IL71761A - Photopolymerization method and compositions with sensitized glyoxylate photoinitiators - Google Patents

Photopolymerization method and compositions with sensitized glyoxylate photoinitiators

Info

Publication number
IL71761A
IL71761A IL71761A IL7176184A IL71761A IL 71761 A IL71761 A IL 71761A IL 71761 A IL71761 A IL 71761A IL 7176184 A IL7176184 A IL 7176184A IL 71761 A IL71761 A IL 71761A
Authority
IL
Israel
Prior art keywords
sensitized
compositions
photopolymerization method
glyoxylate
photoinitiators
Prior art date
Application number
IL71761A
Other languages
English (en)
Other versions
IL71761A0 (en
Original Assignee
Stauffer Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stauffer Chemical Co filed Critical Stauffer Chemical Co
Publication of IL71761A0 publication Critical patent/IL71761A0/xx
Publication of IL71761A publication Critical patent/IL71761A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/28—Nitrogen-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
IL71761A 1983-06-06 1984-05-04 Photopolymerization method and compositions with sensitized glyoxylate photoinitiators IL71761A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/501,470 US4519883A (en) 1983-06-06 1983-06-06 Sensitization of glyoxylate photoinitiators using a terphenyl compound

Publications (2)

Publication Number Publication Date
IL71761A0 IL71761A0 (en) 1984-09-30
IL71761A true IL71761A (en) 1987-09-16

Family

ID=23993683

Family Applications (1)

Application Number Title Priority Date Filing Date
IL71761A IL71761A (en) 1983-06-06 1984-05-04 Photopolymerization method and compositions with sensitized glyoxylate photoinitiators

Country Status (9)

Country Link
US (1) US4519883A (xx)
EP (1) EP0128322A1 (xx)
KR (1) KR850000486A (xx)
AU (1) AU566308B2 (xx)
BR (1) BR8402623A (xx)
DK (1) DK278884A (xx)
IL (1) IL71761A (xx)
NZ (1) NZ208371A (xx)
ZA (1) ZA843881B (xx)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8405437D0 (en) * 1984-03-01 1984-04-04 Amersham Int Plc Detecting polynucleotide sequences
DE3738567A1 (de) * 1987-03-12 1988-09-22 Merck Patent Gmbh Coreaktive fotoinitiatoren
KR100813953B1 (ko) * 2002-04-22 2008-03-14 삼성전자주식회사 대전방지성을 갖는 광경화성 수지 조성물
US7309550B2 (en) * 2004-09-20 2007-12-18 Chemence, Inc. Photosensitive composition with low yellowing under UV-light and sunlight exposure

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3795598A (en) * 1969-10-14 1974-03-05 Bridgestone Tire Co Ltd Photopolymerization process for the manufacture of alternating copolymers of butadiene and acrylonitrile
US4038164A (en) * 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
US4072770A (en) * 1976-05-11 1978-02-07 Scm Corporation U.V. curable poly(ester-urethane) polyacrylate polymers and wet look coatings therefrom
US4118298A (en) * 1977-04-15 1978-10-03 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylamide compositions
US4167464A (en) * 1978-10-16 1979-09-11 The B. F. Goodrich Company Photopolymerized hydrophilic interpolymers of unsaturated carboxylic acid and esters
US4229274A (en) * 1979-02-26 1980-10-21 Ppg Industries, Inc. Ultraviolet light curable compositions for producing coatings of low gloss

Also Published As

Publication number Publication date
ZA843881B (en) 1984-12-24
IL71761A0 (en) 1984-09-30
AU566308B2 (en) 1987-10-15
AU2880584A (en) 1984-12-13
DK278884D0 (da) 1984-06-06
DK278884A (da) 1984-12-07
BR8402623A (pt) 1985-04-30
KR850000486A (ko) 1985-02-27
US4519883A (en) 1985-05-28
EP0128322A1 (en) 1984-12-19
NZ208371A (en) 1986-11-12

Similar Documents

Publication Publication Date Title
IL71762A (en) Photopolymerization method and compositions with sensitized glyoxylate photoinitiators
DE3476068D1 (en) Photopolymerizable composition
GB2143961B (en) Hardening photoresist
DE3373221D1 (en) Photopolymerizable photosensitive composition
AU566653B2 (en) Photopolymerizable composition
DE3467937D1 (en) Image-forming method
GB8419521D0 (en) Developing method
GB2112011B (en) Photosensitive polymerizable composition and laminates thereof
GB2139774B (en) Printer and method for determining exposure conditions thereof
EP0121930A3 (en) Image-forming method
GB8332587D0 (en) Photopolymerizable organic composition
DE3067020D1 (en) Photosensitive composition and pattern-forming method
EP0131824A3 (en) Photopolymerizable composition
DE3264268D1 (en) Radiation-sensitive composition and pattern-formation method using the same
DE3474452D1 (en) Photopolymerizable composition
GB8407567D0 (en) Developing method
GB8426697D0 (en) Determining neutron exposure
IL71761A0 (en) Photopolymerization method and compositions with sensitized glyoxylate photoinitiators
JPS57209931A (en) Photopolymerizable mixture and photopolymerization
GB8426269D0 (en) Developing method
GB8719664D0 (en) Exposure method
IL71759A (en) Photopolymerization method and compositions with sensitized glyoxylate photoinitiators
AU566310B2 (en) Photopolymerizable composition
AU566309B2 (en) Photopolymerizable composition
AU569084B2 (en) Photopolymerizable composition

Legal Events

Date Code Title Description
MM9K Patent not in force due to non-payment of renewal fees