.000 description 9
- 230000008878 coupling Effects 0.000 description 8
- 238000010168 coupling process Methods 0.000 description 8
- 238000005859 coupling reaction Methods 0.000 description 8
- 238000000429 assembly Methods 0.000 description 6
- 230000000712 assembly Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 230000005284 excitation Effects 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 241000722921 Tulipa gesneriana Species 0.000 description 5
- 230000008901 benefit Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BKZJXSDQOIUIIG-UHFFFAOYSA-N argon mercury Chemical compound [Ar].[Hg] BKZJXSDQOIUIIG-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000012634 fragment Substances 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- MZQZQKZKTGRQCG-UHFFFAOYSA-J thorium tetrafluoride Chemical compound F[Th](F)(F)F MZQZQKZKTGRQCG-UHFFFAOYSA-J 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 229920005372 Plexiglas® Polymers 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000001804 debridement Methods 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 235000015250 liver sausages Nutrition 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- XYSQXZCMOLNHOI-UHFFFAOYSA-N s-[2-[[4-(acetylsulfamoyl)phenyl]carbamoyl]phenyl] 5-pyridin-1-ium-1-ylpentanethioate;bromide Chemical compound [Br-].C1=CC(S(=O)(=O)NC(=O)C)=CC=C1NC(=O)C1=CC=CC=C1SC(=O)CCCC[N+]1=CC=CC=C1 XYSQXZCMOLNHOI-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000001356 surgical procedure Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/041—Arrangements for thermal management for gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/0315—Waveguide lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/086—One or more reflectors having variable properties or positions for initial adjustment of the resonator
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
- H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US59653290A | 1990-10-12 | 1990-10-12 | |
| US07/597,382 US5131004A (en) | 1990-10-12 | 1990-10-12 | RF excited CO2 slab waveguide laser |
| US07/596,463 US5140606A (en) | 1990-10-12 | 1990-10-12 | RF excited CO2 slab waveguide laser |
| US07/596,672 US5131003A (en) | 1990-10-12 | 1990-10-12 | RF excited CO2 slab waveguide laser |
| US07/596,788 US5123028A (en) | 1990-10-12 | 1990-10-12 | RF Excited CO2 slab waveguide laser |
| US60791090A | 1990-11-01 | 1990-11-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IL99607A0 IL99607A0 (en) | 1992-08-18 |
| IL99607A true IL99607A (en) | 1994-07-31 |
Family
ID=27560169
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL9960791A IL99607A (en) | 1990-10-12 | 1991-09-27 | Carbon dioxide laser with tissue treatment pulse |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0486152B1 (de) |
| DE (1) | DE69117258T2 (de) |
| IL (1) | IL99607A (de) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5216689A (en) | 1990-10-12 | 1993-06-01 | Coherent, Inc. | Slab laser with enhanced lifetime |
| DE9217640U1 (de) * | 1992-12-23 | 1994-09-29 | Rofin-Sinar Laser Gmbh, 22113 Hamburg | Slab- oder Bandleiterlaser |
| US5353297A (en) * | 1993-07-12 | 1994-10-04 | Coherent, Inc. | Gas slab laser with folded resonator structure |
| US5353296A (en) * | 1993-07-12 | 1994-10-04 | Coherent, Inc. | Materials processing with a high repetition rate isotopic carbon dioxide laser |
| GB9316282D0 (en) * | 1993-08-05 | 1993-09-22 | Univ Heriot Watt | Uniformly excited radiofrequency gas discharge of large electrode area |
| DE19806030A1 (de) * | 1998-02-13 | 1999-08-19 | Lasos Laser Fertigung Gmbh | Vorrichtung zum Ableiten von Verlustwärme |
| CN105846289B (zh) * | 2016-05-13 | 2019-06-28 | 清华大学深圳研究生院 | 一种射频co2激光器及其非稳-波导混合腔 |
| CN110455829A (zh) * | 2019-08-19 | 2019-11-15 | 电子科技大学 | 高功率微波对电介质材料非热影响机制提取系统及方法 |
| CN110635345B (zh) * | 2019-10-31 | 2025-07-29 | 成都微深科技有限公司 | 一种具有可调节支撑装置的二氧化碳激光器 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4719639B1 (en) * | 1987-01-08 | 1994-06-28 | Boreal Laser Inc | Carbon dioxide slab laser |
| US5048048A (en) * | 1989-08-11 | 1991-09-10 | Mitsubishi Denki K.K. | Gas laser device |
-
1991
- 1991-09-27 IL IL9960791A patent/IL99607A/en not_active IP Right Cessation
- 1991-10-09 DE DE69117258T patent/DE69117258T2/de not_active Expired - Fee Related
- 1991-10-09 EP EP91309288A patent/EP0486152B1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| IL99607A0 (en) | 1992-08-18 |
| DE69117258T2 (de) | 1996-10-02 |
| EP0486152A3 (en) | 1992-07-08 |
| DE69117258D1 (de) | 1996-03-28 |
| EP0486152A2 (de) | 1992-05-20 |
| EP0486152B1 (de) | 1996-02-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5123028A (en) | RF Excited CO2 slab waveguide laser | |
| US5140606A (en) | RF excited CO2 slab waveguide laser | |
| US5335242A (en) | Resonator for CO2 slab waveguide laser | |
| US5131003A (en) | RF excited CO2 slab waveguide laser | |
| US5748663A (en) | Retangular discharge gas laser | |
| US6788722B1 (en) | High power waveguide laser | |
| EP0904616B1 (de) | Hochfrequenz-angeregter wellenleiterlaser | |
| EP0675579B1 (de) | Verbesserter CO2 Bandleiterlaser | |
| EP0275023B1 (de) | Plattenförmiger Kohlendioxid-Laser | |
| US7260134B2 (en) | Dielectric coupled CO2 slab laser | |
| WO1993017474A1 (en) | Slab laser with enhanced lifetime | |
| US5237580A (en) | RF excited CO2 slab waveguide laser | |
| US4891819A (en) | RF excited laser with internally folded resonator | |
| EP0486152B1 (de) | Scheibenförmiger Gaslaser | |
| US5155739A (en) | RF excited CO2 slab waveguide laser | |
| US5131004A (en) | RF excited CO2 slab waveguide laser | |
| EP0098143A2 (de) | Kombinierte Laser-Resonator-Struktur | |
| US5255282A (en) | Open waveguide excimer laser | |
| JP2002094147A (ja) | パルス波ｃｏ２レーザー | |
| EP0776073B1 (de) | Gaslaser mit rechteckigem Entladungsraum | |
| EP2382695B1 (de) | Partikelbeschädigungsschutz für hochleistungs-co2-slab-laserspiegel | |
| EP1217700B1 (de) | Grossflächiger Laser | |
| US20070133643A1 (en) | Effective excitation, optical energy extraction and beamlet stacking in a multi-channel radial array laser system | |
| WO1996037935A1 (en) | Microwave excited laser with uniform gas discharge | |
| US5436926A (en) | Micro gas laser with laser array |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| KB | Patent renewed | ||
| KB | Patent renewed | ||
| EXP | Patent expired |